JPH0919806A - Cutting tool covered with hard layer - Google Patents
Cutting tool covered with hard layerInfo
- Publication number
- JPH0919806A JPH0919806A JP19124195A JP19124195A JPH0919806A JP H0919806 A JPH0919806 A JP H0919806A JP 19124195 A JP19124195 A JP 19124195A JP 19124195 A JP19124195 A JP 19124195A JP H0919806 A JPH0919806 A JP H0919806A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- hard layer
- coated
- ticn
- cutting tool
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Abstract
Description
【０００１】[0001]
【発明の属する技術分野】この発明は、特に湿式フライ
ス切削、エンドミル切削などの転削加工に対して優れた
切削性能を示す硬質層被覆切削工具に関するものであ
る。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a hard layer-coated cutting tool which exhibits excellent cutting performance particularly for rolling such as wet milling and end mill cutting.
【０００２】[0002]
【従来の技術】一般に、ＷＣを主成分とするＷＣ基超硬
合金からなる基体（以下、ＷＣ基超硬合金基体という）
またはＴｉＣＮを主成分とするサーメットからなる基体
（以下、ＴｉＣＮ基サーメット基体という）の表面に、
（Ｔｉ0.5 Ｓｉ0.5 ）Ｃの硬質層を被覆してなる硬質層
被覆切削工具は知られている（特開平１−３０６５５０
号公報参照）。2. Description of the Related Art Generally, a substrate made of WC-based cemented carbide containing WC as a main component (hereinafter referred to as WC-based cemented carbide substrate).
Alternatively, on the surface of a base body composed of cermet containing TiCN as a main component (hereinafter referred to as TiCN base cermet base body),
A hard layer-coated cutting tool obtained by coating a hard layer of (Ti 0.5 Si 0.5 ) C is known (JP-A-1-306550).
Reference).
【０００３】[0003]
【発明が解決しようとする課題】しかし、前記従来の
（Ｔｉ0.5 Ｓｉ0.5 ）Ｃ硬質層を被覆した硬質層被覆切
削工具は、湿式フライス切削、エンドミル切削などの転
削加工に用いた場合に耐熱衝撃性および耐欠損性が十分
でなく、したがって、満足のいく工具寿命が得られてい
ない。However, the above-mentioned conventional hard-layer-coated cutting tool coated with a (Ti 0.5 Si 0.5 ) C hard layer is heat-resistant when used for rolling such as wet milling and end mill cutting. The impact resistance and fracture resistance are not sufficient, so that a satisfactory tool life is not obtained.
【０００４】[0004]
【課題を解決するための手段】そこで、本発明者は、上
述のような課題を解決し、湿式フライス切削、エンドミ
ル切削などの転削加工に用いた場合にも一層の長寿命を
示す硬質層被覆切削工具を得るべく研究を行った結果、
（ａ）ＷＣ基超硬合金基体またはＴｉＣＮ基サーメット
基体の表面に、ＴｉＣ、ＴｉＣＮ、ＴｉＮの内の１種の
単層または２種以上の複層を介して、（Ｔｉ1-x Ｓ
ｉx ）（Ｃ1-y Ｎy ）z ［ただし、0.55≦ｘ≦0.99、0.
01≦ｙ≦1.0 、0.5≦ｚ≦1.34］からなる組成のＴｉと
Ｓｉの複合炭窒化物硬質層および／または複合窒化物硬
質層を被覆してなる硬質層被覆切削工具は、湿式フライ
ス切削、エンドミル切削などの転削加工に用いた場合に
従来よりも一層耐熱衝撃性および耐欠損性に優れ、した
がって工具寿命が長くなる、（ｂ）前記（ａ）の硬質層
被覆切削工具の（Ｔｉ1-x Ｓｉx ）（Ｃ1-y Ｎy ）
z ［ただし、0.55≦ｘ≦0.99、0.01≦ｙ≦1.0 、0.5 ≦
ｚ≦1.34］からなる組成のＴｉとＳｉの複合炭窒化物硬
質層および／または複合窒化物硬質層の上に、さらにＴ
ｉＮ層を被覆してもよい、（ｃ）前記ＴｉＣ、ＴｉＣ
Ｎ、ＴｉＮの内の１種の単層または２種以上の複層の厚
さは０．１〜３．０μｍの範囲内にあり、（Ｔｉ1-x Ｓ
ｉx ）（Ｃ1-y Ｎy）z ［ただし、0.55≦ｘ≦0.99、0.0
1≦ｙ≦1.0 、0.5 ≦ｚ≦1.34］からなる組成のＴｉと
Ｓｉの複合炭窒化物硬質層および／または複合窒化物硬
質層の厚さは１．０〜１０μｍの範囲内にあり、ＴｉＮ
層の厚さは０．１〜１．０μｍの範囲内にあり、さらに
これら硬質層の合計の厚さは１．５〜１２．０μｍの範
囲内にあることが好ましい、という知見を得たのであ
る。Therefore, the present inventor has solved the above-mentioned problems and has a hard layer exhibiting a longer life even when used for rolling such as wet milling cutting and end mill cutting. As a result of research to obtain coated cutting tools,
(A) On the surface of a WC-based cemented carbide substrate or a TiCN-based cermet substrate, one of TiC, TiCN, and TiN is used to form (Ti 1-x S
i x ) (C 1-y N y ) z [where 0.55 ≦ x ≦ 0.99, 0.
01 ≤ y ≤ 1.0, 0.5 ≤ z ≤ 1.34] Ti and Si composite carbonitride hard layer and / or hard layer coated cutting tool coated with a composite nitride hard layer are wet milling cutting, When it is used for rolling such as end mill cutting, it is more excellent in thermal shock resistance and fracture resistance than conventional ones, and therefore has a longer tool life. (B) The hard layer-coated cutting tool of (a) (Ti 1 -x Si x) (C 1- y N y)
z [However, 0.55≤x≤0.99, 0.01≤y≤1.0, 0.5≤
z ≦ 1.34] on the composite carbonitride hard layer of Ti and Si and / or the composite nitride hard layer, and further T
iN layer may be coated, (c) TiC, TiC
The thickness of one type of single layer or two or more types of multilayers of N and TiN is in the range of 0.1 to 3.0 μm, and (Ti 1-x S
i x ) (C 1-y N y ) z [where 0.55 ≦ x ≦ 0.99, 0.0
1 ≦ y ≦ 1.0, 0.5 ≦ z ≦ 1.34], the thickness of the composite carbonitride hard layer of Ti and Si and / or the composite nitride hard layer is within the range of 1.0 to 10 μm.
