JPH0945827A - Semiconductor device - Google Patents

Semiconductor device

Info

Publication number
JPH0945827A
JPH0945827A JP19725895A JP19725895A JPH0945827A JP H0945827 A JPH0945827 A JP H0945827A JP 19725895 A JP19725895 A JP 19725895A JP 19725895 A JP19725895 A JP 19725895A JP H0945827 A JPH0945827 A JP H0945827A
Authority
JP
Japan
Prior art keywords
heat
semiconductor device
conductors
components
conductor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP19725895A
Other languages
Japanese (ja)
Inventor
学志 ▲吉▼田
Satoshi Yoshida
Yuji Fujita
祐治 藤田
Kenji Kaneko
憲二 金子
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP19725895A priority Critical patent/JPH0945827A/en
Publication of JPH0945827A publication Critical patent/JPH0945827A/en
Pending legal-status Critical Current

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  • Cooling Or The Like Of Semiconductors Or Solid State Devices (AREA)
  • Cooling Or The Like Of Electrical Apparatus (AREA)

Abstract

PROBLEM TO BE SOLVED: To reduce the temperature difference between the temperatures of electronic components and to make uniform the output signal levels of devices by a method wherein at least one of heat conductors, which are respectively mounted to a plurality of the electronic components and transfer heat, which is generated in the components, to cooling components, has a heat conductivity different from those of the other heat conductors. SOLUTION: A plurality of electronic components 13, 14 and 15 are mounted on the upper surface of a wiring board 11, which consists of a ceramic board made of an alumina or a mullite, through solder balls as connection means. Here, the components 13 are CPUs and the components 14 and 15 are memory elements. Here, heat conductors 31, 32 and 33 are respectively connected with the upper parts of the components 13, 14 and 15 and the heat conductors 31, 32 and 33 are respectively connected thermally with the recess parts in the centers of cooling components 6. Moreover here, materials having heat conductivities different from each other are respectively used for conductors 31, 32 and 33. In concrete terms, Cu, Si and Mo are respectively used for the conductor 31, the conductor 32 and the conductor 33.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は配線基板上に複数の電子
部品を搭載接続し、電子部品上に冷却部品を有する半導
体装置に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a semiconductor device having a plurality of electronic components mounted and connected on a wiring board and having cooling components on the electronic components.

【0002】[0002]

【従来の技術】従来マルチチップモジュールと呼ばれる
半導体装置は一般的に同一種類の複数の電子部品をセラ
ミック基板等の配線基板に搭載していた。たとえば特開
平6−77361 号公報記載のようにLSIチップとヒート
シンクを熱伝導材で熱的に接続する構成で冷却を行って
いた。ここで各チップの発熱量に大きな差はないので同
一構造の熱伝導材を用いて冷却を行っても、各チップの
動作温度に大きな差は生じなかった。
2. Description of the Related Art Conventionally, a semiconductor device called a multi-chip module has generally mounted a plurality of electronic components of the same type on a wiring substrate such as a ceramic substrate. For example, as described in JP-A-6-77361, cooling is performed by a structure in which an LSI chip and a heat sink are thermally connected by a heat conductive material. Here, since there is no large difference in the heat generation amount of each chip, even if cooling is performed using the heat conductive material having the same structure, there is no large difference in the operating temperature of each chip.

【0003】しかし、近年、集積度の向上に伴い、発熱
量の大きな高速CPUと比較的発熱量の少ないメモリ素
子を近接させることで半導体装置を高速化する必要性が
増してきた。
However, in recent years, with the increase in the degree of integration, there is an increasing need to increase the speed of a semiconductor device by bringing a high-speed CPU, which generates a large amount of heat, and a memory element, which generates a relatively small amount of heat, close to each other.

【0004】[0004]

【発明が解決しようとする課題】よく知られているよう
に、モジュール内に実裝された多数のデバイスから出力
される信号レベルを均一化するためには、各電子部品の
動作温度を一定範囲以内に収める必要がある。しかし、
従来構造ではCPUが発生する熱によってCPUとメモ
リ素子との間に許容範囲を超える温度差が生じる。ま
た、CPU近くのメモリ素子とCPUから離れた位置に
あるメモリ素子に接続する熱伝導体に同じ熱伝導率のも
のを用いると、CPU近くのメモリの動作温度がCPU
から離れたメモリの動作温度より高くなる。すなわち各
電子部品の動作温度を一定範囲内に収める点について考
慮がなされていなかった。
As is well known, in order to equalize the signal levels output from a large number of devices embodied in a module, the operating temperature of each electronic component must be within a certain range. Need to fit within. But,
In the conventional structure, the heat generated by the CPU causes a temperature difference exceeding the allowable range between the CPU and the memory element. Further, when the thermal conductors having the same thermal conductivity are used as the thermal conductors connected to the memory element near the CPU and the memory element located far from the CPU, the operating temperature of the memory near the CPU is
Higher than the operating temperature of the memory away from. That is, no consideration was given to keeping the operating temperature of each electronic component within a certain range.

