JPH09148092A - X-ray generator - Google Patents

X-ray generator

Info

Publication number
JPH09148092A
JPH09148092A JP7307719A JP30771995A JPH09148092A JP H09148092 A JPH09148092 A JP H09148092A JP 7307719 A JP7307719 A JP 7307719A JP 30771995 A JP30771995 A JP 30771995A JP H09148092 A JPH09148092 A JP H09148092A
Authority
JP
Japan
Prior art keywords
ray
scattered
region
gas
plasma
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP7307719A
Other languages
Japanese (ja)
Inventor
Noriaki Kamitaka
典明 神高
Hiroyuki Kondo
洋行 近藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Priority to JP7307719A priority Critical patent/JPH09148092A/en
Publication of JPH09148092A publication Critical patent/JPH09148092A/en
Pending legal-status Critical Current

Links

Landscapes

  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • X-Ray Techniques (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

PROBLEM TO BE SOLVED: To provide an X-ray generator capable of being stably used for a long time by controlling scattering particles to be generated with X-ray from plasma by a control member and a stopping member, and increasing the relative pressure of gas along the X-ray advancing direction. SOLUTION: In a depressurized vacuum container 420, a target member 403 of Ta is irradiated by YAG laser beam 409 and excited, and X-ray and scattering particles are generated from plasma 411. The X-ray is taken from an optical element 410 and guided to an X-ray optical system. The scattering particles are stopped by controlling the directional distribution of the discharge by a scattering particle control member 401 provided adjacent to or near the target member 403 and by supplying gas having the high transmission factor of X-ray such of He. A scattering particle stopping member composed of a duct 412 provided with baffles 404 to 407 provided with openings facing the optical element 410 is arranged, and He gas is supplied from a gas introducing pipe 413. Therefore, pressure outside the duct 412 is relatively decreased lower than the pressure on the optical element side, and sticking of the scattering particles is prevented.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【発明の属する技術分野】本発明は、X線顕微鏡、X線
分析装置、X線露光装置などのX線装置に用いて好適な
X線発生装置に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an X-ray generator suitable for use in an X-ray apparatus such as an X-ray microscope, an X-ray analyzer and an X-ray exposure apparatus.

【0002】[0002]

【従来の技術】レーザー光(励起エネルギービームの一
例)を減圧された真空容器内に置かれた標的部材に集光
して照射すると、標的部材は急速にプラズマ化し、この
プラズマから非常に輝度の高いX線が輻射(放出)され
る(X線を発生する)ことが知られている。
2. Description of the Related Art When a laser beam (an example of an excitation energy beam) is condensed and irradiated on a target member placed in a vacuum vessel having a reduced pressure, the target member is rapidly turned into plasma, and the plasma emits very bright light. It is known that high X-rays are radiated (emitted) (generate X-rays).

【0003】X線の発生と共に、前記プラズマからは高
速の電子やイオンなどの飛散粒子がまた、前記標的部材
からは部材の飛散粒子(例えば、ガス化した材料、イオ
ン化した材料、材料小片など)が放出されて真空容器内
に飛散する(以下、これらをまとめて飛散粒子と呼
ぶ)。このような飛散粒子は、光学素子の清浄光学表面
(例えば、X線光学素子面)に衝突して、これらを破損
させたり、あるいは、付着、堆積して機能や特性を低下
させたりするので、大きな問題であった。
Along with the generation of X-rays, high-velocity particles such as electrons and ions are emitted from the plasma, and particles are emitted from the target member (eg, gasified material, ionized material, material pieces, etc.). Are emitted and scattered in the vacuum container (hereinafter, collectively referred to as scattered particles). Since such scattered particles collide with the clean optical surface of the optical element (for example, the X-ray optical element surface) and damage them, or adhere and accumulate to deteriorate the function and characteristics, It was a big problem.

【0004】この問題を解決するために従来の方法で
は、X線源となるプラズマと光学素子との間にX線透過
性の高い物質(例えば、Be)からなる薄膜(以下、飛
散粒子阻止用薄膜と呼ぶ)を設置して遮蔽することによ
り、飛散粒子が光学素子に到達しないようにしていた。
その他の方法としては、プラズマまたは標的部材の近傍
に飛散粒子制御部材を設けて、X線取り出し方向への飛
散粒子放出量の分布を減少させる方法(特願平6−21
6131参照)がある。
In order to solve this problem, according to the conventional method, a thin film made of a substance having a high X-ray transmission property (for example, Be) (hereinafter referred to as a scattered particle blocking device) is provided between the plasma serving as an X-ray source and the optical element. A thin film) was installed and shielded to prevent scattered particles from reaching the optical element.
As another method, a scattered particle control member is provided near the plasma or the target member to reduce the distribution of the scattered particle emission amount in the X-ray extraction direction (Japanese Patent Application No. 6-21).
6131).