It was found that the layer thickness is preferably in the range of 0.1 to 1.0 μm, and the total thickness of these hard layers is preferably in the range of 1.5 to 12.0 μm. is there.
【０００５】この発明は、かかる知見にもとづいてなさ
れたものであって、（１） ＷＣ基超硬合金基体または
ＴｉＣＮ基サーメット基体表面に、ＴｉＣ、ＴｉＣＮ、
ＴｉＮの内の１種の単層または２種以上の複層を介し
て、（Ｔｉ1-x Ｓｉx ）（Ｃ1-y Ｎy ）z ［ただし、0.
55≦ｘ≦0.99、0.01≦ｙ≦1.0 、0.5≦ｚ≦1.34］から
なる組成のＴｉとＳｉの複合炭窒化物硬質層および／ま
たは複合窒化物硬質層を被覆してなる硬質層被覆切削工
具、（２） ＷＣ基超硬合金基体またはＴｉＣＮ基サー
メット基体表面に形成されたＴｉＣ、ＴｉＣＮ、ＴｉＮ
の内の１種の単層または２種以上の複層の厚さは０．１
〜３．０μｍの範囲内にあり、（Ｔｉ1-x Ｓｉx ）（Ｃ
1-y Ｎy ）z ［ただし、0.55≦ｘ≦0.99、0.01≦ｙ≦1.
0 、0.5 ≦ｚ≦1.34］からなる組成のＴｉとＳｉの複合
炭窒化物硬質層および／または複合窒化物硬質層の厚さ
は１．０〜１０μｍの範囲内にある（１）記載の硬質層
被覆切削工具、（３） 前記（Ｔｉ1-x Ｓｉx ）（Ｃ
1-y Ｎy ）z ［ただし、0.55≦ｘ≦0.99、0.01≦ｙ≦1.
0 、0.5 ≦ｚ≦1.34］からなる組成のＴｉとＳｉの複合
炭窒化物硬質層および／または複合窒化物硬質層の上
に、さらに厚さは０．１〜１．０μｍの範囲内のＴｉＮ
層を被覆してなる（１）または（２）記載の硬質層被覆
切削工具。（４） 前記ＴｉＣ、ＴｉＣＮ、ＴｉＮの内
の１種の単層または２種以上の複層、（Ｔｉ1-x Ｓ
ｉx ）（Ｃ1-y Ｎy ）z ［ただし、0.55≦ｘ≦0.99、0.
01≦ｙ≦1.0 、0.5 ≦ｚ≦1.34］からなる組成のＴｉと
Ｓｉの複合炭窒化物硬質層および／または複合窒化物硬
質層、並びにＴｉＮ層の合計の厚さは１．５〜１２．０
μｍの範囲内にある（１）、（２）または（３）記載の
硬質層被覆切削工具、に特徴を有するものである。The present invention has been made on the basis of such findings. (1) The surface of a WC-based cemented carbide substrate or a TiCN-based cermet substrate is coated with TiC, TiCN,
(Ti 1-x Si x ) (C 1-y N y ) z [provided that 0.
55 ≦ x ≦ 0.99, 0.01 ≦ y ≦ 1.0, 0.5 ≦ z ≦ 1.34] Ti and Si composite carbonitride hard layer and / or hard layer coated cutting tool coated with composite nitride hard layer , (2) TiC, TiCN, TiN formed on the surface of WC-based cemented carbide substrate or TiCN-based cermet substrate
The thickness of one of the single layers or two or more layers is 0.1
To (3.0 μm) to (Ti 1-x Si x ) (C
1-y N y ) z [where 0.55 ≦ x ≦ 0.99, 0.01 ≦ y ≦ 1.
0, 0.5 ≤ z ≤ 1.34] Ti and Si composite carbonitride hard layer and / or composite nitride hard layer having a composition within the range of 1.0 to 10 µm (1) Layer-coated cutting tool, (3) said (Ti 1-x Si x ) (C
1-y N y ) z [where 0.55 ≦ x ≦ 0.99, 0.01 ≦ y ≦ 1.
0, 0.5 ≤ z ≤ 1.34] on the composite carbonitride hard layer and / or composite nitride hard layer of Ti and Si having a composition of 0.1 to 1.0 µm.
The hard layer-coated cutting tool according to (1) or (2), which is formed by coating a layer. (4) One of a single layer of TiC, TiCN, and TiN, or two or more layers of (Ti 1-x S
i x ) (C 1-y N y ) z [where 0.55 ≦ x ≦ 0.99, 0.
01 ≦ y ≦ 1.0, 0.5 ≦ z ≦ 1.34], and the total thickness of the composite carbonitride hard layer of Ti and Si and / or the composite nitride hard layer and the TiN layer is 1.5 to 12. 0
It is characterized by the hard layer-coated cutting tool according to (1), (2) or (3) in the range of μm.
【０００６】ｘ、ｙおよびｚの値を前記のごとく限定し
たのは、ｘ＜０．５５、ｘ＞０．９９であると所望の耐
熱衝撃性が得られないからであり、ｙ＜０．０１である
と所望の耐欠損性が得られないからであり、さらにｚ＜
０．５であると所望の耐欠損性が得られず、ｚ＞１．３
４であると所望の耐欠損性が低下するとともに剥離が起
こりやすくなるからである。前記（Ｔｉ1-x Ｓｉx ）
（Ｃ1-y Ｎy ）z ［ただし、0.55≦ｘ≦0.99、0.01≦ｙ
≦1.0 、0.5 ≦ｚ≦1.34］からなる組成のＴｉとＳｉの
複合炭窒化物硬質層および／または複合窒化物硬質層の
内でもＴｉとＳｉの複合炭窒化物硬質層の方が好まし
く、（Ｔｉ1-x Ｓｉx ）（Ｃ1-y Ｎy ）z に於けるｘ、
ｙ、ｚの一層好ましい範囲は、0.6 ≦ｘ≦0.8 、0.3 ≦
ｙ≦0.7 、0.9 ≦ｚ≦1.1 である。The values of x, y and z are limited as described above, because desired thermal shock resistance cannot be obtained when x <0.55 and x> 0.99, and y <0. This is because if it is 01, the desired fracture resistance cannot be obtained, and z <
If 0.5, the desired fracture resistance cannot be obtained, and z> 1.3.
