JPH09255484A - Supporting member for crucible for pulling single crystal - Google Patents

Supporting member for crucible for pulling single crystal

Info

Publication number
JPH09255484A
JPH09255484A JP7050296A JP7050296A JPH09255484A JP H09255484 A JPH09255484 A JP H09255484A JP 7050296 A JP7050296 A JP 7050296A JP 7050296 A JP7050296 A JP 7050296A JP H09255484 A JPH09255484 A JP H09255484A
Authority
JP
Japan
Prior art keywords
crucible
single crystal
cooling plate
pulling
supporting member
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP7050296A
Other languages
Japanese (ja)
Inventor
Shuichi Inami
修一 稲見
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Steel Corp
Original Assignee
Sumitomo Sitix Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Sitix Corp filed Critical Sumitomo Sitix Corp
Priority to JP7050296A priority Critical patent/JPH09255484A/en
Publication of JPH09255484A publication Critical patent/JPH09255484A/en
Pending legal-status Critical Current

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  • Crystals, And After-Treatments Of Crystals (AREA)

Abstract

PROBLEM TO BE SOLVED: To provide a supporting member capable of cooling the bottom of a crucible to a fixed temperature. SOLUTION: This supporting member 4 is equipped with a main body 5 of a crucible pan provided with a recessed part at the center on the top of a disc and a revolving shaft 6 fitted to the center on the under surface of the crucible pan 5. A hollow disc cooling plate 7 having a thickness dimension smaller than that of the recessed part of the main body is engaged with the recessed part of the main body 5 of the crucible pan. The bowl-shaped bottom of a crucible 1 engaged with a hollow formed by the cooling plate 7 and the peripheral part of the main body 5 of the crucible pan enclosing the cooling plate. Two flow channels 10 for passing a cooling medium such as a silicone oil or water are installed in the direction of the shaft length of the revolving shaft 6. The tops of the flow channels 10 are opened through the main body 5 of the crucible pan and connected to the cooling plate 7. The cooling medium at a fixed temperature is sent from one flow channel 10 to the cooling plate 7 and the medium raised in temperature through the cooling plate 7 is discharged from the other flow channel 10.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【発明が属する技術分野】本発明は、DLCZ(Doubl
e Layered Czochralski)法による単結晶の引き上げ
に用いる坩堝を支持する支持部材に関する。
TECHNICAL FIELD The present invention relates to DLCZ (Doubl
The present invention relates to a support member for supporting a crucible used for pulling a single crystal by the e-Layered Czochralski method.

【0002】[0002]

【従来の技術】図3はDLCZ法による単結晶引き上げ
に使用する装置の要部及び従来の坩堝支持部材を示す模
式的側断面図である。原料を投入する坩堝1は、円筒状
の直胴部の下端に椀状の下部を設けてなる石英製の内容
器2に、内容器2と相似形である黒鉛製の外容器3が外
嵌してあり、坩堝1は外容器3と略同じ熱伝導率である
黒鉛製の支持部材24によって回転されると共に、昇降さ
れるようになっている。支持部材24は円板の上面中央に
凹部が形成してある坩堝受皿25と、該坩堝受皿25の下面
中央に取り付けた回転軸26とを備えており、坩堝1はそ
の底部を坩堝受皿25の凹部に嵌合させて坩堝受皿25上に
着脱自在に載置してある。
2. Description of the Related Art FIG. 3 is a schematic side sectional view showing an essential part of an apparatus used for pulling a single crystal by a DLCZ method and a conventional crucible supporting member. In the crucible 1 into which the raw materials are charged, a graphite outer container 3 having a similar shape to the inner container 2 is fitted onto a quartz inner container 2 in which a lower portion of a cylindrical straight body is provided with a bowl-shaped lower portion. The crucible 1 is rotated by a support member 24 made of graphite having substantially the same thermal conductivity as that of the outer container 3 and is moved up and down. The supporting member 24 is provided with a crucible tray 25 having a recess formed in the center of the upper surface of the disc, and a rotary shaft 26 attached to the center of the lower surface of the crucible tray 25. The crucible 1 has its bottom at the bottom of the crucible tray 25. It is fitted in the recess and is detachably placed on the crucible tray 25.

【0003】坩堝1の外側には抵抗加熱式の筒状のヒー
タ13が坩堝1と同心円状に配設してある。また、坩堝1
の中心軸上には棒状又はワイヤ状の引き上げ軸14が配設
してあり、引き上げ軸14の下端には種結晶15が装着して
ある。
On the outside of the crucible 1, a resistance-heating type cylindrical heater 13 is arranged concentrically with the crucible 1. Also, crucible 1
A rod-shaped or wire-shaped pull-up shaft 14 is arranged on the central axis of, and a seed crystal 15 is attached to the lower end of the pull-up shaft 14.

【0004】このような装置でDLCZ法による単結晶
の引き上げを行うには、ヒータ13によって坩堝1内に投
入した原料を溶融して溶融液となした後、ヒータ13のパ
ワーを減じて坩堝1の底から所定の高さまで固体層Sを
成長させ、固体層Sと溶融液層Lとの2層を形成する。
2層の形成が完了すると、ヒータ13のパワーを増大し
て、引き上げ軸14の下端に装着した種結晶15を溶融液層
の表面に接触させ、引き上げ軸14及び回転軸26を互いに
逆方向に回転駆動しつつ、所定の速度で引き上げ軸14を
引き上げていくことにより、種結晶15の下方に単結晶16
を成長させる。そして、単結晶16の引き上げによる溶融
液層Lの減少に伴って、支持部材24によって坩堝1を上
昇させ、溶融液層の表面の高さを略一定に保つと共に、
固体層Sを溶融させることによって溶融液層Lの酸素及
びドーパントの濃度等を一定に保ち、長さ方向に均一な
品質の単結晶16を得る。
In order to pull a single crystal by the DLCZ method with such an apparatus, after the raw material charged into the crucible 1 is melted by the heater 13 to form a molten liquid, the power of the heater 13 is reduced and the crucible 1 is heated. A solid layer S is grown from the bottom to a predetermined height to form two layers, a solid layer S and a melt layer L.
When the formation of the two layers is completed, the power of the heater 13 is increased to bring the seed crystal 15 attached to the lower end of the pulling shaft 14 into contact with the surface of the melt layer, so that the pulling shaft 14 and the rotating shaft 26 move in opposite directions. The single crystal 16 is placed below the seed crystal 15 by pulling up the pulling shaft 14 at a predetermined speed while rotating.
Grow. Then, as the melt liquid layer L is decreased by pulling up the single crystal 16, the supporting member 24 raises the crucible 1 to keep the surface height of the melt liquid layer substantially constant, and
By melting the solid layer S, the concentrations of oxygen and dopant in the melt layer L are kept constant, and a single crystal 16 of uniform quality in the length direction is obtained.

【0005】[0005]

【発明が解決しようとする課題】しかしながら、従来の
支持部材にあっては次のような問題があった。図4は単
結晶引き上げ中の坩堝における熱伝導を説明する説明図
である。ヒータ13から坩堝1に与えられた熱Qh は、外
容器3及び内容器2を伝導して溶融液層Lに与えられる
が、一部は外容器3の壁内を椀状の下部へ伝導する熱Q
w となる。外容器3の下部には、この熱Qw 及びヒータ
13からの熱が与えられる一方、外容器3の下部からは、
外容器3の周面から輻射による熱Qe 及び支持部材への
伝導による熱が放出される。
However, the conventional supporting member has the following problems. FIG. 4 is an explanatory diagram for explaining heat conduction in the crucible during pulling a single crystal. The heat Q h given from the heater 13 to the crucible 1 is conducted to the outer container 3 and the inner container 2 and is given to the molten liquid layer L, but a part of the heat is conducted to the lower part of the bowl in the wall of the outer container 3. Heat Q
w . At the bottom of the outer container 3, this heat Q w and heater
While heat from 13 is given, from the bottom of the outer container 3,
Heat Q e due to radiation and heat due to conduction to the support member are released from the peripheral surface of the outer container 3.

