JPH09116373A - Saw chip and production of saw device using the chip - Google Patents

Saw chip and production of saw device using the chip

Info

Publication number
JPH09116373A
JPH09116373A JP27221195A JP27221195A JPH09116373A JP H09116373 A JPH09116373 A JP H09116373A JP 27221195 A JP27221195 A JP 27221195A JP 27221195 A JP27221195 A JP 27221195A JP H09116373 A JPH09116373 A JP H09116373A
Authority
JP
Japan
Prior art keywords
film
bump
saw
pad
chip
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP27221195A
Other languages
Japanese (ja)
Inventor
Hiromi Yatsuda
博美 谷津田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Japan Radio Co Ltd
Original Assignee
Japan Radio Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Japan Radio Co Ltd filed Critical Japan Radio Co Ltd
Priority to JP27221195A priority Critical patent/JPH09116373A/en
Publication of JPH09116373A publication Critical patent/JPH09116373A/en
Pending legal-status Critical Current

Links

Abstract

PROBLEM TO BE SOLVED: To prevent the easy breakage of electrical connection between a bump and a pad film even when the stress is applied to the junction part between the bump and the pad film by forming an electrode film containing Al on the surface of a piezoelectric substrate and also forming the pad film containing Au and no Al which is laminated on the electrode film only at a part with another part remaining as it is with no lamination. SOLUTION: A pad film 14A containing Au partly overlaps an electrode film 12 containing Al. For this purpose, the shapes, the sizes and the positions of both films 14A and 12 are set respectively. Therefore, an Al-Au alloy layer 18A that is generated due to Al of the film 14A never exists at the junction part related to a bump 16. If the layer 18A is generated at the contact/ lamination part between the films 12 and 14A, the layer 18A is distant away from the bump 16. As a result, the shearing stress is not caused at the layer 18A even though the difference of heat expansion coefficients is caused between a substrate 10 and a package. Therefore, the junction part related to the bump 16 is not substantially impaired.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【発明の属する技術分野】本発明は、少なくとも電極膜
及びパッド膜にて構成される電極構造を有するSAWチ
ップに関し、さらにはこのSAWチップを用いたSAW
デバイス及びその製造方法や、このSAWデバイスを用
いた携帯電話機等の応用機器に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a SAW chip having an electrode structure composed of at least an electrode film and a pad film, and a SAW chip using this SAW chip.
The present invention relates to a device, a method for manufacturing the device, and applied equipment such as a mobile phone using the SAW device.

【0002】[0002]

【従来の技術】圧電性を有する基板の表面又は比較的浅
い部位を伝搬する弾性波は、一般に表面弾性波(SA
W)と呼ばれている。SAWを利用したデバイス(SA
Wデバイス)にはフィルタ、共振器、遅延線等があり、
この種のデバイスはPHS等の簡易型携帯電話機を始め
各種の無線機器・高周波機器に広く用いられている。例
えば携帯電話機のRF段等においては、アンテナ共用器
等周知の態様にて、SAWフィルタが用いられている。
また、携帯電話機を始めとする応用機器に対しては一般
に小形低価格化が求められており、従ってこの種の機器
にて使用されるSAWデバイスに対しても同様の改良が
常に要請されている。いわゆるフリップチップ型SAW
デバイスは、このような要請に応えるべく開発されたS
AWデバイスであり、外部の回路基板上にフェースダウ
ンボンディング可能な構造を有するパッケージに、圧電
基板上に所定の電極を配設した構造を有するチップ(S
AWチップ)を搭載又は収納し、金属を含有するバンプ
にて両者を電気的かつ機械的に接続した構造を有してい
る。
2. Description of the Related Art Acoustic waves propagating on a surface of a substrate having piezoelectricity or a relatively shallow portion are generally surface acoustic waves (SA).
W). Devices using SAW (SA
W devices) include filters, resonators, delay lines, etc.,
This type of device is widely used in various wireless devices and high-frequency devices including simple mobile phones such as PHS. For example, in the RF stage of a mobile phone, a SAW filter is used in a known manner such as an antenna duplexer.
In addition, application devices such as mobile phones are generally required to be small and low-priced. Therefore, similar improvements are always required for SAW devices used in this type of device. . So-called flip-chip type SAW
The device is an S developed to meet such demands.
A chip which is an AW device and has a structure in which predetermined electrodes are provided on a piezoelectric substrate in a package having a structure capable of face-down bonding on an external circuit substrate (S
AW chip) is mounted or housed and both are electrically and mechanically connected by bumps containing metal.

