JPH0875916A - Color filter, production thereof and liquid crystal panel - Google Patents

Abstract

PURPOSE: To provide a color filter free from color mixing, color uneveness and color omission and high in reliability. CONSTITUTION: A production of color filter by arraying coloring agents on a substrate 1 by ink jet system includes (1) a process for providing a resin layer 3 capable of being hardened by light irradiation or light irradiation and heating thereby, being lowered in ink absorptivity on the substrate 1 (2) a process for hardening a part of the resin layer 3 by light irradiation or light irradiation and heating, (3) a process for giving the coloring agents to a non-hardened part of the resin layer 3 by ink jet system and (4) a process for hardening the colored resin layer 3 by light irradiation, or light irradiation and heating.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a color filter preferably used for a color liquid crystal display used in a color television, a personal computer, a pachinko game table, etc., a method for producing the same, and a liquid crystal panel provided with the same. In particular, the present invention relates to a liquid crystal color filter manufactured by using an inkjet recording technique, a manufacturing method thereof, and a liquid crystal panel.

[0002]

2. Description of the Related Art In recent years, the development of personal computers,
Particularly, with the development of portable personal computers, the demand for liquid crystal displays, especially color liquid crystal displays, tends to increase. However, for further popularization, it is necessary to reduce the cost of liquid crystal displays, and in particular, there is an increasing demand for cost reduction of color filters, which have a high cost ratio. Conventionally, various methods have been tried to meet the above-described requirements while satisfying the required characteristics of the color filter, but a method that satisfies all the required characteristics has not yet been established. Each method will be described below.

The first and most frequently used method is the dyeing method. The dyeing method is to coat a glass substrate with a water-soluble polymer material, which is a material for dyeing, pattern it into a desired shape by a photolithography process, and then immerse the obtained pattern in a dyeing bath for coloring. Get the pattern. By repeating this three times, the colored layers of R, G and B are formed.

As another example of this dyeing method, Japanese Patent Application Laid-Open No. 5-2
JP-A-88913 describes a method of forming a photosensitive layer on a substrate, exposing the same in a pattern, and then dyeing an unexposed portion. By repeating this step three times, R, G, and B are described.
It is described that a color filter composed of three colors is manufactured.

The second method is a pigment dispersion method, which is recently replacing the dyeing method. In this method, a monochromatic pattern is obtained by forming a photosensitive resin layer in which a pigment is dispersed on a substrate and patterning this. Further, this process is repeated three times to form R, G, and B colored layers.

A third method is an electrodeposition method. In this method, a transparent electrode is patterned on a substrate, and the first color is electrodeposited by immersing it in an electrodeposition coating solution containing a pigment, a resin, an electrolytic solution and the like. This process is repeated three times to form R, G, and B colored layers, and finally firing is performed.

As a fourth method, a pigment is dispersed in a thermosetting resin and printing is repeated three times to obtain R, G, and
After coating B separately, the colored layer is formed by thermosetting the resin. In any method, it is general to form a protective layer on the colored layer.

The common points of these methods are R,
It is necessary to repeat the same process three times in order to color the three colors of G and B, which is costly. Further, there is a problem that the yield decreases as the number of processes increases. Further, in the electrodeposition method, since the pattern shape that can be formed is limited, it is difficult to apply the present technology to a TFT. Further, the printing method is not suitable for forming a fine pitch pattern because of its poor resolution and smoothness.

[0009]

SUMMARY OF THE INVENTION In order to compensate for these drawbacks, JP-A-59-75205 and JP-A-63-23.
Japanese Patent No. 5901 and Japanese Patent Laid-Open No. 1-217320 describe a method of manufacturing a color filter using an inkjet method, but a method which is not sufficiently satisfactory has not been obtained yet.

Therefore, an object of the present invention is to provide an inexpensive color filter which satisfies the required properties such as heat resistance, solvent resistance and resolution of the conventional method, and also satisfies the ink jet suitability, and has a further shortened process. And a highly reliable color filter manufactured by the method, and a liquid crystal panel including the color filter. In particular, the present invention provides a high-definition and highly reliable color filter for liquid crystal and a method for producing the same, which prevents color mixture and color loss when the colorants are arranged by ejecting ink droplets using an inkjet method. .

A further object of the present invention is to provide a liquid crystal panel which enables high definition display.

[0012]

The above object can be achieved by the following means.

That is, the present invention is a color filter having a resin layer on a substrate, the resin layer including a plurality of colored portions and non-colored portions colored in different colors. The same layer includes a plurality of colored portions and non-colored portions of different colors, the substrate is translucent, the resin material forming the colored portion and the non-colored portion are the same, and the colored portion is a dot. Including being formed.

Further, the present invention is a color filter having a resin layer on a substrate having a light shielding portion and a light transmitting portion, the resin layer having a colored portion, wherein the resin layer on the light shielding portion is a colored portion. And a color filter having a non-colored portion,
Having a protective layer on the resin layer, the colored portion is in contact with the light shielding portion, the width of the non-colored portion is narrower than the width of the light shielding portion,
The colored portion is a color filter formed of ink dots.

