JPH09292607A - Liquid crystal display device and its production - Google Patents

Abstract

PROBLEM TO BE SOLVED: To improve display quality by preventing light drop-out, etc., by domain at an ITO(indium-tin.oxide) end face. SOLUTION: This device is provided with a wiring region 20, thin film transistors(TFT) 6 switching-driving respective pixel parts formed at an intersection part of the wiring region 20 and ITO films (pixel electrode) 5 connected to the drains (D) of the TFTs 6 via a contact part 21 and, further, a guard ring electrode 22 is formed in the wiring region 20 containing the TFTs 6. Driving voltage which forms a liquid crystal black mask C by making a liquid crystal always in a light shielding state by a prescribed method is applied to the guard ring electrode 22. Thus formation of the black mask which was formerly necessary is unnecessary.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a liquid crystal display device used in, for example, a camera-integrated VTR or a liquid crystal projector, and a method for manufacturing the same, and more specifically, a liquid crystal display device having an improved method for forming a black mask region and the same. The present invention relates to a manufacturing method.

[0002]

2. Description of the Related Art Liquid crystal display devices are characterized by a flat structure and low power consumption, and have been put to practical use and spread to electronic equipment with a liquid crystal display device represented by a camera-integrated VTR and a liquid crystal projector. In terms of the light resistance required for liquid crystal display devices, a camera-integrated VTR EVF (Electronic Vi
(e w Finder) does not cause a problem because the amount of incident light is small, but when used in a liquid crystal projector, the amount of incident light is very large, so contrast due to light leakage from the top of the thin film transistor and leakage current due to reflected light from the back surface of the driving substrate. Failure and malfunction of driver circuit (V
There is a problem that (th variation) is likely to occur. Therefore,
A method is adopted in which a black mask is arranged on the portions of the drive substrate and the counter substrate where light easily escapes.

FIG. 5 is a view showing a basic cross-sectional structure of a conventional liquid crystal display device. A first example of the liquid crystal display device in FIG. 5A is composed of a drive substrate 1 and a counter substrate 2. A black mask 3 is provided in the pixel partition portion of the counter substrate 2 for the purpose of shielding light. The black mask 3 is formed by a method of pattern etching a Cr film or the like formed by a sputtering method, a method of exposing and patterning a thin film formed by applying a black dye, and the like. R, G, and B color filters (in the case of a color liquid crystal panel) 4 are formed in the pixel portion divided by the black mask 3 by a dyeing method, a pigment dispersion method, or the like.
An ITO film (Indium-Tin Oxid) is used as a counter electrode of the counter substrate 2.
e) 5 is formed and configured.

A thin film transistor (hereinafter, simply referred to as "T") for driving each pixel electrode is formed on the driving substrate 1.
6) and a storage capacitor 7 are formed, and 1PSG
A (phosphosilicate glass) film 8 and a 2PSG film 9 are formed. On top of that, the Al wiring 10 and the protective film P-
The ITO film 5 is formed together with the SiN 11 and the flattening film 12. The TFT 6 and the ITO film 5 are connected by the contact hole 13.

In the second example of the liquid crystal display device shown in FIG. 5B, an on-chip black mask OCB (O
n Chip Black) is formed. That is, an on-chip black mask 3'for light shielding is formed on the P-SiN 11 and the contact hole 13 formed in the same manner as described above, for example, with Al, Ti, Mo. The drive substrate 1 and the counter substrate 2 are arranged opposite to each other with a predetermined gap (several μm) held therebetween, and the liquid crystal 14 is sandwiched and fixed in these gaps. Polarizing plates (not shown) are laminated on both surfaces of these substrates by rotating the plane of polarization by approximately 90 degrees. A liquid crystal display device having such a structure is called a normally white active matrix type. The liquid crystal display device to which the present invention is applied is not limited to this active matrix type, but is merely an example.

The operation of the liquid crystal display device having such a configuration will be briefly described.

The interface between the drive substrate 1 and the counter substrate 2 is subjected to a rubbing treatment (not shown) so that the liquid crystal molecules are aligned in parallel along the interface, and the injected liquid crystal molecules are rubbed. The treatment twists and makes an orientation of 90 degrees. The liquid crystal molecules have optical rotatory power, and in a normal state in which no voltage is applied, light emitted by a backlight (not shown) propagates along the liquid crystal molecule axis, and a color filter (color liquid crystal panel) formed on the counter substrate. In the case of), color development is performed according to. On the other hand, when a voltage equal to or higher than the threshold value is applied to the liquid crystal display device, the liquid crystal molecules are twisted in the voltage application direction and inverted, the optical activity is lost and the light is cut off to display black. Then, the gradation control in the image display is performed by the shutter operation that controls the transmitted light according to the applied voltage level.