【0006】本発明者がこれらの熱量を解析した結果、
外容器3の下部からの放熱量と外容器23の下部への入熱
量との収支バランスが悪く、外容器3の下部から固体層
Sへ過剰な入熱Qm があることが判明した。この入熱Q
m によって、固体層S及び溶融液層Lの2層形成段階に
あっては、固体層Sの成長が阻害され、所要高さの固体
層Sを得るまでに長時間を要するため、単結晶製造の効
率が低いという問題があった。また、引き上げ中にあっ
ては、入熱Qm によって、固体層Sは過剰に溶融され、
単結晶16の引き上げ終了予定より早い段階で消滅するた
め、それ以後は、単結晶16の引き上げに伴って溶融液層
Lの酸素及びドーパントの濃度が高くなり、長さ方向の
全長に渡って均一な品質の単結晶16が得難いという問題
があった。
As a result of analysis of these heat quantities by the inventor,
It was found that the balance between the amount of heat radiated from the lower portion of the outer container 3 and the amount of heat input to the lower portion of the outer container 23 was poor, and there was excessive heat input Q m from the lower portion of the outer container 3 to the solid layer S. This heat input Q
In the step of forming the two layers of the solid layer S and the melt layer L by m , the growth of the solid layer S is hindered, and it takes a long time to obtain the solid layer S having a required height. There was a problem of low efficiency. Further, during the pulling up, the solid layer S is excessively melted by the heat input Q m ,
Since the single crystal 16 disappears at an earlier stage than the completion of the pulling, the concentration of oxygen and the dopant in the melt layer L increases with the pulling of the single crystal 16, and the concentration is uniform over the entire length in the length direction. There was a problem that it was difficult to obtain a single crystal 16 of various qualities.

【0007】ところで、特公昭54−4711号公報には、坩
堝及び溶融液等の重量を測定するために回転軸の下端に
配設した重量センサに坩堝からの熱が回転軸を介して伝
導し、重量センサの検出精度が低下することを防止すべ
く、回転軸の下端及びその近傍並びに重量センサをシリ
コンオイル中に浸漬し、該シリコンオイル中に配設した
冷却管内に水を通流させることによって、回転軸及び重
量センサを冷却する装置が開示されている。
By the way, in Japanese Patent Publication No. 54-4711, heat from the crucible is conducted to the weight sensor provided at the lower end of the rotary shaft for measuring the weight of the crucible and the molten liquid. In order to prevent the detection accuracy of the weight sensor from deteriorating, the lower end of the rotary shaft and its vicinity and the weight sensor are immersed in silicone oil, and water is allowed to flow through the cooling pipe arranged in the silicone oil. Discloses a device for cooling a rotating shaft and a weight sensor.

【0008】このような装置を外容器の下部からの放熱
量と外容器の下部への入熱量との収支バランスの改善に
適用することが考えられる。しかしながら、本発明者が
伝熱解析を行ったところ、回転軸の下端近傍のみならず
それより上までシリコンオイル中に浸漬しても、外容器
の下部からの放熱量は殆ど変化せず、前述した収支バラ
ンスが改善されないという結果が得られた。
It is possible to apply such a device to improve the balance between the amount of heat radiated from the lower portion of the outer container and the amount of heat input to the lower portion of the outer container. However, when the present inventor conducted heat transfer analysis, the amount of heat released from the lower portion of the outer container hardly changed even when immersed in silicone oil not only near the lower end of the rotating shaft but also above it. The result was that the balance of payments was not improved.

【0009】本発明はかかる事情に鑑みてなされたもの
であって、その目的とするところは坩堝を載置する坩堝
受皿と該坩堝受皿に垂設した回転軸とを備える支持部材
の坩堝受皿に冷却板を設けることによって、坩堝底部を
所要の温度に冷却し得る支持部材を提供することにあ
る。
The present invention has been made in view of the above circumstances, and an object of the present invention is to provide a crucible tray of a supporting member having a crucible tray on which the crucible is placed and a rotary shaft vertically extending from the crucible tray. The purpose of the present invention is to provide a support member capable of cooling the bottom of the crucible to a required temperature by providing the cooling plate.

【0010】[0010]

【課題を解決するための手段】第1発明に係る単結晶引
き上げ用坩堝の支持部材は、坩堝受皿と該坩堝受皿に垂
設した回転軸とを備え、原料の溶融液層と固体層とを共
存させて単結晶を引き上げる場合に用いる坩堝を前記坩
堝受皿上に支持する支持部材において、前記坩堝受皿に
冷却板が設けてあることを特徴とする。
A supporting member for a crucible for pulling a single crystal according to a first aspect of the present invention comprises a crucible tray and a rotary shaft vertically provided on the crucible tray, and includes a melt layer of a raw material and a solid layer. In a supporting member for supporting a crucible used for pulling a single crystal in coexistence on the crucible pan, a cooling plate is provided on the crucible pan.

