JPH08316260A - Wire bonding method and semiconductor manufacturing apparatus - Google Patents

Wire bonding method and semiconductor manufacturing apparatus

Info

Publication number
JPH08316260A
JPH08316260A JP11943195A JP11943195A JPH08316260A JP H08316260 A JPH08316260 A JP H08316260A JP 11943195 A JP11943195 A JP 11943195A JP 11943195 A JP11943195 A JP 11943195A JP H08316260 A JPH08316260 A JP H08316260A
Authority
JP
Japan
Prior art keywords
wire
bonding
loop
parallel movement
package
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP11943195A
Other languages
Japanese (ja)
Inventor
Junichi Hirata
淳一 平田
Isamu Yamazaki
山崎  勇
Yasushi Ishii
康 石井
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Renesas Eastern Japan Semiconductor Inc
Original Assignee
Hitachi Tokyo Electronics Co Ltd
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Tokyo Electronics Co Ltd, Hitachi Ltd filed Critical Hitachi Tokyo Electronics Co Ltd
Priority to JP11943195A priority Critical patent/JPH08316260A/en
Publication of JPH08316260A publication Critical patent/JPH08316260A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/74Apparatus for manufacturing arrangements for connecting or disconnecting semiconductor or solid-state bodies
    • H01L24/78Apparatus for connecting with wire connectors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/44Structure, shape, material or disposition of the wire connectors prior to the connecting process
    • H01L2224/45Structure, shape, material or disposition of the wire connectors prior to the connecting process of an individual wire connector
    • H01L2224/45001Core members of the connector
    • H01L2224/45099Material
    • H01L2224/451Material with a principal constituent of the material being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof
    • H01L2224/45138Material with a principal constituent of the material being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof the principal constituent melting at a temperature of greater than or equal to 950°C and less than 1550°C
    • H01L2224/45144Gold (Au) as principal constituent
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/4805Shape
    • H01L2224/4809Loop shape
    • H01L2224/48091Arched
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/481Disposition
    • H01L2224/48151Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/48221Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/48225Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/481Disposition
    • H01L2224/48151Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/48221Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/48225Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • H01L2224/48227Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation connecting the wire to a bond pad of the item
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/481Disposition
    • H01L2224/48151Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/48221Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/48245Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic
    • H01L2224/48247Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic connecting the wire to a bond pad of the item
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/484Connecting portions
    • H01L2224/48463Connecting portions the connecting portion on the bonding area of the semiconductor or solid-state body being a ball bond
    • H01L2224/48465Connecting portions the connecting portion on the bonding area of the semiconductor or solid-state body being a ball bond the other connecting portion not on the bonding area being a wedge bond, i.e. ball-to-wedge, regular stitch
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/74Apparatus for manufacturing arrangements for connecting or disconnecting semiconductor or solid-state bodies and for methods related thereto
    • H01L2224/78Apparatus for connecting with wire connectors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/74Apparatus for manufacturing arrangements for connecting or disconnecting semiconductor or solid-state bodies and for methods related thereto
    • H01L2224/78Apparatus for connecting with wire connectors
    • H01L2224/7825Means for applying energy, e.g. heating means
    • H01L2224/783Means for applying energy, e.g. heating means by means of pressure
    • H01L2224/78301Capillary
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/80Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
    • H01L2224/85Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a wire connector
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/80Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
    • H01L2224/85Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a wire connector
    • H01L2224/8512Aligning
    • H01L2224/85148Aligning involving movement of a part of the bonding apparatus
    • H01L2224/85169Aligning involving movement of a part of the bonding apparatus being the upper part of the bonding apparatus, i.e. bonding head, e.g. capillary or wedge
    • H01L2224/8518Translational movements
    • H01L2224/85181Translational movements connecting first on the semiconductor or solid-state body, i.e. on-chip, regular stitch
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01082Lead [Pb]

