JPH0854504A - Infrared mirror - Google Patents

Infrared mirror

Info

Publication number
JPH0854504A
JPH0854504A JP21184494A JP21184494A JPH0854504A JP H0854504 A JPH0854504 A JP H0854504A JP 21184494 A JP21184494 A JP 21184494A JP 21184494 A JP21184494 A JP 21184494A JP H0854504 A JPH0854504 A JP H0854504A
Authority
JP
Japan
Prior art keywords
film
thickness
chromium
gold
chromium film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP21184494A
Other languages
Japanese (ja)
Inventor
Nobuo Funabiki
伸夫 船引
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Electric Glass Co Ltd
Original Assignee
Nippon Electric Glass Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Electric Glass Co Ltd filed Critical Nippon Electric Glass Co Ltd
Priority to JP21184494A priority Critical patent/JPH0854504A/en
Publication of JPH0854504A publication Critical patent/JPH0854504A/en
Pending legal-status Critical Current

Links

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  • Optical Filters (AREA)
  • Optical Elements Other Than Lenses (AREA)

Abstract

PURPOSE:To obtain stable and high reflectance without influences of contamination and scratches of a gold film and to produce a mirror at a low cost by forming a chromium film on a glass base body and controlling the thickness of the film to a specified range. CONSTITUTION:This IR mirror is obtd. by forming a chromium film 11 of 10-50Angstrom thickness on a glass base body and forming a gold film 12 o on the chromium film. Since the chromium film 11 is formed to <=50Angstrom thickness, it is possible to allow light beams to enter not the gold film 12 but the glass base body and to transmit through the chromium film 11 to be reflected by the gold film 12. When the chromium film 11 is formed to <=50Angstrom thickness, most of light entering the glass base body transmits through spaces among chromium particles in the chromium film 11, and then the light is reflected by the gold film 12. Thus, higher reflectance is obtd. However, it is not preferable to form the chromium film 11 to <=10Angstrom thickness because the adhesion strength with the base body decreases and the film is easily peeled. Therefore, preferable thickness of the chromium film is 15 to 25Angstrom .

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、半球レンズやプリズム
等の光学部品として適用できる赤外線ミラーに関するも
のである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an infrared mirror applicable as an optical component such as a hemispherical lens or a prism.

【0002】[0002]

【従来の技術】従来より赤外線ミラーの反射材料とし
て、赤外線域において非常に高い反射率を有する金が利
用されている。
2. Description of the Related Art Gold, which has a very high reflectance in the infrared region, has been used as a reflective material for infrared mirrors.

【0003】ただし金からなる膜(以下、金膜という)
は、ガラス等の誘電体からなる基体への付着力が非常に
弱く、これを基体に成膜しても簡単に剥がれてしまう。
そのため、これを基体上に成膜する場合には、まず基体
の表面に、誘電体との付着力が強いクロム膜を成膜した
後、さらにその上に金膜を成膜する方法が採られる。
However, a film made of gold (hereinafter referred to as a gold film)
Has a very weak adhesion to a substrate made of a dielectric such as glass, and is easily peeled off even when it is formed into a film on the substrate.
Therefore, when depositing this on a substrate, a method of first depositing a chromium film having strong adhesion to a dielectric on the surface of the substrate and then depositing a gold film on it is adopted. .

【0004】[0004]

【発明が解決しようとする課題】上記したような基体上
にクロム膜と金膜が形成されてなる赤外線ミラーは、金
膜側から光を入射させ、金膜で反射させるものである
が、金膜が埃や露結によって汚れても、金膜は極めて傷
に弱いため、クリーニング方法は、エアーや有機溶剤の
吹き付けに限られていた。また、万一、金膜に傷が入る
と、反射特性が損なわれて使用不可能になった。
An infrared mirror having a chromium film and a gold film formed on a substrate as described above makes light incident from the gold film side and reflects it at the gold film. Even if the film is contaminated by dust or dew, the gold film is extremely susceptible to scratches, so the cleaning method was limited to blowing air or an organic solvent. In addition, if the gold film were to be scratched, the reflection characteristics would be impaired, making it unusable.

