JPH09310136A - Aluminum hard foil for electrolytic capacitor and its production - Google Patents

Aluminum hard foil for electrolytic capacitor and its production

Info

Publication number
JPH09310136A
JPH09310136A JP14848096A JP14848096A JPH09310136A JP H09310136 A JPH09310136 A JP H09310136A JP 14848096 A JP14848096 A JP 14848096A JP 14848096 A JP14848096 A JP 14848096A JP H09310136 A JPH09310136 A JP H09310136A
Authority
JP
Japan
Prior art keywords
plane
aluminum
rolling
foil
recrystallization
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP14848096A
Other languages
Japanese (ja)
Other versions
JP3348340B2 (en
Inventor
Jun Shimizu
遵 清水
Masahiko Katano
雅彦 片野
Haruyumi Kosuge
張弓 小菅
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toyo Aluminum KK
Nippon Light Metal Co Ltd
Original Assignee
Toyo Aluminum KK
Nippon Light Metal Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toyo Aluminum KK, Nippon Light Metal Co Ltd filed Critical Toyo Aluminum KK
Priority to JP14848096A priority Critical patent/JP3348340B2/en
Publication of JPH09310136A publication Critical patent/JPH09310136A/en
Application granted granted Critical
Publication of JP3348340B2 publication Critical patent/JP3348340B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Abstract

PROBLEM TO BE SOLVED: To reduce dispersion in the surface of foil at the time of electrolytic etching and to reduce the solubility thereof into an electrolyte by regulating the reflected X-rays intensity ratio in the crystal plane in alminum in which purity is regulated to specified value or above and the crystal grain size width in the surface is regulated to specified value or below to specified value or above. SOLUTION: Aluminum in which purity is regulated to >=99.97% and the crystal grain width in the surface is regulated to <=0.4mm is used. In the case the crystal grain width is <=0.4mm. dispersion in the surface after etching is solved. The reflected X-rays intensity ratio (220) in the (220) plane to the (311) plane in the crystal orientation of the aluminum is regulated to >=1. For regulating the crystal grain width to <=0.4mm and reducing the crystals in the (311) orientation, in the alminum ingot after homogenizing treatment, recrystallization is generated for >= two times in the process of hot rolling. As for the rolling conditions of the hot rolling generating the final recrystallization, the rolling is started so as to regulate the temp. in the inlet side of the sheet, and the temp. in the outlet side is regulated to >=310 deg.C. Cold rolling is executed without annealing treatment.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【発明の属する技術分野】本発明は電解コンデンサ用ア
ルミニウム硬質箔およびその製造方法に係り、電解エッ
チングに際して表面むらが少なく、かつ電解液への溶解
性が低くて電解エッチング性の良好な電解コンデンサ用
アルミニウム硬質箔およびその好ましい製造方法に関す
るものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an aluminum hard foil for an electrolytic capacitor and a method for manufacturing the same, for an electrolytic capacitor having less surface unevenness during electrolytic etching and low solubility in an electrolytic solution and good electrolytic etching property. The present invention relates to an aluminum hard foil and a preferable manufacturing method thereof.

【0002】[0002]

【従来の技術】アルミニウムは、陽極酸化により表面に
耐電圧性の緻密な酸化皮膜が形成され誘電体として利用
できること、そしてさらに電気化学的にエッチングする
ことにより表面積を拡大できることを活かしてコンデン
サとして利用されている。このコンデンサに利用される
アルミニウムは陽極用箔においては高静電容量付与の関
係から純度99.97%以上、好ましくは99.98%以上
のアルミニウムをベースに、その他の有意または不純物
元素を必要範囲に配合溶製し、脱ガス、不純物除去等の
処理を施したのち、上下が開放した水冷式鋳型を用いる
DC鋳造法で厚さ約500mmのスラブを鋳造し、溶体化
処理、熱間圧延、冷間圧延して厚さ約0.3mmの箔地とな
し、焼鈍再結晶させた後、あるいは焼鈍なしでさらに薄
く圧延して厚さ約0.1mmの電解コンデンサ用箔とされ
る。
2. Description of the Related Art Aluminum is used as a capacitor by taking advantage of the fact that a dense oxide film having a withstand voltage is formed on the surface by anodic oxidation and can be used as a dielectric, and that the surface area can be increased by electrochemical etching. Have been. The aluminum used in this capacitor is based on aluminum having a purity of 99.97% or more, preferably 99.98% or more, in the anode foil because of its high electrostatic capacity, and other significant or impurity elements within the necessary range. After compounding and melting, and degassing, removing impurities, etc., cast a slab with a thickness of about 500 mm by DC casting method using a water-cooled mold with open upper and lower parts, solution heat treatment, hot rolling, It is cold-rolled to form a foil with a thickness of about 0.3 mm, and after annealing recrystallization, or further thin rolling without annealing to obtain a foil for electrolytic capacitors with a thickness of about 0.1 mm.

