JPH08335607A - One-layer wiring tcp tape - Google Patents

One-layer wiring tcp tape

Info

Publication number
JPH08335607A
JPH08335607A JP13832095A JP13832095A JPH08335607A JP H08335607 A JPH08335607 A JP H08335607A JP 13832095 A JP13832095 A JP 13832095A JP 13832095 A JP13832095 A JP 13832095A JP H08335607 A JPH08335607 A JP H08335607A
Authority
JP
Japan
Prior art keywords
layer
wiring
copper foil
tape
solder resist
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP13832095A
Other languages
Japanese (ja)
Inventor
Kenji Yamaguchi
健司 山口
Osamu Yoshioka
修 吉岡
Masahiko Saeki
雅彦 佐伯
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Cable Ltd
Original Assignee
Hitachi Cable Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Cable Ltd filed Critical Hitachi Cable Ltd
Priority to JP13832095A priority Critical patent/JPH08335607A/en
Publication of JPH08335607A publication Critical patent/JPH08335607A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001Technical content checked by a classifier
    • H01L2924/0002Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • H05K1/03Use of materials for the substrate
    • H05K1/0313Organic insulating material
    • H05K1/032Organic insulating material consisting of one material
    • H05K1/0346Organic insulating material consisting of one material containing N
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/02Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
    • H05K3/022Processes for manufacturing precursors of printed circuits, i.e. copper-clad substrates
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/30Assembling printed circuits with electric components, e.g. with resistor
    • H05K3/32Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits
    • H05K3/34Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits by soldering
    • H05K3/3452Solder masks

Landscapes

  • Wire Bonding (AREA)

Abstract

PURPOSE: To obtain TCP strong in a repeated bending test by a method wherein a one-layer wiring TCP tape with no adhesive is composed of a polyimide base film, a copper foil layer and a solder resist coat film of a polyimide solder resist ink. CONSTITUTION: A one-layer wiring TCP tape is formed by using no adhesive with a base film 3 of a thickness 6 to 75μm; a copper foil layer 1 formed with a one-layer wiring layer of a thickness 4 to 25μm and of a pitch between wires 100μm or less; and a solder resist coating layer 2 of a thickness 6 to 60μm covering a wiring layer. The copper foil layer 1 is obtained by casting of the base film 3 and cure heat treatment. After the solder resist coating layer 2 is subjected to the cure heat treatment at 350 deg.C or less, the characteristics are heat pulling strength is 20 to 30kgf/mm<2> and bending elastic coefficient is 3000 to 5000kgf/m<2> . The solder resist coating layer 2 is an epoxy resin ink polyimide system ink.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、TCP(Tape C
arrier Package)用のTAB(Tape
Automated Bonding)テープに関
し、特に接着剤のない1層配線TCPテープで微細パタ
ーン(配線間のピッチが100μm以下)の配線間の保
護並びに絶縁のための被覆層を有するTCP用TABテ
ープに関するものである。
BACKGROUND OF THE INVENTION The present invention relates to TCP (Tape C
TAB (Tape) for Arriage Package
The present invention relates to an Automated Bonding tape, and more particularly to a TCP TAB tape having an adhesive-free single-layer wiring TCP tape having a fine pattern (pitch between wirings is 100 μm or less) between wirings for protection and insulation. .

【0002】[0002]

【従来の技術】TCP用TABテープにおいて、配線間
の保護並びに絶縁のための被覆層を有する構造として、
従来は、被覆層となるソルダレジストインク(エポキシ
系樹脂)、あるいはポリイミド系樹脂インクを、例え
ば、印刷法で所定の厚さ約20μm厚さに塗布後、大気
中で120〜350°Cに加熱し、1〜5時間ベーク処
理して乾燥並びに反応凝固をさせて被覆層を形成するこ
とによってTCP用TABテープを製造している。
2. Description of the Related Art In a TCP TAB tape, a structure having a coating layer for protection and insulation between wirings is used.
Conventionally, a solder resist ink (epoxy resin) or a polyimide resin ink to be a coating layer is applied to a predetermined thickness of about 20 μm by a printing method and then heated to 120 to 350 ° C. in the atmosphere. Then, the TAB tape for TCP is manufactured by baking for 1 to 5 hours, drying and reactive coagulation to form a coating layer.

【0003】しかし、従来のTCP用TABテープにお
いては、技術的課題がある。すなわち、従来、配線間を
形成する銅箔厚さが4μm以上35μm以下で配線間の
ピッチが100μm以上の領域までは、フオトレジ・パ
ターンエッチングが技術的に可能であった。しかし、接
着剤のない1層配線薄厚TCPテープにおいて、配線間
のピッチが100μm以下、例えば80μmとなると銅
箔厚さが25μm以下の領域ではフオトレジ・パターン
エッチングが不可能となる。
However, the conventional TAB tape for TCP has a technical problem. That is, conventionally, photolithography pattern etching was technically possible up to a region where the thickness of the copper foil forming the space between the wirings was 4 μm or more and 35 μm or less and the pitch between the wirings was 100 μm or more. However, in the single-layer wiring thin TCP tape without adhesive, if the pitch between the wirings is 100 μm or less, for example, 80 μm, the photo resist pattern etching cannot be performed in the region where the copper foil thickness is 25 μm or less.

