JPH09267255A - Groove forming method of abrasive cloth for magnetic disk board - Google Patents
Groove forming method of abrasive cloth for magnetic disk boardInfo
- Publication number
- JPH09267255A JPH09267255A JP10321996A JP10321996A JPH09267255A JP H09267255 A JPH09267255 A JP H09267255A JP 10321996 A JP10321996 A JP 10321996A JP 10321996 A JP10321996 A JP 10321996A JP H09267255 A JPH09267255 A JP H09267255A
- Authority
- JP
- Japan
- Prior art keywords
- laser beam
- polishing cloth
- abrasive cloth
- surface layer
- gas
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Abstract
Description
【０００１】[0001]
【発明の属する技術分野】本発明はリッケルリンめっき
されたアルミ基板あるいはガラス基板等の磁気ディスク
基板の研磨に使用される研磨布への溝形成加工方法に関
する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for forming grooves on a polishing cloth used for polishing a magnetic disk substrate such as an aluminum substrate or a glass substrate plated with Rickel phosphorus.
【０００２】[0002]
【従来の技術】一般に、リッケルリンめっき処理された
アルミ基板あるいはガラス基板等からなる磁気ディスク
基板は媒体加工に先立って基板加工として研磨布を用い
た研磨加工を施される。この際に使用される研磨布とし
ては主としてポリエステル系ポリウレタン、ポリエーテ
ル系ポリウレタン等のスウェード系のものが使用され
る。これら研磨布の表層部、所謂ナップ層には研磨加工
時に使用される研磨スラリー（アルミナ砥粒含有液）の
分散性維持や研磨に使用されたスラリーや基板表面から
除去されたニッケルリンあるいはガラス粒子の排出のた
めの溝を形成させて使用するのが通例である。2. Description of the Related Art Generally, a magnetic disk substrate made of a Rickel-Rin plated aluminum substrate or a glass substrate is subjected to a polishing process using a polishing cloth as a substrate process prior to a medium process. As the polishing cloth used at this time, suede type cloth such as polyester type polyurethane and polyether type polyurethane is mainly used. The surface layer portion of these polishing cloths, the so-called nap layer, maintains the dispersibility of the polishing slurry (alumina abrasive grain-containing liquid) used during polishing, the slurry used for polishing, and nickel phosphorus or glass particles removed from the substrate surface. It is customary to use by forming a groove for discharging the.
【０００３】従来、研磨布に溝を形成する方法として次
の二つの方法が知られている。すなわち、その一は鋭利
な工具を用いて研磨布の表層部を剥ぎ取り加工する方法
であり、その二は溝のパターンを持った金型を加熱して
研磨布に押し当て、熱と圧力によって研磨布表層部を押
しつぶし、溝を形成させる方法である。しかしながら、
前者の方法は剥ぎ取った溝部の端部に剥ぎ取り残し（一
種のバリ）が残りやすく、これを用いて基板を研磨する
際にこの剥ぎ取り残し部分が基板に強く作用し、微小な
スクラッチが基板に発生するという問題点を有し、また
後者の方法は溝のエッジ部が熱により硬化しやすく、研
磨加工時にこの部分が基板に強く作用し、微小なスクラ
ッチが基板に発生するという同じ問題点を有し、これら
スクラッチは後の媒体加工工程で磁性体皮膜を形成して
メディア基板とした場合に記録できない部分となるた
め、研磨工程では極力スクラッチの形成を避けなければ
ならず、基板面の仕上がりが最も重要で微小な欠陥もな
いことが要求される磁気ディスク基板の研磨で問題とさ
れていた。Conventionally, the following two methods are known as methods for forming grooves in a polishing cloth. That is, one is a method of stripping off the surface layer part of the polishing cloth with a sharp tool, and the second is heating a die with a groove pattern and pressing it against the polishing cloth, and applying heat and pressure. In this method, the surface layer of the polishing cloth is crushed to form grooves. However,
The former method tends to leave an unpeeled portion (a kind of burr) at the end of the stripped groove, and when polishing the substrate using this, this unstripped portion strongly acts on the substrate, causing minute scratches on the substrate. In addition, the latter method has the same problem that the edge portion of the groove is easily hardened by heat and this portion strongly acts on the substrate during polishing, causing minute scratches on the substrate. Since these scratches are the part that cannot be recorded when a magnetic film is formed on the media substrate in the subsequent medium processing step, it is necessary to avoid scratch formation in the polishing step as much as possible, and the finish of the substrate surface Was the most important issue, and was a problem in the polishing of magnetic disk substrates, which is required to have no minute defects.
