JPH09172256A - Manufacture of multilayer board - Google Patents
Manufacture of multilayer boardInfo
- Publication number
- JPH09172256A JPH09172256A JP33300195A JP33300195A JPH09172256A JP H09172256 A JPH09172256 A JP H09172256A JP 33300195 A JP33300195 A JP 33300195A JP 33300195 A JP33300195 A JP 33300195A JP H09172256 A JPH09172256 A JP H09172256A
- Authority
- JP
- Japan
- Prior art keywords
- inner layer
- multilayer board
- photosensitive resist
- treatment
- board
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Production Of Multi-Layered Print Wiring Board (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は、電気・電子機器等
に使用される多層板の製造方法に関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for manufacturing a multi-layer board used in electric / electronic equipment.
【0002】[0002]
【従来の技術】従来、電子機器に使用される多層板は、
内層用基板の表面に内層パターンを形成し、その内層用
基板に酸化処理を行った後、その内層用基板の上及び/
又は下にプリプレグを積み重ね、さらにそのプリプレグ
の最外層に金属箔を配して積層し、次いで、加熱加圧成
形して製造されている。2. Description of the Related Art Conventionally, multilayer boards used in electronic equipment are
After forming an inner layer pattern on the surface of the inner layer substrate and performing an oxidation treatment on the inner layer substrate, the inner layer substrate and / or
Alternatively, it is manufactured by stacking a prepreg underneath, arranging a metal foil on the outermost layer of the prepreg, laminating the prepreg, and then heat-pressing.
【0003】上記内層パターンを形成する方法として
は、例えば、銅張り積層板の表面に感光レジストを塗
布、圧着等により施し、次いでパターンフィルムを密着
させて露光し、感光レジストを部分的に硬化させる。次
いで感光レジストの未硬化部を現像液を用いて除去(現
像)した後、未硬化部の感光レジストを除去した部分の
銅箔をエッチング液を用いてエッチングし、次いで剥離
液を用いて残る感光レジストを除去(剥離)して一般に
形成される。感光レジストに水溶性感光レジストと呼ば
れるアルカリに溶解するタイプの感光レジストを用いた
場合、現像の工程では感光レジストが現像液に溶解して
液の粘度が上昇し、その粘度が高い液が撹拌されること
により泡が大量に発生し、現像液が感光レジストと均一
に接触しにくくなるため、感光レジストの幅が太くなっ
たり除去が不十分となり、エッチング精度が低下すると
いう問題があった。そのため、一般に現像液に消泡剤と
呼ばれる添加剤を含有させ、泡の発生を防ぎエッチング
精度を改良している。しかし、剥離の工程では光で硬化
した部分の感光レジストを除去するため、剥離液に感光
レジストはほとんど溶解せず、またエッチング精度にも
影響しないため、添加剤等は特には考慮されていないの
が一般である。As a method of forming the inner layer pattern, for example, a photosensitive resist is applied to the surface of a copper-clad laminate by pressing, pressure bonding, etc., and then a pattern film is brought into close contact with the substrate to expose it to partially cure the photosensitive resist. . Next, the uncured part of the photosensitive resist is removed (developed) using a developing solution, the copper foil in the part where the photosensitive resist of the uncured part is removed is etched using an etching solution, and then the remaining photoresist is removed using a stripping solution. It is generally formed by removing (peeling) the resist. When a photosensitive resist of a type that is soluble in alkali, called a water-soluble photosensitive resist, is used as the photosensitive resist, the photosensitive resist is dissolved in the developer and the viscosity of the liquid increases during the development process, and the liquid with high viscosity is agitated. As a result, a large amount of bubbles are generated, and it becomes difficult for the developing solution to uniformly contact the photosensitive resist, so that the width of the photosensitive resist becomes thicker or the removal becomes insufficient, and there is a problem that the etching accuracy is reduced. Therefore, the developer is generally made to contain an additive called an antifoaming agent to prevent the generation of bubbles and improve the etching accuracy. However, in the stripping step, since the photosensitive resist in the portion cured by light is removed, the photosensitive resist is hardly dissolved in the stripping solution and does not affect the etching accuracy. Therefore, additives are not particularly considered. Is common.
