JPH09159239A - Clean room - Google Patents

Abstract

PROBLEM TO BE SOLVED: To restrict contamination of a clean room as much as possible and improve a degree of cleanliness at a low price. SOLUTION: There are provided an FFU 5 installed at a ceiling 2 of a working room 1 and comprising a ULPA filter 3 and a small-sized blower 4; a louver 6 having a punched plate extending along a predetermined location of the ceiling 2, oppositely faced against FFU 5 and installed near an air blowing port of FFU 5; and a grating floor 7 mounted in substantial opposite relation against FFU 5 while being spaced apart from FFU 5. There are provided the louvers 6 having a punched plate having different opening rates through holes in response to either the mounting location 17 or not-yet mounted location 18 of FFU 5.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a clean room used in a semiconductor manufacturing process or an electronic component inspection process, and more particularly to a clean room for improving the cleanliness of a tunnel bay type working room.

[0002]

2. Description of the Related Art The technology described below studies the present invention,
The present invention was studied by the present inventors upon completion, and its outline is as follows.

The layout method of the work area inside the clean room used in the inspection process of the semiconductor manufacturing process is as follows.
There is a so-called tunnel bay method in which a process area, which is a work room in which important parts of a semiconductor manufacturing apparatus are arranged, and a service area, which is a backup area of the process area, are repeatedly laid out in a tunnel method.

The process area is composed of a production area in which a processing apparatus such as a semiconductor manufacturing apparatus is arranged and a work area in which an operator who operates the processing apparatus is arranged. ULPA () is provided near the ceiling of the work area. Ultra Low Penetration Ai
r) A fan filter unit (Fan for short) that is an air purifier consisting of a filter and a small blower.
(Also called FU) is installed.

Further, the fan filter unit is provided with a skirt member having a lateral air outlet so that clean air can be blown out even to the non-installed portion.

[0006] Here, the clean room in which the fan filter unit is installed is described in, for example, Industrial Research Institute Co., Ltd., issued November 25, 1994, "Electronic Materials 11
Monthly issue, VLSI manufacturing and test equipment guidebook <19
1995 edition>", pp. 133-140.

[0007]

However, in the above-mentioned technique, since the air flow formed by jetting from the fan filter unit locally goes obliquely below the fan filter unit, the air flow is laminar (fan filter). (Flowing vertically from the unit) does not form, causing the entrainment of airflow.

Therefore, it is necessary to add another fan filter unit to a place where the fan filter unit is not installed. The fan filter unit to be added may have the same specifications as the existing one or a special order.

However, in order to add the fan filter unit, it is necessary to cut the ceiling of the clean room and perform opening work.

In this case, a large amount of dust and metal pieces are scattered when the ceiling is cut, which causes a problem of contaminating the clean room.

Further, if an attempt is made to add a fan filter unit, the main body of the fan filter unit needs to be purchased and the above-mentioned additional work is required, which causes a problem that the cost becomes high and the work period becomes long. There is also the problem of having to stop.

It is an object of the present invention to provide a clean room which minimizes pollution and improves cleanliness at a low cost.

The above and other objects and novel features of the present invention will become apparent from the description of the present specification and the accompanying drawings.

[0014]

SUMMARY OF THE INVENTION Among the inventions disclosed in the present application, the outline of a representative one will be briefly described.
It is as follows.

That is, the clean room of the present invention is provided with a working room that is isolated from the outside atmosphere and has a high cleanliness atmosphere, and is installed on the ceiling of the working room, and is an air purifying system including a filter and a blower. And a plate-shaped member provided with a perforation along a predetermined position on the ceiling and facing the air purifier in the vicinity of the air blowing port of the air purifier, and the air purifier separated from the air purifier. The plate member with perforations is provided so as to substantially face each other, and the opening ratio of the holes is different depending on whether the air purifier is installed or not installed.

[0016] With this, the air flow formed by being jetted from the air purifier can be controlled, so that entrainment and turbulence of the air flow can be prevented.

As a result, the airflow can be made laminar, so that the accumulation of suspended dust is not formed, so that the cleanliness in the clean room can be improved and the atmosphere can be maintained.

In the clean room of the present invention, the aperture ratio of the perforated plate-shaped member due to the holes is determined by the hole diameter of the holes, and the perforated plate-shaped members classified according to the hole diameter are the air. It is installed depending on whether the purifier is installed or not installed.

Further, in the clean room of the present invention, in various plate-like members with perforations installed along the ceiling of the working room, holes having a small hole diameter are provided at the facing positions corresponding to the installation positions of the air purifiers. The plate member with perforations is disposed, and the plate member with perforations having a large hole diameter is disposed at a non-opposing position corresponding to a non-installed position of the air purifier.