When it is 4, the desired chipping resistance is lowered and peeling easily occurs. (Ti 1-x Si x )
(C 1-y N y ) z [where 0.55 ≦ x ≦ 0.99, 0.01 ≦ y
≦ 1.0, 0.5 ≦ z ≦ 1.34], the composite carbonitride hard layer of Ti and Si and / or the composite hard nitride layer of Ti and Si is preferably the composite carbonitride hard layer of Ti and Si. Ti 1-x Si x ) (C 1-y N y ) z ,
More preferable ranges of y and z are 0.6 ≤ x ≤ 0.8 and 0.3 ≤
y ≦ 0.7 and 0.9 ≦ z ≦ 1.1.
【０００７】また、この発明の硬質層被覆切削工具のＴ
ｉとＳｉの複合炭窒化物硬質層および／または複合窒化
物硬質層の膜厚は１〜１０μｍの範囲内にあることが好
ましく、基体表面に形成されるＴｉＣ、ＴｉＣＮ、Ｔｉ
Ｎの内の１種の単層または２種以上の複層の厚さは０．
１〜３．０μｍの範囲内にあることが好ましく、さらに
最外層のＴｉＮ層の厚さは０．１〜１．０μｍの範囲内
にあることが好ましい。しかし、基体表面に形成される
硬質層全体の厚さは１．５〜１２．０μｍの範囲内に抑
えなければならない。The hard layer coated cutting tool of the present invention has a T
The film thickness of the composite carbonitride hard layer of i and Si and / or the composite nitride hard layer is preferably in the range of 1 to 10 μm, and TiC, TiCN, Ti formed on the surface of the substrate.
The thickness of one single layer or two or more multilayers of N is 0.
The thickness is preferably in the range of 1 to 3.0 μm, and the thickness of the outermost TiN layer is preferably in the range of 0.1 to 1.0 μm. However, the total thickness of the hard layer formed on the substrate surface must be suppressed within the range of 1.5 to 12.0 μm.
【０００８】[0008]
【発明の実施の形態】この発明の硬質層被覆切削工具に
おける硬質層は、通常のアーク放電式イオンプレーティ
ング法、マグネトロンスパッタリング法などにより成形
することができる。BEST MODE FOR CARRYING OUT THE INVENTION The hard layer in the hard layer-coated cutting tool of the present invention can be formed by a usual arc discharge type ion plating method, magnetron sputtering method or the like.
【０００９】この発明の硬質層被覆切削工具の硬質層を
アーク放電式イオンプレーティング法により形成するに
は、真空装置内のＴｉターゲット上にアーク放電を発生
させ、Ｔｉを蒸発イオン化させると同時に非金属ガス
（窒素ガスおよび炭化水素ガス）を装置内に導入し、負
の基板電圧をかけた切削工具基板上に下層のＴｉＣ、Ｔ
ｉＣＮ、ＴｉＮの内の１種の単層または２種以上の複層
を形成する。In order to form the hard layer of the hard layer-coated cutting tool of the present invention by the arc discharge type ion plating method, an arc discharge is generated on a Ti target in a vacuum apparatus to vaporize and ionize Ti and at the same time A metal gas (nitrogen gas and hydrocarbon gas) was introduced into the device, and a lower layer TiC, T was formed on the cutting tool substrate to which a negative substrate voltage was applied.
One kind of iCN and TiN, or two or more kinds of multilayers are formed.
【００１０】次に、ＴｉとＳｉの混合物のターゲット上
にアーク放電を発生させ、ＴｉとＳｉを蒸発イオン化さ
せると同時に非金属ガス（窒素ガスおよび炭化水素ガ
ス）を装置内に導入し、負の基板電圧をかけて、前記Ｔ
ｉＣ、ＴｉＣＮ、ＴｉＮの内の１種の単層または２種以
上の複層の上にさらに（Ｔｉ1-x Ｓｉx ）（Ｃ
1-y Ｎy）z ［ただし、0.55≦ｘ≦0.99、0.01≦ｙ≦1.0
、0.5 ≦ｚ≦1.34］からなる硬質層を形成する。この
場合、ＴｉとＳｉの比率はターゲットのＴｉ／Ｓｉ比率
を、またメタル／ガス成分の比率はメタル蒸発量／ガス
導入量を調節したり、基板電圧を変化させることにより
制御する。また最外層のＴｉＮ層は、必要に応じて前記
下層のＴｉＮ層と同様にして形成することができる。Next, an arc discharge is generated on the target of a mixture of Ti and Si to vaporize and ionize Ti and Si, and at the same time, a non-metal gas (nitrogen gas and hydrocarbon gas) is introduced into the apparatus to produce a negative gas. Applying the substrate voltage, the T
Further, (Ti 1-x Si x ) (C
1-y N y ) z [However, 0.55 ≦ x ≦ 0.99, 0.01 ≦ y ≦ 1.0
, 0.5 ≦ z ≦ 1.34] is formed. In this case, the Ti / Si ratio is controlled by adjusting the Ti / Si ratio of the target, and the metal / gas component ratio is controlled by adjusting the metal evaporation amount / gas introduction amount or by changing the substrate voltage. The outermost TiN layer can be formed in the same manner as the lower TiN layer, if necessary.
