JPH09102668A - Method for forming circuit with laser - Google Patents

Method for forming circuit with laser

Info

Publication number
JPH09102668A
JPH09102668A JP8193450A JP19345096A JPH09102668A JP H09102668 A JPH09102668 A JP H09102668A JP 8193450 A JP8193450 A JP 8193450A JP 19345096 A JP19345096 A JP 19345096A JP H09102668 A JPH09102668 A JP H09102668A
Authority
JP
Japan
Prior art keywords
thin film
metal thin
laser
circuit
forming method
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP8193450A
Other languages
Japanese (ja)
Other versions
JP3770968B2 (en
Inventor
Takayuki Miyashita
貴之 宮下
Satoyuki Akeda
智行 明田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Polyplastics Co Ltd
Original Assignee
Polyplastics Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Polyplastics Co Ltd filed Critical Polyplastics Co Ltd
Priority to JP19345096A priority Critical patent/JP3770968B2/en
Publication of JPH09102668A publication Critical patent/JPH09102668A/en
Application granted granted Critical
Publication of JP3770968B2 publication Critical patent/JP3770968B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Laser Beam Processing (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)

Abstract

PROBLEM TO BE SOLVED: To make it possible to form a conductive circuit accurately on a molding of synthetic resin with a complex shape in a simple method by forming a metallic thin film with given brightness on the surface of the molding and carrying out a laser beam machining step. SOLUTION: A metallic coating step for a molding is carried out to form a metallic thin film 2 on the surface. In this case, the metallic film 2 on the molding 1 has a thickness of 1 to 2μm, and preferably made of copper in a chemical plating, sputtering, vacuum deposition or ion plating step. When the surface of the metallic thin film 2 has brightness of 40 or below, preferably 30 or below, a laser beam machining step with laser can be carried out directly. As an example, when an electroless copper plating solution containing organic sulfur compound is used, the brightness of the surface of the copper foil deposited thereon becomes 40 or below, so the laser beam machining step can be carried out directly. In addition, thiol-based material like 2- mercaptobenzoimidazole may be used as the organic sulfur compound.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、合成樹脂成形品の
表面に導電回路を形成する方法に関し、電気・電子機器
等の分野で回路部品として使用される、表面に正確な導
電回路を有する成形品を、効率よく製造するための方法
に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for forming a conductive circuit on the surface of a synthetic resin molded product, which is used as a circuit component in the field of electric / electronic equipment and has a precise conductive circuit on the surface. The present invention relates to a method for efficiently manufacturing a product.

【0002】[0002]

【従来の技術及び発明が解決しようとする課題】現在、
レーザー光を用いた回路形成法として、成形品の表面に
予め導電回路として充分な厚さの金属膜を形成し、導電
回路以外の部分の金属膜をレーザー光により飛散除去し
て、そのまま導電回路とする方法(特開昭64−833
91号公報)が考えられているが、この方法によると導
体金属層の厚さを回路としての導電性が充分なように比
較的厚い層(例えば10μm以上)とする必要があるた
め、レーザー光にて金属層の不要部を除去する場合に
は、レーザー光の出力を高くする必要があり、その結
果、下地の合成樹脂成形品まで損傷してしまい、形成し
た回路の外観形状を著しく阻害し、又、合成樹脂を炭化
させて絶縁性に支障を生じる等の問題がある。また、成
形品の表面に金属薄膜を形成し、導電回路部以外の部分
の金属薄膜を除去し回路パターンを形成し、電気メッキ
を行い導電回路とする方法(特開平6−164105号
公報)が考えられており、この方法によればレーザー光
の出力を下げて照射するため合成樹脂が炭化されず絶縁
性の問題はないが、レーザー光の出力を下げているた
め、金属薄膜の厚さのばらつきにより、金属薄膜が部分
的に除去しきれずに残留し、その結果、導電回路が短絡
するという新たな問題が生じる場合がある。
2. Description of the Related Art
As a circuit forming method using laser light, a metal film with a sufficient thickness for a conductive circuit is previously formed on the surface of a molded product, and the metal film other than the conductive circuit is scattered and removed by laser light, and the conductive circuit is used as it is. (Japanese Patent Laid-Open No. 64-833
However, according to this method, the thickness of the conductor metal layer needs to be a relatively thick layer (for example, 10 μm or more) so that the conductivity of the circuit is sufficient. When removing the unnecessary part of the metal layer, it is necessary to increase the output of the laser beam, as a result, the underlying synthetic resin molded product will be damaged and the appearance shape of the formed circuit will be significantly impaired. In addition, there is a problem in that the synthetic resin is carbonized to impair the insulating property. In addition, a method of forming a metal thin film on the surface of a molded product, removing the metal thin film in a portion other than the conductive circuit portion to form a circuit pattern, and performing electroplating to form a conductive circuit (JP-A-6-164105) is disclosed. It is considered that according to this method, the synthetic resin is not carbonized because there is no output of the laser light and irradiation is performed, so there is no problem of insulation, but since the output of the laser light is reduced, the thickness of the metal thin film is reduced. Due to the variation, the metal thin film cannot be partially removed and remains, resulting in a new problem that the conductive circuit is short-circuited.