【０００４】[0004]
【発明が解決しようとする課題】本発明はリッケルリン
めっきされたアルミ基板あるいはガラス基板等からなる
磁気ディスク基板の研磨に使用される研磨布に従来のよ
うなバリや熱による硬化部等の欠陥が形成されない研磨
布の溝形成加工方法を提供するものである。SUMMARY OF THE INVENTION According to the present invention, a polishing cloth used for polishing a magnetic disk substrate made of a Rickel phosphorus-plated aluminum substrate or a glass substrate is free from defects such as burrs and heat-cured portions as in the prior art. It is intended to provide a groove forming method for a polishing cloth that is not formed.
【０００５】[0005]
【問題点を解決するための手段】本発明は、磁気ディス
ク基板用研磨布の表層部に溝を形成加工するに際し、該
研磨布表層部に所定のスポット径に集光させたレーザー
光を照射し、これにより生成したガスあるいは有機物を
不活性ガスを吹き付けることにより該研磨布表層部から
除去することを特徴とするものである。According to the present invention, when a groove is formed in the surface layer of a polishing cloth for a magnetic disk substrate, the surface layer of the polishing cloth is irradiated with laser light focused to a predetermined spot diameter. Then, the gas or organic matter generated thereby is removed from the surface layer of the polishing cloth by spraying an inert gas.
【０００６】[0006]
【発明の実施の態用】図１は本発明を実施する場合のレ
ーザー加工の一例を示す説明図であり、この図１におい
て、ステージ１上に置かれた研磨布２表面の適宜の位置
に溝３を形成する状態を示し、図では研磨布２の垂直上
方からレーザー光照射管４を通しレーザー光を照射する
とともにアシストガス導入口５から窒素ガス、アルゴン
ガス等の不活性ガスをレーザー光照射管４の周囲から導
入し、これらアシストガスをレーザー光照射部に吹き出
し口６から吹き付けるようになっている。なお、図１に
おいて、研磨布２は不織布からなるベース層７の上にポ
リウレタン等からなるナップ層８が積層されてなる。レ
ーザー光照射管４からナップ層８に照射されるレーザー
光はエネルギー密度が高いので、所望の個所だけを選択
的に溶解するのに適するものであり、本発明方法ではこ
のレーザー光の特性を利用して主としてポリエステル系
ポリウレタン、ポリエーテル系ポリウレタン等のスウェ
ード系の研磨布２のナップ層８に溝を効果的に形成する
ものである。図１に示した例は本発明の一例を示すもの
で、これに限定されるものではないことは勿論であり、
例えば図１におけるレーザー光照射管４を省略してレー
ザー光およびアシストガス吹き出し口を一体的にノズル
状に形成しても良く、またアシストガスはレーザー光照
射管４の外側から別に設けたアシストガス吹き出し口か
ら吹き出すようにしても良い。DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS FIG. 1 is an explanatory view showing an example of laser processing for carrying out the present invention. In FIG. 1, an appropriate position on the surface of the polishing cloth 2 placed on the stage 1 is shown. A state in which the grooves 3 are formed is shown. In the figure, laser light is emitted from above the polishing cloth 2 through a laser light irradiation tube 4, and an inert gas such as nitrogen gas or argon gas is emitted from the assist gas introduction port 5 with laser light. The assist gas is introduced from the periphery of the irradiation tube 4 and is blown onto the laser light irradiation portion from the blowout port 6. In FIG. 1, the polishing cloth 2 is formed by laminating a nap layer 8 made of polyurethane or the like on a base layer 7 made of a non-woven fabric. Since the laser light emitted from the laser light irradiation tube 4 to the nap layer 8 has a high energy density, it is suitable for selectively melting only a desired portion. The method of the present invention utilizes the characteristics of the laser light. Then, the groove is effectively formed mainly in the nap layer 8 of the suede type polishing cloth 2 mainly made of polyester polyurethane, polyether polyurethane or the like. The example shown in FIG. 1 is merely an example of the present invention, and the present invention is not limited to this.
For example, the laser light irradiation tube 4 in FIG. 1 may be omitted, and the laser light and the assist gas outlet may be integrally formed into a nozzle shape, and the assist gas may be an assist gas separately provided from the outside of the laser light irradiation tube 4. You may make it blow out from a blowing outlet.