【0005】プラズマ生成位置の近傍に、例えば図1に
示すような飛散粒子制御部材101を設けると、飛散粒
子放出量の角度分布は図2に示す破線のような分布から
実線のような角度分布に変化する。飛散粒子制御部材1
01は、厚さO.4 mmのステンレス製であり、図に示し
たような開口を有する形状をしている。プラズマ105
は、その開口中の端から1mm程度の所に生成される。
このとき、X線の取り出し方向を30度よりも角度の大
きい方向にとれば、X線取り出し方向に放出される飛散
粒子の量を大幅に減少させることができる。
If, for example, a scattered particle control member 101 as shown in FIG. 1 is provided in the vicinity of the plasma generation position, the angular distribution of the scattered particle emission amount changes from the distribution shown by the broken line in FIG. 2 to the distribution shown by the solid line. Changes to. Scattered particle control member 1
01 is made of stainless steel with a thickness of 0.4 mm and has a shape having an opening as shown in the figure. Plasma 105
Are generated at a position about 1 mm from the end in the opening.
At this time, if the X-ray extraction direction is set to a direction having an angle larger than 30 degrees, the amount of scattered particles emitted in the X-ray extraction direction can be significantly reduced.

【0006】また、その他、真空容器内にX線に対する
透過率の高い低原子番号のガス(例えば、Heガス)を
充填することにより、あるいは該ガスのガス流を形成す
ることにより、飛散粒子の阻止を図る方法(特開昭63
−292553参照)が提案されている。
Further, in addition, by filling a gas having a low atomic number with a high X-ray transmittance (for example, He gas) in a vacuum container or forming a gas flow of the gas, scattered particles are scattered. Method to prevent (JP-A-63
-292555) are proposed.

【0007】[0007]

【発明が解決しようとする課題】前記方法は、すべて併
せて用いることができる。その例を図3に示す。プラズ
マ生成部は、図1に示したようになっている。X線の取
り出し方向は標的部材303のレーザー光309照射位
置における法線方向から45度の方向であり、飛散粒子
制御部材301がない場合に比べて10分の1程度に飛
散粒子が減少する。
All of the above methods can be used together. An example is shown in FIG. The plasma generator is as shown in FIG. The X-ray extraction direction is a direction of 45 degrees from the normal direction at the irradiation position of the laser beam 309 of the target member 303, and the amount of scattered particles is reduced to about 1/10 of that in the case where the scattered particle control member 301 is not provided.

【0008】真空容器内にはX線の透過率が高い飛散粒
子阻止用のガスが充填されており、飛散粒子をガス分子
との散乱によって阻止する。プラズマ311からX線取
り出しフィルター(光学素子の一例)310を見込む立
体角範囲を開口が覆うように、開口を有する飛散粒子阻
止部材304,305,306が配置されており、飛散
粒子がガス分子との散乱により回り込んで、X線取り出
しフィルター310に到達することのないようになって
いる。
A gas for preventing scattered particles having a high X-ray transmittance is filled in the vacuum container, and the scattered particles are blocked by scattering with gas molecules. The scattered particle blocking members 304, 305, and 306 having openings are arranged so that the openings cover a solid angle range in which the X-ray extraction filter (an example of an optical element) 310 is seen from the plasma 311, and the scattered particles are gas molecules. Therefore, the X-ray extraction filter 310 does not reach the X-ray extraction filter 310 due to the scattering.

【0009】しかし、この場合、飛散粒子は飛散粒子阻
止部材304に到達するまでの空間でも充填されたガス
によって散乱される。例えば、Krガスが0.1 torr
充填されている場合、図2中の実線で示された角度分布
は、プラズマから100mmの位置では、一点鎖線のよ
うな角度分布に変化してしまう。このように、飛散粒子
制御部材301によりX線取り出し方向への飛散粒子が
少なくなるように制御した角度分布は、飛散粒子が飛散
粒子阻止部材304に到達するまでに充填ガスにより散
乱されるため変化してしまい、結果として、飛散粒子制
御部材304の効果が打ち消されてしまうという問題点
があった。
In this case, however, the scattered particles are scattered by the filled gas even in the space before reaching the scattered particle blocking member 304. For example, Kr gas is 0.1 torr
In the case of being filled, the angular distribution shown by the solid line in FIG. 2 changes to the angular distribution like the one-dot chain line at a position 100 mm from the plasma. In this way, the angular distribution controlled by the scattered particle control member 301 so as to reduce the scattered particles in the X-ray extraction direction changes because the scattered particles are scattered by the filling gas before reaching the scattered particle blocking member 304. As a result, there is a problem that the effect of the scattered particle control member 304 is canceled.

【0010】本発明は、かかる問題点に鑑みてなされた
ものであり、飛散粒子制御部材の効果を減ずることな
く、充填した飛散粒子阻止用のガスや飛散粒子阻止部材
を効果的に利用できるようにして、その結果、長時間安
定して使用できるX線発生装置を提供することを目的と
する。
The present invention has been made in view of the above problems, and it is possible to effectively use the filled gas for preventing scattered particles and the scattered particle blocking member without reducing the effect of the scattered particle controlling member. Then, as a result, it aims at providing the X-ray generator which can be used stably for a long time.

