JPH06164105A - Method for forming conductive circuit on surface of molded item and part with conductive circuit formed thereon - Google Patents

Method for forming conductive circuit on surface of molded item and part with conductive circuit formed thereon

Info

Publication number
JPH06164105A
JPH06164105A JP4310023A JP31002392A JPH06164105A JP H06164105 A JPH06164105 A JP H06164105A JP 4310023 A JP4310023 A JP 4310023A JP 31002392 A JP31002392 A JP 31002392A JP H06164105 A JPH06164105 A JP H06164105A
Authority
JP
Japan
Prior art keywords
circuit
thin film
conductive circuit
molded product
forming
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP4310023A
Other languages
Japanese (ja)
Other versions
JP2965803B2 (en
Inventor
Takayuki Miyashita
貴之 宮下
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Polyplastics Co Ltd
Original Assignee
Polyplastics Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Polyplastics Co Ltd filed Critical Polyplastics Co Ltd
Priority to JP4310023A priority Critical patent/JP2965803B2/en
Priority to EP94915265A priority patent/EP0711102B1/en
Priority to PCT/JP1994/000799 priority patent/WO1995031884A1/en
Publication of JPH06164105A publication Critical patent/JPH06164105A/en
Application granted granted Critical
Publication of JP2965803B2 publication Critical patent/JP2965803B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/02Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
    • H05K3/027Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed by irradiation, e.g. by photons, alpha or beta particles
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • H05K1/0284Details of three-dimensional rigid printed circuit boards
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/10Using electric, magnetic and electromagnetic fields; Using laser light
    • H05K2203/107Using laser light
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/10Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
    • H05K3/108Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern by semi-additive methods; masks therefor
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/10Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
    • H05K3/18Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material
    • H05K3/181Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material by electroless plating

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Manufacturing Of Printed Wiring (AREA)

Abstract

PURPOSE:To provide a molded part having a desired thickness conductive circuit by forming a specific thickness metal thin film on the surface of a synthetic resin molded product and directing a laser beam to a part of the thin film to remove a metal thin film in the other part than a conductor circuit part and then applying electroplating to the metal thin film of a circuit pattern. CONSTITUTION:After activating the surface of a metal adhesive molded product, it is dipped into chemical copper plating solution to apply chemical copper plating to its surface by 0.2 to 2mum thick and clean and dry it. Next, its surface is exposed to a laser beam and a copper thin film in the other part then a circuit forming part is removed, thereby forming a circuit pattern 3. Next, electroplating is applied to the molded product in which the circuit pattern is formed to obtain a product with a circuit formed having a conductive circuit 4 in which a copper film in the circuit part has a desired thickness.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、合成樹脂成形品の表面
に導電回路を形成する方法に関し、電気・電子機器等の
分野で回路部品として使用される、表面に正確な導電回
路を有する成形品を、効率よく製造する方法に関するも
のである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for forming a conductive circuit on the surface of a synthetic resin molded product, which is used as a circuit component in the field of electric and electronic equipment and has a precise conductive circuit on the surface. The present invention relates to a method for efficiently manufacturing a product.

【0002】[0002]