【0003】前記したようにして得られた箔は、酸系電
解液を用いたエッチング工程で電気化学的に両面から穿
孔されピットを多数形成して表面積を拡大し、芯部を残
すことによって箔としての強度を付与している。さらに
次の化成工程で処理液、条件を変えて、誘電体酸化皮膜
を電気化学的に形成させ、次いで製品幅に切断し、リー
ドを取り付け、セパレート紙を挟み、巻き取って電解液
を含浸してケースに入れ、封口材で封口するもので、そ
の後電圧を印加し、加工中に付けた誘電体酸化皮膜の傷
を修復して完成品とされる。
The foil obtained as described above is electrochemically perforated from both sides in an etching process using an acid electrolyte to form a large number of pits to increase the surface area and leave the core portion. As the strength. In the next chemical conversion process, the treatment liquid and conditions are changed to electrochemically form a dielectric oxide film, then cut into product widths, leads are attached, separate paper is sandwiched, and wound to impregnate the electrolyte solution. It is placed in a case and sealed with a sealing material. After that, a voltage is applied to repair the scratches on the dielectric oxide film applied during the processing to complete the product.

【0004】ところで、電解コンデンサ用アルミニウム
箔は、上述の如く精密に製造され、加工されるところか
ら表面むらのない良好なエッチング特性が求められる他
に、コンデンサの小型化指向によって、箔の表面積を拡
大するためのエッチング条件が益々苛酷なものとなって
きた。特に陽極用に用いられる低圧コンデンサ用アルミ
ニウム硬質箔は、鋳塊を均質化処理後焼鈍処理すること
なく冷間圧延して製造され、表面積の拡大処理として特
に塩酸を主体とした電解液を用い交流電流でエッチング
される。近時箔の静電容量を上げるために、電解液中の
塩酸濃度を高くし、また箔が液中に存在する時間を長く
する傾向にある。
By the way, the aluminum foil for electrolytic capacitors is required to have good etching characteristics without surface unevenness because it is precisely manufactured and processed as described above, and the surface area of the foil can be reduced due to the miniaturization of the capacitor. Etching conditions for expansion have become increasingly severe. Aluminum hard foil for low-voltage capacitors, which is used especially for the anode, is manufactured by homogenizing the ingot and then cold rolling it without annealing. It is etched with an electric current. Recently, in order to increase the capacitance of the foil, the concentration of hydrochloric acid in the electrolytic solution tends to be increased, and the time for which the foil is present in the solution tends to be long.

【0005】即ち、上記したような処理をすると箔の電
解液と接触した面は化学的な溶解量が多くなり、ピット
の形状を崩し静電容量の低下や残芯部の厚さ不足による
機械的強度不足をもたらすので、ピットの形状を崩さな
いため化学的な溶解量を少なくする必要があり、酸系電
解液に対する耐溶解性のあるアルミニウム箔が求められ
ている。また化学的な溶解はアルミニウム箔の不純物が
多いと促進されることが知られており、高純化の傾向に
ある。更に特開平4−333541号公報においては箔
の結晶方位の考察から(110)面に対する(100)
面の比(100)/(110)を特定値以下とした硬質
アルミニウム箔の提案がなされている。
That is, when the above-mentioned treatment is carried out, the amount of chemical dissolution on the surface of the foil in contact with the electrolytic solution is increased, the shape of the pits is destroyed, the capacitance is lowered, and the thickness of the residual core portion is insufficient. Since it causes a lack of mechanical strength, it is necessary to reduce the amount of chemical dissolution so as not to damage the shape of the pit, and there is a demand for an aluminum foil that is resistant to dissolution in an acid electrolyte. Further, it is known that the chemical dissolution is promoted when the aluminum foil has a large amount of impurities, and there is a tendency for high purification. Further, in JP-A-4-333541, from the consideration of the crystal orientation of the foil, (100) with respect to the (110) plane
A proposal has been made for a hard aluminum foil in which the surface ratio (100) / (110) is set to a specific value or less.

【0006】[0006]

【発明が解決しようとする課題】アルミニウム箔におけ
る結晶方位の考察から提案された上述のアルミニウム硬
質箔は耐化学的溶解性に関して効果があるが、低圧用ア
ルミニウム硬質箔はエッチング後に目視的な表面むらが
生じており、このような表面むらはエッチングに携わる
場合に好まれない欠点である。しかもさらにより化学的
な溶解量の少ない電解コンデンサ用アルミニウム硬質箔
が求められることは言うまでもない。
The above-mentioned aluminum hard foil proposed from the consideration of the crystal orientation in the aluminum foil is effective in terms of chemical dissolution resistance, but the low-pressure aluminum hard foil is visually uneven in surface after etching. Is caused, which is an unfavorable drawback when engaging in etching. Needless to say, a hard aluminum foil for electrolytic capacitors, which has a smaller amount of chemical dissolution, is required.