Abstract

PURPOSE: To obtain a wire bonding method in which an ultralow loop in an arch height of about 100μm can be realized without damaging the neck part of a wire loop by a method wherein the operation of a bonding tool is controlled in a specific sequence. CONSTITUTION: The operation of a bonding head and that of a table on which the bonding head is mounted are controlled, a connecting electrode on a semiconductor chip 10 and a terminal 15 for external derivation on a package are connected by a bonding wire 13 which is pulled out from a bonding tool 5. In this case, one end of the bonding wire 13 is connected to the connecting electrode on the semiconductor chip 10, and the operation of the bonding tool 5 is controlled in the sequence of a first rise (1), a first fall and a parallel movement (2), a second rise (3) and a second fall and a parallel movement (4). Then, the other end of the bonding wire 13 is connected to the terminal 15 for external derivation on the package. For example, an operating track in a first fall and a parallel movement (2) and a second fall and a parallel movement (4) is set to be an arc shape.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、ワイヤボンディング技
術に関し、たとえば金線などのボンディングを行うワイ
ヤボンダにおけるボンディングツールの動作軌跡におい
て、特にワイヤループのネック部にダメージを与えず
に、アーチ高さがおよそ100μmの超低ループ化の実
現が可能なワイヤボンディング方法および半導体製造装
置に適用して有効な技術に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a wire bonding technique, and for example, in an operation locus of a bonding tool in a wire bonder for bonding a gold wire or the like, an arch height can be increased without damaging a neck portion of a wire loop. The present invention relates to a wire bonding method capable of realizing an ultra-low loop of about 100 μm and a technique effectively applied to a semiconductor manufacturing apparatus.

【0002】[0002]

【従来の技術】たとえば、公知とされたものではない
が、発明者が検討した技術として、金線ボンディング用
のワイヤボンダなどにおいては、ボンディングツール自
体をZ軸方向に移動可能とし、かつこのボンディングツ
ールが搭載されるXYテーブルをX軸およびY軸方向に
移動可能として、このボンディングツールおよびXYテ
ーブルの動作制御により半導体チップ上の接続電極とパ
ッケージの外部引き出し用端子との間がボンディングワ
イヤによって接続される。
2. Description of the Related Art For example, in a wire bonder for gold wire bonding, the bonding tool itself can be moved in the Z-axis direction as a technology studied by the inventor, which is not publicly known. The XY table on which is mounted is movable in the X-axis and Y-axis directions, and the connection electrodes on the semiconductor chip and the external lead-out terminals of the package are connected by bonding wires by the operation control of the bonding tool and the XY table. It

【0003】ところで、近年のVLSIロジックデバイ
スなどのパッケージにおいては、多ピン化、薄型化へ進
んでおり、たとえば薄型プラスチックパッケージを実現
するために、低いループを形成する技術・装置の開発や
ワイヤ材料の開発が要求されてきている。
By the way, in recent packages such as VLSI logic devices, the number of pins has been increased and the thickness has been reduced. For example, in order to realize a thin plastic package, the development of a technique / apparatus for forming a low loop and the wire material. Development is being demanded.

【0004】そこで、ボンディングワイヤの低ループ化
を実現するにあたり、現在ではワイヤ材料の開発による
ところが大きく、ネイルヘッドボンディングでは、ワイ
ヤを溶融してボールを形成する際の放電電流の熱影響に
よりボール直下のネック部が再結晶化してネック部の長
さによってアーチ高さが決まるため、放電電流を制御す
ると同時に再結晶化し難い添加元素を入れてネック部が
短くなるようなワイヤの開発が進められている。
Therefore, in order to realize the low loop of the bonding wire, the development of the wire material has been mainly made at present. In the nail head bonding, the wire is directly under the ball due to the thermal effect of the discharge current when the wire is melted to form the ball. Since the neck recrystallizes and the arch height is determined by the length of the neck, the wire is being developed to control the discharge current and at the same time add an additive element that is difficult to recrystallize to shorten the neck. There is.

【0005】また、ワイヤボンディングのプロセス的に
は、アーチ高さが安定するループ形成技術が開発されて
きており、たとえばアーチ高さを低くするためにクラン
パを制御してキャピラリからボンディングワイヤの引き
出される量を少なくすることにより、ループをある程度
低くしてボンディングを実現しているものと考えられ
る。
As for the wire bonding process, a loop forming technique for stabilizing the arch height has been developed. For example, in order to reduce the arch height, the clamper is controlled to pull out the bonding wire from the capillary. It is considered that the bonding is realized by reducing the loop to some extent by reducing the amount.

【0006】なお、このようなワイヤボンディングに関
する技術としては、たとえば1993年5月31日、日
経BP社発行の「実践講座 VLSIパッケージング技
術(下)」P22〜P30などの文献に記載されてい
る。
A technique relating to such wire bonding is described in documents such as "Practical course VLSI packaging technique (bottom)" P22 to P30 issued by Nikkei BP on May 31, 1993. .

【0007】[0007]

【発明が解決しようとする課題】ところが、前記のよう
な放電電流の制御、ワイヤの開発、クランパの制御技術
においては、ある程度の低ループ化によるボンディング
は可能となるものの、ループのネック部にダメージを与
え、このダメージが低減できないためにワイヤの引っ張
り強度がとれずに、ワイヤボンディング後のモールド時
に断線を引き起こす要因となっている。
However, in the above-mentioned discharge current control, wire development, and clamper control techniques, bonding can be achieved by lowering the loop to some extent, but the neck portion of the loop is damaged. Since this damage cannot be reduced, the tensile strength of the wire cannot be obtained, which causes a disconnection during molding after wire bonding.