【従来の技術及び発明が解決しようとする課題】従来、
合成樹脂製成形品の表面に回路を形成する方法として
は、例えばメッキ性の異なる2種の材料を用いて二重成
形して、回路形成部と他の部分とのメッキ性の差を利用
して回路部を選択的にメッキ加工し、金属回路を形成す
るSKW法、またはPCK法などがあるが、これらの方
法は2回の成形工程が必要なため、煩雑、不経済である
ばかりでなく、2種の樹脂界面の密着性を良くすること
が困難で、例えばメッキ液の浸入、残留等による問題を
生じる場合がある。一方、従来のフォトレジストを用い
る回路形成法では、レジストの塗布、回路パターン露
光、パターン現像、銅エッチング、レジスト剥離という
多くの工程があり、煩雑であるのみならず、立体形状の
成形品の表面に立体的な導電回路を形成しようとする場
合には、平行光による投影露光によりある程度の回路は
形成できるが、精度上問題があり、又基板の立体形状に
よっては限界がある。また、近年、レーザー光線を用い
た回路形成法が開発されつつあり、例えば成形品の表面
に予め導電回路として充分な厚さの金属膜を形成し、導
電回路以外の部分の金属膜をレーザー光線により飛散除
去して、そのまま導電回路とする方法が考えられ、この
方法によれば二重成形やレジスト使用の必要がなく、極
めて簡単であるが、この方法では導体金属層の厚さを回
路としての導電性が充分な比較的厚い層(例えば10μm
以上)とする必要があり、レーザー光にて金属層の不要
部を除去する場合にレーザー光の出力を高くする必要が
あるため、下地の合成樹脂成形品まで損傷してその外観
形状を著しく阻害し、又、合成樹脂を炭化させて絶縁性
に支障を生じる等の問題がある。
2. Description of the Related Art Conventionally, the problems to be solved by the invention
As a method of forming a circuit on the surface of a synthetic resin molded product, for example, double molding is performed using two kinds of materials having different plating properties, and the difference in plating property between the circuit forming part and other parts is used. There is a SKW method or a PCK method in which a circuit part is selectively plated to form a metal circuit. However, since these methods require two molding steps, they are not only complicated and uneconomical. It is difficult to improve the adhesiveness of the interface between the two kinds of resins, which may cause a problem due to, for example, invasion of the plating solution or residual. On the other hand, in the conventional circuit forming method using a photoresist, there are many steps such as resist coating, circuit pattern exposure, pattern development, copper etching, and resist stripping, which is not only complicated but also the surface of a three-dimensional molded product. When a three-dimensional conductive circuit is to be formed, a certain degree of circuit can be formed by projection exposure with parallel light, but there is a problem in accuracy, and there is a limit depending on the three-dimensional shape of the substrate. Further, in recent years, a circuit forming method using a laser beam is being developed. For example, a metal film having a sufficient thickness as a conductive circuit is previously formed on the surface of a molded product, and the metal film other than the conductive circuit is scattered by the laser beam. A method is conceivable in which the conductive circuit is removed and used as it is. This method does not require double molding or use of a resist and is extremely simple. However, in this method, the thickness of the conductive metal layer is used as a conductive circuit. A relatively thick layer (eg 10 μm)
Above), and when the unnecessary portion of the metal layer is removed by laser light, it is necessary to increase the output of laser light, so that the synthetic resin molding of the base is damaged and the appearance shape is significantly impaired. In addition, there is a problem in that the synthetic resin is carbonized to impair the insulating property.

【0003】[0003]