Further, in the clean room of the present invention, a frame member for supporting the perforated plate-like member is provided, and the perforated plate-like member is detachably mounted on the frame member.

The clean room of the present invention is provided with a partition plate for partitioning the perforated plate-shaped member for each kind of hole diameter of the perforated plate-shaped member.

[0022]

Embodiments of the present invention will be described below in detail with reference to the drawings.

FIG. 1 is a view showing an example of an embodiment of the structure of a clean room according to the present invention, (a) is a partial plan view, (b) is a partial cross-sectional view showing an AA cross section of (a),
(C) is a partial cross-sectional view showing a BB cross section of (a), FIG. 2 is a partial perspective view showing an example of an embodiment of the structure of the clean room according to the present invention, and FIG. 3 is a porous room installed in the clean room of the present invention. FIG. 5 is a perspective view showing an example of an embodiment of the structure of the plate-shaped member, FIG. 4 is a partial perspective view showing an example of the embodiment of the structure of the plate-shaped member with perforations installed in the clean room of the present invention, and FIG. It is a simulation test figure which shows an example of embodiment of the simulation of the airflow in the clean room of invention.

The clean room described in the present embodiment is provided with a tunnel bay type working chamber 1 which is isolated from the external atmosphere and has an atmosphere of high cleanliness. For example, a semiconductor wafer is inspected.

The structure of the clean room according to the present embodiment will be described below.
PA filter 3 (filter) and small blower 4 (blower)
A fan filter unit (hereinafter abbreviated as FFU) 5 which is an air purifier consisting of and a perforated plate-like member installed along a predetermined portion of the ceiling 2 and facing the FFU 5 in the vicinity of the blower port 5a of the FFU 5. A louver 6 with a punching plate and a louver 6 with a punching plate, which is an exhaust means installed away from the FFU 5 and substantially facing the FFU 5, and depending on whether the FFU 5 is installed 17 or not installed 18. The aperture ratios of the holes 6a are different.

Here, in the working room 1 of the clean room according to the present embodiment, a production area 1a in which a semiconductor manufacturing apparatus 8 which is a processing apparatus for processing semiconductor wafers is arranged and a worker 9 who operates the semiconductor manufacturing apparatus 8 are provided. And the work area 1b in which the louver 6 with a punching plate is attached to the ceiling 2
At a predetermined position, that is, along the ceiling 2 of the work area 1b and facing the FFU 5.

It should be noted that the FFUs 5 are arranged at a substantially predetermined interval (for example, 2) in the depth direction 16 of the tunnel bay type working chamber 1.
It is attached to both the ceiling 2 of the work area 1b and the ceiling 2 of the production area 1a at intervals of about 000 mm). However, the FFU5 attached to the work area 1b is
It is attached at a high position so that the worker 9 can easily perform the work.

Further, the side wall 15 of the working chamber 1 is provided with a glass screen 15a such as a glass window which can be opened and closed freely (can be hermetically closed in a closed state).

Further, the louver 6 with a punching plate is located at a position about 200 mm directly below the ceiling 2 of the work area 1b in the tunnel bay type work room 1 in the depth direction 16 of the work room 1.
Is laid out towards.

Here, the exhaust means according to the present embodiment is the grating floor 7. That is, the air flow 14 formed by the jet of air from the FFU 5 is exhausted to the underside of the grating floor 7 having a two-layer structure (may be three or more layers).

Therefore, all the air flows 14 in the working chamber 1
Flows from the ceiling 2 to the grating floor 7 and is exhausted.

Further, in the louver 6 with a punching plate installed in the clean room, the aperture ratio of the hole 6a of the louver 6 with a punching plate is determined by the hole diameter of the hole 6a, and the punching is classified according to the hole diameter of the hole 6a. The louver 6 with a plate is installed depending on the installation location 17 or the non-installation location 18 of the FFU 5.

Further, in various louvers 6 with punching plates installed along the ceiling 2 of the working chamber 1, FF
A louver 6 with a punching plate having a hole 6a having a small hole diameter is arranged at a facing portion 10 (immediately below the setting portion 17 of the FFU 5) corresponding to the setting portion 17 of the U5, and a non-facing portion corresponding to the non-setting portion 18 of the FFU 5 A louver 6 with a punching plate having a hole 6a having a large hole diameter is arranged at 11 (immediately below the non-installed portion 18 of the FFU 5).

The detailed structure of the louver 6 with a punching plate (see FIG. 3) installed in the clean room according to the present embodiment will be described. The louver 6 with a punching plate, which is a plate member with perforations, has a thin plate member 6b with perforations. It has a two-layer structure including a louver 6c having a lattice shape.