【0011】第2発明に係る単結晶引き上げ用坩堝の支
持部材は、第1発明において、前記冷却板の内部には冷
却用媒体を循環させる循環路が形成してあることを特徴
とする。
The supporting member for the crucible for pulling a single crystal according to the second invention is characterized in that, in the first invention, a circulation path for circulating a cooling medium is formed inside the cooling plate.

【0012】本発明の単結晶引き上げ用坩堝の支持部材
にあっては、坩堝を載置する坩堝受皿に設けた冷却板に
よって坩堝底部を強制的に冷却するため、坩堝底部が所
要の温度まで降下し、固体層と溶融液層との2層形成段
階にあっては、固体層が所定の高さまで短時間で成長す
る。また、単結晶の引き上げ中にあっては、固体層の過
剰溶融が防止され、単結晶引き上げの終了間際まで固体
層が存在し、軸長方向の全長に渡って均一な品質の単結
晶が得られる。
In the supporting member of the crucible for pulling a single crystal of the present invention, the bottom of the crucible is cooled down to the required temperature because the bottom of the crucible is forcibly cooled by the cooling plate provided on the crucible tray on which the crucible is placed. Then, in the two-layer formation stage of the solid layer and the melt layer, the solid layer grows to a predetermined height in a short time. Further, during pulling of the single crystal, excessive melting of the solid layer is prevented, the solid layer exists until the end of pulling the single crystal, and a single crystal of uniform quality is obtained over the entire length in the axial direction. To be

【0013】冷却板の内部には循環路が形成してあり、
該循環路内にシリコンオイル又は水等の冷却用媒体を通
流して坩堝底部を冷却する。冷却の程度は、冷却用媒体
の流量又は温度等によって調節する。
A circulation path is formed inside the cooling plate,
A cooling medium such as silicon oil or water is passed through the circulation path to cool the bottom of the crucible. The degree of cooling is adjusted by the flow rate or temperature of the cooling medium.

【0014】[0014]

【発明の実施の形態】以下、本発明の実施の形態を図面
に基づいて具体的に説明する。図1はDLCZ法による
単結晶引き上げに使用する装置の要部、及び本発明に係
る支持部材を示す模式的側断面図である。金属製のチャ
ンバ19内に原料を投入する坩堝1が配置してある。坩堝
1は、円筒状の直胴部の下端に椀状の下部を設けてなる
石英製の内容器2に、内容器2と相似形である黒鉛製の
外容器3が外嵌してあり、坩堝1は支持部材4によって
支持されている。坩堝1の外側には抵抗加熱式の筒状の
ヒータ13が坩堝1と同心円状に配設してあり、該ヒータ
13は上下に所定直径の穴が開設してある断熱容器18内に
格納してある。坩堝1の中心軸上には棒状又はワイヤ状
の引き上げ軸14が配設してあり、引き上げ軸14の下端に
は種結晶15が装着してある。
BEST MODE FOR CARRYING OUT THE INVENTION Embodiments of the present invention will be specifically described below with reference to the drawings. FIG. 1 is a schematic side sectional view showing a main part of an apparatus used for pulling a single crystal by the DLCZ method and a supporting member according to the present invention. A crucible 1 for feeding raw materials is arranged in a metal chamber 19. In the crucible 1, a quartz outer container 3 having a bowl-shaped lower portion at the lower end of a cylindrical body is fitted with a graphite outer container 3 having a similar shape to the inner container 2. The crucible 1 is supported by a support member 4. On the outside of the crucible 1, a resistance heating type tubular heater 13 is arranged concentrically with the crucible 1.
13 is housed in a heat insulating container 18 having holes of a predetermined diameter formed on the top and bottom. A rod-shaped or wire-shaped pulling shaft 14 is arranged on the central axis of the crucible 1, and a seed crystal 15 is attached to the lower end of the pulling shaft 14.

