JPH09255351A - Method and device for boring glass plate - Google Patents

Method and device for boring glass plate

Info

Publication number
JPH09255351A
JPH09255351A JP6955496A JP6955496A JPH09255351A JP H09255351 A JPH09255351 A JP H09255351A JP 6955496 A JP6955496 A JP 6955496A JP 6955496 A JP6955496 A JP 6955496A JP H09255351 A JPH09255351 A JP H09255351A
Authority
JP
Japan
Prior art keywords
glass plate
laser
glass
voltage
hole
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP6955496A
Other languages
Japanese (ja)
Inventor
Tsutomu Sawano
勉 澤野
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Sheet Glass Co Ltd
Original Assignee
Nippon Sheet Glass Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Sheet Glass Co Ltd filed Critical Nippon Sheet Glass Co Ltd
Priority to JP6955496A priority Critical patent/JPH09255351A/en
Publication of JPH09255351A publication Critical patent/JPH09255351A/en
Pending legal-status Critical Current

Links

Abstract

PROBLEM TO BE SOLVED: To provide a method and device for boring a glass plate capable of easily boring the glass plate with a fine hole of a straight shape. SOLUTION: This method for boring the glass plate comprises impressing a high voltage on a pair of bar-shaped electrodes 3, 4 disposed in the opposite position of both surfaces of the glass plate 1 to generate an electric discharge, thereby causing the dielectric breakdown of the glass plate. The glass plate part to be bored with the hole is irradiated with a laser beam before or during the impression of the voltage, by which the irradiated glass part is heated.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【発明の属する技術分野】本発明はガラスの孔あけ方
法、特にガラス板の厚み方向に微細な貫通孔をあける方
法および装置に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for making holes in glass, and more particularly to a method and apparatus for making fine through holes in the thickness direction of a glass plate.

【0002】[0002]

【従来の技術】ガラス板に微細な孔をあける方法として
エキシマレーザーを用いた方法が知られている。このエ
キシマレーザーは紫外領域の波長の光が物質を非熱的に
破壊することを利用したもので、数十μmレベルの寸法
の孔加工を行うことができる。安価に100μmレベル
の微細な孔をあける方法としては、研磨剤を高速気流と
ともに噴射するサンドブラスト加工、アルカリ液中で放
電腐食させる電解放電加工等がある。
2. Description of the Related Art A method using an excimer laser is known as a method for making fine holes in a glass plate. This excimer laser utilizes the fact that light having a wavelength in the ultraviolet region destroys a substance non-thermally, and it is possible to perform hole processing with a size of several tens of μm. As a method of inexpensively making fine holes of a level of 100 μm, there are sandblasting in which an abrasive is jetted together with a high-speed air current, electrolytic discharge machining in which an electrical discharge is performed in an alkaline solution, and the like.

【0003】また高電圧放電でガラスの絶縁破壊を生じ
せしめて数十μmレベルの微細な孔あけを可能にする方
法もある。図3に示すように、この高電圧放電ではガラ
ス板21の両面近傍に高電圧用の電極22.23を配置
させ、高電圧発生装置24から発生した高電圧で熱的な
絶縁破壊を生じせしめ、発生したジュール熱でガラスを
蒸発させる方法である。
There is also a method of causing dielectric breakdown of glass by high-voltage discharge and enabling fine holes of several tens of μm level. As shown in FIG. 3, in this high-voltage discharge, high-voltage electrodes 22.23 are arranged in the vicinity of both surfaces of the glass plate 21, and a high voltage generated from the high-voltage generator 24 causes thermal insulation breakdown. The method is to evaporate the glass by the generated Joule heat.

【0004】[0004]

【発明が解決しようとする課題】エキシマレーザーを用
いた加工法は現在数十ミクロンレベルの孔を実用的にあ
けることのできるほぼ唯一の加工法であるが、エキシマ
レーザー自体高価でかつレーザーガスの交換等のランニ
ングコストも高いという欠点を持っている。サンドブラ
スト加工法や電解放電加工法は低コストという利点があ
るが、孔形状がテーパ状になるという欠点をもつ。これ
らの方法に比べて高電圧放電を利用した孔あけ方法は低
コストかつストレートに近い孔形状を持つという利点を
有し、特に1枚のガラス板に多数の貫通孔をあけるのに
有効な方法であるが、ガラスの電気伝導度に大きく依存
し、電気伝導度が高いソーダライムガラスのようなアル
カリ含有ガラスには適用できるが、電気伝導度の低い無
アルカリガラスには、非常に高い放電電圧が必要になり
かつ孔位置が正確に定まらない等の理由で実用的には適
用できない欠点があった。このためTFTに使用される
無アルカリガラス板に対して適用できる低コスト、かつ
ストレート形状の孔の加工法がなかった。
The processing method using the excimer laser is currently the only processing method that can practically make holes of the order of several tens of microns, but the excimer laser itself is expensive and the laser gas It also has the drawback of high running costs such as replacement. The sandblast processing method and the electrolytic discharge processing method have an advantage of low cost, but have a drawback that the hole shape is tapered. Compared to these methods, the hole forming method using high voltage discharge has the advantages of low cost and a hole shape close to a straight line, and is particularly effective for making a large number of through holes in one glass plate. However, it depends greatly on the electrical conductivity of the glass and can be applied to alkali-containing glass such as soda lime glass with high electrical conductivity, but it is very high discharge voltage for alkali-free glass with low electrical conductivity. However, there is a drawback that it cannot be applied practically because the hole position is required and the hole position cannot be accurately determined. For this reason, there is no low-cost and straight-shaped hole processing method applicable to a non-alkali glass plate used for a TFT.

【0005】本発明は無アルカリのガラス板でも簡便に
ストレート形状の微細孔をあけることのできるガラス板
の孔あけ方法および装置を提供することを目的とするも
のである。
It is an object of the present invention to provide a glass plate punching method and apparatus capable of easily punching straight fine holes even in a non-alkali glass plate.

【0006】[0006]

【課題を解決するための手段】すなわち、本発明は、ガ
ラス板の両面の対向する位置に設けた1対の棒状電極に
高い電圧を印加して放電させることによりガラスを絶縁
破壊させるガラス板の孔あけ方法において、前記電圧の
印加前または印加中に、孔があけられるべきガラス板部
分にレーザーを照射して照射ガラス部分を加熱すること
を特徴とするガラス板の孔あけ方法である。
That is, the present invention is directed to a glass plate in which a high voltage is applied to a pair of rod-shaped electrodes provided at opposite positions on both sides of the glass plate to cause discharge to cause dielectric breakdown of the glass plate. In the perforating method, the glass plate portion to be perforated is irradiated with a laser to heat the irradiated glass portion before or during the application of the voltage, and the perforated glass portion is heated.

【0007】本発明において、1対の放電用電極をガラ
ス板の両面の対向する位置に設ける。電極の先端はでき
るだけガラス板表面に近い方があけれる孔の位置が正確
になるので好ましいが、レーザー照射と同時に放電を行
う場合は、レーザー照射光が電極に当たらないように電
極の先端をガラス板表面から0.3〜1.0mm隔てて
位置させる。対向配置させる1対の電極の位置がずれる
と斜めに孔があくので、できるだけ電極の位置を一致さ
せることが好ましい。
In the present invention, a pair of discharge electrodes are provided at opposite positions on both sides of the glass plate. It is preferable that the tip of the electrode be as close as possible to the surface of the glass plate because the position of the hole will be accurate, but when discharging at the same time as laser irradiation, the tip of the electrode should be made glass so that the laser irradiation light does not hit the electrode. It is positioned 0.3 to 1.0 mm from the plate surface. Since the holes are formed diagonally when the positions of the pair of electrodes arranged to face each other are shifted, it is preferable to match the positions of the electrodes as much as possible.

【0008】また棒状電極としては、耐熱性を有する導
電性材料が好ましく、具体的には鋼、炭素を挙げること
ができ、それらの中で鋼、特にステンレス鋼が特に好適
に用いられる。棒状電極の寸法はあけるべき孔の寸法に
依存するが、20μm〜1.0mmの直径の孔をあける
場合は、例えば10μm〜2mmの直径を有する電極が
用いられる。比較的大きい直径の電極を用いて小さい孔
をあける場合、電極の先端は、例えば先端直径が10〜
50μmになるように尖らせておくことが好ましい。
As the rod-shaped electrode, a conductive material having heat resistance is preferable, and concrete examples thereof include steel and carbon. Among them, steel, particularly stainless steel, is particularly preferably used. The size of the rod-shaped electrode depends on the size of the hole to be formed, but when forming a hole having a diameter of 20 μm to 1.0 mm, an electrode having a diameter of 10 μm to 2 mm is used, for example. When making a small hole with an electrode of relatively large diameter, the tip of the electrode may have a tip diameter, for example, of 10 to 10.
It is preferable to make it sharp so as to have a thickness of 50 μm.

【0009】両電極に印加する電源の電圧としては直
流、または交流を用いることができるが、高電圧を発生
し易さから直流が好ましく、5000〜30000Vの
電圧で、3mA〜50mAの電流を流すことができる電
源を用いることが好ましい。
Direct current or alternating current can be used as the voltage of the power source applied to both electrodes, but direct current is preferable from the viewpoint of easily generating a high voltage, and a current of 3 mA to 50 mA flows at a voltage of 5000 to 30000V. It is preferable to use a power source capable of controlling.

【0010】本発明において用いられる、レーザー光を
照射する手段であるレーザーとしてはCO2 レーザーま
たはYAGレーザーが望ましい。可視域および紫外域の
レーザーはガラスの加熱にはあまり効率がよくないので
好ましくない。CO2 レーザーはより安価でガラスを加
熱または溶解させることができるが、波長が10.6μ
mと長くビームスポット径を実用上100μm以下に小
さく絞ることができない。従ってCO2 レーザーは10
0μm以上の直径の孔をあける場合に適しており、光出
力が5〜25Wのものが好適に用いられる。これに対し
てYAGレーザーは波長がCO2 レーザーの1/10の
ためスポット径を数十μmレベルまで絞り込むことが可
能で、これにより、より微細な孔あけが可能である。そ
の反面YAGレーザーの出力光はガラスに対してあまり
吸収されないので、25〜100Wの出力の高い連続発
振型のレーザーが必要となる。
A CO 2 laser or a YAG laser is desirable as a laser which is a means for irradiating a laser beam used in the present invention. Lasers in the visible and ultraviolet regions are not very efficient at heating glass and are not preferred. CO 2 laser is cheaper and can heat or melt glass, but it has a wavelength of 10.6μ.
In practice, the beam spot diameter cannot be narrowed down to 100 μm or less. Therefore, the CO 2 laser is 10
It is suitable for forming a hole having a diameter of 0 μm or more, and a light output of 5 to 25 W is preferably used. On the other hand, since the YAG laser has a wavelength of 1/10 of that of the CO 2 laser, the spot diameter can be narrowed down to a level of several tens of μm, which allows finer holes to be formed. On the other hand, since the output light of the YAG laser is not absorbed so much by the glass, a continuous oscillation type laser with a high output of 25 to 100 W is required.

【0011】本発明において、加熱用レーザーを用いて
局所的に孔をあけるべきガラス板部分を局所的に加熱ま
たは溶解させ、その加熱または溶解されて電気伝導度が
高くなったガラス部分に高電圧を印加して熱的な絶縁破
壊を生じせしめて放電させ、電子なだれで発生したジュ
ール熱で前記加熱、溶解ガラス部分が蒸発、除去され、
その結果、ガラス板に20〜1000μmの直径の貫通
孔をあけることができる。
In the present invention, a glass plate portion to be locally perforated is locally heated or melted by using a heating laser, and a high voltage is applied to the glass portion whose electric conductivity is increased by the heating or melting. Is applied to cause a thermal insulation breakdown to cause discharge, and the Joule heat generated by electron avalanche causes the molten glass portion to evaporate and be removed.
As a result, it is possible to form a through hole having a diameter of 20 to 1000 μm in the glass plate.

【0012】本発明において、被加工ガラス板としては
0.10〜1.5mmの厚み、特に0.15〜0.7m
mの厚みを有する無アルカリのガラス板、および含アル
カリガラス板が好適に用いられる。
In the present invention, the glass plate to be processed has a thickness of 0.10 to 1.5 mm, particularly 0.15 to 0.7 m.
An alkali-free glass plate having a thickness of m and an alkali-containing glass plate are preferably used.

【0013】[0013]

【発明の実施の形態】本発明を実施例を用いて詳細に説
明する。
BEST MODE FOR CARRYING OUT THE INVENTION The present invention will be described in detail with reference to Examples.

【0014】図1に示すように、0.3mmの厚みの無
アルカリのガラス板(NHテクノ(株)製、NA35)
1は、それを支持する台であるXーY移動テーブル2の
上に載置されている。ガラス板1の両面側にそれぞれ棒
状電極3,4をその先端が位置するように配置されてい
る。高い電圧を供給する手段である高電圧発生装置5を
用いて約10000Vの直流高電圧を両電極3,4に印
加する。電極3,4は、直径が1mmで長さが約10c
mのステンレス(SUS304)の線で先端を尖らせ
て、先端直径を約50μmにしている。
As shown in FIG. 1, a non-alkali glass plate having a thickness of 0.3 mm (manufactured by NH Techno Co., Ltd., NA35)
1 is placed on an XY moving table 2 which is a table for supporting it. Rod-shaped electrodes 3 and 4 are arranged on both sides of the glass plate 1 so that their tips are located. A high DC voltage of about 10,000 V is applied to both electrodes 3 and 4 by using a high voltage generator 5 which is a means for supplying a high voltage. The electrodes 3 and 4 have a diameter of 1 mm and a length of about 10c.
The tip diameter is about 50 μm by sharpening the tip with a stainless steel (SUS304) wire of m.

【0015】そしてガラス板1の片面側にCO2 レーザ
ー6が、図2に示すように、その照射光7が両棒状電極
3,4の先端8,9の中間にあるガラス板の孔をあける
部分10に向うように配置されている。電極先端8,9
が照射光7に当たって溶融しないように、照射光7は斜
めにガラスのみを照射するように配置されている。ま
ず、XーY移動テーブル4を調節してその上に載置され
ているガラス板1の孔をあけるべき部分10が両棒状電
極3,4の先端8,9の中間に位置するようにする。電
極3,4の先端8,9はガラス板表面11,12からそ
れぞれ約0.5mmの距離に位置していた。
On one side of the glass plate 1, as shown in FIG. 2, a CO 2 laser 6 irradiates the irradiation light 7 with a hole in the glass plate in the middle of the tips 8 and 9 of the rod-shaped electrodes 3 and 4. It is arranged so as to face the portion 10. Electrode tips 8, 9
The irradiation light 7 is arranged so as to obliquely irradiate only the glass so that the light does not hit the irradiation light 7 and melt. First, the XY moving table 4 is adjusted so that the portion 10 of the glass plate 1 placed on the XY moving table 4 to be perforated is located between the tips 8 and 9 of the rod-shaped electrodes 3 and 4. . The tips 8 and 9 of the electrodes 3 and 4 were located at a distance of about 0.5 mm from the glass plate surfaces 11 and 12, respectively.

【0016】ついで、直流高電圧を両電極3,4に印加
する。この時無アルカリガラス板の絶縁破壊電圧が高い
ため電流は流れず、ガラス板1には絶縁破壊は発生しな
い。電圧を両電極に印加したままの状態で、次にCO2
レーザー6を0.5秒間照射を行うと照射されたガラス
部分10の表面近傍が局所的に溶解し、瞬時に両電極
3,4間に放電が発生、両電極間のガラスの絶縁破壊が
生じて発生したジュール熱によりガラス部分10が蒸
発、除去され、微細な孔13が形成される。CO2レー
ザー2の照射終了と同時に電圧印加を終了する。ガラス
板1は局部的に高温度になっているので、自然放冷によ
る孔周辺のクラック発生を防止するため、孔が形成され
た直後にガラス板1を徐冷炉に入れて徐冷をおこなっ
た。
Then, a high DC voltage is applied to both electrodes 3, 4. At this time, since the dielectric breakdown voltage of the alkali-free glass plate is high, no current flows, and the glass plate 1 is not broken down. In a state where a voltage is applied to both electrodes, then CO 2
When the laser 6 is irradiated for 0.5 seconds, the vicinity of the surface of the irradiated glass portion 10 is locally melted, and an electric discharge is instantaneously generated between the electrodes 3 and 4, causing a dielectric breakdown of the glass between the electrodes. The glass portion 10 is evaporated and removed by the Joule heat generated as a result, and fine holes 13 are formed. The voltage application is terminated at the same time when the irradiation of the CO 2 laser 2 is terminated. Since the glass plate 1 is locally at a high temperature, in order to prevent the occurrence of cracks around the holes due to spontaneous cooling, the glass plate 1 was placed in an annealing furnace immediately after the holes were formed and gradually cooled.

【0017】CO2 レーザーのビームスポット径600
μm、レーザー出力10Wで、0.5秒の照射でガラス
板1に直径が700μmのストレート形状の貫通孔13
が形成された。またレーザースポット径をその半分の3
00μmにした場合、直径が400μmのストレート形
状の貫通孔が形成された。
Beam spot diameter of CO 2 laser 600
μm, laser power 10 W, straight through hole 13 with a diameter of 700 μm in glass plate 1 by irradiation for 0.5 seconds.
Was formed. Also, the laser spot diameter is half that of 3
When it was set to 00 μm, a straight through hole having a diameter of 400 μm was formed.

【0018】また、孔径を小さくするため、上記CO2
レーザーの代わりにビームスポット径50μmのYAG
レーザーを使用した場合は、直径60μmの貫通孔が形
成された。ただし、YAGレーザーの出力光のガラスへ
の吸収が非常に小さいため、レーザー出力が100Wの
ものを使用した。加熱時間等は前記と同じである。孔形
状はストレートに近く、極端なテーパ形状にはならなか
った。
In order to reduce the pore diameter, the above CO 2
YAG with beam spot diameter of 50 μm instead of laser
When a laser was used, through holes with a diameter of 60 μm were formed. However, since the absorption of the output light of the YAG laser into the glass is very small, a laser output of 100 W was used. The heating time and the like are the same as above. The hole shape was close to straight and did not become an extreme taper shape.

【0019】上記の実施例では、放電用電圧の印加開始
の後にレーザー照射をおこなったが、レーザー照射開始
と同時またはその後に放電電圧に印加してもよい。また
上記の実施例では、放電用電極およびレーザーはそれら
の位置を移動させずに用いたが、まず放電用電極に邪魔
されない状態でレーザーをガラス板面に垂直に所定時間
照射し、照射終了直後(例えば約2秒以内)に、別位置
にあった放電用電極を所定位置に移動させて放電させて
もよい。またレーザーはガラス板片側に配置するだけで
なく、ガラス板の両面側に配置してもよい。特にガラス
板がレーザー光を吸収しやすく、レーザー光照射側のガ
ラス部分の温度よりもその反対側の温度が低い場合に
は、レーザーをガラス板の両面側に配置することが有効
である。
In the above embodiment, the laser irradiation is performed after the application of the discharge voltage is started, but it may be applied to the discharge voltage at the same time as or after the start of the laser irradiation. Further, in the above examples, the discharge electrode and the laser were used without moving their positions, but first, the laser was irradiated perpendicularly to the glass plate surface for a predetermined time without being disturbed by the discharge electrode, and immediately after the irradiation was completed. Within (for example, within about 2 seconds), the discharge electrode, which was located at another position, may be moved to a predetermined position for discharging. The laser may be arranged not only on one side of the glass plate but also on both sides of the glass plate. In particular, when the glass plate easily absorbs the laser light and the temperature of the glass part on the laser light irradiation side is lower than the temperature of the glass part on the opposite side, it is effective to dispose the laser on both sides of the glass plate.

