JPH09199653A - Method of plating very small area - Google Patents

Method of plating very small area

Info

Publication number
JPH09199653A
JPH09199653A JP547096A JP547096A JPH09199653A JP H09199653 A JPH09199653 A JP H09199653A JP 547096 A JP547096 A JP 547096A JP 547096 A JP547096 A JP 547096A JP H09199653 A JPH09199653 A JP H09199653A
Authority
JP
Japan
Prior art keywords
plating
plate
area
center
opening
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP547096A
Other languages
Japanese (ja)
Inventor
Yoshimaro Tezuka
良麿 手塚
Keisuke Wada
圭介 和田
Shigeki Ogawa
茂樹 小川
Koji Tanaka
幸司 田中
Tadashi Nakano
正 中野
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Metal Mining Co Ltd
Original Assignee
Sumitomo Metal Mining Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Metal Mining Co Ltd filed Critical Sumitomo Metal Mining Co Ltd
Priority to JP547096A priority Critical patent/JPH09199653A/en
Publication of JPH09199653A publication Critical patent/JPH09199653A/en
Pending legal-status Critical Current

Links

Landscapes

  • Chemically Coating (AREA)
  • Lead Frames For Integrated Circuits (AREA)

Abstract

PROBLEM TO BE SOLVED: To plate a very small area part uniformly by forming eccentricity between the center of the opening of an area plate and the center of a nozzle hole. SOLUTION: In the plating of the edge part of a lead frame 6 using an area plate 3 and a nozzle plate, the diameter of a nozzle hole 4 is selected to be 1.0mm to 1.2mm and the eccentricity between the center of the opening part 5 of the area plate 3 and the center 8 of the nozzle hole 4 is set to be 0.1 to 0.4mm. With this, problems that are apt to be caused by the insufficient transition of the flow of plating liquid from viscous flow to turbulent flow and spreading of the plating fluid to the surface of a lead frame 6 when the diameter of the opening part 5 is reduced and the problem that the discharging of the plating liquid from the inside of the opening part 5 is difficult are solved, the turbulent flow of the plating liquid on the surface of lead frame 6 that covers the opening part 5 is promoted and the discharging of the plating liquid from the inside of the opening part 5 becomes easier. As the result of it, the plating to a very small area becomes easier and the uniform plating to the very small area of the diameter of 1.5mm becomes possible.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【発明の属する技術分野】本発明はリードフレームのメ
ッキ方法に関し、特に微小面積のメッキ部への微細メッ
キを可能とする方法に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a lead frame plating method, and more particularly to a method of enabling fine plating on a plated portion having a small area.

【0002】[0002]

【従来の技術】リードフレームは銅材や鉄合金材をプレ
スで打ち抜き、電解脱脂、酸洗などにより表面処理し、
例えば銅メッキを施し、リード先端部に銀メッキを施し
て製品とされる。そして、リード先端部にメッキする場
合には通常リード先端部より0.5〜1.1mmの部分
にメッキを施すのが一般的である。
2. Description of the Related Art Lead frames are made of copper or iron alloy material which is punched with a press and surface-treated by electrolytic degreasing, pickling, etc.
For example, the product is obtained by plating copper and silver-plating the lead tips. When the lead tip portion is plated, it is common to plate the portion 0.5 to 1.1 mm from the lead tip portion.

【0003】このようなリードフレームの一種にリード
・オン・チップ タイプや高密度タイプのリードフレー
ムがある。これらのリードフレームは複雑な構造をして
おり、微小かつ多段、多列のメッキエリアが設定されて
いることでメッキ効率が低下し、生産性に影響を与えて
いる。
One of such lead frames is a lead-on-chip type or high-density type lead frame. These lead frames have a complicated structure, and the plating areas are set in small, multi-stage, and multi-row, so that the plating efficiency is reduced and the productivity is affected.

【0004】従来、これらの微小エリアメッキは図1に
示されるような複数のメッキ液噴出ノズル1を設けたノ
ズル板2を用い、図2に示すようにエリアプレート3と
ノズル板2とを組み合わせ、エリアプレート上面に被メ
ッキ物であるリードフレームを設置し、ノズル穴4より
メッキ液を噴出させることにより行われている。なお、
エリアプレートの開口部5は被メッキ物であるリードフ
レーム6に合わせ、設計されている。そして開口部の中
心7とノズル穴の中心8とが重なるように配置されてい
る。
Conventionally, such fine area plating uses a nozzle plate 2 provided with a plurality of plating solution jetting nozzles 1 as shown in FIG. 1, and combines an area plate 3 and a nozzle plate 2 as shown in FIG. A lead frame, which is the object to be plated, is installed on the upper surface of the area plate, and the plating solution is ejected from the nozzle holes 4. In addition,
The opening 5 of the area plate is designed in accordance with the lead frame 6 that is the object to be plated. The center 7 of the opening and the center 8 of the nozzle hole are arranged to overlap.

