JPH08321012A - Thin film magnetic head and manufacturing method thereof - Google Patents

Thin film magnetic head and manufacturing method thereof

Info

Publication number
JPH08321012A
JPH08321012A JP7127861A JP12786195A JPH08321012A JP H08321012 A JPH08321012 A JP H08321012A JP 7127861 A JP7127861 A JP 7127861A JP 12786195 A JP12786195 A JP 12786195A JP H08321012 A JPH08321012 A JP H08321012A
Authority
JP
Japan
Prior art keywords
thin film
magnetic head
adhesive
film element
adhesive surface
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP7127861A
Other languages
Japanese (ja)
Other versions
JP2998593B2 (en
Inventor
Hiroyasu Tsuji
弘恭 辻
Seijiro Okada
誠治郎 岡田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP12786195A priority Critical patent/JP2998593B2/en
Publication of JPH08321012A publication Critical patent/JPH08321012A/en
Application granted granted Critical
Publication of JP2998593B2 publication Critical patent/JP2998593B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Abstract

(57)【要約】 【目的】 保護基板を接着する薄膜磁気ヘッドにおい
て、接着面積を小さくしても接着強度を確保し、高信頼
性及び安価な小型薄膜磁気ヘッドを提供し,さらには生
産性の高い薄膜磁気ヘッド製造方法を提供する。 【構成】 保護層3もしくは保護基板4の接着面に、媒
体摺動面の近傍で且つ媒体摺動面に露出しない接着剤の
充填された微細な溝7を、フォトレジストによるパター
ン作成とエッチング技術を用いて配設する事で、磁気ヘ
ッドの小型化に伴う接着面積の低下による接着強度劣化
を防ぐ。
(57) [Abstract] [Purpose] In a thin film magnetic head for bonding a protective substrate, the bonding strength is secured even if the bonding area is made small, providing a highly reliable and inexpensive small thin film magnetic head, and further improving the productivity. A method of manufacturing a thin film magnetic head having high efficiency is provided. A fine groove 7 filled with an adhesive, which is not exposed to the medium sliding surface in the vicinity of the medium sliding surface, is formed on the bonding surface of the protective layer 3 or the protective substrate 4, and a pattern forming and etching technique using a photoresist is performed. By arranging with the use of, the deterioration of the adhesive strength due to the decrease of the adhesive area due to the miniaturization of the magnetic head is prevented.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、磁気記録再生装置に使
用する薄膜磁気ヘッドとその製造方法に関するものであ
る。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a thin film magnetic head used in a magnetic recording / reproducing apparatus and a manufacturing method thereof.

【0002】[0002]

【従来の技術】近年、磁気記録分野においては、高密度
記録化に伴い、狭トラック化、マルチチャンネル化され
た薄膜磁気ヘッドが必要になってきている。特にオーデ
ィオやビデオ製品のデジタル化に伴って、民生機器分野
にまで薄膜磁気ヘッドが進出しようとしており、低コス
ト化・長時間に渡っての信頼性向上が急務となってい
る。特に耐摩耗性に優れたセラミック基板の上に薄膜を
積み重ねて磁気ヘッド素子を作成する薄膜磁気ヘッド
は、薄膜素子部の破壊を防ぐために、保護基板をその上
に接着した構成となっている。
2. Description of the Related Art In recent years, in the field of magnetic recording, a thin track magnetic head and a multi-channel thin film magnetic head have become necessary as the recording density becomes higher. In particular, with the digitization of audio and video products, thin-film magnetic heads are about to enter the consumer equipment field, and there is an urgent need to reduce costs and improve reliability over a long period of time. In particular, a thin film magnetic head in which thin films are stacked on a ceramic substrate having excellent wear resistance to form a magnetic head element has a structure in which a protective substrate is adhered thereon in order to prevent destruction of the thin film element portion.