【0020】[0020]

【発明の効果】本発明によれば、従来放電加工で微細孔
あけが困難であった、電気伝導度の低い無アルカリガラ
ス板でも簡便に、テーパ形状でなくストレート形状の微
細な貫通孔をあけることが可能になる。
According to the present invention, it is possible to easily form fine through-holes having a straight shape instead of a taper shape even with an alkali-free glass plate having a low electric conductivity, which has conventionally been difficult to make fine holes by electric discharge machining. It will be possible.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の孔あけ方法の一実施例を示す斜視図FIG. 1 is a perspective view showing an embodiment of a punching method of the present invention.

【図2】図1の要部を拡大して示す側面図FIG. 2 is a side view showing an enlarged main part of FIG.

【図3】従来法を用いた孔あけ方法を示す斜視図FIG. 3 is a perspective view showing a drilling method using a conventional method.

【符号の説明】[Explanation of symbols]

1 : ガラス板 2 : X−Y移動テーブル 3,4 : 棒状電極 6 : CO2レーザー1: Glass plate 2: XY moving table 3, 4: Bar-shaped electrode 6: CO 2 laser

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 ガラス板の両面の対向する位置に設けた
1対の棒状電極に高い電圧を印加して放電させることに
よりガラスを絶縁破壊させるガラス板の孔あけ方法にお
いて、前記電圧の印加前または印加中に、孔があけられ
るべきガラス板部分にレーザー光を照射して照射ガラス
部分を加熱することを特徴とするガラス板の孔あけ方
法。
1. A method of punching a glass plate, wherein a high voltage is applied to a pair of rod-shaped electrodes provided at opposite positions on both sides of a glass plate to cause a dielectric breakdown of the glass plate, and before the application of the voltage. Alternatively, a method for punching a glass plate, characterized in that, during application, the glass plate portion to be punched is irradiated with laser light to heat the irradiated glass portion.
【請求項2】 ガラス板を支持する台、ガラス板を局部
的に加熱するためのレーザー光を照射する手段、1対の
放電用棒状電極および前記棒状電極に高い電圧を供給す
る手段を有することを特徴とするガラス板の孔あけ装
置。
2. A support for supporting the glass plate, means for irradiating a laser beam for locally heating the glass plate, a pair of discharge rod electrodes, and means for supplying a high voltage to the rod electrodes. Glass plate punching device.
JP6955496A 1996-03-26 1996-03-26 Method and device for boring glass plate Pending JPH09255351A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6955496A JPH09255351A (en) 1996-03-26 1996-03-26 Method and device for boring glass plate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6955496A JPH09255351A (en) 1996-03-26 1996-03-26 Method and device for boring glass plate

Publications (1)

Publication Number Publication Date
JPH09255351A true JPH09255351A (en) 1997-09-30

Family

ID=13406083

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6955496A Pending JPH09255351A (en) 1996-03-26 1996-03-26 Method and device for boring glass plate

Country Status (1)

Country Link
JP (1) JPH09255351A (en)

