JPH09260736A - Laminated ceramic element and its manufacture - Google Patents

Laminated ceramic element and its manufacture

Info

Publication number
JPH09260736A
JPH09260736A JP9492296A JP9492296A JPH09260736A JP H09260736 A JPH09260736 A JP H09260736A JP 9492296 A JP9492296 A JP 9492296A JP 9492296 A JP9492296 A JP 9492296A JP H09260736 A JPH09260736 A JP H09260736A
Authority
JP
Japan
Prior art keywords
plasma
resin
laminated
ceramic element
cleaning
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP9492296A
Other languages
Japanese (ja)
Inventor
Kenji Kumamoto
憲二 熊本
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Chichibu Onoda Cement Corp
Original Assignee
Chichibu Onoda Cement Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Chichibu Onoda Cement Corp filed Critical Chichibu Onoda Cement Corp
Priority to JP9492296A priority Critical patent/JPH09260736A/en
Publication of JPH09260736A publication Critical patent/JPH09260736A/en
Pending legal-status Critical Current

Links

Abstract

PROBLEM TO BE SOLVED: To prevent the migration and insulation breakdown of an element and to improve the reliability by purifying the surface of the element by plasma, and to form a resin film on the surface of the element by plasma polymerization. SOLUTION: The fat, oil and other fine contaminant substances on the surface of a laminated ceramic element 6, which cannot be completely removed merely by cleaning it with organic solvent, are decomposed and removed by the operations of radical, electron and ion in plasma 3 such as tetrafluoromethane or oxygen. After the cleaning of the surface of the element 6 is finished by the plasma 3, a monomer gas for forming tetrafluoroethylene or polymerized film is introduced into an apparatus, and again plasma 3 is generated. Then, the surface of the element 6 can be formed with the polymerized film of fluororesin without recontaminating it.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【発明の属する技術分野】本発明は、圧電アクチュエー
タや圧電トランス等、高電界が発生するような積層型の
セラミックス素子及びその製造方法に係わり、その内部
電極を従来より清浄な状態で樹脂封止し、素子の信頼性
を大幅に向上させることを可能にするものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a laminated type ceramic element such as a piezoelectric actuator or a piezoelectric transformer that generates a high electric field and a method for manufacturing the same, and its internal electrodes are resin-sealed in a cleaner state than before. However, the reliability of the device can be significantly improved.

【0002】[0002]

【従来の技術】積層型のセラミックス素子には、圧電ア
クチュエータのように内部電極が素子表面に露出した構
造となっているものがある。このような素子では、素子
表面での絶縁破壊等を防止するために、素子表面を清浄
化した後、エポキシ樹脂、シリコーン樹脂等で封止して
いる。積層型セラミックス素子の製造では切断、研磨及
びリード線の半田付け等の作業が必要であるため、素子
表面は様々な汚染物質を含んだ油脂等で汚れている。
2. Description of the Related Art Some laminated ceramic elements have a structure in which internal electrodes are exposed on the element surface like a piezoelectric actuator. In such an element, in order to prevent dielectric breakdown or the like on the element surface, the element surface is cleaned and then sealed with epoxy resin, silicone resin, or the like. Since manufacturing of the laminated ceramics element requires operations such as cutting, polishing, and soldering of lead wires, the element surface is contaminated with oil and fat containing various contaminants.