【0005】本発明は電子部品間の温度差を低減するこ
とにより、各デバイスの出力信号レベルを均一化し、半
導体装置の動作をより安定化させることにある。
An object of the present invention is to make the output signal level of each device uniform by reducing the temperature difference between the electronic components and to further stabilize the operation of the semiconductor device.

【0006】[0006]

【課題を解決するための手段】上記目的は、配線基板
と、この基板に搭載される複数の電子部品と、電子部品
に取り付けられ電子部品で発生する熱を冷却部品に伝熱
する熱伝導体からなる半導体装置において、熱伝導体の
少なくとも一つは他の熱伝導体とは異なる熱伝導率を持
つことにより達成される。
The above object is to provide a wiring board, a plurality of electronic parts mounted on the board, and a heat conductor mounted on the electronic parts and for transferring heat generated in the electronic parts to a cooling part. In the semiconductor device made of, at least one of the heat conductors has a thermal conductivity different from that of the other heat conductors.

【0007】[0007]

【作用】上記手段によれば、CPUと接する熱伝導体と
しては、比較的熱伝導率の高い熱伝導体を用い、メモリ
素子と接する熱伝導体としては、比較的熱伝導率の低い
熱伝導体を用いることができる。またCPUの近傍にあ
るメモリに接続される熱伝導体として比較的熱伝導率の
高い熱伝導体を用い、CPUから離れた位置にあるメモ
リに接続される熱伝導体として比較的熱伝導率の低い熱
伝導体を用いることができる。これにより、CPUとメ
モリ素子の温度差が従来より低減され、さらにCPU近
傍のメモリ素子とCPUから離れたメモリ素子間の温度
差が低減する。この結果、CPUおよび各メモリ素子の
出力信号レベルを均一化できる。
According to the above means, a heat conductor having a relatively high heat conductivity is used as the heat conductor in contact with the CPU, and a heat conductor having a relatively low heat conductivity is used as the heat conductor in contact with the memory element. The body can be used. Further, a heat conductor having a relatively high heat conductivity is used as a heat conductor connected to the memory near the CPU, and a heat conductor having a relatively high heat conductivity is used as a heat conductor connected to the memory located away from the CPU. Low heat conductors can be used. As a result, the temperature difference between the CPU and the memory element is reduced as compared with the conventional case, and the temperature difference between the memory element near the CPU and the memory element distant from the CPU is reduced. As a result, the output signal levels of the CPU and each memory element can be made uniform.

【0008】[0008]

【実施例】図1は本発明における第1の実施例である半
導体装置101aの断面図である。
1 is a sectional view of a semiconductor device 101a according to a first embodiment of the present invention.

【0009】配線基板11はたとえばアルミナまたはム
ライト製のセラミクス基板からなる。この配線基板11
上面に、接続手段12としてPb/Sn(95/5wt
%)からなる半田ボールにより、複数の電子部品13,
14および15が搭載されている。接続手段12は電子
部品形態がBGAやベアチップの場合は半田ボールによ
る突起電極形態をとり、電子部品形態がQFP,TCP
の場合はパッケージに付随した金属リード形態をとる。
ここで電子部品13はCPUであり、電子部品14およ
び15はメモリ素子である。
The wiring board 11 is made of, for example, a ceramics board made of alumina or mullite. This wiring board 11
On the upper surface, Pb / Sn (95/5 wt) is used as the connecting means 12.
%) Solder balls made of a plurality of electronic components 13,
14 and 15 are mounted. The connecting means 12 takes the form of a protruding electrode using a solder ball when the electronic component form is BGA or a bare chip, and the electronic component form is QFP or TCP.
In the case of, it takes the form of metal leads attached to the package.
Here, the electronic component 13 is a CPU, and the electronic components 14 and 15 are memory elements.