【0003】[0003]

【課題を解決するための手段】本発明者等は、上記従来
法の問題を解決し、簡便な方法により複雑な形状の成形
品にもレーザー光を利用して精度良く導電回路を形成す
る方法について詳細に検討した結果、成形品の表面に形
成された金属薄膜として、表面の明度(L値)が40以下
のものを用い、レーザー加工を行うことにより、金属薄
膜の厚さのばらつきによる金属薄膜の残留がなくなり、
導電回路を短絡させることなく形成し得ることを見出
し、本発明を完成するに至った。ここで、金属薄膜とし
て、表面の明度(L値)が40以下のものを用いるとは、
元々表面の明度(L値)が40以下である金属薄膜を用い
てもよいし、適当な手段により表面の明度(L値)を40
以下に変化させてもよい。即ち本発明は、合成樹脂成形
品表面に形成した金属薄膜をレーザー光により除去して
回路形成を行う方法において、表面の明度(L値)が40
以下である金属薄膜を用い、あるいは金属薄膜の表面の
明度(L値)を40以下にした後、レーザー加工を行うこ
とを特徴とするレーザーによる回路形成方法である。
SUMMARY OF THE INVENTION The present inventors have solved the problems of the above-mentioned conventional methods, and are capable of accurately forming a conductive circuit on a molded article having a complicated shape by using a laser beam by a simple method. As a result of detailed examination of the above, as a metal thin film formed on the surface of the molded product, a metal thin film having a surface brightness (L value) of 40 or less was used, and by performing laser processing, metal due to variation in thickness of the metal thin film No thin film remains,
The inventors have found that the conductive circuit can be formed without short-circuiting, and have completed the present invention. Here, using a metal thin film having a surface brightness (L value) of 40 or less means
A metal thin film whose surface lightness (L value) is 40 or less may be used originally, or the surface lightness (L value) is 40 or less by an appropriate means.
It may be changed to the following. That is, the present invention is a method for removing a metal thin film formed on the surface of a synthetic resin molded product by laser light to form a circuit, wherein the surface brightness (L value) is 40%.
A circuit forming method using a laser, which is characterized in that the following metal thin film is used, or the lightness (L value) of the surface of the metal thin film is set to 40 or less, and then laser processing is performed.

【0004】[0004]

【発明の実施の形態】以下、図を参照し、順を追って本
発明の方法を説明する。本発明で用いる合成樹脂成形品
(基体成形品)の材質は、金属薄膜を強固に付着するこ
とのできる合成樹脂であれば、熱可塑性樹脂材料、熱硬
化性樹脂材料の何れでも良いが、かかる成形品が後にハ
ンダ付加工等の苛酷な処理を受けることを考慮すると、
耐熱性が高く、かつ機械的強度の優れたものが望まし
く、さらに多量産性の点では射出成形可能な熱可塑性樹
脂が好ましい。その例を挙げれば、芳香族ポリエステ
ル、ポリアミド、ポリアセタール、ポリアリーレンサル
ファイド、ポリサルホン、ポリフェニレンオキサイド、
ポリイミド、ポリエーテルケトン、ポリアリレート及び
これらの組成物等であり、金属薄膜表面の明度(L値)
を40以下にするための熱処理の関係から熱変形温度が20
0 ℃以上の熱可塑性樹脂が好ましく、特に高融点、高強
度、高剛性、成形加工性等の観点から液晶性ポリマー
(例えば液晶性ポリエステル、ポリエステルアミド)、
ポリアリーレンサルファイドが特に好適であるがこれら
に限定されるものではない。また、金属薄膜の密着性を
高めるため、必要に応じその材料に適当な物質を配合し
ても良い。基体成形品1(図1)は、射出成形等により
成形され、その表面の金属薄膜の密着性を良くするた
め、更に酸、アルカリその他による化学的エッチング、
或いはコロナ放電、プラズマ処理等の物理的表面処理を
行っても良い。
BEST MODE FOR CARRYING OUT THE INVENTION The method of the present invention will be described below step by step with reference to the drawings. The material of the synthetic resin molded product (base molded product) used in the present invention may be either a thermoplastic resin material or a thermosetting resin material as long as it is a synthetic resin capable of firmly adhering a metal thin film. Considering that the molded product will later undergo severe processing such as soldering,
A resin having high heat resistance and excellent mechanical strength is preferable, and a thermoplastic resin capable of injection molding is preferable from the viewpoint of mass production. If the example is given, aromatic polyester, polyamide, polyacetal, polyarylene sulfide, polysulfone, polyphenylene oxide,
Polyimide, polyetherketone, polyarylate and their compositions, etc., and the lightness (L value) of the metal thin film surface
The heat distortion temperature of 20
A thermoplastic resin having a temperature of 0 ° C. or higher is preferable, and particularly from the viewpoint of high melting point, high strength, high rigidity, moldability, etc., a liquid crystalline polymer (eg, liquid crystalline polyester, polyester amide),
Polyarylene sulfide is particularly preferred, but not limited to. Moreover, in order to enhance the adhesion of the metal thin film, an appropriate substance may be added to the material, if necessary. The base molded product 1 (FIG. 1) is molded by injection molding or the like, and in order to improve the adhesion of the metal thin film on its surface, chemical etching with acid, alkali or the like,
Alternatively, physical surface treatment such as corona discharge or plasma treatment may be performed.

