JPH09167748A - Substrate washing brush housing case - Google Patents
Substrate washing brush housing caseInfo
- Publication number
- JPH09167748A JPH09167748A JP7347583A JP34758395A JPH09167748A JP H09167748 A JPH09167748 A JP H09167748A JP 7347583 A JP7347583 A JP 7347583A JP 34758395 A JP34758395 A JP 34758395A JP H09167748 A JPH09167748 A JP H09167748A
- Authority
- JP
- Japan
- Prior art keywords
- brush
- container
- main body
- cleaning
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000758 substrate Substances 0.000 title claims abstract description 68
- 238000005406 washing Methods 0.000 title abstract 6
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 25
- 239000007788 liquid Substances 0.000 claims abstract description 19
- 239000011148 porous material Substances 0.000 claims abstract description 19
- 239000000463 material Substances 0.000 claims abstract description 12
- 230000000844 anti-bacterial effect Effects 0.000 claims abstract description 11
- 239000004372 Polyvinyl alcohol Substances 0.000 claims abstract description 9
- 229920002451 polyvinyl alcohol Polymers 0.000 claims abstract description 9
- 238000004140 cleaning Methods 0.000 claims description 116
- 239000002994 raw material Substances 0.000 claims description 4
- 238000003860 storage Methods 0.000 abstract description 38
- 244000005700 microbiome Species 0.000 abstract description 8
- 238000000034 method Methods 0.000 abstract description 5
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 18
- 230000002093 peripheral effect Effects 0.000 description 11
- 239000000126 substance Substances 0.000 description 9
- 239000004065 semiconductor Substances 0.000 description 5
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 4
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical group O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 3
- 239000004743 Polypropylene Substances 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- -1 polypropylene Polymers 0.000 description 3
- 229920001155 polypropylene Polymers 0.000 description 3
- 239000003795 chemical substances by application Substances 0.000 description 2
- 229920003023 plastic Polymers 0.000 description 2
- 239000004033 plastic Substances 0.000 description 2
- 239000002699 waste material Substances 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 239000004677 Nylon Substances 0.000 description 1
- 229920000297 Rayon Polymers 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- QOSATHPSBFQAML-UHFFFAOYSA-N hydrogen peroxide;hydrate Chemical compound O.OO QOSATHPSBFQAML-UHFFFAOYSA-N 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 229920001778 nylon Polymers 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 150000002978 peroxides Chemical class 0.000 description 1
- 239000002964 rayon Substances 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
Landscapes
- Liquid Crystal (AREA)
- Cleaning In General (AREA)
- Brushes (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Abstract
Description
【０００１】[0001]
【発明の属する技術分野】この発明は、半導体ウエハ、
液晶表示装置用或いはフォトマスク用のガラス基板、光
ディスク用の基板等の各種基板を水平姿勢に保持して鉛
直軸回りに回転させながら基板上に洗浄液を供給して基
板をブラシ洗浄する基板洗浄装置において使用される基
板洗浄用ブラシ、特に、ブラシ本体が親水性を有するス
ポンジ状の多孔質素材によって形成された基板洗浄用ブ
ラシをブラシ収納容器に収納した基板洗浄用ブラシ収納
体に関する。[0001] The present invention relates to a semiconductor wafer,
A substrate cleaning device that holds various substrates such as a glass substrate for a liquid crystal display device or a photomask and a substrate for an optical disk in a horizontal position and supplies a cleaning liquid onto the substrate while rotating the substrate about a vertical axis to brush-clean the substrate. The present invention relates to a substrate cleaning brush used in the above, and more particularly to a substrate cleaning brush container in which a brush cleaning container in which a brush main body formed of a hydrophilic sponge-like porous material is housed in a brush container.
【０００２】[0002]
【従来の技術】洗浄用ブラシによって基板を洗浄する基
板洗浄装置の構成及び動作の１例を簡単に説明すると、
基板、例えば半導体ウエハをスピンチャックの上面側に
真空吸着によって水平姿勢に保持し、スピンチャックに
保持された基板を鉛直軸回りに回転させながら、その基
板上に洗浄液を供給し、ブラシ保持アームのブラシ回転
軸を回転させ、その回転軸に固着されブラシ保持アーム
によって懸吊状態に保持された洗浄用ブラシを自転させ
ながら上方位置から下降させて、洗浄用ブラシの下端を
基板表面に接近させ、洗浄用ブラシ下端を基板表面に接
触させ或いは近接させた状態で、自転している洗浄用ブ
ラシを回転している基板の表面に沿って基板上を移動さ
せることにより、基板の洗浄を行なうようにする。この
ような基板洗浄装置においては、使用により劣化した洗
浄用ブラシを交換したり、基板の種類や洗浄の目的など
に応じて洗浄用ブラシの種類を変えたりしている。この
ため、洗浄用ブラシをブラシ保持アームのブラシ回転軸
に取り付け、また、洗浄用ブラシをブラシ回転軸から取
り外すことができるようにしている。2. Description of the Related Art An example of the structure and operation of a substrate cleaning apparatus for cleaning a substrate with a cleaning brush will be briefly described.
A substrate, for example, a semiconductor wafer is held in a horizontal posture on the upper surface side of the spin chuck by vacuum suction, and while the substrate held by the spin chuck is rotated around a vertical axis, a cleaning liquid is supplied onto the substrate and the brush holding arm is rotated. The brush rotating shaft is rotated, and the cleaning brush fixed to the rotating shaft and held in a suspended state by the brush holding arm is rotated while being lowered from the upper position to bring the lower end of the cleaning brush close to the substrate surface, Cleaning the substrate by moving the rotating cleaning brush on the substrate along the surface of the rotating substrate while the lower end of the cleaning brush is in contact with or close to the substrate surface. To do. In such a substrate cleaning apparatus, the cleaning brush that has deteriorated due to use is replaced, or the type of cleaning brush is changed according to the type of substrate and the purpose of cleaning. Therefore, the cleaning brush can be attached to the brush rotating shaft of the brush holding arm, and the cleaning brush can be removed from the brush rotating shaft.