【0004】また、上記酸化処理は、黒化処理と呼ばれ
る化学的酸化処理であり、内層パターンの銅箔の光沢面
に対して施して、銅箔表面に微細な凹凸を有する、黒色
の酸化処理皮膜を形成し、銅箔の光沢面の接着性を向上
させる処理である。The above-mentioned oxidation treatment is a chemical oxidation treatment called blackening treatment, which is a black oxidation treatment which is applied to the shiny side of the copper foil of the inner layer pattern and has fine irregularities on the copper foil surface. This is a treatment that forms a film and improves the adhesiveness of the shiny side of the copper foil.
【0005】最近の多層板の高密度化に伴い、この多層
板を用いてプリント配線板を製造するとき、その製造工
程で用いられているメッキ液等の酸が上記酸化処理皮膜
を溶かし、黒色がピンク色に変色し、ハローイングと呼
ばれる現象が発生する場合があり外観的に問題となって
いる。このハローイングの発生の対策として、多層板の
耐酸強度の向上のために、内層用基板に形成された内層
パターンを、酸化処理後還元処理をする処理(以下耐酸
処理と記す)を行う方法が検討され実施されている。こ
の耐酸処理は酸化したとき形成した黒色の酸化銅を還元
により溶出させるため、酸化したときと比較して処理の
色調が薄くなる。このとき部分的に、特に色調が薄くな
る部分が発生する場合があり、この部分的に特に色調が
薄くなる部分が発生した内層用基板を用いて多層板を製
造し、この多層板の最外層の金属箔をエッチングして外
層パターンを形成すると、外層パターンの間の絶縁部か
ら部分的に特に色調が薄くなった内層パターンの部分が
斑点状に透けて見える現象が発生する場合があった。こ
の斑点状に透けて見える部分は、内層パターンの表面に
異物が混入した場合や、内層パターンの一部が欠けてな
くなった場合と同じように見え、実際に内層パターンの
表面に異物が混入した場合や、内層パターンの一部が欠
けてなくなった場合と見分けがつかないため、その多層
板を廃棄せざるを得ず、歩留まりを低下させており問題
となっている。With the recent increase in the density of multi-layer boards, when a printed wiring board is manufactured using this multi-layer board, an acid such as a plating solution used in the manufacturing process dissolves the above-mentioned oxidation treatment film, resulting in a black color. Turns into pink, and a phenomenon called haloing may occur, which is a problem in appearance. As a countermeasure against the occurrence of this haloing, a method of subjecting the inner layer pattern formed on the inner layer substrate to an oxidation treatment and a reduction treatment (hereinafter referred to as an acid resistance treatment) in order to improve the acid resistance of the multilayer board is a method. Considered and implemented. In this acid-resistant treatment, the black copper oxide formed when oxidized is eluted by reduction, so the color tone of the treatment becomes lighter than when oxidized. At this time, there may be a part where the color tone is particularly thin, and a multilayer board is manufactured using the inner layer substrate where the part where the color tone is particularly partly generated, and the outermost layer of this multilayer board is manufactured. When the outer layer pattern is formed by etching the metal foil, the phenomenon in which the part of the inner layer pattern whose color tone is particularly thin is partially visible from the insulating portion between the outer layer patterns may be seen through. The part that can be seen through in a spotted shape looks the same as when foreign matter is mixed in the surface of the inner layer pattern or when part of the inner layer pattern is missing and disappears. Since it is indistinguishable from the case where a part of the inner layer pattern is lost and disappears, the multilayer board has to be discarded and the yield is reduced, which is a problem.
【0006】[0006]
【発明が解決しようとする課題】本発明は、上記問題点
を改善するために成されたもので、その目的とするとこ
ろは、耐酸処理を施した内層用基板とプリプレグを積層
し、加熱加圧成形して製造する多層板の製造方法におい
て、内層パターンに斑点が形成されず、外観上仕上がり
の良い多層板を得る製造方法を提供することにある。SUMMARY OF THE INVENTION The present invention has been made to solve the above problems. The object of the present invention is to stack an acid-resistant inner layer substrate and a prepreg and heat the substrate. It is an object of the present invention to provide a method for producing a multilayer board produced by pressure molding, in which spots are not formed on an inner layer pattern and a multilayer board having a good appearance is obtained.
【0007】[0007]
【課題を解決するための手段】本発明の請求項1に係る
多層板の製造方法は、銅張り積層板の表面に水溶性感光
レジストを施し、露光した後、現像、エッチングし、次
いで剥離液を用いて剥離して内層パターンを表面に有す
る内層用基板を形成し、その内層用基板に耐酸処理をし
た後、その内層用基板とプリプレグを積層し、加熱加圧
成形して製造する多層板の製造方法において、剥離液に
消泡剤を含有することを特徴とする。According to a first aspect of the present invention, there is provided a method for producing a multilayer board, which comprises applying a water-soluble photosensitive resist on the surface of a copper-clad laminate, exposing it, developing it, etching it, and then removing a stripping solution. A multilayer board manufactured by peeling using to form an inner layer substrate having an inner layer pattern on the surface, acid-treating the inner layer substrate, then laminating the inner layer substrate and prepreg, and heat-press molding In the production method of, the stripping solution contains an antifoaming agent.
【0008】本発明の請求項2に係る多層板の製造方法
は、請求項1記載の多層板の製造方法において、消泡剤
が、ポリオキシアルキレン脂肪酸エステルであることを
特徴とする。The method for producing a multilayer board according to claim 2 of the present invention is characterized in that, in the method for producing a multilayer board according to claim 1, the defoaming agent is a polyoxyalkylene fatty acid ester.
【0009】本発明の請求項3に係る多層板の製造方法
は、請求項1又は請求項2記載の多層板の製造方法にお
いて、剥離液に、消泡剤を剥離液100重量部に対して
0.02〜0.1重量部含有することを特徴とする。The method for manufacturing a multilayer board according to claim 3 of the present invention is the method for manufacturing a multilayer board according to claim 1 or 2, wherein the defoaming agent is added to the stripping solution with respect to 100 parts by weight of the stripping solution. It is characterized by containing 0.02 to 0.1 part by weight.
【0010】本発明の請求項4に係る多層板の製造方法
は、請求項1から請求項3のいずれかに記載の多層板の
製造方法において、水溶性感光レジストが、厚み10〜
50μmのシート状感光レジストであることを特徴とす
る。The method for producing a multilayer board according to claim 4 of the present invention is the method for producing a multilayer board according to any one of claims 1 to 3, wherein the water-soluble photosensitive resist has a thickness of 10 to 10.
It is characterized in that it is a sheet-like photosensitive resist of 50 μm.
【0011】前記課題を解決するため、発明者らは種々
検討を重ねた結果、内層パターンの表面の一部に感光レ
ジスト等が薄く残り、この薄く残った感光レジスト等が
耐酸処理の反応性を変化させることが、内層パターンに
部分的に特に色調が薄くなる部分が発生する原因の一つ
であることを見い出した。そのため、発明者らは内層パ
ターンの表面の一部に感光レジスト等が残り難い製造方
法を見い出し課題を解決した。In order to solve the above-mentioned problems, the inventors have conducted various investigations, and as a result, the photosensitive resist or the like remains thin on a part of the surface of the inner layer pattern, and the thin remaining photosensitive resist or the like has the reactivity of the acid resistance treatment. It has been found that the change is one of the causes that a part where the color tone is particularly thin occurs in the inner layer pattern. Therefore, the inventors have found a manufacturing method in which the photosensitive resist or the like hardly remains on a part of the surface of the inner layer pattern, and solved the problem.
【0012】本発明の多層板の製造方法によると、剥離
液に消泡剤を含有するため、剥離液の剥離性が向上し、
感光レジストを均一に除去することができ、耐酸処理を
施した内層用基板を用いた場合であっても、外観上仕上
がりの良い多層板を得ることができる。According to the method for producing a multilayer board of the present invention, since the stripping solution contains an antifoaming agent, the strippability of the stripping solution is improved,
It is possible to uniformly remove the photosensitive resist, and it is possible to obtain a multilayer board having a good finish in appearance even when an inner layer substrate subjected to an acid resistance treatment is used.