【課題を解決するための手段】本発明者等は、これら従
来法の問題を解決し、簡便な方法で複雑な形状の成形品
にも精度良く回路を形成する方法、特にレーザー光を利
用して導電回路を形成する方法に関し、上記問題を解決
すべく詳細に検討した結果、合成樹脂成形品表面に予め
付与する金属層を特定の厚さ以下としてレーザー光を照
射することにより、レーザー光の出力を下げて不要金属
層を選択的に除去し、下地樹脂に損傷を与えることなく
回路パターンが形成でき、しかる後そのパターン上に電
気メッキにより所望の厚さの金属層を付与することによ
り外観、形状、絶縁性等を損なうことなく比較的簡単に
所望の導電回路を形成し得ることを見出し、本発明に到
達した。即ち本発明は、合成樹脂成形品の表面に導電性
回路を形成するにあたり、金属被覆可能な合成樹脂成形
品の表面に予め化学メッキ、スパッタリング、真空蒸
着、イオンプレーティング、転写法又は導電剤塗装の何
れかの方法により金属被覆加工を行って厚さが0.2 〜2
μm の金属薄膜を形成し、次いで該薄膜表面の一部にレ
ーザー光を照射して、導電回路部となる部分の金属薄膜
を残し、導電回路部以外の部分の金属薄膜を除去するこ
とにより金属薄膜の回路パターンを形成した後、更に該
回路パターンの金属薄膜上に電気メッキを行って所望の
厚さの導電回路を形成することを特徴とする成形品の表
面に導電性回路を形成する方法、及び上記方法により製
造された導電回路形成部品である。
The inventors of the present invention have solved the problems of these conventional methods, and have utilized a method for forming a circuit with high precision even in a molded product having a complicated shape by a simple method, particularly using laser light. Regarding the method of forming a conductive circuit by a detailed examination to solve the above problems, as a result of irradiating a laser beam with a metal layer which is previously applied to the surface of the synthetic resin molded article to a specific thickness or less, By lowering the output and selectively removing the unnecessary metal layer, a circuit pattern can be formed without damaging the underlying resin.After that, a metal layer of the desired thickness is applied by electroplating on the pattern to give an appearance. The inventors have found that a desired conductive circuit can be formed relatively easily without impairing the shape, the insulating property, etc., and have reached the present invention. That is, in the present invention, in forming a conductive circuit on the surface of a synthetic resin molded product, chemical plating, sputtering, vacuum deposition, ion plating, transfer method or conductive agent coating is previously performed on the surface of the synthetic resin molded product capable of metal coating. The thickness is 0.2 to 2 after metal coating by any of
By forming a metal thin film of μm, and then irradiating a part of the surface of the thin film with laser light, leaving the metal thin film in the part that becomes the conductive circuit part, and removing the metal thin film in the part other than the conductive circuit part A method for forming a conductive circuit on the surface of a molded article, which comprises forming a thin film circuit pattern and then performing electroplating on the metal thin film of the circuit pattern to form a conductive circuit having a desired thickness. And a conductive circuit forming component manufactured by the above method.

【0004】以下、図を参照し、順を追って本発明の方
法を説明する。本発明で用いる基体成形品の材質は、金
属薄膜を強固に付着することのできる合成樹脂材料であ
れば、熱可塑性樹脂、熱硬化性樹脂の何れでも良いが、
かかる成形品が後にハンダ付加工等の苛酷な処理を受け
ることを考慮すると、耐熱性が高く、かつ機械的強度の
優れたものが望ましく、また多量生産の点では射出成形
の可能な熱可塑性樹脂が好ましい。その例を挙げれば、
芳香族ポリエステル、ポリアミド、ポリアセタール、ポ
リフェニレンサルファイド、ポリサルホン、ポリフェニ
レンオキサイド、ポリイミド、ポリエーテルケトン、ポ
リアリレート及びこれらの組成物等が挙げられ、特に高
融点、高強度、高剛性、成形加工性等の観点から液晶性
ポリマー(例えば液晶性ポリエステル、ポリエステルア
ミド)、ポリアリーレンサルファイドは特に好適である
がこれらに限定されるものではない。また、金属薄膜の
密着性を高めるため、必要に応じその材料に適当な物質
を配合しても良い。基体成形品(図1)は、射出成形等
により成形され、その表面の金属薄膜の密着性を良くす
るため、更に酸、アルカリその他による化学的エッチン
グ、或いはコロナ放電、プラズマ処理等の物理的表面処
理を行っても良い。
The method of the present invention will be described step by step with reference to the drawings. The material of the base molded product used in the present invention may be either a thermoplastic resin or a thermosetting resin as long as it is a synthetic resin material capable of firmly adhering a metal thin film,
Considering that such a molded product is later subjected to severe processing such as soldering, it is desirable that the molded product has high heat resistance and excellent mechanical strength, and in terms of mass production, a thermoplastic resin that can be injection molded. Is preferred. For example,
Aromatic polyesters, polyamides, polyacetals, polyphenylene sulfides, polysulfones, polyphenylene oxides, polyimides, polyether ketones, polyarylates and compositions thereof, and the like, particularly high melting point, high strength, high rigidity, molding processability, etc. Therefore, liquid crystalline polymers (for example, liquid crystalline polyester, polyester amide) and polyarylene sulfide are particularly preferable, but not limited thereto. Moreover, in order to enhance the adhesion of the metal thin film, an appropriate substance may be added to the material, if necessary. The base molded product (Fig. 1) is formed by injection molding or the like, and in order to improve the adhesion of the metal thin film on its surface, chemical etching with acid, alkali, etc., or physical surface such as corona discharge, plasma treatment, etc. Processing may be performed.