【００１１】この発明の硬質層被覆切削工具の硬質層を
マグネトロンスパッタリング法により形成するには、複
数の偶数個の蒸発源機構を持つマグネトロンスパッタリ
ング装置内にＴｉターゲット２枚と、ＴｉとＳｉの混合
物のターゲット複数枚をそれぞれ試料を挾んで対向させ
る。つぎに非金属ガス（窒素ガスおよび炭化水素ガス）
を装置内に導入し、対向ターゲット間にグロー放電をさ
せると同時にＴｉをスパッタリングイオン化させること
により負の基板電圧をかけた切削工具基板上に下層のＴ
ｉＣ、ＴｉＣＮ、ＴｉＮの内の１種の単層または２種以
上の複層を形成する。In order to form the hard layer of the hard layer-coated cutting tool of the present invention by the magnetron sputtering method, two Ti targets and a mixture of Ti and Si are placed in a magnetron sputtering device having an even number of evaporation source mechanisms. A plurality of targets of (1) are made to face each other while sandwiching the sample. Next, non-metal gas (nitrogen gas and hydrocarbon gas)
Is introduced into the apparatus to cause glow discharge between opposing targets and at the same time sputter ionize Ti to apply a negative substrate voltage to the cutting tool substrate.
A single layer of iC, TiCN, or TiN or a multilayer of two or more types is formed.
【００１２】次に、ＴｉとＳｉをスパッタリングイオン
化させることにより負の基板電圧をかけて、ＴｉＣ、Ｔ
ｉＣＮ、ＴｉＮの内の１種の単層または２種以上の複層
の上にさらに（Ｔｉ1-x Ｓｉx ）（Ｃ1-y Ｎy ）z ［た
だし、0.55≦ｘ≦0.99、0.01≦ｙ≦1.0 、0.5 ≦ｚ≦1.
34］からなる硬質層を形成する。この場合、ＴｉとＳｉ
の比率はターゲットのＴｉ／Ｓｉ比率を、またメタル／
ガス成分の比率はメタル蒸発量／ガス導入量を調節した
り、基板電圧を変化させることにより制御する。また最
外層のＴｉＮ層は、必要に応じて前記下層のＴｉＮ層と
同様にして形成することができる。Next, a negative substrate voltage is applied by sputtering and ionizing Ti and Si, and TiC, T
On (Ti 1-x Si x ) (C 1-y N y ) z (where 0.55 ≦ x ≦ 0.99, 0.01 ≦) on one single layer or two or more multiple layers among iCN and TiN. y ≦ 1.0, 0.5 ≦ z ≦ 1.
34] is formed. In this case, Ti and Si
The ratio of is the Ti / Si ratio of the target, and the metal /
The ratio of the gas components is controlled by adjusting the metal evaporation amount / gas introduction amount and changing the substrate voltage. The outermost TiN layer can be formed in the same manner as the lower TiN layer, if necessary.
【００１３】[0013]
【実施例】ＩＳＯ規格Ｐ３０相当、ＳＰＧＮ１２０３０
８の形状を有するＷＣ基超硬合金製チップ、ＴｉＣＮ−
１２％ＷＣ−８％Ｃｏ−８％ＭｏＣ−７％Ｎｉ−５％Ｔ
ａＣの組成を有するＩＳＯ規格ＳＰＧＮ１２０３０８の
形状のＴｉＣＮ基サーメット製チップ、Ｔｉターゲッ
ト、および表１〜表２に示される比率のＴｉとＳｉの混
合物ターゲットを用意した。Example: ISO standard P30 equivalent, SPGN12030
WC-based cemented carbide tip having a shape of 8, TiCN-
12% WC-8% Co-8% MoC-7% Ni-5% T
A TiCN-based cermet chip in the form of ISO standard SPGN120308 having a composition of aC, a Ti target, and a mixture target of Ti and Si in the ratios shown in Tables 1 and 2 were prepared.
【００１４】実施例１ ＷＣ基超硬合金製チップとＴｉターゲットおよび表１〜
表２に示される比率のＴｉとＳｉの混合物ターゲットを
イオンプレーティング装置内に装着し、かかる状態で前
記イオンプレーティング装置内を排気して１×１０-5Ｔ
ｏｒｒの真空に保持し、昇温速度：６℃／ｍｉｎ．で７
００℃に昇温させ、つづいて、この温度に保持しなが
ら、５×１０-2ＴｏｒｒのＡｒガス雰囲気に保持してイ
オンクリーニングした。Example 1 WC-based cemented carbide tip and Ti target and Tables 1 to 1
A mixture target of Ti and Si having a ratio shown in Table 2 was mounted in the ion plating apparatus, and the inside of the ion plating apparatus was evacuated to 1 × 10 −5 T in such a state.
The vacuum was maintained at orrr and the temperature rising rate was 6 ° C./min. In 7
The temperature was raised to 00 ° C., and then, while being kept at this temperature, ion cleaning was carried out by holding in an Ar gas atmosphere of 5 × 10 −2 Torr.
【００１５】その後、Ｔｉターゲット上にアーク放電を
発生させてＴｉを加熱蒸発させイオン化させ、同時に窒
素ガスおよび／またはアセチレンガスを装置内に導入
し、任意の負の基板電圧をかける通常の方法によりＷＣ
基超硬合金製チップ基体表面に表３〜表４に示される膜
厚のＴｉＣ、ＴｉＣＮ、ＴｉＮの内の１種の単層または
２種以上の複層からなる下層を形成した。After that, an arc discharge is generated on the Ti target to heat and vaporize and ionize Ti, and at the same time, nitrogen gas and / or acetylene gas is introduced into the apparatus, and an arbitrary negative substrate voltage is applied by a usual method. WC
On the surface of the base cemented carbide chip substrate, a lower layer consisting of a single layer of TiC, TiCN or TiN having a film thickness shown in Tables 3 to 4 or a multi-layer of two or more layers was formed.