【０００３】洗浄用ブラシは、ブラシホルダとブラシ本
体とから構成され、ブラシ本体としては、下面側に多数
の毛を植設して形成されたものが一般に使用されている
が、最近では、例えばポリビニルアルコールを原料とし
て製造され親水性を有するスポンジ状の多孔質素材によ
って形成されたものが使用され始めている。このような
多孔質素材で形成されたブラシ本体をブラシホルダに取
着した洗浄用ブラシは、従来、乾燥状態で容器内に収納
されて保管及び輸送され、半導体製造工場等のユーザに
おいて、洗浄用ブラシを使用する前に、ブラシ本体に純
水等の洗浄液を十分に含浸させて、ブラシ本体を一旦湿
潤状態にしてから、ダミー基板を使用してブラシ洗浄を
行ない、その後に、ライン稼動を行なうようにしてい
た。ところが、親水性を有するスポンジ状の多孔質素材
からなるブラシ本体は、乾いた状態では全く弾力性が無
く硬質物化しており、これに純水等を含浸させて使用可
能な状態にまで軟らかくするためには、相当の時間がか
かり、ライン稼動に入るまでに３０分〜６時間といった
多くの時間を費やしていた。A cleaning brush is composed of a brush holder and a brush main body. As the brush main body, one formed by implanting a large number of bristles on the lower surface side is generally used, but recently, for example, Those made of polyvinyl alcohol as a raw material and made of a hydrophilic sponge-like porous material have begun to be used. Conventionally, a cleaning brush in which a brush main body made of such a porous material is attached to a brush holder is conventionally stored in a container in a dry state, stored and transported, and used for cleaning by a user in a semiconductor manufacturing factory or the like. Before using the brush, fully impregnate the brush body with a cleaning solution such as pure water, moisten the brush body once, and then wash the brush using a dummy substrate, and then perform line operation. Was doing. However, the brush body made of a hydrophilic sponge-like porous material is hard and has no elasticity in the dry state, and is impregnated with pure water to soften it until it can be used. Therefore, it takes a considerable amount of time, and a lot of time such as 30 minutes to 6 hours is spent before the line operation starts.
【０００４】そこで、容器内に液体を収容し、その液体
中に親水性を有するスポンジ状の多孔質素材からなるブ
ラシ本体を浸漬させて、基板洗浄用ブラシを保管し輸送
する、といったことが行なわれる。この場合、スポンジ
状の多孔質素材からなるブラシ本体を常に湿潤状態に保
つことになるので、保管及び輸送中に容器内において微
生物が発生する、といった心配がある。このため、容器
内に注入する液体としては、ブラシ本体を腐食させたり
変質させたりすることがなくブラシ本体から物質を溶出
させることもなく、また、純水に溶解するといった性状
を有している他、容器内で微生物が発生するのを抑制す
る効果のあることが求められる。このような液体として
過酸化水素水やイソプロピルアルコールが使用され、そ
れらの薬液が容器内に注入されることになる。Therefore, a liquid is stored in a container, a brush main body made of a hydrophilic sponge-like porous material is immersed in the liquid, and a substrate cleaning brush is stored and transported. Be done. In this case, since the brush body made of the sponge-like porous material is always kept in a wet state, there is a concern that microorganisms will be generated in the container during storage and transportation. Therefore, the liquid to be injected into the container has the property that it does not corrode or deteriorate the brush body, does not elute the substance from the brush body, and dissolves in pure water. In addition, it is required to have an effect of suppressing the generation of microorganisms in the container. Hydrogen peroxide water or isopropyl alcohol is used as such a liquid, and these chemicals are injected into the container.
【０００５】[0005]
【発明が解決しようとする課題】しかしながら、上記し
た基板洗浄用ブラシの保管及び輸送方法では、過酸化水
素水やイソプロピルアルコールといった薬液が使用され
る。このため、半導体製造工場等のユーザにおいて、基
板洗浄用ブラシを使用する際に廃棄される過酸化水素水
やイソプロピルアルコールを廃液処理する必要が生じ
る。However, in the above method of storing and transporting the substrate cleaning brush, a chemical solution such as hydrogen peroxide solution or isopropyl alcohol is used. Therefore, it is necessary for a user of a semiconductor manufacturing factory or the like to perform a waste liquid treatment of hydrogen peroxide solution and isopropyl alcohol that are discarded when using the substrate cleaning brush.
【０００６】この発明は、以上のような事情に鑑みてな
されたものであり、ブラシ本体が親水性を有するスポン
ジ状の多孔質素材によって形成された基板洗浄用ブラシ
を使用する場合に、過酸化水素水やイソプロピルアルコ
ールといった薬液を使用することなく、ブラシ本体を液
体中に浸漬させて基板洗浄用ブラシを保管及び輸送する
過程で容器内に微生物が発生する、といったことを防止
することができる基板洗浄用ブラシ収納体を提供するこ
とを目的とする。The present invention has been made in view of the above circumstances, and when a brush for cleaning a substrate is used, in which the brush main body is made of a sponge-like porous material having hydrophilicity, peroxide is used. A substrate that can prevent the generation of microorganisms in the container during the process of storing and transporting the substrate cleaning brush by immersing the brush body in the liquid without using a chemical liquid such as hydrogen water or isopropyl alcohol It is an object to provide a cleaning brush container.
【０００７】[0007]
【課題を解決するための手段】請求項１に係る発明は、
ブラシ本体が親水性を有するスポンジ状の多孔質素材に
よって形成された基板洗浄用ブラシと、この基板洗浄用
ブラシの少なくとも前記ブラシ本体を気密に収納し、内
部に液体が収容され、その液体中に前記ブラシ本体が浸
漬させられるブラシ収納容器とからなる基板洗浄用ブラ
シ収納体において、前記基板洗浄用ブラシのブラシ本体
を抗菌性素材で形成するとともに、前記ブラシ収納容器
に収容される液体を純水としたことを特徴とする。The invention according to claim 1 is
A brush for cleaning a substrate, the brush main body of which is made of a sponge-like porous material having hydrophilicity, and at least the brush main body of the brush for cleaning a substrate is hermetically housed, a liquid is housed inside, and a liquid is contained in the liquid. In a brush cleaning body for cleaning a substrate, which comprises a brush storage container into which the brush main body is dipped, the brush main body of the substrate cleaning brush is formed of an antibacterial material, and the liquid stored in the brush storage container is pure water. It is characterized by
【０００８】請求項２に係る発明は、請求項１記載の基
板洗浄用ブラシ収納体において、ポリビニルアルコール
を原料として製造された多孔質素材によりブラシ本体を
形成したことを特徴とする。The invention according to a second aspect is characterized in that, in the brush container for cleaning a substrate according to the first aspect, the brush main body is formed of a porous material produced from polyvinyl alcohol as a raw material.
【０００９】請求項１に係る発明の基板洗浄用ブラシ収
納体では、基板洗浄用ブラシのブラシ本体が抗菌性素材
で形成されているため、過酸化水素水やイソプロピルア
ルコールといった薬液を使用しなくても、基板洗浄用ブ
ラシをブラシ収納容器内に収納して保管及び輸送する過
程で、収納容器内に微生物が発生することが抑えられ
る。また、ブラシ収納容器にはブラシ本体と反応する恐
れの無い純水が収容され、その純水中にブラシ本体が浸
漬させれられるので、ブラシ本体が腐食したり変質した
りすることがなく、ブラシ本体から物質が溶出すること
もない。また、半導体製造工場等のユーザにおいて、基
板洗浄用ブラシをブラシ収納容器から取り出してそのま
ま基板の純水洗浄に使用することが可能である。In the substrate cleaning brush container according to the first aspect of the present invention, since the brush main body of the substrate cleaning brush is made of an antibacterial material, a chemical solution such as hydrogen peroxide solution or isopropyl alcohol is not used. Also, in the process of storing and transporting the substrate cleaning brush in the brush storage container, generation of microorganisms in the storage container can be suppressed. Further, since the brush storage container stores pure water that does not react with the brush main body and the brush main body is immersed in the pure water, the brush main body is not corroded or deteriorated. No substance elutes from the body. Further, a user of a semiconductor manufacturing factory or the like can take out the substrate cleaning brush from the brush storage container and use it as it is for cleaning the substrate with pure water.
【００１０】請求項２に係る発明の基板洗浄用ブラシ収
納体では、ポリビニルアルコールを原料として製造され
た多孔質素材で形成されたブラシ本体は、乾燥した状態
では非常に硬くなり、その状態のブラシ本体に純水等を
含浸させて柔軟化させるのには相当の時間を要すること
となるが、純水中に浸漬させられて保管されることによ
り、柔軟化した状態に保たれる。In the brush cleaning body for cleaning a substrate according to the second aspect of the present invention, the brush body made of a porous material made of polyvinyl alcohol is very hard in a dry state, and the brush in that state. It takes a considerable amount of time to impregnate the main body with pure water or the like to make it flexible, but the body is kept in a softened state by being immersed in pure water and stored.
【００１１】[0011]
【発明の実施の形態】以下、この発明の最良の実施形態
について図面を参照しながら説明する。Preferred embodiments of the present invention will be described below with reference to the drawings.
【００１２】図１ないし図３は、この発明の実施形態の
１例を示し、図１は、基板洗浄用ブラシ収納体を分解し
た状態を示す斜視図、図２は、収納容器に洗浄用ブラシ
を収納した状態の基板洗浄用ブラシ収納体を示す部分縦
断面図、図３は、洗浄用ブラシを基板洗浄装置のブラシ
回転軸に取着した状態を示す部分縦断面図である。1 to 3 show an example of an embodiment of the present invention, FIG. 1 is a perspective view showing a state in which a brush cleaning body for cleaning a substrate is disassembled, and FIG. 2 is a cleaning brush in a storage container. FIG. 3 is a partial vertical cross-sectional view showing the substrate cleaning brush accommodating body in a state in which is stored, and FIG. 3 is a partial vertical cross-sectional view showing a state in which the cleaning brush is attached to the brush rotation shaft of the substrate cleaning device.
【００１３】この基板洗浄用ブラシ収納体は、洗浄用ブ
ラシ１０と収納容器３８とから構成されている。洗浄用
ブラシ１０は、上部取着部１２と下部保持部１４とから
なるブラシホルダにブラシ本体１６を保持して構成され
ている。ブラシ本体１６は、上半部が大径に形成され、
下半部が大径部１８より小径の小径部２０となってい
る。このブラシ本体１６は、親水性を有するスポンジ状
の多孔質素材、例えばポリビニルアルコールを原料とし
た多孔質素材であって抗菌性素材により形成されてい
る。多孔質素材は、例えば、ポリビニルアルコールに酸
を触媒としてホルムアルデヒドを結合させるホルマール
化反応によりポリビニルホルマールを生成し、その際、
気孔生成剤を加えて気孔形成を行ない、不溶性の多孔質
基質が完成した後、気泡生成剤を抽出することにより製
造される。この素材により形成されたブラシ本体１６
は、連続的な気孔が形成され、親水性を有し、湿潤時に
は良好な柔軟性、弾力性を呈し、乾燥時には全く弾力性
が無くなって硬質物化する。The substrate cleaning brush container is composed of the cleaning brush 10 and a container 38. The cleaning brush 10 is configured by holding a brush main body 16 in a brush holder including an upper attachment portion 12 and a lower holding portion 14. The brush body 16 has a large diameter in the upper half,
The lower half portion is a small diameter portion 20 having a smaller diameter than the large diameter portion 18. The brush body 16 is made of a sponge-like porous material having hydrophilicity, for example, a porous material made of polyvinyl alcohol as a raw material and an antibacterial material. The porous material is, for example, polyvinyl formal is produced by a formalization reaction in which formaldehyde is bound to polyvinyl alcohol using an acid as a catalyst, and at that time,
It is produced by adding a pore-forming agent to form pores, and after completing the insoluble porous substrate, extracting the bubble-generating agent. Brush body 16 made of this material
Has a continuous porosity, has hydrophilicity, exhibits good flexibility and elasticity when wet, and loses elasticity at all when dried to become a hard material.
