JPH02153100A - Barrel plating device - Google Patents
Barrel plating deviceInfo
- Publication number
- JPH02153100A JPH02153100A JP30419788A JP30419788A JPH02153100A JP H02153100 A JPH02153100 A JP H02153100A JP 30419788 A JP30419788 A JP 30419788A JP 30419788 A JP30419788 A JP 30419788A JP H02153100 A JPH02153100 A JP H02153100A
- Authority
- JP
- Japan
- Prior art keywords
- cathode
- barrel body
- plated
- current
- anode
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000007747 plating Methods 0.000 title claims abstract description 27
- 239000000956 alloy Substances 0.000 abstract description 8
- 229910045601 alloy Inorganic materials 0.000 abstract description 8
- 239000000203 mixture Substances 0.000 abstract description 7
- 239000011347 resin Substances 0.000 abstract description 3
- 229920005989 resin Polymers 0.000 abstract description 3
- 239000000463 material Substances 0.000 abstract 4
- 230000009286 beneficial effect Effects 0.000 description 1
- 239000012141 concentrate Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000009713 electroplating Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000005204 segregation Methods 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
Landscapes
- Electroplating Methods And Accessories (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は、電気めっきに使用されるバレルめっき装置に
関するものである。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a barrel plating apparatus used for electroplating.
一般に使用されているバレルめっき装置は、壁面に多数
の小孔を開け、めっき液の流通を良くした樹脂製の有孔
バレル本体の内部に、陰極となるコンタクトを備え、こ
の有孔バレル本体内に収容されてこのコンタクトに接し
た被めっき物に、有孔バレル本体の外側のめっき液中に
設置された陽極から電流を供給し、有孔バレル本体を回
転又は揺動させながらめっきを行うものである。Commonly used barrel plating equipment has a perforated barrel body made of resin with many small holes in the wall to improve the flow of the plating solution, and is equipped with a contact that serves as a cathode inside the perforated barrel body. A device that supplies current to the object to be plated that is housed in the chamber and comes into contact with the contact from an anode installed in the plating solution outside the perforated barrel body, and performs plating while rotating or swinging the perforated barrel body. It is.
しかしながら、前記従来のバレルめっき装置では、有孔
バレル本体内の陰極コンタクトから離れた被めっき物等
に電流の断続が起き、被めっき物の一部がバイポーラ現
象により酸化、溶解し、めっきを続けると密着不良を生
じ、合金めっきでは合金組成に偏析を生ずることが多か
った。However, in the conventional barrel plating equipment, the current is interrupted in the object to be plated that is away from the cathode contact in the perforated barrel body, and a part of the object to be plated is oxidized and dissolved due to bipolar phenomenon, and plating continues. This causes poor adhesion, and alloy plating often causes segregation in the alloy composition.
また、電流は有孔バレル本体に開けられた小孔を通して
流れるので、小孔に接している被めっき物に電流が集中
し、バレル跡と称されるめっき焼けが生じ、さらに被め
っき物群の中心部には電流が到達し難いため、被めっき
物の陰極を流密度に極めて大きな差が生じ、めっき膜厚
や合金組成にムラを生じるという問題があった。In addition, since the current flows through the small holes drilled in the perforated barrel body, the current concentrates on the objects to be plated that are in contact with the holes, causing plating burns called barrel marks, and further damaging the objects to be plated. Since it is difficult for the current to reach the center, there is a problem in that extremely large differences occur in the current density at the cathode of the object to be plated, resulting in unevenness in the plating film thickness and alloy composition.
本発明は、このような従来のバレルめっき装置の問題点
を解決し、有孔バレル本体内での被めっき物に対する電
流の断続をなくし、電流密度を高くかつ均一たらしめ、
極めて良質なめっき製品を得ることができる、生産性の
高いバレルめっき装置を提供することを目的とするもの
である。The present invention solves the problems of the conventional barrel plating apparatus, eliminates the interruption of current to the object to be plated within the perforated barrel body, and makes the current density high and uniform.