【0005】次にこの成形品の表面に金属被覆加工を行
い、金属薄膜を形成する(図2)。ここで付与する金属
薄膜の厚さは特に重要であり、厚すぎると次工程におけ
るレーザー光線による回路パターン形成に強い出力のレ
ーザー光を要し、先に述べたように基体成形品に損傷を
生じさせるため好ましくない。また、逆に薄すぎると最
終工程において更に電気メッキにより導電性回路として
充分な厚さの金属層を形成する際の電気メッキの加工性
に支障を生じ好ましくない。かかる見地から基体成形品
の表面に付与される金属薄膜の厚さは0.2 〜2μm であ
り、好ましくは0.3 〜1μm である。かかる範囲の厚さ
であればレーザー光線による回路パターン形成が比較的
弱い出力で基体成形品に損傷を生じることなく正確に行
うことができ、また最終的な回路形成のため電気メッキ
加工に必要な程度の導電性は保たれるので好適である。
かかる金属薄膜を形成する方法としては、化学メッキ、
スパッタリング、真空蒸着、イオンプレーティング、転
写法、導電剤塗装等、従来公知の何れの方法でも良い
が、均一な金属薄膜を形成するためには化学メッキ(無
電解メッキ)、スパッタリング、イオンプレーティン
グ、真空蒸着が適当である。
Next, a metal coating process is performed on the surface of this molded product to form a metal thin film (FIG. 2). The thickness of the metal thin film provided here is particularly important. If it is too thick, a laser beam with a strong output is required for forming a circuit pattern by a laser beam in the next step, which causes damage to the base molded article as described above. Therefore, it is not preferable. On the other hand, if it is too thin, the workability of electroplating when forming a metal layer having a sufficient thickness as a conductive circuit by electroplating in the final step is not preferable. From this point of view, the thickness of the metal thin film applied to the surface of the base molded article is 0.2 to 2 μm, preferably 0.3 to 1 μm. If the thickness is within such a range, the circuit pattern formation by the laser beam can be accurately performed with a comparatively weak output without causing damage to the base molded product, and to the extent necessary for electroplating for the final circuit formation. Is preferable because it maintains the conductivity.
As a method for forming such a metal thin film, chemical plating,
Any conventionally known method such as sputtering, vacuum deposition, ion plating, transfer method, conductive agent coating, etc. may be used, but chemical plating (electroless plating), sputtering, ion plating is required to form a uniform metal thin film. Vacuum deposition is suitable.

【0006】次に表面に金属薄膜を形成した成形品(図
2)について、回路形成部以外の部分に出力を適宜調節
したレーザー光を照射することによりこの部分の金属薄
膜を選択的に飛散除去し、金属薄膜の回路パターンを形
成する(図3)。照射するレーザー光はYAGレーザ
ー、炭酸ガスレーザー等、赤外領域の波長を有し、予め
設定された回路パターンを、コンピュータによって制御
されたXY方向のスキャン機構を有するレーザーマーカ
ーにより選択的に照射する。また、複雑な立体成形品に
回路を形成する必要のある場合には、レーザー光を光フ
ァイバ、プリズム等により立体的な方向に導き、コンピ
ュータ制御により立体的に所定の領域を正確に照射する
ことができる。また、この方法によれば、パターンの作
成及び修正等はレーザー照射域の描画プログラムの変更
だけで簡単に行える利点を有する。
Next, with respect to the molded product having a metal thin film formed on its surface (FIG. 2), the metal thin film in this portion is selectively scattered and removed by irradiating the portion other than the circuit forming portion with laser light whose output is appropriately adjusted. Then, a circuit pattern of the metal thin film is formed (FIG. 3). The laser light to be emitted has a wavelength in the infrared region such as a YAG laser or a carbon dioxide gas laser, and a predetermined circuit pattern is selectively emitted by a laser marker having an XY scanning mechanism controlled by a computer. . Also, when it is necessary to form a circuit in a complicated three-dimensional molded product, laser light should be guided in a three-dimensional direction by an optical fiber, prism, etc., and computer-controlled to accurately irradiate a predetermined area three-dimensionally. You can Further, according to this method, the creation and modification of the pattern can be easily performed only by changing the drawing program in the laser irradiation area.