【0008】そこで、本発明の目的は、ボンディングツ
ールの動作軌跡を制御して、ワイヤループのネック部に
ダメージを与えずに、アーチ高さがおよそ100μmの
超低ループ化を実現することができるワイヤボンディン
グ方法および半導体製造装置を提供することにある。
Therefore, an object of the present invention is to control the operation locus of the bonding tool to realize an ultra-low loop with an arch height of about 100 μm without damaging the neck portion of the wire loop. It is to provide a wire bonding method and a semiconductor manufacturing apparatus.

【0009】本発明の前記ならびにその他の目的と新規
な特徴は、本明細書の記述および添付図面から明らかに
なるであろう。
The above and other objects and novel features of the present invention will be apparent from the description of this specification and the accompanying drawings.

【0010】[0010]

【課題を解決するための手段】本願において開示される
発明のうち、代表的なものの概要を簡単に説明すれば、
以下のとおりである。
Of the inventions disclosed in the present application, a representative one will be briefly described below.
It is as follows.

【0011】すなわち、本発明のワイヤボンディング方
法は、ボンディングヘッドおよびこのボンディングヘッ
ドが搭載されるテーブルの動作制御により、半導体チッ
プ上の接続電極とパッケージの外部引き出し用端子との
間をボンディングツールから引き出されるボンディング
ワイヤで接続する場合に適用されるものであり、ボンデ
ィングワイヤの一方を半導体チップ上の接続電極に接続
した後のボンディングツールの動作を、第1の上昇、第
1の下降かつ平行移動、第2の上昇、第2の下降かつ平
行移動の順に制御して、ボンディングワイヤの他方をパ
ッケージの外部引き出し用端子に接続するものである。
That is, according to the wire bonding method of the present invention, by controlling the operation of the bonding head and the table on which the bonding head is mounted, the connection electrode on the semiconductor chip and the external lead terminal of the package are pulled out from the bonding tool. The present invention is applied to the case where the bonding wire is connected by the bonding wire, and the operation of the bonding tool after connecting one of the bonding wires to the connection electrode on the semiconductor chip is performed by the first rising, the first descending and parallel movement, The other of the bonding wires is connected to the external lead-out terminal of the package by controlling the second ascending, the second descending, and the parallel movement in this order.

【0012】具体的には、前記ボンディングツールの動
作制御を、第1の上昇で必要とするワイヤループのアー
チ高さの数倍の高さまで動作させた後に第1の下降かつ
平行移動でワイヤループのアーチ高さ付近まで動作さ
せ、さらに第2の上昇でワイヤループの長さ分だけ動作
させた後に第2の下降かつ平行移動でパッケージの外部
引き出し用端子の位置まで動作させるようにし、特に前
記ワイヤループのアーチ高さをおよそ100μmとし、
さらに前記第1の下降かつ平行移動および第2の下降か
つ平行移動における動作軌跡を弧状とするようにしたも
のである。
[0012] Specifically, the operation control of the bonding tool is operated up to several times as high as the arch height of the wire loop required for the first ascent, and then the wire loop is moved for the first descending and parallel movement. To the position of the external lead-out terminal of the package by the second descending and parallel movement. The arch height of the wire loop is about 100 μm,
Further, the operation loci in the first descending and parallel moving and the second descending and parallel moving are arcuate.

【0013】また、本発明の半導体製造装置は、少なく
とも、ボンディングツールの動作軌跡を制御するため
に、半導体チップ上の接続電極の位置に位置決めしてボ
ンディングワイヤの一方を半導体チップ上の接続電極に
接続し、その後必要とするワイヤループのアーチ高さの
数倍の高さまで上昇させた後にワイヤループのアーチ高
さ付近まで下降かつ平行移動させ、さらにワイヤループ
の長さ分だけ上昇させた後に下降かつ平行移動させてパ
ッケージの外部引き出し用端子の位置に位置決めしてボ
ンディングワイヤの他方をパッケージの外部引き出し用
端子に接続する手段を有するものである。
Further, in the semiconductor manufacturing apparatus of the present invention, at least the bonding wire is positioned at the position of the connection electrode on the semiconductor chip and one of the bonding wires is connected to the connection electrode on the semiconductor chip in order to control the operation trajectory of the bonding tool. Connect, then raise to a height several times higher than the required wire loop arch height, then descend and translate to near the wire loop arch height, then raise the wire loop length and then descend. Further, there is provided means for parallelly moving and positioning at the position of the external lead-out terminal of the package to connect the other bonding wire to the external lead-out terminal of the package.