【0005】[0005]

【発明が解決しようとする課題】ところで、近年、リー
ドの高密度化が構造の複雑化が一層要求されるようにな
り、例えばリード間隔ばかりでなくリード自体の幅も、
90〜200ミクロンと狭くなってきている。このよう
なリード幅の狭いリードフレーム先端部の所望部にのみ
直径1.5mm程度の微小面積部のメッキを施すために
上記図2の従来のエリアプレート3とノズル板2とを用
いてリード先端部にメッキを施そうとするとメッキむら
が多発し、収率が大幅に低下するという問題点がある。
By the way, in recent years, it has been required to increase the density of the leads and to make the structure more complicated. For example, not only the lead interval but also the width of the lead itself is required.
It is becoming as narrow as 90 to 200 microns. In order to plate a small area portion having a diameter of about 1.5 mm only on a desired portion of the lead frame tip portion having such a narrow lead width, the lead tip is formed by using the conventional area plate 3 and nozzle plate 2 shown in FIG. There is a problem that if plating is applied to a portion, uneven plating frequently occurs and the yield is significantly reduced.

【0006】本発明はこのような状況を打破するために
開発されたものであり、直径1.5mm程度の微小面積
部にむらなくメッキを施す方法の提供を課題とする。
The present invention was developed in order to overcome such a situation, and an object thereof is to provide a method for uniformly plating a small area having a diameter of about 1.5 mm.

【0007】[0007]

【課題を解決するための手段】上記課題を解決する本発
明の方法は、エリアプレートとノズル板とを用いてリー
ドフレーム先端部にメッキを施す方法において、エリア
プレートの開口部中心とノズル穴の中心とを偏芯させる
ものである。
The method of the present invention for solving the above-mentioned problems is a method of plating the lead frame tip end portion by using an area plate and a nozzle plate. The center is eccentric.

【0008】そして、本発明の方法は特に、ノズル穴の
直径が1.0〜1.2mmの場合にエリアプレートの開
口部中心とノズル穴の中心とを0.1〜0.4mm偏芯
させると有効である。
In the method of the present invention, particularly, when the diameter of the nozzle hole is 1.0 to 1.2 mm, the center of the opening of the area plate and the center of the nozzle hole are eccentric by 0.1 to 0.4 mm. And is effective.

【0009】[0009]

【発明の実施の形態】ノズル穴より噴出されるメッキ液
はエリアプレート開口部内を上昇し、被メッキ物である
リードフレームに当たり、リードフレーム表面に拡散
し、ついでエリアプレート開口部内を落下し、排出され
る。この開口部内を上昇するメッキ液は層流であるが、
リードフレーム表面に衝突することにより乱流に変化す
る。そして、開口部を覆うリードフレーム面全面にメッ
キ液が拡散することになる。
BEST MODE FOR CARRYING OUT THE INVENTION The plating liquid ejected from a nozzle hole rises in the area plate opening, hits the lead frame which is the object to be plated, diffuses on the lead frame surface, and then drops in the area plate opening and is discharged To be done. The plating liquid rising in this opening is laminar,
When it collides with the surface of the lead frame, it becomes turbulent. Then, the plating solution diffuses over the entire surface of the lead frame that covers the opening.

【0010】しかし、開口部の直径が小さくなるに従い
メッキ液の層流から乱流への転換、リードフレーム面へ
の拡散が不十分になり、結果的にメッキむらが発生しや
すくなる。加えて開口部内よりのメッキ液の排出が困難
となり、これもメッキむら発生の一因となっている。
However, as the diameter of the opening becomes smaller, the conversion of the plating solution from a laminar flow to a turbulent flow and the diffusion to the lead frame surface become insufficient, resulting in uneven plating. In addition, it becomes difficult to discharge the plating liquid from the inside of the opening, which also causes uneven plating.

【0011】本発明の方法において、エリアプレートの
開口部中心とノズル穴の中心とを偏芯させるのは、一つ
には開口部を覆うリードフレーム表面でのメッキ液の乱
流化を助長するためであり、一つには開口部内のメッキ
液に流れを形成させ、開口部内よりのメッキ液の排出を
容易化させるためである。以下実施例で本発明を説明す
る。
In the method of the present invention, the eccentricity of the center of the opening of the area plate and the center of the nozzle hole promotes turbulence of the plating solution on the surface of the lead frame covering the opening. This is because, in part, a flow is formed in the plating solution in the opening to facilitate discharge of the plating solution from the opening. Hereinafter, the present invention will be described with reference to examples.

【0012】[0012]

【実施例】次に実施例を用いて本発明をさらに説明す
る。
Next, the present invention will be further described with reference to examples.

【0013】(実施例1)図1と同様の複数のメッキ液
噴出ノズル1を設けたノズル板2を用い、図3に示すよ
うにエリアプレート3の上面に被メッキ物であるリード
フレームを設置し、ノズル穴4よりメッキ液を噴出させ
て20ピース/1連の長尺品のメッキを行った。
(Embodiment 1) A nozzle plate 2 provided with a plurality of plating solution jetting nozzles 1 similar to that shown in FIG. 1 is used, and a lead frame, which is an object to be plated, is set on the upper surface of an area plate 3 as shown in FIG. Then, the plating solution was ejected from the nozzle hole 4 to plate a long piece of 20 pieces / 1 series.

【0014】この際、エリア開口部の直径を0.3〜
2.0mmと変化させ、ノズル穴の直径を1.0mmと
し、エリア開口部中心とノズル穴中心とを0.2mmず
らして図3のように設置した。また、エリア開口部中心
とノズル穴中心のずらし量を0.0mm、(ずらさない
もの)のメッキも行った。
At this time, the diameter of the area opening is 0.3 to
The diameter of the nozzle hole was changed to 2.0 mm, the diameter of the nozzle hole was set to 1.0 mm, and the center of the area opening portion and the center of the nozzle hole were displaced by 0.2 mm, and they were installed as shown in FIG. In addition, the amount of displacement between the center of the area opening portion and the center of the nozzle hole was 0.0 mm, and plating was performed without displacement.

【0015】使用メッキ液は、Ag60〜70g/リッ
トル、pH7.8〜8.3のものを温度65℃で用い
た。
The plating solution used was Ag of 60 to 70 g / liter and pH of 7.8 to 8.3 at a temperature of 65 ° C.

【0016】長尺品の素材は銅合金材であり、板厚は
0.15mm、ピン数は64本、リード幅は90ミクロ
ンである。
The material of the long product is a copper alloy material, the plate thickness is 0.15 mm, the number of pins is 64, and the lead width is 90 microns.

【0017】液噴き揚げポンプは市販の縦型マグネット
ポンプ((株)ワールドケミカル社製YD65LC−
E)を用いた。
The liquid jet pump is a commercially available vertical magnet pump (YD65LC- manufactured by World Chemical Co., Ltd.).
E) was used.

【0018】得られた結果を表1に示した。The results obtained are shown in Table 1.

【0019】 表1より、ノズル穴の直径を1.0mmとした場合、エ
リア開口部の直径が0.4〜1.8mmの範囲であれば
本発明の方法が有効であることがわかる。
[0019] From Table 1, it can be seen that when the diameter of the nozzle hole is 1.0 mm, the method of the present invention is effective when the diameter of the area opening is in the range of 0.4 to 1.8 mm.

【0020】(実施例2)エリア開口部の直径を1.4
mmとし、ノズル穴の直径を1.0mmとし、エリア開
口部中心とノズル穴中心とを0〜0.5mmずらした以
外は実施例1と同様にしてメッキを行った。
(Embodiment 2) The diameter of the area opening is set to 1.4.
mm, the diameter of the nozzle hole was 1.0 mm, and the plating was performed in the same manner as in Example 1 except that the center of the area opening and the center of the nozzle hole were offset by 0 to 0.5 mm.

【0021】得られた結果を表2に示した。The results obtained are shown in Table 2.

【0022】 表2よりエリア開口部中心とノズル穴中心とを0.1〜
0.4mmずらすと良い結果が得られることがわかる。
[0022] From Table 2, the area opening center and the nozzle hole center are 0.1
It can be seen that a good result is obtained by shifting by 0.4 mm.