【0007】[0007]

【課題を解決するための手段】本発明は上記したような
従来技術における課題を解消することに成功したもの
で、即ち本発明者らは、低圧用アルミニウム硬質箔のエ
ッチング後の目視的な表面むらは鋳塊の均質化処理後の
結晶粒の残影であり、如何にこの残影を無くすかについ
て鋭意研究した結果、箔の結晶粒幅を0.4mm以下とした
硬質箔は、エッチング後に目視的な表面むらが生じない
ことを見出し、さらに箔の結晶粒幅をこのように0.4mm
以下とした硬質箔は結晶方位の種類の多い圧延集合組織
であって、このアルミニウム硬質箔の圧延集合組織中の
(200)、(220)方位を除いたその他の結晶方位
中(311)方位が酸系電解液、特に塩酸系電解液に対
する溶解性を助長することを見出し本発明を完成したも
のであって、以下の如くである。
The present invention has succeeded in solving the problems in the prior art as described above, that is, the present inventors have found that the visual surface of an aluminum hard foil for low pressure after etching The unevenness is the remnant of crystal grains after homogenization of the ingot, and as a result of diligent research on how to eliminate this remnant, a hard foil with a crystal grain width of 0.4 mm or less was found after etching. It was found that no visible surface unevenness occurred, and the crystal grain width of the foil was set to 0.4 mm in this way.
The hard foil described below has a rolling texture with many types of crystal orientations, and the (311) orientation in other crystal orientations other than the (200) and (220) orientations in the rolling texture of this aluminum hard foil is The present invention has been completed by finding out that the solubility in an acid-based electrolytic solution, particularly a hydrochloric acid-based electrolytic solution is promoted, and the present invention is completed as follows.

【0008】即ち、第1の発明は、アルミニウム純度が
99.97%以上であり、表面の結晶粒幅が0.4mm以下で
あって、かつ結晶方位の(311)面に対する(22
0)面の反射X線強度比(220)/(311)が1.0
以上であることを特徴とする電解コンデンサ用アルミニ
ウム硬質箔であり、また第2の発明は、アルミニウム純
度が99.97%以上であり、表面の結晶粒幅が0.4mm以
下であって、かつ結晶方位の(200)面および(31
1)面に対する(220)面の反射X線強度比(22
0)/{(200)+(311)}が1.0以上であるこ
とを特徴とする電解コンデンサ用アルミニウム硬質箔で
ある。更に第3の発明は、アルミニウム純度が99.97
%以上であり、表面の結晶粒幅が0.4mm以下であり、か
つ結晶方位の(200)面、(220)面および(31
1)面に対する(220)面の反射X線強度比(22
0)/{(200)+(220)+(311)}が0.4
以上であることを特徴とする電解コンデンサ用アルミニ
ウム硬質箔であり、第4の発明は、アルミニウム純度が
99.97%以上の鋳塊を均質化処理後熱間圧延し熱間圧
延板を得るに際し、熱間圧延中に2回以上再結晶を発生
させ、最終の再結晶を発生させる熱間圧延の圧延条件と
して、板の入り側の温度を400℃以下として圧延を開
始し出側の温度を310℃以上の温度とし、しかる後焼
鈍処理することなく冷間圧延することを特徴とする電解
コンデンサ用アルミニウム硬質箔の製造方法である。
That is, the first aspect of the invention is that the aluminum purity is 99.97% or more, the crystal grain width of the surface is 0.4 mm or less, and the crystal orientation is (2211) with respect to the (311) plane.
The ratio of the reflected X-ray intensity of the (0) plane (220) / (311) is 1.0
The second aspect of the present invention is an aluminum hard foil for an electrolytic capacitor, characterized in that the aluminum purity is 99.97% or more, and the surface crystal grain width is 0.4 mm or less, and (200) plane and (31
The ratio of the reflected X-ray intensity of the (220) plane to the 1) plane (22
The aluminum hard foil for electrolytic capacitors is characterized in that 0) / {(200) + (311)} is 1.0 or more. Furthermore, in the third invention, the aluminum purity is 99.97.
% Or more, the crystal grain width of the surface is 0.4 mm or less, and the (200) plane, (220) plane and (31) of the crystal orientation are
The ratio of the reflected X-ray intensity of the (220) plane to the 1) plane (22
0) / {(200) + (220) + (311)} is 0.4
A fourth aspect of the present invention is an aluminum hard foil for electrolytic capacitors, which is characterized in that the ingot having an aluminum purity of 99.97% or more is hot-rolled after homogenization treatment to obtain a hot-rolled sheet. As a rolling condition for hot rolling in which recrystallization is generated twice or more during hot rolling to generate final recrystallization, the temperature at the entrance side of the plate is set to 400 ° C. or less and rolling is started and the temperature at the exit side is set. A method of manufacturing an aluminum hard foil for an electrolytic capacitor, which comprises performing a cold rolling at a temperature of 310 ° C. or higher and without subsequent annealing treatment.