【００１４】尚、ブラシ本体１６の形成素材としては、
抗菌性ポリビニルアルコール以外にも、例えば抗菌性ポ
リプロピレン、抗菌性ナイロン、抗菌性レーヨンなどで
あってもよい。As a material for forming the brush main body 16,
Other than the antibacterial polyvinyl alcohol, for example, antibacterial polypropylene, antibacterial nylon, antibacterial rayon or the like may be used.
【００１５】ブラシホルダの上部取着部１２の上面中央
部には、洗浄用ブラシ１０を基板洗浄装置のブラシ回転
軸に取着するための係止部２２が一体に突設されてお
り、係止部２２に雄ねじ２４が螺刻されている。また、
係止部２２の上端面には、その中央部に角穴２６が軸心
線方向に穿設されている。上部取着部１２の下半部は、
上半部に比べて若干細く形成されており、この下半部の
嵌合部２８に円筒状の下部保持部１４の上端部が嵌着さ
れる。図１中の符号３０は、上部取着部１２の嵌合部２
８の外周面に形設された係止小突起であり、符号３２
は、嵌合部２８に下部保持部１４の上端部を嵌着したと
きに係止小突起３０と係合する係止小凹部である。下部
保持部１４の外径寸法は、上部取着部１２の上半部の外
径と同じにし、また、下部保持部１４の内径寸法は、ブ
ラシ本体１６の大径部１８の外径より僅かに大きくされ
ている。また、下部保持部１４の下端近くの内周面に
は、支持環状部３４が一体に形設されている。支持環状
部３４の内径寸法は、ブラシ本体１６の小径部２０の外
径より僅かに大きくかつ大径部１８の外径より小さくさ
れている。また、下部保持部１４の下端には、互いに１
８０°の角度をなす位置関係で２個所に回り止め用切欠
き３６が形成されている。このブラシホルダは、例えば
ポリプロピレン等のプラスチック材によって形成され
る。An engaging portion 22 for attaching the cleaning brush 10 to the brush rotating shaft of the substrate cleaning apparatus is integrally projectingly provided at the center of the upper surface of the upper attaching portion 12 of the brush holder. A male screw 24 is threaded on the stopper 22. Also,
A square hole 26 is formed in the center of the upper end surface of the locking portion 22 in the axial direction. The lower half of the upper mounting part 12
It is formed slightly thinner than the upper half portion, and the upper end portion of the cylindrical lower holding portion 14 is fitted into the fitting portion 28 of the lower half portion. Reference numeral 30 in FIG. 1 denotes the fitting portion 2 of the upper attachment portion 12.
8 is a locking small protrusion formed on the outer peripheral surface of 8,
Is a small locking recess that engages with the small locking protrusion 30 when the upper end of the lower holding unit 14 is fitted into the fitting unit 28. The outer diameter of the lower holding portion 14 is the same as the outer diameter of the upper half of the upper attachment portion 12, and the inner diameter of the lower holding portion 14 is smaller than the outer diameter of the large diameter portion 18 of the brush body 16. Has been made larger. A support annular portion 34 is integrally formed on the inner peripheral surface near the lower end of the lower holding portion 14. The inner diameter of the support annular portion 34 is slightly larger than the outer diameter of the small diameter portion 20 of the brush body 16 and smaller than the outer diameter of the large diameter portion 18. In addition, at the lower ends of the lower holding portions 14,
Rotation notches 36 are formed at two positions in a positional relationship of forming an angle of 80 °. The brush holder is made of a plastic material such as polypropylene.
【００１６】ブラシホルダにブラシ本体１６を保持する
には、下部保持部１４の支持環状部３４の孔にブラシ本
体１６の小径部２０を挿入して、下部保持部１４内にブ
ラシ本体１６を収容した後、下部保持部１４の上端部に
上部取着部１２の嵌合部２８を嵌着させるようにすれば
よい。このとき、ブラシ本体１６は、下部保持部１４の
支持環状部３４によって支持されるとともに、上面が上
部取着部１２の下面に当接して、ブラシホルダに対する
上下方向の移動が規制され、また、下部保持部１４の内
周面によってブラシホルダに対する横方向の移動が規制
される。そして、ブラシ本体１６がブラシホルダに保持
されたときに、ブラシ本体１６の下端面が下部保持部１
４の下端より下方へ突き出た状態になる。In order to hold the brush main body 16 in the brush holder, the small diameter portion 20 of the brush main body 16 is inserted into the hole of the support annular portion 34 of the lower holding portion 14 to accommodate the brush main body 16 in the lower holding portion 14. After that, the fitting portion 28 of the upper attachment portion 12 may be fitted to the upper end portion of the lower holding portion 14. At this time, the brush main body 16 is supported by the support annular portion 34 of the lower holding portion 14, and the upper surface of the brush main body 16 contacts the lower surface of the upper mounting portion 12 to restrict the movement in the vertical direction with respect to the brush holder. The inner peripheral surface of the lower holding portion 14 restricts lateral movement with respect to the brush holder. Then, when the brush main body 16 is held by the brush holder, the lower end surface of the brush main body 16 has a lower holding portion 1.
It is in a state of protruding downward from the lower end of 4.
【００１７】収納容器３８は、容器本体４０と蓋体４２
とから構成されており、容器本体４０及び蓋体４２は、
例えばポリプロピレン等のプラスチック材によって形成
されている。容器本体４０は、その上面が開口し、内径
寸法が洗浄用ブラシ１０のブラシホルダの外径より僅か
に大きくされている。また、容器本体４０の内周面に
は、互いに１８０°の角度をなす位置関係で２個所に、
容器本体４０の内底面から容器本体４０の軸線方向に沿
って延びる回り止め用棒状突起４４がそれぞれ突設され
ており、また、両回り止め用棒状突起４４を含めて互い
に６０°ずつの角度をなす位置関係で４個所に、容器本
体４０の内底面から容器本体４０の軸線方向に沿って延
び回り止め用棒状突起４４より若干短い支持用棒状突起
４６がそれぞれ突設されている。そして、図２に示すよ
うに、洗浄用ブラシ１０を容器本体４０内へ、ブラシホ
ルダの下部保持部１４の回り止め用切欠き３６の位置と
容器本体４０の回り止め用棒状突起４４の位置とを合わ
せて嵌挿すると、４個の支持用棒状突起４６の上端に洗
浄用ブラシ１０のブラシホルダの下部保持部１４の下端
が当接し、４個の支持用棒状突起４６によって洗浄用ブ
ラシ１０が容器本体４０内において支持されるととも
に、各回り止め用棒状突起４４の上端部に各回り止め用
切欠き３６がそれぞれ嵌合して、洗浄用ブラシ１０が容
器本体４０内において軸心線回りに回動しないように固
定される。このとき、洗浄用ブラシ１０のブラシ本体１
６の下端面が容器本体４０の内底面に接触しないように
なっている。また、容器本体４０の上端部外周面には雄
ねじ４８が螺刻されている。The storage container 38 includes a container body 40 and a lid 42.
And the container body 40 and the lid 42 are
For example, it is formed of a plastic material such as polypropylene. The upper surface of the container body 40 is open, and the inner diameter of the container body 40 is slightly larger than the outer diameter of the brush holder of the cleaning brush 10. Further, on the inner peripheral surface of the container body 40, at two positions in a positional relationship of forming an angle of 180 ° with each other,
Anti-rotation bar-shaped projections 44 extending from the inner bottom surface of the container body 40 along the axial direction of the container body 40 are provided in a protruding manner, and the anti-rotation bar-shaped projections 44 are included at an angle of 60 ° to each other. The supporting rod-shaped projections 46, which extend from the inner bottom surface of the container body 40 along the axial direction of the container body 40 and are slightly shorter than the rotation-stopping rod-shaped projections 44, are provided at four positions in the positional relationship. Then, as shown in FIG. 2, the cleaning brush 10 is inserted into the container body 40, and the position of the rotation preventing notch 36 of the lower holding portion 14 of the brush holder and the position of the rotation preventing rod-shaped projection 44 of the container body 40 are set. When they are fitted together, the lower ends of the lower holding portions 14 of the brush holders of the cleaning brushes 10 abut on the upper ends of the four supporting bar-shaped projections 46, and the cleaning brush 10 is moved by the four supporting bar-shaped projections 46. While being supported in the container body 40, the rotation preventing notches 36 are respectively fitted to the upper end portions of the rotation preventing rod-shaped projections 44, so that the cleaning brush 10 is rotated around the axis in the container body 40. It is fixed so that it does not rotate. At this time, the brush body 1 of the cleaning brush 10
The lower end surface of 6 does not come into contact with the inner bottom surface of the container body 40. A male screw 48 is threaded on the outer peripheral surface of the upper end portion of the container body 40.
【００１８】蓋体４２の内周面には、図１には示されて
いないが、容器本体４０の上端部外周面に螺刻された雄
ねじ４８に螺合する雌ねじが螺刻されている。また、蓋
体４２の内側上面の中央部に、洗浄用ブラシ１０の係止
部２２が遊嵌する凹部５０が形成されている。そして、
蓋体４２の内側上面の、凹部５０の形成部分以外の面
が、洗浄用ブラシ１０のブラシホルダ上面と接触もしく
は近接して洗浄用ブラシ１０の移動を規制もしくは許容
範囲で制限する制動部をなすことになる。また、蓋体４
２の内側上面の周縁部には、蓋体４２の内周面の雌ねじ
に容器本体４０の上端部外周面の雄ねじ４８を螺入させ
て、蓋体４２を容器本体４０に螺合させたときに、容器
本体４０の上端側に密接して収納容器３８の内部を気密
に保持するガスケット５２が取着されている。Although not shown in FIG. 1, an internal thread which is not shown in FIG. 1 and which is screwed onto the external thread 48 threaded on the outer peripheral surface of the upper end portion of the container body 40 is threaded on the inner surface of the lid 42. Further, a concave portion 50 into which the locking portion 22 of the cleaning brush 10 is loosely fitted is formed in the central portion of the inner upper surface of the lid body 42. And
The inner upper surface of the lid 42 other than the portion where the recess 50 is formed is in contact with or close to the upper surface of the brush holder of the cleaning brush 10 to form a braking portion that restricts the movement of the cleaning brush 10 or restricts it within an allowable range. It will be. Also, the lid 4
When the male screw 48 on the outer peripheral surface of the upper end portion of the container body 40 is screwed into the female screw on the inner peripheral surface of the lid body 42 at the peripheral edge portion of the inner upper surface of 2, the lid body 42 is screwed into the container body 40. A gasket 52 is attached to the upper end of the container body 40 to hold the inside of the storage container 38 airtight.