Further, the present invention is a method for manufacturing a color filter in which a colorant is arranged on a substrate by an ink jet method. (1) The substrate can be cured by light irradiation or light irradiation and heating, whereby ink absorbability is obtained. Providing a resin layer that reduces the temperature, (2) a step of curing a part of the resin layer on the light shielding portion by light irradiation or light irradiation and heating,
(3) A step of applying a colorant to an uncured portion of the resin layer by an inkjet method, and (4) a step of curing the colored resin layer by light irradiation and / or heating, In the manufacturing method, the substrate has a light-shielding portion, and a part of the resin layer on the light-shielding portion is cured,
The width of the resin layer on the light-shielding portion that is cured in the step (2) is narrower than the width of the light-shielding portion, and a curable second resin layer is formed on the resin layer to make the second curable In the method for producing a color filter, the resin layer contains a resin composition curable by light irradiation and / or heat treatment, and an inorganic layer is formed on the resin layer by vapor deposition or sputtering.

Further, the present invention is a liquid crystal panel comprising the above-described color filter and a substrate facing the color filter, and a liquid crystal compound is sealed between the both substrates.

The present invention also provides, in a method of manufacturing a color filter in which a colorant is arranged on a substrate by an ink jet system, (1) an ink receptive property is provided on the substrate, and a light irradiation portion by light irradiation or light irradiation and heating is used. A step of providing a resin composition layer in which the residual amount of hydrophilic groups is reduced, (2) a step of irradiating a part of the resin layer with light or a step of performing a light irradiation and a heat treatment, (3) non-irradiation of light on the resin composition layer A method for producing a color filter, comprising: a step of applying a colorant to an area by an inkjet method; and (4) a step of curing the colored resin composition layer by light irradiation and / or heating, and a substrate. The resin composition layer on the light-shielding portion is narrower than the width of the light-shielding portion. Illumination by light irradiation or light irradiation and heating Resin composition hydrophilic Motozan amount decreases portion contains a compound which generates an acid by light irradiation,
A curable second resin layer is formed on the resin layer, and the second curable resin layer contains a resin composition curable by light irradiation and / or heat treatment, and on the resin layer, It is a method for manufacturing a color filter in which an inorganic layer is formed by vapor deposition or sputtering.

[0018]

BEST MODE FOR CARRYING OUT THE INVENTION Hereinafter, the present invention will be described in detail with reference to the drawings.

FIG. 1 shows the manufacturing process of the color filter of the present invention, and shows an example of the constitution of the color filter of the present invention.

In the present invention, a translucent substrate is preferred as the substrate, and a glass substrate is generally used. However, a glass substrate may be used as long as it has the required properties such as transparency and mechanical strength as a color filter for liquid crystal. It is not limited to.

FIG. 1A shows a glass substrate 1 having a light transmitting portion 7 and a black matrix 2 which is a light shielding portion. First, a resin composition, which can be cured by light irradiation or light irradiation and heating, which reduces ink absorbability, is applied on the substrate 1 on which the black matrimus 2 is formed, and prebaking is performed if necessary. The resin layer 3 is formed (see FIG. 1).
(B)). The resin layer 3 can be formed by using a coating method such as spin coating, roll coating, bar coating, spray coating, or dip coating, and is not particularly limited.

Next, the resin layer in the portion shielded by the black matrix 2 is preliminarily subjected to pattern exposure using the photomask 4 to cure a part of the resin layer so that a portion 8 (non-colored) is not absorbed. Part) (Fig. 1
(C)), then using the inkjet head 5, R,
Each color of G and B is colored in the same layer (FIG. 1D), and the ink is dried if necessary.

As the photomask 4 used at the time of pattern exposure, one having an opening for hardening the light-shielding portion by black matrix is used. At this time, it is necessary to apply a relatively large amount of ink in order to prevent color loss of the colorant at the portion in contact with the black matrix. Therefore, it is preferable to use a mask having an opening narrower than the (light-shielding) width of the black matrix.

As the ink used for coloring, it is possible to use both dye-based and pigment-based inks, and also liquid inks and solid inks.

The curable resin composition used in the present invention may be any curable resin composition as long as it has ink receptivity and can be cured by light irradiation or at least one of light irradiation and heating. There are, for example, acrylic resins; epoxy resins; silicone resins; hydroxypropyl cellulose, hydroxyethyl cellulose,
Examples thereof include cellulose derivatives such as methyl cellulose and carboxymethyl cellulose, or modified products thereof.

It is also possible to use a photoinitiator (crosslinking agent) for promoting a crosslinking reaction of these resins by light or light and heat. As the photoinitiator, dichromate,
Bisazide compounds, radical initiators, cationic initiators, anionic initiators and the like can be used. Further, these photoinitiators can be mixed or used in combination with other sensitizers. In addition, in order to further promote the crosslinking reaction, heat treatment may be performed after the light irradiation.

The resin layer containing these compositions is very excellent in heat resistance, water resistance and the like, and can sufficiently withstand a high temperature or a washing step in a subsequent step.