【0009】[0009]

【発明の実施の形態】上記したような本発明について、
更にその仔細を説明すると、電解コンデンサ用アルミニ
ウム硬質箔は鋳塊を均質化処理後焼鈍処理することなく
冷間圧延されて製箔されることから、均質化処理後の鋳
塊の結晶組織が箔にまで影響を及ぼすこととなる。即
ち、高い静電容量を付与できることから純度99.97%
以上、好ましくは99.98%以上のアルミニウムをベー
スに、Fe、Si、Cu、等の元素を必要範囲に配合または制
限して溶製し、脱ガス、不純物除去等の処理を施したの
ち、上下が開放した水冷式鋳型を用いるDC鋳造法で厚
さ約500mmのスラブを鋳造し、該鋳塊を600〜64
0℃程度の温度で溶体化される。ここで鋳塊は再結晶
し、この再結晶した鋳塊は次に熱間圧延される。この熱
間圧延は鋳塊を冷間圧延可能の厚さまで複数回圧延され
る。
BEST MODE FOR CARRYING OUT THE INVENTION
More specifically, the aluminum hard foil for electrolytic capacitors is cold rolled without homogenizing and then annealing the ingot, so that the crystal structure of the ingot after homogenizing treatment is the foil. Will be affected. That is, since it can give a high capacitance, the purity is 99.97%.
As described above, preferably, based on aluminum of 99.98% or more, elements such as Fe, Si, Cu, etc. are blended or limited within a necessary range to be melted, and after degassing, removing impurities, etc., A slab having a thickness of about 500 mm was cast by a DC casting method using a water-cooled mold whose top and bottom were open,
The solution is formed at a temperature of about 0 ° C. Here, the ingot is recrystallized and the recrystallized ingot is then hot rolled. In this hot rolling, the ingot is rolled a plurality of times to a thickness that enables cold rolling.

【0010】上記したような複数回の圧延の間に結晶粒
は圧延方向に延ばされ再結晶する時間的余裕の無い間に
熱間圧延が終了するが、圧延板の表面を平滑なものとす
るために熱間圧延板の両端が切断されるような場合は、
この両端切断作業の間に再結晶が終了する。本発明者等
は硬質箔のエッチング後の表面むらがこの再結晶と非常
に関係があることを見出したことは上述したとおりであ
るが、この再結晶粒の幅がさらに重要であって、その幅
が0.4mm以下であればエッチング後の表面むらが解消す
ることを見出した。然して再結晶粒幅を0.4mm以下にす
るには、熱間圧延における再結晶を少なくとも2回発生
させる処理が必要であることも発明者らが確認した。こ
のような再結晶を発生させる好ましい条件は、最終の再
結晶を発生させる熱間圧延条件として、板の温度が40
0℃以下で圧延を開始し、310℃以上の温度で終了す
ることである。
During a plurality of times of rolling as described above, the crystal grains are stretched in the rolling direction and hot rolling is completed before there is a time margin for recrystallization, but the surface of the rolled plate is assumed to be smooth. If both ends of the hot rolled plate are cut in order to
Recrystallization is completed during this both-end cutting operation. Although the present inventors have found that the surface unevenness of the hard foil after etching is very related to this recrystallization, as described above, the width of the recrystallized grains is more important, and It has been found that when the width is 0.4 mm or less, surface unevenness after etching is eliminated. However, the inventors have also confirmed that in order to reduce the recrystallized grain width to 0.4 mm or less, it is necessary to perform a process of causing recrystallization at least twice in hot rolling. A preferable condition for generating such recrystallization is a hot rolling condition for generating final recrystallization, in which the plate temperature is 40 ° C.
Rolling starts at 0 ° C or lower and ends at a temperature of 310 ° C or higher.

【0011】上述したような再結晶がエッチング後の表
面むらを解消するのは次のように考えられる。即ち複数
回の圧延の間に鋳塊の結晶粒は圧延方向に延ばされる
が、再結晶させることによりこの圧延方向に延ばされた
結晶粒の粒界および粒内から新しい再結晶粒が発生す
る。このときの再結晶においては圧延による加工歪が再
結晶の核となるため圧延前鋳塊における結晶粒よりサイ
ズが小さく、かつ鋳塊結晶粒の再結晶はもとの粒界を消
滅させていくことになる。このようにして表面むらの原
因である鋳塊組織の残影は解消されていくが、鋳塊の結
晶粒界に沿った結晶粒が直線状に残るため1回の再結晶
では表面むら解消の効果は充分に得られない。
The reason why the above-mentioned recrystallization eliminates the surface unevenness after etching is considered as follows. That is, the crystal grains of the ingot are stretched in the rolling direction during a plurality of rollings, but by recrystallization, new recrystallized grains are generated from the grain boundaries of the crystal grains stretched in the rolling direction and inside the grains. . In the recrystallization at this time, since the processing strain due to rolling becomes the nucleus of the recrystallization, the size is smaller than the crystal grains in the ingot before rolling, and the recrystallization of the ingot crystal grains causes the original grain boundaries to disappear. It will be. In this way, the shadow of the ingot structure, which is the cause of surface unevenness, is eliminated, but since the crystal grains along the crystal grain boundaries of the ingot remain linearly, it is possible to eliminate the surface irregularity in one recrystallization. The effect is not sufficient.

【0012】したがって上述したような現象を確実なも
のとするためには少くとも2回以上、好ましくは3回以
上、さらに好ましくは4回以上再結晶させることが肝要
である。この場合の熱間圧延条件は上述したように、最
終の再結晶を発生させる熱間圧延の圧延条件として板の
入側における温度を400℃以下で圧延を開始し、出側
の温度を310℃以上の温度で終了するもので、このよ
うにすると好ましく表面むらを解消できる。
Therefore, in order to secure the phenomenon as described above, it is important to recrystallize at least twice, preferably three times or more, more preferably four times or more. The hot rolling conditions in this case are, as described above, as the rolling conditions of the hot rolling that causes the final recrystallization, the temperature at the inlet side of the plate is 400 ° C. or less, and the temperature at the outlet side is 310 ° C. Since the process ends at the above temperature, the unevenness of the surface can be preferably eliminated by doing so.

【0013】上記のような熱間圧延温度が前記範囲であ
る理由は、再結晶温度が400℃を超えると、不純物が
少いため結晶粒は粗大化し、その幅が0.4mmを超えてし
まい、また出側温度が310℃未満であると熱間圧延中
に再結晶の駆動力である歪がある程度解放され、このよ
うに駆動力の解放された状態の板では再結晶が発生しな
いことによるものである。然して2回以上の再結晶では
鋳塊の結晶粒界に沿って発生した結晶粒の粒内および粒
界から結晶粒が発生し、更に粒内、粒界上の再結晶を繰
返すことによって鋳塊における結晶組織残影は適切に消
滅する。このような結果として結晶粒幅は細かくなり、
この細かさが目視的な表面むらを解消させるものと推定
される。
The reason why the hot rolling temperature is within the above range is that when the recrystallization temperature exceeds 400 ° C., the amount of impurities is small and the crystal grains become coarse, and the width thereof exceeds 0.4 mm. Further, if the exit temperature is less than 310 ° C., the strain that is the driving force for recrystallization is released to some extent during hot rolling, and recrystallization does not occur in the plate with the driving force thus released. Is. However, when recrystallization is performed twice or more, crystal grains are generated inside and from the grain boundaries of the crystal grains generated along the crystal grain boundaries of the ingot, and further recrystallization on the grain boundaries and on the grain boundaries is repeated to form the ingot. The remnant of the crystal texture in the image disappears properly. As a result, the grain width becomes finer,
It is presumed that this fineness eliminates the visual unevenness of the surface.

【0014】前記した熱間圧延の終了した熱間圧延板は
次に冷間圧延され硬質箔とされるが、上述のように再結
晶を複数回発生させた硬質アルミニウム箔の圧延集合組
織は、(200)(220)ばかりでなく(111)
(311)(422)等多種の結晶方位面を有するもの
であって、それらの中で(200)はアルミニウム箔に
酸溶解性を付与し、(220)は耐酸溶解性を付与する
ものであることは知られている。然しこの特定結晶方位
だけでは再結晶を複数回発生させたアルミニウム硬質箔
の酸溶解性を規定することはできない。何故ならば、
(200)(220)以外の上述の結晶方位面の中(3
11)は酸溶解性を著しく付与するところから、(31
1)の存在量によっては箔中の(200)(220)の
量的割合を規定しただけでは酸溶解性を規定することは
できないからである。
The hot-rolled sheet that has been hot-rolled as described above is then cold-rolled to form a hard foil. As described above, the rolling texture of the hard aluminum foil in which recrystallization is generated a plurality of times is: Not only (200) and (220) but (111)
(311) and (422) having various crystallographic orientation planes, among which (200) imparts acid solubility to the aluminum foil and (220) imparts acid solubility resistance. It is known. However, this specific crystal orientation alone cannot define the acid solubility of the aluminum hard foil that has undergone recrystallization a plurality of times. because,
Among the above crystal orientation planes other than (200) and (220) (3
Since (11) gives remarkably acid solubility, (31)
This is because depending on the amount of 1) present, the acid solubility cannot be defined only by defining the quantitative ratio of (200) and (220) in the foil.

【0015】従って酸溶解性を規定するには(311)
を考慮する必要があり、本発明者等の種々研究結果から
して結晶方位の(311)面に対する(220)面の反
射X線強度比(220)/(311)が1.0以上である
こと、または結晶方位の(200)面および(311)
面に対する(220)面の反射X線強度比(220)/
{(200)+(311)}が1.0以上であること、ま
たは結晶方位の(200)面、(220)面および(3
11)面に対する(220)面の反射X線強度比(22
0)/{(200)+(220)+(311)}が0.4
以上であることにより酸溶解性に優れたアルミニウム硬
質箔の得られることを見出した。
Therefore, to define the acid solubility (311)
From the results of various studies by the present inventors, the reflected X-ray intensity ratio (220) / (311) of the (220) plane to the (311) plane of the crystal orientation is 1.0 or more. Or (200) plane and (311) of crystal orientation
Ratio of reflected X-ray intensity of (220) plane to (220) /
{(200) + (311)} is 1.0 or more, or the (200) plane, (220) plane, and (3
The ratio of the reflected X-ray intensity of the (220) plane to the (11) plane (22
0) / {(200) + (220) + (311)} is 0.4
It was found that an aluminum hard foil excellent in acid solubility can be obtained by the above.