【００１９】洗浄用ブラシ１０は、収納容器３８の容器
本体４０内に図２に示すような状態で収納され、容器本
体４０内には純水が注入され、その後に、蓋体４２によ
って容器本体４０の上面開口が密閉される。収納容器３
８内に注入する純水の量は、保管や輸送中に収納容器３
８が傾いたり逆さになったりしても、ブラシ本体１６の
全体が常に純水中に浸漬された状態となる程度としてお
く。容器本体４０に蓋体４２を螺合させて収納容器３８
を密閉した状態においては、上記したように収納容器３
８内での洗浄用ブラシ１０の移動が規制されもしくは許
容範囲で制限され、保管や輸送中に洗浄用ブラシ１０が
収納容器３８内で大きく揺動することはない。また、ブ
ラシ本体１６の下端面が容器本体４０の内底面に接触し
ないように保持されるので、洗浄用ブラシ１０の保管や
輸送中にブラシ本体１６が変形するようなことがない。
さらに、収納容器３８が密閉された状態においては、保
管や輸送中に収納容器３８内から純水が漏れ出たり蒸発
したりすることがなく、また、保管や輸送中に収納容器
３８内へパーティクルが混入する心配も無い。また、洗
浄用ブラシ１０のブラシ本体１６は、常に全体が純水中
に浸漬しているので、柔軟化し弾力性を有する状態に保
たれる。従って、洗浄用ブラシ１０は、収納容器３８か
ら取り出して直ちに基板の洗浄処理に使用することが可
能である。そして、洗浄用ブラシ１０のブラシ本体１６
は抗菌性素材で形成されているため、収納容器内に微生
物が発生することが抑えられる。また、収納容器３８に
は純水が収容されているため、ブラシ本体が腐食したり
変質したりすることがなく、ブラシ本体から物質が溶出
することもなく、また、洗浄用ブラシ１０を収納容器３
８から取り出してそのまま基板の純水洗浄に使用するこ
とが可能である。The cleaning brush 10 is housed in the container body 40 of the container 38 in the state shown in FIG. 2, pure water is injected into the container body 40, and then the container body 40 is closed by the lid 42. The top opening of 40 is sealed. Storage container 3
The amount of pure water to be injected into the container 8 depends on the storage container 3 during storage and transportation.
Even if 8 is tilted or inverted, the entire brush body 16 is always immersed in pure water. The container 42 is screwed into the container body 40 to accommodate the storage container 38.
In the closed state, the storage container 3
The movement of the cleaning brush 10 within the container 8 is regulated or restricted within an allowable range, and the cleaning brush 10 does not largely swing in the storage container 38 during storage or transportation. Further, since the lower end surface of the brush main body 16 is held so as not to contact the inner bottom surface of the container main body 40, the brush main body 16 is not deformed during storage or transportation of the cleaning brush 10.
Further, when the storage container 38 is hermetically sealed, pure water does not leak or evaporate from the storage container 38 during storage or transportation, and particles are stored in the storage container 38 during storage or transportation. There is no need to worry. Further, since the entire brush body 16 of the cleaning brush 10 is always immersed in pure water, the brush body 16 is kept soft and elastic. Therefore, the cleaning brush 10 can be used for cleaning the substrate immediately after being taken out from the storage container 38. Then, the brush body 16 of the cleaning brush 10
Since is formed of an antibacterial material, it is possible to suppress the generation of microorganisms in the storage container. Further, since pure water is stored in the storage container 38, the brush main body is not corroded or deteriorated, no substance is eluted from the brush main body, and the cleaning brush 10 is stored in the storage container 38. Three
It is possible to take it out from No. 8 and use it as it is for cleaning the substrate with pure water.
【００２０】次に、収納容器３８に収納された洗浄用ブ
ラシ１０を基板洗浄装置のブラシ回転軸に取着し、ま
た、ブラシ回転軸に取着された洗浄用ブラシ１０をブラ
シ回転軸から取り外して収納容器３８に収納する操作に
ついて、図３を参照しながら説明しておく。Next, the cleaning brush 10 stored in the storage container 38 is attached to the brush rotating shaft of the substrate cleaning apparatus, and the cleaning brush 10 attached to the brush rotating shaft is removed from the brush rotating shaft. The operation of storing the same in the storage container 38 will be described with reference to FIG.
【００２１】図３に示すように、洗浄用ブラシ１０が取
着されるブラシ回転軸５４は、その下端近くにフランジ
部５６が一体に形設されており、そのフランジ部５６よ
り下端側の部分５８が、洗浄用ブラシ１０の係止部２２
の上端面中央部に穿設された角穴２６と嵌合する角棒状
に形成されている。また、ブラシ回転軸５４のフランジ
部５６には、洗浄用ブラシ１０の係止部２２の雄ねじ２
４に螺合する雌ねじが螺刻されたナット６０が、ブラシ
回転軸５４の周りに回転可能に係合して保持されてい
る。そして、ブラシ回転軸５４に洗浄用ブラシ１０を取
着するには、まず、収納容器３８の蓋体４２を取り去っ
て容器本体４０の上面を開口させ、洗浄用ブラシ１０の
ブラシホルダの上面側を容器本体４０の上面開口から覗
かせた状態にする。次に、容器本体４０に洗浄用ブラシ
１０を収納したまま、容器本体４０を手で持って洗浄用
ブラシ１０を下方からブラシ回転軸５４に接近させ、係
止部２２の角穴２６をブラシ回転軸５４の下端部の角棒
状部分５８に嵌合させる。そして、容器本体４０を手で
支え持った状態で、係止部２２の雄ねじ２４にナット６
０を螺合させて締め付ける。この際、係止部２２の雄ね
じ２４にナット６０の雌ねじが螺合した状態で、手でナ
ット６０を回転させるように操作するが、ブラシホルダ
の下部保持部１４の回り止め用切欠き３６が容器本体４
０の内周面の回り止め用棒状突起４４の上端部に係合し
ているため、容器本体４０を手で把持しておくことによ
り、ナット６０を回転させても洗浄用ブラシ１０が共回
りすることはない。以上のようにして、図３に示すよう
に洗浄用ブラシ１０がブラシ回転軸５４に取着される
と、容器本体４０を下向きに引き上げて洗浄用ブラシ１
０から抜き出す。この間、洗浄用ブラシ１０には一切手
を触れずに、上記した一連の操作が行なわれる。As shown in FIG. 3, the brush rotary shaft 54 to which the cleaning brush 10 is attached has a flange portion 56 integrally formed near the lower end thereof, and a portion on the lower end side of the flange portion 56. Reference numeral 58 denotes the locking portion 22 of the cleaning brush 10.