【0003】従来は、素子表面の汚れを、ノニオン系水
性洗剤やメチレンクロライド、プロパノール等の有機溶
剤を用いて超音波洗浄するだけであった。しかし、この
ような洗浄だけでは十分に清浄化されない場合があった
り、十分清浄化されている場合でも、続く乾燥、封止作
業時に素子表面が再汚染される場合があった。積層型の
セラミックス素子では、1kv/mmにも及ぶ高電界が
内部電極間に発生する場合も多く、内部電極が露出した
素子では、素子表面が僅かでも汚染されていると、異な
る電位の内部電極間でマイグレーション発生しやすくな
る等の原因により、比較的短時間のうちに絶縁破壊等の
不良が発生することがあった。
Conventionally, the dirt on the surface of the element has been simply ultrasonically cleaned using a nonionic aqueous detergent, an organic solvent such as methylene chloride or propanol. However, such cleaning alone may not be sufficiently cleaned, or even if it is sufficiently cleaned, the element surface may be re-contaminated during subsequent drying and sealing operations. In a multilayer ceramic element, a high electric field of up to 1 kv / mm is often generated between the internal electrodes. In the element with the internal electrodes exposed, if the element surface is slightly contaminated, the internal electrodes with different potentials may be present. In some cases, defects such as dielectric breakdown may occur within a relatively short period of time due to the reason that migration easily occurs during the period.

【0004】[0004]

【発明が解決しようとする課題】本発明は、内部電極が
露出した構造の積層セラミックス素子の表面を、汚れが
残らないように完全に清浄化し、再汚染されることなく
樹脂封止することにより、マイグレーションの発生のな
い、即ち素子の絶縁破壊を防ぎ、信頼性を大幅に向上さ
せた積層セラミック素子の製造方法及び本製法により製
造された積層セラミック素子を提供することを目的とし
ている。
According to the present invention, the surface of a laminated ceramics element having a structure in which internal electrodes are exposed is completely cleaned so that no dirt remains, and resin-sealed without recontamination. It is an object of the present invention to provide a method for producing a monolithic ceramic element in which migration does not occur, that is, dielectric breakdown of the element is prevented and reliability is greatly improved, and a monolithic ceramic element produced by the present production method.

【0005】[0005]

【課題を解決するための手段】本発明によれば、内部電
極が素子表面に露出した構造の積層セラミックス素子の
樹脂封止において、素子表面をプラズマで清浄化する工
程と、プラズマ重合により素子表面に樹脂被膜を形成す
る工程とを備えることを特徴とする積層セラミックス素
子の製造方法を提供する。
According to the present invention, in resin sealing of a laminated ceramics element having a structure in which internal electrodes are exposed on the element surface, a step of cleaning the element surface with plasma, and an element surface by plasma polymerization And a step of forming a resin coating on the surface of the laminated ceramic element.

【0006】また本発明によれば、内部電極が素子表面
に露出した構造の積層セラミック素子において、素子表
面がプラズマ重合により樹脂封止されていることを特徴
とする積層セラミックス素子を提供する。
Further, according to the present invention, there is provided a monolithic ceramic element having a structure in which internal electrodes are exposed on the element surface, wherein the element surface is resin-sealed by plasma polymerization.

【0007】[0007]

【作用】有機溶剤等で洗浄しただけでは完全に除去でき
なかった積層セラミックス素子表面の油脂その他の微少
な汚染物質でも、テトラフルオロメタン(CF4 )や酸
素等のプラズマ中のラジカル、電子、イオンの作用によ
り分解、除去することができる。プラズマにより積層セ
ラミックス素子表面の清浄化を終えた後、装置内にテト
ラフルオロエチレン等、重合膜を形成させるためのモノ
マーガスを導入し、再度プラズマを発生させると、素子
表面を再汚染されることなくフッ素樹脂等の重合被膜を
形成することができる。
[Function] Even if oil and other minute contaminants on the surface of the laminated ceramics element, which cannot be completely removed only by washing with an organic solvent, radicals, electrons and ions in plasma such as tetrafluoromethane (CF 4 ) and oxygen Can be decomposed and removed by the action of. After cleaning the surface of the laminated ceramics element with plasma, introducing a monomer gas for forming a polymerized film such as tetrafluoroethylene into the device and generating plasma again will recontaminate the element surface. Instead, a polymerized film such as a fluororesin can be formed.