【0016】前記(311)方位の結晶を少なくするに
は、例えば上述の熱間圧延に於ける複数回の再結晶処理
における最終の再結晶処理を、板の入り側の温度400
℃以下で圧延を開始し、出側の温度を310℃以上の温
度とすることである。その他の方法としては、熱間圧延
の速度、熱間圧延の板温度の組み合わせによって達成さ
せることができる。したがって、エッチングに際して表
面むらがなく、耐酸性の優れた電解コンデンサ用硬質ア
ルミニウム箔を製造するには、エッチングの際に生じる
上述の表面むらの解消条件と(311)方位を少なくす
る熱間圧延条件を組み合わせると、熱間圧延中に2回以
上の再結晶を発生させ、最終の再結晶を発生させる熱間
圧延の圧延条件として、板の入り側温度を400℃以下
で圧延を開始し、出側の温度を310℃以上とすること
となる。請求項1の(220)/(311)及び請求項
2の(220)/{(200)+(311)}の上限値
は表面むらのない箔を得るという実際の操業上において
3.5〜4.0程度となるが、理想的な条件を把握すれば本
発明において得られる理論的上限値は無限大となる。ま
た、同様に請求項3の(220)/{(200)+(2
20)+(311)}の実際の操業上の上限値は0.9程
度であるが、本発明における理論的上限値は1である。
In order to reduce the number of crystals in the (311) orientation, for example, the final recrystallization treatment in a plurality of recrystallization treatments in the hot rolling described above is performed at a temperature 400 at the entrance side of the plate.
Rolling is started at a temperature of ℃ or below, and the temperature on the delivery side is set to a temperature of 310 ℃ or higher. As another method, it can be achieved by a combination of the speed of hot rolling and the plate temperature of hot rolling. Therefore, in order to produce a hard aluminum foil for an electrolytic capacitor that has no surface unevenness during etching and is excellent in acid resistance, conditions for eliminating the above-described surface unevenness that occurs during etching and hot rolling conditions for reducing the (311) orientation are required. , The recrystallization is performed twice or more during the hot rolling, and the final recrystallization is generated as the rolling conditions of the hot rolling. The temperature on the side will be 310 ° C. or higher. The upper limit value of (220) / (311) of claim 1 and (220) / {(200) + (311)} of claim 2 is in practical operation of obtaining a foil without surface unevenness.
Although it is about 3.5 to 4.0, the theoretical upper limit value obtained in the present invention becomes infinite if the ideal conditions are grasped. Similarly, (220) / {(200) + (2
20) + (311)} has an actual upper limit value of about 0.9, but the theoretical upper limit value of the present invention is 1.

【0017】本発明における上述の結晶方位は、反射X
線強度で測定したものであって、以下の方法によるもの
である。箔のCuKα(アルファ)線による反射X線強
度測定において、Al(200)、(220)、(31
1)の位置に検出器を固定し、試料を80rpm で面内回
転させながら、10°/分のスキャンスピードでそれぞ
れの方位の±10°の範囲で試料を回転させて、その間
0.02°間隔で計測した全計測値をそれぞれの方位の集
積度として得た。なお、測定中の電圧は30kV、電流は
20mA、スリット幅は発散スリット1°、受光スリット
0.3mmである。また、測定の繰り返し数を5回とし、平
均値を求めた。
In the present invention, the above-mentioned crystal orientation is the reflection X
It was measured by the line intensity and was measured by the following method. In the reflection X-ray intensity measurement of CuKα (alpha) rays of the foil, Al (200), (220), (31
While fixing the detector at the position of 1) and rotating the sample in-plane at 80 rpm, rotate the sample in the range of ± 10 ° of each azimuth at a scan speed of 10 ° / min, and in the meantime.
All measurement values measured at 0.02 ° intervals were obtained as the integration degree of each azimuth. The voltage during measurement is 30 kV, the current is 20 mA, the slit width is 1 ° for the divergence slit, and the slit for receiving light.
It is 0.3 mm. Further, the number of repetitions of measurement was set to 5 and the average value was obtained.

【0018】また化学溶解性の評価は次の方法によっ
た。表面酸化皮膜の影響を避けるため、箔を常温の希フ
ッ酸水溶液に20秒浸せきし、その後以下の条件で化学
溶解性(対酸性)を評価した。 液組成 :2360cc塩酸、2640cc純水 液温 :80℃ 浸せき時間:180秒
The chemical solubility was evaluated by the following method. In order to avoid the influence of the surface oxide film, the foil was dipped in a dilute aqueous solution of hydrofluoric acid at room temperature for 20 seconds, and then the chemical solubility (against acidity) was evaluated under the following conditions. Liquid composition: 2360cc hydrochloric acid, 2640cc pure water Liquid temperature: 80 ° C Immersion time: 180 seconds