【0011】[0011]

【課題を解決するための手段】そのため、本発明は第一
に「減圧された真空容器内の標的部材に励起エネルギー
ビームを照射してプラズマを形成させ、該プラズマから
X線を取り出すX線発生装置であり、前記標的部材及び
/又は前記プラズマから放出される飛散粒子の放出量の
方向分布を制御して、前記X線を取り出す方向への飛散
粒子放出量を低減させる飛散粒子制御部材を前記標的部
材に隣接または近接させて設け、かつ、前記真空容器内
に設置された光学素子に前記飛散粒子が衝突、付着また
は堆積するのを防止するための部材であり開口を有する
飛散粒子阻止部材を前記エネルギービームまたは前記X
線が該開口を通過するように、前記プラズマと前記光学
素子との間に設けたX線発生装置において、前記プラズ
マから前記飛散粒子阻止部材の直前までの第1領域にお
ける圧力を相対的に小さくし、前記飛散粒子阻止部材か
ら前記光学素子までの第2領域における圧力を相対的に
高くする圧力分離機構を設け、かつ、前記第2領域に飛
散粒子阻止用のガスを導入するためのガス導入口を設け
たことを特徴とするX線発生装置(請求項1)」を提供
する。
Therefore, the first aspect of the present invention is to "generate X-rays by irradiating a target member in a depressurized vacuum container with an excitation energy beam to form plasma and extracting X-rays from the plasma. An apparatus for controlling the directional distribution of the amount of scattered particles emitted from the target member and / or the plasma to reduce the amount of scattered particle emitted in the X-ray extraction direction. A scattering particle blocking member having an opening, which is a member for preventing the scattered particles from colliding, adhering to or accumulating on an optical element installed in the vacuum container, is provided. The energy beam or the X
In the X-ray generator provided between the plasma and the optical element so that the rays pass through the opening, the pressure in the first region from the plasma to immediately before the scattered particle blocking member is relatively small. Then, a gas separation mechanism for relatively increasing the pressure in the second region from the scattered particle blocking member to the optical element is provided, and the gas introduction for introducing the scattered particle blocking gas into the second region. An X-ray generator having a mouth is provided (Claim 1).

【0012】また、本発明は第二に「前記圧力分離機構
は少なくとも、前記第1領域に接続された真空排気機構
と、前記第1領域及び第2領域を分離する部材であり両
領域をつなぐ微少開口を有する分離部材とを備えてお
り、かつ、該微少開口は前記エネルギービームまたは前
記X線が通過するように配置されていることを特徴とす
る請求項1記載のX線発生装置(請求項2)」を提供す
る。
The present invention is secondly "The pressure separating mechanism is a member for separating at least the vacuum evacuation mechanism connected to the first region and the first region and the second region and connecting both regions. An X-ray generator according to claim 1, further comprising: a separating member having a minute opening, wherein the minute opening is arranged so that the energy beam or the X-rays can pass therethrough. Item 2) ”is provided.

【0013】また、本発明は第三に「前記圧力分離機構
は少なくとも、前記第1領域に接続された真空排気機構
と、前記第1領域及び第2領域を分離する部材と、該部
材に接合された前記飛散粒子阻止部材であり前記二つの
領域をつなぐ微少開口を有する飛散粒子阻止部材とを備
えており、かつ、該微少開口は前記エネルギービームま
たは前記X線が通過するように配置されていることを特
徴とする請求項1記載のX線発生装置(請求項3)」を
提供する。
In addition, a third aspect of the present invention is that "the pressure separation mechanism includes at least a vacuum exhaust mechanism connected to the first region, a member for separating the first region and the second region, and a member joined to the member. And a scattered particle blocking member having a minute opening connecting the two regions, and the minute opening is arranged so that the energy beam or the X-ray may pass therethrough. The X-ray generator according to claim 1 (claim 3) "is provided.

【0014】また、本発明は第四に「前記飛散粒子阻止
部材は少なくとも、開口を有する複数の板状部材または
複数の開口を有する部材を備えていることを特徴とする
請求項1〜3記載のX線発生装置(請求項4)」を提供
する。また、本発明は第五に「前記飛散粒子阻止部材
は、バッフルを有するダクトを備えていることを特徴と
する請求項4記載のX線発生装置(請求項5)」を提供
する。
In a fourth aspect of the present invention, "the scattered particle blocking member comprises at least a plurality of plate-shaped members having openings or a member having a plurality of openings. X-ray generator (claim 4) ". Further, the present invention fifthly provides an "X-ray generator (claim 5)" according to claim 4, wherein the scattered particle blocking member includes a duct having a baffle.