【0014】[0014]

【作用】前記したワイヤボンディング方法および半導体
製造装置によれば、半導体チップ上の接続電極とパッケ
ージの外部引き出し用端子との間のワイヤボンディング
におけるボンディングツールの動作が、第1の上昇と下
降かつ平行移動、第2の上昇と下降かつ平行移動で行わ
れることにより、1回目の第1の上昇と下降かつ平行移
動による軌跡によってワイヤループのアーチ高さを決
め、2回目の第2の上昇と下降かつ平行移動によってワ
イヤループの長さを決めることができる。
According to the wire bonding method and the semiconductor manufacturing apparatus described above, the operation of the bonding tool in the wire bonding between the connection electrode on the semiconductor chip and the external lead-out terminal of the package is the first ascending, descending and parallel operation. By performing the movement, the second ascent and descent and the parallel movement, the arch height of the wire loop is determined by the locus of the first ascending and descending and the parallel movement, and the second ascending and descending the second time. And the length of the wire loop can be determined by the translation.

【0015】たとえば、ワイヤループのアーチ高さをお
よそ100μmに抑える場合には、ボンディングツール
の第1の上昇で100μmのアーチ高さの数倍、たとえ
ば300〜500μm程度の高さまで動作させることで
ワイヤループの低ループ化を図ることができる。
For example, when the arch height of the wire loop is to be suppressed to about 100 μm, the wire is operated by operating the bonding tool up to a height several hundred times the arch height of 100 μm, for example, 300 to 500 μm. A low loop can be achieved.

【0016】また、ワイヤループのアーチ高さ、すなわ
ちこのアーチ高さに相当するネック部の長さを1回目の
第1の上昇と下降かつ平行移動による軌跡によって決め
てしまうために、低ループ化を可能とする従来のような
リバースモード動作に比べてボンディングツールとワイ
ヤとの擦れを抑えることができ、これによってワイヤの
ネック部に与えるダメージを低減させることができる。
Further, since the arch height of the wire loop, that is, the length of the neck portion corresponding to this arch height is determined by the trajectory of the first ascent and descent and the parallel movement of the first time, the loop is made low. It is possible to suppress the friction between the bonding tool and the wire, as compared with the conventional reverse mode operation that enables the above, and thereby reduce the damage given to the neck portion of the wire.

【0017】さらに、1回目の第1の下降かつ平行移
動、2回目の第2の下降かつ平行移動における動作軌跡
によってワイヤループの形状、さらにこの形状に伴って
アーチ高さなどが異なり、たとえば動作軌跡を弧状とす
る場合には、直線に比べてワイヤループの形状が緩やか
になるとともにアーチ高さを低くすることができる。
Further, the shape of the wire loop and the arch height and the like differ depending on the motion locus in the first first downward movement and parallel movement and the second second downward movement and parallel movement. When the locus is arcuate, the shape of the wire loop becomes gentler and the arch height can be made lower than that of a straight line.

【0018】これにより、ワイヤループのネック部にダ
メージを与えることなく、かつアーチ高さをおよそ10
0μmの超低ループにすることができるので、ワイヤル
ープのネック部におけるダメージの低減とワイヤループ
の超低ループ化の両立を実現させることができる。
As a result, the arch height is about 10 without damaging the neck portion of the wire loop.
Since the ultra-low loop of 0 μm can be achieved, it is possible to realize both reduction of damage at the neck portion of the wire loop and ultra-low loop of the wire loop.

【0019】[0019]

【実施例】以下、本発明の実施例を図面に基づいて詳細
に説明する。
Embodiments of the present invention will now be described in detail with reference to the drawings.

【0020】図1は本発明の一実施例であるワイヤボン
ダの一例を示す外観斜視図、図2は本実施例のワイヤボ
ンダにおけるワイヤボンディングの各処理手順における
状態を示す説明図、図3はボンディングツールの動作軌
跡とワイヤのループ状態の一例を示す説明図、図4は本
実施例と比較した従来技術におけるボンディングツール
の動作軌跡の一例を示す説明図、図5は図4におけるボ
ンディングツールとワイヤとの要部関係を示す断面図、
図6は従来技術における他の一例を示す説明図である。
FIG. 1 is an external perspective view showing an example of a wire bonder which is an embodiment of the present invention, FIG. 2 is an explanatory view showing the state of each wire bonding process in the wire bonder of this embodiment, and FIG. 3 is a bonding tool. 4 is an explanatory view showing an example of the operation locus of the bonding tool and the wire loop state of the wire, FIG. 4 is an explanatory view showing an example of the operation path of the bonding tool in the prior art compared with this embodiment, and FIG. Cross-sectional view showing the main part relation of,
FIG. 6 is an explanatory diagram showing another example of the conventional technique.