【0019】更に表面むらの判定および結晶粒幅の
測定はそれぞれ次の方法によった。 表面むら判定 箔を常温の希フッ酸水溶液に20秒浸漬後、50℃の8
%HCl、1%H2SO4 の混酸溶液中において、300mA/
cm2 の電流密度で周波数20Hzの交流電解を60秒行
い、表面むらを目視で判定した。 結晶粒幅の測定 箔を電解研磨し、ホウフッ酸溶液中で陽極酸化後、光学
顕微鏡に偏光レンズを用いて結晶粒を観察した。その
後、写真から試料における結晶粒の最大幅を求めた。
Further, the determination of surface unevenness and the measurement of crystal grain width were carried out by the following methods. Surface unevenness determination After immersing the foil in a dilute hydrofluoric acid solution at room temperature for 20 seconds, the foil is kept at 50 ° C for 8 hours.
In a mixed acid solution of 1% HCl and 1% H 2 SO 4 , 300 mA /
AC electrolysis at a frequency of 20 Hz was performed for 60 seconds at a current density of cm 2 , and the surface unevenness was visually determined. Measurement of Crystal Grain Width The foil was electropolished and anodized in a borofluoric acid solution, and then the crystal grain was observed using a polarizing lens in an optical microscope. Thereafter, the maximum width of the crystal grains in the sample was determined from the photograph.

【0020】[0020]

【実施例】本発明によるものの具体的実施例について説
明すると、本発明者等は次の表1に示すような組成のア
ルミニウム溶湯を準備し、DC鋳造して厚さ500mmの
鋳塊とした。
EXAMPLE A concrete example of the present invention will be described. The present inventors prepared an aluminum melt having the composition shown in Table 1 below, and DC-casted the same into an ingot having a thickness of 500 mm.

【0021】[0021]

【表1】 [Table 1]

【0022】上記のようにして得られた鋳塊は、次いで
これを600℃の温度で4時間の均質化処理をなし、こ
れを次の表2に示すような種々の条件で熱間圧延をな
し、然る後焼鈍処理することなく厚さ90μm のアルミ
ニウム硬質箔とした。得られた硬質箔について化学溶解
性と反射X線強度を前述したような測定方法によって測
定した結果は次の表2に示す如くであった。
The ingot obtained as described above was then homogenized at a temperature of 600 ° C. for 4 hours and hot-rolled under various conditions as shown in Table 2 below. None, and thereafter, an aluminum hard foil having a thickness of 90 μm was formed without annealing. The chemical solubility and the reflected X-ray intensity of the obtained hard foil were measured by the above-mentioned measuring methods, and the results are shown in Table 2 below.

【0023】[0023]

【表2】 [Table 2]

【0024】即ちこの表2において試験番号1のものは
熱間圧延中の再結晶回数が1回であって比較例であり、
試験番号2と3のものはこの熱間圧延中における再結晶
回数が2回。試験番号4と5のものは3回であって本発
明方法の条件を満足した発明例であり、試験番号6と7
のものは熱間圧延中再結晶回数が何れも2回であるけれ
ども最終の再結晶を発生させる熱間圧延条件としての板
の温度が本発明の温度条件を満足しない比較例であって
表面むら、化学溶解量などが何れも本発明のものより劣
っており、反射X線強度比などにおいても試験番号1の
ものより低い。
That is, in Table 2, Test No. 1 is a comparative example in which the number of recrystallizations during hot rolling was one, and
For the test Nos. 2 and 3, the number of recrystallizations during this hot rolling was twice. Test Nos. 4 and 5 are invention examples satisfying the conditions of the method of the present invention three times, and Test Nos. 6 and 7
Although the number of recrystallizations during hot rolling was 2 in each case, it was a comparative example in which the temperature of the plate as the hot rolling condition for generating the final recrystallization did not satisfy the temperature condition of the present invention, and surface unevenness was observed. , The amount of chemical dissolution was inferior to that of the present invention, and the reflected X-ray intensity ratio and the like were lower than those of Test No. 1.

【0025】[0025]

【発明の効果】以上説明したような本発明によるときは
電解エッチングに際して表面むらが少く、また電解液へ
の溶解性が低くて電解エッチング性の良好な電解コンデ
ンサ用アルミニウム硬質箔を提供し、またその好ましい
製造方法を確立して近時におけるコンデンサの小型化指
向に即応した製品を適切に提供し得るものであるから工
業的にその効果の大きい発明である。
As described above, according to the present invention, there is provided an aluminum hard foil for electrolytic capacitors, which has less surface unevenness during electrolytic etching, has low solubility in an electrolytic solution, and has good electrolytic etching properties. It is an invention that has a great effect industrially because it is possible to appropriately provide a product that immediately responds to the recent trend toward miniaturization of capacitors by establishing the preferable manufacturing method.