【0003】以下に従来の磁気ヘッドについて説明す
る。図3は従来のヨーク型MR(磁気抵抗効果型)再生
素子とインダクティブ型記録素子を持った、マルチチャ
ンネル薄膜磁気ヘッドの外観図である。図3において1
1はセラミック基板、12はMR素子・再生ヨーク磁性
材・記録コア磁性材・配線材・絶縁材等の各材料の薄膜
をパターニングして積み重ねた薄膜素子部である。13
は薄膜素子部の最上層となるアルミナ等からなる保護
層、14はセラミックからなる保護基板で機械加工によ
る溝19が施されている。15は接着剤、16は端子部
である。
A conventional magnetic head will be described below. FIG. 3 is an external view of a multi-channel thin film magnetic head having a conventional yoke type MR (magnetoresistive effect) reproducing element and an inductive recording element. 1 in FIG.
Reference numeral 1 is a ceramic substrate, and 12 is a thin film element portion formed by patterning and stacking thin films of various materials such as an MR element, a reproducing yoke magnetic material, a recording core magnetic material, a wiring material, and an insulating material. Thirteen
Is a protective layer made of alumina or the like, which is the uppermost layer of the thin film element portion, and 14 is a protective substrate made of ceramic, in which grooves 19 are machined. Reference numeral 15 is an adhesive, and 16 is a terminal portion.

【0004】[0004]

【発明が解決しようとする課題】しかしながら上記の従
来構成では、高価な薄膜磁気ヘッドの大幅なコストダウ
ンをはかるために、薄膜素子部を小型化し1基板当たり
のヘッド取れ数を多くする必要がある中で、以下に示す
ようないくつかの問題点を有していた。まず、薄膜素子
部の小型化をはかった場合に、接着面積はそれに伴って
小さくなり、接着強度は減少する。図4は従来のヘッド
を1/3に小型化した時の従来接着法での接着強度と接
着面積比の関係を示す。図4より接着面積の減少により
強度とそのバラツキが大幅に劣化していることがわか
る。したがって、十分な強度が取れないために途中の加
工工程での歩留が悪かったり、強度信頼性試験に耐えれ
ない。
However, in the above-mentioned conventional structure, in order to significantly reduce the cost of the expensive thin film magnetic head, it is necessary to downsize the thin film element portion and increase the number of heads to be taken per substrate. Among them, there were some problems as shown below. First, when the size of the thin film element portion is reduced, the adhesion area becomes smaller accordingly, and the adhesion strength decreases. FIG. 4 shows the relationship between the bonding strength and the bonding area ratio in the conventional bonding method when the conventional head is downsized to 1/3. It can be seen from FIG. 4 that the strength and its variation are significantly deteriorated due to the decrease in the bonding area. Therefore, since the sufficient strength cannot be obtained, the yield in the processing step in the middle is bad, or the strength reliability test cannot be endured.

【0005】また、接着層厚みは媒体摺動時の信頼性面
で極力薄くする必要がある。図5は接着強度と接着層厚
みの関係を示す。接着層厚みの増加により図5に示すよ
うに強度は強くなるものの、図6に示すように偏摩耗1
7や接着剤の伸び18によるスペーシングロスが大きく
なる場合がある。また、溝19を機械加工で設ける限り
溝幅寸法に限界があり,小型化にともなって保護基板幅
が小さくなり、溝19の幅が相対的に大きくなるため、
溝19に占める接着剤の体積が全接着剤体積からみて大
きな割合となり、保護基板14の接着面の平坦部の幅が
小さくなる。その結果膨潤の影響や応力による特性劣化
あるいは、接着層厚の不安定さが無視できなくなる。
Further, it is necessary to make the thickness of the adhesive layer as thin as possible in terms of reliability when sliding the medium. FIG. 5 shows the relationship between the adhesive strength and the adhesive layer thickness. Although the strength increases as shown in FIG. 5 due to the increase in the thickness of the adhesive layer, uneven wear 1
7 or the elongation 18 of the adhesive may increase the spacing loss. In addition, since the groove width is limited as long as the groove 19 is machined, the width of the groove 19 becomes relatively large because the width of the protective substrate becomes small as the size becomes smaller.
The volume of the adhesive occupying the groove 19 becomes a large ratio in view of the total volume of the adhesive, and the width of the flat portion of the adhesive surface of the protective substrate 14 becomes small. As a result, the influence of swelling, characteristic deterioration due to stress, and instability of the adhesive layer thickness cannot be ignored.

【0006】さらに多数ヘッドの同時溝加工は機械加工
では困難で,生産性が低い。したがって、従来構成のヘ
ッドでは容易に小型化が図れず、信頼性面でも不安定な
ものしかできず,生産性が低かった。本発明は、これら
の問題点を解決するもので、薄膜素子部と保護基板の接
着面積が小さくなっても、媒体摺動面の接着層を厚くす
ることなく接着強度を確保することができ、したがっ
て、小型化によって安価なしかも従来と信頼性面で変わ
らない薄膜磁気ヘッドを供給し,さらには生産性の高い
薄膜磁気ヘッド製造方法を提供することを目的とする。
Furthermore, simultaneous groove machining of a large number of heads is difficult by machining, and productivity is low. Therefore, the head having the conventional structure cannot be easily miniaturized, and only a reliable head can be produced, resulting in low productivity. The present invention is to solve these problems, even if the adhesive area of the thin film element portion and the protective substrate is reduced, it is possible to ensure the adhesive strength without thickening the adhesive layer of the medium sliding surface, Therefore, it is an object of the present invention to provide a thin film magnetic head which is inexpensive and has the same reliability as the conventional one due to miniaturization, and to provide a method of manufacturing a thin film magnetic head having high productivity.

【0007】[0007]

【課題を解決するための手段】この目的を達成するため
に本発明の磁気ヘッドは、薄膜素子部側接着面あるいは
保護基板側接着面の少なくともどちらか一方に、媒体摺
動面の近傍で且つ媒体摺動面に露出しない、接着剤の充
填された微細な溝を有することを特徴とするものであ
る。
In order to achieve this object, a magnetic head according to the present invention has at least one of a thin film element portion side adhesive surface and a protective substrate side adhesive surface in the vicinity of a medium sliding surface and It is characterized in that it has fine grooves filled with an adhesive that are not exposed on the sliding surface of the medium.

【0008】また、本発明の磁気ヘッドの製造方法は、
薄膜素子部を作成した基板の薄膜素子部側接着面と保護
基板側接着面を研磨する工程と、薄膜素子部側接着面あ
るいは保護基板側接着面の少なくともどちらか一方に、
フォトレジストを用いて媒体摺動面にまで達しない溝の
パターンを形成し、前記パターンをエッチングにより加
工することで所定の溝を作成する工程と、接着剤を前記
溝に充填した上で、薄膜素子部側接着面と保護基板側接
着面を接着剤を介して突き合わせて硬化させる工程とを
含むことを特徴とする薄膜磁気ヘッド製造方法である。
The method of manufacturing the magnetic head of the present invention is
A step of polishing the thin film element portion side adhesive surface and the protective substrate side adhesive surface of the substrate on which the thin film element portion is created, and at least one of the thin film element portion side adhesive surface and the protective substrate side adhesive surface,
A step of forming a groove pattern that does not reach the medium sliding surface using a photoresist and creating a predetermined groove by processing the pattern by etching, and filling the groove with an adhesive, and then forming a thin film A thin film magnetic head manufacturing method comprising a step of abutting an element portion side adhesive surface and a protective substrate side adhesive surface with an adhesive to cure them.

【0009】[0009]

【作用】この構成及び製造方法によって、微細な溝を必
要場所に作成する構成によって、摺動面で接着層厚が薄
く,溝部分で接着層厚を厚く,しかも微小な接着面で溝
に占める接着剤の体積が全接着剤体積からみて小さな割
合となる構成をとることにより,強度が強く信頼性面で
優れた薄膜磁気ヘッドを実現することができる。
With this structure and the manufacturing method, a fine groove is formed at a required place, so that the thickness of the adhesive layer on the sliding surface is thin, the thickness of the adhesive layer on the groove portion is large, and the minute adhesive surface occupies the groove. By adopting a configuration in which the volume of the adhesive is a small proportion of the total volume of the adhesive, it is possible to realize a thin film magnetic head having high strength and excellent reliability.