【0005】そのため金膜の上に誘電体の膜を成膜し
て、金膜に汚れや傷が発生するのを防止することが試み
られているが、このような方法を採用すると、生産コス
トが大幅に上昇することになる。
Therefore, it has been attempted to form a dielectric film on the gold film to prevent the gold film from being soiled or scratched. Will rise significantly.

【0006】本発明は、上記事情に鑑みなされたもので
あり、基体材料としてガラスを使用し、この基体側から
光を入射させるため、金膜の汚れや傷に左右されること
なく、安定して高い反射率を得ることが可能であり、し
かも低コストで生産可能な赤外線ミラーを提供すること
を目的とするものである。
The present invention has been made in view of the above circumstances. Since glass is used as the base material and light is incident from the side of the base, it is stable without being affected by dirt or scratches on the gold film. It is an object of the present invention to provide an infrared mirror which can obtain high reflectance and can be manufactured at low cost.

【0007】[0007]

【課題を解決するための手段】本発明の赤外線ミラー
は、ガラス基体上にクロム膜が形成され、さらにその上
に金膜が形成されてなる赤外線ミラーにおいて、該クロ
ム膜の厚みが、10〜50Åであることを特徴とする。
The infrared mirror of the present invention is an infrared mirror in which a chromium film is formed on a glass substrate and a gold film is further formed thereon, and the thickness of the chromium film is 10 to 10. It is characterized by being 50Å.

【0008】[0008]

【作用】本発明の赤外線ミラーは、クロム膜の厚みが、
50Å以下であるため、金膜側ではなく、ガラス基体側
から光を入射させ、クロム膜を通して、金膜で光を反射
させることが可能となる。
In the infrared mirror of the present invention, the thickness of the chrome film is
Since it is 50 Å or less, it becomes possible to allow light to enter from the glass substrate side, not the gold film side, and reflect the light through the chromium film at the gold film.

【0009】すなわち従来の赤外線ミラーにおいては、
基体上にクロム膜を成膜する場合、成膜の作業性だけを
配慮しているため、約100〜1000Å程度の厚みの
ものが一般的であり、このようなクロム膜に光が入射し
ても、クロム粒子間を通る光は非常に少ない。
That is, in the conventional infrared mirror,
When forming a chrome film on a substrate, only the workability of the film formation is taken into consideration. Therefore, a chrome film having a thickness of about 100 to 1000 Å is generally used. However, very little light passes between the chrome particles.

【0010】従って基体の材料として透明なガラスを使
用し、この基体上に約100〜1000Å程度の厚みを
有するクロム膜を成膜し、さらにその上に金膜を成膜し
てなる赤外線ミラーを使用し、基体側から光を入射させ
ても、クロム膜で光が反射しやすくなり、金膜に光が到
達し難くなるため、高い反射率が得られない。
Therefore, an infrared mirror in which transparent glass is used as the material of the substrate, a chromium film having a thickness of about 100 to 1000 Å is formed on this substrate, and a gold film is further formed thereon Even if light is made incident from the side of the base material, the chromium film tends to reflect the light and makes it difficult for the light to reach the gold film, so that a high reflectance cannot be obtained.

【0011】しかしながら本発明の赤外線ミラーのよう
に、クロム膜の厚みを50Å以下にすると、ガラス基体
側から入射した光のほとんどがクロム膜のクロム粒子間
を通過することになり、それらが金膜で反射するため、
反射率が高くなる。ただしクロム膜の厚みが、10Å以
下になると、基体との付着力が低下し、膜はがれが生じ
やすくなるため好ましくない。本発明において、より好
ましいクロム膜の厚みは、15〜25Åである。
However, when the thickness of the chromium film is 50 Å or less as in the infrared mirror of the present invention, most of the light incident from the glass substrate side passes through between the chromium particles of the chromium film, and they are the gold film. Is reflected at
High reflectance. However, when the thickness of the chrome film is 10 Å or less, the adhesion to the substrate is lowered and the film peeling easily occurs, which is not preferable. In the present invention, the more preferable thickness of the chromium film is 15 to 25Å.

【0012】尚、本発明におけるクロム膜及び金膜の成
膜方法としては、スパッタリング法や真空蒸着法等が使
用可能である。
As the method for forming the chromium film and the gold film in the present invention, a sputtering method, a vacuum vapor deposition method or the like can be used.