【0010】さらに電子部品13,14および15の上
部には冷却部品16が覆うように配置されている。ここ
で冷却部品16は熱伝導率が高く加工しやすい材料であ
るAlN等のセラミクスからなる。また生産性向上やコ
スト低減のためにはAlやCuなどの金属が望ましい。
さらに冷却部品16の周辺部は凸状に加工されており、
配線基板11の周辺部に半田等(図示せず)により接続
されている。ここで電子部品13,14および15上部
には熱伝導体31,32および33が接続されており、
熱伝導体31,32および33は冷却部品16の中央凹
部に熱的に接続されている。ここで電子部品13はCP
Uなので、その発熱量が40〜50Wに達する一方、電
子部品14および15はメモリ素子なので、その発熱量
は数Wレベルである。
Further, a cooling component 16 is arranged above the electronic components 13, 14 and 15 so as to cover it. Here, the cooling component 16 is made of ceramics such as AlN, which is a material having high thermal conductivity and easy to process. Further, metals such as Al and Cu are desirable for improving productivity and reducing costs.
Furthermore, the periphery of the cooling component 16 is processed into a convex shape,
It is connected to the peripheral portion of the wiring board 11 by solder or the like (not shown). Here, heat conductors 31, 32 and 33 are connected to the upper parts of the electronic components 13, 14 and 15,
The heat conductors 31, 32 and 33 are thermally connected to the central recess of the cooling component 16. Here, the electronic component 13 is CP
Since it is U, its heat generation amount reaches 40 to 50 W, while the electronic components 14 and 15 are memory elements, so its heat generation amount is several W level.

【0011】本実施例では熱伝導体31,32および3
3に熱伝導率の異なる材料を用いた。具体的には、熱伝
導体31にはCu、熱伝導体32にはSi、熱伝導体3
3にはMoをそれぞれ用いた。本実施例による各電子部
品の温度分布を図2に示す。
In this embodiment, the heat conductors 31, 32 and 3 are
Materials having different thermal conductivity were used for No. 3. Specifically, the heat conductor 31 is Cu, the heat conductor 32 is Si, and the heat conductor 3 is
3 was Mo. The temperature distribution of each electronic component according to this embodiment is shown in FIG.

【0012】横軸に配線基板中心からの距離を示し、縦
軸に各電子部品の動作温度を示す。グラフの下に示す図
は半導体装置101aであり、配線基板11と電子部品
13,14および15の配置と接続状態を示している。
電子部品14および15はメモリ素子であって、その発
熱量はいずれも5Wである。また電子部品13はCPUで
あり、その発熱量は40Wである。
The horizontal axis represents the distance from the center of the wiring board, and the vertical axis represents the operating temperature of each electronic component. The figure shown below the graph is the semiconductor device 101a, and shows the arrangement and connection state of the wiring board 11 and the electronic components 13, 14 and 15.
Each of the electronic components 14 and 15 is a memory element, and its heat generation amount is 5 W. Further, the electronic component 13 is a CPU, and its heat generation amount is 40W.

【0013】点線は従来構造での動作温度の分布を示し
ている。従来構造では、熱伝導体31,32および33
に厚さの等しいCuを用いることで各熱伝導体の熱伝導
率を同じにした。各電子部品13,14,15と外部雰
囲気の間の熱抵抗はほぼ等しいので、発熱量の大きい電
子部品13の温度上昇がもっとも大きい。そして、電子
部品13の周囲に伝わる熱量の影響が大きい電子部品1
4の温度上昇が次に大きく、電子部品15の温度上昇は
最も小さい。電子部品13,14,15の動作温度差Δ
Taは30(℃)に達した。
The dotted line shows the distribution of operating temperature in the conventional structure. In the conventional structure, the heat conductors 31, 32 and 33 are
The heat conductivity of each heat conductor was made the same by using Cu having the same thickness. Since the thermal resistances between the electronic components 13, 14 and 15 and the external atmosphere are substantially equal to each other, the temperature rise of the electronic component 13 having a large heat generation amount is the largest. Then, the electronic component 1 that is greatly affected by the amount of heat transmitted to the periphery of the electronic component 13
The temperature rise of 4 is the next largest, and the temperature rise of the electronic component 15 is the smallest. Difference in operating temperature of electronic parts 13, 14, 15 Δ
Ta reached 30 (° C).