【0015】また、本発明は第六に「前記ダクトに飛散
粒子阻止用のガスを導入するためのガス導入口を設けた
ことを特徴とする請求項5記載のX線発生装置(請求項
6)」を提供する。また、本発明は第七に「前記圧力分
離機構は少なくとも、前記第1領域に接続された真空排
気機構と、バッフル及びガス導入口が設けられたダクト
を有する飛散粒子阻止部材とを備えていることを特徴と
する請求項1記載のX線発生装置(請求項7)」を提供
する。
In a sixth aspect of the present invention, "the X-ray generator according to the fifth aspect is provided with a gas inlet for introducing a gas for preventing scattered particles into the duct. )"I will provide a. In the seventh aspect of the present invention, "the pressure separation mechanism includes at least a vacuum exhaust mechanism connected to the first region, and a scattered particle blocking member having a duct provided with a baffle and a gas inlet. An X-ray generator according to claim 1 is provided.

【0016】[0016]

【発明の実施の形態】本発明のX線発生装置(請求項1
〜7)においては、プラズマから飛散粒子阻止部材の直
前までの第1領域における圧力を相対的に小さくし、飛
散粒子阻止部材から光学素子までの第2領域における圧
力を相対的に高くする圧力分離機構を設け、かつ、前記
第2領域に飛散粒子阻止用のガスを導入するためのガス
導入口を設けているので、飛散粒子制御部材の効果を減
ずることなく、充填したガスや飛散粒子阻止部材を効果
的に利用できるようにして、その結果、装置を長時間安
定して使用できるという効果を奏する。
DETAILED DESCRIPTION OF THE INVENTION The X-ray generator of the present invention (claim 1)
(7) In the pressure separation, the pressure in the first region from the plasma to immediately before the scattered particle blocking member is made relatively small, and the pressure in the second region from the scattered particle blocking member to the optical element is made relatively high. Since the mechanism is provided and the gas introduction port for introducing the gas for preventing the scattered particles is provided in the second region, the filled gas and the scattered particle blocking member can be obtained without reducing the effect of the scattered particle control member. Is effectively used, and as a result, the device can be used stably for a long time.

【0017】前記飛散粒子制御部材による制御効果を強
化して、装置を長時間安定して使用できるという前記効
果を増大するために、本発明にかかる圧力分離機構とし
ては、例えば、少なくとも、前記第1領域に接続された
真空排気機構と、前記第1領域及び第2領域を分離する
部材であり両領域をつなぐ微少開口を有する分離部材と
を備えた機構が好ましく、かつ、該微少開口を前記エネ
ルギービームまたは前記X線が通過するように配置する
ことが好ましい(請求項2)。
In order to enhance the control effect of the scattered particle control member and increase the effect that the apparatus can be used stably for a long time, the pressure separating mechanism according to the present invention is, for example, at least the first A mechanism provided with a vacuum evacuation mechanism connected to one region and a separating member that separates the first region and the second region and that has a minute opening connecting both regions is preferable, and the minute opening is described above. The energy beam or the X-rays are preferably arranged so as to pass therethrough (claim 2).

【0018】或いは、同様に、本発明にかかる圧力分離
機構としては、少なくとも、前記第1領域に接続された
真空排気機構と、前記第1領域及び第2領域を分離する
部材と、該部材に接合された前記飛散粒子阻止部材であ
り前記二つの領域をつなぐ微少開口を有する飛散粒子阻
止部材とを備えた機構が好ましく、かつ、該微少開口を
前記エネルギービームまたは前記X線が通過するように
配置することが好ましい(請求項3)。
Alternatively, similarly, as the pressure separating mechanism according to the present invention, at least a vacuum evacuation mechanism connected to the first region, a member for separating the first region and the second region, and the member are provided. A mechanism provided with the above-mentioned scattered particle blocking member, which is a scattered particle blocking member having a minute opening connecting the two regions, is preferable, and the energy beam or the X-ray passes through the minute opening. It is preferable to dispose (claim 3).

【0019】飛散粒子阻止効果を増大するために、本発
明にかかる飛散粒子阻止部材としては、少なくとも、開
口を有する複数の板状部材または複数の開口を有する部
材を備えたものが好ましい(請求項4)。或いは、同様
に、本発明にかかる飛散粒子阻止部材としては、バッフ
ルを有するダクトを備えたものが好ましい(請求項
5)。
In order to increase the effect of preventing scattered particles, it is preferable that the scattered particle preventing member according to the present invention is provided with at least a plurality of plate-shaped members having openings or a member having a plurality of openings. 4). Alternatively, similarly, as the scattered particle blocking member according to the present invention, one provided with a duct having a baffle is preferable (claim 5).

【0020】また、前記飛散粒子制御部材による制御効
果及び前記飛散粒子阻止効果を増大するために、本発明
にかかるダクトに飛散粒子阻止用のガスを導入するため
のガス導入口を設けることが好ましい(請求項6)。ま
た、前記飛散粒子制御部材による制御効果を強化して、
装置を長時間安定して使用できるという前記効果を増大
するために、本発明にかかる圧力分離機構としては、例
えば、少なくとも、前記第1領域に接続された真空排気
機構と、バッフル及びガス導入口が設けられたダクトを
有する飛散粒子阻止部材とを備えたものが好ましい(請
求項7)。
Further, in order to enhance the control effect of the scattered particle control member and the scattered particle blocking effect, it is preferable to provide a gas inlet for introducing a gas for scattering particle blocking into the duct according to the present invention. (Claim 6). Further, by strengthening the control effect of the scattered particle control member,
In order to increase the effect that the device can be used stably for a long time, the pressure separation mechanism according to the present invention includes, for example, at least a vacuum exhaust mechanism connected to the first region, a baffle and a gas inlet. And a scattering particle blocking member having a duct provided with (Claim 7).

