JPH0862625A - Production of liquid crystal display substrate - Google Patents

Abstract

PURPOSE: To exactly execute the decision of shorting points without errors. CONSTITUTION: This process for producing liquid crystal display substrate comprises forming gate line 11 groups which extend in a direction (y) and are juxtaposed in a direction (x) and drain line 12 groups which are insulated from these gate line 11 groups, extend in the direction (x) and are juxtaposed in the direction (y) on the liquid crystal side of at least one transparent substrate of the transparent substrates arranged to face each other via liquid crystals. Further, the gate line 11 groups and the drain line 12 groups are respectively commonly connected by common gate lines and common drain lines 12A within the regions of the transparent substrates to be cut and discarded in later stages. The process described above includes an inspection stage for deciding shorting of the gate line 11 groups and the drain line 12 groups by impressing voltage between the common gate lines and the common drain lines 12A and detecting the gate lines 11 and drain lines 12 which release IR rays. The respective gate lines 11 and the respective drain lines 12 are provided with high-resistance parts (11R) 12R in the parts in proximity to the respective common gate lines and common drain lines 12A.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method of manufacturing a liquid crystal display substrate, and more particularly, when a so-called gate line group and drain line group are formed on the liquid crystal display substrate, the gate line and the drain line are short-circuited. The present invention relates to a method for manufacturing a liquid crystal display substrate including a step of inspecting whether or not there is any.

[0002]

2. Description of the Related Art For example, an active matrix type liquid crystal display substrate has a liquid crystal side surface of one of the transparent substrates which are arranged to face each other with a liquid crystal interposed therebetween.
A gate line group extending in the y direction and arranged in parallel in the x direction and a drain line group insulated from the gate line group and extending in the x direction and arranged in the y direction are formed.

Then, in each region surrounded by the gate line group and the drain line group intersecting with each other, a switching element which is turned on by a scanning signal from the gate line and a video signal from the drain line cause the switching element to operate. A so-called pixel is formed by forming a pixel electrode supplied through the pixel electrode.

By the way, in the manufacture of the liquid crystal display substrate having such a structure, it is inspected whether or not the gate line and the drain line are short-circuited at least when the gate line group and the drain line group are formed. .

In this inspection, for example, the gate line group is commonly connected to the peripheral surface of the same transparent substrate on which the gate line group and the drain line group are formed and to the area surface to be cut off in a later step. A common drain line formed by commonly connecting the common gate line and the drain line group, and applying a voltage between the common gate line and the common drain line and emitting a infrared ray; There is known a method of determining the presence / absence of a drain line with, for example, an infrared camera.

Such an inspection is carried out, for example, in Japanese Patent Laid-Open No. 1-1.
It is known from, for example, 85454.

[0007]

However, it has been pointed out that such an inspection may be difficult to determine a short-circuited portion.

That is, a gate line and a drain line extending from a short-circuited portion to a common gate line and a common drain line are used as heat sources, and heat is easily conducted over a relatively wide range from the heat source, and other adjacent gate lines are used. Or it will heat up to the drain wire, and as a result,
This was because it was difficult to detect the outstanding infrared radiation region.

Therefore, the present invention has been made under such circumstances, and an object thereof is a method of manufacturing a liquid crystal display substrate capable of accurately determining a shorted portion without error. To provide.

[0010]

In order to achieve such an object, the present invention comprises the following means.

Means 1. A group of gate lines extending in the y direction and juxtaposed in the x direction on the liquid crystal side surface of at least one of the transparent substrates arranged to face each other with the liquid crystal in between.
The gate line group and the drain are formed in a region of the transparent substrate which is insulated from the gate line group and extends in the x direction and is arranged in parallel in the y direction, and is cut and discarded in a later step. Line groups are commonly connected by a common gate line and a common drain line, respectively, and a voltage is applied between the common gate line and the common drain line, and infrared rays are emitted from the gate line and the drain line. In a method of manufacturing a liquid crystal display substrate, which includes an inspection step of determining a short circuit between the gate line and the drain line by detection, a high voltage is applied to a portion of each gate line and each drain line in the vicinity of the common gate line and the common drain line. It is characterized in that a resistance portion is provided.

Means 2. In the configuration according to means 1, at least one of the gate line and the drain line is formed of a laminated body including a transparent conductive layer, and the high resistance portion has a single-layer structure including only the transparent conductive layer. It is what

[0013]

According to the structure described in the means 1, when there is a short circuit between a certain gate line and the drain line, as in the conventional case, the gate line and the common drain which reach the common gate line from the short circuit point. The drain wire reaching the wire heats up due to Joule heat and emits infrared rays.