【0015】支持部材4は円板の上面中央に凹部が形成
してある坩堝受皿本体5と、該坩堝受皿本体5の下面中
央に取り付けた回転軸6とを備えている。坩堝受皿本体
5の凹部には、その厚み寸法が凹部の深さ寸法より小さ
い中空円板状の冷却板7が嵌合してあり、冷却板7及び
これを取り囲む坩堝受皿本体5の周縁部で形成される窪
みに、坩堝1の椀状の底部を嵌合させてある。なお、坩
堝受皿本体5及び回転軸6は坩堝1の外容器3と略同じ
熱伝導率の黒鉛で形成してあり、冷却板7はアルミニウ
ム等の金属で形成してある。回転軸6は回転駆動及び昇
降駆動を行う回転昇降装置40に固定してあり、回転昇降
装置40の駆動によって支持部材4は坩堝1を回転させつ
つ上昇させるようになっている。
The support member 4 is provided with a crucible tray main body 5 having a recess formed in the center of the upper surface of the disc, and a rotary shaft 6 attached to the center of the lower surface of the crucible tray main body 5. A hollow disk-shaped cooling plate 7 having a thickness smaller than the depth of the recess is fitted in the recess of the crucible saucer main body 5, and the cooling plate 7 and the peripheral portion of the crucible saucer main body 5 surrounding the cooling plate 7 are fitted together. The bowl-shaped bottom of the crucible 1 is fitted into the formed recess. The crucible tray body 5 and the rotary shaft 6 are made of graphite having substantially the same thermal conductivity as the outer container 3 of the crucible 1, and the cooling plate 7 is made of metal such as aluminum. The rotary shaft 6 is fixed to a rotary elevating device 40 that performs rotational drive and elevating drive, and the drive of the rotary elevating device 40 causes the support member 4 to rise while rotating the crucible 1.

【0016】このような装置でDLCZ法による単結晶
の引き上げを行うには、ヒータ13によって坩堝1内に投
入した原料を溶融して溶融液となした後、ヒータ13のパ
ワーを減じて坩堝1の底から所定の高さまで固体層Sを
成長させ、固体層Sと溶融液層Lとの2層を形成する。
2層の形成が完了すると、ヒータ13のパワーを増大し
て、引き上げ軸14の下端に装着した種結晶15を溶融液層
Lの表面に接触させ、引き上げ軸14及び支持部材4を互
いに逆方向に回転駆動しつつ、所定の速度で引き上げ軸
14を引き上げていくことにより、種結晶15の下方に単結
晶16を成長させる。そして、単結晶16の引き上げによる
溶融液層Lの減少に伴って、支持部材4によって坩堝1
を上昇させ、溶融液層Lの表面の高さを略一定に保つと
共に、固体層Sを溶融させることによって溶融液層Lの
酸素及びドーパントの濃度等を一定に保ち、長さ方向に
均一な品質の単結晶16を得る。
In order to pull a single crystal by the DLCZ method with such an apparatus, after the raw material charged into the crucible 1 is melted by the heater 13 to form a molten liquid, the power of the heater 13 is reduced and the crucible 1 is heated. A solid layer S is grown from the bottom to a predetermined height to form two layers, a solid layer S and a melt layer L.
When the formation of the two layers is completed, the power of the heater 13 is increased so that the seed crystal 15 attached to the lower end of the pulling shaft 14 is brought into contact with the surface of the melt layer L, and the pulling shaft 14 and the supporting member 4 are moved in opposite directions. While pulling the rotation shaft,
By pulling up 14 the single crystal 16 is grown below the seed crystal 15. Then, as the melt liquid layer L is reduced by pulling up the single crystal 16, the crucible 1 is supported by the support member 4.
To keep the height of the surface of the melt liquid layer L substantially constant, and by melting the solid layer S to keep the concentration of oxygen and dopant in the melt liquid layer L constant, etc. A quality single crystal 16 is obtained.