【0004】また、接着剤のない1層配線薄厚TCPテ
ープにおいて、配線間の保護並びに絶縁のための被覆層
を有する構造では、被覆層となるソルダレジストインク
(エポキシ系樹脂)、あるいはポリイミド系樹脂インク
を、例えば、印刷法で所定の厚さ約20μm厚さに塗布
後、大気中で120〜350°Cに加熱し、1〜5時間
キュア処理して乾燥並びに反応凝固をさせて被覆層を形
成することによってTCP用TABテープを製造する
と、200°Cを越える領域では銅箔の配線が熱による
軟化を起こし、銅箔配線のばね性が低下し、しかも同時
に屈曲性が低下するため、屈曲性とばね性を必要とする
1層配線薄厚TCPテープには使用できないという技術
課題がある。
Also, in a single-layer wiring thin TCP tape without adhesive, in a structure having a coating layer for protection and insulation between wirings, a solder resist ink (epoxy resin) or a polyimide resin serving as a coating layer is used. For example, the ink is applied to a predetermined thickness of about 20 μm by a printing method, heated to 120 to 350 ° C. in the atmosphere, cured for 1 to 5 hours, dried, and reactively solidified to form a coating layer. When the TAB tape for TCP is manufactured by forming it, the wiring of the copper foil softens due to heat in the area exceeding 200 ° C., the spring property of the copper foil wiring is deteriorated, and at the same time, the bending property is deteriorated. There is a technical problem that it cannot be used for a single-layer wiring thin TCP tape that requires elasticity and springiness.

【0005】さらに、TCP用TABテープとして、従
来金属箔の両面に、例えば、エポキシ樹脂塗料主体のソ
ルダレジストインクを用いスクリーン印刷法で形成する
技術もあるが、この技術も200°Cを越えると銅箔の
配線が熱による軟化が起こり、銅箔配線のばね性が低下
し、しかも同時に屈曲性が低下するため、屈曲性とばね
性を必要とする1層配線薄厚TCPテープには使用でき
ないという技術課題がある。このように、従来の製法に
よる接着剤のない1層配線薄厚TCPテープでは、キュ
ア処理温度が120〜350°Cと高温のために、銅箔
の配線が熱による軟化を起こし、銅箔配線のばね性が低
下し、しかも同時に屈曲性が低下する。
Further, there is a technique of forming a TAB tape for TCP on both sides of a conventional metal foil by a screen printing method using, for example, a solder resist ink mainly composed of an epoxy resin paint, but this technique also exceeds 200 ° C. Since the copper foil wiring is softened by heat, the springiness of the copper foil wiring is deteriorated, and at the same time, the flexibility is deteriorated. Therefore, it cannot be used for a single-layer wiring thin TCP tape that requires flexibility and springability. There are technical challenges. As described above, in the conventional single-layer wiring thin TCP tape without an adhesive produced by the conventional manufacturing method, since the curing temperature is as high as 120 to 350 ° C., the wiring of the copper foil is softened by heat, and the copper foil wiring The spring property is reduced, and at the same time, the flexibility is reduced.

【0006】[0006]

【発明が解決しようとする課題】以上述べたように、従
来の接着剤のない1層配線薄厚TCPテープによると、
キュア処理温度が350°Cという高温に於いて、銅箔
配線のばね性が低下し、しかも同時に屈曲性が低下する
という課題を有している。
As described above, according to the conventional one-layer wiring thin TCP tape without adhesive,
When the curing temperature is as high as 350 ° C., there is a problem that the spring property of the copper foil wiring is lowered and, at the same time, the bending property is lowered.

【0007】それ故、本発明の目的は、キュア処理温度
が350°Cの領域に於いても銅箔の配線が熱による軟
化を起こすことがなく、銅箔配線のばね性が低下した
り、屈曲性が低下したりすることのない、屈曲性とばね
性を備えた1層配線薄厚TCPテープを経済的に提供す
ることにある。
Therefore, the object of the present invention is to prevent the copper foil wiring from being softened by heat even in the region where the curing temperature is 350 ° C., and to reduce the spring property of the copper foil wiring. It is an object to economically provide a single-layer wiring thin TCP tape having flexibility and spring properties without lowering the flexibility.

【0008】また、本発明の目的は、特に微細パターン
(配線間のピッチが100μm以下)TCP用TABテ
ープに於いて、キュア処理温度が350°Cの領域に於
いても銅箔の配線が熱による軟化を起こすことがなく、
銅箔配線のばね性が低下したり、屈曲性が低下したりす
ることのない、屈曲性とばね性を良好な1層配線薄厚T
CPテープを提供することにある。
Further, an object of the present invention is, in particular, in a TAB tape for TCP having a fine pattern (pitch between wirings is 100 μm or less), even if the curing temperature is 350 ° C., the copper foil wiring is heated. Without causing softening due to
A single-layer wiring thin thickness T with good bendability and springability, which does not reduce the springiness or bendability of the copper foil wiring.
To provide CP tape.

【0009】また、本発明の目的は、繰り返し曲げ試験
(屈曲試験)に強く、ばね性を有する1層銅箔配線のT
CPテープを提供することにある。
Another object of the present invention is to resist the repeated bending test (bending test) and to obtain the T of a single-layer copper foil wiring having a spring property.
To provide CP tape.

【0010】[0010]

【課題を解決するための手段】本発明は、上記の目的を
実現するために、厚さ6〜75μmのベースフイルム
と、厚さ4〜25μmで配線間のピッチが100μm以
下の1層配線層を形成する銅箔層と、配線層を覆う厚さ
6〜60μmのソルダレジスト被覆層によって、接着剤
のない1層配線TCPテープを構成する。
In order to achieve the above object, the present invention provides a base film having a thickness of 6 to 75 μm and a single wiring layer having a thickness of 4 to 25 μm and a pitch between wirings of 100 μm or less. A one-layer wiring TCP tape having no adhesive is formed by the copper foil layer forming the layer and the solder resist coating layer having a thickness of 6 to 60 μm covering the wiring layer.

【0011】また本発明は、上記の目的を実現するため
に、ポリイミドベースフイルムと、ポリイミド系ソルダ
レジストインクのソルダレジスト被覆層と、銅箔層によ
り接着剤のない1層配線TCPテープを構成する。この
場合、銅箔層は、ベースフイルムのキャステング及びキ
ュア熱処理と、ソルダレジスト被覆層の350°C以下
のキュア熱処理後の特性が、引っ張り強さ20〜30k
gf/mm2 で曲げ弾性係数3000〜5000kgf
/mm2 である銅箔で1層配線TCPテープ構成するも
のである。
In order to achieve the above-mentioned object, the present invention comprises a polyimide-based film, a solder resist coating layer of a polyimide-based solder resist ink, and a copper foil layer to form an adhesive-free single-layer wiring TCP tape. . In this case, the copper foil layer has a tensile strength of 20 to 30 k after the casting and curing heat treatment of the base film and the solder resist coating layer after the heat treatment of 350 ° C. or less.
Bending elastic modulus of 3000 to 5000 kgf at gf / mm 2
A single-layer wiring TCP tape is composed of a copper foil having a thickness of / mm 2 .

【0012】[0012]

【作用】本発明においては、ポリイミドベースフイルム
と、銅箔層と、ポリイミド系ソルダレジストインクのソ
ルダレジスト被覆層によって、接着剤のない1層配線T
CPテープを構成することにより、キュア熱処理温度3
50°Cに於いても銅箔層の軟化はしない。銅箔層は、
ベースフイルムのキャステング及びキュア熱処理と、ソ
ルダレジスト被覆層の350°C以下のキュア熱処理後
に於ける銅箔の特性が、引っ張り強さ20〜30kgf
/mm2 で曲げ弾性係数3000〜5000kgf/m
2 である銅箔を使用することによって、キュア熱処理
温度350°Cに於いても銅箔層の軟化はしない1層配
線TCPテープを実現できる。
In the present invention, the polyimide-based film, the copper foil layer, and the solder resist coating layer of the polyimide-based solder resist ink are used to form an adhesive-free single-layer wiring T.
Cure heat treatment temperature 3 by constructing CP tape
Even at 50 ° C, the copper foil layer does not soften. The copper foil layer is
The cast film of the base film and the heat treatment for curing, and the heat treatment of the solder resist coating layer at a temperature of 350 ° C. or less have the characteristics of the copper foil having a tensile strength of 20 to 30 kgf.
/ Mm 2 bending elastic modulus 3000-5000 kgf / m
By using the copper foil of m 2, it is possible to realize the one-layer wiring TCP tape which does not soften the copper foil layer even at the curing heat treatment temperature of 350 ° C.

【0013】本発明に於いて、配線層を形成する銅箔層
の厚さが4μm以上25μm以下にする理由は、配線間
のピッチが100μmを越える領域では、銅箔層の厚さ
が35μmを越える領域までは、フオトレジ・パターン
エッチングが可能であった。しかし、配線間のピッチが
100μm以下の領域では、銅箔層の厚さ25μm以上
では、フオトレジ・パターンエッチングが不可能となる
ためである。
In the present invention, the reason why the thickness of the copper foil layer forming the wiring layer is 4 μm or more and 25 μm or less is that the thickness of the copper foil layer is 35 μm in the region where the pitch between the wirings exceeds 100 μm. Photolithography pattern etching was possible up to the area beyond. However, in a region where the pitch between the wirings is 100 μm or less, the photolithography pattern etching becomes impossible when the thickness of the copper foil layer is 25 μm or more.

【0014】本発明に於いて、ベースフイルムの厚さを
6μm以上75μm以下とし、配線層を覆うソルダレジ
スト被覆層の厚さを6μm以上60μm以下とする理由
は、接着剤のない1層配線TCPテープにおいて、ベー
スフイルムの厚さは6μm以上75μm以下の場合に、
製法の制限を受けずに屈曲性を維持することが出来る為
であり、ソルダレジスト被覆層の厚さは、配線間の保
護、絶縁並びに屈曲性向上の為であり、特に屈曲回数と
して100万回以上保証するためには6μm以上60μ
m以下の厚さの確保が必要である。
In the present invention, the reason why the thickness of the base film is 6 μm or more and 75 μm or less and the thickness of the solder resist coating layer that covers the wiring layer is 6 μm or more and 60 μm or less is one layer TCP without adhesive. In the tape, when the thickness of the base film is 6 μm or more and 75 μm or less,
This is because the flexibility can be maintained without being restricted by the manufacturing method, and the thickness of the solder resist coating layer is for protection between wirings, insulation, and improvement of the flexibility. To guarantee the above, 6μm or more 60μ
It is necessary to secure a thickness of m or less.

【0015】本発明において、繰り返し曲げ試験(例え
ば、曲げ半径2mmのMITの曲げ試験機)の屈曲回数
として100万回以上保証し、しかもばね性を有するた
めには、銅箔層として、キュア熱処理温度350°Cに
於いても銅箔層が軟化しないことが必要となる。このた
め本発明においては、銅箔層として、大気中で120〜
350°C、1〜5時間キュア処理した後の特性が、引
っ張り強さ20〜30kgf/mm2 を保有し、しか
も、銅箔層に作用する曲げ応力を適度に保有するために
は曲げ弾性係数3000〜5000kgf/mm2 を有
する銅箔を使用することにより従来の技術課題が解決で
きることを見い出したものである。
In the present invention, in order to guarantee a bending number of 1,000,000 times or more in a repeated bending test (for example, a bending tester of MIT with a bending radius of 2 mm) and to have springiness, a copper foil layer is cured by heat treatment. It is necessary that the copper foil layer does not soften even at a temperature of 350 ° C. Therefore, in the present invention, as a copper foil layer, in the atmosphere
The properties after curing at 350 ° C for 1 to 5 hours have a tensile strength of 20 to 30 kgf / mm 2 and, in addition, a flexural modulus of elasticity in order to appropriately hold the bending stress acting on the copper foil layer. It was found that the conventional technical problems can be solved by using a copper foil having 3000 to 5000 kgf / mm 2 .

【0016】[0016]

【実施例】以下、本発明の実施例を図により説明する。
図1は本発明TCPテープを示す横断面図、図2は各種
銅箔の引張り強さ・伸び線図、図3はテープ屈曲時の曲
げ応力分布図であり、図中、1は配線層を形成する銅箔
層、2はソルダレジスト被覆層、3はベースフイルムで
ある。
Embodiments of the present invention will be described below with reference to the drawings.
FIG. 1 is a cross-sectional view showing the TCP tape of the present invention, FIG. 2 is a tensile strength / stretching diagram of various copper foils, and FIG. 3 is a bending stress distribution diagram when the tape is bent. In FIG. 1, 1 is a wiring layer. The copper foil layer to be formed, 2 is a solder resist coating layer, and 3 is a base film.

【0017】本発明は、図1に示すように、ポリイミド
ベースフイルム3と、ポリイミド系ソルダレジストイン
クのソルダレジスト被覆層2と、銅箔層1により、接着
剤のない1層配線TCPテープを構成する。この場合、
銅箔層1は、ベースフイルムのキャステング及びキュア
熱処理と、ソルダレジスト被覆層の350°C以下のキ
ュア熱処理後の特性が、引っ張り強さ20〜30kgf
/mm2 で曲げ弾性係数3000〜5000kgf/m
2 である銅箔で1層配線TCPテープ構成するもので
ある。
In the present invention, as shown in FIG. 1, a polyimide base film 3, a solder resist coating layer 2 of a polyimide-based solder resist ink, and a copper foil layer 1 constitute a one-layer wiring TCP tape having no adhesive. To do. in this case,
The copper foil layer 1 has a tensile strength of 20 to 30 kgf after casting and curing heat treatment of the base film, and after the heat treatment of the solder resist coating layer at 350 ° C. or less.
/ Mm 2 bending elastic modulus 3000-5000 kgf / m
A one-layer wiring TCP tape is constructed with a copper foil of m 2 .

【0018】この本発明実施例1構成の1層配線TCP
テープが見い出された背景として、ここで本発明テープ
の製造法を説明する。厚さ18μmの銅箔の種類とし
て、圧延箔A、電解箔B、電解箔C、電解箔Dを準備
し、各々に厚さ50μmのポリイミドをキャステング
し、350°Cのキュア処理を行ない、フォトレジ・エ
ッチングで配線間のピッチ60μmの1層配線TCPテ
ープを製造した。このようにして得られた配線上に、ポ
リイミドソルダレジストインク(キュア後の被覆層の曲
げ弾性係数は600kgf/mm2 )をスクリーン印刷
法で厚さ20μmに塗布した。塗布後300°C以下の
キュア温度で3時間ステップキュアを実施した。これで
実施例1構成の1層配線TCPテープが得られる。
The single-layer wiring TCP having the structure according to the first embodiment of the present invention
By way of background to the discovery of the tape, the method of making the tape of the present invention will now be described. Rolled foil A, electrolytic foil B, electrolytic foil C, and electrolytic foil D were prepared as types of copper foil having a thickness of 18 μm, and polyimide having a thickness of 50 μm was cast on each, and a curing treatment at 350 ° C. was performed. A single-layer wiring TCP tape having a pitch between wirings of 60 μm was manufactured by registration etching. Polyimide solder resist ink (having a flexural modulus of elasticity of the coating layer after curing of 600 kgf / mm @ 2) was applied to the wiring thus obtained by screen printing to a thickness of 20 .mu.m. After coating, step curing was carried out at a curing temperature of 300 ° C. or lower for 3 hours. As a result, the one-layer wiring TCP tape having the structure of the first embodiment is obtained.

【0019】このようにして得られた圧延箔A、電解箔
B、電解箔C、電解箔Dを有する各々の1層タイプ配線
TCPテープについて、繰り返し曲げ試験(曲げ半径2
mmのMITの曲げ試験機)を行なった。その結果、屈
曲回数は、圧延箔A=120万回(ただし軟化してばね
性が無くなった)、電解箔B=95万回、電解箔C=9
5万回、電解箔D=120万回であり、屈曲回数100
万回を保証できた。軟化の程度が少なく、最もばね性を
有するのは、電解箔Dの組み合わせであった。
Repeated bending tests (bending radius 2) were carried out for each one-layer type wiring TCP tape having the rolled foil A, electrolytic foil B, electrolytic foil C, and electrolytic foil D thus obtained.
mm MIT bending tester). As a result, the number of times of bending was as follows: rolled foil A = 1.2 million times (however, softened and lost the spring property), electrolytic foil B = 950,000 times, electrolytic foil C = 9
50,000 times, electrolytic foil D = 1.2 million times, 100 times of bending
I was able to guarantee 10,000 times. It was the combination of the electrolytic foils D that had the least degree of softening and the most springiness.

【0020】次に、電解箔Dの構成タイプの1層配線T
CPテープにおいて、電解箔Dの銅箔厚さ18μmと2
5μmの2種類を用意し、接着剤無しで、各々に厚さ5
0μmのポリイミドキャステング材を組み合わせて配線
間のピッチ60μm、1層配線薄厚TCPテープを製造
した。さらにその配線の上にポリイミド系ソルダレジス
トインク(キュア後の被覆層の曲げ弾性係数は600k
gf/mm2 )をスクリーン印刷法で厚さ20μmに塗
布した。塗布後300°C以下のキュア温度で3時間ス
テップキュアを実施した。
Next, the one-layer wiring T of the constitution type of the electrolytic foil D is used.
In the CP tape, the electrolytic foil D has a copper foil thickness of 18 μm and 2
Two types of 5 μm are prepared, each with a thickness of 5 without adhesive.
A 0-μm polyimide casting material was combined to produce a 60-μm pitch between wirings and a single-layer wiring thin TCP tape. Furthermore, polyimide-based solder resist ink (the bending elastic modulus of the coating layer after curing is 600 k
gf / mm 2 ) was applied to a thickness of 20 μm by a screen printing method. After coating, step curing was carried out at a curing temperature of 300 ° C. or lower for 3 hours.

【0021】このようにして得られた各々の1層タイプ
配線TCPテープについて、繰り返し曲げ試験(曲げ半
径2mmのMITの曲げ試験機)を行なった。その結
果、屈曲回数は、電解箔Dの銅箔厚さ18μmの組み合
わせでは120万回で破断したこれに対して電解箔Dの
銅箔厚さ25μmの組み合わせでは100万回を越えた
ところで破断した。いずれの銅箔の組み合わせの1層タ
イプ配線TCPテープでも屈曲回数は、100万回を保
証できた。また、85°C、85%湿度でDCバイアス
50Vでのマイグレーション試験を1000時間実施し
たが、電解箔Dの銅箔厚さ18μm1層タイプ配線TC
Pテープと、25μm1層タイプ配線TCPテープの双
方ともに、被覆層の絶縁破壊は無かった。以上のように
本発明の電解箔Dの組み合わせにより、ばね性、屈曲性
並びに耐マイグレーションの信頼性の高い1層タイプ配
線TCPテープを供給することができた。
Each of the thus obtained single layer type wiring TCP tapes was repeatedly subjected to a bending test (a bending tester for MIT having a bending radius of 2 mm). As a result, the number of times of bending was 1,200,000 times when the copper foil thickness of the electrolytic foil D was 18 μm, whereas the number of times of bending was more than 1 million times when the copper foil thickness of the electrolytic foil D was 25 μm. . The 1-layer type wiring TCP tape of any combination of the copper foils could guarantee the number of bending times of 1 million times. Further, a migration test was carried out at a DC bias of 50 V at 85 ° C. and 85% humidity for 1000 hours. The electrolytic foil D had a copper foil thickness of 18 μm and a single layer type wiring TC.
Both the P tape and the 25 μm single-layer type wiring TCP tape had no dielectric breakdown of the coating layer. As described above, by combining the electrolytic foil D of the present invention, it was possible to supply a one-layer type wiring TCP tape with high reliability of spring property, flexibility and migration resistance.

【0022】ここで、屈曲性を向上させるために設けた
ポリイミドキャステング・キュア後並びにソルダレスジ
スト被覆層のキュア(温度350°C)後の銅箔層の引
張り強さと曲げ弾性係数について説明する。前記実施例
で示したように、作製した銅箔を温度350°Cで処理
後の銅箔層の引張り強さと曲げ弾性係数を測定した結果
は、表1の通りである。
Here, the tensile strength and flexural modulus of the copper foil layer after polyimide casting and curing for improving the flexibility and after curing the solderless dist coating layer (at a temperature of 350 ° C.) will be described. As shown in the above example, Table 1 shows the results obtained by measuring the tensile strength and the bending elastic modulus of the copper foil layer after the treatment of the produced copper foil at a temperature of 350 ° C.

【0023】また、実施例の各種銅箔の引張り強さ・伸
び線図は図2の通りである。これら表1および図2から
明らかなように、ばね性並びに屈曲性の良好な電解箔D
は、引張り強さが20〜30kgf/mm2 、曲げ弾性
係数が3000〜5000kgf/mm2 を有するのが
判明した。この曲げ弾性係数が5000kgf/mm 2
を越えると、銅箔層に働く屈曲のための曲げ応力が増大
することが分かる。すなわち、図3のテープ屈曲時の曲
げ応力分布図に示すように、銅箔層に働く曲げ応力б
は、銅箔層に働く曲げ応力б=E・ε ここで、曲げひずみε=[1層配線TCPテープの中立
軸までの距離C(約1層配線TCPテープの厚さの半
分)]を[(曲げ半径R)+1層配線TCPテープの中
立軸までの距離C(約1層配線TCPテープの厚さの半
分)]で除した値である。なお、曲げ応力бは、銅箔層
の降伏応力(図2の引張り強さ・伸び線図の塑性変形が
始まる引張強さ)より小さくないと破壊してしまう。そ
して曲げ弾性係数が3000kgf/mm2 以下の銅箔
では、曲げによるばね性が弱く(屈曲時の復元力が弱く
なり元に戻らなくなる)、ばね性並びに屈曲性の必要な
1層配線TCPテープとしては使用できなくなる。
Further, the tensile strength and elongation of various copper foils of the examples
The diagram is shown in FIG. From these Table 1 and FIG.
As is clear, the electrolytic foil D has good spring properties and flexibility.
Has a tensile strength of 20 to 30 kgf / mm2Flexural elasticity
Coefficient is 3000 to 5000 kgf / mm2To have
found. This bending elastic modulus is 5000 kgf / mm 2
Above, the bending stress due to bending acting on the copper foil layer increases
I know what to do. That is, the curve when the tape in FIG. 3 is bent
Bending stress acting on the copper foil layer as shown in the
Is the bending stress acting on the copper foil layer б = E · ε, where bending strain ε = [one layer wiring TCP tape neutral
Distance to axis C (Approximately one layer wiring TCP tape thickness half
Min)] in [(bending radius R) +1 layer wiring TCP tape
Distance to vertical axis C (Approximately 1 layer wiring half the thickness of TCP tape
Minutes)]. The bending stress б is the copper foil layer.
Yield stress (Plastic deformation of the tensile strength / elongation diagram in Fig. 2
If it is not less than the tensile strength at which it starts, it will break. So
And the bending elastic modulus is 3000 kgf / mm2Copper foil below
, The springiness due to bending is weak (the restoring force at bending is weak.
It will not return to its original shape.)
It cannot be used as a one-layer wiring TCP tape.

【0024】本発明の実施例では、電解銅箔の例を説明
したが、キュア熱処理温度が350°Cのキュア熱処理
条件で適度に軟化した後の銅箔層の引っ張り強さが20
〜30kgf/mm2 で曲げ弾性係数が3000〜50
00kgf/mm2 が確保されるならば、圧延銅箔でも
よい。
In the embodiment of the present invention, the example of the electrolytic copper foil was explained, but the tensile strength of the copper foil layer after being moderately softened under the curing heat treatment condition of the curing heat treatment temperature of 350 ° C. is 20.
Bending elastic modulus is 3,000 to 50 at -30 kgf / mm 2.
Rolled copper foil may be used as long as it can secure 00 kgf / mm 2 .

【0025】また、本発明では、接着剤のない1層配線
TCPテープにおいて、配線間の保護並びに絶縁のため
の被覆層を有する構造のTCPテープについて説明した
が、本発明の技術は、屈曲性とフレックス性を加味した
フレックス樹脂系の被覆層を有する構造の接着剤を有す
るTCP用1層配線TABテープにも応用可能である
Further, in the present invention, the TCP tape having a structure having a coating layer for protection and insulation between wirings in the one-layer wiring TCP tape having no adhesive has been described, but the technique of the present invention is flexible. It is also applicable to a one-layer wiring TAB tape for TCP having an adhesive having a structure having a flex resin-based coating layer in which flexibility and flexibility are taken into consideration.

【0026】[0026]

【発明の効果】本発明の効果としては、キュア処理温度
が350°Cの領域に於いても、銅箔の配線が熱による
軟化を起こすことがなく、銅箔配線のばね性が低下した
り、屈曲性が低下したりすることのない、屈曲性とばね
性を必要とする1層配線薄厚TCPテープを提供するこ
とができる。
As an effect of the present invention, even in a region where the curing temperature is 350 ° C., the wiring of the copper foil does not soften due to heat, and the spring property of the copper foil wiring deteriorates. Thus, it is possible to provide a single-layer wiring thin TCP tape which requires flexibility and spring property without lowering flexibility.

【0027】また、本発明の効果としては、特に、微細
パターン(配線間のピッチが100μm以下)TCP用
TABテープに於いて、キュア処理温度が350°Cの
領域に於いても銅箔の配線が熱による軟化を起こすこと
がなく、銅箔配線のばね性が低下したり、屈曲性が低下
したりすることのない、屈曲性とばね性を良好な1層配
線薄厚TCPテープを提供するこができる。
Further, as an effect of the present invention, in particular, in a TAB tape for TCP having a fine pattern (pitch between wirings is 100 μm or less), even if the curing temperature is 350 ° C. A single-layer wiring thin TCP tape having good flexibility and spring properties, which does not cause softening due to heat, and does not reduce spring properties or flexibility of copper foil wiring. You can

【0028】また、本発明の効果としては、繰り返し曲
げ試験(屈曲試験)に強く、ばね性を有する1層銅箔配
線のTCPテープを提供することができる。
Further, as an effect of the present invention, it is possible to provide a TCP tape of a single-layer copper foil wiring which is strong against a repeated bending test (bending test) and has a spring property.

【0029】本発明の効果としては、本発明のTPCテ
ープは、液晶のドライバー用またはASIC用の配線間
の高絶縁抵抗(85°Cで湿度85%で1000時間経
過後の絶縁抵抗が109 Ω以上)で信頼性の高い、微細
配線(配線間のピッチが100μm以下)TCPテープ
を、安定して供給することができ、しかも量産により安
価に提供することが出来る。
As an effect of the present invention, the TPC tape of the present invention has a high insulation resistance between wirings for liquid crystal drivers or ASICs (insulation resistance of 10 9 after 1000 hours at 85 ° C. and humidity of 85%). It is possible to stably supply a fine wiring (pitch between wirings of 100 μm or less) TCP tape having a high reliability of Ω or more) and to provide it at low cost by mass production.

【0030】また、本発明の効果としては、本発明のT
CPテープは、フレキシブルな接続用、液晶のドライバ
ー用、または、ABIS用の配線間の高絶縁抵抗(85
°Cで湿度85%で100時間経過後の絶縁抵抗が10
9 Ω以上)で、しかもフレキシブル性を有する、いわゆ
るフレックスTABテープ及びフレキシブルな接続用T
ABテープにおいて、屈曲性にすぐれた、信頼性の高
い、微細配線(配線間のピッチが100μm以下)に適
するTCP用TABテープを提供することが出来る。
Further, as an effect of the present invention, T of the present invention
CP tape has a high insulation resistance (85%) between wiring for flexible connection, liquid crystal driver, or ABIS.
Insulation resistance after 10 hours at 85 ° C and 85% humidity is 10
9 Ω or more) and so-called flex TAB tape with flexibility and flexible connecting T
In the AB tape, it is possible to provide a highly reliable, highly reliable TAB tape for TCP suitable for fine wiring (pitch between wirings is 100 μm or less).

【0031】また、本発明の効果としては、本発明の接
着剤のない1層配線TCPテープはフレキシブルな接続
用TABテープにおいて、ばね性(屈曲時の復元力が大
きくすぐ元にもどる)に優れかつ屈曲性に優れ、屈曲性
の信頼性が高い特徴がある。また、微細配線(配線間の
ピッチが100μm以下)TPC用TABテープにも適
している。
The effect of the present invention is that the adhesive-free single-layer wiring TCP tape of the present invention is a flexible TAB tape for connection, which is excellent in the spring property (the restoring force at the time of bending is large and returns to the original state immediately). In addition, it is characterized by excellent flexibility and high reliability of flexibility. It is also suitable for TAB tape for fine wiring (pitch between wirings is 100 μm or less) for TPC.

【0032】また、本発明の効果としては、特に曲げ半
径が5mm以下の屈曲性の厳しいきついフレキシブルな
接続用TABテープにおいて、しかも、微細配線(配線
間のピッチが100μm以下)で、優れた屈曲特性とば
ね性(屈曲時の復元力が大きくすぐ元にもどる)が安定
している。
Further, as an effect of the present invention, particularly in a tightly flexible TAB tape having a bending radius of 5 mm or less and having a severe bendability and excellent bending with fine wiring (pitch between wirings is 100 μm or less). The characteristics and springiness (the restoring force at the time of bending is large and returns to the original immediately) are stable.

【0033】また、本発明の他の効果としては、本発明
のTCPテープは、高絶縁抵抗で、しかも耐電食(耐マ
イグレーション)性に優れ、信頼性の高いTPCテープ
を安定した状態で量産でき提供することが出来る。
As another effect of the present invention, the TCP tape of the present invention can be mass-produced in a stable state with a highly reliable TPC tape having high insulation resistance and excellent electrolytic corrosion (migration) resistance. Can be provided.

【0034】以上のように、本発明TCPテープは、特
に微細配線(配線間のピッチが100μm以下)に適
し、優れた屈曲特性とばね性(屈曲時の復元力が大きく
すぐ元にもどる)が安定している。繰り返し曲げ試験
(屈曲試験)に強く、ばね性を有するので、信頼性の高
いTCP用TABテープを提供することが出来る。勿
論、1層銅箔配線のTCPテープを経済的に提供するこ
とができる。
As described above, the TCP tape of the present invention is particularly suitable for fine wiring (pitch between wirings is 100 μm or less), and has excellent bending characteristics and spring property (the restoring force at the time of bending is large and returns immediately). stable. Since it is strong against repeated bending tests (bending tests) and has springiness, it is possible to provide a highly reliable TAB tape for TCP. Of course, it is possible to economically provide the TCP tape having the one-layer copper foil wiring.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明TCPテープの実施例を示す横断面図。FIG. 1 is a cross-sectional view showing an embodiment of a TCP tape of the present invention.

【図2】各種銅箔の引張り強さ・伸び線図。[Fig. 2] Tensile strength and elongation diagram of various copper foils.

【図3】テープ屈曲時の曲げ応力分布図。FIG. 3 is a bending stress distribution diagram when the tape is bent.

【符号の説明】[Explanation of symbols]

1.配線層を形成する銅箔層 2.ソルダレジスト被覆層 3.ベースフイルム 1. Copper foil layer that forms the wiring layer 1. Solder resist coating layer 3. Base film

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】 厚さ6〜75μmのベースフイルムと、
厚さ4〜25μmで配線間のピッチが100μm以下の
1層配線層を形成する銅箔層と、配線層を覆う厚さ6〜
60μmのソルダレジスト被覆層より接着剤を有せずに
構成されることを特徴とする接着剤のない1層配線TC
Pテープ。
1. A base film having a thickness of 6 to 75 μm,
A copper foil layer forming a single wiring layer having a thickness of 4 to 25 μm and a pitch between wirings of 100 μm or less, and a thickness of 6 to covering the wiring layer.
Adhesive-free single-layer wiring TC characterized by being configured without an adhesive with a solder resist coating layer of 60 μm
P tape.
【請求項2】 前記銅箔層は、ベースフイルムのキャス
テング及びキュア熱処理と、ソルダレジスト被覆層の3
50℃以下のキュア熱処理後の特性が、引っ張り強さ2
0〜30kgf/mm2 で曲げ弾性係数3000〜50
00kgf/mm2 であることを特徴とする請求項1記
載の1層配線TCPテープ。
2. The copper foil layer comprises a base film casting and curing heat treatment, and a solder resist coating layer.
Tensile strength of 2 after curing heat treatment at 50 ℃ or less
Bending elastic modulus 3000 to 50 at 0 to 30 kgf / mm 2.
The one-layer wiring TCP tape according to claim 1, wherein the TCP tape has a weight of 00 kgf / mm 2 .
【請求項3】 前記ソルダレジスト被覆層は、エポキシ
系樹脂インクポリイミド系インクであることを特徴とす
る請求項1記載の接着剤のない1層配線TCPテープ。
3. The adhesive-free single-layer wiring TCP tape according to claim 1, wherein the solder resist coating layer is an epoxy resin ink or a polyimide ink.
JP13832095A 1995-06-05 1995-06-05 One-layer wiring tcp tape Pending JPH08335607A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13832095A JPH08335607A (en) 1995-06-05 1995-06-05 One-layer wiring tcp tape

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13832095A JPH08335607A (en) 1995-06-05 1995-06-05 One-layer wiring tcp tape

Publications (1)

Publication Number Publication Date
JPH08335607A true JPH08335607A (en) 1996-12-17

Family

ID=15219149

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13832095A Pending JPH08335607A (en) 1995-06-05 1995-06-05 One-layer wiring tcp tape

Country Status (1)

Country Link
JP (1) JPH08335607A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101009128B1 (en) * 2004-03-30 2011-01-18 신닛테츠가가쿠 가부시키가이샤 Flexible copper-clad laminate and method for making the same
US8187922B2 (en) * 2008-09-30 2012-05-29 Cambridge Silicon Radio Ltd. Low cost flexible substrate
CN105386088A (en) * 2010-07-01 2016-03-09 三井金属矿业株式会社 Electrodeposited copper foil and process for production thereof

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101009128B1 (en) * 2004-03-30 2011-01-18 신닛테츠가가쿠 가부시키가이샤 Flexible copper-clad laminate and method for making the same
US8187922B2 (en) * 2008-09-30 2012-05-29 Cambridge Silicon Radio Ltd. Low cost flexible substrate
CN105386088A (en) * 2010-07-01 2016-03-09 三井金属矿业株式会社 Electrodeposited copper foil and process for production thereof
CN105386088B (en) * 2010-07-01 2018-06-29 三井金属矿业株式会社 Electrolytic copper foil and its manufacturing method

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