By detecting this infrared ray with, for example, an infrared camera or the like, it becomes possible to determine the short-circuited portion.

In this case, however, the high resistance part of the gate line and the high resistance part of the drain line generate heat particularly, and the amount of infrared radiation from this part also increases, and the gate line and the drain to be detected are detected. It is extremely easy to check the lines.

Therefore, conventionally, the heat is easily conducted over a relatively wide range from the heat source and the adjacent gate line or drain line is heated, and as a result, a remarkable infrared radiation region is detected. It becomes possible to eliminate the adverse effect that it is difficult to perform.

Therefore, it becomes possible to accurately determine the short-circuited portion without any error.

Further, according to the structure described in the means 2, since the other material layers other than the transparent conductive layer in the laminate can be formed in a pattern of cutting at the high resistance portion, the number of manufacturing steps is kept as it is. You will be able to.

[0019]

EXAMPLE FIG. 2 is a plan view showing one of the glass substrates arranged to face each other with a liquid crystal in between, and shows the glass substrate in one step of its manufacturing process.

In the figure, there is a glass substrate 10. A gate line group is formed on the main surface of the glass substrate 10 and includes gate lines 11 extending in the x direction and arranged in parallel in the y direction in the figure. Each gate line 11 forming this gate line group is formed of, for example, a sequentially laminated body of an Al layer and an ITO (Indium Tin Oxide) layer.

A drain line group is formed so as to cross the gate line group, that is, the drain line 12 extending in the y direction and juxtaposed in the x direction.
Each drain line 12 constituting this drain line group is also formed of, for example, a sequentially laminated body of an Al layer and an ITO layer.

Each gate line 11 and each drain line 12 are insulated by an interlayer insulating film (not shown), and they are not connected to each other.

In the area surrounded by the gate line 11 and the drain line 12, a switching element 13 which is turned on by a scanning signal from the gate line 11 and a video signal from the drain line 12 are provided in the switching element 1.
3 and the pixel electrode 14 supplied via 3 are formed.

The switching element 13 is composed of, for example, a thin film transistor (TFT), and its gate electrode is formed in the same step as the gate line 11, the gate insulating film is formed in the same step as the interlayer insulating film, and a semiconductor is further formed. After the layer (Poly-Si) is formed, the source and drain electrodes are formed in the same process as the drain line 12.

The pixel electrode 14 is composed of an ITO layer, and is formed in the same step as the ITO layer forming the drain layer 12, for example.

The surface-treated glass substrate 10 is provided with a region 10A (outside the frame indicated by a dotted line) which is cut and abandoned in a later step in the peripheral portion thereof, and the gate line 11 and The drain lines 12 extend and are connected to the common gate line 11A and the common drain line 12A formed in the respective regions.

In this embodiment, the common drain line 12A is formed on each of the x-direction sides, and every other drain line 12 is arranged on the common drain line 1 side.
It is designed to be connected to 2A.

Here, in each gate line 11 connected to the common gate line 11A, a high resistance portion 11R having a particularly high resistance in a portion close to the common gate line 11A.
Are formed. Similarly, a high resistance portion 12R having a particularly high resistance is formed in a portion of each drain line 12 connected to each common drain line 12A, which is close to the common drain line 12A.

These high resistance portions 11R and 12R are shown in an enlarged view of the high resistance portion 12R in the drain line 12 portion.
As shown in (4), it is formed only by an ITO layer having a relatively large area.

This ITO layer is formed integrally with the ITO layer which constitutes the drain line 12 made of a laminated body, and is manufactured as follows, for example.

That is, when forming the drain line 12, first, an Al layer is formed in a pattern cut at the high resistance portion, and an ITO layer formed by stacking with the Al layer is further formed into the high resistance. The portion 12R is formed in a pattern having a relatively large area.

In this case, the pattern of the high resistance portion 12 may be of any shape, but if it has a special shape as shown in the figure, it is easy to recognize the infrared rays as will be described later. The effect will come to be exhibited.

In the figure, an interlayer insulating film 15 is arranged at the intersection of the gate line 11 and the drain line 12, and the gate line 11 and the drain line 12 are connected to each other by a pinhole or the like formed in the interlayer insulating film 15. There may be a short circuit between them.

Next, in the liquid crystal display substrate constructed as described above, the inspection for whether or not there is a short circuit between the gate line and the drain line will be described.

