JPH0845424A - Thin plate of iron-nickel alloy with excellent etching characteristic for color picture tube - Google Patents

Thin plate of iron-nickel alloy with excellent etching characteristic for color picture tube

Info

Publication number
JPH0845424A
JPH0845424A JP17539394A JP17539394A JPH0845424A JP H0845424 A JPH0845424 A JP H0845424A JP 17539394 A JP17539394 A JP 17539394A JP 17539394 A JP17539394 A JP 17539394A JP H0845424 A JPH0845424 A JP H0845424A
Authority
JP
Japan
Prior art keywords
thin plate
segregation
etching
shadow mask
less
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP17539394A
Other languages
Japanese (ja)
Inventor
Kiyoshi Tsuru
清 鶴
Tadashi Inoue
正 井上
Naoji Yamanouchi
直次 山之内
Isamu Kage
勇 鹿毛
Hiroshi Wakasa
浩 若狭
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
JFE Engineering Corp
Original Assignee
NKK Corp
Nippon Kokan Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NKK Corp, Nippon Kokan Ltd filed Critical NKK Corp
Priority to JP17539394A priority Critical patent/JPH0845424A/en
Publication of JPH0845424A publication Critical patent/JPH0845424A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To provide a thin plate of Fe-Ni alloy ensuring free from irregular etching at a shadow mask etching process. CONSTITUTION:In this thin plate, the component segregation rate A of nickel determined by the following formula is 10% or less, a segregated section in unit volume is 14vol% or more, and the length of one segregated section immediately before an etching process is 35mm or above. The formula is A=[{(component concentration in segregated area)-(mean component concentration)}/(mean component concentration]X100(%).

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、カラーテレビブラウン
管用シャドウマスク材やアパーチヤーグリル素材として
使用される、エッチング特性に優れたカラー受像管用F
e−Ni系合金薄板に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a color picture tube F which is used as a shadow mask material or an aperture grill material for a color television CRT and has excellent etching characteristics.
The present invention relates to an e-Ni alloy thin plate.

【0002】[0002]

【従来の技術】カラーテレビブラウン管用シャドウマス
ク材やアパーチヤーグリル素材としては、一般に軟鋼が
知られている。カラーテレビブラウン管内では、3個の
電子銃から出る電子ビームが、シャドウマスクにあけた
微小孔を通過して、蛍光スクリーン上の所定の一点に精
密に照射されることにより、特定の色調が与えられるも
のである。
2. Description of the Related Art Mild steel is generally known as a shadow mask material for color television picture tubes and an aperture grill material. In a color television cathode ray tube, electron beams emitted from three electron guns pass through minute holes formed in a shadow mask and are precisely applied to a predetermined point on a fluorescent screen to give a specific color tone. It is what is done.

【0003】ところがこの様なブラウン管を連続使用す
ると、電子ビームが照射されるガラス体に支持された蛍
光面や、シャドウマスクの温度が次第に高くなってく
る。特にシャドウマスクは、前記ガラス体に支持された
蛍光面に比べ相当高温になり、しかもシャドウマスクの
方がガラス体に比べ、熱膨張係数がはるかに大きいた
め、相互に位置ずれが起って電子ビームの照射が正確に
行われず、画像が不鮮明となる。このためシャドウマス
クの懸架装置となる支持体の構造を工夫して、それを補
償することも行われているが十分ではない。
However, when such a cathode ray tube is continuously used, the temperature of the fluorescent screen supported by the glass body irradiated with the electron beam and the shadow mask are gradually increased. In particular, the shadow mask has a considerably higher temperature than the fluorescent screen supported by the glass body, and the thermal expansion coefficient of the shadow mask is much larger than that of the glass body. The beam is not radiated accurately and the image becomes unclear. For this reason, it has been attempted to devise a structure of a support body which is a suspension device of the shadow mask to compensate for it, but this is not sufficient.