As the ink jet method used in the present invention, a bubble jet type using an electrothermal converter as an energy generating element or a piezo jet type using a piezoelectric element can be used. It can be set arbitrarily.

In this example, a black matrix is formed on the substrate, but the black matrix is formed on the resin layer after forming the curable resin composition layer or after coloring. However, there is no particular problem, and the form is not limited to this example. or,
As a shape method, it is preferable to form a metal thin film on a substrate by sputtering or vapor deposition and pattern it by a photolithography process, or pattern a black resin of a photosensitive resin, but it is not limited to this.

Next, the curable resin composition is cured by light irradiation or light irradiation and heat treatment (FIG. 1E), and the protective layer 6 is formed as necessary (FIG. 1F). The protective layer 6 can be formed by using a second resin composition of a photo-curing type, a thermosetting type or a photo-thermal combined type, or can be formed by vapor deposition or sputtering using an inorganic material, and can be formed as a color filter. Any material can be used as long as it has transparency in such a case and can sufficiently withstand the subsequent ITO forming process, alignment film forming process and the like.

FIG. 2 shows a method of manufacturing a color filter used in a liquid crystal panel in which a black matrix is provided on opposing substrates.

The method of providing the black matrix not on the color filter side but on the opposing substrate is effective as a method of improving the aperture ratio.

On the glass substrate 1 shown in FIG. 2 (a), a composition whose ink absorbency at the light-irradiated portion is lowered by light irradiation or light irradiation and heat treatment is applied, and if necessary, prebaked to perform light irradiation. Alternatively, the composition layer 3 in which the ink absorbency of the light-irradiated portion is lowered by light irradiation and heat treatment is formed (FIG. 2B).

Then, pattern exposure is performed using the photomask 4 to lower the ink absorbency of the exposed portion of the composition layer 3 (FIG. 2C), and then the unexposed portion is used by using the inkjet head 5. The same layer is colored with R, G, and B (FIG. 2D), and dried as necessary. In order to prevent color loss, it is important to make the width of the non-colored portion 8 narrower than the width of the black matrix (not shown) provided on the opposing substrate.

Next, the colored resin composition layer is cured by light irradiation and / or heat treatment (FIG. 2 (e)), and a protective layer 6 is formed (FIG. 2 (f)) if necessary to form a color filter. obtain. As the protective layer, a photocurable type, a thermosetting type or a photothermal combined type resin material, an inorganic film formed by vapor deposition, sputtering or the like can be used, and it has transparency when used as a color filter. IT
Any material that can withstand the O formation process, the alignment film formation process, etc. can be used.

In this way, the resin layer is provided on the substrate,
A color filter having a plurality of colored portions and non-colored portions in which the resin layer is colored with different colors is manufactured.

FIGS. 3 and 4 show cross sections of a TFT color liquid crystal panel incorporating the color filter according to the present invention.
The form is not limited to this example.

In the color liquid crystal panel, generally, the color filter substrate 1 and the counter substrate 14 are combined to form a liquid crystal compound 1
It is formed by enclosing 2. TFTs (not shown) and transparent pixel electrodes 13 are formed in a matrix inside one substrate 14 of the liquid crystal panel. In addition, inside the other substrate 1, a color filter 9 is installed so that RGB color materials are arranged at positions facing the pixel electrodes, and a transparent counter electrode (common electrode) 10 is formed on one surface of the color filter 9. To be done. The black matrix is usually formed on the color filter substrate side (FIG. 3), but is formed on the opposing TFT substrate side in the BM on-array type liquid crystal panel (FIG. 4). Furthermore, an alignment film 11 is formed in the plane of both substrates, and by rubbing the alignment film 11, liquid crystal molecules can be aligned in a certain direction. A polarizing plate 15 is adhered to the outside of each glass substrate, and the liquid crystal compound 12 has a gap (2 to 5 μm) between these glass substrates.
m). In addition, a combination of a fluorescent lamp (not shown) and a scattering plate (not shown) is generally used as the backlight, and the liquid crystal compound is displayed by functioning as an optical shutter that changes the transmittance of the backlight. I do.

Further, as another aspect of the method for producing a color filter of the present invention, a substrate on which a black matrix is formed has an ink receptive property, and has a hydrophilic property in a light irradiation portion by light irradiation or light irradiation and heating. A resin composition layer in which the residual amount of the group is reduced is applied to form a resin composition having ink receptivity and reduced in the residual amount of the hydrophilic group in the light-irradiated portion by light irradiation or light irradiation and heating. By utilizing the difference in ink absorbency between exposed and unexposed areas, it is intended to prevent color mixture of ink and diffusion of ink more than necessary, by light irradiation or light irradiation and heating. It is preferable to use a resin composition in which the ink absorbency of the light-irradiated portion is reduced, and crosslinking such as through a hydrophilic group such as a hydroxyl group, an alkoxy group, an amino group or an addition reaction to the hydrophilic group is caused. It is preferable to use a resin composition. Further, in this example, an example in which the ink absorbency is lowered only by light irradiation is shown, but there is no problem even if heat treatment is used in combination to advance the crosslinking reaction.