【0021】以下、本発明を実施例によりさらに詳細に
説明するが、本発明はこれらの実施例に限定されるもの
ではない。
Hereinafter, the present invention will be described in more detail by way of examples, but the present invention is not limited to these examples.

【0022】[0022]

【実施例】図4は、本実施例のX線発生装置の主要部を
示す概略部分構成図である。YAGレーザー光(励起エ
ネルギービームの一例)409が集光レンズ408によ
り、テープ状のタンタルターゲット(標的部材の一例)
403の表面に集光される。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS FIG. 4 is a schematic partial block diagram showing the main part of the X-ray generator of this embodiment. A YAG laser beam (an example of an excitation energy beam) 409 passes through a condenser lens 408, and a tape-shaped tantalum target (an example of a target member).
It is focused on the surface of 403.

【0023】タンタルターゲット403は、厚さ15μ
mのテープ形状であり、テープ上の同じ位置にレーザー
光が繰り返し集光されることのないように、プラズマ発
生時には、駆動手段(例えば、モーター、不図示)によ
りリールLを回転させて、タンタルテープを巻き取るこ
とにより、レーザーの集光位置を変化させている。タン
タルテープの移動速度は、一つのプラズマが生成されて
から次のプラズマを生成するためのレーザー光が入射す
るまでに、プラズマの発生によりタンタルテープに生ず
る孔の直径分以上の距離だけテープが移動する速度であ
る。
The tantalum target 403 has a thickness of 15 μm.
When the plasma is generated, the reel L is rotated by a driving means (for example, a motor, not shown) so that the laser light is not repeatedly focused on the same position on the tape. By winding the tape, the focus position of the laser is changed. The moving speed of the tantalum tape is such that the tape moves by a distance equal to or more than the diameter of the hole generated in the tantalum tape due to the generation of plasma from the time when one plasma is generated until the laser light for generating the next plasma is incident. Is the speed to do.

【0024】タンタルテープが移動しても、X線源とな
るプラズマの位置が変化しないように、本実施例では、
タンタルテープはターゲット保持部材402と飛散粒子
制御部材401の間に挟み込まれている。ここで飛散粒
子制御部材401は固定されており、ターゲット保持部
材402は、バネ材(不図示)によりタンタルテープを
飛散粒子制御部材401に押さえつけている。これらの
部材401、402により、発生するプラズマ411の
位置は変化することがない。
In this embodiment, the position of plasma serving as an X-ray source does not change even if the tantalum tape moves.
The tantalum tape is sandwiched between the target holding member 402 and the scattered particle control member 401. Here, the scattered particle control member 401 is fixed, and the target holding member 402 presses the tantalum tape to the scattered particle control member 401 with a spring material (not shown). The position of the generated plasma 411 is not changed by these members 401 and 402.

【0025】タンタルターゲット上にYAGレーザー4
09は45度の入射角で入射、集光され、生成したプラ
ズマ411から発生したX線は、YAGレーザー409
とは反対側の45度の方向に設けられたX線取り出しフ
ィルタ(光学素子の一例)410からX線光学系へと導
かれる。プラズマ411とX線取り出しフィルタ410
の間には、バッフル404、405、406、407及
びガス導入口が設けられた(ガス導入管413が接続さ
れた)ダクト(飛散粒子阻止部材の一例)412が設け
られている。
YAG laser 4 on the tantalum target
09 is incident and condensed at an incident angle of 45 degrees, and the X-ray generated from the generated plasma 411 is YAG laser 409.
It is guided to the X-ray optical system from an X-ray extraction filter (an example of an optical element) 410 provided in the direction of 45 degrees on the opposite side to. Plasma 411 and X-ray extraction filter 410
Baffles 404, 405, 406, and 407 and a duct (an example of a scattered particle blocking member) 412 (to which a gas introduction pipe 413 is connected) provided with baffles 404, 405, 406, and 407 are provided between them.

【0026】ダクト412内部に設けられたバッフル4
04、405、406、407は、プラズマ411から
X線取り出しフィルタ410を見込む立体角を遮らない
ように、その開口がそれぞれ構成及び配置されている。
前記プラズマ411から前記ダクト412の直前までの
第1領域に設けられた真空ポンプ(真空排気機構の一
例、不図示)によって真空容器420の内部のうち、第
1領域は0.01torr以下の圧力に排気されている。
Baffle 4 provided inside the duct 412
The openings of 04, 405, 406, and 407 are configured and arranged so as not to block the solid angle of the X-ray extraction filter 410 from the plasma 411.
The first region of the inside of the vacuum container 420 is evacuated to a pressure of 0.01 torr or less by a vacuum pump (an example of a vacuum evacuation mechanism, not shown) provided in the first region from the plasma 411 to immediately before the duct 412. Has been done.