【0005】次に、この成形品の表面に金属被覆加工を
行い、金属薄膜2を形成する(図2)。ここで付与する
金属薄膜2の厚さは、厚すぎると次工程におけるレーザ
ー光による回路パターン形成に強い出力のレーザー光を
要することとなり、先に述べたように基体成形品1に損
傷を生じさせるため好ましくない。逆に薄すぎると後工
程での電気メッキによる金属層付加工程において、メッ
キのための電気が流れなくなるため好ましくない。かか
る見地から基体成形品1の表面に付与される金属薄膜2
の厚さは0.1 〜2μm程度の範囲が適当であり、より好
ましくは0.3 〜1μmである。かかる範囲の厚さであれ
ばレーザー光による回路パターン形成を比較的弱い出力
で基体成形品1に損傷を生じさせることなく正確に行う
ことができるので好適である。かかる金属薄膜2を形成
する方法としては、化学メッキ、スパッタリング、真空
蒸着、イオンプレーティング、転写法、導電剤塗装等、
従来公知の何れの方法でも良いが、均一な金属薄膜2を
形成するためには化学メッキ(無電解メッキ)、スパッ
タリング、真空蒸着、イオンプレーティングが適当であ
る。また、ここで用いる金属は、銅、銀、ニッケル等、
後述のように、化学反応等により暗褐色に変化する金属
であれば、何れの金属でも良いが、安価で導電性の良い
金属薄膜を形成するためには銅が好適である。ここで、
金属薄膜の表面の明度(L値)が40以下、より好ましく
は30以下であれば、そのままレーザー加工を行えばよ
い。例えば、無電解銅メッキ液に有機イオウ化合物を添
加すると析出した銅薄膜の表面の明度(L値)は40以下
であるので、そのままレーザー加工を行うことができ
る。ここで、有機イオウ化合物としては、2−メルカプ
トベンゾイミダゾール等のチオール類、ジメチルジスル
フィド等のジスルフィド類、1,2 −ビス(2−ヒドロキ
シエチルチオ)エタン等のスルフィド類、チオアセト
ン、チオ尿素等のチオケトン類、1−エチルチアゾリウ
ムクロライド等のスルホニウム類、スルホラン等のスル
ホラン類が挙げられ、これらの1種又は2種以上を用い
ることができる。無電解メッキ表面の明度(L値)が40
を越えている場合は、表面に金属薄膜2を形成した基体
成形品1(図2)の金属薄膜2の表面を、明度(L値)
が40以下になるように暗色に変化させれば良い(図
3)。本発明における明度とは、色差計で測定されたL
値のことである。金属薄膜表面の明度(L値)を40以下
に変化させる方法としては化学反応が好適であり、具体
的には酸化、硫化等の既知の方法であり、その金属に適
した方法であればいかなる方法でもよく、例えば銅薄膜
の場合、加熱による酸化で薄膜表面に暗色の酸化物を形
成させる方法が簡便で好適である。また、ここでの加熱
温度の設定は重要であり、低い温度では金属薄膜2が酸
化されずらく、また逆に高い温度では基体樹脂成形品に
変形などの不具合が生じるため好ましくない。かかる見
地から金属薄膜を加熱により酸化させる場合の加熱温度
は、100 〜200 ℃、好ましくは140 〜200 ℃が適当であ
り、0.5 〜3時間加熱時間が適当である。
Next, the surface of this molded product is subjected to a metal coating process to form a metal thin film 2 (FIG. 2). If the thickness of the metal thin film 2 provided here is too thick, a laser beam having a strong output is required for forming a circuit pattern by the laser beam in the next step, which causes damage to the base molded article 1 as described above. Therefore, it is not preferable. On the other hand, if it is too thin, electricity for plating will not flow in the metal layer adding step by electroplating in the subsequent step, which is not preferable. From this point of view, the metal thin film 2 applied to the surface of the base molded article 1
The thickness is preferably in the range of about 0.1 to 2 .mu.m, more preferably 0.3 to 1 .mu.m. If the thickness is in this range, the circuit pattern formation by the laser light can be accurately performed with a comparatively weak output without causing damage to the base molded product 1. Examples of the method of forming the metal thin film 2 include chemical plating, sputtering, vacuum deposition, ion plating, transfer method, conductive agent coating, etc.
Any known method may be used, but chemical plating (electroless plating), sputtering, vacuum deposition, or ion plating is suitable for forming a uniform metal thin film 2. The metal used here is copper, silver, nickel, or the like.
As described below, any metal may be used as long as it is a metal that changes to dark brown color due to a chemical reaction or the like, but copper is preferable for forming a metal thin film that is inexpensive and has good conductivity. here,
If the lightness (L value) of the surface of the metal thin film is 40 or less, more preferably 30 or less, laser processing may be performed as it is. For example, when the organic sulfur compound is added to the electroless copper plating solution, the brightness (L value) of the surface of the deposited copper thin film is 40 or less, so that laser processing can be performed as it is. Here, examples of the organic sulfur compound include thiols such as 2-mercaptobenzimidazole, disulfides such as dimethyldisulfide, sulfides such as 1,2-bis (2-hydroxyethylthio) ethane, thioacetone, thiourea and the like. Examples thereof include thioketones, sulfoniums such as 1-ethylthiazolium chloride, and sulfolanes such as sulfolane, and one or more of these can be used. The brightness (L value) of the electroless plating surface is 40
When the value exceeds L, the surface of the metal thin film 2 of the substrate molded product 1 (FIG. 2) having the metal thin film 2 formed on the surface thereof has the lightness (L value).
It may be changed to a dark color so that the value becomes 40 or less (Fig. 3). The lightness in the present invention means L measured by a color difference meter.
It is a value. As a method for changing the lightness (L value) of the surface of the metal thin film to 40 or less, a chemical reaction is suitable, specifically, a known method such as oxidation or sulfurization, and any method suitable for the metal. For example, in the case of a copper thin film, a method of forming a dark oxide on the thin film surface by oxidation by heating is simple and suitable. Further, the setting of the heating temperature here is important, and the metal thin film 2 is less likely to be oxidized at a low temperature, and conversely, at a high temperature, a defect such as deformation of the base resin molded product occurs, which is not preferable. From this point of view, when the metal thin film is oxidized by heating, the heating temperature is 100 to 200 ° C., preferably 140 to 200 ° C., and the heating time is 0.5 to 3 hours.