【0004】したがって、シャドウマスク材としては、
アンバーのような鉄−ニッケル系合金等の低熱膨張材料
を、用いることが提案されていた。しかしながら、この
ような鉄−ニッケル系合金からなるシャドウマスク材
は、シャドウマスクを製造する工程でのフォトエッチン
グ穿孔時に、エッチングされたシャドウマスクを斜光で
目視観察すると、エッチングむらと称する欠陥が発生す
ることが分かった。このむらは、Niを30〜55wt
%含有するFe−Ni合金、あるいは副成分1wt%以
下を含有するFe−Ni系合金からなるシャドウマスク
素材において顕著となる。このようなむらを改善すべ
く、特開昭60−56053に示されるように、成分偏
析率を10%以下、単位体積中の偏析部を5容積%以下
としたインバー材も提案されている。
Therefore, as a shadow mask material,
It has been proposed to use low thermal expansion materials such as iron-nickel alloys such as Amber. However, such a shadow mask material made of an iron-nickel-based alloy causes defects called etching unevenness when the etched shadow mask is visually observed with oblique light during photoetching perforation in the step of manufacturing the shadow mask. I found out. This unevenness contains Ni of 30 to 55 wt.
% Of Fe-Ni alloy or Fe-Ni alloy containing 1 wt% or less of sub-components. In order to improve such unevenness, an invar material having a component segregation ratio of 10% or less and a segregation portion in a unit volume of 5% by volume or less has been proposed as disclosed in JP-A-60-56053.

【0005】[0005]

【発明が解決しようとする課題】しかしながら、この技
術では通常の孔径ピッチのシャドウマスクのスジムラは
改善できるが、孔径ピッチが300μm以下の超高精細
シャドウマスクとしてエッチングすると、インバー材特
有のむらは依然として発生するという問題点がある。
However, although this technique can improve the streak unevenness of a shadow mask having a normal hole diameter pitch, when it is etched as an ultra-high-definition shadow mask having a hole diameter pitch of 300 μm or less, the unevenness peculiar to the Invar material still occurs. There is a problem of doing.

【0006】このエッチングむらとは、エッチングマス
クを斜光で見ると直線状に見えるむらであり、Fe−N
i系合金薄板を超高精細シャドウマスクのパターンにエ
ッチングしたときに、著しく強く発生する。このむら
は、製品上で画面の色ズレの原因となるため、解消が強
く望まれていた。
This etching unevenness is an unevenness that appears linear when the etching mask is viewed with oblique light.
It occurs remarkably strongly when an i-based alloy thin plate is etched into a pattern of an ultra-high definition shadow mask. Since this unevenness causes color shift of the screen on the product, it has been strongly desired to eliminate it.

【0007】この発明は、従来技術の上述のような問題
点を解消するためになされたものであり、Fe−Ni系
合金、特にNiを30〜55wt%含有するFe−Ni
合金、並びにさらに副成分1wt%以下を含有するFe
−Ni系合金からなる、孔径300μm以下の高精細タ
イプシャドウマスクの製造において、エッチングむらの
発生しない素材を提供することを目的としている。
The present invention has been made in order to solve the above-mentioned problems of the prior art, and is an Fe-Ni alloy, particularly Fe-Ni containing 30 to 55 wt% of Ni.
Fe, containing alloys and 1% by weight or less of subcomponents
An object of the present invention is to provide a material that does not cause uneven etching in the production of a high-definition type shadow mask made of a Ni-based alloy and having a pore size of 300 μm or less.

【0008】[0008]

【問題を解決するための手段】この発明に係るエッチン
グ特性に優れたカラー受像管用Fe−Ni系合金薄板
は、数2で規定されるNiの成分偏析率Aが10%以
下、単位体積中の偏析部が14容積%以上、かつエッチ
ング直前の偏析部の1つの長さが35mm以上であるも
のである。
The thin Fe-Ni alloy plate for a color picture tube according to the present invention, which is excellent in etching characteristics, has a Ni component segregation ratio A of 10% or less, which is defined by the equation 2, in a unit volume. The segregation portion is 14% by volume or more, and one length of the segregation portion immediately before etching is 35 mm or more.

【0009】[0009]

【数2】 [Equation 2]

【0010】[0010]

【作用】本発明者は低熱膨張で優れた軟磁気特性を有す
るNiを30〜50wt%含有し、さらに副成分1wt
%以下を含有するFe−Ni系合金薄板のエッチングむ
らについて、種々の研究を行った結果、Ni重量%が3
0wt%以上になると、強いエッチングムラが現れるこ
と、更にはNi濃度と強い相関があることがわかった。
The present inventor contains 30 to 50 wt% of Ni having low thermal expansion and excellent soft magnetic characteristics, and further contains 1 wt% of a subcomponent.
As a result of various studies on the etching unevenness of the Fe-Ni alloy thin plate containing 1% or less, the Ni weight% is 3%.
It was found that when the content is 0 wt% or more, strong etching unevenness appears and there is a strong correlation with the Ni concentration.

【0011】すなわち、本発明者らは、数3で規定され
るNiの成分偏析率Aが10%以下、単位体積中の偏析
部が14容積%以上、かつエッチング直前の偏析部の1
つの長さが35mm以上であるようにすることにより、
エッチング時のむらの発生を抑制することができるとい
うことを見い出した。
That is, the present inventors have found that the Ni component segregation ratio A defined by the equation 3 is 10% or less, the segregation portion in a unit volume is 14% by volume or more, and the segregation portion 1 immediately before etching is 1%.
By setting the length of one to be 35 mm or more,
It was found that unevenness during etching can be suppressed.

【0012】[0012]

【数3】 (Equation 3)

【0013】偏析部を、図1に示すように、シャドウマ
スク1をエッチング液でエッチングする(エッチング液
は塩化第二鉄で腐食する)と、Ni濃化部2が線状に明
瞭に表れる。
As shown in FIG. 1, when the shadow mask 1 is etched in the segregated portion with an etchant (the etchant is corroded by ferric chloride), the Ni-enriched portion 2 appears clearly linearly.

【0014】上記の偏析部では、シャドウマスク1表面
上で特異な凹凸は見られず、連続性をなしているが、図
2に示すX線強度からわかるように、偏析部ではNi濃
度の非連続性が見られ、明らかにNi偏析部が存在する
ことがわかる。また図2からは、X線強化部の大きさか
ら、偏析部の重量%も測定でき、また偏析部とそうでな
い部とは、各々の平均成分濃度との対比により、理論的
にも区別し得るものである。そして、本発明における偏
析部は、平均成分濃度に対するNi濃化部を意味してお
り、また偏析域は各偏析部を総合したもので、偏析域の
成分濃度は各偏析部の成分濃度の総合濃度(平均濃度)
を示すものである。
In the above segregation portion, no peculiar unevenness is seen on the surface of the shadow mask 1 and it is continuous, but as can be seen from the X-ray intensity shown in FIG. Continuity is seen, and it is clear that there is a Ni segregation part. Further, from FIG. 2, the weight% of the segregated portion can be measured from the size of the X-ray strengthened portion, and the segregated portion and the other portion can be theoretically distinguished from each other by comparing the respective average component concentrations. I will get it. The segregation portion in the present invention means a Ni enriched portion with respect to the average component concentration, and the segregation region is a total of each segregation portion, and the component concentration in the segregation region is the total concentration of components in each segregation portion. Concentration (average concentration)
Is shown.

【0015】次に本発明素材を構成するNi偏析部等の
限定理由を説明する。数4で規定されるNiの成分偏析
率Aを10%以下とする理由は、Niの成分偏析が10
%を超えると母材とのエッチング性の差が顕著になり、
本発明で特徴とする高精細マスクのエッチング時のむら
が顕著になるためである。
Next, the reasons for limiting the Ni segregation portion and the like which constitute the material of the present invention will be described. The reason why the Ni component segregation ratio A defined by the equation 4 is 10% or less is that the Ni component segregation is 10% or less.
%, The difference in etching property from the base material becomes remarkable,
This is because unevenness during etching of the high-definition mask, which is a feature of the present invention, becomes remarkable.

