JPH08230314A - Color filter, production thereof and liquid crystal panel using color filter - Google Patents

Abstract

PURPOSE: To suppress the density irregularity in the same pixel by forming a resin compsn. layer lowering the ink absorbability of a light irradiated part on a substrate and exposing the same patternwise to lower the ink absorbability of the exposed part and coloring an unexposed part by an ink jet system before curing the same. CONSTITUTION: When a color filter suitable for a color liquid crystal display is produced, a resin compsn. lowering the ink absorbability of a light irradiated part by light irradiation or light irradiation and heat treatment is applied to a substrate 1 having a black matrix formed thereon to form a resin layer 3. Next, the resin layer 3 of a part from which light is shaded by the black matrix 2 is exposed patternwise using a photomask 4 to react the resin compsn. to lower ink absorbability and, thereafter, an unexposed part is colored by using an ink jet head 5. Subsequently, the resin layer 3 is cured and a protective layer 6 is formed. By this method, a filter high in reliability free from trouble such as the density irregularity in the same pixel is inexpensively obtained.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for manufacturing a color filter suitable for a color liquid crystal display used in a color television, a personal computer, a pachinko game table, etc., a color filter obtained by the method, and the same. The present invention relates to a liquid crystal panel, and more particularly to a method for manufacturing a liquid crystal color filter using an inkjet recording technique. The present invention also relates to a liquid crystal color filter manufactured by using an inkjet recording technique, and a liquid crystal panel including the color filter.

[0002]

2. Description of the Related Art In recent years, with the development of personal computers, especially portable personal computers,
There is an increasing demand for liquid crystal displays, especially color liquid crystal displays. However, cost reduction is necessary for further widespread use, and in particular, there is an increasing demand for cost reduction of a color filter, which has a heavy weight in terms of cost.

Conventionally, various methods have been tried to meet the above-mentioned requirements while satisfying the required characteristics of the color filter, but a method that satisfies all the required characteristics has not yet been established. Each method will be described below.

The most frequently used first method is the dyeing method. The dyeing method is to first form a water-soluble polymer material, which is a material for dyeing, on a glass substrate, pattern it into a desired shape by a photolithography process, and then immerse the obtained pattern in a dyeing bath. Get a colored pattern. By repeating this three times, R, G,
The B color filter layer is formed.

Further, as another example of this dyeing method, Japanese Patent Application Laid-Open No.
In JP-A-288913, a photosensitive layer is provided on a substrate, patternwise is exposed to this, an unexposed portion is dyed, and this step is repeated three times to form three colors of R, G, and B. A method of manufacturing a color filter having a three-layer structure is described.

The second method is a pigment dispersion method, which is recently replacing the dyeing method. In this method, first, a photosensitive resin layer in which a pigment is dispersed is formed on a substrate, and this is patterned to obtain a monochromatic pattern. Further, this process is repeated three times to form R, G, and B color filter layers.

The third method is an electrodeposition method. In this method, first, a transparent electrode is patterned on a substrate, a pigment,
The first color is electrodeposited by immersing it in an electrodeposition coating solution containing resin, electrolytic solution, etc. This process is repeated three times to form R, G, and B color filter layers, and is finally baked.

As a fourth method, a pigment is dispersed in a thermosetting resin and printing is repeated three times to obtain R, G, and
After coating B separately, the colored layer is formed by thermosetting the resin. In any method, it is general to form a protective layer on the colored layer.

The common points of these methods are R,
It is necessary to repeat the same process three times in order to color the three colors of G and B, which is costly. Further, there is a problem that the yield decreases as the number of processes increases.
Further, in the electrodeposition method, since the pattern shape that can be formed is limited, the current technology is not suitable for a TFT. Further, in the printing method, it is difficult to form a fine pitch pattern because of poor resolution.

[0010]

In order to make up for these drawbacks, a method of manufacturing a color filter using an ink jet method is disclosed in JP-A-59-75205 and JP-A-63-75205.
It has been proposed in Japanese Patent No. 235901 or Japanese Patent Application Laid-Open No. 1-217320, but a sufficient method has not been obtained yet.

Therefore, an object of the present invention is to satisfy the necessary properties such as heat resistance, solvent resistance, and resolution that the conventional method has, and also to satisfy the ink jet suitability, and further shorten the process,
It is an object of the present invention to provide a method for manufacturing a color filter at low cost, a highly reliable color filter manufactured by the method, and a liquid crystal panel using the color filter. In the present invention, in particular, a highly reliable liquid crystal color that prevents color mixing and color loss when arranging colorants by ejecting ink using an inkjet method and suppresses the occurrence of density unevenness in the same pixel. A method for manufacturing a filter is provided.

[0012]

The above object can be achieved by the following means.

That is, the first invention is a method of manufacturing a color filter in which ink is ejected by using an ink jet method and the substrate is colored with each of red, green, and blue. (1) The substrate is irradiated with light. Alternatively, a step of forming a layer of a resin composition in which the ink absorptivity of a light-irradiated portion is reduced by light irradiation and heat treatment, and (2) a step of reducing the ink absorptivity of an exposed portion by pattern-exposing the resin layer ( 3) A step of ejecting ink using an ink jet method to attach ink droplets to the unexposed portion of the resin layer and the boundary portion between the unexposed portion and the exposed portion to color the unexposed portion, and (4) coloring And a step of curing the resin layer by light irradiation and / or heat treatment.

A second aspect of the present invention is a method for producing a color filter, in which ink is ejected using an ink jet method to color the substrate with red, green and blue colors.
(1) a step of forming a layer of a resin composition on the substrate by light irradiation or light irradiation and heat treatment to improve the ink absorbability of the light irradiated portion; and (2) pattern exposure of the resin layer to form an ink in the exposed portion. A step of improving the absorptivity and (3) a step of ejecting ink using an ink jet method to attach an ink droplet to the exposed portion of the resin layer and a boundary portion between the exposed portion and the unexposed portion to color the exposed portion And (4) a step of curing the colored resin layer by heat treatment, which is a method for manufacturing a color filter.

According to a first aspect of the invention, the substrate has a light-shielding portion, the width of the exposed portion of the resin layer formed on the substrate is narrower than the width of the portion shielded by the light-shielding portion, and the resin layer is cured. And forming a protective layer.

In a second aspect of the invention, the substrate has a light-shielding portion, the width of the exposed portion of the resin layer formed on the substrate is wider than the width of the opening formed by the light-shielding portion, and the cured resin layer is formed. Forming a protective layer thereon.

The present invention is also a color filter manufactured by the above method, which has a substrate facing the color filter and has a structure in which a liquid crystal compound is sealed between both substrates. It is a liquid crystal panel.

[0018]

DETAILED DESCRIPTION OF THE INVENTION The present invention will be described in detail below with reference to the drawings.

FIG. 1 is a process diagram showing a method for manufacturing a liquid crystal color filter according to the present invention, and shows an example of the structure of the liquid crystal color filter according to the present invention.

In the present invention, a glass substrate is generally used as a substrate, but the substrate is not limited to a glass substrate as long as it has necessary properties such as transparency and mechanical strength as a liquid crystal color filter.

FIG. 1A shows a diagram in which a black matrix 2 as a light shielding portion is formed on a glass substrate 1 having a light transmitting portion 7 (which is an opening formed by the black matrix 2). is there.

First, on the substrate 1 on which the black matrix 2 is formed, a resin composition whose ink absorptivity in the light-irradiated portion is lowered by light irradiation or light irradiation and heat treatment is applied, and prebaked if necessary. The resin layer 3 is formed (see FIG. 1).
(B)). In this example, an example in which the resin composition layer is reacted only by light irradiation is shown, but the resin composition may be a combination of light irradiation and heat treatment.