【００１６】次に表１〜表２に示される比率のＴｉとＳ
ｉの混合物ターゲット上にアーク放電を発生させてＴｉ
とＳｉを加熱蒸発させイオン化させるとともに、供給口
より表１〜表２に示される比率の窒素ガスおよびアセチ
レンガスを導入し、表１〜表２に示される負の基板電圧
をかけることにより、前記下層の上に表３〜表４に示さ
れる膜厚を有しさらに表３〜表４に示されるＴｉとＳｉ
の複合硬質層を被覆し、さらに必要に応じて中間層の上
にＴｉＮ層を形成してＷＣ基超硬合金製チップを基体と
した発明硬質層被覆ＷＣ基超硬合金製チップ（以下、本
発明被覆チップという）１〜１０、比較硬質層被覆ＷＣ
基超硬合金製チップ（以下、比較被覆チップという）１
〜１０および従来硬質層被覆ＷＣ基超硬合金製チップ
（以下、従来被覆チップという）１〜２を作製した。前
記下層、ＴｉとＳｉの複合硬質層の組成（原子比）およ
び最外層のＴｉＮはいずれもＥＰＭＡ分析により特定し
た。Next, Ti and S in the ratios shown in Tables 1 and 2 are used.
arcing on the target of the mixture of
And Si are heated and vaporized to be ionized, nitrogen gas and acetylene gas in the ratios shown in Tables 1 and 2 are introduced from the supply port, and the negative substrate voltage shown in Tables 1 and 2 is applied, thereby Ti and Si having the film thicknesses shown in Tables 3 to 4 on the lower layer and further shown in Tables 3 to 4
Of the present invention in which a WC-based cemented carbide chip is used as a base by coating a composite hard layer of No. 1, and a TiN layer is further formed on the intermediate layer, if necessary. Invention coated chip) 1-10, comparative hard layer coated WC
Chip made of base cemented carbide (hereinafter referred to as comparative coated chip) 1
10 and conventional hard layer coated WC-based cemented carbide chips (hereinafter referred to as conventional coated chips) 1 and 2 were produced. The composition (atomic ratio) of the lower layer, the composite hard layer of Ti and Si, and TiN of the outermost layer were all specified by EPMA analysis.
【００１７】[0017]
【表１】 [Table 1]
【００１８】[0018]
【表２】 [Table 2]
【００１９】[0019]
【表３】 [Table 3]
【００２０】[0020]
【表４】 [Table 4]
【００２１】これら本発明被覆チップ１〜１０比較被覆
チップ１〜１０および従来被覆チップ１〜２を用いて、
下記の条件の湿式フライス切削試験を実施した。 湿式フライス切削試験条件 被削材：ＪＩＳ規格ＳＣＭ４４０の角材、 切削速度：２５０ｍ／ｍｉｎ、 送り：０．２ｍｍ／ｒｅｖ．、 切込み：２．０ｍｍ、 の条件で湿式フライス切削し、切刃の逃げ面の最大摩耗
幅が０．３ｍｍになったところを寿命とし、寿命に至る
時間（分）および摩耗形態を測定し、それらの測定結果
を表５に示した。Using these coated chips 1-10 of the present invention and comparative coated chips 1-10 and conventional coated chips 1-2,
A wet milling cutting test was conducted under the following conditions. Wet milling cutting test conditions Work material: JIS standard SCM440 square material, Cutting speed: 250 m / min, Feed: 0.2 mm / rev. Wet milling under the following conditions: depth of cut: 2.0 mm. The life is defined as the maximum wear width of the flank of the cutting edge is 0.3 mm. The time (minute) to reach the life and the wear pattern are measured. The measurement results are shown in Table 5.
【００２２】[0022]
【表５】 [Table 5]
【００２３】表３〜表５に示される結果から、本発明被
覆チップ１〜１０は比較被覆チップ１〜１０および従来
被覆チップ１〜２に比べて切削特性が優れていることが
分かる。From the results shown in Tables 3 to 5, it can be seen that the coated chips 1 to 10 of the present invention are superior in cutting characteristics to the comparative coated chips 1 to 10 and the conventional coated chips 1 and 2.
【００２４】実施例２ ＴｉＣＮ−１２％ＷＣ−８％Ｃｏ−８％ＭｏＣ−７％Ｎ
ｉ−５％ＴａＣの組成を有するＩＳＯ規格ＳＰＧＮ１２
０３０８の形状のＴｉＣＮ基サーメット製チップとＴｉ
ターゲットおよび表６〜表７に示される比率のＴｉとＳ
ｉの混合物ターゲットをイオンプレーティング装置内に
装着し、かかる状態で前記イオンプレーティング装置内
を排気して１×１０-5Ｔｏｒｒの真空に保持し、昇温速
度：６℃／ｍｉｎ．で７００℃に昇温させ、つづいて、
この温度に保持しながら、５×１０-2ＴｏｒｒのＡｒガ
ス雰囲気に保持してイオンクリーニングした。Example 2 TiCN-12% WC-8% Co-8% MoC-7% N
ISO standard SPGN12 with composition of i-5% TaC
0308 shape TiCN based cermet tip and Ti
Target and Ti and S in the ratios shown in Tables 6 to 7
The mixture target of No. i was mounted in the ion plating apparatus, and in this state, the inside of the ion plating apparatus was evacuated and kept at a vacuum of 1 × 10 −5 Torr, and the temperature rising rate was 6 ° C./min. To 700 ° C, and then
While maintaining this temperature, ion cleaning was carried out by maintaining it in an Ar gas atmosphere of 5 × 10 -2 Torr.
【００２５】その後、Ｔｉターゲット上にアーク放電を
発生させてＴｉを加熱蒸発させイオン化させ、同時に窒
素ガスおよび／またはアセチレンガスを装置内に導入
し、任意の負の基板電圧をかける通常の方法によりＴｉ
ＣＮ基サーメット製チップ基体表面に表８〜表９に示さ
れるＴｉＣ、ＴｉＣＮ、ＴｉＮの内の１種の単層または
２種以上の複層からなる膜厚の下層を形成した。After that, an arc discharge is generated on the Ti target to heat and evaporate and ionize Ti, and at the same time, nitrogen gas and / or acetylene gas is introduced into the apparatus, and an arbitrary negative substrate voltage is applied by a usual method. Ti
On the surface of the CN-based cermet chip substrate, a lower layer having a film thickness of one kind of TiC, TiCN, and TiN shown in Tables 8 to 9 or a multilayer of two or more kinds was formed.