By the way, in the conventional liquid crystal display device, a black mask 3 is provided on a portion corresponding to the TFT of the counter substrate 2 or a portion where light is easily leaked, and an on-chip black mask 3'is provided on the upper portion of the TFT of the drive substrate 1 for the purpose of shielding light. Are formed, the black mask 3 and the on-chip black mask 3 '
However, the number of steps for forming the film is increased, which results in an increase in production cost. In particular, in a liquid crystal display device used in a liquid crystal projector having a large amount of incident light, a signal line such as Al formed on a drive substrate (see FIG. 5 ( c))), Ti, W, and M
o Metal (Ti is mainly used in consideration of contact resistance and etching property) is laminated. As is well known, since this Ti metal film is active, an oxide film is formed by O ₂ ashing at the time of opening a contact hole to increase the contact resistance. Therefore, light etching is performed by the Ti layer before forming the ITO film. However, there is a problem that a contact failure (which becomes an open bright point defect) is likely to occur due to the step breakage of the Ti layer.

In the alignment state of the liquid crystal molecules when the drive voltage is applied in FIG. 6, first, when the on-chip black mask 3'is formed on the drive substrate 1 in FIG. When the horizontal electric field is generated, the tilt direction of the liquid crystal molecules is tilted along the electric field to form a domain. The obliquely incident light B easily enters the domain formed in this way, causing light leakage. Also,
Even when the black mask 3 is formed on the counter substrate 2 of FIG. 6B, a domain is formed by the generation of a lateral electric field at the end face of the ITO film 5 as a result, and the oblique incident light B enters. Therefore, there is a problem that some light leakage occurs.

[0010]

SUMMARY OF THE INVENTION The present invention has been made in view of the above problems, and the problem is that the production cost is increased because a black mask must be formed on a counter substrate or a drive substrate for the purpose of shielding light. A liquid crystal display device and a method of manufacturing the same that prevent the rise of the aperture ratio, the reduction of the aperture ratio due to the rubbing of the bonding due to the formation of a black mask on the counter substrate, and the light leakage due to the domain at the ITO end face are improved. Is to provide.

[0011]

In order to solve the above-mentioned problems of the present invention, the following means have been taken. That is, as a basic configuration of the present invention, in a liquid crystal display device including a drive substrate on which a plurality of pixel electrodes are formed, a counter substrate, and liquid crystal sandwiched between these gaps, the drive substrate and the counter substrate are provided. At least one of them is formed by forming a light-shielding electrode means (guard ring electrode) surrounding the pixel electrode with a predetermined gap that keeps the liquid crystal in a light-shielding state at all times.

The manufacture of the liquid crystal display device of the present invention described above
The following steps are performed. That is, in a method of manufacturing a liquid crystal display device including a drive substrate on which a plurality of pixel electrodes are formed, a counter substrate, and liquid crystal sandwiched between these gaps, at least one of the drive substrate and the counter substrate is It includes a step of forming a light-shielding electrode means surrounding the pixel electrode with a predetermined gap that keeps the liquid crystal always in a light-shielding state, and a step of forming an opaque means for filling a gap between the light-shielding electrode means and an adjacent pixel electrode.

A liquid crystal display device according to a second aspect of the present invention includes a pixel electrode arranged in a matrix and a driving substrate provided with a thin film transistor connected to the pixel electrode and driving the pixel electrode.
In a liquid crystal display device having a counter substrate which is arranged to face the drive substrate with a predetermined gap, and a liquid crystal sandwiched in these gaps, an interface portion of the drive substrate includes a thin film transistor formation region and is adjacent to each other. In the wiring area between the pixel electrode and the pixel electrode, the light shielding electrode means for keeping the liquid crystal in the light shielding state is provided.

The liquid crystal display device of the second invention is manufactured by the following steps. Pixel electrodes arranged in a matrix, a driving substrate including thin film transistors connected to the pixel electrodes and driving the pixel electrodes, an opposite substrate arranged to face the driving substrate with a predetermined gap, and In a method for manufacturing a liquid crystal display device having a liquid crystal sandwiched in a gap, a step of forming a black mask such as metal on a thin film transistor, and a wiring region between pixel electrodes adjacent to each other including a thin film transistor formation region, Forming a light-shielding electrode means for keeping the liquid crystal in a light-shielding state at all times.