As a material forming such a resin layer, N is used.
-Methylol acrylamide, N-methoxymethyl acrylamide, N-ethoxymethyl acrylamide, N-
An acrylic polymer containing a monomer such as isopropoxymethylacrylamide, N-methylolmethacrylamide, N-methoxymethylmethacrylamide, and N-ethoxymethylmethacrylamide, and a diphenyliodonium salt,
A combination with an onium salt such as a triphenylsulfonium salt or a photoinitiator such as a halogenated triazine compound is particularly preferably used. Also polyvinyl alcohol,
A system in which a compound having a hydroxyl group such as hydroxypropyl cellulose is mixed with a crosslinking agent such as methylolated melamine or methylolated propylene urea and the above photoinitiator may be used. Further, in the composition, perylene as a sensitizer,
A compound such as anthracene may be added.

The resin layer can be formed by any coating method such as spin coating, roll coating, bar coating, spray coating, and dip coating, and is not particularly limited.

Then, the resin layer in the portion shielded by the black matrix 2 is preliminarily subjected to pattern exposure using the mask 4 to react the resin composition,
After reducing the ink absorbency (FIG. 1C), each color of R, G, and B is colored in the same layer by using the inkjet head 5 (FIG. 1D), and the ink is dried if necessary. I do. The exposure section 8 functions as a color mixing prevention wall and constitutes a non-colored section.

As the photomask 4 at the time of pattern exposure, one having an opening for exposing the resin layer on the light-shielding portion by the black matrix in a stripe shape or a matrix shape is used. At this time, considering that it is necessary to eject a large amount of ink in order to prevent color loss at the boundary between the black matrix and the opening 7 that is the light transmitting portion, the opening that is narrower than the light-shielding width of the black matrix. It is preferable to use a mask having

FIG. 2 is a plan view of a color filter of the present invention formed by exposing in stripes and in a matrix.

The pattern exposure may be performed in stripes as shown in FIG. 2 (a), and in this case, it is suitable for manufacturing a color filter having a stripe-shaped colored pattern, and in FIG. 2 (b). As shown in the drawing, it may be carried out in a matrix, and in this case, it is suitable for manufacturing a color filter having a matrix-shaped colored pattern.

In the present invention, for example, as shown in FIG.
Ink droplets 30 are applied to the unexposed portion (the portion surrounded by the exposed portion 8) to color the resin layer. However, the ink droplets should reach the boundary between the unexposed portion and the exposed portion. Even if ink that is difficult to spread is used, the unevenness of the density in the pixel is suppressed as a result.

Since the ink absorbency of the resin layer is reduced in the exposed area, it exhibits ink repellency as compared with the unexposed area, and the ink droplets adhering to the exposed area retain the ink absorbency in the unexposed area. As a result, the resin layer in the unexposed portion is uniformly colored up to the end portion, and white spots between the pixels and the black matrix can be suppressed.

As the ink used for coloring, it is possible to use both dye-based and pigment-based inks. Further, as the ink jet method, a bubble jet type using an electrothermal converter as an energy generating element, a piezo jet type using a piezoelectric element, or the like can be used, and a coloring area and a coloring pattern can be arbitrarily set. .

This example shows an example in which a black matrix is formed on the substrate, but the black matrix is formed on the resin layer after forming the resin layer or after coloring, or a color filter substrate. There is no particular problem even if it is formed on the side of the substrate that faces the substrate, and its form is not limited to this example. Further, as a method for forming the same, a method of forming a metal thin film on a substrate by sputtering or vapor deposition and patterning by a photolithography process, or a method of directly patterning a black photosensitive resin by a photolithography process is generally used. It is not limited to these.

Then, the colored resin layer is cured by irradiation with light and / or heat treatment (FIG. 1 (e)), and the protective layer 6 is formed (FIG. 1 (f)) if necessary.

As the protective layer, a photocurable type, a thermosetting type or a photothermal combined type resin material, an inorganic film formed by vapor deposition, sputtering or the like can be used.
It has transparency when used as a color filter, and I
Any material that can withstand the TO formation process, the alignment film formation process, etc. can be used.

In the present invention, since the ink droplets are also applied to the exposed portion, the condition of the exposed portion surface (wettability) becomes closer to that of the colored portion surface, and when a protective layer or an ITO film is formed on the resin layer, Adhesion is good and pinholes are less likely to occur.

FIG. 3 shows a method of manufacturing a color filter used in a liquid crystal panel in which a black matrix is provided on the opposing substrate.