【0003】図3には、フリップチップ型SAWフィル
タ、特にそのSAWチップの構造が示されている。図中
符号10で示される圧電基板の表面にはそれぞれ送波用
電極又は受波用電極を構成するよう指交叉状電極指群を
有する二対の電極膜12が配設されている。電極膜12
のうち図3(a)にて上下に位置する長方形の部分の上
には、バンプ16と電気的及び機械的に接続されるパッ
ド膜14が配設されている。バンプ16は、後述するパ
ッケージ20上のパッド膜22とSAWチップ上の電極
膜12とをパッド膜14を介し電気的に接続し、またS
AWチップをパッケージ20に機械的に固定する機能を
有している。
FIG. 3 shows the structure of a flip-chip type SAW filter, especially the SAW chip. On the surface of the piezoelectric substrate shown by reference numeral 10 in the drawing, two pairs of electrode films 12 having finger-intersectioned electrode finger groups are arranged so as to respectively constitute a wave-transmitting electrode or a wave-receiving electrode. Electrode film 12
A pad film 14 that is electrically and mechanically connected to the bumps 16 is provided on the upper and lower rectangular portions in FIG. 3A. The bump 16 electrically connects a pad film 22 on the package 20 described later and the electrode film 12 on the SAW chip via the pad film 14, and
It has a function of mechanically fixing the AW chip to the package 20.

【0004】ここで、電極膜12は、一般に、ストレス
マイグレーションに対する強度を確保すべくCuを添加
したAl膜とする。すなわち、電極膜12の素材はAl
−Cu合金である(参考文献:“High Power SAW Filte
r for Antenna Duplexer”,Y.Kinoshita,A.Nakagoshi,
H.Kojima and M.Hikita,IEEE 1983 Ultrasonic Symposi
um,pp.83-86)。この電極膜12の好適な膜厚は使用周
波数帯域に依存しており、800MHz以上の周波数で
使用するSAWフィルタでは電極膜12を一般に100
nm〜200nmといった非常に薄い膜にしなければな
らない。図3においてパッド膜14を設けている理由
は、このような薄い電極膜12では超音波ボンダ等を用
いたバンプ16との接合を実行できないことである。こ
の目的から明らかなように、パッド膜14の厚みは超音
波ボンダ等を適用しうる厚み(例えば1μm)としなけ
ればならず、またその素材としてはバンプ16や電極膜
12との接続に適する素材(例えばAl)を用いなけれ
ばならない。
Here, the electrode film 12 is generally an Al film added with Cu in order to secure strength against stress migration. That is, the material of the electrode film 12 is Al
-Cu alloy (reference: "High Power SAW Filte
r for Antenna Duplexer ”, Y.Kinoshita, A.Nakagoshi,
H.Kojima and M.Hikita, IEEE 1983 Ultrasonic Symposi
um, pp.83-86). The suitable film thickness of the electrode film 12 depends on the frequency band used, and in the SAW filter used at a frequency of 800 MHz or higher, the electrode film 12 is generally 100
It must be a very thin film such as nm-200 nm. The reason for providing the pad film 14 in FIG. 3 is that such thin electrode film 12 cannot be bonded to the bump 16 using an ultrasonic bonder or the like. As is clear from this purpose, the thickness of the pad film 14 must be a thickness (for example, 1 μm) to which an ultrasonic bonder or the like can be applied, and the material thereof is a material suitable for connection with the bump 16 or the electrode film 12. (Eg Al) must be used.