【０００７】照射されるレーザー光の種類は特に限定さ
れず、例えばＹＡＧ、ＣＯ2、エキシマレーザー等が適
宜使用でき、その出力は所望形状の溝が形成できればよ
く、必要な出力の目安としては１．０〜２００Ｗ程度が
適当である。また、レーザー光のスポット径は溝幅に応
じて決定するが、一般には０．１〜１０ｍｍφが適当で
ある。なお、レーザー光の発振方式はパルス発振でも連
続発振でも良いが、連続発振の方が好ましい。レーザー
光の照射により照射された部分は局部的に高温になり、
研磨布表層、所謂ナップ層の主構成成分であるウレタン
等が熱分解し、ガス状あるいは微粉末状の有機物が生成
する。この有機物等が研磨布表層部に残っていると、そ
こが欠陥となるので、レーザー光照射により生成された
ガス状あるいは微粉末状の有機物を研磨布表層部から除
去する必要がある。本発明ではそのために窒素ガス、ア
ルゴンガス等の不活性ガスからなるアシストガスをレー
ザー光照射部に吹き付け、前記有機物を研磨布から速や
かに除去するようにする。The type of laser light to be applied is not particularly limited, and for example, YAG, CO 2 , excimer laser or the like can be used as appropriate, and its output is only required to form a groove having a desired shape. The suitable range is about 0.0 to 200 W. The spot diameter of the laser beam is determined according to the groove width, but generally 0.1 to 10 mmφ is suitable. The oscillation method of the laser light may be pulse oscillation or continuous oscillation, but continuous oscillation is preferable. The part irradiated by the irradiation of laser light locally becomes hot,
Urethane, which is the main constituent of the polishing cloth surface layer, so-called nap layer, is thermally decomposed to produce a gaseous or fine powdery organic substance. If this organic substance or the like remains on the polishing cloth surface layer portion, it becomes a defect, and therefore it is necessary to remove the gaseous or fine powdery organic matter generated by laser light irradiation from the polishing cloth surface layer portion. Therefore, in the present invention, an assist gas composed of an inert gas such as nitrogen gas or argon gas is blown to the laser beam irradiation section to quickly remove the organic matter from the polishing cloth.
【０００８】溝の形成はレーザー光を照射するビームノ
ズルをアシストガス吹き付け部材とともに移動させる
か、あるいは図１において研磨布２を載せたステージ１
を左右、前後に移動させて研磨布を適当な軌跡をもって
移動させるか何れかの手段により所望の溝を形成する。
溝の幅、深さはレーザー光の出力、ビーム径、送り速度
等で制御する。The groove is formed by moving the beam nozzle for irradiating the laser beam together with the assist gas blowing member, or in FIG. 1, the stage 1 on which the polishing cloth 2 is placed.
To move the polishing cloth with a proper locus so as to form a desired groove.
The width and depth of the groove are controlled by the output of laser light, the beam diameter, the feed rate, and the like.
【０００９】[0009]
【実施例】ナップ層材質がポリエステル系ポリウレタン
である研磨布を用い、この研磨布表層部に、パルス発振
レーザーとしてＮｄ−ＹＡＧレーザーを用い、スポット
径をφ1.5mm、パルス幅を0.5ms、周波数を100Hz、送り
速度を1000mm／分とし、平均出力を実施例１では５Ｗ，
実施例２では１０Ｗとし、またパルスエネルギーを実施
例１では0.10Ｊ(シ゛ュール)／Ｐ(ハ゜ルス)、実施例２では0.15
Ｊ(シ゛ュール)／Ｐ(ハ゜ルス)とし、それぞれ20mmピッチの格子
形状の溝加工を行なった。得られた研磨布を用いてニッ
ケルリンめっき処理基板１５枚の表裏（３０面）を研磨
し、スクラッチの発生を調べた。スクラッチ量は光学顕
微鏡で基板表面を観察し、各面に何本のスクラッチが発
生したか計数した。その結果を表１に示す。なお、比較
のため従来法として熱プレス法により溝形成加工を行な
った研磨布を用いた結果をも表１に併記する。EXAMPLE A polishing cloth made of polyester polyurethane was used as the nap layer material. An Nd-YAG laser was used as a pulsed laser on the surface layer of the polishing cloth. The spot diameter was 1.5 mm, the pulse width was 0.5 ms, and the frequency was 0.5 ms. Is 100 Hz, the feed rate is 1000 mm / min, and the average output is 5 W in Example 1.
In Example 2, the pulse energy was set to 10 W, and in Example 1, the pulse energy was 0.10 J (jour) / P (pulse), and in Example 2, it was 0.15.