【0007】かくして金属薄膜による回路パターンを形
成した成形品は、使用目的により可能であればそのまま
回路部品として使用しても良いが、一般に回路部品とし
て使用する場合は、その導電性の点で、あるいは使用中
の摩擦等による損傷断線等の点で、上記の如き2μm 未
満の薄膜の回路では、不都合な場合が多く、一般には少
なくとも10μm 以上の厚さが必要とされる。従って本発
明においては、この回路パターン上に更に電気メッキを
施し、所望の厚さ(例えば、10〜100 μm )に金属層を
付加して目的とする最終的な回路(図4)を形成する。
かかる金属層の付加は既に形成された回路パターンが電
気メッキに可能な程度の導電性を有するため一般的な電
気メッキ法を適用することができる。
The molded product thus formed with the circuit pattern of the metal thin film may be used as it is as a circuit component if possible depending on the purpose of use, but in general, when it is used as a circuit component, in terms of its conductivity, Alternatively, the thin film circuit having a thickness of less than 2 μm as described above is often inconvenient in view of damage and breakage due to friction during use, and generally requires a thickness of at least 10 μm or more. Therefore, in the present invention, the circuit pattern is further electroplated and a metal layer is added to a desired thickness (for example, 10 to 100 μm) to form a final circuit (FIG. 4) of interest. .
A general electroplating method can be applied to the addition of the metal layer because the already formed circuit pattern has a conductivity that allows electroplating.

【0008】[0008]

【発明の効果】本発明によれば、SKW法やPCK法の
ように煩雑な複合成形の必要がなく、またフォトレジス
トを用いる場合のように回路パターン露光や現像といっ
た暗室内での煩雑な工程の必要もなく、またレーザー光
を使用する際の基体成形品の損傷による外観、形状、さ
らには絶縁性等に対する支障を避けることができ、簡便
な方法で所望の厚さの正確な導電性回路を有する成形部
品を得ることができ、経済的にも有利である。
According to the present invention, there is no need for complicated composite molding unlike the SKW method and the PCK method, and the complicated steps in the dark room such as circuit pattern exposure and development unlike when using a photoresist. Is unnecessary, and the appearance, shape, and insulation properties due to damage to the base molded product when using laser light can be avoided, and a simple and accurate conductive circuit of the desired thickness can be obtained. It is possible to obtain a molded part having the above, which is economically advantageous.

【0009】[0009]