【0023】(実施例3)長尺品の素材を鉄合金材、板
厚0.25mm、ピン数24本、リード幅200ミクロ
ンとした以外は実施例1と同様にしてメッキを行った。
(Example 3) Plating was performed in the same manner as in Example 1 except that the material of the long product was an iron alloy material, the plate thickness was 0.25 mm, the number of pins was 24, and the lead width was 200 microns.

【0024】得られた結果は実施例1と同様であった。The results obtained were similar to those of Example 1.

【0025】[0025]

【発明の効果】本発明の方法に従えば、エリア開口部内
での液の乱流化とメッキ液の排出が確実になり、その結
果微細メッキが容易に可能であり、かつむらの発生は防
止できる。
According to the method of the present invention, the turbulence of the liquid and the discharge of the plating liquid in the area opening are surely achieved, and as a result, the fine plating can be easily performed and the occurrence of unevenness is prevented. it can.

【図面の簡単な説明】[Brief description of drawings]

【図1】従来の微小エリアメッキに用いられるノズル板
の外観図である。
FIG. 1 is an external view of a nozzle plate used for conventional minute area plating.

【図2】従来の微小エリアメッキに用いられるエリアプ
レートとノズル板との位置関係を示した図である。
FIG. 2 is a diagram showing a positional relationship between an area plate and a nozzle plate used for conventional minute area plating.

【図3】本発明の微細エリアメッキに用いるエリアプレ
ートとノズル板との位置関係を示した図である。
FIG. 3 is a diagram showing a positional relationship between an area plate used for fine area plating of the present invention and a nozzle plate.

【符号の説明】[Explanation of symbols]

1−−−メッキ液噴出ノズル 2−−−ノズル板 3−−−エリアプレート 4−−−ノズル穴 5−−−エリアプレートの開口部 6−−−リードフレーム 7−−−開口部の中心 8−−−ノズル穴の中心 1 --- Plating liquid jet nozzle 2 ---- Nozzle plate 3 --- Area plate 4 --- Nozzle hole 5 ---- Area plate opening 6 --- Lead frame 7 --- Center of opening 8 −−− Nozzle hole center

───────────────────────────────────────────────────── フロントページの続き (72)発明者 田中 幸司 東京都青梅市末広町1−6−1 住友金属 鉱山株式会社電子事業本部内 (72)発明者 中野 正 東京都青梅市末広町1−6−1 住友金属 鉱山株式会社電子事業本部内 ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Inventor Koji Tanaka 1-6-1 Suehiro-cho, Ome-shi, Tokyo Sumitomo Metal Mining Co., Ltd. Electronic Business Division (72) Inventor Tadashi Nakano 1-6 Suehiro-cho, Ome-shi, Tokyo -1 Sumitomo Metal Mining Co., Ltd. Electronic Business Division

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 エリアプレートとノズル板とを用いて
リードフレーム先端部にメッキを施す方法において、エ
リアプレートの開口部中心とノズル穴の中心とを偏芯さ
せることを特徴とする微細エリアメッキ方法。
1. A fine area plating method in which a center of an opening of a area plate and a center of a nozzle hole are eccentric in a method of plating a lead frame front end using an area plate and a nozzle plate. .
【請求項2】 ノズル穴の直径を1.0〜1.2mm
とし、エリアプレートの開口部中心とノズル穴の中心と
を0.1〜0.4mm偏芯させることを特徴とする請求
項1記載の微細エリアメッキ方法。
2. The diameter of the nozzle hole is 1.0 to 1.2 mm
The fine area plating method according to claim 1, wherein the center of the opening of the area plate and the center of the nozzle hole are decentered by 0.1 to 0.4 mm.
JP547096A 1996-01-17 1996-01-17 Method of plating very small area Pending JPH09199653A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP547096A JPH09199653A (en) 1996-01-17 1996-01-17 Method of plating very small area

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP547096A JPH09199653A (en) 1996-01-17 1996-01-17 Method of plating very small area

Publications (1)

Publication Number Publication Date
JPH09199653A true JPH09199653A (en) 1997-07-31

Family

ID=11612139

Family Applications (1)

Application Number Title Priority Date Filing Date
JP547096A Pending JPH09199653A (en) 1996-01-17 1996-01-17 Method of plating very small area

Country Status (1)

Country Link
JP (1) JPH09199653A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20140098693A (en) * 2013-01-31 2014-08-08 히다치 조센 가부시키가이샤 Vacuum evaporation apparatus and vacuum evaporation method

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20140098693A (en) * 2013-01-31 2014-08-08 히다치 조센 가부시키가이샤 Vacuum evaporation apparatus and vacuum evaporation method

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