The method of providing the black matrix not on the color filter side but on the opposing substrate is effective as a method of improving the aperture ratio.

A glass substrate 1 shown in FIG. 3 (a) is coated with a resin composition having water-based ink absorbability, and the ink absorbency of the light-irradiated portion is lowered by light irradiation or light irradiation and heat treatment. Pre-baking is performed according to the above conditions to form the resin layer 3 in which the ink absorptivity of the light-irradiated portion is lowered by light irradiation or light irradiation and heat treatment (FIG. 3B).

Then, pattern exposure is performed using the photomask 4 to reduce the ink absorbency of the exposed portion 8 of the resin layer 3 to form a color mixing prevention wall (FIG. 3).
(C)) Using the inkjet head 5, the unexposed portion is colored with each color of R, G, and B (FIG. 3D), and dried if necessary. In order to prevent color loss, it is important that the width of the exposed portion 8 which is also a color mixing prevention wall be narrower than the width of a black matrix (not shown) provided on the opposing substrate.

FIG. 4 shows another method of manufacturing the color filter for liquid crystal according to the present invention, and shows an example of the constitution of the color filter for liquid crystal according to the present invention.

FIG. 4A shows a glass substrate 1 having a light transmitting portion 7 (an opening formed by a black matrix).
It is the figure which formed the black matrix 2 on the top.

First, a resin composition that improves the ink absorbability of the light-irradiated portion by light irradiation or light irradiation and heat treatment is applied onto the substrate on which the black matrix 2 is formed, and if necessary, prebaking is performed to form a resin layer. 3 (FIG. 4)
(B)). In this example, an example in which the resin layer is reacted only by light irradiation is shown, but there is no problem because the resin composition uses both light irradiation and heat treatment.

As the material constituting the resin layer, an acrylic polymer such as polyphenoxyethyl methacrylate, phenoxyethyl methacrylate-methyl methacrylate copolymer, phenoxyethyl methacrylate-hydroxyethyl methacrylate, phenoxyethyl methacrylate, etc., and diphenyliodonium salt, A combination with an onium salt such as a triphenylsulfonium salt or a photoinitiator such as a halogenated triazine compound is particularly preferably used. In addition, compounds such as perylene and anthracene may be added as sensitizers to the composition.

Next, the resin layer 3 is preliminarily subjected to pattern exposure using the mask 4 to react the resin composition (FIG. 4 (c)), and then R and G are applied to the exposed area using the ink jet head 5. , B respectively (see FIG. 4).
(D)) Ink is dried if necessary. The unexposed portion 8 ′ functions as a color mixing prevention wall and constitutes a non-colored portion.

Then, the colored resin layer is cured by light irradiation and / or heat treatment (FIG. 4E), and the protective layer 6 is formed as necessary (FIG. 4F).

A photomask having an opening for exposing the portion of the resin layer 3 colored by the ink jet head 5 is used as the photomask for the pattern exposure. At this time, considering that it is necessary to eject a large amount of ink in order to prevent color loss at the boundary between the black matrix and the opening, an opening wider than the width of the opening 7 formed by the black matrix. It is preferable to use a mask having a portion.

FIG. 5 shows a method of manufacturing a color filter used for a liquid crystal panel in which a black matrix is provided on the opposing substrate.

On the glass substrate 1 shown in FIG. 5 (a), a resin composition that improves the ink absorbability of the light-irradiated portion by light irradiation or light irradiation and heat treatment is applied, and if necessary, prebaked to apply light. By irradiation or light irradiation and heat treatment, the resin layer 3 whose ink absorbency in the light irradiated portion is improved is formed (FIG. 5B).

Then, pattern exposure is performed using the photomask 4 to improve the ink absorbency of the exposed portion of the resin layer 3 (FIG. 5 (c)), and then the exposed portion is exposed to R using the ink jet head 5. , G, and B (see FIG. 5).
(D)), if necessary, dry. In order to prevent color loss, it is important to make the width of the unexposed portion 8'narrower than the width of the black matrix (not shown) provided on the opposing substrate.

6 and 7 show cross sections of a TFT color liquid crystal panel incorporating a color filter according to the present invention. The form is not limited to this example.