【0021】まず、図1により本実施例のワイヤボンダ
の構成を説明する。
First, the structure of the wire bonder of this embodiment will be described with reference to FIG.

【0022】本実施例のワイヤボンダは、たとえば金
(Au)線を用いた熱圧着法によるネイルヘッドボンデ
ィングのワイヤボンダとされ、チップがダイボンディン
グされた基板の供給を行うローダ部1と、この基板を搬
送し、かつ所定の位置で停止させてワイヤボンディング
を行うフィーダ部2と、ワイヤボンディングされた基板
の収納を行うアンローダ部3と、X軸、Y軸およびZ軸
方向に駆動してチップ上の接続電極と基板上の外部引き
出し用端子との間のワイヤボンディングを行うボンディ
ングヘッド部4とから構成されている。
The wire bonder of this embodiment is a wire bonder for nail head bonding by a thermocompression bonding method using, for example, a gold (Au) wire. A feeder section 2 for carrying and carrying out wire bonding by stopping at a predetermined position, an unloader section 3 for housing the wire-bonded substrate, and an X-axis, Y-axis, and Z-axis direction for driving on the chip. It comprises a bonding head portion 4 for wire bonding between the connection electrode and the external lead-out terminal on the substrate.

【0023】ボンディングヘッド部4は、金線を通すキ
ャピラリ5(ボンディングツール)、キャピラリ5を取
り付けるツールホルダ6、X軸およびY軸方向へ移動す
るXYテーブル7、チップと基板との位置を検出するカ
メラ8などから構成され、先端にキャピラリ5が取り付
けられているツールホルダ6が上下に動かされ、このボ
ンディングヘッド部4が載るXYテーブル7との動作制
御により、ボンド間に金線が接続されてループが形成さ
れ、このときにボンディングヘッド部4に搭載されたカ
メラ8により、基板とその上にダイボンディングされた
チップとの相対位置が検出され、所定の箇所に金線が接
続されるようになっている。
The bonding head unit 4 detects a capillary 5 (bonding tool) through which a gold wire is passed, a tool holder 6 to which the capillary 5 is attached, an XY table 7 that moves in the X-axis and Y-axis directions, and the positions of the chip and the substrate. A tool holder 6 including a camera 8 and having a capillary 5 attached at its tip is moved up and down, and a gold wire is connected between the bonds by controlling the operation with an XY table 7 on which the bonding head 4 is mounted. A loop is formed, and at this time, the relative position between the substrate and the chip die-bonded thereon is detected by the camera 8 mounted on the bonding head unit 4 so that the gold wire is connected to a predetermined position. Has become.

【0024】また、ボンディングヘッド部4には、キャ
ピラリ5が取り付けられているツールホルダ6と、この
ボンディングヘッド部4が載るXYテーブル7との相対
動作制御により、キャピラリ5の動作軌跡を制御するた
めの制御部9(ヘッド制御手段)が接続されており、一
連のワイヤボンディング動作を制御するとともに、特に
金線の一方が半導体チップ上の接続電極に接続された
後、キャピラリ5の動作が、第1の上昇、第1の下降か
つ平行移動、第2の上昇、第2の下降かつ平行移動の順
に制御されて、金線の他方がパッケージの外部引き出し
用端子に接続されるようになっている。
Further, in order to control the movement locus of the capillary 5 by the relative movement control of the tool holder 6 to which the capillary 5 is attached to the bonding head portion 4 and the XY table 7 on which this bonding head portion 4 is mounted. Is connected to the controller 9 (head control means) to control a series of wire bonding operations, and in particular, after one of the gold wires is connected to the connection electrode on the semiconductor chip, the operation of the capillary 5 is Controlled in the order of 1 rise, 1st fall and parallel movement, 2nd rise, 2nd fall and parallel movement, the other of the gold wires is connected to the external lead-out terminal of the package. .

【0025】次に、本実施例の作用について、始めにワ
イヤボンディングの基本動作を図2に基づいて説明す
る。
Next, regarding the operation of this embodiment, the basic operation of wire bonding will be described with reference to FIG.