Is formed in the shape of a square rod that fits into a square hole 26 formed in the center of the upper end surface of the. Further, the male screw 2 of the locking portion 22 of the cleaning brush 10 is attached to the flange portion 56 of the brush rotating shaft 54.
A nut 60 in which a female screw threaded to 4 is threaded is rotatably engaged and held around the brush rotary shaft 54. Then, in order to attach the cleaning brush 10 to the brush rotating shaft 54, first, the lid 42 of the storage container 38 is removed to open the upper surface of the container body 40, and the upper surface side of the brush holder of the cleaning brush 10 is attached. The container body 40 is in a state of being viewed through the top opening. Next, while the cleaning brush 10 is stored in the container body 40, the container body 40 is held by hand to bring the cleaning brush 10 close to the brush rotation shaft 54 from below, and the square hole 26 of the engaging portion 22 is rotated. The shaft 54 is fitted into the rectangular bar portion 58 at the lower end. Then, while holding the container body 40 by hand, the nut 6 is attached to the male screw 24 of the locking portion 22.
Screw 0 and tighten. At this time, the nut 60 is manually rotated while the female screw of the nut 60 is screwed into the male screw 24 of the locking portion 22, but the rotation notch 36 of the lower holding portion 14 of the brush holder is not removed. Container body 4
Since it engages with the upper end portion of the rotation-preventing rod-shaped projection 44 on the inner peripheral surface of 0, by holding the container body 40 by hand, the cleaning brush 10 rotates together even if the nut 60 is rotated. There is nothing to do. As described above, when the cleaning brush 10 is attached to the brush rotating shaft 54 as shown in FIG. 3, the container body 40 is pulled downward to raise the cleaning brush 1
Extract from 0. During this time, the series of operations described above is performed without touching the cleaning brush 10 at all.
【００２２】一方、ブラシ回転軸５４から洗浄用ブラシ
１０を取り外すときは、ブラシ回転軸５４に取着された
洗浄用ブラシ１０に下方から容器本体４０を接近させ、
図３に示したように洗浄用ブラシ１０に容器本体４０を
外挿する。そして、容器本体４０を手で支え持った状態
でナット６０を回転させ、ナット６０を係止部２２から
離脱させる。この際、ブラシホルダの下部保持部１４の
回り止め用切欠き３６が容器本体４０の内周面の回り止
め用棒状突起４４の上端部に係合しているため、容器本
体４０を手で把持しておくことにより、ナット６０を回
転させても洗浄用ブラシ１０が共回りすることはない。
ナット６０が係止部２２から離脱すると、容器本体４０
を下向きに引き下げ、係止部２２の角穴２６をブラシ回
転軸５４の下端部の角棒状部分５８から抜き出して、ブ
ラシ回転軸５４から洗浄用ブラシ１０を取り外す。そし
て、容器本体４０内へ純水を注入した後、容器本体４０
に蓋体４２を螺合させる。この取外し操作の間も、洗浄
用ブラシ１０に一切手を触れることがない。On the other hand, when removing the cleaning brush 10 from the brush rotating shaft 54, the container main body 40 is approached from below to the cleaning brush 10 attached to the brush rotating shaft 54,
As shown in FIG. 3, the container body 40 is externally attached to the cleaning brush 10. Then, the nut 60 is rotated while holding the container body 40 by hand, and the nut 60 is disengaged from the locking portion 22. At this time, since the rotation stop notch 36 of the lower holding portion 14 of the brush holder is engaged with the upper end portion of the rotation stop rod-shaped projection 44 on the inner peripheral surface of the container body 40, the container body 40 is gripped by hand. By doing so, even if the nut 60 is rotated, the cleaning brush 10 does not rotate together.
When the nut 60 is disengaged from the locking portion 22, the container body 40
Is pulled down, the square hole 26 of the engaging portion 22 is pulled out from the square bar portion 58 at the lower end portion of the brush rotary shaft 54, and the cleaning brush 10 is removed from the brush rotary shaft 54. Then, after injecting pure water into the container body 40,
The lid 42 is screwed onto the. During this removing operation, the cleaning brush 10 is not touched at all.
【００２３】この発明に係る基板洗浄用ブラシ収納体の
構成は以上説明した通りであるが、この発明の範囲は、
上記説明並びに図面の内容に限定されるものでないこと
は勿論である。すなわち、洗浄用ブラシのブラシホルダ
の構成やブラシ本体の形状、素材などは、上記説明のも
のに限定されないし、また、上記説明では、収納容器に
１個の基板洗浄用ブラシを収納するようにしているが、
純水が入った容器に複数個の洗浄用ブラシを同時に収納
するようにしても差し支えない。The structure of the brush cleaning body for cleaning a substrate according to the present invention is as described above, but the scope of the present invention is:
Of course, the present invention is not limited to the above description and the contents of the drawings. That is, the configuration of the brush holder of the cleaning brush, the shape of the brush main body, the material, etc. are not limited to those described above, and in the above description, one substrate cleaning brush is stored in the storage container. However,
There may be no problem even if a plurality of cleaning brushes are simultaneously stored in a container containing pure water.