【0013】[0013]

【実施例】以下、本発明の赤外線ミラーを実施例に基づ
いて詳細に説明する。
EXAMPLES The infrared mirror of the present invention will be described in detail below with reference to examples.

【0014】表1は、本発明の実施例(試料No.1〜
4)及び比較例(試料No.5〜7)を示すものであ
る。
Table 1 shows examples of the present invention (Sample Nos. 1 to 1).
4) and Comparative Examples (Sample Nos. 5 to 7).

【0015】[0015]

【表1】 [Table 1]

【0016】表中のNo.1〜6の各試料は、以下のよ
うにして作製した。
No. in the table Each sample of 1-6 was produced as follows.

【0017】まず基体としてホウケイ酸ガラス基板(5
0×50×0.8mm)を作製した後、その上に、表に
示した厚みのクロム膜をスパッタリング法で成膜した。
次いでこのクロム膜の上に、表に示した厚みの金膜をス
パッタリング法で成膜した。
First, a borosilicate glass substrate (5
(0 × 50 × 0.8 mm), a chromium film having the thickness shown in the table was formed thereon by a sputtering method.
Then, a gold film having the thickness shown in the table was formed on this chromium film by a sputtering method.

【0018】また表中のNo.7の試料は、上記と同様
のホウケイ酸ガラス基板を準備した後、その上に270
0Åの厚みの金膜をスパッタリング法で成膜することに
よって作製したものである。
Further, No. in the table Sample No. 7 was prepared by preparing a borosilicate glass substrate similar to the above and then 270
It is produced by forming a gold film having a thickness of 0Å by a sputtering method.

【0019】このようにして作製した各試料について、
1300nmおよび1550nmの波長における反射率
を測定すると共に、金膜の剥がれ試験を行い、その結果
を表1に示した。
For each of the samples prepared in this way,
The reflectance at the wavelengths of 1300 nm and 1550 nm was measured, and the peeling test of the gold film was performed. The results are shown in Table 1.

【0020】表1から明らかなように、実施例の各試料
は、1300nmの波長における反射率が90.3%以
上、1550nmの波長における反射率が90.8%以
上といずれも高く、しかも膜剥がれ試験においても、金
膜が剥がれることは全くなかった。
As is clear from Table 1, each of the samples of Examples has a high reflectance of 90.3% or more at a wavelength of 1300 nm and a reflectance of 90.8% or more at a wavelength of 1550 nm. Even in the peeling test, the gold film was not peeled at all.

【0021】それに対し、No.5の試料は、反射率は
高かったが、金膜の半分の面積で剥がれが生じた。また
No.6の試料は、金膜の剥がれは生じなかったが、実
施例の各試料に比べて反射率が低かった。さらにNo.
7の試料は、反射率は高かったが、金膜の全てが簡単に
剥がれた。
On the other hand, No. The sample of No. 5 had high reflectance, but peeling occurred in half the area of the gold film. In addition, No. In the sample of No. 6, peeling of the gold film did not occur, but the reflectance was lower than that of each sample of the example. Furthermore, No.
Sample No. 7 had a high reflectance, but the entire gold film was easily peeled off.

【0022】尚、上記の反射率は、自記分光光度計(株
式会社日立製作所製U−4000)によって測定したも
のであり、また膜剥がれ試験は、各試料の金膜をダイヤ
モンドカッターで約2mm間隔の格子状に傷を付け、そ
の全表面にわたって♯610スコッチテープ(スリーエ
ム株式会社製)を貼り付けた後、テープを真上方向に引
き剥がし、金膜の剥がれ具合を観察したものである。
The above reflectance was measured by a self-recording spectrophotometer (U-4000 manufactured by Hitachi, Ltd.). In the film peeling test, the gold film of each sample was spaced by about 2 mm with a diamond cutter. After the scratches were made in the shape of a grid and a # 610 Scotch tape (manufactured by 3M Co., Ltd.) was applied over the entire surface, the tape was peeled off right above, and the degree of peeling of the gold film was observed.

【0023】図1は、半球レンズ10の平面部にクロム
膜(厚み16Å)11が形成され、さらにその上に金膜
(厚み2500Å)12が形成された赤外線ミラーを使
用したレーザーダイオード(LD)部品を示す断面図で
ある。
FIG. 1 shows a laser diode (LD) using an infrared mirror in which a chrome film (thickness 16Å) 11 is formed on a flat surface of a hemispherical lens 10 and a gold film (thickness 2500Å) 12 is further formed on the chrome film 11. It is sectional drawing which shows a component.