【0026】まず、ローダ部1から供給されたチップ1
0がダイボンディングされた基板11をフィーダ部2に
より搬送し、このフィーダ部2上の所定の位置で停止さ
せてワイヤボンディング位置に位置決めする。これと同
時に、ボンディングヘッド部4のキャピラリ5もチップ
10上の所定の接続電極の位置に位置決めする。
First, the chip 1 supplied from the loader unit 1
The substrate 11 on which 0 is die-bonded is conveyed by the feeder unit 2, stopped at a predetermined position on the feeder unit 2 and positioned at the wire bonding position. At the same time, the capillaries 5 of the bonding head unit 4 are also positioned at the positions of the predetermined connection electrodes on the chip 10.

【0027】そして、ワイヤスプール12より金線13
(ボンディングワイヤ)を供給し、キャピラリ5に通さ
れた金線13の先端を電気トーチ、ガス炎などのボール
形成用トーチ14で溶融してボールを形成する(図2
(a) )。さらに、キャピラリ5でボールを基板11上に
ダイボンディングされたチップ10上の接続電極上に圧
着する(図2(b) )。
Then, the gold wire 13 is formed from the wire spool 12.
(Bonding wire) is supplied, and the tip of the gold wire 13 passed through the capillary 5 is melted by a ball forming torch 14 such as an electric torch or a gas flame to form a ball (FIG. 2).
(a)). Further, the capillaries 5 press-bond the balls onto the connection electrodes on the chip 10 die-bonded onto the substrate 11 (FIG. 2 (b)).

【0028】その後、金線13を基板11上の外部引き
出し用端子のインナーリード15に導き、キャピラリ5
のエッジでインナーリード15上に金線13を圧着する
(図2(c) )。そして、クランパ16で金線13を挟ん
で引っ張り、金線13を切断する(図2(d) )。
After that, the gold wire 13 is guided to the inner lead 15 of the external lead-out terminal on the substrate 11, and the capillary 5 is inserted.
The gold wire 13 is crimped onto the inner lead 15 at the edge of (Fig. 2 (c)). Then, the gold wire 13 is sandwiched by the clamper 16 and pulled to cut the gold wire 13 (FIG. 2 (d)).

【0029】これにより、1ワイヤのボンディングが終
了し、以降は上記の基本動作をチップ10上の全ての接
続電極と外部引き出し用端子のインナーリード15とに
対して繰り返すことにより1個の基板11のワイヤボン
ディングが完了する。
As a result, the bonding of one wire is completed, and thereafter, the above basic operation is repeated for all the connection electrodes on the chip 10 and the inner leads 15 of the external lead-out terminals, so that one substrate 11 is formed. Wire bonding is completed.

【0030】そして、ワイヤボンディングが完了した基
板11をフィーダ部2により搬送し、このワイヤボンデ
ィングされた基板11をアンローダ部3に収納する。以
上の動作をローダ部1に収納されている全ての基板11
に対して繰り返して行う。
Then, the substrate 11 on which wire bonding has been completed is conveyed by the feeder unit 2, and this wire-bonded substrate 11 is stored in the unloader unit 3. All the substrates 11 stored in the loader unit 1 are subjected to the above operation.
Repeat for.

【0031】続いて、本実施例の特徴であるワイヤボン
ディング時におけるキャピラリ5の動作制御について、
金線13の一方がチップ10上の接続電極に接続された
後、所定の軌跡で制御されて金線13の他方が外部引き
出し用端子のインナーリード15に接続されるまでの手
順を図3により説明する。
Next, regarding the operation control of the capillary 5 during wire bonding, which is a feature of this embodiment,
After connecting one of the gold wires 13 to the connection electrode on the chip 10, the procedure until the other of the gold wires 13 is connected to the inner lead 15 of the external lead-out terminal under the control of a predetermined locus is shown in FIG. explain.

【0032】なお、図3においては、破線部分がワイヤ
ボンディング完了後の金線13によるループ形状を示
し、また実線部分はキャピラリ5の先端の動作軌跡を示
し、この動作軌跡における数字〜が動作順番となっ
ている。
In FIG. 3, the broken line portion shows the loop shape of the gold wire 13 after the wire bonding is completed, and the solid line portion shows the movement locus of the tip of the capillary 5. Has become.

【0033】まず、金線13の一方をチップ10上の接
続電極に接続した後、第1の上昇により必要とするワイ
ヤループのアーチ高さの数倍の高さまで動作させる
()。その後、第1の下降かつ平行移動によりワイヤ
ループのアーチ高さまで、たとえば弧状軌跡で動作させ
る()。
First, after connecting one of the gold wires 13 to the connection electrode on the chip 10, the gold wire 13 is operated up to several times as high as the arch height of the wire loop required by the first rise (). After that, it is moved to the arch height of the wire loop by, for example, an arc-shaped trajectory by the first descending and parallel movement ().