【0017】回転軸6の内部には、シリコンオイル又は
水等の冷却用媒体を流入出する2本の通流路10,10が、
回転軸6の軸長方向に設けてあり、通流路10,10の上端
は坩堝受皿本体5を貫通して冷却板7に連結してある。
回転軸6の下端近傍の周面には通流路10,10に連通する
2つの穴が、回転軸6の軸長方向に距離を隔てて開設し
てあり、回転軸6にはこれらの穴を覆うように筒状の継
手部材30が外嵌してある。継手部材30の内周面には、冷
却用媒体が通流する環状の溝31,31が前述した2つの穴
に対応する位置に形成してあり、また、冷却用媒体の漏
出を防止するOリング32,32が継手部材30の上下端近傍
に取り付けてある。継手部材30の一方の溝31には、ポン
プPによって冷却装置を備えるタンク35から冷却媒体が
流入され、他方の溝31からは冷却板7を経て昇温した冷
却媒体がタンク35へ流出するようになっている。
Inside the rotary shaft 6, there are two passages 10, 10 through which a cooling medium such as silicone oil or water flows in and out,
It is provided in the axial direction of the rotary shaft 6, and the upper ends of the flow passages 10 and 10 penetrate the crucible tray body 5 and are connected to the cooling plate 7.
Two holes communicating with the flow passages 10, 10 are formed in the peripheral surface near the lower end of the rotary shaft 6 at a distance in the axial direction of the rotary shaft 6, and these holes are formed in the rotary shaft 6. A tubular joint member 30 is externally fitted so as to cover the. On the inner peripheral surface of the joint member 30, annular grooves 31, 31 through which the cooling medium flows are formed at positions corresponding to the above-mentioned two holes, and the leakage of the cooling medium is prevented O Rings 32, 32 are attached near the upper and lower ends of the joint member 30. The cooling medium is introduced into the one groove 31 of the joint member 30 from the tank 35 provided with the cooling device by the pump P, and the heated cooling medium is discharged from the other groove 31 to the tank 35 via the cooling plate 7. It has become.

【0018】図2は図1に示した冷却板7のII−II
線による拡大断面図である。平面視が円形の冷却板7の
中央付近には2つの穴7a,7aが開設してあり、この穴7
a,7aに前述した通流路10,10(図1参照)がそれぞれ
連結してある。冷却板7の内部には複数の邪魔板8,
8,…が設けてあり、該邪魔板8,8,…によって、一
方の穴7aから流入した冷却用媒体が冷却板7の周方向へ
蛇行しつつ移動して他方の穴7aから流出する循環路9が
形成されている。
FIG. 2 is a II-II of the cooling plate 7 shown in FIG.
It is an expanded sectional view by a line. Two holes 7a, 7a are formed in the vicinity of the center of the cooling plate 7 having a circular plan view.
The above-mentioned communication channels 10 and 10 (see FIG. 1) are connected to a and 7a, respectively. Inside the cooling plate 7, a plurality of baffle plates 8,
.. are provided, and the baffle plates 8, 8, ... Circulate the cooling medium flowing in from one hole 7a while meandering in the circumferential direction of the cooling plate 7 and flowing out from the other hole 7a. A passage 9 is formed.

【0019】そして、循環路9内に冷却用媒体を循環さ
せて冷却板7上に載置した坩堝1の底部を所要の温度ま
で冷却する。これによって、固体層Sの過剰な溶融が防
止され、固体層Sと溶融液層Lとの2層形成段階にあっ
ては、固体層Sが所定の高さまで短時間で成長する。ま
た、単結晶16の引き上げ中にあっては、固体層Sの過剰
溶融が防止され、単結晶16の引き上げ終了間際まで固体
層Sが存在し、軸長方向の全長に渡って均一な品質の単
結晶16を得ることができる。
Then, a cooling medium is circulated in the circulation passage 9 to cool the bottom of the crucible 1 placed on the cooling plate 7 to a required temperature. This prevents excessive melting of the solid layer S, and in the two-layer formation stage of the solid layer S and the melt liquid layer L, the solid layer S grows to a predetermined height in a short time. Further, during the pulling of the single crystal 16, the solid layer S is prevented from being excessively melted, the solid layer S exists until the end of the pulling of the single crystal 16, and the solid layer S has a uniform quality over the entire length in the axial direction. A single crystal 16 can be obtained.

【0020】[0020]

【実施例】次に、比較試験を行った結果について説明す
る。次の表1は比較試験の結果を示すものである。
EXAMPLES Next, the results of comparison tests will be described. The following Table 1 shows the results of the comparative test.

