JPH0914713A - Air processing device in clean room - Google Patents
Air processing device in clean roomInfo
- Publication number
- JPH0914713A JPH0914713A JP7160595A JP16059595A JPH0914713A JP H0914713 A JPH0914713 A JP H0914713A JP 7160595 A JP7160595 A JP 7160595A JP 16059595 A JP16059595 A JP 16059595A JP H0914713 A JPH0914713 A JP H0914713A
- Authority
- JP
- Japan
- Prior art keywords
- clean room
- filter
- target device
- air
- structural member
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Air Filters, Heat-Exchange Apparatuses, And Housings Of Air-Conditioning Units (AREA)
- Ventilation (AREA)
- Filtering Of Dispersed Particles In Gases (AREA)
Abstract
Description
【0001】[0001]
【産業上の利用分野】本発明は、クリーンルーム内で発
生するガス状物質及び熱を処理するための空気処理装置
に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an air treatment apparatus for treating gaseous substances and heat generated in a clean room.
【0002】[0002]
【従来の技術】次世代のより高度な清浄度が要求される
クリーンルームにおいては、希薄なガス状物質までをも
除去するフィルタが必要であり、その主な濾材としてア
ルミなどの金属細繊維と活性炭を用いている。このガス
状物質除去フィルタを組み込んだクリーンルームの空気
浄化システムとして、幾つかの方式が考えられるが、一
般的には循環系統に前記フィルタを組み込むか、クリー
ンブースかクリーントンネルの様な局所化した空間の吸
気側に組み込んでいる。2. Description of the Related Art In the next generation clean room where higher cleanliness is required, it is necessary to use a filter that removes even dilute gaseous substances, and its main filter media are fine metal fibers such as aluminum and activated carbon. Is used. There are several possible methods for cleaning the air in a clean room that incorporates this filter for removing gaseous substances, but generally, the filter is installed in the circulation system or a localized space such as a clean booth or a clean tunnel. It is installed on the intake side of.
【0003】[0003]
【発明が解決しようとする課題】しかしながら、上記従
来の方式よりも、ガス状物質を発生する対象機器(例え
ば半導体製造装置)が特定できるならば、その対象機器
の直近でガスを除去することが最良である。それは、処
理風量が少なくて済むと同時に、対象ガスもクリーンル
ームの雰囲気で希釈される前の比較的高い濃度で除去す
る方が効率が良いからである。However, if the target device (for example, a semiconductor manufacturing apparatus) that generates a gaseous substance can be specified more than in the conventional system, the gas can be removed in the immediate vicinity of the target device. Is the best. This is because it is more efficient to remove the target gas at a relatively high concentration before it is diluted with the atmosphere in the clean room, while at the same time requiring a small amount of processing air.
【0004】一方、空調負荷としての対象機器の発熱の
点から考えると、半導体工場などで頻繁に行われる生産
ラインの変更、増設に対応して、冷房能力を補完するた
めの冷却コイルを循環系統に設置することが多いが、こ
の場合も前述のフィルタと同様の理由で、必要となった
時点で対象機器の直近で処理する方が最適である。On the other hand, in terms of heat generation of the target equipment as an air conditioning load, a cooling coil for complementing the cooling capacity is provided in a circulation system in response to frequent changes and expansion of production lines in semiconductor factories and the like. In many cases, however, it is best to perform processing in the immediate vicinity of the target device when necessary, for the same reason as the above-mentioned filter.
【0005】本発明は、上記課題を解決するものであっ
て、処理風量が少なくて済むと同時にガス除去効率及び
冷却効率を高めることができるクリーンルームにおける
空気処理装置を提供することを目的とする。An object of the present invention is to solve the above problems, and to provide an air treatment device in a clean room which can improve the gas removal efficiency and the cooling efficiency while requiring a small amount of treatment air.
【0006】[0006]
【課題を解決するための手段】そのために本発明のクリ
ーンルームにおける空気処理装置は、室内気流を天井面
から床下へ流すように構成したクリーンルーム1と、ク
リーンルーム1内に設置された対象機器3と、構造部材
8上に支持され、多数の通気孔6が形成された床部材7
と、対象機器3に近接して構造部材8に吊り下げられた
フィルタコイルユニットFCUと、フィルタコイルユニ
ットFCU内に設けられたガス状物質除去フィルタA、
冷却コイルC及びファンBとを備えたことを特徴とす
る。なお、上記構成に付加した番号は、本発明の理解を
容易にするために図面と対比させるためのもので、これ
により本発明の構成が何ら限定されるものではない。To this end, an air treatment device in a clean room according to the present invention comprises a clean room 1 configured to flow an indoor airflow from a ceiling surface to a floor below, and a target device 3 installed in the clean room 1. A floor member 7 supported on the structural member 8 and having a large number of ventilation holes 6 formed therein.
A filter coil unit FCU suspended in the structural member 8 close to the target device 3; a gaseous substance removal filter A provided in the filter coil unit FCU;
A cooling coil C and a fan B are provided. The numbers added to the above configuration are for comparison with the drawings to facilitate understanding of the present invention, and the configuration of the present invention is not limited by this.
【0007】[0007]
【作用及び発明の効果】本発明においては、クリーンル
ーム1内に設置された対象機器3から発生するガス状物
質及び熱を、対象機器3の直近に設けたフィルタコイル
ユニットFCUで除去するため、処理風量が少なくて済
むと同時に、対象ガスもクリーンルーム1の雰囲気で希
釈される前の比較的高い濃度及び温度で除去及び冷却す
ることができ除去効率及び冷却効率を高めることができ
る。また、必要な場所に必要な時点でフィルタコイルユ
ニットFCUを設置することにより、生産ラインの変
更、増設にフレキシブルに対応することができると共に
コストダウンを図ることができる。In the present invention, since the gaseous substance and heat generated from the target device 3 installed in the clean room 1 are removed by the filter coil unit FCU provided in the immediate vicinity of the target device 3, the treatment is performed. A small amount of air is required, and at the same time, the target gas can be removed and cooled at a relatively high concentration and temperature before being diluted in the atmosphere of the clean room 1, and the removal efficiency and the cooling efficiency can be improved. Further, by installing the filter coil unit FCU at a necessary place at a necessary time, it is possible to flexibly cope with the production line change and expansion, and it is possible to reduce the cost.
【0008】[0008]
【実施例】以下、本発明の実施例を図面を参照しつつ説
明する。図1は、本発明のクリーンルームにおける空気
処理装置の1実施例を示す模式的断面図である。図中、
Aはガス状物質除去フィルタ、Bはファン、Cは冷却コ
イル、FCUはフィルタコイルユニットを示している。Embodiments of the present invention will be described below with reference to the drawings. FIG. 1 is a schematic cross-sectional view showing one embodiment of an air treatment device in a clean room of the present invention. In the figure,
A is a gaseous substance removal filter, B is a fan, C is a cooling coil, and FCU is a filter coil unit.
【0009】超清浄な作業空間となるクリーンルーム1
の両側に隣接して、サービスゾーン2が設置されてお
り、クリーンルーム1とサービスゾーン2に跨って半導
体製造装置等の対象機器3が設置されている。クリーン
ルーム1の上部には、HEPAフィルタ4を介して給気
チャンバー5が形成され、給気チャンバー5とサービス
ゾーン2の間にガス状物質除去フィルタA及びファンB
が配設されている。また、クリーンルーム1内に供給さ
れる外気は、外気処理用のガス状物質除去フィルタA及
びファンBを経て清浄化される構成となっている。A clean room 1 that provides an ultra-clean work space
A service zone 2 is installed adjacent to both sides of the device, and a target device 3 such as a semiconductor manufacturing apparatus is installed across the clean room 1 and the service zone 2. An air supply chamber 5 is formed above the clean room 1 via a HEPA filter 4, and a gaseous substance removal filter A and a fan B are provided between the air supply chamber 5 and the service zone 2.
Are arranged. Further, the outside air supplied into the clean room 1 is configured to be cleaned through the gaseous substance removal filter A and the fan B for treating the outside air.
【0010】クリーンルーム1の床には、多数の通気孔
6が形成された床部材7が設けられ、この床部材7は梁
又は根太からなる構造部材8上に下地材9を介して敷
設、支持され、床部材7の下部には還気チャンバー10
が形成されている。対象機器3に近接して構造部材8の
下部には、フィルタコイルユニットFCUが吊り部材1
1により固定されている。吊り部材11の中間には、ゴ
ム等の防振部材12が設けられ、ファンBの振動が対象
機器3に伝わらないようにしている。また、サービスゾ
ーン2には、対象機器3のから発生する特殊ガスや熱を
除去、冷却するために近接してフィルタコイルユニット
FCUが設置されている。The floor of the clean room 1 is provided with a floor member 7 in which a large number of ventilation holes 6 are formed. The floor member 7 is laid and supported on a structural member 8 made of beams or joists via a base material 9. The return air chamber 10 is provided below the floor member 7.
Are formed. The filter coil unit FCU is provided below the structural member 8 close to the target device 3 and the hanging member 1 is provided.
It is fixed by 1. A vibration damping member 12 made of rubber or the like is provided in the middle of the hanging member 11 to prevent the vibration of the fan B from being transmitted to the target device 3. Further, in the service zone 2, a filter coil unit FCU is installed in proximity to remove and cool special gas and heat generated from the target device 3.
【0011】上記構成からなる本発明の作用について説
明する。クリーンルーム1は、室内気流が天井面から床
下へ流れる垂直一様流であり、クリーンルーム1内にお
いては、対象機器3から特殊ガスや熱が発生し、また、
壁面等の建材から有機ガスが発生する。クリーンルーム
1の大部分の空気は、床部材7の通気孔6を通って還気
チャンバー10に入り、再び通気孔6を通ってサービス
ゾーン2に入り、ガス状物質除去フィルタAを通過する
とき、ガス状物質が除去され清浄な空気となってクリー
ンルーム1内に供給される。The operation of the present invention having the above configuration will be described. The clean room 1 is a vertical uniform flow of the indoor airflow from the ceiling surface to the underfloor, and in the clean room 1, special gas and heat are generated from the target device 3, and
Organic gas is generated from building materials such as walls. When most of the air in the clean room 1 enters the return air chamber 10 through the ventilation holes 6 of the floor member 7, enters the service zone 2 through the ventilation holes 6 again, and passes through the gaseous substance removal filter A, Gaseous substances are removed and clean air is supplied to the clean room 1.
【0012】本発明においては、上記作用に加えて対象
機器3から発生する特殊ガスを、対象機器3の直下に設
けたフィルタコイルユニットFCUで除去するため、処
理風量が少なくて済むと同時に、対象ガスもクリーンル
ーム1の雰囲気で希釈される前の比較的高い濃度で除去
することができ効率が良い。また、対象機器3の発熱
も、対象機器3の直下に設けたフィルタコイルユニット
FCU及び対象機器3の後部に設けたフィルタコイルユ
ニットFCUで冷却処理するため、処理風量が少なくて
済むと同時に、冷却効率が良くなる。通気孔6における
空気の通過速度は、通常のクリーンルームにおける通過
速度(通気孔6の開口率50%の場合で0.8m/se
c程度)より1〜2割程度早めとし、フィルタコイルユ
ニットFCU周辺の空気を積極的に誘引しつつも、クリ
ーンルーム1の床面上500mm程度より上の空間で垂
直な気流を乱さない風速に設定する。In the present invention, the special gas generated from the target device 3 is removed by the filter coil unit FCU provided directly below the target device 3 in addition to the above-mentioned action, so that the processing air volume can be reduced and at the same time the target gas can be processed. The gas can also be removed at a relatively high concentration before being diluted in the atmosphere of the clean room 1, which is efficient. Further, heat generation of the target device 3 is also cooled by the filter coil unit FCU provided directly below the target device 3 and the filter coil unit FCU provided at the rear part of the target device 3, so that a small amount of air flow can be processed and at the same time, cooling can be performed. Efficiency is improved. The passage speed of the air through the ventilation holes 6 is 0.8 m / se when the passage speed in a normal clean room (when the opening ratio of the ventilation holes 6 is 50%).
About 10 to 20% earlier than (c), while actively attracting the air around the filter coil unit FCU, set a wind speed that does not disturb the vertical air flow in the space above 500 mm above the floor of the clean room 1. To do.
【0013】また、サービスゾーン2の対象機器3の後
部あるいは付帯機器から特殊ガスや熱の発生がある場合
には、その空間の気流方向に準じて同様の方法でフィル
タコイルユニットFCUを設置し、同様にガスの除去、
冷却を効率良く行うことができる。Further, when special gas or heat is generated from the rear part of the target device 3 in the service zone 2 or incidental device, the filter coil unit FCU is installed by the same method according to the air flow direction of the space, Gas removal as well,
Cooling can be performed efficiently.
【図1】本発明のクリーンルームにおける空気処理装置
の1実施例を示す模式的断面図である。FIG. 1 is a schematic cross-sectional view showing one embodiment of an air treatment device in a clean room of the present invention.
A…ガス状物質除去フィルタ、B…ファン、C…冷却コ
イル FCU…フィルタコイルユニット、1…クリーンルー
ム、2…サービスゾーン 3…対象機器、4…HEPAフィルタ、5…給気チャン
バー、6…通気孔 7…床部材、8…構造部材、9…下地材、10…還気チ
ャンバー 11…吊り部材、12…防振部材A ... Gaseous substance removal filter, B ... Fan, C ... Cooling coil FCU ... Filter coil unit, 1 ... Clean room, 2 ... Service zone 3 ... Target equipment, 4 ... HEPA filter, 5 ... Air supply chamber, 6 ... Vent hole 7 ... Floor member, 8 ... Structural member, 9 ... Base material, 10 ... Return air chamber 11 ... Suspension member, 12 ... Vibration damping member
───────────────────────────────────────────────────── フロントページの続き (72)発明者 露木茂和 東京都港区芝浦一丁目2番3号 清水建設 株式会社内 (72)発明者 関口 猛 東京都港区芝浦一丁目2番3号 清水建設 株式会社内 ─────────────────────────────────────────────────── ─── Continuation of front page (72) Inventor Shigekazu Tsurugi 1-3-2 Shibaura, Minato-ku, Tokyo Shimizu Construction Co., Ltd. (72) Inventor Takeshi Sekiguchi 1-3-2 Shibaura, Minato-ku, Tokyo Shimizu Construction Co., Ltd.
Claims (1)
成したクリーンルームと、該クリーンルーム内に設置さ
れた対象機器と、構造部材上に支持され、多数の通気孔
が形成された床部材と、前記対象機器に近接して前記構
造部材に吊り下げられたフィルタコイルユニットと、該
フィルタコイルユニット内に設けられたガス状物質除去
フィルタ、冷却コイル及びファンとを備えたことを特徴
とするクリーンルームにおける空気処理装置。1. A clean room configured to flow an indoor airflow from the ceiling surface to the underfloor, a target device installed in the clean room, and a floor member supported on a structural member and having a large number of ventilation holes. A clean room characterized by comprising a filter coil unit suspended from the structural member in the vicinity of the target device, a gaseous substance removal filter provided in the filter coil unit, a cooling coil and a fan. Air treatment equipment in.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP16059595A JP3491242B2 (en) | 1995-06-27 | 1995-06-27 | Air treatment equipment in clean room |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP16059595A JP3491242B2 (en) | 1995-06-27 | 1995-06-27 | Air treatment equipment in clean room |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH0914713A true JPH0914713A (en) | 1997-01-17 |
JP3491242B2 JP3491242B2 (en) | 2004-01-26 |
Family
ID=15718353
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP16059595A Expired - Lifetime JP3491242B2 (en) | 1995-06-27 | 1995-06-27 | Air treatment equipment in clean room |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP3491242B2 (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0967445A3 (en) * | 1998-06-25 | 2002-06-05 | Nec Corporation | Air conditioning apparatus with reducing pressure loss in air circulation |
JP2006292290A (en) * | 2005-04-12 | 2006-10-26 | Shimizu Corp | Air cleaning system for clean room |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS626631U (en) * | 1985-06-26 | 1987-01-16 | ||
JPH0216937U (en) * | 1988-07-19 | 1990-02-02 | ||
JPH04309736A (en) * | 1991-04-05 | 1992-11-02 | Hitachi Plant Eng & Constr Co Ltd | Floor device for clean room |
JPH05312369A (en) * | 1992-05-08 | 1993-11-22 | Nec Corp | Clean room floor panel |
-
1995
- 1995-06-27 JP JP16059595A patent/JP3491242B2/en not_active Expired - Lifetime
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS626631U (en) * | 1985-06-26 | 1987-01-16 | ||
JPH0216937U (en) * | 1988-07-19 | 1990-02-02 | ||
JPH04309736A (en) * | 1991-04-05 | 1992-11-02 | Hitachi Plant Eng & Constr Co Ltd | Floor device for clean room |
JPH05312369A (en) * | 1992-05-08 | 1993-11-22 | Nec Corp | Clean room floor panel |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0967445A3 (en) * | 1998-06-25 | 2002-06-05 | Nec Corporation | Air conditioning apparatus with reducing pressure loss in air circulation |
JP2006292290A (en) * | 2005-04-12 | 2006-10-26 | Shimizu Corp | Air cleaning system for clean room |
JP4660816B2 (en) * | 2005-04-12 | 2011-03-30 | 清水建設株式会社 | Air purification system in a clean room |
Also Published As
Publication number | Publication date |
---|---|
JP3491242B2 (en) | 2004-01-26 |
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