【0034】さらに、第2の上昇で必要とするワイヤル
ープの長さ分だけ動作させる()。その後、第2の下
降かつ平行移動で外部引き出し用端子のインナーリード
15の位置まで、たとえば弧状軌跡で動作させる
()。
Further, the wire loop is operated by the length of the wire loop required for the second ascent (). After that, the second descending and parallel movement is performed to the position of the inner lead 15 of the external lead-out terminal, for example, in an arcuate locus ().

【0035】そして、インナーリード15の所定の位置
へ接続のために位置決め動作を行う(〜)。これに
より、金線13の他方を外部引き出し用端子のインナー
リード15に接続することができる。
Then, a positioning operation is performed to connect the inner lead 15 to a predetermined position (-). Thereby, the other of the gold wires 13 can be connected to the inner lead 15 of the external lead-out terminal.

【0036】この一連のキャピラリ5の動作において
は、第1の上昇、その後の第1の下降かつ平行移動によ
ってワイヤループのアーチ高さがほぼ決定され、たとえ
ばこの場合には第1の上昇によりたとえば300〜50
0μmの高さまで動作した後に第1の下降かつ平行移動
により弧状軌跡で動作するので、アーチ高さはおよそ1
00μmとすることができる。なお、この動作軌跡につ
いては、一点鎖線で示す´〜´で動作させることも
可能である。
In this series of movements of the capillary 5, the arch height of the wire loop is substantially determined by the first ascent and then the first ascent and translation, for example in this case the first ascent. 300-50
After operating up to a height of 0 μm, it moves in an arcuate trajectory by the first descending and parallel movement, so the arch height is about 1
It can be set to 00 μm. It should be noted that this movement locus can also be moved along the lines'- 'indicated by the one-dot chain line.

【0037】従って、本実施例のワイヤボンダによれ
ば、金線13の一方がチップ10上の接続電極に接続さ
れた後に金線13の他方が外部引き出し用端子のインナ
ーリード15に接続されるまでのキャピラリ5の動作軌
跡を制御することにより、ワイヤループのアーチ高さを
およそ100μmに超低ループ化することができ、かつ
ワイヤループのネック部に与えるダメージを低減するこ
とができる。
Therefore, according to the wire bonder of this embodiment, one of the gold wires 13 is connected to the connection electrode on the chip 10 and the other of the gold wires 13 is connected to the inner lead 15 of the external lead-out terminal. By controlling the operation locus of the capillary 5, the arch height of the wire loop can be made extremely low to about 100 μm, and damage to the neck portion of the wire loop can be reduced.

【0038】たとえば、本実施例と比較される従来技術
において、図4に示すような低ループ化を可能とするリ
バースモード動作の場合には、金線13がリバース動作
によりキャピラリ5から出されるときに図5のようにキ
ャピラリ5の内部と擦れてネック部にダメージが残り、
また図6のようなノーマルモード動作の場合には、金線
13が擦れずに曲げ力のみが加わってダメージは少ない
ものの低ループ化ができず、本実施例のような両立可能
な技術が望まれている。
For example, in the prior art compared with this embodiment, in the case of the reverse mode operation which enables the low loop as shown in FIG. 4, when the gold wire 13 is taken out from the capillary 5 by the reverse operation. As shown in Fig. 5, it rubs against the inside of the capillary 5 and damage remains on the neck,
Further, in the case of the normal mode operation as shown in FIG. 6, the gold wire 13 is not rubbed and only bending force is applied to the gold wire 13 to cause less damage, but the loop cannot be made low, and a compatible technique as in the present embodiment is desired. It is rare.

【0039】以上、本発明者によってなされた発明を実
施例に基づき具体的に説明したが、本発明は前記実施例
に限定されるものではなく、その要旨を逸脱しない範囲
で種々変更可能であることはいうまでもない。
Although the invention made by the present inventor has been specifically described based on the embodiments, the present invention is not limited to the embodiments and various modifications can be made without departing from the scope of the invention. Needless to say.

【0040】たとえば、本実施例のワイヤボンダについ
ては、金線を用いた熱圧着法によるネイルヘッドボンデ
ィングのワイヤボンダである場合について説明したが、
本発明は前記実施例に限定されるものではなく、超音波
併用熱圧着法によるネイルヘッドボンディング、さらに
超音波法によるウェッジボンディングによるワイヤボン
ダについても広く適用可能である。
For example, the wire bonder of this embodiment has been described as a wire bonder for nail head bonding by thermocompression bonding using a gold wire.
The present invention is not limited to the above-described embodiment, but can be widely applied to nail head bonding by the ultrasonic combined thermocompression bonding method and wire bonder by the wedge bonding by the ultrasonic method.