The object of the present invention is to provide a highly productive barrel plating device that can produce extremely high-quality plated products.
本発明は、有孔バレル本体内に陽極と陰極を配備したこ
とを特徴とするバレルめっき装置であり、さらに前記陰
極を導電性の網状体とし、該網状体を有孔バレル本体内
壁に沿って配備したことをも特徴とするものである。The present invention is a barrel plating apparatus characterized in that an anode and a cathode are provided in a perforated barrel body, and further, the cathode is a conductive net-like body, and the net-like body is arranged along the inner wall of the perforated barrel body. It is also characterized by the fact that it has been deployed.
本発明では、有孔バレル本体内に陽極と陰極を共に配備
しであるため、電流は従来のように有孔バレル本体壁面
の小孔を経由することな(、陽極から陰極へ直接流れる
から、従来よくみられるバレル跡は生ぜず、被めっき物
群の中心部にも電流が到達しやすく、被めっき物へ流れ
る電流密度は均一となり、めっき膜厚1合金組成などの
ムラのないめっき製品を得ることができる。また、陽極
と陰極の極間距離が短いから、浴電圧が低く、電気エネ
ルギーのロスも少なくなる。In the present invention, since both the anode and the cathode are provided in the perforated barrel body, the current does not pass through the small hole in the wall of the perforated barrel body (as it flows directly from the anode to the cathode). Barrel marks that are commonly seen in the past do not occur, the current can easily reach the center of the object to be plated, and the current density flowing to the object to be plated is uniform, making it possible to achieve even plating products such as plating film thickness of 1 alloy composition. Furthermore, since the distance between the anode and cathode is short, the bath voltage is low and the loss of electrical energy is also reduced.
また、陰極を導電性の網状体としてこれを有孔バレル本
体内壁に沿って配備すれば、陰極の面積が広くなって被
めっき物との接触が良好になり、従来のものより陰極電
流密度を高くすることが可能となり、被めっき物群全体
に電流が流れ、被めっき物への電流の断続がなくなり、
被めっき物にバイポーラ現象などは生ずることがない。In addition, if the cathode is made of a conductive net and is placed along the inner wall of the perforated barrel body, the area of the cathode becomes wider and the contact with the object to be plated becomes better, resulting in a higher cathode current density than the conventional one. This allows current to flow through the entire group of objects to be plated, eliminating intermittent current flow to the objects to be plated.
Bipolar phenomenon does not occur in the plated object.
本発明の実施例を図面を参照しながら説明すれば、1は
槽2内に満たされためっき液中に浸漬され、回転(第1
図参照)又は反転揺動(第2図参照)する従来同様の樹
脂製の有孔バレル本体であって、壁面にはめっき液の流
通を良くするための多くの小孔が開けられている。有孔
バレル本体l内には陽極3と陰極が共に配備されており
、陰極としては従来の陰極コンタクトと同様のものとす
ることができるが、図示例のように導電性の綱4、例え
ば鉄、ステンレス、ti4等の金属製のw44を陰極と
し、この陰極たる綱4を有孔バレル本体1の内壁に沿っ
て張り付けることができる。An embodiment of the present invention will be described with reference to the drawings. 1 is immersed in a plating solution filled in a tank 2 and rotated (first
It is a perforated barrel body made of resin similar to the conventional art which can be rotated (see figure) or reversely oscillated (see figure 2), and has many small holes in the wall surface to improve the circulation of the plating solution. Both an anode 3 and a cathode are arranged in the perforated barrel body l, and the cathode can be similar to a conventional cathode contact, but as shown in the example, a conductive wire 4, e.g. , stainless steel, TI4, or the like is used as a cathode, and the rope 4 serving as the cathode can be attached along the inner wall of the perforated barrel body 1 .
図中、5は有孔バレル本体1内の被めっき物を示す。In the figure, 5 indicates an object to be plated inside the perforated barrel body 1.