【0016】[0016]

【数4】 [Equation 4]

【0017】偏析部を単位体積中で14%以上とする理
由は、14%未満であると、偏析部の占める割合が小さ
く、そのためかえって偏析部でない部分と比較して、ム
ラ部として顕著に見えてくるからである。
The reason why the segregation portion is set to 14% or more in a unit volume is that if it is less than 14%, the proportion of the segregation portion is small, so that it appears conspicuously as an uneven portion as compared with the non-segregation portion. Because it will come.

【0018】また、偏析部の1つの長さを、エッチング
前の材料で35mm以上とする理由は、35mm未満だ
と、偏析部の単位体積率が14%以上でも平板内に顕著
に見られるが、35mm以上では全体の中に占める割合
が増え、ムラとして顕著に見えてこなくなるからであ
る。
The reason why the length of one of the segregated portions is 35 mm or more in the material before etching is that if the length is less than 35 mm, it can be remarkably observed in the flat plate even if the unit volume ratio of the segregated portion is 14% or more. ., 35% or more, the proportion of the total increases, and it becomes less visible as unevenness.

【0019】このように、Niの偏析率、偏析部の分布
状態、大きさを厳密に管理することにより、始めて孔径
ピッチ300μm以下の超高精細マスクで、エッチング
むらの発生が抑制される。しかも、低熱膨張率であるこ
れらの材料の特性により、画像は一段と鮮明になるとい
う極めて優れた特徴を有する。これらの条件を満たすた
めの製造手段としては、800℃以上の温度での熱間加
工での累積圧下率を、98.1%以上99.8%以下と
する。これは、図3の累積圧下率と偏析部の単位体積中
の割合、偏析部の一つの長さおよびNiの成分偏析率と
の関係を示すグラフのように、累積圧下率98.1%未
満では、Niの成分偏析率が10%を超え、偏析部のひ
とつの長さが35mm未満となり、エッチングムラが発
生し、また、累積圧下率99.8%超えでは、偏析部の
単位体積中の割合が14%未満となり、各々エッチング
むらが発生するからである。
By strictly controlling the Ni segregation rate, the distribution state and the size of the segregated portions in this manner, the occurrence of etching unevenness can be suppressed for the first time in an ultrahigh-definition mask having a hole diameter pitch of 300 μm or less. Moreover, due to the characteristics of these materials having a low coefficient of thermal expansion, the image has an extremely excellent feature that it becomes clearer. As a manufacturing means for satisfying these conditions, the cumulative reduction rate in hot working at a temperature of 800 ° C. or higher is set to 98.1% or more and 99.8% or less. As shown in the graph of FIG. 3, which shows the relationship between the cumulative reduction ratio, the ratio of the segregation portion in the unit volume, the length of one of the segregation portions and the Ni component segregation ratio, the cumulative reduction ratio is less than 98.1%. When the Ni component segregation rate exceeds 10%, the length of one of the segregation portions is less than 35 mm, etching unevenness occurs, and when the cumulative reduction rate exceeds 99.8%, This is because the ratio becomes less than 14%, and uneven etching occurs in each.

【0020】[0020]

【実施例】表1に示される本発明合金の内No.1〜
4、8は造塊した後、分塊圧延してスラブとし、No.
5〜7、9は連続鋳造して連続鋳造スラブとした後、加
熱炉で加熱して熱間圧延を行い、熱延鋼板を得た。この
ときの熱間圧延は、800℃以上の累積圧下率が、9
8.1%以上99.8%以下となるようにした。
EXAMPLES Among the alloys of the present invention shown in Table 1, No. 1 to
Nos. 4 and 8 were ingot-cast and then slab-rolled to form slabs.
Nos. 5 to 7 and 9 were continuously cast to form a continuously cast slab, which was then heated in a heating furnace to perform hot rolling to obtain a hot rolled steel sheet. In the hot rolling at this time, the cumulative rolling reduction of 800 ° C. or higher was 9
It was set to be not less than 8.1% and not more than 99.8%.

【0021】そして、得られた熱延鋼板を素材として冷
間圧延を行い板厚0.12mm材の薄板を得た。
Then, cold rolling was performed using the obtained hot rolled steel sheet as a raw material to obtain a thin sheet having a thickness of 0.12 mm.

【0022】このようにして製造された薄板から、表1
に示す試験材No.1〜9の試験材を採取し、それぞれ
の試験材に孔径230μm、孔ピッチ300μmでフォ
トエッチングを施した後、エッチングむらの有無を調査
した。この結果を表1に示す。
From the thin plate produced in this way, Table 1
Test material No. The test materials 1 to 9 were sampled, and each test material was photoetched with a hole diameter of 230 μm and a hole pitch of 300 μm, and then the presence or absence of etching unevenness was investigated. Table 1 shows the results.

【0023】[0023]

【表1】 [Table 1]

【0024】表1に示すように、本発明により得られた
合金からなるシャドウマスク素材は、従来のFe−Ni
系合金のシャドウマスク素材にくらべ,エッチング時の
むらの発生はなく、シャドウマスク用素材として優れた
材料であることが明らかである。
As shown in Table 1, the shadow mask material made of the alloy obtained by the present invention is a conventional Fe--Ni alloy.
Compared to the shadow mask material made of the system alloy, there is no unevenness during etching, and it is clear that it is an excellent material for the shadow mask.

【0025】[0025]

【発明の効果】この発明により、シャドウマスクにエッ
チング時のむらが発生しない。
According to the present invention, the shadow mask is free from unevenness during etching.

【図面の簡単な説明】[Brief description of drawings]

【図1】エッチング後のNi偏析部を示す概略図。FIG. 1 is a schematic diagram showing a Ni segregation portion after etching.

【図2】図1のI−I断面におけるNi及びFeのX線
強度分布の測定結果を示すチャートである。
FIG. 2 is a chart showing the measurement results of X-ray intensity distributions of Ni and Fe in the II cross section of FIG.

【図3】偏析部の単位体積中の割合、Niの成分偏析率
および偏析部の一つの長さと累積圧下率との関係を示す
グラフである。
FIG. 3 is a graph showing the relationship between the ratio of the segregation portion per unit volume, the Ni component segregation rate, the length of one segregation portion, and the cumulative reduction rate.

───────────────────────────────────────────────────── フロントページの続き (72)発明者 鹿毛 勇 東京都千代田区丸の内一丁目1番2号 日 本鋼管株式会社内 (72)発明者 若狭 浩 東京都千代田区丸の内一丁目1番2号 日 本鋼管株式会社内 ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Inventor Isamu Kage 1-2-1, Marunouchi, Chiyoda-ku, Tokyo Nihon Kokan Co., Ltd. (72) Inventor Hiroshi Wakasa 1-2-1 Marunouchi, Chiyoda-ku, Tokyo Date Main Steel Pipe Co., Ltd.

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】 数1で規定されるNiの成分偏析率Aが
10%以下、単位体積中の偏析部が14容積%以上、か
つエッチング直前の偏析部の1つの長さが35mm以上
であることを特徴とするエッチング特性に優れたカラー
受像管用Fe−Ni系合金薄板。 【数1】
1. The Ni component segregation ratio A defined by the equation 1 is 10% or less, the segregation portion in a unit volume is 14% by volume or more, and the length of one segregation portion immediately before etching is 35 mm or more. An Fe-Ni alloy thin plate for a color picture tube, which is excellent in etching characteristics. [Equation 1]
JP17539394A 1994-07-27 1994-07-27 Thin plate of iron-nickel alloy with excellent etching characteristic for color picture tube Pending JPH0845424A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP17539394A JPH0845424A (en) 1994-07-27 1994-07-27 Thin plate of iron-nickel alloy with excellent etching characteristic for color picture tube

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17539394A JPH0845424A (en) 1994-07-27 1994-07-27 Thin plate of iron-nickel alloy with excellent etching characteristic for color picture tube

Publications (1)

Publication Number Publication Date
JPH0845424A true JPH0845424A (en) 1996-02-16

Family

ID=15995315

Family Applications (1)

Application Number Title Priority Date Filing Date
JP17539394A Pending JPH0845424A (en) 1994-07-27 1994-07-27 Thin plate of iron-nickel alloy with excellent etching characteristic for color picture tube

Country Status (1)

Country Link
JP (1) JPH0845424A (en)

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