【００２６】次に表６〜表７に示される比率のＴｉとＳ
ｉの混合物ターゲット上にアーク放電を発生させてＴｉ
とＳｉを加熱蒸発させイオン化させるとともに、供給口
より表６〜表７に示される比率の窒素ガスおよびアセチ
レンガスを導入し、表６〜表７に示される負の基板電圧
をかけることにより、前記下層の上に表８〜表９に示さ
れる膜厚を有しさらに表８〜表９に示されるＴｉとＳｉ
の複合硬質層を被覆し、さらに必要に応じて中間層の上
にＴｉＮ層を形成してＴｉＣＮ基サーメット製チップを
基体とした本発明被覆チップ１１〜２０、比較被覆チッ
プ１１〜２０および従来被覆チップ３〜４を作製した。
前記下層、ＴｉとＳｉの複合硬質層の組成（原子比）お
よび最外層のＴｉＮはいずれもＥＰＭＡ分析により特定
した。Next, Ti and S in the ratios shown in Tables 6 to 7 are used.
arcing on the target of the mixture of
And Si are heated and vaporized to be ionized, nitrogen gas and acetylene gas in the ratios shown in Tables 6 to 7 are introduced from the supply port, and the negative substrate voltage shown in Tables 6 to 7 is applied, thereby Ti and Si having the film thicknesses shown in Tables 8 to 9 on the lower layer and further shown in Tables 8 to 9
Of the present invention, the coated chips 11 to 20, the comparative coated chips 11 to 20 and the conventional coating, in which a TiN layer is formed on the intermediate layer if necessary to form a TiCN-based cermet chip as a base. Chips 3 to 4 were produced.
The composition (atomic ratio) of the lower layer, the composite hard layer of Ti and Si, and TiN of the outermost layer were all specified by EPMA analysis.
【００２７】[0027]
【表６】 [Table 6]
【００２８】[0028]
【表７】 [Table 7]
【００２９】[0029]
【表８】 [Table 8]
【００３０】[0030]
【表９】 [Table 9]
【００３１】これら本発明被覆チップ１１〜２０比較被
覆チップ１１〜２０および従来被覆チップ３〜４を用い
て、下記の条件の湿式フライス切削試験を実施した。 湿式フライス切削試験条件 被削材：ＪＩＳ規格ＳＣＭ４４０の角材、 切削速度：３００ｍ／ｍｉｎ、 送り：０．１５ｍｍ／ｒｅｖ．、 切込み：１．５ｍｍ、 の条件で湿式転削加工し、切刃の逃げ面の最大摩耗幅が
０．３ｍｍになったところを寿命とし、寿命に至る時間
（分）および摩耗形態を測定し、それらの測定結果を表
１０に示した。Using these coated chips 11 to 20 of the present invention and comparative coated chips 11 to 20 and conventional coated chips 3 to 4, a wet milling cutting test was carried out under the following conditions. Wet milling cutting test conditions Work material: JIS standard SCM440 square material, Cutting speed: 300 m / min, Feed: 0.15 mm / rev. Cutting depth: 1.5 mm, wet rolling was performed, and the life when the maximum wear width of the flank of the cutting edge was 0.3 mm was defined as the life, and the time (minute) to reach the life and the wear pattern were measured. Table 10 shows the measurement results.
【００３２】[0032]
【表１０】 [Table 10]
【００３３】表８〜表１０に示される結果から、本発明
被覆チップ１１〜２０は比較被覆チップ１１〜２０およ
び従来被覆チップ３〜４に比べて切削特性が優れている
ことが分かる。From the results shown in Tables 8 to 10, it is understood that the coated chips 11 to 20 of the present invention have excellent cutting characteristics as compared with the comparative coated chips 11 to 20 and the conventional coated chips 3 to 4.
【００３４】実施例３ ＷＣ−９％Ｃｏの組成を有し、直径：１０ｍｍで３０度
の捩じれ角を持つＷＣ基微粒超硬合金製４枚刃エンドミ
ル（以下、ＷＣ基微粒超硬合金製エンドミルという）お
よび表１１〜表１２に示される比率のＴｉとＳｉの混合
物ターゲットを用意した。Example 3 A WC-based fine grain cemented carbide 4-flute end mill having a composition of WC-9% Co and a diameter: 10 mm and a twist angle of 30 degrees (hereinafter referred to as WC-based fine grain cemented carbide end mill). And a mixture target of Ti and Si having the ratios shown in Tables 11 to 12 was prepared.
【００３５】このＷＣ基微粒超硬合金製エンドミルをマ
グネトロンスパッタリング装置内の中央に装着し、さら
に、表１１〜表１２に示される比率のＴｉとＳｉの混合
物ターゲットをエンドミルを挟んで対向させて配置し、
かかる状態で前記マグネトロンスパッタリング装置内を
排気して１×１０-5Ｔｏｒｒの真空に保持し、昇温速
度：６℃／ｍｉｎ．で７００℃に昇温させ、続いて、こ
の温度に保持しながら、１．５×１０-4ＴｏｒｒのＡｒ
ガス雰囲気に保持してイオンクリーニングした。This WC-based fine-grain cemented carbide end mill was mounted in the center of a magnetron sputtering apparatus, and Ti and Si mixture targets in the ratios shown in Tables 11 to 12 were arranged to face each other with the end mill interposed therebetween. Then
In this state, the inside of the magnetron sputtering apparatus was evacuated and kept in a vacuum of 1 × 10 −5 Torr, and the temperature rising rate was 6 ° C./min. The temperature is raised to 700 ° C. at a temperature of 1.5 × 10 −4 Torr while maintaining this temperature.
Ion cleaning was performed while maintaining the gas atmosphere.