In the color liquid crystal panel, generally, the color filter substrate 1 and the counter substrate 14 are combined to form a liquid crystal compound 1
It is formed by enclosing 2. TFTs (not shown) and transparent pixel electrodes 13 are formed in a matrix inside one substrate 14 of the liquid crystal panel. In addition, a color filter 9 is installed inside the other substrate 1 so that RGB color materials are arranged at positions facing the pixel electrodes, and a transparent counter electrode (common electrode) 10 is provided on one surface of the color filter 9. It is formed. The black matrix 2 is usually formed on the color filter substrate side (FIG. 6), but is formed on the TFT substrate side facing the BM on array type liquid crystal panel (FIG. 7). Furthermore, an alignment film 11 is formed in the plane of both substrates, and by rubbing the alignment film 11, liquid crystal molecules can be aligned in a certain direction. A polarizing plate 15 is adhered to the outside of each glass substrate, and the liquid crystal compound 12 has a gap (2 to 5 μm) between these glass substrates.
m). A combination of a fluorescent lamp (not shown) and a scattering plate (not shown) is generally used as the backlight, and the liquid crystal compound 12 functions as an optical shutter that changes the transmittance of the backlight light. Display.

(Examples) The present invention will be described in detail below with reference to examples.

Example 1 10 parts by weight of a copolymer of N-methylolacrylamide and methyl methacrylate and triphenylsulfonium triflate (Midori Kagaku, trade name: TPS-105)
A composition having 0.2 parts by weight of water-based ink, which absorbs water and decreases in ink absorbability upon irradiation with light, was prepared.
As shown in FIG. 1, the glass substrate 1 on which the black matrix 2 is formed is spin-coated to a dry film thickness of 1 μm, and prebaked at 60 ° C. for 10 minutes to form the resin layer 3
Was formed.

Next, a part of the resin layer 3 on the black matrix 2 was pattern-exposed through a photomask 4 having an opening portion narrower than the width of the black matrix 2 to lower the ink absorbency of the exposed portion. The size of the pixel (opening 7) at this time is 80 μm × 130 as shown in FIG.
The width of the exposed portion, that is, the portion where the ink absorbency was lowered was 20 μm between the adjacent pixels.

Next, a matrix pattern was colored on the unexposed portion by using the ink jet head 5 with the dye inks of R, G and B. Immediately after ink landing, the dot diameter is 120 μm and the dot pitch is 120 μ
m, and drawing was performed as shown in FIG. Then 90
The ink was dried at 5 ° C. for 5 minutes. Subsequently, heat treatment was performed at 230 ° C. for 1 hour to cure the resin layer.

Further, a two-component thermosetting resin composition (SS-7625) was spin-coated on the resin layer so as to have a film thickness of 1 μm, prebaked at 90 ° C. for 30 minutes, and then at 230 ° C. for 30 minutes. Was heat-treated to form a protective layer, and the color filter of the present invention was prepared.

When the color filter for liquid crystal thus produced was observed with an optical microscope, no obstacles such as color mixture, color unevenness, color loss, and density unevenness in pixels were observed. Also, the adhesion between the resin layer and the protective layer was good.

When the TFT liquid crystal panel shown in FIG. 6 was prepared and driven by using the liquid crystal color filter thus prepared, a high-definition color display was possible.

Example 2 In Example 1, the dot pitch at the time of ink landing was set to 60.
Example 1 except that drawing was performed as shown in FIG. 9 instead of μm.
A color filter for liquid crystal was prepared in the same manner as in.

When the liquid crystal color filter thus produced was observed with an optical microscope, no obstacles such as color mixture, color unevenness, color loss, and density unevenness in pixels were observed. Also, the adhesion between the resin layer and the protective layer was good.

When the TFT liquid crystal panel shown in FIG. 6 was produced and driven by using the liquid crystal color filter thus produced, high-definition color display was possible.