【実施例】以下、図を参照して本発明の実施例を示す
が、本発明はこれに限定されるものではない。 実施例1 液晶性ポリエステル(商品名「ベクトラ」、ポリプラス
チックス(株)製)を主体とする金属密着性(化学メッ
キ性)樹脂組成物を用いて射出成形し立体的な成形品1
を作成した(図1)。次いでこれを脱脂し、KOH水溶
液にてその表面のほぼ全面をエッチング処理した後、H
Cl水溶液にて中和し、洗浄後、触媒(商品名キャタリ
ストA−30、奥野製薬工業(株)製)を付与して表面
を活性化した後、化学銅メッキ液(商品名OPC−75
0、奥野製薬工業(株)製)に浸漬して成形品の表面
に、厚さ0.6 μm の化学銅メッキ2を施し、よく洗浄し
た後乾燥した(図2)。次に、この表面を化学銅メッキ
した成形品(図2)に、レーザーパワーが0.5WのYA
Gレーザー5を照射して回路形成部以外の銅薄膜を除去
することにより回路パターン3を形成した(図3)。次
にこの回路パターンを形成した成形品(図3)に、電気
銅メッキを行い、回路部分の銅膜の厚さ30μm の正確で
立体的な導電回路4を有する回路形成品(図4)を得
た。この成形品は回路部以外の露出した樹脂地肌に殆ん
ど損傷が認められなかった。
EXAMPLES Examples of the present invention will now be described with reference to the drawings, but the present invention is not limited thereto. Example 1 A three-dimensional molded product 1 obtained by injection molding using a metal-adhesive (chemical plating) resin composition mainly composed of liquid crystalline polyester (trade name "Vectra", manufactured by Polyplastics Co., Ltd.)
Was created (Fig. 1). Next, this is degreased, and after etching the almost entire surface with a KOH aqueous solution, H
After neutralizing with a Cl aqueous solution and washing, a catalyst (trade name Catalyst A-30, manufactured by Okuno Chemical Industries Co., Ltd.) is applied to activate the surface, and then a chemical copper plating solution (trade name OPC-75).
0, manufactured by Okuno Seiyaku Kogyo Co., Ltd., and the surface of the molded product was subjected to chemical copper plating 2 having a thickness of 0.6 μm, thoroughly washed and dried (FIG. 2). Next, a YA with a laser power of 0.5 W was applied to the molded product (Fig. 2) whose surface was chemically copper-plated.
The circuit pattern 3 was formed by irradiating the G laser 5 and removing the copper thin film other than the circuit formation part (FIG. 3). Next, a molded product with this circuit pattern (Fig. 3) is electroplated with copper to obtain a circuit-formed product (Fig. 4) having an accurate and three-dimensional conductive circuit 4 with a copper film thickness of 30 µm in the circuit part. Obtained. In this molded product, almost no damage was observed on the exposed resin background other than the circuit part.

【0010】比較例1 成形品表面の化学銅メッキの厚さを5μm した以外は、
実施例1と同様にして、5μm の銅薄膜を形成した成形
品を作成した。この成形品に対し、実施例1と同様のレ
ーザー光を用いて、レーザー光出力0.6 Wで回路パター
ン形成を試みたところ、薄膜厚に対するレーザー光出力
が弱すぎてパターン形成が困難であった。また、レーザ
ー光の出力を逐次上げたところ回路パターンの形成は可
能となったが、正確なパターンは得られず、しかも樹脂
地肌の損傷がみられた。
Comparative Example 1 Except that the thickness of the chemical copper plating on the surface of the molded product was 5 μm,
In the same manner as in Example 1, a molded product having a copper thin film of 5 μm formed was prepared. An attempt was made to form a circuit pattern on this molded product by using the same laser light as in Example 1 with a laser light output of 0.6 W, but the laser light output with respect to the thin film thickness was too weak, and pattern formation was difficult. Further, when the output of the laser beam was increased successively, a circuit pattern could be formed, but an accurate pattern could not be obtained and the resin background was damaged.

【0011】比較例2 実施例1と同様の方法により化学銅メッキ(厚さ0.6 μ
m )を施した後、そのまま電気銅メッキを行い、一旦成
形品の全面を厚さ30μm の銅膜で被覆した。次に、この
電気メッキを行った成形品に、レーザーパワーが5〜15
WのYAGレーザーを照射したが、銅膜を完全に除去す
ることができず、回路パターンの形成が行えなかった。
更にこの銅メッキ層が除去できるまでレーザー光出力を
上げた結果、露出した樹脂地肌は著しい損傷(炭化)が
認められ、回路部品として使用できない状態であった。
Comparative Example 2 Chemical copper plating (thickness: 0.6 μm) was carried out by the same method as in Example 1.
m), electrolytic copper plating was performed as it was, and the entire surface of the molded product was once coated with a copper film having a thickness of 30 μm. Next, laser power of 5 to 15 is applied to this electroplated molded product.
When a W YAG laser was irradiated, the copper film could not be completely removed and a circuit pattern could not be formed.
Further, as a result of increasing the laser light output until the copper plating layer could be removed, the exposed resin background was found to be significantly damaged (carbonized) and could not be used as a circuit component.

【図面の簡単な説明】[Brief description of drawings]

【図1】図1は、本発明の一例として立体回路成形部品
となる基体成形品の断面図である。
FIG. 1 is a cross-sectional view of a base molded product that is a three-dimensional circuit molded component as an example of the present invention.