【0013】[0013]
【発明の実施の形態】本発明の多層板の製造方法は、銅
張り積層板の表面に水溶性感光レジストを塗布、圧着等
により施し、次いでパターンフィルムを密着させて露光
して感光レジストを部分的に硬化させる。次いで感光レ
ジストの未硬化部を現像液を用いて除去(現像)した
後、未硬化部の感光レジストを除去した部分の銅箔をエ
ッチング液を用いてエッチングし、次いで剥離液を用い
て残る感光レジストを除去(剥離)して内層パターンを
表面に有する内層用基板を形成する。次いでその内層用
基板に耐酸処理をした後、その内層用基板とプリプレグ
及び必要に応じて金属箔を積層し、加熱加圧成形して製
造する。BEST MODE FOR CARRYING OUT THE INVENTION The method for producing a multilayer board according to the present invention comprises applying a water-soluble photosensitive resist to the surface of a copper-clad laminate by pressing, pressure bonding, etc., and then exposing a pattern film by bringing it into close contact to expose the photosensitive resist. Harden. Next, the uncured part of the photosensitive resist is removed (developed) using a developing solution, the copper foil in the part where the photosensitive resist of the uncured part is removed is etched using an etching solution, and then the remaining photoresist is removed using a stripping solution. The resist is removed (peeled) to form an inner layer substrate having an inner layer pattern on its surface. Then, after subjecting the inner layer substrate to acid resistance treatment, the inner layer substrate, the prepreg and, if necessary, a metal foil are laminated, and heat-pressed to manufacture.
【0014】このとき用いる剥離液に消泡剤を含有する
ことが重要であり、その消泡剤を含有することにより剥
離液の剥離性が向上し、厚みの薄い感光レジストや、小
さな感光レジスト等であっても内層パターンの上に残留
しにくくなり、感光レジストを均一に除去することがで
きる。なお、剥離液に含有する消泡剤以外の成分として
は、一般に水酸化ナトリウム、水酸化カリウム等のアル
カリと水であり、アルカリの濃度は1〜4%、剥離液の
処理温度は40〜60℃が一般である。It is important for the stripping solution used at this time to contain an antifoaming agent. By containing the defoaming agent, the strippability of the stripping solution is improved, and a thin photosensitive resist, a small photosensitive resist, etc. Even in this case, it is hard to remain on the inner layer pattern, and the photosensitive resist can be uniformly removed. The components other than the defoaming agent contained in the stripping solution are generally alkali such as sodium hydroxide and potassium hydroxide and water, the concentration of the alkali is 1 to 4%, and the treating temperature of the stripping solution is 40 to 60. C is common.
【0015】上記消泡剤としては、例えばポリオキシア
ルキレン脂肪酸エステル、シリコンオイル等の有機珪素
化合物等が挙げられる。下記式(A)で表されるポリオ
キシアルキレン脂肪酸エステルの場合、剥離液への分散
性及び界面活性力が良好であり、感光レジストを均一に
除去する効果が大きく好ましい。なお、式中Rは水素又
は炭素数30以下のアルキル基を表し、a,b,cは0
又は正の数を表す。ただし、a,b,cは同時には0と
はならない数である。Examples of the defoaming agent include polyoxyalkylene fatty acid esters, organic silicon compounds such as silicon oil, and the like. In the case of the polyoxyalkylene fatty acid ester represented by the following formula (A), the dispersibility in the stripping solution and the surface activity are good, and the effect of uniformly removing the photosensitive resist is large, which is preferable. In the formula, R represents hydrogen or an alkyl group having 30 or less carbon atoms, and a, b, and c are 0.
Or, it represents a positive number. However, a, b, and c are numbers that do not become 0 at the same time.
【0016】[0016]
【化1】 Embedded image
【0017】また、剥離液に消泡剤を含有する量として
は、剥離液100重量部に対して0.02〜0.1重量
部が好ましい。0.02重量部未満の場合は界面活性力
が小さく、厚みの薄い感光レジストや、小さな感光レジ
ストがわずかに残留する場合があり、また、0.1重量
部を越えると消泡剤が内層パターンの上に残留し、この
消泡剤が耐酸処理の反応性を変化させることにより内層
パターンに部分的に色調が薄くなる部分が少し発生する
場合があり問題となる。The amount of the defoaming agent contained in the stripping solution is preferably 0.02 to 0.1 part by weight per 100 parts by weight of the stripping solution. If the amount is less than 0.02 part by weight, the surface active force is small, and a thin photosensitive resist or a small photosensitive resist may remain slightly. If the amount exceeds 0.1 part by weight, the defoaming agent may cause an inner layer pattern. When the defoaming agent remains on the surface of the inner layer, the anti-foaming agent may change the reactivity of the acid resistance treatment.
【0018】内層パターンを形成するときの剥離以外の
工程である露光、現像、エッチング等は特に限定するも
のではなく、使用する感光レジストに応じて一般の方法
が適用可能である。Exposure, development, etching, etc., which are steps other than peeling when forming the inner layer pattern, are not particularly limited, and a general method can be applied depending on the photosensitive resist used.
【0019】なお、本発明に係る多層板の製造方法は、
内層パターンに耐酸処理が行われている場合に限定され
る。この耐酸処理とは、酸化処理後還元処理をする化学
的処理であり、銅箔及び/又は銅メッキによって形成さ
れた内層パターンの銅箔の光沢面又は銅メッキの表面に
対して施して、耐酸性を確保した上で接着性を向上させ
る処理である。一般的には酸化剤とアルカリを含む液で
処理し酸化銅とした後、有機性還元剤、活性水素又は弱
酸キレート溶液等により処理し、酸化処理のとき形成し
た黒色の酸化銅を還元により溶出させて、薄黒色又は濃
茶色の耐酸処理皮膜を形成する。そのため、酸化したと
きと比較して処理の色調が薄くなる。厚みの薄い感光レ
ジストや、小さな感光レジスト等が内層パターンの上に
残留していると耐酸処理の反応性を変化させ、内層パタ
ーンに部分的に特に色調が薄くなる部分が発生する。し
かし、本発明に係る製造方法によると、感光レジストを
均一に除去することができるため、内層パターンに部分
的に特に色調が薄くなる部分が発生しにくくなる。The method of manufacturing a multilayer board according to the present invention is as follows.
It is limited to the case where the inner layer pattern is subjected to acid resistance treatment. The acid-resistant treatment is a chemical treatment in which oxidation treatment and reduction treatment are performed, and the acid-proof treatment is performed on the shiny side or the copper-plated surface of the copper foil and / or the copper foil of the inner layer pattern formed by copper plating. This is a treatment for improving adhesiveness after ensuring the adhesiveness. Generally, after treating with a liquid containing an oxidizing agent and alkali to form copper oxide, it is treated with an organic reducing agent, active hydrogen or a weak acid chelate solution, etc., and the black copper oxide formed during the oxidizing treatment is eluted by reduction. Then, a light black or dark brown acid resistant film is formed. Therefore, the color tone of the treatment becomes lighter than that of the oxidation. If a thin photosensitive resist, a small photosensitive resist, or the like remains on the inner layer pattern, the reactivity of the acid resistance treatment is changed, and a part where the color tone is particularly thin occurs in the inner layer pattern. However, according to the manufacturing method of the present invention, since the photosensitive resist can be uniformly removed, a portion where the color tone is particularly thin is not likely to occur in the inner layer pattern.
【0020】本発明に用いられる感光レジストとして
は、水溶性(アルカリ現像型)の、シート状のドライフ
ィルム、インク等が挙げられる。厚み10〜50μmの
シート状感光レジストの場合、適度の解像度と適度の金
属部との密着力を合わせ持ち好ましい。なお、感光レジ
ストは、ネガタイプが好ましい。光が照射された部分の
感光レジストが現像により除去されるポジタイプは、金
属との密着力が劣るため、内層パターンを形成するとき
欠け不具合が発生しやすい。Examples of the photosensitive resist used in the present invention include water-soluble (alkaline developing type) sheet-like dry film and ink. A sheet-shaped photosensitive resist having a thickness of 10 to 50 μm is preferable because it has a proper resolution and a proper adhesion to the metal part. The photosensitive resist is preferably a negative type. The positive type, in which the photosensitive resist in the portion irradiated with light is removed by development, has a poor adhesion to a metal, and thus a chipping defect is likely to occur when forming the inner layer pattern.
【0021】本発明に用いられる銅張り積層板として
は、片面又は両面に銅箔が張られている板であればよ
く、例えば、エポキシ樹脂系、フェノール樹脂系、ポリ
イミド樹脂系、不飽和ポリエステル樹脂系、ポリフェニ
レンエーテル樹脂系等の熱硬化性樹脂や、ポリ塩化ビニ
ール、ポリエチレン等の熱可塑性樹脂のシートの片面又
は両面に銅箔が張られている板や、ガラス等の無機質繊
維やポリエステル、ポリアミド、ポリアクリル、ポリイ
ミド等の有機質繊維や、木綿等の天然繊維のクロス、ペ
ーパー等の基材を、上記熱硬化性樹脂や、上記熱可塑性
樹脂で接着し、片面又は両面に銅箔が張られている板等
が挙げられる。また、本発明に用いられる銅張り積層板
の銅箔としては電解銅箔、圧延銅箔等が挙げられ、銅箔
の厚みは、5〜70ミクロンであることが好ましい。5
ミクロン未満の場合は銅箔の入手が困難となり、70ミ
クロンを越える場合は回路のエッチング精度が低下す
る。なお、銅張り積層板として、銅箔が張られていない
板の表面に銅メッキを行い、銅の層を形成したものでも
よく、また銅張り積層板の表面に銅メッキを行ったもの
でもよい。The copper-clad laminate used in the present invention may be a plate having a copper foil stretched on one or both sides, and examples thereof include epoxy resin type, phenol resin type, polyimide resin type and unsaturated polyester resin. -Based, polyphenylene ether resin-based thermosetting resin, polyvinyl chloride, a sheet of thermoplastic resin such as polyethylene, a plate with copper foil on one or both sides, inorganic fibers such as glass, polyester, polyamide , Organic fibers such as polyacrylic and polyimide, cloth of natural fibers such as cotton, base materials such as paper are bonded with the thermosetting resin or the thermoplastic resin, and copper foil is stretched on one or both sides. A plate that is used. Examples of the copper foil of the copper-clad laminate used in the present invention include electrolytic copper foil and rolled copper foil, and the thickness of the copper foil is preferably 5 to 70 μm. 5
If it is less than micron, it becomes difficult to obtain the copper foil, and if it exceeds 70 micron, the etching accuracy of the circuit is deteriorated. The copper-clad laminate may be a copper-clad laminate having a copper layer formed by plating the surface of a plate not coated with copper foil, or may be a copper-clad laminate having a copper plated surface. .
【0022】内層用基板とプリプレグを積層し、加熱加
圧成形する方法は特に限定するものではなく、一般の方
法が適用可能である。なお、プリプレグは、樹脂を、
紙、布等の基材に含浸し、半硬化させて得られるもので
あり、樹脂としては、エポキシ樹脂系、フェノール樹脂
系、ポリイミド樹脂系、不飽和ポリエステル樹脂系、ポ
リフェニレンエーテル樹脂系等の単独、変性物、混合物
のように、熱硬化性樹脂全般が用いられ、必要に応じて
シリカ、炭酸カルシウム、水酸化アルミニウム、タルク
等の無機質粉末充填材や、ガラス繊維、パルプ繊維、合
成繊維、セラミック繊維等の繊維質充填材を含有する。
また、基材としては、ガラス等の無機質繊維やポリエス
テル、ポリアミド、ポリアクリル、ポリイミド等の有機
質繊維や、木綿等の天然繊維のクロス、ペーパー等が用
いられる。The method of laminating the inner layer substrate and the prepreg and heat-pressing is not particularly limited, and a general method can be applied. The prepreg is made of resin,
It is obtained by impregnating a base material such as paper or cloth and semi-curing it. As the resin, epoxy resin type, phenol resin type, polyimide resin type, unsaturated polyester resin type, polyphenylene ether resin type, etc. In general, thermosetting resins such as modified products and mixtures are used, and if necessary, inorganic powder fillers such as silica, calcium carbonate, aluminum hydroxide and talc, glass fibers, pulp fibers, synthetic fibers and ceramics. Contains fibrous fillers such as fibers.
As the base material, inorganic fibers such as glass, organic fibers such as polyester, polyamide, polyacryl and polyimide, cloth of natural fibers such as cotton, paper and the like are used.
【0023】[0023]
(実施例1)大きさ50×50cm、銅箔を除く厚み
0.4mmの両面ガラス基材エポキシ樹脂銅張り積層板
(FR−4タイプ)の銅箔(厚み35μm)表面に、厚
み30μm、ネガタイプ、シート状水溶性感光レジスト
[東京応化工業株式会社製、品名 AF−730]を貼
り付けた。次いで、その感光レジストにマスクフィルム
を接触させた後、50mJ/平方cmの光量のUV光を
照射して露光し、マスクフィルムを離した後、室温で3
0分放置した。次いで、現像液100重量部に対し炭酸
ナトリウムを1重量部含有する、温度28℃の液を2分
間スプレーしてマスクフィルムで遮蔽してUV光を照射
していない部分の感光レジストを溶解して現像した後、
水洗した。その後、塩化第2銅エッチング液を用いて感
光レジストが溶解した部分の金属部を溶かしてエッチン
グし、水洗し、次いで剥離液を2分間スプレーして残る
感光レジストを溶解して剥離し、水洗して内層パターン
を表面に有する内層用基板を形成した。(Example 1) A copper foil (thickness: 35 μm) of a double-sided glass substrate epoxy resin copper-clad laminate (FR-4 type) having a size of 50 × 50 cm and a thickness of 0.4 mm excluding a copper foil, a thickness of 30 μm, a negative type A sheet-shaped water-soluble photosensitive resist [manufactured by Tokyo Ohka Kogyo Co., Ltd., product name AF-730] was attached. Then, a mask film was brought into contact with the photosensitive resist, and then UV light having a light amount of 50 mJ / cm 2 was irradiated for exposure, and the mask film was released.