【0010】また,フォトレジストによるパターン作成
及びエッチング技術を用いて溝を作成することにより微
細な溝加工が可能でしかも生産性の高い薄膜磁気ヘッド
製造方法を実現することができる。
Further, by forming a groove by using a pattern forming method using a photoresist and an etching technique, it is possible to realize a thin film magnetic head manufacturing method capable of fine groove processing and having high productivity.

【0011】[0011]

【実施例】以下本発明の一実施例について、図面を参照
しながら説明する。図1は本実施例の薄膜磁気ヘッドの
外観図を示すものである。図1において1はセラミック
基板、2はMR素子・再生ヨーク磁性材・記録コア磁性
材・配線材・絶縁材等の各材料の薄膜をパターニングし
て積み重ねた薄膜素子部である。3は薄膜素子部2の最
上層となるアルミナ等からなる保護層、4はセラミック
からなる保護基板、5は接着剤である。6は端子部であ
る。7は保護層3にパターニングされた溝である。
An embodiment of the present invention will be described below with reference to the drawings. FIG. 1 is an external view of the thin film magnetic head of this embodiment. In FIG. 1, 1 is a ceramic substrate, and 2 is a thin film element portion formed by patterning and stacking thin films of various materials such as MR element, reproducing yoke magnetic material, recording core magnetic material, wiring material, and insulating material. 3 is a protective layer made of alumina or the like which is the uppermost layer of the thin film element portion 4, 4 is a protective substrate made of ceramics, and 5 is an adhesive. 6 is a terminal part. Reference numeral 7 is a groove patterned in the protective layer 3.

【0012】まず、実施例のヘッドの構成について説明
する。セラミック基板1上に各薄膜からなる薄膜素子部
2を配置し、薄膜素子部2の最上層である保護層3に溝
7を設け、接着剤5を介して保護基板4が保護層3と突
き合わされて接着されている。図1に示す磁気ヘッドの
製造方法の各工程を図2に示す。図2において8はフォ
トレジスト、9は薄膜素子部側接着面、10は保護基板
側接着面、20は媒体摺動面である。
First, the structure of the head of the embodiment will be described. A thin film element portion 2 made of each thin film is arranged on a ceramic substrate 1, a groove 7 is provided in a protective layer 3 which is the uppermost layer of the thin film element portion 2, and the protective substrate 4 projects from the protective layer 3 via an adhesive 5. Aligned and glued. FIG. 2 shows each step of the method of manufacturing the magnetic head shown in FIG. In FIG. 2, reference numeral 8 is a photoresist, 9 is a thin film element portion side adhesive surface, 10 is a protective substrate side adhesive surface, and 20 is a medium sliding surface.

【0013】図2(a)に示すように、セラミック基板
1上に各薄膜材料をパターニングして積み重ね、多数の
薄膜素子部2を形成し、薄膜素子部側接着面9を平坦に
研磨する。次に図2(b)に示すように、平坦化された
薄膜素子部側接着面9にフォトレジスト8を用いて媒体
摺動面20にまで達さない溝7のパターンを形成する。
図2(c)に示すように、薄膜素子部側接着面9をエッ
チングにより加工することで所定の溝7を作成する。次
に図2(d)に示すように、フォトレジスト8を溶剤で
除去する。次に図2(e)に示すように保護基板側接着
面10を研磨し、薄膜素子部側接着面9と保護基板側接
着面10の少なくともどちらか一方に、接着剤5を塗布
し突き合わせて接着する。次に一つの薄膜素子部2の所
定の大きさで切断し(図示せず)、図1に示す薄膜磁気
ヘッドを得る。この工程を多数の薄膜素子2が配列され
た基板状態で行ったが、工程途中に複数のヘッドが一列
配列された棒状態に切り出してから同様に工程を進めて
もかまわない。
As shown in FIG. 2A, each thin film material is patterned and stacked on the ceramic substrate 1 to form a large number of thin film element portions 2, and the thin film element portion side adhesive surface 9 is polished flat. Next, as shown in FIG. 2B, a pattern of the groove 7 which does not reach the medium sliding surface 20 is formed on the flattened thin film element side adhesive surface 9 by using a photoresist 8.
As shown in FIG. 2C, a predetermined groove 7 is created by processing the thin film element side adhesive surface 9 by etching. Next, as shown in FIG. 2D, the photoresist 8 is removed with a solvent. Next, as shown in FIG. 2E, the protective substrate side adhesive surface 10 is polished, and the adhesive 5 is applied to at least one of the thin film element portion side adhesive surface 9 and the protective substrate side adhesive surface 10 and abutted. To glue. Next, one thin film element portion 2 is cut into a predetermined size (not shown) to obtain the thin film magnetic head shown in FIG. Although this step is performed in a substrate state in which a large number of thin film elements 2 are arranged, it is also possible to cut out into a rod state in which a plurality of heads are arranged in a row during the step and then proceed with the same step.