As a composition example of the resin composition used in the present invention, specifically, a system utilizing a cross-linking reaction by chemical amplification is preferable, and a base resin is a cellulose derivative such as hydroxypropyl cellulose or hydroxyethyl cellulose. Polymer alcohols such as polyvinyl alcohol and their derivatives, novolak resins such as cresol novolac and derivatives thereof, acrylic resins containing a hydroxyl group-containing acrylic monomer unit such as hydroxyethyl methacrylate, and the like, and also as a cross-linking agent. Are preferably used melamine derivatives such as methylolated melamine, as photoinitiators, onium salts such as triphenylsulfonium hexafluoroantimonate, halogenated organic compounds such as trichloromethyltriazine, but are not limited thereto. Not shall.

The coating material of the portion shielded from light by the black matrix is previously subjected to pattern exposure (see FIG. 1).
(C)), R, G, B using the inkjet head 5
Each color is colored (FIG. 1D), and the ink is dried if necessary. As the reaction proceeds, the remaining amount of hydrophilic groups such as hydroxyl groups, alkoxy groups, amino groups, etc. decreases in the exposed areas, making it difficult to absorb ink, and thus it is possible to prevent color mixing of ink between colors. In order to cause a difference in ink absorbency, it is preferable that the residual amount of hydrophilic groups in the exposed area be 70% or less of that in the unexposed area. In this case, the hydrophilic group can be quantified by a spectrum such as IR or NMR. The analysis is valid. Further, as a photomask for pattern exposure, a photomask having an opening for exposing a light-shielded portion by a black matrix is used. At this time, considering that it is necessary to eject a large amount of ink in order to prevent color loss in a portion in contact with the black matrix, it is preferable to use a mask having an opening portion narrower than the light shielding width of the black matrix. preferable.

Then, the colored coating material is cured by light irradiation, heat treatment or light irradiation and heat treatment (FIG. 1E), and a protective layer is formed if necessary (FIG. 1E).
(F)) As the protective layer, a photocurable type, a thermosetting type or a photothermal combined type resin material, an inorganic film formed by vapor deposition, sputtering or the like can be used, and it has transparency when used as a color filter. Any material that can withstand the ITO forming process, the alignment film forming process, etc. can be used.

[0043]

EXAMPLES The present invention will be specifically described below with reference to examples.

Example 1 On the glass substrate 1 on which the black matrix 2 was formed,
A water-soluble negative resist composed of polyvinylpyrrolidone and a bisazide compound (photoinitiator) was spin-coated to a film thickness of 2 μm, and prebaked at 90 ° C. for 20 minutes to form a photocurable resin layer 3.

Next, a part of the resin layer on the black matrix was pattern-exposed and cured through a photomask having an opening narrower than the width of the black matrix.

Further, the R, G and B matrix patterns were colored with the dye ink using the ink jet head 5, and then the ink was dried at 90 ° C. for 5 minutes. Subsequently, the entire surface was exposed to cure the resin layer 3.

Example 2 A photocurable resin composition comprising an epoxy acrylate and a photoinitiator was spin-coated on the resin layer 3 colored according to Example 1 so as to have a film thickness of 1 μm, and at 90 ° C. for 30 minutes. Was prebaked to form the protective layer 6. Then
By exposing the entire surface to cure the protective layer 6, a color filter for liquid crystal was prepared.

When the thus-prepared color filter for liquid crystal was observed with an optical microscope, no obstacles such as color mixture, color unevenness, and color loss were observed.

Further, when the liquid crystal panel shown in FIG. 3 was prepared using this color filter and driven, a high-definition color display was possible.

Example 3 A two-pack type epoxy acrylate thermosetting resin composition was roll-coated on the resin layer 3 obtained in Example 1 to a film thickness of 1 μm, and prebaked at 90 ° C. for 30 minutes. Then, the protective layer 6 was formed. Then 30 at 230 ℃
A color filter for liquid crystal was prepared by performing heat treatment for minutes to cure the protective layer 6.

When the color filter for liquid crystal thus produced was observed with an optical microscope, no obstacles such as color mixture, color unevenness, and color loss were observed.

Further, when the liquid crystal panel shown in FIG. 3 was produced by using this color filter and driven, high-definition color display was possible.

Example 4 On the resin layer 3 obtained in Example 1, a photocurable resin composition comprising a bisphenol A type epoxy resin and a photocationic initiator was spin-coated to a film thickness of 1 μm, and 90 Pre-baking was performed at 30 ° C. for 30 minutes to form the protective layer 6. Then, after exposing the entire surface to 30 ° C. at 30 ° C.
A color filter for liquid crystal was prepared by performing heat treatment for minutes to completely cure the protective layer 6.

When the color filter for liquid crystal thus produced was observed with an optical microscope, no obstacles such as color mixture, color unevenness and color loss were observed.

Further, when the liquid crystal panel shown in FIG. 3 was prepared using this color filter and driven, a high-definition color display was possible.

Example 5 On the resin layer 3 colored according to Example 1, a SiO ₂ film 6 was formed by sputtering to have a film thickness of 0.5 μm,
A color filter for liquid crystal was created.

When the liquid crystal color filter thus produced was observed with an optical microscope, no obstacles such as color mixing, color unevenness, and color loss were observed.

Further, when a liquid crystal panel shown in FIG. 3 was produced using this color filter and driven, high-definition color display was possible.

Example 6 On the glass substrate 1 on which the black matrix 2 was formed,
A photocurable resin composition comprising a bisphenol A type epoxy resin and a cationic initiator is spin-coated to a film thickness of 2 μm and prebaked at 90 ° C. for 20 minutes to form a photocurable resin composition layer 3. Formed.

Next, part of the resin layer on the black matrix is pattern-exposed through a photomask having an opening narrower than the width of the black matrix, and the pattern exposure is performed at 120 ° C. for 1 hour.
A heat treatment was performed for 0 minutes to cure the exposed portion. Further, by using the ink jet head 5, R by pigment ink,
After coloring the G and B matrix patterns, 5 at 90 ° C
The ink was dried for one minute. Subsequently, the entire surface was exposed, and then heat treatment was performed at 200 ° C. for 60 minutes to completely cure the resin layer 3.

Example 7 A photocurable resin composition comprising an epoxy acrylate and a photoinitiator was spin-coated on the resin layer 3 colored in Example 6 so as to have a film thickness of 1 μm, and at 90 ° C. for 30 minutes. Was prebaked to form the protective layer 6. Then
By exposing the entire surface to cure the protective layer 6, a color filter for liquid crystal was prepared.

When the thus-prepared color filter for liquid crystal was observed with an optical microscope, no troubles such as color mixture, color unevenness, and color loss were observed.

Further, when a liquid crystal panel shown in FIG. 3 was produced using this color filter and driven, high-definition color display was possible.

Example 8 A two-pack type thermosetting resin composition was spin-coated on the resin layer 3 colored in Example 6 to a film thickness of 1 μm, and prebaked at 90 ° C. for 30 minutes. To form the protective layer 6. Then, heat treatment was performed at 230 ° C. for 30 minutes to cure the protective layer 6 to prepare a color filter for liquid crystal.

When the color filter for liquid crystal thus produced was observed with an optical microscope, no obstacles such as color mixture, color unevenness, and color loss were observed.

When the liquid crystal panel shown in FIG. 3 was produced using this color filter and driven, high-definition color display was possible.

Example 9 A photocurable resin composition similar to that used in Example 6 was spin-coated on the resin layer 3 colored in Example 6 to a film thickness of 1 μm, and at 90 ° C. Pre-baking was performed for 30 minutes to form the protective layer 6. Next, after subjecting the entire surface to exposure, heat treatment was carried out at 230 ° C. for 30 minutes to completely cure the protective layer 6 to prepare a color filter for liquid crystal.

When the thus-prepared color filter for liquid crystal was observed with an optical microscope, no obstacles such as color mixture, color unevenness, and color loss were observed.

Further, when the liquid crystal panel shown in FIG. 3 was prepared using this color filter and driven, high-definition color display was possible.

Example 10 On the resin layer 3 colored in Example 6, a SiO ₂ film 6 was formed by sputtering to have a film thickness of 0.5 μm,
A color filter for liquid crystal was created.

When the color filter for liquid crystal thus produced was observed with an optical microscope, no obstacles such as color mixture, color unevenness and color loss were observed.

Further, when the liquid crystal panel shown in FIG. 3 was prepared using this color filter and driven, a high-definition color display was possible.

Example 11 Vitroxypropyl cellulose (HPC-manufactured by Nippon Soda)
H) 5 g-Methylolated melamine derivative (Sumitex M-3 manufactured by Sumitomo Kasei) 5 g-Cationic photoinitiator (SP-170 manufactured by ADEKA)
A resin composition consisting of 25 g, which has water-based ink absorbency and whose ink absorbency at the light-irradiated part is lowered by light irradiation or light irradiation and heat treatment, is spin-coated on a silicon substrate to a film thickness of 1 μm, and then at 90 ° C. Prebaking was performed for 20 minutes. Then, after the entire surface is exposed with an exposure amount of 1 J / cm ² , F
T-IR (Micro FTIR-10 manufactured by JASCO Corporation)
0) was used to measure the infrared absorption spectrum in the reflection mode, and the residual hydroxyl group was compared by comparing it with the spectrum before exposure, and it was confirmed that it was reduced to 70% before exposure. .

Next, the above resin composition was spin-coated on a glass substrate having a black matrix formed thereon so as to have a film thickness of 2 μm, and prebaked at 90 ° C. for 20 minutes.

Then, 1 J / cm ² is applied through a photomask having an opening narrower than the width of the black matrix.
Part of the resin layer on the black matrix was pattern-exposed and cured with the exposure amount of. Further inkjet head 5
The R, G, and B matrix patterns were colored in the unexposed area with a dye ink by using, and the ink was dried at 90 ° C. for 5 minutes. Subsequently, the entire surface was exposed.