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100693942B1 (en) * 2005-11-28 2007-03-12 케이 이엔지(주) Hole machining method of glass and hole machine
JP2013531380A (en) * 2010-07-02 2013-08-01 ショット アクチエンゲゼルシャフト Interposer and method for generating holes in an interposer
JP2013534510A (en) * 2010-07-02 2013-09-05 ショット アクチエンゲゼルシャフト Method for manufacturing perforated products while stress relaxation
WO2013129165A1 (en) * 2012-02-27 2013-09-06 旭硝子株式会社 Method for producing glass substrate, and glass substrate
JP2013534868A (en) * 2010-07-02 2013-09-09 ショット アクチエンゲゼルシャフト Method and apparatus for making multiple holes in a workpiece
JP2013536089A (en) * 2010-07-02 2013-09-19 ショット アクチエンゲゼルシャフト Formation of micropores
JP2014214036A (en) * 2013-04-24 2014-11-17 旭硝子株式会社 Method for forming through-hole through glass substrate by using laser
JP2015058470A (en) * 2013-09-20 2015-03-30 旭硝子株式会社 Discharge assisted laser hole processing device
JP2016056046A (en) * 2014-09-08 2016-04-21 旭硝子株式会社 Open hole formation method

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100693942B1 (en) * 2005-11-28 2007-03-12 케이 이엔지(주) Hole machining method of glass and hole machine
JP2013531380A (en) * 2010-07-02 2013-08-01 ショット アクチエンゲゼルシャフト Interposer and method for generating holes in an interposer
JP2013534510A (en) * 2010-07-02 2013-09-05 ショット アクチエンゲゼルシャフト Method for manufacturing perforated products while stress relaxation
JP2013534868A (en) * 2010-07-02 2013-09-09 ショット アクチエンゲゼルシャフト Method and apparatus for making multiple holes in a workpiece
JP2013536089A (en) * 2010-07-02 2013-09-19 ショット アクチエンゲゼルシャフト Formation of micropores
US11744015B2 (en) 2010-07-02 2023-08-29 Schott Ag Interposer and method for producing holes in an interposer
WO2013129165A1 (en) * 2012-02-27 2013-09-06 旭硝子株式会社 Method for producing glass substrate, and glass substrate
JP2014214036A (en) * 2013-04-24 2014-11-17 旭硝子株式会社 Method for forming through-hole through glass substrate by using laser
JP2015058470A (en) * 2013-09-20 2015-03-30 旭硝子株式会社 Discharge assisted laser hole processing device
JP2016056046A (en) * 2014-09-08 2016-04-21 旭硝子株式会社 Open hole formation method

Similar Documents

Publication Publication Date Title
JP6552717B2 (en) How to cut a thin glass layer
KR20130127970A (en) Method and devices for creating a multiplicity of holes in workpieces
JP2006513121A (en) Glass plate cutting device {GLASS-PLATECHTINGMACHINE}
JPH09255351A (en) Method and device for boring glass plate
JP5805008B2 (en) Laser processing machine for glass fine hole processing and glass fine hole processing method
JP4684544B2 (en) Method and apparatus for dividing semiconductor wafer formed from silicon
US20140363626A1 (en) Method of manufacturing glass substrate, and glass substrate
JPH11267867A (en) Method and device for laser processing
JP2005118821A (en) Ultrashort pulse laser beam machining method
CN113798666A (en) Method, device, apparatus, storage medium, and electronic device for welding material
JP2005101413A (en) Method and equipment for dividing sheet-like workpiece
KR100381165B1 (en) A Glass Cutting Device and a Method
JP3999999B2 (en) Laser surface processing equipment
JP2002331373A (en) Welding method for aluminum
JP2004058118A (en) Method for piercing ceramic substrate
US9018565B2 (en) Generation of holes using multiple electrodes
JP3615097B2 (en) Combined welding method of laser and arc
JP2004291026A (en) Method and apparatus for drilling hole in brittle material
JPH01185987A (en) Oscillation of pulse laser and apparatus therefor
JPH08112674A (en) Method for cutting off non-conductive body
JP2007175738A (en) Q-switched laser beam-machining method and apparatus
JP2005231035A (en) Method and apparatus for processing fragile material
JPS5937348Y2 (en) Laser processing equipment
CN110695536B (en) Laser processing method
KR100511439B1 (en) Glass-plate cutting machine having a light-mask