JPH09137272A - スパッタリング装置 - Google Patents

スパッタリング装置

Info

Publication number
JPH09137272A
JPH09137272A JP8130997A JP13099796A JPH09137272A JP H09137272 A JPH09137272 A JP H09137272A JP 8130997 A JP8130997 A JP 8130997A JP 13099796 A JP13099796 A JP 13099796A JP H09137272 A JPH09137272 A JP H09137272A
Authority
JP
Japan
Prior art keywords
sputtering
target
magnetic
substrate
sputtering surface
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP8130997A
Other languages
English (en)
Japanese (ja)
Inventor
Bum-Jin Kim
範鎭 金
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Daiu Denshi Kk
WiniaDaewoo Co Ltd
Original Assignee
Daiu Denshi Kk
Daewoo Electronics Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Daiu Denshi Kk, Daewoo Electronics Co Ltd filed Critical Daiu Denshi Kk
Publication of JPH09137272A publication Critical patent/JPH09137272A/ja
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/48—Disposition or mounting of heads or head supports relative to record carriers ; arrangements of heads, e.g. for scanning the record carrier to increase the relative speed
    • G11B5/52—Disposition or mounting of heads or head supports relative to record carriers ; arrangements of heads, e.g. for scanning the record carrier to increase the relative speed with simultaneous movement of head and record carrier, e.g. rotation of head
    • G11B5/53—Disposition or mounting of heads on rotating support

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Magnetic Heads (AREA)
JP8130997A 1995-04-29 1996-04-26 スパッタリング装置 Pending JPH09137272A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR1019950010601A KR0141866B1 (ko) 1995-04-29 1995-04-29 헤드 드럼용 비디오 헤드의 스퍼터링 장치
KR1995P10601 1995-04-29

Publications (1)

Publication Number Publication Date
JPH09137272A true JPH09137272A (ja) 1997-05-27

Family

ID=19413504

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8130997A Pending JPH09137272A (ja) 1995-04-29 1996-04-26 スパッタリング装置

Country Status (3)

Country Link
JP (1) JPH09137272A (zh)
KR (1) KR0141866B1 (zh)
CN (1) CN1140207A (zh)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105200384A (zh) * 2015-10-27 2015-12-30 中国科学院兰州化学物理研究所 一种类金刚石薄膜的磁靴增强磁控溅射镀膜装置及方法

Also Published As

Publication number Publication date
KR0141866B1 (ko) 1998-07-15
CN1140207A (zh) 1997-01-15
KR960038755A (ko) 1996-11-21

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Legal Events

Date Code Title Description
A02 Decision of refusal

Free format text: JAPANESE INTERMEDIATE CODE: A02

Effective date: 20031216