【0027】そのため、プラズマ411からダクト41
2までの空間が、飛散粒子がHeガスによってほとんど
散乱の効果を受けない圧力に保たれており、飛散粒子制
御部材401のX線取り出しフィルタ410方向に対す
る飛散粒子の低減効果は、ダクト(飛散粒子阻止部材)
412のバッフル404の開口に達するまで保持され
る。
Therefore, from the plasma 411 to the duct 41
The space up to 2 is kept at a pressure at which scattered particles are hardly affected by He gas, and the effect of reducing scattered particles in the direction of the X-ray extraction filter 410 of the scattered particle control member 401 is the duct (scattered particles). (Blocking member)
It is held until it reaches the opening of baffle 404 at 412.

【0028】また、真空容器420の内部のうち、ダク
ト412の内部、即ちダクト412からX線取り出しフ
ィルタ410までの第2領域には、ガス導入管413か
らHeガスが導入されており、Heガスの導入量を調節
することによって、ダクト412内部(第2領域)の圧
力を飛散粒子を阻止するには十分で、しかもX線が十分
に透過できる圧力(例えば、0.1 〜1.0torr )に保持し
ている。
He gas is introduced from the gas introduction pipe 413 into the interior of the duct 412 of the vacuum container 420, that is, the second region from the duct 412 to the X-ray extraction filter 410. By adjusting the amount of the introduced gas, the pressure inside the duct 412 (second region) is maintained at a pressure (for example, 0.1 to 1.0 torr) that is sufficient to prevent scattered particles and that allows sufficient X-ray transmission. ing.

【0029】できるだけ少ないHeガスの導入(流量)
により飛散粒子阻止効果を得るためには、ダクト412
のバッフル404の開口を極力小さくし、バッフル40
4をプラズマ411によりダメージを受けない程度にプ
ラズマ411に極力近づければよい。その場合、Heガ
スの流量を少なくすることができるだけでなく、バッフ
ル404をプラズマ411に近づけた分だけ、バッフル
404からX線取り出しフィルタ410までの距離が長
くなり、Heガス雰囲気中を飛散粒子が通過する距離が
長くなるので、より低い圧力で飛散粒子が阻止できるよ
うになる。この理由により、さらにHeガスの流量を少
なくできる。
Introduction of He gas as little as possible (flow rate)
In order to obtain the scattering particle prevention effect by the duct 412
The baffle 404 is made as small as possible and the baffle 40
4 should be brought as close as possible to the plasma 411 to the extent that it is not damaged by the plasma 411. In that case, not only the flow rate of He gas can be reduced, but also the distance from the baffle 404 to the X-ray extraction filter 410 becomes longer as the baffle 404 is brought closer to the plasma 411, and scattered particles in the He gas atmosphere become Since the distance traveled is long, the scattering particles can be blocked at a lower pressure. For this reason, the flow rate of He gas can be further reduced.

【0030】本実施例では、前記第1領域における圧力
を相対的に小さくし、前記第2領域における圧力を相対
的に高くする圧力分離機構として、前記第1領域に接続
された真空排気ポンプと、バッフル及びガス導入口が設
けられたダクト(飛散粒子阻止部材と兼用)412を用
いている。本実施例のX線発生装置によれば、飛散粒子
制御部材401のX線取り出し方向への飛散粒子量を減
少させる効果と、真空容器内にHeガスを導入・充填さ
せて飛散粒子量を減少させる効果と、飛散粒子阻止部材
によって、Heとの散乱により新たにX線取り出し方向
に到達する飛散粒子を減少させる効果を併せて奏するの
で、長時間安定してX線発生装置として利用できる。
In this embodiment, a vacuum exhaust pump connected to the first region is used as a pressure separating mechanism for relatively reducing the pressure in the first region and relatively increasing the pressure in the second region. , A duct (also used as a scattered particle blocking member) 412 provided with a baffle and a gas inlet is used. According to the X-ray generator of the present embodiment, the effect of reducing the amount of scattered particles in the X-ray extraction direction of the scattered particle control member 401 and the amount of scattered particles by introducing and filling He gas in the vacuum container are reduced. Since the scattered particle blocking member and the effect of reducing the scattered particles newly reaching in the X-ray extraction direction due to scattering with He by the scattered particle blocking member, it can be stably used as an X-ray generator for a long time.