【0014】本構造の動作温度の分布を実線に示す。電
子部品13に接続する熱伝導体31には従来と同じCu
を用いた。電子部品13から周囲に伝達する熱量に大き
く影響される電子部品14と接する熱伝導体32の材料
としては、Cuより熱伝導率の小さいSiを用いた。電
子部品13の熱的影響が比較的少ない電子部品15と接
する熱伝導体33の材料は、Siよりさらに熱伝導率の
小さいMoを用いた。これら熱伝導体31,32,33
の厚さは等しくした。電子部品14と外部雰囲気の間の
熱抵抗は、従来例に比べて大きくなっているので、電子
部品13と14の温度差は従来より低減される。また電
子部品15と外部雰囲気の間の熱抵抗は、電子部品14
と外部雰囲気との間の熱抵抗よりさらに大きいので、従
来構造と比べた電子部品15の温度上昇の幅はさらに大
きくなり、電子部品14と15の温度差も従来より低減
される。
The solid line shows the distribution of the operating temperature of this structure. For the heat conductor 31 connected to the electronic component 13, the same Cu as the conventional one is used.
Was used. As the material of the heat conductor 32 that contacts the electronic component 14 that is greatly affected by the amount of heat transferred from the electronic component 13 to the surroundings, Si having a smaller thermal conductivity than Cu was used. As a material of the heat conductor 33 which is in contact with the electronic component 15 in which the thermal influence of the electronic component 13 is relatively small, Mo having a smaller thermal conductivity than Si was used. These heat conductors 31, 32, 33
Had the same thickness. Since the thermal resistance between the electronic components 14 and the external atmosphere is larger than that of the conventional example, the temperature difference between the electronic components 13 and 14 is reduced as compared with the conventional example. Further, the thermal resistance between the electronic component 15 and the external atmosphere is
Since the thermal resistance between the electronic component 15 and the external atmosphere is larger than that of the conventional structure, the temperature rise of the electronic component 15 is further increased, and the temperature difference between the electronic components 14 and 15 is also reduced as compared with the conventional structure.

【0015】この結果、電子部品13,14,15の動
作温度差ΔTbは5(℃)となり、従来に比べて約6分
の1に低減できた。またの理由より、熱伝導体32には
熱伝導体Cuの熱伝導率よりも小さいMoを用い、熱伝
導体33には熱伝導体32に用いたMoよりさらに熱伝
導率が小さいAl23を用いても同様の効果が得られ
る。
As a result, the operating temperature difference ΔTb between the electronic components 13, 14 and 15 is 5 (° C.), which can be reduced to about one sixth of the conventional one. For other reasons, Mo that is smaller than the heat conductivity of the heat conductor Cu is used for the heat conductor 32, and Al 2 O that has a smaller heat conductivity than the Mo used for the heat conductor 32 is used for the heat conductor 33. The same effect can be obtained by using 3 .

【0016】図3は本発明における第2の実施例である
半導体装置101bの断面図である。
FIG. 3 is a sectional view of a semiconductor device 101b according to a second embodiment of the present invention.

【0017】半導体装置101bは、半導体装置101
aにおける熱伝導体31,32および33を複数部品で
構成した例である。すなわち、熱伝導体36,37およ
び38は、熱伝導体31,32および33のそれぞれと
熱伝導体34を積層してなる。
The semiconductor device 101b is the semiconductor device 101.
This is an example in which the heat conductors 31, 32, and 33 in a are composed of a plurality of parts. That is, the heat conductors 36, 37 and 38 are formed by laminating the heat conductors 31, 32 and 33 and the heat conductor 34, respectively.

【0018】本実施例では熱伝導体を複数積層すること
で熱伝導体36,37および38の熱伝導率に差を設け
た。具体的には、熱伝導体34にはPb/Sn(37/
63wt%)を使用し、熱伝導体31,32および33
は第1の実施例と同様にそれぞれCu,Si,Moを使
用した。第1の実施例と同様に電子部品13,14,1
5の順に外部雰囲気との間の熱抵抗が大きくなるので従
来例に比べて各電子部品間の温度差を低減できる。また
Cu,AlN,SiC,Al,W,SiまたはMoの中
の任意の3種類を熱伝導率の大きい順に電子部品13,
14,15に配置することによっても同様の効果が得ら
れる。
In this embodiment, a plurality of heat conductors are laminated so that the heat conductors 36, 37 and 38 have different thermal conductivities. Specifically, the heat conductor 34 has Pb / Sn (37 /
63 wt%) and heat conductors 31, 32 and 33
Used Cu, Si and Mo respectively as in the first embodiment. Similar to the first embodiment, electronic components 13, 14, 1
Since the thermal resistance to the external atmosphere increases in the order of 5, the temperature difference between the electronic components can be reduced as compared with the conventional example. Also, any three kinds of Cu, AlN, SiC, Al, W, Si or Mo are selected in order of increasing thermal conductivity from the electronic component 13,
The same effect can be obtained by arranging 14 and 15.