According to the liquid crystal display device and the method of manufacturing the same of the present invention, the peripheral region other than the pixel electrode of at least one of the driving substrate and the counter substrate, or the wiring region between adjacent pixel electrodes including the thin film transistor forming region. In addition, since the guard ring electrode for forming the liquid crystal black mask is formed with the liquid crystal always kept in the light-shielding state, incident light including oblique light and reflected light from the counter substrate are blocked. This eliminates the need for a black mask, which was previously required,
The manufacturing process can be simplified. Further, since the liquid crystal black mask is formed by the guard ring electrodes, a horizontal electric field with respect to the potential of the adjacent pixel is not generated, light leakage due to domains is suppressed, and the contrast ratio can be improved.

[0016]

BEST MODE FOR CARRYING OUT THE INVENTION Specific embodiments of the present invention will be described below with reference to the accompanying drawings.

First Embodiment First, a first embodiment of the liquid crystal display device of the present invention will be described with reference to FIGS. 1 and 2. 1A and 1B are views showing one pixel region in a liquid crystal display device according to a first embodiment of the present invention. FIG. 1A is a plan view of a normally white active matrix liquid crystal display device, and FIG. FIG. 3C is a sectional view showing an off state of a thin film transistor of the device, and FIG. 7C is a sectional view showing an on state of the thin film transistor of the liquid crystal display device. FIG. 2 is a sectional view for explaining the effect of the first embodiment of the liquid crystal display device of the present invention. It should be noted that parts common to those described in the related art will be given the same reference numerals hereafter.

This display device has a wiring area 20 for signal lines and scanning lines formed on the drive substrate 1 (a line width of 6 μm as an example).
m), the TFT 6 for switching and driving each pixel portion is arranged at the intersection of the wiring region 20, the source and gate electrodes of the TFT 6 are connected to a predetermined line by the wiring region 20, and the drain (D) of the TFT 6 is It is connected to the ITO film 5, which is a pixel electrode, via the contact portion 21. Further, in the wiring region 20 including the TFT 6, a guard ring electrode 22 as a light shielding electrode means is provided as a feature of the present invention.
Is formed on the same surface with the same material as the ITO film 5 with a line width of 2 μm, for example. A drive voltage for keeping the liquid crystal in a light-shielding state is applied to the guard ring electrode 22 by a predetermined method.

That is, V is applied to the guard ring electrode 22.
A drive voltage such as a start pulse or a feed pulse is applied, or the guard ring electrode 22 is connected to a ground terminal, and a common voltage (voltage that inverts every 1H) applied to the ITO film 5 of the counter substrate 2 or the like. It is driven by the method. It is needless to say that the method of driving the guard ring electrode 22 of the present invention is not limited to the above-described method, and another method having the same function may be used. The operating states of the TFT 6 when it is turned on and off will be sequentially described below.

When the thin film transistor of FIG. 1B is in the OFF state, the guard ring electrode 22 of the present invention is provided together with the ordinary ITO film 5 in the TFT 6 portion (left side of FIG. 1) of the drive substrate 1.
Are formed. ITO film 5 and guard ring electrode 22
An Al wiring 10 for completely blocking light is formed in the gap between and. Similarly, a guard ring electrode 22 is formed between adjacent pixel electrodes in the wiring portion between the pixel electrodes (on the right in the figure), and an Al wiring 10 is formed in the gap. When the incident light A is applied to the liquid crystal display device in which the guard ring electrode 22 is thus formed, the guard ring electrode 22 portion is always shielded by forming the liquid crystal black mask C and the pixel electrode portion is turned off. Therefore, the potential is the same as that of the ITO film 5 of the counter substrate 2 and light is transmitted therethrough.

In the ON state of the thin film transistor of FIG. 2C, the guard ring electrode 22 of the present invention is similarly formed on the TFT 6 portion (left side of FIG. 3) of the drive substrate 1 to form ITO.
An Al wiring 10 for completely blocking light is formed in a gap between the film 5 and the guard ring electrode 22. In the wiring portion between the pixel electrodes (on the right in the figure), the guard ring electrode 22 is formed between the adjacent pixel electrodes, and the Al wiring 1 is provided in the gap.
0 is formed. Then, the guard ring electrode 22 that always forms the liquid crystal black mask C and shields light in this way
When the incident light A is applied to the formed liquid crystal display device, the pixel electrode portion is shielded from light because it has an on-voltage (the voltage of the pixel electrode decreases and a voltage is applied between the opposing substrates).