It was left for 0 minutes. Then, a solution containing 1 part by weight of sodium carbonate with respect to 100 parts by weight of a developing solution and having a temperature of 28 ° C. is sprayed for 2 minutes to shield with a mask film to dissolve the photosensitive resist in a portion not irradiated with UV light. After developing
Washed with water. Then, using a cupric chloride etching solution, the metal part of the part where the photosensitive resist is dissolved is dissolved and etched, and then washed with water, and then a stripping solution is sprayed for 2 minutes to dissolve and strip the remaining photosensitive resist, followed by washing with water. To form an inner layer substrate having an inner layer pattern on its surface.
【0024】なお、上記剥離液としては、剥離液100
重量部に対し水酸化ナトリウムを3重量部と、消泡剤と
して上記式(A)で表されるポリオキシアルキレン脂肪
酸エステル[東邦千葉化学工業株式会社製、品名 プロ
ナール502]を0.05重量部含有する、液温50℃
の液を用いた。As the above-mentioned stripping solution, the stripping solution 100
3 parts by weight of sodium hydroxide and 0.05 parts by weight of a polyoxyalkylene fatty acid ester represented by the above formula (A) [manufactured by Toho Chiba Chemical Co., Ltd., product name Pronal 502] as an antifoaming agent. Contains, liquid temperature 50 ℃
Was used.
【0025】得られた内層パターンの銅箔表面をバフ研
磨した後、塩化銅液に25℃で25秒浸漬し、水洗し、
次いで塩酸液に室温で60秒浸漬し、水洗し、次いで9
6℃の亜塩素酸ナトリウム、リン酸ナトリウム及び水酸
化ナトリウムを含む水溶液に60秒浸漬し、水洗し酸化
銅を形成した。次いで、酸化銅の上に亜鉛粉末をコーテ
ィングし硫酸に浸漬することにより水素を発生させ、そ
の水素により酸化銅を還元し、水洗し、100℃で20
分乾燥して、内層パターンに耐酸処理を施した。After buffing the obtained copper foil surface of the inner layer pattern, it was immersed in a copper chloride solution at 25 ° C. for 25 seconds and washed with water,
Then, soak in hydrochloric acid solution at room temperature for 60 seconds, wash with water, and then
It was immersed for 60 seconds in an aqueous solution containing sodium chlorite, sodium phosphate and sodium hydroxide at 6 ° C. and washed with water to form copper oxide. Next, copper powder is coated on the zinc oxide and immersed in sulfuric acid to generate hydrogen, the copper oxide is reduced by the hydrogen, washed with water, and heated at 100 ° C. for 20 minutes.
After minute drying, the inner layer pattern was subjected to acid resistance treatment.
【0026】次いで、その耐酸処理を施した内層用基板
に、厚み0.15mm、樹脂含有率50%のガラス基材
エポキシ樹脂プリプレグ(FR−4タイプ)を上下に各
2枚づつ重ね、さらにそのプリプレグの外層に厚み18
μmの銅箔を配して積層し、この積層物を温度170
℃、圧力3.9MPa、時間60分の条件で加熱加圧成
形して多層板を得た。Next, two glass-based epoxy resin prepregs (FR-4 type) each having a thickness of 0.15 mm and a resin content of 50% were stacked on the upper and lower two layers, respectively, on the acid-resistant inner layer substrate. 18-thick outer layer of prepreg
A copper foil of μm is arranged and laminated, and this laminated body is heated at a temperature of 170
A multilayer plate was obtained by heat and pressure molding under the conditions of ° C, pressure 3.9 MPa, time 60 minutes.