【0014】本実施例では、薄膜素子部側接着面9に溝
7を作成したが、保護基板側接着面10に溝7を作成し
てもよいし、薄膜素子部側接着面9、保護基板側接着面
10の両方に溝7を作成してもよいことは言うまでもな
い。本実施例では、溝7の深さは約4μm幅は50μm
とし、保護膜にアルミナを用いケミカルエッチングで保
護膜側に溝をケミカルエッチングで作成したがその手法
は問わない。
In this embodiment, the groove 7 is formed on the adhesive surface 9 on the thin film element side, but the groove 7 may be formed on the adhesive surface 10 on the protective substrate side, or the adhesive surface 9 on the thin film element side, the protective substrate. It goes without saying that the groove 7 may be formed on both of the side adhesive surfaces 10. In this embodiment, the groove 7 has a depth of about 4 μm and a width of 50 μm.
Then, the grooves were formed on the protective film side by chemical etching by chemical etching using alumina as the protective film, but the method is not limited.

【0015】また、本実施例では溝7の形状を格子状に
パターン形成することにより、接着面全面にわたって接
着層厚が安定になり均一な接着強度が得られた。さらに
本実施例では、保護層3に溝7を薄膜素子部2との位置
関係を規定してパターン形成することで、工程途中での
棒状態に切り出す加工等で該溝7を位置合わせの基準と
しても用いることができ、また、溝7と端子部6上の保
護層3を除去するパターンを同一マスクで形成すること
で、溝7をエッチングにより作成する際に端子部6上の
保護層3の除去とを同時にできる利点もある。
Further, in this embodiment, by forming the grooves 7 in a lattice pattern, the thickness of the adhesive layer was stabilized over the entire adhesive surface, and uniform adhesive strength was obtained. Further, in this embodiment, the groove 7 is formed in the protective layer 3 by defining the positional relationship with the thin film element portion 2 to form a pattern, so that the groove 7 is used as a reference for alignment by cutting out into a rod state during the process. Also, by forming a pattern for removing the groove 7 and the protective layer 3 on the terminal portion 6 with the same mask, the protective layer 3 on the terminal portion 6 can be formed when the groove 7 is formed by etching. There is also an advantage that can be removed at the same time.

【0016】本実施例による小型化した薄膜磁気ヘッド
と従来の製造方法で小型化した薄膜磁気ヘッド及び従来
の大きさの薄膜磁気ヘッドの比較を
A comparison between the miniaturized thin film magnetic head according to the present embodiment, the thin film magnetic head miniaturized by the conventional manufacturing method, and the conventional thin film magnetic head will be compared.

【0017】[0017]

【表1】 [Table 1]

【0018】に示す。この(表1)から明らかなよう
に、本実施例による薄膜磁気ヘッドは、小型化されて接
着面積が小さくなっても、加工等に耐え信頼性も確保で
きる強度を満足できたものとなっている。しかも、媒体
摺動面に露出する部分の接着剤の厚みを変えていないの
で、偏摩耗や接着剤の伸びによるスペーシングロスを増
やすことなく強度が強くなった磁気ヘッドとなってい
る。また、接着剤の体積が小さく、従来の機械加工で入
れた溝を有する磁気ヘッドと比べて、接着剤の膨潤によ
る悪影響や摺動面加工時の接着剤の溝部伸びによる悪影
響が小さい。
As shown in FIG. As is clear from this (Table 1), the thin-film magnetic head according to the present embodiment has sufficient strength to withstand processing and ensure reliability even if the thin-film magnetic head is downsized and the adhesion area is reduced. There is. Moreover, since the thickness of the adhesive at the portion exposed to the medium sliding surface is not changed, the strength of the magnetic head is increased without increasing spacing loss due to uneven wear or elongation of the adhesive. Further, the volume of the adhesive is small, and the adverse effects due to the swelling of the adhesive and the adverse effects due to the groove extension of the adhesive at the time of processing the sliding surface are smaller than those of the conventional magnetic head having grooves formed by machining.