【0008】[0008]

【発明の実施の形態】本発明の一実施例として以下に示
す圧電アクチュエータの製造方法によって本発明を説明
するが、本発明は圧電アクチュエータに限らず圧電トラ
ンス等の積層セラミックス素子に適用できる。
BEST MODE FOR CARRYING OUT THE INVENTION The present invention will be described as an embodiment of the present invention by the following method for manufacturing a piezoelectric actuator. However, the present invention is not limited to a piezoelectric actuator and can be applied to a laminated ceramic element such as a piezoelectric transformer.

【0009】チタン酸ジルコン酸鉛(PZT)の微粉末
にバインダー、溶剤、分散剤、消泡剤を加え、媒体撹拌
ミルで分散したのち、真空脱泡後、ドクターブレード成
形により厚さ100μmのグリーンシートを得た。これ
にAg/Pdペーストを内部電極として印刷し、これを50
〜130枚積層、圧着した。これらの積層体を焼成後、
切断し外部電極として銀を焼き付け、これにリード線を
半田付けし積層型圧電アクチュエータ素子を作製した。
A fine powder of lead zirconate titanate (PZT), a binder, a solvent, a dispersant, and a defoaming agent are added, and the mixture is dispersed in a medium stirring mill. After degassing in a vacuum, a doctor blade is formed into a green sheet having a thickness of 100 μm. Got the sheet. Ag / Pd paste is printed on this as an internal electrode.
~ 130 sheets were laminated and pressure-bonded. After firing these laminates,
The laminate was cut and silver was baked as an external electrode, and a lead wire was soldered to this to produce a laminated piezoelectric actuator element.

【0010】素子表面の汚れを落とすために、メチレン
クロライド及びノニオン系洗剤で超音波洗浄した後、純
水で濯いだ。外部電極がプラズマエッチングされるのを
防止するため、外部電極部分のみシリコーン樹脂を焼き
付けた。このような前処理を行った積層型圧電アクチュ
エータ素子を平行平板電極を有する図1に示す真空装置
内に装填した。
In order to remove dirt from the surface of the device, ultrasonic cleaning was performed with methylene chloride and nonionic detergent, and then rinsed with pure water. In order to prevent the external electrodes from being plasma-etched, a silicone resin was baked only on the external electrode portions. The laminated piezoelectric actuator element subjected to such pretreatment was loaded in the vacuum apparatus shown in FIG. 1 having parallel plate electrodes.

【0011】図1において前記の前処理を行った積層型
圧電アクチュエータ素子6を図の様に装置内の上下に配
置された平行平板電極2間に配置する。装置内の気体を
排気口4からロータリーポンプ(図示せず)で排気しな
がら、酸素ガスを5%混合したテトラフルオロメタンを
ガス供給口5より、装置内部の圧力が0.1Torrになる
ように導入した。この状態で平行平板電極2に13.5
6MHz、100Wの高周波電力を高周波電源1により
印加しプラズマ3を発生させた。プラズマ3を発生させ
る方法はRF法、直流法、マイクロ波法のいずれでもよ
い。このプラズマ3中に10分間放置して、積層型圧電
アクチュエータ素子6の表面の汚染物質を分解、除去し
た。
In FIG. 1, the laminated piezoelectric actuator element 6 which has been subjected to the above-mentioned pretreatment is arranged between the parallel plate electrodes 2 arranged above and below in the apparatus as shown in the drawing. While exhausting the gas in the device from the exhaust port 4 with a rotary pump (not shown), tetrafluoromethane mixed with 5% of oxygen gas is supplied from the gas supply port 5 so that the pressure inside the device becomes 0.1 Torr. Introduced. In this state, 13.5 is applied to the parallel plate electrode 2.
A high frequency power of 6 MHz and 100 W was applied by the high frequency power source 1 to generate plasma 3. The method of generating the plasma 3 may be any of the RF method, the direct current method, and the microwave method. By standing in the plasma 3 for 10 minutes, the contaminants on the surface of the laminated piezoelectric actuator element 6 were decomposed and removed.