【0031】[0031]

【発明の効果】以上説明したように、本発明のX線発生
装置によれば、飛散粒子制御部材のX線取り出し方向へ
の飛散粒子量を減少させる効果と、真空容器内に飛散粒
子阻止用のガスを導入・充填させて飛散粒子量を減少さ
せる効果と、飛散粒子阻止部材によって、前記ガスとの
散乱により新たにX線取り出し方向に到達する飛散粒子
を減少させる効果を併せて奏するので、長時間安定して
X線発生装置として利用できる。
As described above, according to the X-ray generator of the present invention, the effect of reducing the amount of scattered particles in the X-ray extraction direction of the scattered particle control member and the prevention of scattered particles in the vacuum container are provided. Since the effect of reducing the amount of scattered particles by introducing and filling the gas of, and the effect of reducing scattered particles newly reaching in the X-ray extraction direction due to scattering with the gas by the scattering particle blocking member, It can be used stably as an X-ray generator for a long time.

【図面の簡単な説明】[Brief description of the drawings]

【図1】は、飛散粒子制御部材101をTaターゲット
(標的部材)103に隣接して設けた例を示す斜視図で
ある。
FIG. 1 is a perspective view showing an example in which a scattered particle control member 101 is provided adjacent to a Ta target (target member) 103.

【図2】は、飛散粒子放出量の角度分布例を示すデータ
図である。
FIG. 2 is a data diagram showing an example of an angular distribution of scattered particle emission amounts.

【図3】は、従来のX線発生装置(一例)の概略構成図
である。
FIG. 3 is a schematic configuration diagram of a conventional X-ray generator (an example).

【図4】は、実施例のX線発生装置の概略構成図であ
る。
FIG. 4 is a schematic configuration diagram of an X-ray generator according to an embodiment.

【符号の説明】[Explanation of symbols]

101,301,401 飛散粒子制御部材 102,202,302 標的部材保持部材 103,203,303 標的部材 104,309,409 YAGレーザー光(励起エネ
ルギービームの一例) 304,305,306,307 飛散粒子阻止部材 404,405,406,407 バッフル 308,408 集光レンズ 310,410 X線取り出しフィルター(光学素子の
一例) 311,411 プラズマ 412 ダクト(飛散粒子阻止部材の一例) 413 ガス導入管またはガス導入口 L リール 以上
101,301,401 Scattered particle control member 102,202,302 Target member holding member 103,203,303 Target member 104,309,409 YAG laser light (an example of excitation energy beam) 304,305,306,307 Scattered particle prevention Members 404, 405, 406, 407 Baffles 308, 408 Condensing lenses 310, 410 X-ray extraction filters (an example of an optical element) 311, 411 Plasma 412 Ducts (an example of a scattering particle blocking member) 413 Gas introduction pipe or gas introduction port More than L reel

Claims (7)

【特許請求の範囲】[Claims] 【請求項1】 減圧された真空容器内の標的部材に励起
エネルギービームを照射してプラズマを形成させ、該プ
ラズマからX線を取り出すX線発生装置であり、前記標
的部材及び/又は前記プラズマから放出される飛散粒子
の放出量の方向分布を制御して、前記X線を取り出す方
向への飛散粒子放出量を低減させる飛散粒子制御部材を
前記標的部材に隣接または近接させて設け、かつ、前記
真空容器内に設置された光学素子に前記飛散粒子が衝
突、付着または堆積するのを防止するための部材であり
開口を有する飛散粒子阻止部材を前記エネルギービーム
または前記X線が該開口を通過するように、前記プラズ
マと前記光学素子との間に設けたX線発生装置におい
て、 前記プラズマから前記飛散粒子阻止部材の直前までの第
1領域における圧力を相対的に小さくし、前記飛散粒子
阻止部材から前記清浄光学面までの第2領域における圧
力を相対的に高くする圧力分離機構を設け、かつ、前記
第2領域に飛散粒子阻止用のガスを導入するためのガス
導入口を設けたことを特徴とするX線発生装置。
1. An X-ray generator for irradiating an excitation energy beam to a target member in a vacuum container, which is decompressed, to form plasma, and extracting X-rays from the plasma, wherein the target member and / or the plasma A scattered particle control member for controlling the directional distribution of the amount of scattered particles emitted to reduce the amount of scattered particles emitted in the direction for extracting the X-rays is provided adjacent to or in proximity to the target member, and The energy beam or the X-ray passes through the opening through a flying particle blocking member that is a member for preventing the flying particles from colliding, adhering or accumulating on the optical element installed in the vacuum container. As described above, in the X-ray generator provided between the plasma and the optical element, the pressure in the first region from the plasma to immediately before the scattered particle blocking member is reduced. Is provided relatively small, and a pressure separating mechanism for relatively increasing the pressure in the second region from the scattered particle blocking member to the cleaning optical surface is provided, and a gas for scattering particle blocking is provided in the second region. An X-ray generator characterized in that a gas inlet for introducing the gas is provided.
【請求項2】 前記圧力分離機構は少なくとも、前記第
1領域に接続された真空排気機構と、前記第1領域及び
第2領域を分離する部材であり両領域をつなぐ微少開口
を有する分離部材とを備えており、かつ、該微少開口は
前記エネルギービームまたは前記X線が通過するように
配置されていることを特徴とする請求項1記載のX線発
生装置。
2. The pressure separation mechanism includes at least a vacuum exhaust mechanism connected to the first region, and a separation member that is a member that separates the first region and the second region and that has a minute opening connecting both regions. 2. The X-ray generator according to claim 1, further comprising: and the minute aperture is arranged so that the energy beam or the X-ray can pass therethrough.
【請求項3】 前記圧力分離機構は少なくとも、前記第
1領域に接続された真空排気機構と、前記第1領域及び
第2領域を分離する部材と、該部材に接合された前記飛
散粒子阻止部材であり前記二つの領域をつなぐ微少開口
を有する飛散粒子阻止部材とを備えており、かつ、該微
少開口は前記エネルギービームまたは前記X線が通過す
るように配置されていることを特徴とする請求項1記載
のX線発生装置。
3. The pressure separating mechanism includes at least an evacuation mechanism connected to the first region, a member separating the first region and the second region, and the flying particle blocking member joined to the member. And a scattering particle blocking member having a minute opening connecting the two regions, and the minute opening is arranged so that the energy beam or the X-rays pass therethrough. Item X-ray generator.
【請求項4】 前記飛散粒子阻止部材は少なくとも、開
口を有する複数の板状部材または複数の開口を有する部
材を備えていることを特徴とする請求項1〜3記載のX
線発生装置。
4. The X according to claim 1, wherein the scattered particle blocking member includes at least a plurality of plate-shaped members having openings or a member having a plurality of openings.
Line generator.
【請求項5】 前記飛散粒子阻止部材は、バッフルを有
するダクトを備えていることを特徴とする請求項4記載
のX線発生装置。
5. The X-ray generator according to claim 4, wherein the scattered particle blocking member includes a duct having a baffle.
【請求項6】 前記ダクトに飛散粒子阻止用のガスを導
入するためのガス導入口を設けたことを特徴とする請求
項5記載のX線発生装置。
6. The X-ray generator according to claim 5, wherein the duct is provided with a gas inlet for introducing a gas for preventing scattered particles.
【請求項7】 前記圧力分離機構は少なくとも、前記第
1領域に接続された真空排気機構と、バッフル及びガス
導入口が設けられたダクトを有する飛散粒子阻止部材と
を備えていることを特徴とする請求項1記載のX線発生
装置。
7. The pressure separating mechanism comprises at least an evacuation mechanism connected to the first region, and a scattered particle blocking member having a duct provided with a baffle and a gas introduction port. The X-ray generator according to claim 1.
JP7307719A 1995-11-27 1995-11-27 X-ray generator Pending JPH09148092A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7307719A JPH09148092A (en) 1995-11-27 1995-11-27 X-ray generator