In the conventional liquid crystal display device shown in FIG. 6, when the TFT 6 in one pixel portion is turned on, the liquid crystal 1
No. 4 was shielded from light, but when the TFT 6 in the adjacent pixel portion was in the off state (same voltage as the counter substrate), a domain was generated by the electric field in the lateral direction, resulting in light leakage, resulting in a decrease in contrast. On the other hand, in the guard ring electrode 22 of the present invention shown in FIG. 2, since the liquid crystal wall, that is, the liquid crystal black mask C is formed around each pixel portion, the horizontal electric field is not generated. As a result, no domain is generated and no light leak occurs even with respect to the obliquely incident light B. However, it is necessary to form the metal light-shielding mask D by the Al wiring 10 or the like in the gap between the pixel electrode and the guard ring electrode. As described above, according to the liquid crystal display device of the present invention, it is possible to eliminate the usual black mask made of a metal film, reduce costs, and realize a liquid crystal display device having an excellent contrast ratio.

Second Embodiment Next, a second embodiment of the liquid crystal display device of the present invention will be described with reference to FIG. FIG. 3 is a diagram showing one pixel region in the second embodiment of the liquid crystal display device of the present invention, (a) is a plan view of a polycrystalline silicon (Poly-Si) type liquid crystal display device,
(B) E- which uses Al wiring for light shielding of the liquid crystal display device
A cross-sectional view of the E'section, (c) shows Al for light shielding of the liquid crystal display device.
FIG. 9 is a cross-sectional view of a portion FF ′ in which wiring is also used.

This display device is roughly constituted by the TFT 6 formed at the intersection of the wiring regions 20 arranged on the drive substrate 1, and the ITO film 5 serving as a pixel electrode connected to the drain of the TFT 6 or the like. Details of the guard ring electrode of this example will be described below.

The liquid crystal display device shown in FIGS. 3B and 3C has 1Poly 24 and 1Po formed on the driving substrate 1.
2Poly25, 2Po formed through a gate oxide film or the like after patterning of the Al wiring 10, 1Poly which is connected to ly24 and serves as a drain electrode and a light shielding film
The first PSG film 8 and the second PSG film 9 (which may be BSG), the flattening film 12, the ITO film 5 and the IT of the adjacent pixel, which are formed after the patterning of ry25, are provided as the insulating means.
The guard ring electrode 22 is formed between the O films 5'with a predetermined line width.

An ITO film 5 is formed on the entire surface of the counter substrate 2, and an alignment film (not shown) such as a polyimide film or polyvinyl alcohol is applied and formed on the ITO films of the drive substrate 1 and the counter substrate 2 for rubbing treatment. Has been done.

Then, the guard ring electrode 22 and Al
When the incident light A is applied to the liquid crystal display device in which the light shielding portion including the wiring 10 is formed, only the pixel electrode portion is transmitted when the TFT is off and both the light shielding portion and the pixel electrode portion are transmitted when the TFT is on, as described above. It is shielded from light. At this time, according to the liquid crystal display device of the present example, since the Al wiring 10 also serves as a light shielding film for shielding the gap between the guard ring electrode 22 and the pixel electrode, it is not necessary to newly form a black mask. Manufacturing cost can be reduced.

Embodiment 3 This embodiment is an example in which the present invention is applied to a normally white simple matrix type liquid crystal display device, which will be described with reference to FIG. FIG. 4 is a diagram showing a two-pixel region in the third embodiment of the liquid crystal display device of the present invention,
(A) is a plan view of a drive substrate of a simple matrix type liquid crystal display device and a cross-sectional view of GG 'part, (b) is a plan view of a counter substrate of the liquid crystal display device and a cross-sectional view of H-H' part,
FIG. 6C is a sectional view for explaining the operation of the liquid crystal display device. The formation of the polyimide alignment film on the drive substrate 1 and the counter substrate 2 and the rubbing process are the same as those in the related art, and the description thereof is omitted here.