Here, the perforated thin plate member 6b is formed of, for example, resin and has a thickness of about 1.5 mm. Further, the perforated thin plate member 6b has a plurality of holes 6a, and for example, the holes 6 having a hole diameter of about 4 to 5 mm.
a.

The louver 6c is made of, for example, resin and has a thickness of about 20 mm. Further, the louver 6c has a lattice shape.

That is, the louver 6 with the punching plate is
It has a two-layer structure in which a thin plate member 6b with perforations and a louver 6c are joined.

The louver 6 with a punching plate according to the present embodiment is classified according to the size of the hole 6a, and the louver 6 with a punching plate having various opening ratios is prepared in advance depending on the size of the hole 6a. .

Further, the clean room according to the present embodiment is provided with an L-shaped frame 12 which is a frame member for supporting the louver 6 with the punching plate, and the louver 6 with the punching plate is detachably mounted on the L-shaped frame 12. It is placed.

Here, the L-shaped frame 12 is screwed to, for example, the FFU 5 installed in the production area 1a.

Further, the clean room according to the present embodiment is provided with a partition plate 13 for partitioning the louver 6 with a punching plate according to the hole diameter of the hole 6a of the louver 6 with a punching plate.

That is, when the louvers 6 with punching plates having various aperture ratios are arranged, each louver 6 with punching plates is partitioned by the partition plate 13.

The louver 6 with a punching plate installed in the clean room according to this embodiment is the FFU5.
The opening ratio differs depending on the installation location 17 or the non-installation location 18 of the FFU 5 in various louvers 6 with punching plates installed along the ceiling 2 of the working chamber 1. A louver 6 with a punching plate having an aperture ratio of 10 to 20% is arranged at a facing portion 10 (immediately below the setting portion 17 of the FFU 5) corresponding to the setting portion 17, and a non-facing portion 1 corresponding to the non-setting portion 18 of the FFU 5
1 (immediately below the non-installed portion 18 of FFU5) has an aperture ratio of 30
Louvers 6 with punching plates of ˜35% are alternately arranged (see FIG. 4).

This is obtained from the simulation test diagram of the air flow 14 in the working room 1 in the clean room shown in FIG.

Here, the simulation test diagram of the air flow 14 in the working room 1 in the clean room shown in FIG.
This is a simulation of the state of the air flow 14 in the six cases (case 1 to case 6) using a computer with the aperture ratio of the holes 6a as a parameter.

As a result, the state of the air flow 14 shown in Case 5 is the closest to the laminar flow state, and the theoretical values of the aperture ratio in that case are 32.6% (non-opposed part 11) and 16.6% (opposed). Since the calculation was performed as “location 10)”, it was obtained that the louvers 6 with punching plates having the aperture ratios in the ranges described above are preferably disposed at the respective locations.

According to the clean room of this embodiment, the following operational effects can be obtained.

That is, a predetermined portion of the ceiling 2 of the work room 1 of the clean room (in the present embodiment, the work area 1
The louver 6 with a punching plate is F along the ceiling 2) of b.
It is installed near the blower opening 5a of FU5, and further, FFU5
A grating floor 7 which is an exhaust means is installed substantially opposite to the installation location 17 of the FFU 5 or a non-installation location 18 of the FFU 5.
Since the opening ratio of the holes 6a of the louver 6 with a punching plate is different according to the above, the airflow 14 formed by jetting from the FFU 5 can be controlled.

As a result, it is possible to prevent the entrainment and turbulence of the air flow 14, and to make the air flow 14 a laminar flow.

As a result, since the stagnant space for floating dust is not formed, the cleanliness in the clean room can be improved and the atmosphere can be maintained.

By installing the louvers 6 with punching plates having different aperture ratios, the cleanliness class of the working chamber 1 can be improved, for example, from class 100 to class 10.

Further, since it is not necessary to add the FFU5, it is not necessary to cut the ceiling 2 or perform the opening work in the product manufacturing line, so that the inside of the clean room can be prevented from being contaminated and the number of the FFU5 is small. This allows a wide range of air cleaning.

As a result, the adverse effect on the product can be suppressed, and the cleanliness of the place where the number of FFUs 5 to be installed is restricted due to the structure of the clean room can be further improved.

By not adding the FFU5,
Since the construction is not performed, the construction period can be shortened, and the cleanliness in the clean room can be improved at a low price.