【0021】[0021]

【表1】 [Table 1]

【0022】表1中、比較例は坩堝受皿に冷却板を設け
ていない場合を示している。一方、実施例1は図1に示
した如く、坩堝受皿に冷却板が設けてあり、該冷却板内
の循環路に水を40リットル/分で循環させた場合を、
実施例2は前記循環路に水を60リットル/分で循環指
せた場合を、また、実施例3は前記循環路に水を80リ
ットル/分で循環指せた場合をそれぞれ示している。ま
た、坩堝に原料を充填し、それを75kwのヒータパワ
ーで溶融した後、ヒータパワーを65kwに低下させる
と共に坩堝を60mm降下させて固体層の形成を開始し
てから7時間後の初期固体層の厚みを測定し、比較例の
初期固体層の厚みを基準とし、基準からの増加量を初期
固体層厚とした。そして、初期固体層を形成後、種結晶
を溶融液層に浸漬し、次の表2の条件で単結晶を引き上
げ、固体層が消滅したときの単結晶の長さを測定した。
なお、表2に示した条件での目標単結晶長は1300m
mである。
In Table 1, the comparative example shows a case where the crucible tray is not provided with a cooling plate. On the other hand, in Example 1, as shown in FIG. 1, when the cooling plate was provided in the crucible tray and water was circulated at 40 liters / minute in the circulation path in the cooling plate,
Example 2 shows a case where water is circulated to the circulation path at 60 liters / minute, and Example 3 shows a case where water is circulated to the circulation path at 80 liters / minute. In addition, after filling the crucible with the raw material and melting it with the heater power of 75 kw, the heater power was lowered to 65 kw and the crucible was lowered by 60 mm to form the solid layer, and the initial solid layer was formed 7 hours after the solid layer was formed. Was measured, and the thickness of the initial solid layer of Comparative Example was used as a reference, and the amount of increase from the reference was used as the initial solid layer thickness. Then, after forming the initial solid layer, the seed crystal was immersed in the melt layer, the single crystal was pulled up under the conditions of the following Table 2, and the length of the single crystal when the solid layer disappeared was measured.
The target single crystal length under the conditions shown in Table 2 is 1300 m.
m.

【0023】[0023]

【表2】 [Table 2]

【0024】表1から明らかな如く、冷却板に循環させ
る水の流量を増加させるにつれて、初期固体層厚が増大
している。そして、流量が80リットル/分であるとき
(実施例3)、初期固体層は比較例より70mm増大し
ており、これによって固体層を、引き上げた単結晶の長
さが目標単結晶長になるまで存在させることができ、目
標単結晶長の全長にわたってDLCZ法による単結晶の
引き上げを実施することができた。
As is clear from Table 1, the initial solid layer thickness increases as the flow rate of water circulated through the cooling plate increases. Then, when the flow rate is 80 liters / minute (Example 3), the initial solid layer is increased by 70 mm as compared with the comparative example, whereby the length of the single crystal pulled up from the solid layer becomes the target single crystal length. The single crystal could be pulled up by the DLCZ method over the entire length of the target single crystal length.

【0025】[0025]

【発明の効果】以上詳述した如く、本発明に係る単結晶
引き上げ用坩堝の支持部材にあっては、冷却板によって
坩堝の底部を冷却するため、固体層と溶融液層との2層
形成段階にあっては、固体層が所定の高さまで短時間で
成長する。また、単結晶の引き上げ中にあっては、固体
層の過剰溶融が防止され、単結晶の引き上げ終了間際ま
で固体層が存在し、長さ方向の全長に渡って均一な品質
の単結晶が得られる等、本発明は優れた効果を奏する。
As described above in detail, in the supporting member for the crucible for pulling a single crystal according to the present invention, since the bottom of the crucible is cooled by the cooling plate, two layers of a solid layer and a melt layer are formed. In the stage, the solid layer grows to a predetermined height in a short time. Also, during pulling of the single crystal, excessive melting of the solid layer is prevented, the solid layer exists until the end of pulling the single crystal, and a single crystal of uniform quality is obtained over the entire length in the length direction. That is, the present invention has excellent effects.

【図面の簡単な説明】[Brief description of drawings]

【図1】DLCZ法による単結晶引き上げに使用する装
置の要部、及び本発明に係る支持部材を示す模式的側断
面図である。
FIG. 1 is a schematic side sectional view showing a main part of an apparatus used for pulling a single crystal by a DLCZ method and a supporting member according to the present invention.

【図2】図1に示した冷却板のII−II線による拡大
断面図である。
FIG. 2 is an enlarged cross-sectional view taken along line II-II of the cooling plate shown in FIG.

【図3】DLCZ法による単結晶引き上げに使用する装
置の要部及び従来の坩堝支持部材を示す模式的側断面図
である。
FIG. 3 is a schematic side sectional view showing a main part of an apparatus used for pulling a single crystal by a DLCZ method and a conventional crucible supporting member.