Further, a two-component thermosetting resin SS-7625 (manufactured by JSR) was spin-coated on the resin layer as a protective layer so as to have a film thickness of 1 μm, and heat-treated at 230 ° C. for 1 hour to cure. Let

When the color filter for liquid crystal thus produced was observed with an optical microscope, no obstacles such as color mixture, color unevenness and color loss were observed.

Example 12 The same resin composition as in Example 11 was spin-coated on a silicon substrate to a film thickness of 1 μm, and prebaked at 90 ° C. for 20 minutes. Then, after performing whole surface exposure with an exposure amount of 1 J / cm ² , heat treatment was performed on a hot plate at 150 ° C. for 1 minute, and the residual amount of hydroxyl groups was compared in the same manner as in Example 11. It was confirmed that the amount of the water was reduced to 50%.

Next, the above resin composition was spin-coated on a glass substrate on which a black matrix had been formed so as to have a film thickness of 2 μm, and prebaked at 90 ° C. for 20 minutes to form a resin composition layer. .

Then, 1 J / cm ² was applied through a photomask having an opening narrower than the width of the black matrix.
Part of the resin layer on the black matrix was pattern-exposed with the exposure amount of, and heat treatment was performed on a hot plate at 150 ° C. for 1 minute. Further, the R, G, and B matrix patterns were colored with dye ink using the inkjet head 5, and then the ink was dried at 90 ° C. for 5 minutes. Subsequently, the entire surface was exposed and then heat treatment was performed at 200 ° C. for 1 hour to cure the resin layer.

Further, a two-component thermosetting resin SS-7625 (manufactured by JSR) was spin-coated on the resin layer as a protective layer so as to have a film thickness of 1 μm, and heat-treated at 230 ° C. for 1 hour to cure. It was

When the liquid crystal color filter thus produced was observed with an optical microscope, no obstacles such as color mixing, color unevenness, and color loss were observed.

Further, when the liquid crystal panel shown in FIG. 3 was prepared by using this color filter and driven, high-definition color display was possible.

Example 13 On a glass substrate on which a black matrix had been formed, the same resin composition as in Example 11 was spin-coated to a film thickness of 2 μm and prebaked at 90 ° C. for 20 minutes to obtain a resin composition. An object layer was formed.

Then, 1 J / cm ² was applied through a photomask having an opening narrower than the width of the black matrix.
Part of the resin layer on the black matrix was pattern-exposed with the exposure amount of, and heat treatment was performed on a hot plate at 150 ° C. for 1 minute. Further, the R, G, and B matrix patterns were colored with a pigment ink using the inkjet head 5, and then the ink was dried at 90 ° C. for 5 minutes. Subsequently, heat treatment was performed at 230 ° C. for 1 hour to cure the resin layer.

Further, a two-component thermosetting resin SS-7625 (manufactured by JSR) was spin-coated on the resin layer as a protective layer so as to have a film thickness of 1 μm, and heat-treated at 230 ° C. for 1 hour to cure. It was

When the color filter for liquid crystal thus produced was observed with an optical microscope, no obstacles such as color mixture, color unevenness, and color loss were observed.

Example 14 Vitroxyethyl cellulose (AH- manufactured by Fuji Chemical Co., Ltd.)
15) 5 g Methylolated melamine derivative (Sumitex M-3 manufactured by Sumitomo Chemical Co., Ltd.) 5 g Infrared absorption spectrum was measured in the same manner as in Example 11 using a resin composition in which the ink absorbency of the light-irradiated portion was reduced by heat treatment, and the residual hydroxyl group was compared by comparing with the spectrum before exposure. As a result, it was confirmed that the amount was reduced to 65% before exposure.

Next, the above resin composition was spin-coated on a glass substrate having a black matrix formed thereon so as to have a film thickness of 2 μm, and prebaked at 90 ° C. for 20 minutes.

Then, 1 J / cm ² was applied through a photomask having an opening narrower than the width of the black matrix.
Part of the resin layer on the black matrix was pattern-exposed with the exposure amount of. Further, the unexposed portion was colored with a dye ink to form a matrix pattern of R, G, and B using the inkjet head 5, and then the ink was dried at 90 ° C. for 5 minutes. Subsequently, the entire surface was exposed to cure the resin layer.

Further, a two-component thermosetting resin SS-7625 (manufactured by JSR) was spin-coated on the resin layer so as to have a film thickness of 1 μm, and heat-treated at 230 ° C. for 1 hour to cure the resin. It was

When the color filter for liquid crystal thus produced was observed with an optical microscope, no troubles such as color mixing, color unevenness and color loss were observed.

Example 15 The same resin composition as in Example 14 was used, and Example 12 was used.
The whole surface exposure and heat treatment were performed in exactly the same manner as above, the infrared absorption spectrum was measured, and the residual hydroxyl group was compared by comparing with the spectrum before exposure.
It has been confirmed that the amount has decreased to%.

Then, the above resin composition was spin-coated on a glass substrate on which a black matrix had been formed so as to have a film thickness of 2 μm, and prebaked at 90 ° C. for 20 minutes to form a resin composition layer. .