J (zul) / P (pulse) was used, and grooves having a grid shape of 20 mm pitch were machined. The obtained polishing cloth was used to polish the front and back surfaces (30 surfaces) of 15 nickel-phosphorus-plated substrates, and the occurrence of scratches was examined. The scratch amount was obtained by observing the surface of the substrate with an optical microscope and counting how many scratches were generated on each surface. Table 1 shows the results. For comparison, Table 1 also shows the results obtained by using a polishing cloth having a groove formed by a hot pressing method as a conventional method.
【００１０】[0010]
【表１】 [Table 1]
【００１１】表１から、本発明法に従って溝を形成した
研磨布を用いて研磨した基板にはスクラッチの発生が皆
無であった。From Table 1, no scratches were found on the substrate polished with the polishing cloth having the grooves formed according to the method of the present invention.
【００１２】[0012]
【発明の効果】以上のような本発明によれば、従来法に
おけるようなバリや硬化部等の欠陥を有しない溝を研磨
布に形成することができ、得られた研磨布を用いてニッ
ケルリン基板を研磨することによりスクラッチが発生せ
ず、従って基板面の仕上がりが良好となり、後の媒体加
工工程で磁性体皮膜を形成してメディア基板とした場合
に微小な欠陥もない磁気ディスク基板が得られる。As described above, according to the present invention, it is possible to form a groove having no defects such as burrs and hardened portions as in the conventional method on the polishing cloth, and the obtained polishing cloth is used for nickel. By scratching the phosphorus substrate, scratches do not occur, the substrate surface finish is good, and a magnetic disk substrate that does not have microscopic defects when a magnetic film is formed as a media substrate in a later medium processing step is obtained. can get.
【図１】本発明を実施する場合の一例を模式的に示す説
明図である。FIG. 1 is an explanatory diagram schematically showing an example of implementing the present invention.
１ ステージ ２ 研磨布 ３ 溝 ４ レーザー光照射管 ５ アシストガス導入口 ６ 吹き出し口 ７ ベース層 ８ ナップ層 1 Stage 2 Polishing cloth 3 Groove 4 Laser light irradiation tube 5 Assist gas inlet 6 Outlet 7 Base layer 8 Nap layer
Claims (1)
を形成加工する方法において、該研磨布表層部に所定の
スポット径に集光させたレーザー光を照射し、これによ
り生成したガスあるいは有機物を不活性ガスを吹き付け
ることにより該研磨布表層部から除去することを特徴と
する磁気ディスク基板用研磨布の溝形成加工方法。1. A method of forming a groove in a surface layer of a polishing cloth for a magnetic disk substrate, irradiating the surface layer of the polishing cloth with a laser beam focused to a predetermined spot diameter to thereby generate gas or A groove forming method for a polishing cloth for a magnetic disk substrate, characterized in that an organic substance is removed from the surface layer of the polishing cloth by spraying an inert gas.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10321996A JPH09267255A (en) | 1996-03-29 | 1996-03-29 | Groove forming method of abrasive cloth for magnetic disk board |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10321996A JPH09267255A (en) | 1996-03-29 | 1996-03-29 | Groove forming method of abrasive cloth for magnetic disk board |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH09267255A true JPH09267255A (en) | 1997-10-14 |
Family
ID=14348394
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP10321996A Pending JPH09267255A (en) | 1996-03-29 | 1996-03-29 | Groove forming method of abrasive cloth for magnetic disk board |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH09267255A (en) |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61169186A (en) * | 1985-01-23 | 1986-07-30 | Toyota Motor Corp | Head for laser beam machining |
| JPH04356384A (en) * | 1991-05-30 | 1992-12-10 | Sharp Corp | Laser radiating device |
| JPH05200579A (en) * | 1992-01-22 | 1993-08-10 | Hitachi Ltd | Laser beam machine |
| JPH0740232A (en) * | 1993-08-05 | 1995-02-10 | Hitachi Ltd | Polishing device and polishing method |
-
1996
- 1996-03-29 JP JP10321996A patent/JPH09267255A/en active Pending
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61169186A (en) * | 1985-01-23 | 1986-07-30 | Toyota Motor Corp | Head for laser beam machining |
| JPH04356384A (en) * | 1991-05-30 | 1992-12-10 | Sharp Corp | Laser radiating device |
| JPH05200579A (en) * | 1992-01-22 | 1993-08-10 | Hitachi Ltd | Laser beam machine |
| JPH0740232A (en) * | 1993-08-05 | 1995-02-10 | Hitachi Ltd | Polishing device and polishing method |
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