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7307719A JPH09148092A (en) 1995-11-27 1995-11-27 X-ray generator

Publications (1)

Publication Number Publication Date
JPH09148092A true JPH09148092A (en) 1997-06-06

Family

ID=17972430

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7307719A Pending JPH09148092A (en) 1995-11-27 1995-11-27 X-ray generator

Country Status (1)

Country Link
JP (1) JPH09148092A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007194590A (en) * 2005-11-23 2007-08-02 Asml Netherlands Bv Radiation system and lithography apparatus

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007194590A (en) * 2005-11-23 2007-08-02 Asml Netherlands Bv Radiation system and lithography apparatus

Similar Documents

Publication Publication Date Title
US8212228B2 (en) Extreme ultra violet light source apparatus
US8530869B2 (en) Extreme ultraviolet light source apparatus
US7999241B2 (en) Extreme ultraviolet light source apparatus
TW201630477A (en) Plasma-based light source
JP2008277481A (en) Extreme-ultraviolet light source apparatus
JP2001521066A5 (en)
KR20080086486A (en) Radiation system and lithographic apparatus
JP2001057298A (en) X-ray generator, and projection exposure device having the same and exposing method
CN113767715A (en) High brightness plasma light source produced by laser
EP1211918B1 (en) Method of stopping ions and small debris in extreme-ultraviolet and soft x-rays plasma sources by using krypton
JPH09320792A (en) X-ray generator
JPH09148092A (en) X-ray generator
JP3666055B2 (en) X-ray generator and X-ray exposure apparatus
JP2022532840A (en) Extreme UV light source protection system
JP2004332115A (en) Method for preventing adhesion of contaminating particle to surface of microcomponent, microcomponent storage device and thin layer deposition device
WO2023079042A1 (en) High-brightness laser produced plasma source and method of generating and collecting radiation
JPH09320794A (en) X-ray generator
JPH09245992A (en) X-ray generating device
JP2000098094A (en) X-ray generator
CN116195369A (en) Short wavelength radiation source with multi-segment collector module
JPH09237695A (en) X-ray generating device
JPH08241847A (en) Aligner and its method
JPH08162286A (en) Laser plasma source
US12028958B2 (en) High-brightness laser produced plasma source and method of generation and collection radiation
JP2000047000A (en) Laser excited x-ray source

Legal Events

Date Code Title Description
A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20050222

A02 Decision of refusal

Free format text: JAPANESE INTERMEDIATE CODE: A02

Effective date: 20050621