【0019】図4は本発明の第3の実施例である半導体
装置101cの断面図である。
FIG. 4 is a sectional view of a semiconductor device 101c which is a third embodiment of the present invention.

【0020】半導体装置101cは、半導体装置101
aの熱伝導体31,32および33を熱伝導体45,4
6および47に置き換えた構造である。これら熱伝導体
45,46および47は熱伝導体40と熱伝導体41の
2つの部品からなる。そして、電子部品13と接する熱
伝導体40の厚さを最も厚くし、電子部品15と接する
熱伝導体40の厚さを最も薄くした。ここで熱伝導体4
0の材料としてはCuを用い、熱伝導体41の材料とし
ては、Cuより熱伝導率の小さいPb/Sn(37/6
3wt%)を用いた。以上の構成によれば第1の実施例
と同様に、電子部品13,14,15の順に外部雰囲気
との間の熱抵抗が大きくなるので、従来例に比べて各電
子部品間の温度差を低減できる。
The semiconductor device 101c is the semiconductor device 101.
a of the heat conductors 31, 32 and 33 to the heat conductors 45, 4
The structure is replaced with 6 and 47. These heat conductors 45, 46 and 47 are composed of two parts, a heat conductor 40 and a heat conductor 41. Then, the thickness of the heat conductor 40 in contact with the electronic component 13 was made thickest, and the thickness of the heat conductor 40 in contact with the electronic component 15 was made thinnest. Here the heat conductor 4
Cu is used as the material of 0, and the material of the heat conductor 41 is Pb / Sn (37/6) having a smaller thermal conductivity than Cu.
3 wt%) was used. According to the above configuration, as in the first embodiment, the thermal resistance between the electronic components 13, 14 and 15 and the external atmosphere increases in this order, so that the temperature difference between the electronic components can be reduced compared to the conventional example. It can be reduced.

【0021】図5は本発明の第4の実施例である半導体
装置101dの断面図である。
FIG. 5 is a sectional view of a semiconductor device 101d according to a fourth embodiment of the present invention.

【0022】半導体装置101cは、半導体装置101
aの熱伝導体31,32および33を熱伝導体48,4
9および50に置き換えた構造である。そして、電子部
品13と接する熱伝導体48の接触面積を最も大きく
し、電子部品15と接する熱伝導体50の接触面積を最
も小さくした。ここで熱伝導体48,49,50の材料
としてはCuを用いた。以上の構成によれば第1の実施
例と同様に、電子部品13,14,15の順に外部雰囲
気との間の熱抵抗が大きくなるので、従来例に比べて各
電子部品間の温度差を低減できる。
The semiconductor device 101c is the semiconductor device 101.
a of the heat conductors 31, 32 and 33 to the heat conductors 48, 4
The structure is replaced with 9 and 50. The contact area of the heat conductor 48 in contact with the electronic component 13 was maximized, and the contact area of the heat conductor 50 in contact with the electronic component 15 was minimized. Here, Cu was used as the material of the heat conductors 48, 49, 50. According to the above configuration, as in the first embodiment, the thermal resistance between the electronic components 13, 14 and 15 and the external atmosphere increases in this order, so that the temperature difference between the electronic components is smaller than that in the conventional example. It can be reduced.

【0023】[0023]

【発明の効果】本発明によれば複数の電子部品を高密度
で搭載した半導体装置内で、同種の電子部品の動作温度
の差を少なくすることができるので、各電子部品から出
力される信号レベルが均一化し、半導体装置の動作をよ
り安定させることができる。
According to the present invention, it is possible to reduce the difference in operating temperature between electronic components of the same type in a semiconductor device in which a plurality of electronic components are mounted at high density. The level becomes uniform, and the operation of the semiconductor device can be further stabilized.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の一実施例の複数の電子部品を配線基板
に搭載し電子部品と冷却部品を熱伝導体で接続した半導
体装置の断面図。
FIG. 1 is a cross-sectional view of a semiconductor device in which a plurality of electronic components according to an embodiment of the present invention are mounted on a wiring board and the electronic components and cooling components are connected by a heat conductor.