【0027】(実施例2)剥離液に含有するポリオキシ
アルキレン脂肪酸エステルの量が、水100重量部に対
し0.2重量部であること以外は実施例1と同様にして
多層板を得た。Example 2 A multilayer board was obtained in the same manner as in Example 1 except that the amount of the polyoxyalkylene fatty acid ester contained in the stripping solution was 0.2 part by weight with respect to 100 parts by weight of water. .
【0028】(比較例1)剥離液にポリオキシアルキレ
ン脂肪酸エステルを含有しないこと以外は実施例1と同
様にして、多層板を得た。Comparative Example 1 A multilayer board was obtained in the same manner as in Example 1 except that the stripping solution did not contain polyoxyalkylene fatty acid ester.
【0029】実施例1、2及び比較例1で得られた多層
板の外層銅箔をエッチングにより全面除去し、内層パタ
ーンに発生する斑点の有無を各5枚目視で調べて評価し
た。その結果は、表1に示したとおり、実施例1、2は
比較例1と比較して内層パターンに斑点が発生しにくい
ことが確認された。The outer layer copper foils of the multilayer boards obtained in Examples 1 and 2 and Comparative Example 1 were entirely removed by etching, and the presence or absence of spots in the inner layer pattern was visually inspected and evaluated. As a result, as shown in Table 1, it was confirmed that in Examples 1 and 2, spots were less likely to occur in the inner layer pattern as compared with Comparative Example 1.
【0030】[0030]
【表1】 [Table 1]
【0031】[0031]
【発明の効果】本発明に係る多層板の製造方法による
と、内層パターンに耐酸処理を施した内層用基板とプリ
プレグを積層し、加熱加圧成形して多層板を製造する際
に、内層パターンに点状の斑点が形成されず、外観上仕
上がりの良い多層板を得ることができる。According to the method for producing a multilayer board of the present invention, an inner layer pattern is formed when an inner layer substrate having an inner layer pattern subjected to an acid treatment and a prepreg are laminated and heat-pressed to produce a multilayer board. It is possible to obtain a multi-layer board having a good finished appearance without the formation of dot-like spots.
Claims (4)
トを施し、露光した後、現像、エッチングし、次いで剥
離液を用いて剥離して内層パターンを表面に有する内層
用基板を形成し、その内層用基板に酸化処理後還元処理
を行う処理をした後、その内層用基板とプリプレグを積
層し、加熱加圧成形して製造する多層板の製造方法にお
いて、剥離液に消泡剤を含有することを特徴とする多層
板の製造方法。1. A surface of a copper-clad laminate is coated with a water-soluble photosensitive resist, exposed, developed, etched, and then peeled using a peeling solution to form an inner layer substrate having an inner layer pattern on the surface, In the method for producing a multilayer board in which the inner layer substrate is subjected to a reduction treatment and then a reduction treatment, and then the inner layer substrate and a prepreg are laminated, and heated and pressed to produce, a defoaming agent is contained in the release liquid. A method for producing a multilayer board, comprising:
エステルであることを特徴とする請求項1記載の多層板
の製造方法。2. The method for producing a multilayer board according to claim 1, wherein the defoaming agent is a polyoxyalkylene fatty acid ester.
に対して0.02〜0.1重量部含有することを特徴と
する請求項1又は請求項2記載の多層板の製造方法。3. The production of a multilayer board according to claim 1, wherein the stripping solution contains an antifoaming agent in an amount of 0.02 to 0.1 part by weight per 100 parts by weight of the stripping solution. Method.
μmのシート状感光レジストであることを特徴とする請
求項1から請求項3のいずれかに記載の多層板の製造方
法。4. The water-soluble photosensitive resist has a thickness of 10 to 50.
The method for producing a multilayer board according to any one of claims 1 to 3, which is a sheet-like photosensitive resist having a thickness of µm.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP33300195A JPH09172256A (en) | 1995-12-21 | 1995-12-21 | Manufacture of multilayer board |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP33300195A JPH09172256A (en) | 1995-12-21 | 1995-12-21 | Manufacture of multilayer board |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH09172256A true JPH09172256A (en) | 1997-06-30 |
Family
ID=18261185
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP33300195A Pending JPH09172256A (en) | 1995-12-21 | 1995-12-21 | Manufacture of multilayer board |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH09172256A (en) |
-
1995
- 1995-12-21 JP JP33300195A patent/JPH09172256A/en active Pending
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