In this display device, for example, the ITO film 5 serving as a pixel electrode provided on the drive substrate 1 and the counter substrate 2, and the first guard ring electrode 30, which is a characteristic part of the present invention, is opaque on the drive substrate 1. It is formed via the means 31.
The opaque means 31 is a patternable thin film mixed with a black pigment or resin. Similarly, R, G, and B color filters (in the case of a color liquid crystal panel) 4 and a second guard ring electrode 32 are formed on the counter substrate 2 via a first insulating means 33 and a second insulating means 34. There is. The first insulating means 33 may be non-patternable as long as it is a transparent resin, and the second insulating means 34 needs to be a thin film that can be patterned by an opaque insulating means.

Further, as shown in the enlarged view X, the first guard ring electrode 30 and the second guard ring electrode 32 are formed so as to overlap the adjacent pixel electrodes via the insulating means to form the liquid crystal black mask region. Spreading and opaque means 31
By providing the role of the second insulating means 34, the black pigment or resin of the opaque means 31 can be eliminated. However, the insulating means at this time must be a thin film that can be patterned with transparent resin. Because,
This is because the insulating means of the pixel electrode portion must be removed.

A bias that constantly shields the liquid crystal is applied between the first guard ring electrode 30 and the second guard ring electrode 32 in FIG. 4C. When the intersection of the signal on the drive substrate 1 side and the signal on the counter substrate 2 side is not selected (when off), the incident light A is in the transmissive state, and when the intersection is selected (when on), the incident light is on. A is in a light-shielded state. Since the liquid crystal black mask C is always formed by the guard ring electrode portions in the potentials of the pixel portions in the on state and the off state, the electric field in the lateral direction does not work and the generation of domains is suppressed. Thereby, it is possible to prevent light leakage due to the incidence of the obliquely incident light B.

The present invention is not limited to the above embodiment,
Various embodiments can be adopted. In this embodiment, normally white active matrix type and simple matrix type liquid crystal display devices have been exemplified, but normally black liquid crystal display devices and other liquid crystal display devices such as ferroelectric liquid crystal display devices and plasma address type liquid crystal display devices. The present invention can be applied to the liquid crystal display device, and is not limited to the structure and driving method of the liquid crystal display device. Further, it goes without saying that the present invention can be developed into various forms within the scope of its technical idea.

[0033]

As described above, according to the liquid crystal display device and the method of manufacturing the same of the present invention, the peripheral region other than the pixel electrode of at least one of the drive substrate and the counter substrate or the adjacent region including the thin film transistor formation region is adjacent. Since the guard ring electrode for forming the liquid crystal black mask is formed in the wiring region between the pixel electrode and the liquid crystal, the incident light including oblique light and the reflected light from the counter substrate are blocked. This eliminates the need for forming a black mask, which is conventionally required, and simplifies the manufacturing process, thus improving the production efficiency of the liquid crystal display device.

Since the liquid crystal black mask is formed by the guard ring electrode of the present invention, a lateral electric field with the adjacent pixel electrode is not generated, light leakage due to domains is suppressed, and the contrast ratio is improved. Since it is not affected by the adjacent pixel portion, the occurrence of flicker in line-sequential and dot-sequential operations is suppressed, and a high-quality liquid crystal display device can be realized. Further, the aperture ratio is improved by forming each pixel electrode and the guard ring electrode in an overlapping structure.

[Brief description of drawings]

1A and 1B are diagrams showing one pixel region in a liquid crystal display device according to a first embodiment of the present invention, in which FIG. 1A is a plan view of a normally white active matrix liquid crystal display device, and FIG. FIG. 3C is a sectional view showing an off state of the thin film transistor of the display device, and FIG. 7C is a sectional view showing an on state of the thin film transistor of the liquid crystal display device.

FIG. 2 is a cross-sectional view illustrating an effect of the first embodiment of the liquid crystal display device of the present invention.

3A and 3B are diagrams showing one pixel region in Embodiment 2 of the liquid crystal display device of the present invention, FIG. 3A is a plan view of a polycrystalline silicon type liquid crystal display device, and FIG. FIG. 3C is a sectional view of an EE ′ portion in which Al wiring is also used, and FIG. 6C is a sectional view of an FF ′ portion in which Al wiring is also used for light shielding of the liquid crystal display device.

FIG. 4 is a diagram showing a two-pixel region in a liquid crystal display device according to a third embodiment of the present invention, in which (a) is a plan view of a drive substrate of a simple matrix liquid crystal display device and a cross section taken along line GG ′. FIG. 6B is a plan view of a counter substrate of the liquid crystal display device and a cross-sectional view taken along the line HH ', and FIG. 7C is a cross-sectional view for explaining the operation of the liquid crystal display device.