Example 3 In Example 1, the pixel size was 100 μm × 200.
.mu.m, the width of the area between the pixels where the ink absorbency has decreased is 20 .mu.m, and the dot diameter immediately after ink landing is 80 .mu.m.
A color filter of the present invention was produced in the same manner as in Example 1 except that the dot pitch was 55 μm, the two rows were printed in the area where the ink absorbency was lowered, and the drawing was performed as shown in FIG.

When the liquid crystal color filter thus produced was observed with an optical microscope, no obstacles such as color mixture, color unevenness, color loss, and density unevenness in the pixel were observed. Also, the adhesion between the resin layer and the protective layer was good.

When the TFT liquid crystal panel shown in FIG. 6 was produced and driven by using the liquid crystal color filter thus produced, a high-definition color display was possible.

Example 4 In Example 1, the pixel size was 150 μm × 270.
.mu.m, the width of the part where the ink absorbency between the pixels has decreased is 30 .mu.m, and the dot diameter immediately after ink landing is 80 .mu.m.
m, the dot pitch was 55 μm, and three rows were printed for the area where the ink absorbency was lowered, and the color filter of the present invention was prepared in the same manner as in Example 1 except that the drawing was performed as shown in FIG.

When the color filter for liquid crystal thus produced was observed with an optical microscope, no obstacles such as color mixture, color unevenness, color loss, and density unevenness in pixels were observed. Also, the adhesion between the resin layer and the protective layer was good.

When the TFT liquid crystal panel shown in FIG. 6 was produced and driven by using the liquid crystal color filter thus produced, a high-definition color display was possible.

Example 5 In Example 1, the pixel size was 100 μm × 170.
.mu.m, the width of the part where the ink absorption between the pixels has decreased is 20 .mu.m, and the dot diameter immediately after the ink has landed is 50 .mu.m.
m, the dot pitch was 50 μm, and three rows were printed for the portion where the ink absorbency was lowered, and the color filter of the present invention was prepared in the same manner as in Example 1 except that the drawing was performed as shown in FIG.

When the color filter for liquid crystal thus produced was observed with an optical microscope, no obstacles such as color mixture, color unevenness, color loss, and density unevenness in the pixel were observed. Also, the adhesion between the resin layer and the protective layer was good.

When the TFT liquid crystal panel shown in FIG. 6 was produced and driven by using the liquid crystal color filter thus produced, highly vivid color display was possible.

Examples 6 to 11 As shown in FIG. 4, on a glass substrate 1 on which a black matrix 2 was formed, an acrylic copolymer having the composition shown below 97 parts by weight Methyl methacrylate 30 parts by weight Phenoxyethyl methacrylate A resin composition obtained by dissolving 60 parts by weight of hydroxyethyl methacrylate 10 parts by weight and 3 parts by weight of triphenylsulfonium triflate in ethyl cellosolve has a film thickness of 2
The resin layer 3 was formed by spin coating so as to have a thickness of μm and prebaking at 90 ° C. for 20 minutes.

Then, pattern exposure was performed from the substrate 1 side using the black matrix 2 as a mask, and heat treatment was performed on a hot plate at 120 ° C. for 1 minute. Next, after the exposed portion is colored with a matrix pattern using the R, G, and B dye inks using the inkjet head 5 under the same conditions as in Examples 1 to 5, the exposed portion is heated at 90 ° C. for 5 hours.
The ink was dried for one minute. Subsequently, heat treatment was performed at 200 ° C. for 60 minutes to cure the resin layer 3.

Further, a protective layer was formed in the same manner as in Example 1.

When the color filter for liquid crystal thus produced was observed with an optical microscope, no obstacles such as color mixture, color unevenness, color loss, and density unevenness in pixels were observed. The adhesion between the resin layer and the protective layer was also good.

When a TFT liquid crystal panel was prepared and driven as shown in FIG. 6 using the color filter for liquid crystal prepared in this manner, high-definition color display was possible.

[0076]

EFFECTS OF THE INVENTION By adopting the method for manufacturing a color filter for liquid crystal according to the present invention, color mixture, color unevenness, color loss,
It is possible to inexpensively manufacture a highly reliable color filter for liquid crystal, which is excellent in the adhesion of the protective layer and has no trouble such as uneven density in the pixel.