【0012】積層型圧電アクチュエータ素子6の表面が
清浄化された後、テトラフルオロメタンの供給を止め、
一旦装置内のガスを排気口4から排気した後、テトラフ
ルオロエチレンとアルゴンを同量混合したガスを、装置
内部の圧力が0.5Torrになるようにガス供給口5より
導入した。この状態で平行平板電極2に13.56MH
z、20Wの高周波電力を高周波電源1により印加しプ
ラズマ3を発生させ、この中に3時間放置して積層型圧
電アクチュエータ素子6の表面にテトラフルオロエチレ
ンの重合被膜を形成した。被膜の厚みは約3μmであっ
た。テトラフルオロエチレンとアルゴンの混合ガスを排
気口4から排気した後、さらに被膜樹脂中の不飽和結合
を開き、樹脂の架橋を促進させるため、ヘリウムをガス
供給口5より導入し、上記と同様にプラズマ3を発生さ
せ、この中に3分間放置してフッ素樹脂被膜を形成し
た。さらに被膜を保護するために、エポキシ樹脂を50
0μmの厚みでオーバーコートした。尚、オーバーコー
ト材としては従来と同様のエポキシ樹脂、シリコーン樹
脂等が使用できる。
After the surface of the laminated piezoelectric actuator element 6 is cleaned, the supply of tetrafluoromethane is stopped,
After the gas in the apparatus was once exhausted from the exhaust port 4, a gas in which tetrafluoroethylene and argon were mixed in the same amount was introduced from the gas supply port 5 so that the pressure inside the apparatus became 0.5 Torr. In this state, 13.56 MH is applied to the parallel plate electrode 2.
A high frequency power of z and 20 W was applied from the high frequency power source 1 to generate plasma 3, which was left for 3 hours to form a polymer film of tetrafluoroethylene on the surface of the laminated piezoelectric actuator element 6. The coating thickness was about 3 μm. After exhausting the mixed gas of tetrafluoroethylene and argon from the exhaust port 4, helium was introduced from the gas supply port 5 in order to further open the unsaturated bond in the coating resin and accelerate the crosslinking of the resin, and in the same manner as above. Plasma 3 was generated and left in this for 3 minutes to form a fluororesin coating. To further protect the coating, add 50% epoxy resin.
It was overcoated to a thickness of 0 μm. As the overcoat material, the same epoxy resin, silicone resin, or the like as the conventional one can be used.

【0013】このように本発明の製造方法によれば、高
清浄状態を保ったまま安定なフッ素樹脂被膜の形成が可
能となる。上記実施例では積層型圧電アクチュエータ素
子6の表面にフッ素樹脂被膜を形成したが、装置内に導
入するモノマーガスの種類を換えることによって、シリ
コーン樹脂、スチレン樹脂、エチレン樹脂、その他封止
の目的に合わせて種々の樹脂を形成することが可能であ
る。
As described above, according to the manufacturing method of the present invention, it is possible to form a stable fluororesin film while maintaining a highly clean state. Although the fluororesin coating film is formed on the surface of the laminated piezoelectric actuator element 6 in the above-mentioned embodiment, it is possible to change the kind of the monomer gas introduced into the apparatus to the silicone resin, the styrene resin, the ethylene resin, or other purposes for sealing. It is possible to form various resins in combination.

【0014】比較のため、従来の製法である、メチレン
クロライド及びノニオン系洗剤で超音波洗浄した後、純
水で濯ぎ、プラズマ処理を行わないでエポキシ樹脂をコ
ートした素子も作製した。本発明による積層型圧電アク
チュエータ素子と従来の製法で作製した積層型圧電アク
チュエータ素子をそれぞれ500個用意した。これらを
85℃、60%RHの恒温恒湿槽中で0−150v(3
kv/mm)、100Hzで1億回駆動させた。
For comparison, an element coated with epoxy resin without ultrasonic treatment was also prepared, which was a conventional method of ultrasonic cleaning with methylene chloride and nonionic detergent, followed by rinsing with pure water. The laminated piezoelectric actuator element according to the present invention and the laminated piezoelectric actuator element manufactured by the conventional manufacturing method were prepared for each 500 pieces. These are 0-150v (3 ℃ in a constant temperature and humidity tank of 85 ℃, 60% RH.
(kv / mm), it was driven 100 million times at 100 Hz.