【0005】[0005]

【発明が解決しようとする課題】主としてAuにて形成
されるAuバンプをバンプ16として使用しているとき
には、バンプ16とパッド膜14の接触部位におけるA
l−Au合金の形成により、両者が接合される。しかし
ながら、このAl−Au合金には固くてもろいという性
質がある。従って、接合後のバンプ16・パッド膜14
間の金属相互拡散によってこのAl−Au合金が無視で
きない厚みを有するAl−Au合金層18へと成長して
しまうと(図4参照)、バンプ16をパッケージ20の
表面のパッド膜22と電気的及び機械的に接続する際に
(図5参照)、圧電基板10とパッケージ20の熱膨張
係数の差に起因して生じる剪断応力にてAl−Au合金
層18、ひいてはバンプ16と電極膜12の間の間接的
接続が破壊され、不良乃至故障の発生を招いてしまう。
When an Au bump formed mainly of Au is used as the bump 16, A at the contact portion between the bump 16 and the pad film 14 is used.
The formation of the l-Au alloy joins the two. However, this Al-Au alloy has the property of being hard and brittle. Therefore, the bump 16 and the pad film 14 after bonding
When the Al—Au alloy grows into an Al—Au alloy layer 18 having a non-negligible thickness due to metal interdiffusion between the bumps 16 (see FIG. 4), the bumps 16 are electrically connected to the pad film 22 on the surface of the package 20. In addition, when mechanically connecting (see FIG. 5), the Al—Au alloy layer 18, and hence the bump 16 and the electrode film 12 are sheared by the shear stress caused by the difference in thermal expansion coefficient between the piezoelectric substrate 10 and the package 20. The indirect connection between them is destroyed, which causes a failure or a failure.

【0006】本発明の目的の一つは、電極構造の改善に
より、バンプとパッド層の接合部位に何等かの応力が加
わったとしてもバンプと電極膜の間の電気的接続が失わ
れにくいようにすることにある。本発明の目的の他の一
つは、圧電基板とパッケージの熱膨張係数に差があって
も十分高い歩留まり及び十分低い故障率を実現できるよ
うにすることにある。本発明の目的の他の一つは、上述
の目的を簡便な手段で、従って低いコストで実現可能に
することにある。
One of the objects of the present invention is to improve the electrode structure so that the electrical connection between the bump and the electrode film is less likely to be lost even if some stress is applied to the bonding portion between the bump and the pad layer. Is to Another object of the present invention is to realize a sufficiently high yield and a sufficiently low failure rate even if there is a difference in thermal expansion coefficient between the piezoelectric substrate and the package. Another of the objects of the present invention is to make it possible to realize the above-mentioned object by a simple means and thus at a low cost.

【0007】[0007]

【課題を解決するための手段及び発明の効果】このよう
な目的を達成するために、本発明に係るSAWチップ
は、圧電性を有する基板と、基板表面又は比較的浅い部
位にて伝搬する弾性波を送受波するための送受波電極が
形成されるよう基板表面に配設され、Alを含有する電
極膜と、その一部のみが電極膜と積層され他の一部が積
層されずに残るよう基板表面に配設され、Auを含有し
Alを含有しないパッド膜と、を備えることを特徴とす
る。また、本発明に係るSAWデバイスの製造方法は、
本発明に係るSAWチップ及び当該SAWチップを搭載
乃至収納するパッケージを準備するステップと、パッド
膜の表面のうち電極膜と積層されていない部分にAuを
含有するバンプを配設するステップと、そのパッド膜の
表面にバンプが形成されたSAWチップをパッケージに
搭載乃至収納するステップと、パッケージ表面の導電部
分と基板表面のパッド膜とをバンプを介し電気的かつ機
械的に接続するステップと、を有することを特徴とす
る。
In order to achieve such an object, the SAW chip according to the present invention is provided with a substrate having piezoelectricity and elasticity propagating on the substrate surface or a relatively shallow portion. An electrode film which is arranged on the surface of the substrate so as to form a wave transmitting / receiving electrode for transmitting / receiving a wave, and an Al-containing electrode film, only a part of which is laminated with the electrode film and the other part of which is left without being laminated. And a pad film containing Au and containing no Al. Further, the method for manufacturing a SAW device according to the present invention is
A step of preparing a SAW chip according to the present invention and a package on which the SAW chip is mounted or housed; a step of providing a bump containing Au on a portion of the surface of the pad film that is not laminated with the electrode film; A step of mounting or accommodating a SAW chip having bumps formed on the surface of a pad film in a package, and a step of electrically and mechanically connecting a conductive portion on the package surface and a pad film on the substrate surface via the bumps. It is characterized by having.

【0008】このように、本発明においては、パッド膜
がAlを含有していないためパッド膜とバンプの接合部
位にAl−Au合金層が成長することがない。従って、
従来に比べ、バンプとパッド層の接合部位に生じる応力
による不良乃至故障が発生しにくいから、高い歩留まり
及び低い故障率を基板とパッケージの熱膨張係数に差が
あっても上述の簡便な手段にて実現できる。なお、電極
膜とパッド膜の接触部位には合金層が発生し得るもの
の、電極膜と重ならない部位にてバンプをパッド膜と接
合しているから、この合金層には応力が生じにくい。
As described above, in the present invention, since the pad film does not contain Al, the Al—Au alloy layer does not grow at the bonding portion between the pad film and the bump. Therefore,
Since defects or failures due to stress generated at the bonding portion between the bump and the pad layer are less likely to occur than in the past, a high yield and a low failure rate can be used as the above-mentioned simple means even if there is a difference in the thermal expansion coefficient between the substrate and the package. Can be realized. Although an alloy layer may be generated at the contact portion between the electrode film and the pad film, since the bump is bonded to the pad film at a portion that does not overlap the electrode film, stress is unlikely to occur in this alloy layer.

【0009】[0009]

【発明の実施の形態】以下、本発明の好適な実施形態に
関し図面に基づき説明する。図1及び図2に示されるよ
うに、本実施形態では、パッド膜14Aの一部が電極膜
12の上に乗り上げた構造となるよう、パッド膜14A
及び電極膜12の形状、寸法及び位置が設定されてい
る。また、本実施形態では、パッド膜14AがAuから
形成されている。このように、本実施形態は、Alから
形成されたパッド膜14がその全面に亘って電極膜12
と重なりあっていた従来技術と相違している。なお、こ
こでは、図3〜図5に示される従来技術と同様の又は対
応する構成には同一の符号を付し説明を省略している。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Preferred embodiments of the present invention will be described below with reference to the drawings. As shown in FIGS. 1 and 2, in the present embodiment, the pad film 14A has a structure in which a part of the pad film 14A rides on the electrode film 12.
The shape, size and position of the electrode film 12 are set. Further, in the present embodiment, the pad film 14A is made of Au. As described above, in the present embodiment, the pad film 14 formed of Al is entirely covered with the electrode film 12.
It is different from the conventional technology that overlaps with. Note that, here, the same or corresponding configurations as those of the conventional technique shown in FIGS. 3 to 5 are denoted by the same reference numerals and the description thereof is omitted.

【0010】このようにパッド膜14AがAuであるた
め、本実施形態によれば、図4に示されるようなAl−
Au合金層18がバンプ16に係る接合部位に発生する
ことがない。また、電極膜12とパッド膜14Aの接触
・積層部位にてAl−Au合金層18Aが発生するもの
の、このAl−Au合金層18Aはバンプ16から離れ
た部位にあり従って図5に示される原因での剪断応力は
この層18Aには生じない。従って、基板10の熱膨張
係数とパッケージ20の熱膨張係数の間に差があって
も、バンプ16に係る接合部位はほとんど損傷を受け
ず、その結果歩留り改善、不良・故障率低減といった効
果が生じ、製品価格も安価化可能になる。加えて、図1
及び図2に示される構造は、図3及び図4に示される構
造と基本的に同一の製造設備を使用して製造することが
可能である。
As described above, since the pad film 14A is made of Au, according to the present embodiment, Al- as shown in FIG.
The Au alloy layer 18 does not occur at the bonding site of the bump 16. Further, although the Al-Au alloy layer 18A is generated at the contact / lamination site between the electrode film 12 and the pad film 14A, the Al-Au alloy layer 18A is located away from the bump 16, and therefore the cause shown in FIG. Shear stress does not occur in this layer 18A. Therefore, even if there is a difference between the coefficient of thermal expansion of the substrate 10 and the coefficient of thermal expansion of the package 20, the bonding portion related to the bump 16 is hardly damaged, and as a result, the yield is improved and the defect / failure rate is reduced. As a result, the product price can be reduced. In addition, FIG.
The structure shown in FIG. 2 and FIG. 2 can be manufactured using basically the same manufacturing equipment as the structure shown in FIGS.

【0011】なお、従来技術と基本的に同一の製造設備
を使用して製造することが可能であるとしても、そのこ
とが直ちに“本発明に係る改良が単なる設計的選択にす
ぎない”ことを意味するものではない点に注意する必要
がある。すなわち、電極の配置・形状・素材等の要因は
SAWデバイスの性能や製造条件を決定する要因の一つ
であり、これらの改良を単なる設計的選択として閑却す
ることは本技術分野では不適切である。
It should be noted that even if it is possible to manufacture using basically the same manufacturing equipment as in the prior art, it immediately means that "the improvement according to the present invention is merely a design choice". Note that it does not mean that. That is, factors such as the arrangement, shape, and material of the electrodes are one of the factors that determine the performance and manufacturing conditions of the SAW device, and it is inappropriate for this technical field to neglect these improvements as mere design choices. Is.

【0012】[0012]

【補遺】本発明は、本発明に係る製造方法により製造さ
れるSAWデバイスとしても、また本発明に係るSAW
デバイスを備える携帯電話機としても、把握することが
できる。また、上述の実施形態ではSAWフィルタを例
としたが、本発明は他の種類のSAWデバイスにも適用
できる。さらに、図では電極膜12はいわゆる正規型の
送受波電極を構成していたが、各種手法に従う重み付け
が施された電極を構成するようにしても構わない。
[Addendum] The present invention also relates to a SAW device manufactured by the manufacturing method according to the present invention, and a SAW device according to the present invention.
It can be understood as a mobile phone equipped with a device. Further, although the SAW filter is taken as an example in the above-described embodiment, the present invention can be applied to other types of SAW devices. Further, although the electrode film 12 constitutes a so-called normal type transmission / reception electrode in the figure, the electrode film 12 may constitute a weighted electrode according to various methods.

【図面の簡単な説明】[Brief description of the drawings]

【図1】 本発明の一実施形態に係るSAWチップ、特
にその電極構造を示す図であり、(a)は上面図、
(b)は縦側面図、(c)は横側面図である。
FIG. 1 is a diagram showing a SAW chip according to an embodiment of the present invention, particularly an electrode structure thereof, in which (a) is a top view,
(B) is a vertical side view, and (c) is a horizontal side view.

【図2】 この実施形態におけるバンプ接合部位周辺の
構造を示す断面図である。
FIG. 2 is a cross-sectional view showing a structure around a bump bonding portion in this embodiment.

【図3】 従来技術に係るSAWチップ、特にその電極
構造を示す図であり、(a)は上面図、(b)は縦側面
図、(c)は横側面図である。
3A and 3B are diagrams showing a SAW chip according to a conventional technique, particularly an electrode structure thereof, FIG. 3A is a top view, FIG. 3B is a vertical side view, and FIG. 3C is a lateral side view.