【００３６】その後、表１１〜表１２に示される比率の
窒素ガスおよびアセチレンガスを導入すると共に、表１
１〜表１２に示される比率のＴｉとＳｉの混合物ターゲ
ット上にグロー放電を発生させてＴｉとＳｉをスパッタ
リングイオン化させた。同時に、表１１〜表１２に示さ
れる負の基板電圧をかけることにより、前記ＷＣ基微粒
超硬合金製エンドミル基体表面に表１３〜表１４に示さ
れる膜厚を有しさらに表１３〜表１４に示される複合硬
質層を被覆した本発明ＷＣ基微粒超硬合金製エンドミル
（以下、本発明被覆エンドミルという）１〜１０、比較
ＷＣ基微粒超硬合金製エンドミル（以下、比較被覆エン
ドミルという）１〜１０および従来ＷＣ基微粒超硬合金
製エンドミル（以下、従来被覆エンドミルという）１〜
２を作製した。Then, nitrogen gas and acetylene gas in the ratios shown in Tables 11 to 12 were introduced, and Table 1
A glow discharge was generated on a Ti / Si mixture target having a ratio shown in Tables 1 to 12 to cause Ti and Si to be sputter-ionized. At the same time, by applying the negative substrate voltage shown in Table 11 to Table 12, the WC-based fine cemented carbide end mill substrate surface has the film thickness shown in Table 13 to Table 14, and further Table 13 to Table 14 Of the present invention WC-based fine grain cemented carbide end mill (hereinafter referred to as the present invention coated end mill) 1 to 10 and comparative WC-based fine grain cemented carbide end mill (hereinafter referred to as the comparative coated end mill) 1 -10 and conventional WC-based fine grain cemented carbide end mill (hereinafter referred to as conventional coated end mill) 1
2 was produced.
【００３７】[0037]
【表１１】 [Table 11]
【００３８】[0038]
【表１２】 [Table 12]
【００３９】[0039]
【表１３】 [Table 13]
【００４０】[0040]
【表１４】 [Table 14]
【００４１】これら本発明被覆エンドミル１〜１０、比
較被覆エンドミル１〜１０および従来被覆エンドミル１
〜２を用いて、下記の条件の湿式肩削り試験を実施し
た。 湿式肩削り試験条件 被削材：ＪＩＳ規格ＳＣＭ４４０の角材、 回転数：１２００ｒ．ｐ．ｍ．、 送り：２８０ｍｍ／ｍｉｎ．、 深さ方向の切込み：１５ｍｍ、 横方向の切込み：１ｍｍ、 の条件で湿式肩削りを行った。外周刃の最大摩耗幅が
０．２ｍｍになったところを寿命とし、寿命に至る時間
（分）および摩耗形態を測定し、それらの測定結果を表
１５に示した。These coated end mills 1 to 10 of the present invention, comparative coated end mills 1 to 10 and conventional coated end mill 1
~ 2 was used to carry out a wet shoulder milling test under the following conditions. Wet shoulder milling test conditions Work material: JIS standard SCM440 square bar, Rotation speed: 1200 r. p. m. , Feed: 280 mm / min. Wet shoulder milling was performed under the following conditions: depth of cut: 15 mm, lateral cut: 1 mm. The time when the maximum wear width of the outer peripheral blade was 0.2 mm was defined as the life, the time (minute) to reach the life and the wear pattern were measured, and the measurement results are shown in Table 15.
【００４２】[0042]
【表１５】 [Table 15]
【００４３】表１５に示される結果から、本発明被覆エ
ンドミル１〜１０は、比較被覆エンドミル１〜１０およ
び従来被覆エンドミル１〜２に比べて切削性能が優れて
いることが分かる。From the results shown in Table 15, it is understood that the coated end mills 1 to 10 of the present invention are superior in cutting performance to the comparative coated end mills 1 to 10 and the conventional coated end mills 1 and 2.
【００４４】[0044]
【発明の効果】前記実施例１〜３に示される結果から、
この発明の硬質層被覆切削工具は、従来の硬質層被覆切
削工具に比べて一層優れた性能を有し、工業上優れた効
果をもたらすものである。From the results shown in Examples 1 to 3 above,
The hard layer-coated cutting tool of the present invention has more excellent performance than the conventional hard layer-coated cutting tool, and brings an industrially excellent effect.
───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.6 識別記号 庁内整理番号 ＦＩ 技術表示箇所 Ｃ２３Ｃ 14/06 Ｃ２３Ｃ 14/06 Ｌ Ｐ ─────────────────────────────────────────────────── ─── Continuation of the front page (51) Int.Cl. 6 Identification code Internal reference number FI Technical indication C23C 14/06 C23C 14/06 LP
Claims (4)
ーメット基体表面に、ＴｉＣ、ＴｉＣＮ、ＴｉＮの内の
１種の単層または２種以上の複層を介して、（Ｔｉ1-x
Ｓｉx ）（Ｃ1-y Ｎy ）z ［ただし、0.55≦ｘ≦0.99、
0.01≦ｙ≦1.0 、0.5 ≦ｚ≦1.34］からなる組成のＴｉ
とＳｉの複合炭窒化物硬質層および／または複合窒化物
硬質層を被覆してなることを特徴とする硬質層被覆切削
工具。1. A surface of a WC-based cemented carbide substrate or a TiCN-based cermet substrate is coated with (Ti 1-x) through a single layer of TiC, TiCN or TiN or a multilayer of two or more types.
Si x ) (C 1-y N y ) z [where 0.55 ≦ x ≦ 0.99,
0.01≤y≤1.0, 0.5≤z≤1.34]
A hard-layer-coated cutting tool characterized by coating a composite carbonitride hard layer of Si and Si and / or a composite nitride hard layer.
ーメット基体表面に形成されたＴｉＣ、ＴｉＣＮ、Ｔｉ
Ｎの内の１種の単層または２種以上の複層の厚さは０．
１〜３．０μｍの範囲内にあり、（Ｔｉ1-x Ｓｉx ）
（Ｃ1-y Ｎy ）z ［ただし、0.55≦ｘ≦0.99、0.01≦ｙ
≦1.0 、0.5 ≦ｚ≦1.34］からなる組成のＴｉとＳｉの
複合炭窒化物硬質層および／または複合窒化物硬質層の
厚さは１．０〜１０μｍの範囲内にあることを特徴とす
る請求項１記載の硬質層被覆切削工具。2. TiC, TiCN, Ti formed on the surface of a WC-based cemented carbide substrate or a TiCN-based cermet substrate.