しかして、有孔バレル本体l内に収容された被めっき物
5は、有孔バレル本体1を回転(第1図)又は180°
反転、揺動(第2図)させながらめっき液の流通を良く
し、陽極3と陰極間に通電することによってめっきされ
る。この時、電流は陽極3から陰極へ直接流れることに
なり、従来のバレル跡は発生せず、中心部の被めっき物
5にも電流が到達しやすく、被めっき物5の陰極電流密
度も均一となり、めっき膜厚5合金組成などのムラのな
い外観も良好なめき製品を得ることができ、しかも陽極
3と陰極との極間距離が短いから、浴電圧が低く、電気
エネルギーのロスも少ない。Thus, the object to be plated 5 housed in the perforated barrel body 1 is rotated (FIG. 1) or 180° by the perforated barrel body 1.
Plating is performed by inverting and rocking (Fig. 2) to improve the flow of the plating solution, and by passing current between the anode 3 and the cathode. At this time, the current flows directly from the anode 3 to the cathode, and the conventional barrel mark does not occur, the current easily reaches the object to be plated 5 in the center, and the cathode current density of the object to be plated 5 is also uniform. Therefore, it is possible to obtain a plated product with a good appearance and no unevenness such as a plating film thickness of 5 alloy composition, and because the distance between the anode 3 and the cathode is short, the bath voltage is low and there is little loss of electrical energy. .
さらに、陰極を導電性の!144として有孔バレル本体
1の内壁に沿って張り付けた時は、陰極の面積が広くな
り、陰極たる網4と被めっき物5との接触が良好になり
、陰極電流密度を高くとることができ、被めっき物5全
体に電流が流れ、電流の断続がなくなりバイポーラ現象
などが生ずることがなく、また被めっき物5と5li1
4との間に摩擦を生じて被めっき物が良く攪拌され、め
っき膜厚のバラツキがさらに少なくなる。Furthermore, the cathode is conductive! When attached along the inner wall of the perforated barrel body 1 as 144, the area of the cathode becomes larger, and the contact between the net 4 serving as the cathode and the object to be plated 5 is improved, and a high cathode current density can be achieved. , the current flows throughout the object to be plated 5, there is no intermittent current, no bipolar phenomenon occurs, and the object to be plated 5 and 5li1
4, the object to be plated is well agitated, further reducing variations in the thickness of the plated film.
以上述べたように本発明によれば、次に列挙するような
極めて有益な効果を生ずる。As described above, according to the present invention, extremely beneficial effects as listed below are produced.
■ 有孔バレル本体内で電流が陽極から陰極へ直接流れ
るから、電流を高くしても従来のようなバレル跡は全(
発生しない。■ Current flows directly from the anode to the cathode inside the perforated barrel body, so even if the current is high, there are no barrel marks like in the past (
Does not occur.
■ 被めっき物群の中心部にも電流が流れやすく、被め
っき物の電流密度のバラツキが少ないので、合金組成の
変動も少なく、めっき膜厚2合金組成とも均一なめっき
製品を得ることができる。■ Current flows easily in the center of the group of objects to be plated, and there is little variation in the current density of the objects to be plated, so there is little variation in alloy composition, and it is possible to obtain plated products with uniform plating film thickness and both alloy compositions. .
■ 陽極と陰極との極間距離が短いので、浴電圧が低く
、電気ロスが少ない。■ Because the distance between the anode and cathode is short, the bath voltage is low and there is little electrical loss.
■ 陰極を網状体として有孔バレル本体内壁に配備した
時は、陰極面積が広(なり、かつ被めっき物との接触が
良好になり、陰極電流密度を高くすることが可能となり
、被めっき物全体に電流が流れ、バイポーラを生ずるこ
となく、生産性も高くなる。■ When the cathode is arranged in the form of a mesh on the inner wall of the perforated barrel body, the cathode area is wide (and the contact with the object to be plated is good, the cathode current density can be increased, and the object to be plated is Current flows throughout, eliminating bipolar conditions and increasing productivity.