The holes 6 of the louver 6 with a punching plate
The aperture ratio due to a is determined by the hole diameter of the hole 6a.
Since the louvers 6 with punching plates classified according to the hole diameters of a are respectively installed according to the installation locations 17 of the FFU 5, the louvers 6 with punching plates having the holes 6a of various hole diameters are prepared in advance. Can be set and changed in detail. As a result, FFU
Because the aperture ratio of the louver 6 with a punching plate can be changed according to the specifications of 5 (air volume, wind speed, etc.), the ceiling 2
It is possible to make a clean unit for the entire surface.

In addition, in various louvers 6 with punching plates installed along the ceiling 2 of the working room 1, the FFU
The louver 6 with a punching plate having a hole 6a having a small hole diameter is arranged in the facing portion 10 corresponding to the installation location 17 of the No. 5 and the non-facing location 11 corresponding to the non-installation location 18 of the FFU 5
Since the louver 6 with a punching plate having the hole 6a having a large hole diameter is arranged in the chamber, the cleanliness can be improved even for various tunnel bay type working chambers 1.

Further, an L-shaped frame 12 for supporting the louver 6 with a punching plate is provided, and the louver 6 with a punching plate is detachably mounted on the L-shaped frame 12, so that the louver 6 with a punching plate is attached. The louver 6 with a punching plate can be easily replaced and can be prevented from falling.

By fixing the L-shaped frame 12 with screws, the installation distance of the work area 1b of the louver 6 with a punching plate from the ceiling 2 can be set freely, so that floors such as the grating floor 7 can be set. It is possible to broaden the response to the height restriction from the surface.

Further, the hole 6 of the louver 6 with a punching plate
Since the partition plate 13 for partitioning the louver 6 with the punching plate is provided for each type of hole diameter of a, the holes 6a
Even when the louver 6 with a punching plate is replaced by changing the aperture ratio, the installation position of the louver 6 with a punching plate to be replaced can be easily determined.

Further, the partition plate 13 can prevent the louvers 6 with punching plates from being displaced in the adjacent direction.

Further, since the louver 6 with a punching plate is a louver 6 with a punching plate having a two-layer structure composed of a thin plate member 6b with perforations and a louver 6c forming a lattice, its strength can be improved.

Although the invention made by the present inventor has been specifically described based on the embodiments of the present invention, the present invention is not limited to the embodiments of the present invention, and does not depart from the gist of the invention. It goes without saying that various changes can be made with.

For example, in the above-described embodiment, the case where the type of the plate member with perforations is divided according to the hole diameter of the holes has been described, but the type of plate member with perforations is classified according to the number of holes or the like. The aperture ratio may be changed and divided.

Further, the shape of the hole is not limited to a circular shape, but may be another shape such as an ellipse or a quadrangle.

Further, the plate member with perforations is not limited to the two-layer structure, and may have a multi-layer structure or a one-layer structure as long as its strength is maintained.

Further, in the above embodiment, the case where the clean room is the inspection step of the object to be processed (semiconductor wafer) in the semiconductor manufacturing process has been described, but the clean room may be used for other semiconductor manufacturing steps. Further, it may be used in an inspection process of electronic parts other than semiconductors.

[0067]

Advantageous effects obtained by typical ones of the inventions disclosed by the present application will be briefly described as follows.
It is as follows.

(1). A perforated plate-like member is installed near the air vent of the air purifier along a predetermined location on the ceiling of the working room of the clean room, and an exhaust means is installed almost facing the air purifier, and the air purifier is installed. Alternatively, since the aperture ratio of the holes of the plate member with perforations varies depending on the non-installed portion, the air flow jetted from the air purifier can be controlled. As a result, it is possible to prevent entrainment and turbulence of the airflow, and to make the airflow a laminar flow. As a result, since a stagnant place for floating dust is not formed, the cleanliness in the clean room can be improved and the atmosphere can be maintained.

(2). Since it is not necessary to add an air purifier, it is not necessary to perform ceiling cutting or opening work in the product manufacturing line, so it is possible to prevent contamination in the clean room. As a result, adverse effects on the product can be suppressed.

(3). Since the construction is not carried out by not adding the air purifier, the construction period can be shortened and the cleanliness in the clean room can be improved at a low price.

(4). The aperture ratio due to the holes of the perforated plate-like member is determined by the hole diameter of the holes, and the perforated plate-like members classified according to the hole diameter of the holes are installed in accordance with the installation location of the air purifier, respectively, in advance. The aperture ratio can be finely set and changed by preparing a perforated plate-like member having pores of various diameters.

(5). In various plate-like members with perforations installed along the ceiling of the work room, plate-like members with perforations having a small hole diameter are arranged at opposing positions corresponding to the installation positions of the air purifiers. The perforated plate-shaped member having a large hole diameter is arranged in the non-opposing place corresponding to the non-installed place, so that the cleanliness is improved even for various tunnel bay type working chambers. be able to.