【0015】従来の製法で作製した素子は8個(1.6
%)が、1億回に達するまでに絶縁破壊した。一方、本
発明による素子では、1億回駆動する間に絶縁破壊する
素子はなかった。
Eight (1.6) elements were manufactured by the conventional manufacturing method.
%) Caused dielectric breakdown by the time it reached 100 million times. On the other hand, in the device according to the present invention, there was no device that caused dielectric breakdown during 100 million driving.

【0016】[0016]

【発明の効果】本発明によれば、積層型のセラミックス
素子をプラズマにより高度に清浄し、装置内に導入する
ガスを換えてプラズマを発生させるだけで、素子表面が
再汚染されることなく、清浄な状態で樹脂封止すること
が可能となるため、高電界が印加されても素子表面にお
いて、異なる外部電極に接続された内部電極間でマイグ
レーションの発生が抑制され、短時間で素子が絶縁破壊
を起こすことがなくなり、素子の信頼性が大幅に向上す
る。また、プラズマにより重合した樹脂は通常の合成法
で製造した樹脂よりも架橋構造が発達しているため、耐
熱性が高く、高温での耐電圧も向上する。このため、素
子を高温環境下で使用しても絶縁破壊しにくくなり、素
子の使用温度領域を高温側へ広げることが可能となる。
According to the present invention, the surface of the element is not recontaminated by simply cleaning the laminated ceramic element with plasma and changing the gas introduced into the apparatus to generate plasma. Since it is possible to perform resin encapsulation in a clean state, migration is suppressed between internal electrodes connected to different external electrodes on the element surface even when a high electric field is applied, and the element is insulated in a short time. It will not be destroyed and the reliability of the device will be greatly improved. In addition, the resin polymerized by plasma has a higher cross-linked structure than the resin produced by the usual synthetic method, and thus has high heat resistance and improved withstand voltage at high temperatures. Therefore, even if the element is used in a high temperature environment, dielectric breakdown is less likely to occur, and the operating temperature range of the element can be expanded to the high temperature side.

【図面の簡単な説明】[Brief description of drawings]

【図1】積層セラミックス素子をプラズマ処理する装置
の概略図である。
FIG. 1 is a schematic view of an apparatus for plasma-processing a laminated ceramics element.

【符号の説明】[Explanation of symbols]

1 高周波電源 2 平行平板電極 3 プラズマ 4 排気口 5 ガス供給口 6 積層セラミックス素子 1 high frequency power supply 2 parallel plate electrode 3 plasma 4 exhaust port 5 gas supply port 6 multilayer ceramic element

───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.6 識別記号 庁内整理番号 FI 技術表示箇所 H01L 41/22 H01L 41/22 Z ─────────────────────────────────────────────────── ─── Continuation of the front page (51) Int.Cl. 6 Identification number Office reference number FI technical display location H01L 41/22 H01L 41/22 Z