Then, 1 J / cm ² was applied through a photomask having an opening narrower than the width of the black matrix.
Part of the resin layer on the black matrix was pattern-exposed with the exposure amount of, and heat treatment was performed on a hot plate at 150 ° C. for 1 minute. Further, the R, G, and B matrix patterns were colored with dye ink using the inkjet head 5, and then the ink was dried at 90 ° C. for 5 minutes. Subsequently, the entire surface was exposed and then heat treatment was performed at 200 ° C. for 1 hour to cure the resin layer.

Further, a two-component thermosetting resin SS-7625 (manufactured by JSR) was spin-coated on the resin layer so as to have a film thickness of 1 μm, and heat-treated at 230 ° C. for 1 hour to cure the resin. It was

When the color filter for liquid crystal thus produced was observed with an optical microscope, no troubles such as color mixing, color unevenness and color loss were observed.

Further, when the liquid crystal panel shown in FIG. 3 was prepared using this color filter and driven, high-definition color display was possible.

Example 16 The resin composition of Example 14 was spin-coated on a glass substrate having a black matrix formed thereon so as to have a film thickness of 2 μm, and prebaked at 90 ° C. for 20 minutes to form a resin composition layer. Created.

Then, 1 J / cm ² was applied through a photomask having an opening narrower than the width of the black matrix.
Part of the resin layer on the black matrix was pattern-exposed with the exposure amount of, and heat treatment was performed on a hot plate at 150 ° C. for 1 minute. Further, the R, G, and B matrix patterns were colored with a pigment ink using the inkjet head 5, and then the ink was dried at 90 ° C. for 5 minutes. Subsequently, heat treatment was performed at 230 ° C. for 1 hour to cure the resin layer.

Further, a two-component thermosetting resin SS-7625 (made by JSR) was spin-coated on the resin layer so as to have a film thickness of 1 μm, and heat-treated at 230 ° C. for 1 hour to cure. It was

When the color filter for liquid crystal thus produced was observed with an optical microscope, no obstacles such as color mixture, color unevenness, and color loss were observed.

Example 17-Hydroxyethyl methacrylate-methyl methacrylate copolymer 5g-Methylolated melamine derivative (Sumitex M-3 manufactured by Sumitomo Chemical Co., Ltd.) 5g-Cationic photoinitiator (SP-170 manufactured by ADEKA)
A sample was prepared in exactly the same manner as in Example 11 using a resin composition consisting of 0.25 g, which has water-based ink absorbency and whose ink absorbency in the light-irradiated portion is reduced by light irradiation or heat treatment. When the absorption spectrum was measured and compared with the spectrum before exposure to compare the residual amount of hydroxyl groups, it was confirmed that the residual hydroxyl group had decreased to 40% before exposure.

Next, when a color filter for liquid crystal was prepared in exactly the same manner as in Example 11 and observed with an optical microscope, no trouble such as color mixing, color unevenness, color loss, etc. was observed.

Further, when a liquid crystal panel shown in FIG. 3 was produced using this color filter and driven, high-definition color display was possible.

Example 18 Hydroxypropyl cellulose (HPC manufactured by Nippon Soda)
-H) 5 g-Dimethylol urea (Mitsui Toatsu Chemicals, Inc., T-251)
5g-Cationic photoinitiator (made by ADEKA, SP-170)
A sample was prepared in exactly the same manner as in Example 11 using a resin composition of 0.25 g, which has water-based ink absorbency and whose ink absorbency in the light-irradiated portion is reduced by light irradiation or light irradiation and heat treatment. When the infrared absorption spectrum was measured and compared with the spectrum before exposure to compare the residual amount of hydroxyl groups, it was confirmed that the residual amount was reduced to 60% before exposure.

Next, a color filter for liquid crystal was prepared in exactly the same manner as in Example 11 and was observed by an optical microscope. As a result, no trouble such as color mixing, color unevenness and color loss was observed.

Further, when the liquid crystal panel shown in FIG. 3 was produced using this color filter and driven, high-definition color display was possible.

Example 19 As shown in FIG. 2, the compositions of Examples 1, 6 and 11 were applied on a glass substrate 1 to form a resin composition layer 3. Then, pattern exposure was performed from the resin layer 3 side using the photomask 4 to reduce the resin ink absorbency of the exposed portion. Further, an R, G, B matrix pattern was colored on the exposed area with dye ink using the inkjet head 5, and then heat treatment was performed under the same conditions as in each of the examples.

Further, the protective layer 6 was formed in the same manner as in Example 2 to prepare three types of color filters for liquid crystals.

When the thus-prepared color filter for liquid crystal was observed with an optical microscope, no troubles such as color mixing, color unevenness and color loss were observed.

Further, when the liquid crystal panel shown in FIG. 4 was prepared using this color filter and driven, a high-definition color display was possible.

[0113]

According to the present invention, it is possible to provide a highly reliable color filter for liquid crystal having no defects such as color mixture, color unevenness, and color loss, and a liquid crystal panel capable of high-definition color display.

[Brief description of drawings]

FIG. 1 is a diagram showing a manufacturing process of a liquid crystal color filter according to the present invention.

FIG. 2 is a diagram showing another manufacturing process of the color filter for liquid crystal according to the present invention.

FIG. 3 is a cross-sectional view showing a structure of a liquid crystal panel.

FIG. 4 is a cross-sectional view showing the structure of another liquid crystal panel.

[Explanation of symbols]

 1 Substrate 2 Black Matrix 3 Resin Layer 4 Photomask 5 Inkjet Head 6 Protective Layer 7 Light Transmission Part 8 Non-Colored Part 9 Color Filter

 ─────────────────────────────────────────────────── ─── Continued front page (72) Inventor Miya ▲ saki ▼ Ken 3-30-2 Shimomaruko, Ota-ku, Tokyo Canon Inc. (72) Hideto Yokoi 3-30-30 Shimomaruko, Ota-ku, Tokyo No. 2 within Canon Inc. (72) Inventor Hiroshi Sato 3-30-2 Shimomaruko, Ota-ku, Tokyo Within Canon Inc.

Claims (25)

[Claims] 1. A color filter having a resin layer on a substrate, the resin layer including a plurality of colored portions and non-colored portions which are colored with different colors. 2. The color filter according to claim 1, wherein a plurality of colored portions and non-colored portions of different colors are included in the same layer of the resin layer. 3. The color filter according to claim 1, wherein the substrate is translucent. 4. The color filter according to claim 1, wherein the materials of the resin forming the colored portion and the non-colored portion are the same. 5. The color filter according to claim 1, wherein the colored portion is formed of dots. 6. A color filter having a resin layer on a substrate having a light-shielding portion and a light-transmitting portion, the resin layer having a colored portion, wherein the resin layer on the light-shielding portion is not colored with the colored portion. A color filter having a portion. 7. The protective layer is provided on the resin layer.
The color filter described in. 8. The color filter according to claim 6, wherein the colored portion is in contact with the light shielding portion. 9. The color filter according to claim 6, wherein the width of the non-colored portion is narrower than the width of the light shielding portion. 10. The color filter according to claim 6, wherein the colored portion is formed of ink dots. 11. A method of manufacturing a color filter in which a colorant is arranged on a substrate by an ink jet method, wherein (1) the substrate can be cured by light irradiation or light irradiation and heating, which lowers ink absorbability. And (2) curing a part of the resin layer on the light-shielding portion by light irradiation or light irradiation and heating, (3) applying a colorant to the uncured portion of the resin layer by an inkjet method. And a step of (4) curing the colored resin layer by light irradiation and / or heating. 12. The method of manufacturing a color filter according to claim 11, wherein the substrate has a light shielding portion, and a part of the resin layer on the light shielding portion is cured. 13. The method of manufacturing a color filter according to claim 12, wherein the width of the resin layer on the light shielding portion which is cured in the step (2) is narrower than the width of the light shielding portion. 14. The method of manufacturing a color filter according to claim 11, wherein a curable second resin layer is formed on the resin layer. 15. The method for producing a color filter according to claim 14, wherein the second curable resin layer contains a resin composition curable by light irradiation and / or heat treatment. 16. The method for manufacturing a color filter according to claim 11, wherein an inorganic layer is formed on the resin layer by vapor deposition or sputtering. 17. A liquid crystal panel, comprising: the color filter according to claim 6; and a substrate facing the color filter, wherein a liquid crystal compound is sealed between both substrates. 18. The color filter according to claim 1, wherein a substrate provided with a light shielding portion is provided at a position opposite to the color filter, and a liquid crystal composition is sealed between the color filter and the substrate. LCD panel. 19. A method of manufacturing a color filter in which a colorant is arranged on a substrate by an inkjet method, comprising: (1) having hydrophilicity at a light-irradiated portion having an ink-accepting property on the substrate and being irradiated with light or irradiated and heated. A step of providing a resin composition layer whose remaining amount decreases, (2) a step of irradiating a part of the resin layer with light, or a step of applying a light irradiation and heat treatment, (3) an inkjet on a non-irradiated part of the resin composition layer A method for producing a color filter, comprising: a step of applying a colorant by a method; and (4) a step of curing the colored resin composition layer by light irradiation and / or heating. 20. The method for producing a color filter according to claim 19, wherein the substrate has a light shielding portion, and a part of the resin layer on the light shielding portion is cured. 21. The width of the resin composition layer on the light-shielding portion irradiated with light in the step (2) is narrower than the width of the light-shielding portion.
A method for manufacturing the color filter according to. 22. The color filter according to claim 19, wherein the resin composition in which the residual amount of hydrophilic groups in the light-irradiated portion is reduced by light irradiation or light irradiation and heating contains a compound that produces an acid by light irradiation. Manufacturing method. 23. The method of manufacturing a color filter according to claim 19, wherein a curable second resin layer is formed on the resin layer. 24. The method for producing a color filter according to claim 23, wherein the second curable resin layer contains a resin composition curable by light irradiation and / or heat treatment. 25. The method of manufacturing a color filter according to claim 19, wherein an inorganic layer is formed on the resin layer by vapor deposition or sputtering.