【００２４】[0024]
【発明の効果】請求項１に係る発明の基板洗浄用ブラシ
収納体を使用すると、過酸化水素水やイソプロピルアル
コールといった薬液を使用しなくても、親水性を有する
スポンジ状の多孔質素材によって形成されたブラシ本体
をブラシ収納容器内の純水中に浸漬させて基板洗浄用ブ
ラシを保管及び輸送する過程において、ブラシ収納容器
内に微生物が発生することが抑えられる。そして、薬液
を使用しないので、基板洗浄用ブラシを使用する際にそ
の廃液処理を行なう必要が無くなる。When the substrate cleaning brush container according to the first aspect of the present invention is used, it is formed of a hydrophilic sponge-like porous material without using a chemical solution such as hydrogen peroxide solution or isopropyl alcohol. It is possible to suppress the generation of microorganisms in the brush storage container during the process of storing and transporting the substrate cleaning brush by immersing the brush main body in pure water in the brush storage container. Further, since the chemical liquid is not used, it is not necessary to perform the waste liquid treatment when the substrate cleaning brush is used.
【００２５】請求項２に係る発明の基板洗浄用ブラシ収
納体では、ポリビニルアルコールを原料として製造され
た多孔質素材で形成されたブラシ本体が、純水中に浸漬
させられて柔軟化した状態に保たれるとともに、ブラシ
収納容器内に微生物が発生することが抑えられる。In the brush container for cleaning a substrate according to the second aspect of the present invention, the brush main body made of a porous material made of polyvinyl alcohol is made soaked in pure water to be softened. While being kept, the generation of microorganisms in the brush storage container is suppressed.
【図１】この発明の実施形態の１例を示し、基板洗浄用
ブラシ収納体を分解した状態を示す斜視図である。FIG. 1 is a perspective view showing an example of an embodiment of the present invention and showing a state in which a brush holder for cleaning a substrate is disassembled.
【図２】図１に示した基板洗浄用ブラシ収納体の収納容
器に洗浄用ブラシを収納した状態を示す部分縦断面図で
ある。FIG. 2 is a partial vertical cross-sectional view showing a state in which a cleaning brush is stored in a storage container of the substrate cleaning brush storage body shown in FIG.
【図３】図１に示した基板洗浄用ブラシ収納体の洗浄用
ブラシを基板洗浄装置のブラシ回転軸に取着した状態を
示す部分縦断面図である。FIG. 3 is a partial vertical cross-sectional view showing a state in which the cleaning brush of the substrate cleaning brush housing shown in FIG. 1 is attached to a brush rotation shaft of a substrate cleaning device.
１０ 洗浄用ブラシ １２ ブラシホルダの上部取着部 １４ ブラシホルダの下部保持部 １６ ブラシ本体 ２２ ブラシホルダの係止部 ３６ 回り止め用切欠き部 ３８ 収納容器 ４０ 容器本体 ４２ 蓋体 ４４ 回り止め用棒状突起 ４６ 支持用棒状突起 ５４ 基板洗浄装置のブラシ回転軸 10 Cleaning Brush 12 Upper Attachment Part of Brush Holder 14 Lower Holding Part of Brush Holder 16 Brush Main Body 22 Locking Part of Brush Holder 36 Notch for Rotation Stop 38 Storage Container 40 Container Body 42 Lid 44 Rod for Rotation Stop Protrusion 46 Supporting rod-like protrusion 54 Brush rotating shaft of substrate cleaning device
───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.6 識別記号 庁内整理番号 ＦＩ 技術表示箇所 Ｇ０２Ｆ 1/1333 ５００ Ｇ０２Ｆ 1/1333 ５００ ─────────────────────────────────────────────────── ─── Continuation of the front page (51) Int.Cl. 6 Identification code Internal reference number FI Technical display location G02F 1/1333 500 G02F 1/1333 500
Claims (2)
の多孔質素材によって形成された基板洗浄用ブラシと、 この基板洗浄用ブラシの少なくとも前記ブラシ本体を気
密に収納し、内部に液体が収容され、その液体中に前記
ブラシ本体が浸漬させられるブラシ収納容器とからなる
基板洗浄用ブラシ収納体において、 前記基板洗浄用ブラシのブラシ本体を抗菌性素材で形成
するとともに、前記ブラシ収納容器に収容される液体を
純水としたことを特徴とする基板洗浄用ブラシ収納体。1. A brush for cleaning a substrate, the brush main body of which is made of a hydrophilic sponge-like porous material, and at least the brush main body of the brush for cleaning a substrate is hermetically housed and a liquid is housed therein. A substrate cleaning brush container comprising a brush container in which the brush main body is immersed in the liquid, wherein the brush main body of the substrate cleaning brush is formed of an antibacterial material, and is housed in the brush container. A brush container for cleaning a substrate, wherein the liquid used is pure water.
リビニルアルコールを原料として製造されたものである
請求項１記載の基板洗浄用ブラシ収納体。2. The substrate cleaning brush container according to claim 1, wherein the porous material forming the brush main body is manufactured using polyvinyl alcohol as a raw material.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP34758395A JP3396123B2 (en) | 1995-12-15 | 1995-12-15 | Substrate cleaning brush housing |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP34758395A JP3396123B2 (en) | 1995-12-15 | 1995-12-15 | Substrate cleaning brush housing |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH09167748A true JPH09167748A (en) | 1997-06-24 |
| JP3396123B2 JP3396123B2 (en) | 2003-04-14 |
Family
ID=18391205
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP34758395A Expired - Lifetime JP3396123B2 (en) | 1995-12-15 | 1995-12-15 | Substrate cleaning brush housing |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3396123B2 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114345042A (en) * | 2022-01-07 | 2022-04-15 | 甘肃能源化工职业学院 | Dust collecting equipment that mine electrical equipment used |
-
1995
- 1995-12-15 JP JP34758395A patent/JP3396123B2/en not_active Expired - Lifetime
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114345042A (en) * | 2022-01-07 | 2022-04-15 | 甘肃能源化工职业学院 | Dust collecting equipment that mine electrical equipment used |
| CN114345042B (en) * | 2022-01-07 | 2023-02-17 | 甘肃能源化工职业学院 | Dust collecting equipment that mine electrical equipment used |
Also Published As
| Publication number | Publication date |
|---|---|
| JP3396123B2 (en) | 2003-04-14 |
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