【0019】[0019]

【発明の効果】以上のように本発明は、基板上に薄膜素
子部を作成した後、保護基板を該薄膜素子部に接着する
ことで構成される磁気ヘッドにおいて、薄膜素子部側接
着面あるいは、保護基板側接着面の少なくともどちらか
一方に、媒体摺動面の近傍で且つ媒体摺動面に露出しな
い接着剤の充填された微細な溝を配置した構成にするこ
とにより、薄膜素子部の小型化をはかる際に高強度・高
歩留・高信頼性を持った優れた磁気ヘッドを実現するも
のである。
As described above, according to the present invention, in a magnetic head constructed by forming a thin film element portion on a substrate and then adhering a protective substrate to the thin film element portion, a thin film element portion side adhesive surface or By disposing a fine groove filled with an adhesive that is not exposed to the medium sliding surface in the vicinity of the medium sliding surface on at least one of the protective substrate side adhesive surfaces, the thin film element portion It is intended to realize an excellent magnetic head with high strength, high yield, and high reliability when downsizing.

【0020】また,本発明の製造方法は薄膜素子部側接
着面と保護基板側接着面を研磨する工程と、薄膜素子部
側接着面あるいは保護基板側接着面の少なくともどちら
か一方にフォトレジストを用いて溝のパターンを形成す
る工程と、パターンを作成した面のエッチング加工で所
定の溝を作成する工程と、接着剤を溝に充填した状態
で、薄膜素子部側接着面と保護基板側接着面を接着剤を
介して突き合わせて硬化させる工程とを含むことによ
り,機械加工ではできない必要な微細な溝を同時に多数
作成することができる。これによって、1枚の基板から
薄膜素子部の取れ数を大幅に増大することができ、安価
に提供することができる。
Further, the manufacturing method of the present invention comprises a step of polishing the thin film element portion side adhesive surface and the protective substrate side adhesive surface, and a photoresist on at least one of the thin film element portion side adhesive surface and the protective substrate side adhesive surface. Step of forming a groove pattern by using it, step of creating a predetermined groove by etching the surface on which the pattern was created, and bonding the thin film element side adhesive surface and protective substrate side adhesive with the groove filled. By including the step of bringing the surfaces into contact with each other via an adhesive and hardening the same, a large number of necessary fine grooves that cannot be machined can be simultaneously formed. As a result, the number of thin film element portions taken from one substrate can be significantly increased, and the thin film element portions can be provided at low cost.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の実施例における磁気ヘッドの外観図FIG. 1 is an external view of a magnetic head according to an embodiment of the invention.

【図2】本発明の実施例における磁気ヘッド製造方法の
各工程の説明図
FIG. 2 is an explanatory diagram of each step of the magnetic head manufacturing method according to the embodiment of the present invention.

【図3】従来の磁気ヘッドの外観図FIG. 3 is an external view of a conventional magnetic head

【図4】従来ヘッドの接着強度と接着面積の関係の実測
値を示す図
FIG. 4 is a diagram showing actually measured values of the relationship between the adhesive strength and the adhesive area of a conventional head.

【図5】従来ヘッドの接着強度と接着層厚の関係の実測
値を示す図
FIG. 5 is a diagram showing measured values of the relationship between the adhesive strength of the conventional head and the adhesive layer thickness.

【図6】従来ヘッドにおける接着層が厚いときの問題点
説明図
FIG. 6 is an explanatory view of a problem when the adhesive layer in the conventional head is thick.