【0024】図中、半球レンズ10は、BK−7(光ガ
ラス株式会社製)から作製され、その球面部には、Ti
2 膜層とSiO2 膜層からなる反射防止膜13が形成
されている。この半球レンズ10は、球面部の一部が金
属製キャップ14にはめ込まれ、この金属製キャップ1
4の内部には、LD素子15が取り付けられている。
In the figure, a hemispherical lens 10 is made of BK-7 (manufactured by Optical Glass Co., Ltd.), and its spherical surface has Ti.
An antireflection film 13 composed of an O 2 film layer and a SiO 2 film layer is formed. A part of the spherical surface of the hemispherical lens 10 is fitted into the metal cap 14, and the metal cap 1
An LD element 15 is attached to the inside of 4.

【0025】このようなLD部品において、LD素子1
5から光線が発せられると、光線のほとんどは、反射防
止膜13とクロム膜11を通過し、金膜12に到達して
矢印のように90°の角度で反射することになるため、
平板上に集光させて光学システムを組むことが可能であ
る。
In such an LD component, the LD element 1
When light rays are emitted from 5, most of the light rays pass through the antireflection film 13 and the chromium film 11, reach the gold film 12, and are reflected at an angle of 90 ° as shown by the arrow.
It is possible to form an optical system by condensing light on a flat plate.

【0026】また本発明の赤外線ミラーは、プリズムに
利用して光量の反射損失を少なくすることも可能であ
る。
The infrared mirror of the present invention can also be used as a prism to reduce the reflection loss of the amount of light.

【0027】[0027]

【発明の効果】以上のように本発明の赤外線ミラーは、
ガラス基体側から光を入射させるため、金膜の表面が汚
れたり、傷が付いたとしても、反射率が低下することが
なく、しかも金膜の上に誘電体の膜を成膜する必要がな
いため、低コストで生産することが可能であり、光学部
品として広範囲の用途が期待できる。
As described above, the infrared mirror of the present invention is
Since light is incident from the glass substrate side, the reflectance does not decrease even if the surface of the gold film becomes dirty or scratched, and it is necessary to form a dielectric film on the gold film. Since it is not available, it can be produced at low cost and can be expected to have a wide range of uses as an optical component.

【図面の簡単な説明】[Brief description of drawings]

【図1】球面レンズを金属製キャップにはめ込んだLD
部品を示す断面図である。
[Figure 1] LD with a spherical lens fitted in a metal cap
It is sectional drawing which shows a component.

【符号の説明】[Explanation of symbols]

10 半球レンズ 11 クロム膜 12 金膜 13 反射防止膜 14 金属製キャップ 15 LD素子 10 hemispherical lens 11 chrome film 12 gold film 13 antireflection film 14 metal cap 15 LD element

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】 ガラス基体上にクロム膜が形成され、さ
らにその上に金膜が形成されてなる赤外線ミラーにおい
て、該クロム膜の厚みが、10〜50Åであることを特
徴とする赤外線ミラー。
1. An infrared mirror in which a chromium film is formed on a glass substrate, and a gold film is further formed on the chromium film, wherein the thickness of the chromium film is 10 to 50 Å.
JP21184494A 1994-08-11 1994-08-11 Infrared mirror Pending JPH0854504A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP21184494A JPH0854504A (en) 1994-08-11 1994-08-11 Infrared mirror

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP21184494A JPH0854504A (en) 1994-08-11 1994-08-11 Infrared mirror

Publications (1)

Publication Number Publication Date
JPH0854504A true JPH0854504A (en) 1996-02-27

Family

ID=16612529

Family Applications (1)

Application Number Title Priority Date Filing Date
JP21184494A Pending JPH0854504A (en) 1994-08-11 1994-08-11 Infrared mirror

Country Status (1)

Country Link
JP (1) JPH0854504A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN114577965A (en) * 2022-03-25 2022-06-03 陕西周源光子科技有限公司 Photoelectric detection system for liquid chromatograph

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN114577965A (en) * 2022-03-25 2022-06-03 陕西周源光子科技有限公司 Photoelectric detection system for liquid chromatograph

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