【図2】従来半導体装置の温度分布と本構造による温度
特性図。
FIG. 2 is a temperature distribution diagram of a conventional semiconductor device and a temperature characteristic according to the present structure.

【図3】本発明の一実施例の複数の電子部品を配線基板
に搭載し電子部品と冷却部品を熱伝導体で接続した半導
体装置の断面図。
FIG. 3 is a cross-sectional view of a semiconductor device in which a plurality of electronic components according to an embodiment of the present invention are mounted on a wiring board and the electronic components and the cooling components are connected by a heat conductor.

【図4】本発明の一実施例の複数の電子部品を配線基板
に搭載し電子部品と冷却部品を熱伝導体で接続した半導
体装置の断面図。
FIG. 4 is a cross-sectional view of a semiconductor device in which a plurality of electronic components according to an embodiment of the present invention are mounted on a wiring board and the electronic components and the cooling components are connected by a heat conductor.

【図5】本発明の一実施例の複数の電子部品を配線基板
に搭載し電子部品と冷却部品を熱伝導体で接続した半導
体装置の断面図。
FIG. 5 is a cross-sectional view of a semiconductor device in which a plurality of electronic components according to an embodiment of the present invention are mounted on a wiring board and the electronic components and the cooling components are connected by a heat conductor.

【符号の説明】[Explanation of symbols]

11…配線基板、12…突起電極、13…CPU部品、
14…メモリ部品、15…メモリ部品、16…冷却部
品、31…熱伝導体、32…熱伝導体、33…熱伝導
体、101a…半導体装置。
11 ... Wiring board, 12 ... Projection electrode, 13 ... CPU component,
14 ... Memory component, 15 ... Memory component, 16 ... Cooling component, 31 ... Thermal conductor, 32 ... Thermal conductor, 33 ... Thermal conductor, 101a ... Semiconductor device.

Claims (8)

【特許請求の範囲】[Claims] 【請求項1】配線基板と、この基板に搭載される複数の
電子部品と、前記電子部品に取り付けられ前記電子部品
で発生する熱を冷却部品に伝える熱伝導体からなる半導
体装置において、前記熱伝導体の少なくとも一つは他の
熱伝導体とは異なる熱伝導率を持つことを特徴とする半
導体装置。
1. A semiconductor device comprising a wiring board, a plurality of electronic parts mounted on the board, and a heat conductor mounted on the electronic parts and transmitting heat generated in the electronic parts to a cooling part, A semiconductor device, wherein at least one of the conductors has a different thermal conductivity from other heat conductors.
【請求項2】請求項1において、前記熱伝導体の少なく
とも一つは他の熱伝導体とは熱伝導率の異なる材料から
なる半導体装置。
2. The semiconductor device according to claim 1, wherein at least one of the thermal conductors is made of a material having a thermal conductivity different from that of the other thermal conductors.
【請求項3】請求項1または2において、前記熱伝導体
は熱伝導率の異なる複数の材料を積層してなる半導体装
置。
3. The semiconductor device according to claim 1, wherein the thermal conductor is formed by laminating a plurality of materials having different thermal conductivities.
【請求項4】請求項3において、前記熱伝導体を構成す
る複数の材料のうち少なくとも一つの材料の厚さが他の
熱伝導体を構成する材料の厚さと異なっている半導体装
置。
4. The semiconductor device according to claim 3, wherein the thickness of at least one of the plurality of materials forming the heat conductor is different from the thickness of the material forming the other heat conductor.
【請求項5】請求項1において、前記熱伝導体の少なく
とも一つは他の熱伝導体とは前記電子部品との接続面積
が異なっている半導体装置。
5. The semiconductor device according to claim 1, wherein at least one of the heat conductors has a connection area different from other heat conductors with the electronic component.
【請求項6】請求項1,2,3,4または5において、
前記電子部品はベアチップからなる半導体装置。
6. The method of claim 1, 2, 3, 4, or 5,
A semiconductor device in which the electronic component is a bare chip.
【請求項7】請求項1,2,3,4または5において、
前記電子部品はQFP,BGA,TCP等の表面実裝用
パッケージからなる半導体装置。
7. The method according to claim 1, wherein
The electronic component is a semiconductor device including a package for surface implementation such as QFP, BGA, TCP.
【請求項8】請求項1,2,3,4または5において、
前記熱伝導体を構成する材料の少なくとも一つは半田か
らなる半導体装置。
8. The method of claim 1, 2, 3, 4, or 5,
A semiconductor device in which at least one of the materials forming the heat conductor is solder.
JP19725895A 1995-08-02 1995-08-02 Semiconductor device Pending JPH0945827A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP19725895A JPH0945827A (en) 1995-08-02 1995-08-02 Semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP19725895A JPH0945827A (en) 1995-08-02 1995-08-02 Semiconductor device