【符号の説明】[Explanation of symbols]

1 セラミック基板 2 薄膜素子部 3 保護層 4 保護基板 5 接着剤 6 端子部 7 溝 8 フォトレジスト 9 薄膜素子部側接着面 10 保護基板側接着面 20 媒体摺動面 DESCRIPTION OF SYMBOLS 1 Ceramic substrate 2 Thin film element part 3 Protective layer 4 Protective substrate 5 Adhesive 6 Terminal part 7 Groove 8 Photoresist 9 Thin film element side adhesive surface 10 Protective substrate side adhesive surface 20 Medium sliding surface

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 基板上に薄膜素子部を作成した後、保護
基板を前記薄膜素子部に接着することで構成される磁気
ヘッドにおいて、前記薄膜素子部側接着面あるいは前記
保護基板側接着面の少なくともどちらか一方に、媒体摺
動面近傍で且つ前記媒体摺動面に露出しない、接着剤の
充填された微細な溝を有することを特徴とする薄膜磁気
ヘッド。
1. A magnetic head constructed by forming a thin film element portion on a substrate and then adhering a protective substrate to the thin film element portion, wherein the thin film element portion side adhesive surface or the protective substrate side adhesive surface is formed. A thin-film magnetic head, characterized in that at least one of them has a fine groove filled with an adhesive near the medium sliding surface and not exposed to the medium sliding surface.
【請求項2】 薄膜素子部を作成した基板の前記薄膜素
子部側接着面と保護基板側接着面を研磨する工程と、前
記薄膜素子部側接着面あるいは前記保護基板側接着面の
少なくともどちらか一方に、フォトレジストを用いて媒
体摺動面にまで達しない溝のパターンを形成する工程
と、前記パターンを作成した前記薄膜素子部側接着面あ
るいは前記保護基板側接着面をエッチングにより加工す
ることで所定の溝を作成する工程と、接着剤を前記溝に
充填した状態で、前記薄膜素子部側接着面と前記保護基
板側接着面を接着剤を介して突き合わせて硬化させる工
程とを含むことを特徴とする薄膜磁気ヘッド製造方法。
2. A step of polishing the thin film element portion side adhesive surface and the protective substrate side adhesive surface of the substrate on which the thin film element portion is formed, and at least one of the thin film element portion side adhesive surface and the protective substrate side adhesive surface. On the other hand, a step of forming a groove pattern that does not reach the medium sliding surface using a photoresist, and processing the thin film element side adhesive surface or the protective substrate side adhesive surface on which the pattern is formed by etching. And a step of forming a predetermined groove with the adhesive, and a step of abutting and curing the thin film element side adhesive surface and the protective substrate side adhesive surface via an adhesive while the groove is filled with an adhesive. And a method of manufacturing a thin film magnetic head.
JP12786195A 1995-05-26 1995-05-26 Thin film magnetic head and method of manufacturing the same Expired - Fee Related JP2998593B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12786195A JP2998593B2 (en) 1995-05-26 1995-05-26 Thin film magnetic head and method of manufacturing the same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12786195A JP2998593B2 (en) 1995-05-26 1995-05-26 Thin film magnetic head and method of manufacturing the same

Publications (2)

Publication Number Publication Date
JPH08321012A true JPH08321012A (en) 1996-12-03
JP2998593B2 JP2998593B2 (en) 2000-01-11

Family

ID=14970478

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12786195A Expired - Fee Related JP2998593B2 (en) 1995-05-26 1995-05-26 Thin film magnetic head and method of manufacturing the same

Country Status (1)

Country Link
JP (1) JP2998593B2 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7724474B2 (en) 2005-08-09 2010-05-25 Tdk Corporation Thin-film magnetic head comprising contact pad including portions of closure and substrate and magnetic recording apparatus comprising the head
US7764466B2 (en) 2005-11-17 2010-07-27 Tdk Corporation Thin-film magnetic head with closure and manufacturing method of the head

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7724474B2 (en) 2005-08-09 2010-05-25 Tdk Corporation Thin-film magnetic head comprising contact pad including portions of closure and substrate and magnetic recording apparatus comprising the head
US7764466B2 (en) 2005-11-17 2010-07-27 Tdk Corporation Thin-film magnetic head with closure and manufacturing method of the head

Also Published As

Publication number Publication date
JP2998593B2 (en) 2000-01-11

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