【0006】通常、金属と合成樹脂とのレーザーによる
加工性は、合成樹脂のほうがより低い出力のレーザーで
加工されるので、下地部分の合成樹脂の損傷を防ぐため
に、できるだけ低い出力のレーザーで加工する必要があ
る。本発明は、色差計での明度(L値)を40以下にすれ
ば、金属薄膜に対するレーザー光の吸収が多くなり、合
成樹脂の損傷がない低い出力のレーザーで不必要な部分
の金属薄膜を完全に除去し、短絡しない導電回路を形成
できることを見出したのである。つまり、色差計での明
度(L値)が40より大きくなると、金属薄膜に対するレ
ーザー光の吸収が悪くなり、高い出力のレーザーで加工
しなければならないため金属薄膜を除去する際に下地の
合成樹脂を炭化させる等の不具合が発生する場合があ
り、好ましくないのである。
Generally, regarding the processability of the metal and the synthetic resin by the laser, since the synthetic resin is processed by the laser having a lower output, the laser is processed by the laser with the lowest possible output in order to prevent the synthetic resin from being damaged. There is a need to. According to the present invention, when the lightness (L value) in the color difference meter is set to 40 or less, the absorption of the laser light to the metal thin film is increased, and the metal thin film of the unnecessary part is not damaged by the low output laser which does not damage the synthetic resin. It has been found that a conductive circuit that can be completely removed and that does not short-circuit can be formed. In other words, when the lightness (L value) in the color difference meter is greater than 40, the absorption of the laser light to the metal thin film deteriorates, and it is necessary to process with a high-power laser, so when removing the metal thin film, the underlying synthetic resin This is not preferable because problems such as carbonization may occur.

【0007】次に、表面の明度(L値)が40以下の金属
薄膜が形成された成形品(図3)について、導電回路部
分以外の不要部分に出力を適宜調節したレーザー光4を
照射することにより、この部分の金属薄膜2だけを選択
的に飛散除去し、金属薄膜2の導電回路パターン5を形
成する(図4)。ここで、照射するレーザー光4は、化
学反応した金属薄膜を除去することのできるレーザーで
あれば如何なるものでもよいが、金属薄膜の除去性能を
考慮すると、赤外領域の波長を有するYAGレーザー、
炭酸ガスレーザーなどが好ましい。かかるレーザーは、
予め設定された回路パターンを、コンピュータによって
制御されたXY方向のスキャン機構を有するレーザーマ
ーカーにより選択的に照射する。また、複雑な立体成形
品に回路を形成する必要のある場合には、レーザー光4
を光ファイバ、プリズム等により立体的な方向に導き、
コンピュータ制御により所定の領域を正確に照射するこ
とができる。またはXY方向のスキャン機構を有するレ
ーザーマーカーとコンピュータにより同調して動くXY
Z方向、回転、傾斜の5軸のテーブルを組み合せること
によっても立体的に照射することができる。また、この
方法によれば、パターンの作成及び修正等は、レーザー
照射域の描画プログラムを変更するだけで簡単に行える
利点を有する。
Next, with respect to the molded product (FIG. 3) on which the metal thin film having the surface brightness (L value) of 40 or less is formed, the unnecessary portion other than the conductive circuit portion is irradiated with the laser beam 4 whose output is appropriately adjusted. As a result, only the metal thin film 2 in this portion is selectively scattered and removed to form the conductive circuit pattern 5 of the metal thin film 2 (FIG. 4). Here, the laser light 4 to be irradiated may be any laser as long as it can remove the chemically reacted metal thin film, but in consideration of the removal performance of the metal thin film, a YAG laser having a wavelength in the infrared region,
Carbon dioxide gas laser and the like are preferable. Such lasers
A preset circuit pattern is selectively irradiated by a laser marker having a scanning mechanism in XY directions controlled by a computer. If it is necessary to form a circuit on a complicated three-dimensional molded product, laser light 4
The optical fiber, prism, etc.
It is possible to accurately irradiate a predetermined area by computer control. Alternatively, an XY that moves in synchronization with a computer with a laser marker having an XY scanning mechanism.
It is also possible to irradiate three-dimensionally by combining a 5-axis table of Z direction, rotation, and inclination. Further, according to this method, the creation and modification of the pattern can be easily performed only by changing the drawing program in the laser irradiation area.