The thickness of one single layer or two or more multilayers of N is 0.
Within the range of 1 to 3.0 μm, (Ti 1-x Si x ).
(C 1-y N y ) z [where 0.55 ≦ x ≦ 0.99, 0.01 ≦ y
≤1.0, 0.5 ≤z≤1.34], and the thickness of the composite carbonitride hard layer of Ti and Si and / or the composite nitride hard layer of 1.0 to 10 µm. The hard layer-coated cutting tool according to claim 1.
z ［ただし、0.55≦ｘ≦0.99、0.01≦ｙ≦1.0 、0.5 ≦
ｚ≦1.34］からなる組成のＴｉとＳｉの複合炭窒化物硬
質層および／または複合窒化物硬質層の上に、さらに厚
さは０．１〜１．０μｍの範囲内のＴｉＮ層を被覆して
なることを特徴とする請求項１または２記載の硬質層被
覆切削工具。3. The (Ti 1-x Si x ) (C 1-y N y ).
z [However, 0.55≤x≤0.99, 0.01≤y≤1.0, 0.5≤
z ≦ 1.34] and a TiN layer having a thickness in the range of 0.1 to 1.0 μm is further coated on the Ti / Si composite carbonitride hard layer and / or the composite nitride hard layer. The hard layer-coated cutting tool according to claim 1 or 2, wherein
種の単層または２種以上の複層、（Ｔｉ1-x Ｓｉx ）
（Ｃ1-y Ｎy ）z ［ただし、0.55≦ｘ≦0.99、0.01≦ｙ
≦1.0 、0.5 ≦ｚ≦1.34］からなる組成のＴｉとＳｉの
複合炭窒化物硬質層および／または複合窒化物硬質層、
並びにＴｉＮ層の合計の厚さは１．５〜１２．０μｍの
範囲内にあることを特徴とする請求項１、２または３記
載の硬質層被覆切削工具。4. One of the TiC, TiCN and TiN
Single layer or two or more layers, (Ti 1-x Si x ).
(C 1-y N y ) z [where 0.55 ≦ x ≦ 0.99, 0.01 ≦ y
≤1.0, 0.5 ≤z≤1.34] Ti and Si composite carbonitride hard layer and / or composite nitride hard layer,
Also, the hard layer coated cutting tool according to claim 1, 2 or 3, wherein the total thickness of the TiN layer is in the range of 1.5 to 12.0 µm.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP19124195A JP3572732B2 (en) | 1995-07-04 | 1995-07-04 | Hard layer coated cutting tool |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP19124195A JP3572732B2 (en) | 1995-07-04 | 1995-07-04 | Hard layer coated cutting tool |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0919806A true JPH0919806A (en) | 1997-01-21 |
| JP3572732B2 JP3572732B2 (en) | 2004-10-06 |
Family
ID=16271252
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP19124195A Expired - Fee Related JP3572732B2 (en) | 1995-07-04 | 1995-07-04 | Hard layer coated cutting tool |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3572732B2 (en) |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2004217481A (en) * | 2003-01-15 | 2004-08-05 | Sumitomo Electric Ind Ltd | Wear resistant member |
| US7294416B2 (en) | 2003-03-25 | 2007-11-13 | Kobe Steel, Ltd. | Hard film |
| WO2008007165A1 (en) * | 2006-07-11 | 2008-01-17 | Ion Technology (Hong Kong) Limited | Surface treatment for titanium or titanium-alloys |
| JP2011218541A (en) * | 2010-03-23 | 2011-11-04 | Mitsubishi Materials Corp | Surface-coated cutting tool having hard coating layer exhibiting superior chipping resistance |
| US20140370309A1 (en) * | 2011-12-05 | 2014-12-18 | Fraunhofer-Gesellschaft Zur Foerderung Der Angewandten Forschung E. V. | Hard-material-coated bodies composed of metal, cemented hard material, cermet or ceramic and processes for producing such bodies |
| CN110359029A (en) * | 2019-08-15 | 2019-10-22 | 株洲华锐精密工具股份有限公司 | Applying coating and preparation method thereof for cutter |
-
1995
- 1995-07-04 JP JP19124195A patent/JP3572732B2/en not_active Expired - Fee Related
Cited By (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2004217481A (en) * | 2003-01-15 | 2004-08-05 | Sumitomo Electric Ind Ltd | Wear resistant member |
| US7294416B2 (en) | 2003-03-25 | 2007-11-13 | Kobe Steel, Ltd. | Hard film |
| US7758974B2 (en) | 2003-03-25 | 2010-07-20 | Kobe Steel, Ltd. | Hard film |
| DE102004014466B4 (en) * | 2003-03-25 | 2011-05-05 | Kabushiki Kaisha Kobe Seiko Sho (Kobe Steel, Ltd.), Kobe-shi | Use of a hard material layer as coating of a sliding component for a hydraulic component in an aqueous environment |
| WO2008007165A1 (en) * | 2006-07-11 | 2008-01-17 | Ion Technology (Hong Kong) Limited | Surface treatment for titanium or titanium-alloys |
| JP2011218541A (en) * | 2010-03-23 | 2011-11-04 | Mitsubishi Materials Corp | Surface-coated cutting tool having hard coating layer exhibiting superior chipping resistance |
| US20140370309A1 (en) * | 2011-12-05 | 2014-12-18 | Fraunhofer-Gesellschaft Zur Foerderung Der Angewandten Forschung E. V. | Hard-material-coated bodies composed of metal, cemented hard material, cermet or ceramic and processes for producing such bodies |
| US9309593B2 (en) * | 2011-12-05 | 2016-04-12 | Fraunhofer-Gesellschaft Zur Foerderung Der Angewandten Forschung E. V. | Hard-material-coated bodies composed of metal, cemented hard material, cermet or ceramic and processes for producing such bodies |
| CN110359029A (en) * | 2019-08-15 | 2019-10-22 | 株洲华锐精密工具股份有限公司 | Applying coating and preparation method thereof for cutter |
Also Published As
| Publication number | Publication date |
|---|---|
| JP3572732B2 (en) | 2004-10-06 |
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