【図2】図2は、図1に示す基体成形品の表面に化学銅
メッキを施し、銅薄膜を付与した状態を示す断面図であ
る。
FIG. 2 is a cross-sectional view showing a state where the surface of the base molded article shown in FIG. 1 is subjected to chemical copper plating and a copper thin film is applied.

【図3】図3は、図2に示す化学銅メッキを施した成形
品の回路形成部以外の部分の化学銅薄膜をYAGレーザ
ーにより除去し、回路パターンを形成した状態を示す断
面図である。
FIG. 3 is a cross-sectional view showing a state in which a chemical pattern is formed by removing a chemical copper thin film in a portion other than the circuit forming portion of the molded product plated with chemical copper shown in FIG. 2 by a YAG laser. .

【図4】図4は、図3に示す回路パターンを形成した成
形品に電気銅メッキを施し、所要の厚さの金属層よりな
る回路を形成した状態を示す断面図である。
FIG. 4 is a cross-sectional view showing a state in which a molded product having the circuit pattern shown in FIG. 3 is electroplated with copper to form a circuit made of a metal layer having a required thickness.

【符号の説明】[Explanation of symbols]

1…基体成形品 2…化学銅メッキによる銅薄膜 3…レーザ光により形成された回路パターン 4…電気銅メッキにより形成された導電回路 5…レーザー光 DESCRIPTION OF SYMBOLS 1 ... Base molded product 2 ... Copper thin film by chemical copper plating 3 ... Circuit pattern formed by laser light 4 ... Conductive circuit formed by electrolytic copper plating 5 ... Laser light

─────────────────────────────────────────────────────
─────────────────────────────────────────────────── ───

【手続補正書】[Procedure amendment]

【提出日】平成6年2月14日[Submission date] February 14, 1994

【手続補正1】[Procedure Amendment 1]

【補正対象書類名】明細書[Document name to be amended] Statement

【補正対象項目名】0007[Correction target item name] 0007

【補正方法】変更[Correction method] Change

【補正内容】[Correction content]

【0007】かくして金属薄膜による回路パターンを形
成した成形品は、使用目的により可能であればそのまま
回路部品として使用しても良いが、一般に回路部品とし
て使用する場合は、その導電性の点で、あるいは使用中
の摩擦等による損傷断線等の点で、上記の如き2μm 未
満の薄膜の回路では、不都合な場合が多く、一般には少
なくとも10μm 以上の厚さが必要とされる。従って本発
明においては、この回路パターン上に更に電気メッキを
施し、所望の厚さ(例えば、10〜100 μm )に金属層を
付加して目的とする最終的な回路(図4)を形成する。
かかる金属層の付加は既に形成された回路パターンが電
気メッキに可能な程度の導電性を有するため一般的な電
気メッキ法を適用することができる。本発明の方法によ
って形成された導電回路を有する成形品は、各種の電気
・電子機器部品として用いられる。例えば、その所定の
位置に電子素子等を設置し、その電子素子の端子を上記
導電性回路の所定部と連結し、更に要すれば導電性回路
及び電子素子の全部又は一部を適当な樹脂にて封止して
一体の電子部品を形成し、各種の電気・電子機器部品、
機械用機能部品等として好適に使用される。
The molded product thus formed with the circuit pattern of the metal thin film may be used as it is as a circuit component if possible depending on the purpose of use, but in general, when it is used as a circuit component, in terms of its conductivity, Alternatively, the thin film circuit having a thickness of less than 2 μm as described above is often inconvenient in view of damage and breakage due to friction during use, and generally requires a thickness of at least 10 μm or more. Therefore, in the present invention, the circuit pattern is further electroplated and a metal layer is added to a desired thickness (for example, 10 to 100 μm) to form a final circuit (FIG. 4) of interest. .
A general electroplating method can be applied to the addition of the metal layer because the already formed circuit pattern has a conductivity that allows electroplating. The molded product having the conductive circuit formed by the method of the present invention is used as various electric / electronic device parts. For example, an electronic element or the like is installed at a predetermined position, the terminal of the electronic element is connected to a predetermined portion of the conductive circuit, and further, if necessary, the conductive circuit and the electronic element may be entirely or partially made of a suitable resin. To form an integrated electronic component, and various electrical and electronic equipment components,
It is preferably used as a functional component for machinery.

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】 合成樹脂成形品の表面に導電性回路を形
成するにあたり、金属被覆可能な合成樹脂成形品の表面
に予め化学メッキ、スパッタリング、真空蒸着、イオン
プレーティング、転写法又は導電剤塗装の何れかの方法
により金属被覆加工を行って厚さが0.2 〜2μm の金属
薄膜を形成し、次いで該薄膜表面の一部にレーザー光を
照射して、導電回路部となる部分の金属薄膜を残し、導
電回路部以外の部分の金属薄膜を除去することにより金
属薄膜の回路パターンを形成した後、更に該回路パター
ンの金属薄膜上に電気メッキを行って所望の厚さの導電
回路を形成することを特徴とする成形品の表面に導電性
回路を形成する方法。
1. When forming a conductive circuit on the surface of a synthetic resin molded product, chemical plating, sputtering, vacuum deposition, ion plating, transfer method or conductive agent coating is applied to the surface of the synthetic resin molded product capable of metal coating in advance. To form a metal thin film having a thickness of 0.2 to 2 μm by irradiating a laser beam on a part of the surface of the thin film to remove the metal thin film in the part which becomes the conductive circuit part. After forming the circuit pattern of the metal thin film by removing the metal thin film in the portion other than the conductive circuit part, the metal thin film of the circuit pattern is further electroplated to form a conductive circuit of a desired thickness. A method for forming a conductive circuit on the surface of a molded article, which is characterized by the above.
【請求項2】 成形品が立体的な表面形状である請求項
1記載の成形品の表面に導電性回路を形成する方法。
2. The method for forming a conductive circuit on the surface of a molded product according to claim 1, wherein the molded product has a three-dimensional surface shape.
【請求項3】 請求項1又は2記載の方法により製造さ
れた導電回路形成部品。
3. A conductive circuit forming component manufactured by the method according to claim 1.
JP4310023A 1992-11-19 1992-11-19 Method for forming conductive circuit on surface of molded article and conductive circuit forming part Expired - Fee Related JP2965803B2 (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP4310023A JP2965803B2 (en) 1992-11-19 1992-11-19 Method for forming conductive circuit on surface of molded article and conductive circuit forming part
EP94915265A EP0711102B1 (en) 1992-11-19 1994-05-18 Method for forming a conductive circuit on the surface of a molded product
PCT/JP1994/000799 WO1995031884A1 (en) 1992-11-19 1994-05-18 Method for forming conductive circuit on surface of molded product, and component having conduction circuit

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP4310023A JP2965803B2 (en) 1992-11-19 1992-11-19 Method for forming conductive circuit on surface of molded article and conductive circuit forming part
PCT/JP1994/000799 WO1995031884A1 (en) 1992-11-19 1994-05-18 Method for forming conductive circuit on surface of molded product, and component having conduction circuit

Publications (2)

Publication Number Publication Date
JPH06164105A true JPH06164105A (en) 1994-06-10
JP2965803B2 JP2965803B2 (en) 1999-10-18

Family

ID=26435285

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4310023A Expired - Fee Related JP2965803B2 (en) 1992-11-19 1992-11-19 Method for forming conductive circuit on surface of molded article and conductive circuit forming part

Country Status (2)

Country Link
JP (1) JP2965803B2 (en)
WO (1) WO1995031884A1 (en)

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ATE56050T1 (en) * 1987-04-24 1990-09-15 Siemens Ag PROCESS FOR THE MANUFACTURE OF CIRCUIT BOARDS.
JPH04263490A (en) * 1991-02-19 1992-09-18 Matsushita Electric Ind Co Ltd Manufacture of thin film circuit

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WO2012064051A2 (en) * 2010-11-09 2012-05-18 황기선 Method for manufacturing three-dimensional conductor pattern using laser and apparatus for same
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Also Published As

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