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】 内部電極が素子表面に露出した構造の積
層セラミックス素子の樹脂封止において、素子表面をプ
ラズマで清浄化する工程と、プラズマ重合により素子表
面に樹脂被膜を形成する工程とを備えることを特徴とす
る積層セラミックス素子の製造方法。
1. A resin sealing of a laminated ceramic element having a structure in which internal electrodes are exposed on the element surface, including a step of cleaning the element surface with plasma, and a step of forming a resin film on the element surface by plasma polymerization. A method for manufacturing a laminated ceramic element, comprising:
【請求項2】 プラズマ重合により素子表面に被膜を形
成する樹脂が、フッ素樹脂、シリコーン樹脂、スチレン
樹脂、エチレン樹脂から選択される少なくとも一種であ
ることを特徴とする請求項1記載の積層セラミックス素
子の製造方法。
2. The laminated ceramics element according to claim 1, wherein the resin forming the coating film on the surface of the element by plasma polymerization is at least one selected from a fluororesin, a silicone resin, a styrene resin, and an ethylene resin. Manufacturing method.
【請求項3】 内部電極が素子表面に露出した構造の積
層セラミック素子において、素子表面がプラズマ重合に
より樹脂封止されていることを特徴とする積層セラミッ
クス素子。
3. A monolithic ceramic element having a structure in which internal electrodes are exposed on the element surface, wherein the element surface is resin-sealed by plasma polymerization.
JP9492296A 1996-03-25 1996-03-25 Laminated ceramic element and its manufacture Pending JPH09260736A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9492296A JPH09260736A (en) 1996-03-25 1996-03-25 Laminated ceramic element and its manufacture

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9492296A JPH09260736A (en) 1996-03-25 1996-03-25 Laminated ceramic element and its manufacture

Publications (1)

Publication Number Publication Date
JPH09260736A true JPH09260736A (en) 1997-10-03

Family

ID=14123481

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9492296A Pending JPH09260736A (en) 1996-03-25 1996-03-25 Laminated ceramic element and its manufacture

Country Status (1)

Country Link
JP (1) JPH09260736A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6411012B2 (en) 1999-12-08 2002-06-25 Tdk Corporation Multilayer piezoelectric element and method of producing the same
JP2004282053A (en) * 2003-02-26 2004-10-07 Kyocera Corp Stacked electronic component, its manufacturing method, and spray device

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6411012B2 (en) 1999-12-08 2002-06-25 Tdk Corporation Multilayer piezoelectric element and method of producing the same
JP2004282053A (en) * 2003-02-26 2004-10-07 Kyocera Corp Stacked electronic component, its manufacturing method, and spray device

Similar Documents

Publication Publication Date Title
JPH11251303A (en) Plasma treating equipment
KR102392557B1 (en) Substrate processing method, substrate processing apparatus and film-forming apparatus
JPH0317390B2 (en)
JP2002110613A (en) Plasma cleaning apparatus and method
CN101111994B (en) Piezoelectric oscillation element and piezoelectric oscillation component using it
JPH09260736A (en) Laminated ceramic element and its manufacture
CN102918674A (en) Method for producing a piezo actuator and piezo actuator
US4230553A (en) Treating multilayer printed wiring boards
JPH10321604A (en) Plasma treatment device
JP2008186832A (en) Discharge device and method for manufacturing the same
WO1995002896A1 (en) Method for manufacturing semiconductor
WO2005027222A3 (en) Assembly of an electrical component comprising an electrical insulation film on a substrate and method for producing said assembly
JPH08316214A (en) Plasma treating device
JPH11154734A (en) Formation of thin film capacitor
JPH05251511A (en) Production of copper/polyimide laminate structure
JPH0917685A (en) Capacitor and its manufacture
JPH04273485A (en) Multilayer piezoelectric actuator element and its manufacture
JP2003068724A (en) Apparatus and method for plasma processing
EP1624471B1 (en) Method for making an electrode by ion beam implantation
JP2658614B2 (en) Manufacturing method of metallized film capacitor
KR20040011242A (en) Method of making semiconductor back-electret
JP3739308B2 (en) Plasma processing method
JPH06216116A (en) Insulation film formation method by silicone resin
JPH0622186B2 (en) Method of manufacturing film capacitor
JP2005045094A (en) Laminate capacitor and its manufacturing method

Legal Events

Date Code Title Description
A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20040223

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20040907

A02 Decision of refusal

Free format text: JAPANESE INTERMEDIATE CODE: A02

Effective date: 20050201