【図4】単結晶引き上げ中の坩堝における熱伝導を説明
する説明図である。
FIG. 4 is an explanatory diagram illustrating heat conduction in a crucible during pulling of a single crystal.

【符号の説明】[Explanation of symbols]

1 坩堝 2 内容器 3 外容器 4 支持部材 5 坩堝受皿本体 6 回転軸 7 冷却板 8 邪魔板 L 溶融液層 S 固体層 1 crucible 2 inner container 3 outer container 4 support member 5 crucible saucer body 6 rotating shaft 7 cooling plate 8 baffle plate L molten liquid layer S solid layer

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 坩堝受皿と該坩堝受皿に垂設した回転軸
とを備え、原料の溶融液層と固体層とを共存させて単結
晶を引き上げる場合に用いる坩堝を前記坩堝受皿上に支
持する支持部材において、 前記坩堝受皿に冷却板が設けてあることを特徴とする単
結晶引き上げ用坩堝の支持部材。
1. A crucible tray comprising a crucible tray and a rotary shaft extending vertically from the crucible tray, and a crucible used for pulling a single crystal by coexisting a molten layer and a solid layer of a raw material is supported on the crucible tray. A supporting member for a crucible for pulling a single crystal, wherein the crucible tray is provided with a cooling plate.
【請求項2】 前記冷却板の内部には冷却用媒体を循環
させる循環路が形成してある請求項1記載の単結晶引き
上げ用坩堝の支持部材。
2. A supporting member for a crucible for pulling a single crystal according to claim 1, wherein a circulation path for circulating a cooling medium is formed inside the cooling plate.
JP7050296A 1996-03-26 1996-03-26 Supporting member for crucible for pulling single crystal Pending JPH09255484A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7050296A JPH09255484A (en) 1996-03-26 1996-03-26 Supporting member for crucible for pulling single crystal

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7050296A JPH09255484A (en) 1996-03-26 1996-03-26 Supporting member for crucible for pulling single crystal

Publications (1)

Publication Number Publication Date
JPH09255484A true JPH09255484A (en) 1997-09-30

Family

ID=13433376

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7050296A Pending JPH09255484A (en) 1996-03-26 1996-03-26 Supporting member for crucible for pulling single crystal

Country Status (1)

Country Link
JP (1) JPH09255484A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2013019401A1 (en) * 2011-08-01 2013-02-07 Gtat Corporation Liquid-cooled heat exchanger
JP2014521577A (en) * 2011-05-02 2014-08-28 ジーティーエイティー コーポレーション Apparatus and method for producing polycrystalline material having large particle size
US20150176150A1 (en) * 2013-09-30 2015-06-25 Gt Crystal Systems, Llc Advanced crucible support and thermal distribution management
JP6062045B2 (en) * 2013-05-31 2017-01-18 新日鐵住金株式会社 SiC single crystal manufacturing apparatus and SiC single crystal manufacturing method using the manufacturing apparatus

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2014521577A (en) * 2011-05-02 2014-08-28 ジーティーエイティー コーポレーション Apparatus and method for producing polycrystalline material having large particle size
WO2013019401A1 (en) * 2011-08-01 2013-02-07 Gtat Corporation Liquid-cooled heat exchanger
RU2560439C1 (en) * 2011-08-01 2015-08-20 ДжиТиЭйТи Корпорейшн Fluid-cooled heat exchanger
US9982361B2 (en) 2011-08-01 2018-05-29 Gtat Corporation Liquid-cooled heat exchanger
JP6062045B2 (en) * 2013-05-31 2017-01-18 新日鐵住金株式会社 SiC single crystal manufacturing apparatus and SiC single crystal manufacturing method using the manufacturing apparatus
JPWO2014192573A1 (en) * 2013-05-31 2017-02-23 新日鐵住金株式会社 SiC single crystal manufacturing apparatus and SiC single crystal manufacturing method using the manufacturing apparatus
US20150176150A1 (en) * 2013-09-30 2015-06-25 Gt Crystal Systems, Llc Advanced crucible support and thermal distribution management
US9845548B2 (en) * 2013-09-30 2017-12-19 Gtat Corporation Advanced crucible support and thermal distribution management

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