【0008】その後、表面の明度(L値)が40以下の金
属薄膜2の不要な部分を除去して形成した回路パターン
5の導電回路部分に、更に電気メッキを施し、所望の厚
さ(例えば、10〜100 μm)に金属層を付加して目的と
する導電回路6を形成する(図5)。金属層は、10μm
以上の厚さであれば、導電性の点、あるいは使用中の摩
擦等による損傷断線等の問題もなく、また必要以上に厚
くする必要もないので厚くても100 μm程度で良い。
尚、表面を酸化物などの化合物3により明度(L値)40
以下とした金属薄膜2では、特にその上に形成する電気
メッキによる金属層6の密着性が良くないことから、電
気メッキで金属層6を形成する為の前処理として、金属
薄膜表面層を除去した方が望ましい。その方法として
は、公知の如何なる方法を用いても構わないが、成形品
を塩酸、硫酸等の酸に浸漬し該表面層を溶解除去する方
法が簡便である。
After that, the conductive circuit portion of the circuit pattern 5 formed by removing the unnecessary portion of the metal thin film 2 whose surface brightness (L value) is 40 or less is further electroplated to a desired thickness (eg, , 10-100 μm) to form a target conductive circuit 6 (FIG. 5). The metal layer is 10 μm
With the above thickness, there is no problem in terms of conductivity or damage such as breakage due to friction during use, and since it is not necessary to make the thickness more than necessary, the thickness may be about 100 μm.
In addition, the brightness (L value) of the surface of compound 3 such as oxide is 40
In the metal thin film 2 described below, the adhesion of the metal layer 6 formed by electroplating on the metal thin film 2 is not good. Therefore, the metal thin film surface layer is removed as a pretreatment for forming the metal layer 6 by electroplating. It is better to do. As the method, any known method may be used, but a method of immersing the molded product in an acid such as hydrochloric acid or sulfuric acid to dissolve and remove the surface layer is convenient.

【0009】[0009]

【発明の効果】本発明によれば、レーザー光を使用する
ことに起因する、合成樹脂成形品の損傷による外観、形
状、絶縁性等に対する弊害を避けることができ、また、
金属薄膜の厚さのばらつきによる金属薄膜の残留がなく
なるため、導電回路の短絡がなく、加工条件幅が広くな
るため量産性に優れ、簡便な方法で所望の厚さの正確な
導電回路を有する導電回路部品を得ることができ、経済
的にも有利である。
EFFECTS OF THE INVENTION According to the present invention, it is possible to avoid the adverse effects on the appearance, shape, insulating property, etc. due to the damage of the synthetic resin molded product due to the use of laser light.
Since the metal thin film does not remain due to the variation in the thickness of the metal thin film, there is no short circuit of the conductive circuit, and the range of processing conditions is wide, resulting in excellent mass productivity and having a precise conductive circuit of the desired thickness with a simple method. A conductive circuit component can be obtained, which is economically advantageous.

【0010】[0010]

【実施例】以下、図を参照して本発明の実施例を示す
が、本発明はこれに限定されるものではない。尚、明度
(L値)は、色差計(日本電色工業(株)製「Z-300
A」)により、30φの投光レンズを用いて、外光の影響
を受けないようにして、成形品のメッキ表面を測定する
ことにより得た値である。 実施例1 液晶性ポリエステル(商品名「ベクトラ」、ポリプラス
チックス(株)製)を主体とする金属密着性(メッキ
性)樹脂組成物を用いて射出成形により立体的な成形品
1を作成した(図1)。次いでこれを脱脂し、KOH水
溶液にてその表面のほぼ全面をエッチング処理した後、
HCl水溶液にて中和、洗浄後、触媒を付与して表面を
活性化し後、化学銅メッキ液(奥野製薬工業(株)製O
PC−750、A液、B液及びC液の混合溶液)に浸漬
して、表面に厚さ0.3 μmの化学銅メッキの金属薄膜2
を形成し、よく洗浄した後、乾燥した(図2)。次に、
この表面を化学銅メッキした成形品(図2)を、120 ℃
で1時間加熱したところ、化学銅メッキ表面が化学反応
を起こし暗褐色の酸化物3に変化した(図3)。この表
面の明度(L値)は26.23 であった。次いで、この化学
銅メッキ表面を変色させた成形品に、レーザー出力が0.
4 WのYAGレーザー光4を照射して、導電回路部分以
外の不要部分の化学銅メッキを除去することにより、導
電回路パターン5を形成した(図4)。その後、この導
電回路パターン5を形成した成形品を、5%硫酸水溶液
に浸漬し、表面の変色した酸化物を溶解除去した後、導
電回路パターン部分に、厚さ10μmの電気銅メッキを施
し、洗浄後、乾燥し、正確で立体的な導電回路部分6を
有する回路形成品(図5)を得た。上記の工程で50個の
回路形成品を製造し、その良品率を測定した結果を表1
に示す。
EXAMPLES Examples of the present invention will now be described with reference to the drawings, but the present invention is not limited thereto. In addition, the brightness (L value) is measured by a color difference meter (“Z-300” manufactured by Nippon Denshoku Industries Co., Ltd.).
A)) is a value obtained by measuring the plating surface of a molded product using a 30φ projection lens so as not to be affected by external light. Example 1 A three-dimensional molded article 1 was prepared by injection molding using a metal adhesive (plating) resin composition mainly composed of liquid crystalline polyester (trade name "Vectra", manufactured by Polyplastics Co., Ltd.). (Figure 1). Next, this is degreased, and after etching the almost entire surface with a KOH aqueous solution,
After neutralization and washing with an aqueous HCl solution, a catalyst is applied to activate the surface, and then a chemical copper plating solution (Okuno Pharmaceutical Co., Ltd. O
It is dipped in PC-750, a mixed solution of solution A, solution B and solution C), and a metal thin film 2 of 0.3 μm thick is formed on the surface by chemical copper plating.
Was formed, washed well, and then dried (FIG. 2). next,
A molded product (Fig. 2) whose surface is chemically copper-plated at 120 ° C
When heated for 1 hour, the chemical copper plating surface changed to dark brown oxide 3 due to a chemical reaction (FIG. 3). The brightness (L value) of this surface was 26.23. Then, the laser output is 0.
A conductive circuit pattern 5 was formed by irradiating 4 W of YAG laser light 4 to remove unnecessary chemical copper plating other than the conductive circuit part (FIG. 4). After that, the molded product having the conductive circuit pattern 5 formed thereon is dipped in a 5% aqueous solution of sulfuric acid to dissolve and remove the discolored oxide on the surface, and then the conductive circuit pattern portion is subjected to electrolytic copper plating with a thickness of 10 μm. After washing, it was dried to obtain a circuit-formed product (FIG. 5) having an accurate and three-dimensional conductive circuit portion 6. Table 1 shows the results of measuring the yield rate of 50 circuit-formed products manufactured in the above process.
Shown in

【0011】実施例2〜8、比較例1〜6 金属薄膜の厚さ、金属薄膜表面に暗色の化合物(酸化
物)を形成する際の加熱温度と、その結果形成された成
形品の表面の明度、導電回路部分以外の不要部分を除去
する際のレーザー光のレーザー出力を、それぞれ表1に
示すよう変えた以外は実施例1と同様にして回路形成品
を製造し、同様の測定を行った。結果を表1に示す。
Examples 2 to 8 and Comparative Examples 1 to 6 The thickness of the metal thin film, the heating temperature for forming a dark-colored compound (oxide) on the surface of the metal thin film, and the surface temperature of the molded article formed as a result. A circuit-formed article was manufactured in the same manner as in Example 1 except that the laser output of the laser light for removing unnecessary portions other than the brightness and the conductive circuit portion was changed as shown in Table 1, and the same measurement was performed. It was Table 1 shows the results.

【0012】[0012]

【表1】 [Table 1]

【0013】実施例9 液晶性ポリエステル(商品名「ベクトラ」、ポリプラス
チックス(株)製)を主体とする金属密着性(メッキ
性)樹脂組成物を用いて射出成形により立体的な成形品
1を作成した(図1)。次いでこれを脱脂し、KOH水
溶液にてその表面のほぼ全面をエッチング処理した後、
HCl水溶液にて中和、洗浄後、触媒を付与して表面を
活性化し後、奥野製薬工業(株)製の無電解化学銅メッ
キ液OPC−750のA液及びB液の混合溶液にチオ尿
素6ppmを配合した化学銅メッキ液に浸漬して、表面
に厚さ0.5 μmの化学銅メッキの金属薄膜2を形成し、
よく洗浄した後、乾燥した(図2)。この表面の明度
(L値)は23.76 であった。次いで、この化学銅メッキ
を形成した成形品に、レーザー出力が0.7 WのYAGレ
ーザー光4を照射して、導電回路部分以外の不要部分の
化学銅メッキを除去することにより、導電回路パターン
5を形成した(図4)。その後、この導電回路パターン
5を形成した成形品の導電回路パターン部分に、厚さ10
μmの電気銅メッキを施し、洗浄後、乾燥し、正確で立
体的な導電回路部分6を有する回路形成品(図5)を得
た。上記の工程で50個の回路形成品を製造し、その良品
率を測定した結果を表2に示す。 実施例10 金属薄膜の厚さを変えた以外は実施例9と同様にして回
路形成品を製造し、同様の測定を行った。結果を表2に
示す。
Example 9 Three-dimensional molded article 1 by injection molding using a metal adhesive (plating) resin composition mainly composed of liquid crystalline polyester (trade name "Vectra", manufactured by Polyplastics Co., Ltd.) Was created (Fig. 1). Next, this is degreased, and after etching the almost entire surface with a KOH aqueous solution,
After neutralizing and washing with an aqueous HCl solution, a catalyst is applied to activate the surface, and then thiourea is added to a mixed solution of the electroless chemical copper plating solution OPC-750 manufactured by Okuno Chemical Industries Co., Ltd. Immersion in a chemical copper plating solution containing 6 ppm to form a 0.5 μm-thick chemical copper plating metal thin film 2 on the surface,
After thorough washing, it was dried (Fig. 2). The brightness (L value) of this surface was 23.76. Then, the molded product on which the chemical copper plating is formed is irradiated with YAG laser light 4 having a laser output of 0.7 W to remove the chemical copper plating on unnecessary portions other than the conductive circuit portion, thereby forming the conductive circuit pattern 5. Formed (FIG. 4). After that, a thickness of 10 is formed on the conductive circuit pattern portion of the molded product on which the conductive circuit pattern 5 is formed.
A circuit-formed product (FIG. 5) having an accurate and three-dimensional conductive circuit portion 6 was obtained by applying electrolytic copper plating of μm, washing and drying. Table 2 shows the results of measuring 50 non-defective products by manufacturing 50 circuit-formed products in the above process. Example 10 A circuit formed article was manufactured in the same manner as in Example 9 except that the thickness of the metal thin film was changed, and the same measurement was performed. Table 2 shows the results.

【0014】[0014]

【表2】 [Table 2]

【図面の簡単な説明】[Brief description of the drawings]

【図1】図1は、本発明の一例として立体回路成形部品
となる基体成形品の斜視図である。
FIG. 1 is a perspective view of a base molded product that is a molded product of a three-dimensional circuit as an example of the present invention.

【図2】図2は、図1に示す基体成形品の表面に化学銅
メッキを施し、銅薄膜を形成した状態を示す斜視図であ
る。
FIG. 2 is a perspective view showing a state where a copper thin film is formed by performing chemical copper plating on the surface of the base molded article shown in FIG.

【図3】図3は、図2に示す銅薄膜を形成した成形品を
加熱し、銅薄膜表面に明度(L値)が40以下の酸化物を
形成させた状態を示す斜視図である。
FIG. 3 is a perspective view showing a state in which a molded product having the copper thin film shown in FIG. 2 is heated to form an oxide having a lightness (L value) of 40 or less on the surface of the copper thin film.

【図4】図4は、成形品の導電回路部分以外の銅薄膜を
YAGレーザーにより除去し、導電回路パターンを形成
した状態を示す斜視図である。
FIG. 4 is a perspective view showing a state in which a copper thin film other than a conductive circuit portion of a molded product is removed by a YAG laser to form a conductive circuit pattern.

【図5】図5は、図4に示す導電回路パターンを形成し
た成形品の導電回路部分に電気銅メッキを施し、回路を
形成した状態を示す斜視図である。
5 is a perspective view showing a state in which a circuit is formed by performing electrolytic copper plating on a conductive circuit portion of a molded product on which the conductive circuit pattern shown in FIG. 4 is formed.

【符号の説明】[Explanation of symbols]

1・・・基体成形品 2・・・化学金属メッキによる金属薄膜 3・・・明度(L値)が40以下に変化した金属 4・・・レーザー光 5・・・レーザー光により形成された導電回路パターン 6・・・電気銅メッキにより形成された導電回路 1 ... Base molded product 2 ... Metal thin film by chemical metal plating 3 ... Metal whose lightness (L value) is changed to 40 or less 4 ... Laser light 5 ... Conductivity formed by laser light Circuit pattern 6 ... Conductive circuit formed by electrolytic copper plating

Claims (11)

【特許請求の範囲】[Claims] 【請求項1】 合成樹脂成形品表面に形成した金属薄膜
をレーザー光により除去して回路形成を行う方法におい
て、表面の明度(L値)が40以下である金属薄膜を用
い、レーザー加工を行うことを特徴とするレーザーによ
る回路形成方法。
1. A method for removing a metal thin film formed on the surface of a synthetic resin molded article by laser light to form a circuit, using a metal thin film having a surface brightness (L value) of 40 or less to perform laser processing. A method for forming a circuit using a laser, characterized in that
【請求項2】 合成樹脂成形品表面に形成した金属薄膜
をレーザー光により除去して回路形成を行う方法におい
て、金属薄膜の表面の明度(L値)を40以下にした後、
レーザー加工を行うことを特徴とするレーザーによる回
路形成方法。
2. A method of forming a circuit by removing a metal thin film formed on the surface of a synthetic resin molded product by laser light, after setting the lightness (L value) of the surface of the metal thin film to 40 or less,
A method for forming a circuit using a laser, which comprises performing laser processing.
【請求項3】 金属薄膜の表面を、100 〜200 ℃の温度
で0.5 〜3時間加熱して明度(L値)を40以下に変化さ
せることを特徴とする請求項2記載の回路形成方法。
3. The circuit forming method according to claim 2, wherein the surface of the metal thin film is heated at a temperature of 100 to 200 ° C. for 0.5 to 3 hours to change the lightness (L value) to 40 or less.
【請求項4】 金属薄膜が銅からなることを特徴とする
請求項1〜3の何れか1項記載の回路形成方法。
4. The circuit forming method according to claim 1, wherein the metal thin film is made of copper.
【請求項5】 レーザー加工した後、金属薄膜表面を酸
で処理することを特徴とする請求項1〜4の何れか1項
記載の回路形成方法。
5. The circuit forming method according to claim 1, wherein the metal thin film surface is treated with an acid after laser processing.
【請求項6】 表面の明度(L値)が40以下である金属
薄膜が、有機イオウ化合物を含有する無電解銅メッキ液
から得られた銅薄膜であることを特徴とする請求項1記
載の回路形成方法。
6. The metal thin film having a brightness (L value) of 40 or less on the surface is a copper thin film obtained from an electroless copper plating solution containing an organic sulfur compound. Circuit forming method.
【請求項7】 有機イオウ化合物が、チオール類、ジス
ルフィド類、スルフィド類、チオケトン類、スルホニウ
ム類、スルホラン類より選ばれた1種又は2種以上であ
る請求項6記載の回路形成方法。
7. The circuit forming method according to claim 6, wherein the organic sulfur compound is one or more selected from thiols, disulfides, sulfides, thioketones, sulfoniums and sulfolanes.
【請求項8】 合成樹脂成形品が、熱変形温度が200 ℃
以上のものであることを特徴とする請求項1〜7の何れ
か1項記載の回路形成方法。
8. A synthetic resin molded product has a heat distortion temperature of 200 ° C.
The circuit forming method according to any one of claims 1 to 7, which is the above.
【請求項9】 合成樹脂成形品が、ポリエーテルサルフ
ォン、ポリエーテルイミド、液晶性ポリエステル、ポリ
エステルアミド、ポリフェニレンサルファイド、ポリサ
ルフォン及びこれらの組成物を用いて形成されたもので
あることを特徴とする請求項1〜8の何れか1項記載の
回路形成方法。
9. A synthetic resin molded article is formed by using polyether sulfone, polyether imide, liquid crystalline polyester, polyester amide, polyphenylene sulfide, polysulfone, and compositions thereof. The circuit forming method according to claim 1.
【請求項10】 YAGレーザーによりレーザー加工す
ることを特徴とする請求項1〜9の何れか1項記載の回
路形成方法。
10. The circuit forming method according to claim 1, wherein laser processing is performed with a YAG laser.
【請求項11】 合成樹脂成形品が立体的形状であるこ
とを特徴とする請求項1〜10の何れか1項記載の回路
形成方法。
11. The circuit forming method according to claim 1, wherein the synthetic resin molded product has a three-dimensional shape.
JP19345096A 1995-07-28 1996-07-23 Circuit formation method using laser Expired - Fee Related JP3770968B2 (en)

Priority Applications (1)

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Application Number Priority Date Filing Date Title
JP7-192877 1995-07-28
JP19287795 1995-07-28
JP19345096A JP3770968B2 (en) 1995-07-28 1996-07-23 Circuit formation method using laser

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2016213357A (en) * 2015-05-11 2016-12-15 アルプス電気株式会社 Manufacturing method of wiring structure, and wiring structure manufactured by the manufacturing method
KR20180032413A (en) * 2016-09-22 2018-03-30 주식회사 엘지화학 Composition and method for forming conductive pattern by irradiation of electromagnetic wave

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2016213357A (en) * 2015-05-11 2016-12-15 アルプス電気株式会社 Manufacturing method of wiring structure, and wiring structure manufactured by the manufacturing method
KR20180032413A (en) * 2016-09-22 2018-03-30 주식회사 엘지화학 Composition and method for forming conductive pattern by irradiation of electromagnetic wave

Also Published As

Publication number Publication date
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