第1図及び第2図は本発明の実施例を示す切断説明図で
ある。
l・・・有孔バレル本体、2・・・槽、3・・・陽極、
4・・・網、5・・・被めっき物。
第1FIGS. 1 and 2 are cutaway views showing an embodiment of the present invention. l... Perforated barrel body, 2... Tank, 3... Anode,
4... Net, 5... Item to be plated. 1st
Claims (2)
特徴とするバレルめっき装置。(1) A barrel plating device characterized by having an anode and a cathode arranged inside a perforated barrel body.
バレル本体内壁に沿って配備したものである請求項1記
載のバレルめっき装置。(2) The barrel plating apparatus according to claim 1, wherein the cathode is a conductive net-like body, and the net-like body is arranged along the inner wall of the perforated barrel body.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP30419788A JPH02153100A (en) | 1988-12-02 | 1988-12-02 | Barrel plating device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP30419788A JPH02153100A (en) | 1988-12-02 | 1988-12-02 | Barrel plating device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH02153100A true JPH02153100A (en) | 1990-06-12 |
Family
ID=17930188
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP30419788A Pending JPH02153100A (en) | 1988-12-02 | 1988-12-02 | Barrel plating device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH02153100A (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2009235486A (en) * | 2008-03-27 | 2009-10-15 | Tdk Corp | Barrel plating apparatus |
WO2011049086A1 (en) * | 2009-10-19 | 2011-04-28 | ディップソール株式会社 | Barrel plating device |
WO2011049066A1 (en) * | 2009-10-19 | 2011-04-28 | ディップソール株式会社 | Method of barrel electroplating with aluminum or aluminum alloy |
JP2011084799A (en) * | 2009-10-19 | 2011-04-28 | Dipsol Chemicals Co Ltd | Zinc or zinc alloy barrel electroplating method |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5690998A (en) * | 1979-12-21 | 1981-07-23 | Fujitsu Ltd | Barrel plating apparatus |
JPS5731154U (en) * | 1980-07-31 | 1982-02-18 | ||
JPS6089599A (en) * | 1983-10-21 | 1985-05-20 | Seikosha Co Ltd | Barrel device for barrel plating |
-
1988
- 1988-12-02 JP JP30419788A patent/JPH02153100A/en active Pending
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5690998A (en) * | 1979-12-21 | 1981-07-23 | Fujitsu Ltd | Barrel plating apparatus |
JPS5731154U (en) * | 1980-07-31 | 1982-02-18 | ||
JPS6089599A (en) * | 1983-10-21 | 1985-05-20 | Seikosha Co Ltd | Barrel device for barrel plating |
Cited By (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2009235486A (en) * | 2008-03-27 | 2009-10-15 | Tdk Corp | Barrel plating apparatus |
WO2011049086A1 (en) * | 2009-10-19 | 2011-04-28 | ディップソール株式会社 | Barrel plating device |
WO2011049066A1 (en) * | 2009-10-19 | 2011-04-28 | ディップソール株式会社 | Method of barrel electroplating with aluminum or aluminum alloy |
JP2011084799A (en) * | 2009-10-19 | 2011-04-28 | Dipsol Chemicals Co Ltd | Zinc or zinc alloy barrel electroplating method |
JP2011084797A (en) * | 2009-10-19 | 2011-04-28 | Dipsol Chemicals Co Ltd | Barrel plating apparatus |
JP2011084798A (en) * | 2009-10-19 | 2011-04-28 | Dipsol Chemicals Co Ltd | Method of barrel electroplating with aluminum or aluminum alloy |
CN102575375A (en) * | 2009-10-19 | 2012-07-11 | 迪普索尔化学株式会社 | Method of barrel electroplating with aluminum or aluminum alloy |
US20120205249A1 (en) * | 2009-10-19 | 2012-08-16 | Honda Motor Co., Ltd. | Aluminum or Aluminum Alloy Barrel Electroplating Method |
US8916039B2 (en) * | 2009-10-19 | 2014-12-23 | Dipsol Chemicals Co., Ltd. | Aluminum or aluminum alloy barrel electroplating method |
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