First, in this inspection, as shown in FIG. 1, a voltage is applied by bringing the probes 20A and 20B into contact with the common gate line 11A and the common drain line 12A, respectively.

Thus, for example, when a short circuit is made between the gate line 11 and the drain line 12 shown in FIG. 3 through the interlayer insulating film, the Joule heat generated by the current flow has a particularly high resistance. Gate line 11
High resistance portion 11R and the high resistance portion 12 of the drain wire 12
Will occur in R. For this reason, infrared radiation becomes remarkable in the high resistance portions 11R and 12R.

Then, the liquid crystal display substrate is imaged by an infrared camera (not shown), and the image information whose output is digitized is stored in the frame memory 30 as shown in FIG.
It is designed to be stored in.

The information stored in the frame memory 30 is
Information of high brightness is stored at addresses (x ₀ , y ₀ ) corresponding to the positions of the high resistance parts 11R and 12R from which infrared rays are emitted.

Then, from the information in the frame memory 30, those arranged side by side in the x direction are added to obtain the signal shown in FIG. 7B, and those arranged side by side in the y direction are added. Then, the signal shown in FIG.

Each of these signals is input to the shift register, and the peak point thereof is detected and the address (x ₀ , y ₀ ) of the frame memory at the peak point is detected.

This address (x ₀ , y ₀ ) corresponds to the position of the intersection of the gate line 11 and the drain line 12 in FIG. 3, and it becomes possible to determine that a short circuit has occurred at this point.

According to the method of manufacturing a liquid crystal display substrate having such a structure, the high resistance portion 11R of the gate line 11 and the high resistance portion 12R of the drain line 12 generate heat particularly, and infrared rays from this portion are generated. The amount of radiation of the gate line 1 also increases, and for example, the gate line 1 to be detected by an infrared camera
1 and the drain wire 12 can be confirmed very easily.

Therefore, conventionally, the heat is easily conducted over a relatively wide range from the heat source and the adjacent gate line or drain line is heated, and as a result, a remarkable infrared radiation region is detected. It becomes possible to eliminate the adverse effect that it is difficult to perform.

The above embodiment will be described with reference to FIG.
The peaks of the respective signals shown in (b) and (c) come to appear clearly, and it is no longer the case that the peaks become smooth as in the past.

Therefore, it becomes possible to accurately determine the short-circuited portion without any error.

Further, since the high resistance portions 11R and 12R are formed in a pattern in which the material layers other than the transparent conductive layer of the laminate are cut at the high resistance portions, the number of manufacturing steps is unchanged. And will be able to be formed.

[0047]

As is apparent from the above description,
According to the method of manufacturing a liquid crystal display substrate according to the present invention, it becomes possible to accurately and accurately determine a short-circuited portion in the short-circuit inspection between the gate line and the drain line.

[Brief description of drawings]

FIG. 1 is an enlarged plan view showing an embodiment of a method for manufacturing a liquid crystal display substrate according to the present invention.

FIG. 2 is an overall plan view showing an embodiment of a method of manufacturing a liquid crystal display substrate according to the present invention.

FIG. 3 is an explanatory view showing an example of a method for manufacturing a liquid crystal display substrate according to the present invention.

FIG. 4 is an explanatory view showing an example of a method for manufacturing a liquid crystal display substrate according to the present invention.

[Explanation of symbols]

 11 …………………… Gate line 11A ……………… Common gate line 11R ……………… High resistance part 12 …………………… Drain line 12A ……………… Common drain line 12R ……………… High resistance part

Claims (2)

[Claims] 1. A group of gate lines extending in the y direction and arranged side by side in the X direction on the liquid crystal side surface of at least one of the transparent substrates arranged to face each other with a liquid crystal interposed therebetween, and the gate lines. A gate line group and a drain line group in a region of the transparent substrate, which is insulated from the group and extends in the x direction and is juxtaposed in the y direction, and is cut and abandoned in a later step. Are commonly connected by a common gate line and a common drain line, respectively, and a voltage is applied between the common gate line and the common drain line, and they are detected by detecting the gate line and the drain line emitting infrared rays. In the method of manufacturing a liquid crystal display substrate including the inspection step of determining a short circuit between the gate line and the drain line, the common gate line and the common The liquid crystal display method of manufacturing a substrate, characterized by comprising a portion of the high resistance provided in a portion close to the drain line. 2. The invention according to claim 1, wherein at least one of the gate line and the drain line is composed of a laminated body including a transparent conductive layer, and the high resistance portion is a single layer structure including only the transparent conductive layer. A method for manufacturing a liquid crystal display substrate, which is characterized by: