JPH03297192A - Circuit board and manufacture thereof - Google Patents
Circuit board and manufacture thereofInfo
- Publication number
- JPH03297192A JPH03297192A JP10072890A JP10072890A JPH03297192A JP H03297192 A JPH03297192 A JP H03297192A JP 10072890 A JP10072890 A JP 10072890A JP 10072890 A JP10072890 A JP 10072890A JP H03297192 A JPH03297192 A JP H03297192A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- bending
- electric circuit
- circuit board
- circuit
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 9
- 238000005452 bending Methods 0.000 claims abstract description 32
- 229910052751 metal Inorganic materials 0.000 claims abstract description 13
- 239000002184 metal Substances 0.000 claims abstract description 13
- 239000010410 layer Substances 0.000 claims description 54
- 238000000034 method Methods 0.000 claims description 7
- 239000011241 protective layer Substances 0.000 claims description 7
- 229920000592 inorganic polymer Polymers 0.000 claims description 6
- 229920000620 organic polymer Polymers 0.000 claims description 6
- 239000000463 material Substances 0.000 abstract description 14
- 239000000758 substrate Substances 0.000 abstract description 6
- 239000004952 Polyamide Substances 0.000 abstract description 3
- 229920002647 polyamide Polymers 0.000 abstract description 3
- 229920005989 resin Polymers 0.000 abstract description 3
- 239000011347 resin Substances 0.000 abstract description 3
- 238000004806 packaging method and process Methods 0.000 abstract description 2
- 238000009413 insulation Methods 0.000 abstract 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 6
- 229910052782 aluminium Inorganic materials 0.000 description 4
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 4
- 238000004070 electrodeposition Methods 0.000 description 4
- 239000003822 epoxy resin Substances 0.000 description 4
- 229920000647 polyepoxide Polymers 0.000 description 4
- 230000000052 comparative effect Effects 0.000 description 3
- 239000000470 constituent Substances 0.000 description 3
- 229910052802 copper Inorganic materials 0.000 description 3
- 239000010949 copper Substances 0.000 description 3
- 239000011889 copper foil Substances 0.000 description 3
- 229920001721 polyimide Polymers 0.000 description 3
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 239000004642 Polyimide Substances 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 239000011247 coating layer Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 230000007547 defect Effects 0.000 description 2
- 229910000679 solder Inorganic materials 0.000 description 2
- 229910000976 Electrical steel Inorganic materials 0.000 description 1
- 239000004962 Polyamide-imide Substances 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- 230000005856 abnormality Effects 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 239000012790 adhesive layer Substances 0.000 description 1
- 239000012141 concentrate Substances 0.000 description 1
- 239000012792 core layer Substances 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- -1 formal Polymers 0.000 description 1
- 239000003365 glass fiber Substances 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000011229 interlayer Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 229920002312 polyamide-imide Polymers 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 239000004814 polyurethane Substances 0.000 description 1
- 229920002635 polyurethane Polymers 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 229920002050 silicone resin Polymers 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 239000002966 varnish Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/0284—Details of three-dimensional rigid printed circuit boards
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/03—Use of materials for the substrate
- H05K1/05—Insulated conductive substrates, e.g. insulated metal substrate
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/22—Secondary treatment of printed circuits
- H05K3/28—Applying non-metallic protective coatings
Landscapes
- Non-Metallic Protective Coatings For Printed Circuits (AREA)
- Structure Of Printed Boards (AREA)
Abstract
Description
【発明の詳細な説明】
〔技術分野〕
本発明は、各種電気装置や電子装置の電気回路形成用と
して使用し得る回路基板並びにその製造方法に関する。DETAILED DESCRIPTION OF THE INVENTION [Technical Field] The present invention relates to a circuit board that can be used for forming electric circuits of various electrical devices and electronic devices, and a method for manufacturing the same.
最近における電気電子装置を小型化しようとする趨勢か
ら、それらに使用される各種部品の小型化が要求されて
いる。その一貫として、回路基板はスペースファクタを
小さくするために折り曲げ加工を施して実装する要求が
ある。2. Description of the Related Art With the recent trend toward miniaturizing electrical and electronic devices, there is a demand for miniaturization of various components used in these devices. As part of this, there is a demand for circuit boards to be bent and mounted in order to reduce the space factor.
従来、この回路基板としてはアルミニウムなどの金属基
板上に可撓性の絶縁層を有し、更にその上に銅などの導
電性金属からなる電気回路層を有する金属ベース基板が
使用されていた。Conventionally, as this circuit board, a metal base substrate has been used, which has a flexible insulating layer on a metal substrate such as aluminum, and further has an electric circuit layer made of a conductive metal such as copper on top of the flexible insulating layer.
ところで上記構造の金属ベース基板は、折り曲げ加工性
が良好でなく、たとえば90度前後に折り曲げると、一
般に薄くて而して機械的強度の低い電気回路層への応力
集中のために核層に切断不良が生じる問題がある。この
ために折り曲げの角度に制限があり、実装基板の小型化
が充分でないのが実情である。従って本発明は、上記の
問題に鑑みて、折り曲げ加工性の改善された回路基板、
並びにその製造方法を提供することを目的とするもので
ある。By the way, the metal base substrate with the above structure does not have good bending workability, and when bent, for example, around 90 degrees, stress concentrates on the electrical circuit layer, which is generally thin and has low mechanical strength, causing it to break into the core layer. There is a problem of defects occurring. For this reason, there is a limit to the bending angle, and the actual situation is that miniaturization of the mounting board is not sufficient. Therefore, in view of the above problems, the present invention provides a circuit board with improved bending processability,
The object of the present invention is to provide a method for producing the same.
本発明者らは、折り曲げ加工部分の電気回路層上に有機
高分子や無機高分子の層を設けると上記の問題が解決す
ることを知った。The present inventors have found that the above problem can be solved by providing a layer of an organic polymer or an inorganic polymer on the electrical circuit layer of the bent portion.
而して本発明は、金属基層上に絶縁層及び電気回路層を
有する回路基板に於いて、折り曲げ加工部分の電気回路
層上に有機高分子あるいは無機高分子からなる折り曲げ
保護層が設けられてなることを特徴とする回路基板、並
びに金属基層上に絶縁層及び電気回路層を有する回路基
板の折り曲げ加工される部分の電気回路層上に有機高分
子あるいは無機高分子からなる折り曲げ保護層を形成し
、ついで折り曲げ加工を施すことを特徴とする回路基板
の製造方法に関するものである。Accordingly, the present invention provides a circuit board having an insulating layer and an electric circuit layer on a metal base layer, in which a bending protection layer made of an organic polymer or an inorganic polymer is provided on the electric circuit layer of the bent portion. A folding protection layer made of an organic polymer or an inorganic polymer is formed on the electric circuit layer of the portion to be bent of the circuit board having an insulating layer and an electric circuit layer on a metal base layer. The present invention relates to a method of manufacturing a circuit board, which is characterized in that the circuit board is then subjected to a bending process.
回路基板の折り曲げ加工しようとする部分の電気回路層
上に折り曲げ保護層を設けてからその部分をたとえばプ
レス金型を用いて電気回路が外側となる方向く曲げによ
り伸長する方向)あるいは逆に電気回路が内側となる方
向く曲げにより圧縮する方向)のいずれの方向に曲げて
も電気回路に対する応力集中を避けることができ、その
結果、電気回路層の切断不良が極めて少なくなる。また
曲げ加工の範囲(曲げ角度、曲げR)も広がり、実装基
板の小型化が可能となり、曲げ加工の自由度が大きくな
るので回路設計も容易となる。A bending protective layer is provided on the electrical circuit layer of the part of the circuit board that is to be bent, and then that part is bent using a press mold, for example, in the direction in which the electrical circuit is outward (in the direction in which the electrical circuit is stretched), or vice versa. Stress concentration on the electrical circuit can be avoided by bending in either direction (direction in which the circuit turns inward or direction in which the circuit is compressed by bending), and as a result, cutting defects in the electrical circuit layer are extremely reduced. Furthermore, the range of bending (bending angle, bending radius) is expanded, the mounting board can be made smaller, and the degree of freedom in bending is increased, making circuit design easier.
従って本発明の回路基板は製造が容易であり、しかも優
れた折り曲げ加工性を有するので高密度実装の各種電気
、電子機器の生産に好適に採用することができる。Therefore, since the circuit board of the present invention is easy to manufacture and has excellent bending workability, it can be suitably employed in the production of various electrical and electronic devices with high-density packaging.
第1図は本発明の実施例の断面図を示し、第2図は本発
明の実施例の斜視図を示す。FIG. 1 shows a sectional view of an embodiment of the invention, and FIG. 2 shows a perspective view of an embodiment of the invention.
それらの実施例に於いて、金属基層1の上に絶縁層2が
、更にその上に電気回路層3が設けられている。各層は
、それぞれ従来よりこの分野で使用され、あるいは周知
されている材料にて構成されていてよい、したがって金
属基層1の構成材料としては、アルミニウム、銅、珪素
鋼等が例示され、絶縁層2構成材料としてはポリイミド
、ポリアミド、ガラス繊維補強エポキシ樹脂などが例示
され、電気回路層3の構成材料としては、銅、アルミニ
ウム、ニッケル、銀、金等の導電性金属が例示される。In these embodiments, an insulating layer 2 is provided on the metal base layer 1, and an electrical circuit layer 3 is provided thereon. Each layer may be composed of a material that has been conventionally used in this field or is well known. Therefore, examples of the constituent material of the metal base layer 1 include aluminum, copper, silicon steel, etc., and the insulating layer 2 Examples of the constituent material include polyimide, polyamide, glass fiber reinforced epoxy resin, etc., and examples of the constituent material of the electric circuit layer 3 include conductive metals such as copper, aluminum, nickel, silver, and gold.
各層間は、周知の接着剤を用いて接着されていても良ζ
、あるいは絶縁層2を電着塗装により形成する場合には
電着塗装層がBステージにある間にIll又は層2を電
着塗装上に重ねて加熱、加圧して電着塗装層のCステー
ジ化と層間接着とを同時に達成せしめても良い。Each layer may be bonded using a well-known adhesive.
Alternatively, when the insulating layer 2 is formed by electrodeposition coating, while the electrodeposition coating layer is in the B stage, layer Ill or layer 2 is placed on the electrodeposition coating and heated and pressurized to bring the electrodeposition coating layer to the C stage. and interlayer adhesion may be achieved at the same time.
電気回路層3の折り曲げ加工部分31は、薄層のたとえ
ば厚さ10〜1000μ−程度の折り曲げ保護層4によ
り良好に接着した状態で覆われている。折り曲げ保護層
4は第1図のように電気回路N3を全て覆っていても良
いが、第2図のように電気回路層3の折り曲げ加工部3
1のみを覆うようにしても良い。The folded portion 31 of the electric circuit layer 3 is covered with a thin folding protection layer 4 having a thickness of, for example, about 10 to 1000 μm, in a well-adhered state. The folding protection layer 4 may cover the entire electrical circuit N3 as shown in FIG.
It is also possible to cover only 1.
折り曲げ保護層4の材料としては、有機高分子あるいは
無機高分子が用いられるが、少なくとも電気回路層3に
対して、特に電気回路層3と絶縁層2とに対して少なく
とも回路基板の折り曲げ加工に際して剥離しない程度に
良好な接着性を示すものが好ましい。なお折り曲げ保護
層4の材料が過度に機械的強度が弱いと保護効果が乏し
く、方過度に剛直であるとそれ自体が回路基板の折り曲
げ加工性を阻害するので、ヤング率にして5,000〜
100,000 kgf/cj、特に8,000〜50
.000 kgf/cfflのものが好ましい。材料例
を示すと、ポリアミド、ポリイミド、ポリアミドイミド
、ポリエステル、ポリウレタン、ホルマール、シリコン
樹脂、エポキシ樹脂、各種の紫外線硬化樹脂、ソルダー
レジスト、等が挙げられる。折り曲げ保護層4が電気絶
縁性であると回路基板の実装上好都合である場合が多い
ので、該層構成材料は体積抵抗率にして】09 Ω1以
上の電気絶縁性のものが好ましい。An organic polymer or an inorganic polymer is used as the material for the bending protective layer 4, but it is difficult to use at least for the electric circuit layer 3, especially for the electric circuit layer 3 and the insulating layer 2, when bending the circuit board. It is preferable to use a material that exhibits good adhesion to the extent that it does not peel off. Note that if the material of the bending protective layer 4 has an excessively low mechanical strength, the protective effect will be poor, and if the material is excessively rigid, it will inhibit the bending processability of the circuit board.
100,000 kgf/cj, especially 8,000-50
.. 000 kgf/cffl is preferred. Examples of materials include polyamide, polyimide, polyamideimide, polyester, polyurethane, formal, silicone resin, epoxy resin, various ultraviolet curable resins, solder resist, and the like. Since it is often convenient for mounting the circuit board if the folding protective layer 4 is electrically insulating, it is preferable that the material constituting the layer is electrically insulating and has a volume resistivity of 09 Ω1 or more.
折り曲げ保護層4は、たとえば上記に例示した樹脂のワ
ニスを折り曲げ加工前の回路基板の必要個所に塗布し、
乾燥し、更に必要により紫外線や電子線の照射、あるい
は加熱により硬化して形成することができる。The bending protection layer 4 is formed by applying, for example, the above-mentioned resin varnish to the necessary parts of the circuit board before the bending process.
It can be formed by drying and further curing by irradiation with ultraviolet rays or electron beams, or heating if necessary.
以下、本発明を実施例をもってより具体的に説明するが
、本発明はこれ等実施例によって同等限定されるもので
はない。Hereinafter, the present invention will be explained in more detail with reference to Examples, but the present invention is not limited to the same extent by these Examples.
比較例1
両面に厚さ15μ−の接着剤層を有する厚さ25μ■の
ポリイミドフィルムを厚さQ、5+uのアルミニウム板
の上に置き、更にその上に厚さ35μmの銅箔を重ねて
170℃、60分、30kg/−の条件で熱プレスし、
回路基板材を得た。この回路基板材から50鶴角片を採
取し、次いでその銅箔層をエツチング処理して、幅1f
l、長さ50龍のパターンを十数本並べた形に銅箔層を
残して模擬電気回路を形成した。Comparative Example 1 A polyimide film with a thickness of 25μ and having an adhesive layer with a thickness of 15μ on both sides was placed on an aluminum plate with a thickness of Q, 5+U, and then a copper foil with a thickness of 35μm was layered on top of it. Heat pressed at ℃, 60 minutes, 30 kg/-,
A circuit board material was obtained. Fifty square pieces were taken from this circuit board material, and then the copper foil layer was etched to create a width of 1 f.
A simulated electric circuit was formed by leaving a copper foil layer in the form of a dozen or so patterns of 50 mm in length and 50 mm in length.
実施例1
比較例1の回路基板の模擬電気回路上の全面にエポキシ
樹脂を塗布し硬化して(硬化した層のヤング率:約17
.000 kgf/c+J)厚さ20μm(D折す曲げ
保護層を形成した。Example 1 Epoxy resin was applied to the entire surface of the simulated electric circuit of the circuit board of Comparative Example 1 and cured (Young's modulus of the cured layer: approximately 17).
.. 000 kgf/c+J) thickness 20 μm (D-folding bending protective layer was formed).
実施例2
実施例1で用いた用いエポキシ樹脂の代わりにソルダー
レジストを用いたことを除いては、実施例1と全く同様
にして厚さ20μmの折り曲げ保護層を形成した。Example 2 A folding protective layer having a thickness of 20 μm was formed in the same manner as in Example 1, except that a solder resist was used instead of the epoxy resin used in Example 1.
実施例1〜2、比較例1の各回路基板につき、プレス金
型を用いて第1図のように模擬電気回路が外側となる方
向(曲げにより伸長する方向)に曲げ角度90度、13
5度、曲げRO,5” 、 1.0 ”1.5°、2.
0 ”に折り曲げ加工を行い、模擬電気回路の切断(パ
ターンの割れ)有無を調べた。評価結果を下表に示す。Each of the circuit boards of Examples 1 to 2 and Comparative Example 1 was bent at an angle of 90 degrees and 13 degrees in the direction in which the simulated electric circuit is outward (the direction in which it is stretched by bending) as shown in Figure 1 using a press mold.
5 degrees, bend RO, 5", 1.0" 1.5°, 2.
0'' bending process was carried out, and the presence or absence of breakage of the simulated electric circuit (crack in the pattern) was examined.The evaluation results are shown in the table below.
同表において、折り曲げ加工後において模擬電気回路に
異常が認められなかった場合は○で示し、亀裂の発生が
見られた場合は×で示す。In the same table, if no abnormality was observed in the simulated electric circuit after the bending process, it is indicated by ○, and if cracks were observed, it is indicated by ×.
第1図 Figure 1
第1図及び第2図は、それぞれ本発明の実施例の断面図
及び斜視図を示す。
1 金属基層
2 絶縁層
3 電気回路層
31 折り曲げ加工部分
4 折り曲げ保護層 (以上)第2図1 and 2 show a cross-sectional view and a perspective view, respectively, of an embodiment of the invention. 1 Metal base layer 2 Insulating layer 3 Electric circuit layer 31 Bending portion 4 Bending protection layer (and above) Fig. 2
Claims (3)
基板に於いて、折り曲げ加工部分の電気回路層上に有機
高分子あるいは無機高分子からなる折り曲げ保護層が設
けられてなることを特徴とする回路基板。(1) In a circuit board having an insulating layer and an electric circuit layer on a metal base layer, a bending protection layer made of an organic polymer or an inorganic polymer is provided on the electric circuit layer of the bent portion. circuit board.
,000kgf/cm^2である第1請求項に記載の回
路基板。(2) Young's modulus of the folded protective layer is 5,000 to 100
, 000 kgf/cm^2.
基板の折り曲げ加工される部分の電気回路層上に有機高
分子あるいは無機高分子からなる折り曲げ保護層を形成
し、ついで折り曲げ加工を施すことを特徴とする第1請
求項又は第2請求項に記載の回路基板の製造方法。(3) Forming a bending protection layer made of an organic or inorganic polymer on the electric circuit layer of the part to be bent of a circuit board having an insulating layer and an electric circuit layer on a metal base layer, and then performing the bending process. The method for manufacturing a circuit board according to claim 1 or 2, characterized in that:
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10072890A JPH03297192A (en) | 1990-04-17 | 1990-04-17 | Circuit board and manufacture thereof |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10072890A JPH03297192A (en) | 1990-04-17 | 1990-04-17 | Circuit board and manufacture thereof |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH03297192A true JPH03297192A (en) | 1991-12-27 |
Family
ID=14281674
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP10072890A Pending JPH03297192A (en) | 1990-04-17 | 1990-04-17 | Circuit board and manufacture thereof |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH03297192A (en) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH04130438U (en) * | 1991-05-21 | 1992-11-30 | シヤープ株式会社 | Mounting board |
JP2013089305A (en) * | 2011-10-13 | 2013-05-13 | Shin Etsu Polymer Co Ltd | Capacitance sensor and manufacturing method therefor, and wiring board |
US8791230B2 (en) | 2010-06-08 | 2014-07-29 | Nippon Shokubai Co., Ltd. | Method for producing particulate water absorbent resin |
JP2016009118A (en) * | 2014-06-25 | 2016-01-18 | 株式会社ジャパンディスプレイ | Display device and manufacturing method of display device |
JP2019212675A (en) * | 2018-05-31 | 2019-12-12 | 日東電工株式会社 | Printed circuit board |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5388157A (en) * | 1977-01-13 | 1978-08-03 | Matsushita Electric Ind Co Ltd | Printed circuit board |
JPS5727177U (en) * | 1980-07-22 | 1982-02-12 | ||
JPS5856463B2 (en) * | 1978-11-17 | 1983-12-15 | 松下電器産業株式会社 | Manufacturing method of non-aqueous electrolyte battery |
-
1990
- 1990-04-17 JP JP10072890A patent/JPH03297192A/en active Pending
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5388157A (en) * | 1977-01-13 | 1978-08-03 | Matsushita Electric Ind Co Ltd | Printed circuit board |
JPS5856463B2 (en) * | 1978-11-17 | 1983-12-15 | 松下電器産業株式会社 | Manufacturing method of non-aqueous electrolyte battery |
JPS5727177U (en) * | 1980-07-22 | 1982-02-12 |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH04130438U (en) * | 1991-05-21 | 1992-11-30 | シヤープ株式会社 | Mounting board |
US8791230B2 (en) | 2010-06-08 | 2014-07-29 | Nippon Shokubai Co., Ltd. | Method for producing particulate water absorbent resin |
JP2013089305A (en) * | 2011-10-13 | 2013-05-13 | Shin Etsu Polymer Co Ltd | Capacitance sensor and manufacturing method therefor, and wiring board |
JP2016009118A (en) * | 2014-06-25 | 2016-01-18 | 株式会社ジャパンディスプレイ | Display device and manufacturing method of display device |
JP2019212675A (en) * | 2018-05-31 | 2019-12-12 | 日東電工株式会社 | Printed circuit board |
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