【図4】 この従来技術におけるバンプ接合部位周辺の
構造を示す断面図である。
FIG. 4 is a cross-sectional view showing a structure around a bump bonding portion in this conventional technique.

【図5】 この従来技術の問題点をやや誇張して描いた
側面図である。
FIG. 5 is a side view in which the problems of the conventional technique are slightly exaggerated.

【符号の説明】[Explanation of symbols]

10 圧電基板、12 電極膜(Al−Cu)、14A
パッド膜(Au)、16 バンプ(Au)、18A
合金層(Al−Au)、20 パッケージ、22 パッ
ケージ側のパッド膜。
10 piezoelectric substrate, 12 electrode film (Al-Cu), 14A
Pad film (Au), 16 bumps (Au), 18A
Alloy layer (Al-Au), 20 package, 22 Pad film on package side.

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 圧電性を有する基板と、 基板表面又は比較的浅い部位にて伝搬する弾性波を送受
波するための送受波電極が形成されるよう基板表面に配
設され、Alを含有する電極膜と、 その一部のみが電極膜と積層され他の一部が積層されず
に残るよう基板表面に配設され、Auを含有しAlを含
有しないパッド膜と、 を備えることを特徴とするSAWチップ。
1. A substrate having piezoelectricity, and a transducing electrode for transmitting and receiving an elastic wave propagating on a substrate surface or a relatively shallow portion are provided on the substrate surface and contain Al. An electrode film, and a pad film which is arranged on the surface of the substrate such that only a part of the electrode film is laminated with the electrode film and the other part is left without being laminated, and the pad film contains Au and does not contain Al. SAW chip to do.
【請求項2】 請求項1記載のSAWチップ及び当該S
AWチップを搭載乃至収納するパッケージを準備するス
テップと、 パッド膜の表面のうち電極膜と積層されていない部分に
Auを含有するバンプを配設するステップと、 そのパッド膜の表面にバンプが形成されたSAWチップ
をパッケージに搭載乃至収納するステップと、 パッケージ表面の導電部分と基板表面のパッド膜とをバ
ンプを介し電気的かつ機械的に接続するステップと、 を有することを特徴とするSAWデバイスの製造方法。
2. The SAW chip and the S according to claim 1.
A step of preparing a package for mounting or housing an AW chip, a step of providing a bump containing Au on a portion of the surface of the pad film which is not laminated with the electrode film, and a bump formed on the surface of the pad film SAW device, comprising: mounting or housing the formed SAW chip in a package; and electrically and mechanically connecting a conductive portion on the package surface and a pad film on the substrate surface via bumps. Manufacturing method.
JP27221195A 1995-10-20 1995-10-20 Saw chip and production of saw device using the chip Pending JPH09116373A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP27221195A JPH09116373A (en) 1995-10-20 1995-10-20 Saw chip and production of saw device using the chip

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP27221195A JPH09116373A (en) 1995-10-20 1995-10-20 Saw chip and production of saw device using the chip

Publications (1)

Publication Number Publication Date
JPH09116373A true JPH09116373A (en) 1997-05-02

Family

ID=17510666

Family Applications (1)

Application Number Title Priority Date Filing Date
JP27221195A Pending JPH09116373A (en) 1995-10-20 1995-10-20 Saw chip and production of saw device using the chip

Country Status (1)

Country Link
JP (1) JPH09116373A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002261571A (en) * 2001-02-27 2002-09-13 Kyocera Corp Surface acoustic wave device and its producing method

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002261571A (en) * 2001-02-27 2002-09-13 Kyocera Corp Surface acoustic wave device and its producing method
JP4731026B2 (en) * 2001-02-27 2011-07-20 京セラ株式会社 Manufacturing method of surface acoustic wave device

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