───────────────────────────────────────────────────── フロントページの続き (72)発明者 片野 雅彦 静岡県庵原郡蒲原町蒲原1丁目34番1号 日本軽金属株式会社グループ技術センター 内 (72)発明者 小菅 張弓 愛知県稲沢市小池1丁目11番1号 日本軽 金属株式会社名古屋工場内 ─────────────────────────────────────────────────── ─── Continuation of front page (72) Inventor Masahiko Katano 1-34-1 Kambara, Kambara-cho, Anbara-gun, Shizuoka Prefecture Nippon Light Metal Co., Ltd. Group Technology Center (72) Inventor Zhangyumi Kosuge 1-11 Koike, Inazawa-shi, Aichi No. 1 Nippon Light Metal Co., Ltd. Nagoya factory

Claims (4)

【特許請求の範囲】[Claims] 【請求項1】 アルミニウム純度が99.97%以上で、
表面の結晶粒幅が0.4mm以下であり、かつ結晶方位の
(311)面に対する(220)面の反射X線強度比
(220)/(311)が1.0以上であることを特徴と
した電解コンデンサ用アルミニウム硬質箔。
1. The aluminum purity is 99.97% or more,
The crystal grain width of the surface is 0.4 mm or less, and the reflected X-ray intensity ratio (220) / (311) of the (220) plane to the (311) plane of the crystal orientation is 1.0 or more. Aluminum hard foil for electrolytic capacitors.
【請求項2】 アルミニウム純度が99.97%以上で、
表面の結晶粒幅が0.4mm以下であり、かつ結晶方位の
(200)面および(311)面に対する(220)面
の反射X線強度比(220)/{(200)+(31
1)}が1.0以上であることを特徴とした電解コンデン
サ用アルミニウム硬質箔。
2. The aluminum purity is 99.97% or more,
The crystal grain width of the surface is 0.4 mm or less, and the reflected X-ray intensity ratio of the (220) plane to the (200) plane and the (311) plane of the crystal orientation is (220) / {(200) + (31
1)} is 1.0 or more, an aluminum hard foil for electrolytic capacitors.
【請求項3】 アルミニウム純度が99.97%以上で、
表面の結晶粒幅が0.4mm以下であり、かつ結晶方位の
(200)面、(220)面および(311)面に対す
る(220)面の反射X線強度比(220)/{(20
0)+(220)+(311)}が0.4以上であること
を特徴とした電解コンデンサ用アルミニウム硬質箔。
3. The aluminum purity is 99.97% or more,
The crystal grain width of the surface is 0.4 mm or less, and the ratio of the reflected X-ray intensity of the (220) plane to the (200) plane, the (220) plane and the (311) plane of the crystal orientation (220) / {(20
0) + (220) + (311)} is 0.4 or more, an aluminum hard foil for electrolytic capacitors.
【請求項4】 アルミニウム純度が99.97%以上の鋳
塊を均質化処理後熱間圧延し熱間圧延板を得るに際し、
熱間圧延中に2回以上の再結晶を発生させ、最終の再結
晶を発生させる熱間圧延の圧延条件を、板の入り側の温
度を400℃以下で圧延を開始し出側の温度を310℃
以上の温度とし、しかる後焼鈍処理することなく冷間圧
延することを特徴とした電解コンデンサ用アルミニウム
硬質箔の製造方法。
4. In obtaining a hot-rolled sheet by hot-rolling an ingot having an aluminum purity of 99.97% or more after homogenization treatment,
The rolling conditions of hot rolling in which recrystallization is generated twice or more during hot rolling to generate the final recrystallization are as follows. 310 ° C
A method for producing an aluminum hard foil for an electrolytic capacitor, which comprises the above temperature and then cold rolling without annealing treatment.
JP14848096A 1996-05-21 1996-05-21 Aluminum hard foil for electrolytic capacitor and method for producing the same Expired - Lifetime JP3348340B2 (en)

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JP3348340B2 JP3348340B2 (en) 2002-11-20

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Country Link
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Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH1150213A (en) * 1997-07-25 1999-02-23 Furukawa Electric Co Ltd:The Aluminum foil for electrode of electrolytic capacitor
JP2007146269A (en) * 2004-12-21 2007-06-14 Showa Denko Kk Aluminum material for electrolytic capacitor electrode, method for producing electrode material for electrolytic capacitor, and anode material for aluminum electrolytic capacitor and aluminum electrolytic capacitor
JP2011040371A (en) * 2009-08-14 2011-02-24 Sb Limotive Co Ltd Electrode plate for secondary battery, and secondary battery including the same
JP2012144809A (en) * 2005-05-31 2012-08-02 Showa Denko Kk Aluminum material for electrolytic capacitor electrode, method for manufacturing electrode material for electrolytic capacitor, anode material for aluminum electrolytic capacitor, and aluminum electrolytic capacitor

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH1150213A (en) * 1997-07-25 1999-02-23 Furukawa Electric Co Ltd:The Aluminum foil for electrode of electrolytic capacitor
JP2007146269A (en) * 2004-12-21 2007-06-14 Showa Denko Kk Aluminum material for electrolytic capacitor electrode, method for producing electrode material for electrolytic capacitor, and anode material for aluminum electrolytic capacitor and aluminum electrolytic capacitor
JP2012144809A (en) * 2005-05-31 2012-08-02 Showa Denko Kk Aluminum material for electrolytic capacitor electrode, method for manufacturing electrode material for electrolytic capacitor, anode material for aluminum electrolytic capacitor, and aluminum electrolytic capacitor
JP2011040371A (en) * 2009-08-14 2011-02-24 Sb Limotive Co Ltd Electrode plate for secondary battery, and secondary battery including the same

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