[Brief description of drawings]

FIG. 1 is a diagram showing a method of manufacturing a color filter for liquid crystal according to the present invention.

FIG. 2 is a plan view of a color filter for liquid crystal according to the present invention.

FIG. 3 is a diagram showing another method of manufacturing a color filter for liquid crystal according to the present invention.

FIG. 4 is a diagram showing another method for manufacturing a liquid crystal color filter according to the present invention.

FIG. 5 is a diagram showing another method of manufacturing a color filter for liquid crystal according to the present invention.

FIG. 6 is a sectional view of a liquid crystal panel equipped with a color filter for liquid crystal according to the present invention.

FIG. 7 is a cross-sectional view of a liquid crystal panel equipped with a color filter for liquid crystal according to the present invention.

FIG. 8 is a diagram illustrating a method of coloring ink in manufacturing a color filter in Example 1.

FIG. 9 is a diagram illustrating a method of coloring ink in manufacturing a color filter in Example 2.

FIG. 10 is a diagram illustrating a method of coloring ink in manufacturing a color filter in Example 3.

FIG. 11 is a diagram illustrating a method of coloring ink in manufacturing a color filter in Example 4.

FIG. 12 is a diagram illustrating a method of coloring ink in manufacturing a color filter in Example 5.

[Explanation of symbols]

 DESCRIPTION OF SYMBOLS 1 Substrate 2 Black matrix 3 Resin layer 4 Photomask 5 Inkjet head 6 Protective layer 7 Opening part (light transmitting part) by black matrix 8 Exposed part 8'Unexposed part 30 Ink dots

 ─────────────────────────────────────────────────── ─── Continued Front Page (72) Inventor Katsuhiro Shirota 3-30-2 Shimomaruko, Ota-ku, Tokyo Canon Inc. (72) Inventor Hideto Yokoi 3-30-2 Shimomaruko, Ota-ku, Tokyo Canon (72) Inventor Hiroshi Sato 3-30-2 Shimomaruko, Ota-ku, Tokyo Canon Inc.

Claims (9)

[Claims] 1. A method of manufacturing a color filter in which ink is ejected using an inkjet method and a substrate is colored with each of red, green, and blue. (1) Light irradiation or light irradiation and heat treatment on the substrate A step of forming a layer of a resin composition in which the ink absorbability of the light-irradiated portion is reduced by (2) a step of pattern-exposing the resin layer to reduce the ink absorbency of the exposed portion, and (3) an inkjet method. Ink is ejected using the above method to color the unexposed portion of the resin layer and ink droplets on the boundary between the unexposed portion and the exposed portion to color the unexposed portion, and (4) the colored resin layer And a step of curing by light irradiation and / or heat treatment. 2. A method of manufacturing a color filter in which ink is ejected using an inkjet method and the substrate is colored with each of red, green, and blue. (1) Light irradiation or light irradiation and heat treatment on the substrate A step of forming a layer of a resin composition in which the ink absorptivity of the light-irradiated portion is improved by (2) a step of pattern-exposing the resin layer to improve the ink absorptivity of the exposed part, and (3) an inkjet method Ink is discharged by using the method, and a step of coloring the exposed portion by exposing the exposed portion of the resin layer and an ink droplet on the boundary between the exposed portion and the unexposed portion, and (4) heat treating the colored resin layer. And a step of curing the color filter. 3. The method for manufacturing a color filter according to claim 1, wherein the substrate has a light shielding portion. 4. The method for manufacturing a color filter according to claim 2, wherein the substrate has a light shielding portion. 5. The method for manufacturing a color filter according to claim 3, wherein the width of the exposed portion of the resin layer formed on the substrate is narrower than the width of the portion shielded by the light shielding portion. 6. The method for producing a color filter according to claim 4, wherein the width of the exposed portion of the resin layer formed on the substrate is wider than the width of the opening formed by the light shielding portion. 7. The method for producing a color filter according to claim 1, wherein a protective layer is formed on the cured resin layer. 8. A color filter manufactured by the method according to claim 1. 9. A liquid crystal panel having a substrate facing the color filter according to claim 8, and having a structure in which a liquid crystal compound is sealed between both substrates.