(6). Since the frame member supporting the perforated plate member is provided and the perforated plate member is detachably mounted on the frame member, the perforated plate member can be easily replaced.

(7). By fixing the frame member with screws, it is possible to freely set the installation distance from the ceiling of the work area of the perforated plate-shaped member,
It is possible to broaden the response to the height restriction from the floor surface.

(8). By providing a partition plate for partitioning the perforated plate-shaped member for each type of hole diameter of the perforated plate-shaped member, even when replacing the perforated plate-shaped member by changing the aperture ratio of the holes, The installation position of the perforated plate-like member to be replaced can be easily determined. Further, the partition plate can prevent the plate-shaped members with perforations from being displaced in the adjacent direction.

[Brief description of the drawings]

1A and 1B are diagrams showing an example of an embodiment of a clean room structure according to the present invention, in which FIG. 1A is a partial plan view and FIG.
Is a partial sectional view showing an AA cross section of (a), (c) is (a)
3 is a partial cross-sectional view showing a BB cross section of FIG.

FIG. 2 is a partial perspective view showing an example of an embodiment of the structure of a clean room according to the present invention.

FIG. 3 is a perspective view showing an example of an embodiment of a structure of a plate member with perforations installed in a clean room of the present invention.

FIG. 4 is a partial perspective view showing an example of an embodiment of the structure of a plate member with perforations installed in a clean room of the present invention.

FIG. 5 is a simulation test diagram showing an example of an embodiment of an airflow simulation in the clean room of the present invention.

[Explanation of symbols]

 1 Working Room 1a Production Area 1b Working Area 2 Ceiling 3 ULPA Filter (Filter) 4 Small Blower (Blower) 5 FFU (Air Purifier) 5a Blower 6 Louver with Punching Plate (Plate Member with Perforation) 6a Hole 6b With Perforation Thin plate member 6c Louver 7 Grating floor (exhaust means) 8 Semiconductor manufacturing equipment (processing equipment) 9 Worker 10 Opposing location 11 Non-opposing location 12 L-shaped frame (frame member) 13 Partition plate 14 Airflow 15 Side wall 15a Glass screen 16 Backward direction 17 Places 18 Places not installed

Claims (7)

[Claims] 1. A clean room provided with a work chamber that is isolated from the external atmosphere and has a high cleanliness atmosphere, the air purifier being installed on the ceiling of the work chamber and comprising a filter and a blower. A perforated plate-like member installed near a blower port of the air purifier along a predetermined position on the ceiling and facing the air purifier, and substantially facing the air purifier apart from the air purifier. A clean room characterized in that the plate member with perforations having different opening ratios by holes is provided in accordance with installation or non-installation location of the air purifier. . 2. The clean room according to claim 1, wherein the aperture ratio of the perforated plate-shaped member due to the holes is determined by the hole diameter of the hole, and the perforated plate-shaped member is classified according to the hole diameter of the hole. The clean room is characterized by being installed depending on whether the air purifier is installed or not installed. 3. The clean room according to claim 2, wherein various perforated plate-like members installed along the ceiling of the working chamber, the small parts are provided at opposing positions corresponding to the installation positions of the air purifiers. A perforated plate-shaped member having a hole having a hole diameter is arranged, and a plate member with a perforation having a hole having a large hole diameter is arranged at a non-opposing position corresponding to a non-installed position of the air purifier, Clean room to do. 4. The clean room according to claim 1, 2, or 3, wherein the working chamber is provided with a production area in which a processing device for processing an object to be processed is arranged, and an operator operating the processing device. A clean room, characterized in that the plate member with perforations is provided along the ceiling of the work area. 5. The clean room according to claim 1, 2, 3 or 4, wherein a frame member that supports the perforated plate-shaped member is provided, and the perforated plate-shaped member is attachable to and detachable from the frame member. Clean room characterized by being installed in. 6. The clean room according to claim 1, 2, 3, 4 or 5, wherein a partition plate for partitioning the perforated plate-shaped member is provided for each type of hole diameter of the perforated plate-shaped member. A clean room characterized by 7. The clean room according to claim 1, 2, 3, 4, 5 or 6, wherein the air purifier is installed at a place where the perforated plate-like member is installed along a ceiling of the working chamber. A plate-shaped member with a perforation rate of 10 to 20% is installed at a facing portion corresponding to the above, and a plate-like member with a perforation rate of 30 to 35% is provided at a non-facing position corresponding to a non-installed position of the air cleaner. A clean room characterized by the installation of components.