Publications (1)

Publication Number Publication Date
JPH0945827A true JPH0945827A (en) 1997-02-14

Family

ID=16371479

Family Applications (1)

Application Number Title Priority Date Filing Date
JP19725895A Pending JPH0945827A (en) 1995-08-02 1995-08-02 Semiconductor device

Country Status (1)

Country Link
JP (1) JPH0945827A (en)

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001244391A (en) * 1999-12-21 2001-09-07 Toyota Central Res & Dev Lab Inc Cooling structure of multichip module
US7254035B2 (en) 2000-10-25 2007-08-07 Sony Computer Entertainment Inc. Circuit substrate unit and electronic equipment
JP2008021810A (en) * 2006-07-13 2008-01-31 Shinko Electric Ind Co Ltd Semiconductor module and radiation plate
JP2008103595A (en) * 2006-10-20 2008-05-01 Shinko Electric Ind Co Ltd Semiconductor module, and heat dissipation plate for semiconductor module
US7610678B2 (en) 2004-08-19 2009-11-03 Fujitsu Limited Heat transfer sheet, heat transfer structural body and manufacturing method of the heat transfer structural body
JP2011233562A (en) * 2010-04-23 2011-11-17 Hitachi Ltd Power conversion device and rolling stock
JP2016062953A (en) * 2014-09-16 2016-04-25 株式会社デンソー Electronic control unit and dynamo-electric machine using the same
US9699883B2 (en) 2015-01-08 2017-07-04 Toyota Motor Engineering & Manufacturing North America, Inc. Thermal switches for active heat flux alteration
CN110634753A (en) * 2019-09-25 2019-12-31 北京比特大陆科技有限公司 Method for welding chip with radiator and PCB assembly
CN114613738A (en) * 2022-05-12 2022-06-10 山东中清智能科技股份有限公司 Multi-chip packaging structure and manufacturing method thereof
US11837520B2 (en) 2020-12-23 2023-12-05 Fujitsu Limited Semiconductor device and semiconductor device fabrication method

Cited By (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001244391A (en) * 1999-12-21 2001-09-07 Toyota Central Res & Dev Lab Inc Cooling structure of multichip module
US7254035B2 (en) 2000-10-25 2007-08-07 Sony Computer Entertainment Inc. Circuit substrate unit and electronic equipment
US7610678B2 (en) 2004-08-19 2009-11-03 Fujitsu Limited Heat transfer sheet, heat transfer structural body and manufacturing method of the heat transfer structural body
JP2008021810A (en) * 2006-07-13 2008-01-31 Shinko Electric Ind Co Ltd Semiconductor module and radiation plate
JP2008103595A (en) * 2006-10-20 2008-05-01 Shinko Electric Ind Co Ltd Semiconductor module, and heat dissipation plate for semiconductor module
JP2011233562A (en) * 2010-04-23 2011-11-17 Hitachi Ltd Power conversion device and rolling stock
JP2016062953A (en) * 2014-09-16 2016-04-25 株式会社デンソー Electronic control unit and dynamo-electric machine using the same
US9699883B2 (en) 2015-01-08 2017-07-04 Toyota Motor Engineering & Manufacturing North America, Inc. Thermal switches for active heat flux alteration
CN110634753A (en) * 2019-09-25 2019-12-31 北京比特大陆科技有限公司 Method for welding chip with radiator and PCB assembly
US11837520B2 (en) 2020-12-23 2023-12-05 Fujitsu Limited Semiconductor device and semiconductor device fabrication method
CN114613738A (en) * 2022-05-12 2022-06-10 山东中清智能科技股份有限公司 Multi-chip packaging structure and manufacturing method thereof
CN114613738B (en) * 2022-05-12 2022-07-15 山东中清智能科技股份有限公司 Multi-chip packaging structure and manufacturing method thereof

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