JPH09306802A5 - - Google Patents
Info
- Publication number
- JPH09306802A5 JPH09306802A5 JP1996116249A JP11624996A JPH09306802A5 JP H09306802 A5 JPH09306802 A5 JP H09306802A5 JP 1996116249 A JP1996116249 A JP 1996116249A JP 11624996 A JP11624996 A JP 11624996A JP H09306802 A5 JPH09306802 A5 JP H09306802A5
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- detection area
- reference member
- alignment
- alignment system
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8116249A JPH09306802A (ja) | 1996-05-10 | 1996-05-10 | 投影露光装置 |
| KR1019970015201A KR970077111A (ko) | 1996-05-10 | 1997-04-23 | 투영 노광 장치 |
| US08/853,389 US5920378A (en) | 1995-03-14 | 1997-05-09 | Projection exposure apparatus |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8116249A JPH09306802A (ja) | 1996-05-10 | 1996-05-10 | 投影露光装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH09306802A JPH09306802A (ja) | 1997-11-28 |
| JPH09306802A5 true JPH09306802A5 (OSRAM) | 2004-11-18 |
Family
ID=14682467
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP8116249A Pending JPH09306802A (ja) | 1995-03-14 | 1996-05-10 | 投影露光装置 |
Country Status (2)
| Country | Link |
|---|---|
| JP (1) | JPH09306802A (OSRAM) |
| KR (1) | KR970077111A (OSRAM) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1788617B1 (en) * | 2004-06-09 | 2013-04-10 | Nikon Corporation | Substrate holding device, exposure apparatus having the same and method for producing a device |
| WO2006041100A1 (ja) * | 2004-10-15 | 2006-04-20 | Nikon Corporation | 露光装置及びデバイス製造方法 |
| KR101318037B1 (ko) * | 2004-11-01 | 2013-10-14 | 가부시키가이샤 니콘 | 노광 장치 및 디바이스 제조 방법 |
| EP2823361B1 (en) * | 2012-03-08 | 2022-03-02 | ASML Netherlands B.V. | Lithography system and method for processing a target, such as a wafer |
| JP6462993B2 (ja) * | 2014-04-02 | 2019-01-30 | キヤノン株式会社 | 露光装置および物品製造方法 |
-
1996
- 1996-05-10 JP JP8116249A patent/JPH09306802A/ja active Pending
-
1997
- 1997-04-23 KR KR1019970015201A patent/KR970077111A/ko not_active Withdrawn
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