5A and 5B are views showing approximately one pixel of a conventional liquid crystal display device, FIG. 5A is a sectional view in which a black matrix is formed on a counter substrate side, and FIG. 5B is an on-chip black mask on a drive substrate side. The formed sectional view, (c) is an enlarged sectional view for explaining step breakage of the ITO film.

FIG. 6 is a diagram showing an alignment state of liquid crystal molecules when a voltage is applied to a conventional liquid crystal display device, FIG. 6A is a cross-sectional view in which an on-chip black mask is formed on a driving substrate side,
(B) is a sectional view in which a black mask is formed on the counter substrate side.

[Explanation of symbols]

1 ... Driving substrate, 2 ... Counter substrate, 3 ... Black mask, 4
... Color filter, 5 ... ITO film, 6 ... TFT, 8 ... 1
PSG film, 9 ... 2 PSG film, 10 ... Al wiring, 11 ... P
-SiN, 12 ... Flattening film, 13 ... Contact hole,
14 ... Liquid crystal, 20 ... Wiring region, 21 ... Contact part, 2
3 ... Insulating means, 24 ... 1Poly, 25 ... 2Poly,
30 ... First guard ring electrode, 31 ... Opaque means, 32
... second guard ring electrode, 33 ... first insulating means, 34 ...
Second insulation means

Claims (10)

[Claims] 1. A liquid crystal display device comprising a drive substrate on which a plurality of pixel electrodes are formed, a counter substrate, and liquid crystal sandwiched between these gaps, wherein at least one of the drive substrate and the counter substrate is provided. The liquid crystal display device is characterized in that light-shielding electrode means surrounding the pixel electrode is formed in a predetermined gap that keeps the liquid crystal in a light-shielding state at all times. 2. The liquid crystal display device according to claim 1, wherein at least one of the drive substrate and the counter substrate is formed with a light shielding electrode means and an opaque means for filling a gap between adjacent pixel electrodes. . 3. A light-shielding electrode means is provided on at least one of the drive substrate and the counter substrate via an insulating means.
The liquid crystal display device according to claim 1, wherein the pixel electrodes are formed so as to overlap each other between adjacent pixel electrodes. 4. A method of manufacturing a liquid crystal display device, comprising: a drive substrate having a plurality of pixel electrodes formed thereon; a counter substrate; and a liquid crystal sandwiched between these gaps. On at least one side, a step of forming a light-shielding electrode means surrounding the pixel electrode with a predetermined gap that always keeps the liquid crystal in a light-shielding state, and a step of forming an opaque means for filling a gap between the light-shielding electrode means and an adjacent pixel electrode. A method for manufacturing a liquid crystal display device, comprising: 5. Pixel electrodes arranged in a matrix,
A drive substrate provided with a thin film transistor connected to the pixel electrode and driving the pixel electrode, a counter substrate arranged to face the drive substrate with a predetermined gap, and a liquid crystal sandwiched in the gap. In the liquid crystal display device having the above, the drive substrate includes a thin film transistor forming region, and a light shielding electrode unit for keeping the liquid crystal always in a light shielding state is formed in a wiring region between the pixel electrodes adjacent to each other. Liquid crystal display device. 6. The liquid crystal display device according to claim 5, wherein the light-shielding electrode means is formed simultaneously with the pixel electrode by an ITO film. 7. The liquid crystal display device according to claim 5, wherein the light-shielding electrode means is formed so as to overlap between adjacent pixel electrodes via an insulating means. 8. The liquid crystal display device according to claim 5, wherein the drive substrate is provided with a light-shielding electrode means and an opaque means for filling a gap between adjacent pixel electrodes. 9. The liquid crystal display device according to claim 8, wherein the opaque means is also used by a metal wiring layer formed on the drive substrate. 10. A pixel electrode arranged in a matrix, a driving substrate provided with a thin film transistor connected to the pixel electrode and driving the pixel electrode, and arranged to face the driving substrate with a predetermined gap. In a method of manufacturing a liquid crystal display device having a counter substrate and a liquid crystal sandwiched in the gap, a step of forming an opaque means on the drive substrate, and a pixel electrode including the thin film transistor forming region and adjacent to each other. And a step of forming light-shielding electrode means for keeping the liquid crystal always in a light-shielding state in a wiring region between them.