【0041】この超音波法によるウェッジボンディング
においては、ワイヤをウェッジと呼ばれるボンディング
ツールでチップ上の接続電極および外部引き出し用端子
に超音波を加えながら圧着する方法であり、常温で接合
可能なこと、ネイルヘッドボンディングに比べて電極の
微細ピッチ化に向いていることが特徴となる。
In the wedge bonding by the ultrasonic method, a wire is crimped by a bonding tool called a wedge while applying ultrasonic waves to a connecting electrode on a chip and a terminal for external extraction, and can be bonded at room temperature. The feature is that it is suitable for fine pitch of electrodes as compared with nail head bonding.

【0042】また、ウェッジボンディングでは、特にワ
イヤとしてアルミニウム線を用いることにより、このア
ルミニウム線は強度が小さく、腐食し易いため、主に気
密封止によるセラミックパッケージに使用することがで
きる。
In the wedge bonding, since an aluminum wire is used as a wire, the aluminum wire has low strength and is easily corroded. Therefore, the aluminum wire can be mainly used for a hermetically sealed ceramic package.

【0043】[0043]

【発明の効果】本願において開示される発明のうち、代
表的なものによって得られる効果を簡単に説明すれば、
以下のとおりである。
Advantageous effects obtained by typical ones of the inventions disclosed in the present application will be briefly described.
It is as follows.

【0044】(1).ボンディングワイヤの一方を半導体チ
ップ上の接続電極に接続した後、ボンディングツールの
動作を、第1の上昇、第1の下降かつ平行移動、第2の
上昇、第2の下降かつ平行移動の順に制御して、ボンデ
ィングワイヤの他方をパッケージの外部引き出し用端子
に接続することにより、ワイヤループのアーチ高さを第
1の上昇と下降かつ平行移動によって決めることができ
るので、第1の上昇でアーチ高さの数倍の高さまで動作
させることでワイヤループのアーチ高さをおよそ100
μmに超低ループ化することが可能となる。
(1). After connecting one of the bonding wires to the connection electrode on the semiconductor chip, the operation of the bonding tool is changed to the first rising, the first lowering and parallel movement, the second rising, and the second rising. By controlling the descending and parallel movements in order and connecting the other side of the bonding wire to the external lead-out terminal of the package, the arch height of the wire loop can be determined by the first ascending and descending and parallel movements. The first rise raises the arch height of the wire loop to approximately 100 by operating to several times the arch height.
It becomes possible to make an ultra low loop to μm.

【0045】(2).前記(1) により、ワイヤループのアー
チ高さに相当するネック部の長さを1回目の第1の上昇
と下降かつ平行移動による軌跡によって決めることがで
きるので、ボンディングツールとワイヤとの擦れを抑
え、ワイヤループのネック部に与えるダメージを低減す
ることが可能となる。
(2) According to the above (1), the length of the neck portion corresponding to the arch height of the wire loop can be determined by the trajectory of the first ascent and descent and the parallel movement of the first time. It is possible to suppress rubbing between the tool and the wire and reduce damage to the neck portion of the wire loop.

【0046】(3).前記(1) において、第1の下降かつ平
行移動、第2の下降かつ平行移動におけるボンディング
ツールの動作軌跡を弧状とした場合には、この動作軌跡
によってワイヤループの形状、さらにこの形状に伴って
アーチ高さなどを変えることができるので、動作軌跡を
弧状とすることによってワイヤループの形状を緩やかに
してさらにアーチ高さの超低ループ化を図ることが可能
となる。
(3) In the above (1), when the operation locus of the bonding tool in the first descending and parallel movement and the second descending and parallel movement is arcuate, the shape of the wire loop is determined by this operation locus. Further, since the arch height and the like can be changed in accordance with this shape, it becomes possible to make the shape of the wire loop gentle by making the motion locus arc-shaped and further achieve an ultra-low loop of the arch height. .

【0047】(4).前記(1) 〜(3) により、ワイヤボンダ
におけるボンディングツールの動作軌跡を制御して、ワ
イヤループのネック部におけるダメージの低減と、ワイ
ヤループの超低ループ化との両立を実現することが可能
となる。
(4) By the above (1) to (3), it is possible to control the movement locus of the bonding tool in the wire bonder to reduce the damage in the neck portion of the wire loop and to realize the ultra-low loop of the wire loop. Can be realized.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の一実施例であるワイヤボンダの一例を
示す外観斜視図である。
FIG. 1 is an external perspective view showing an example of a wire bonder that is an embodiment of the present invention.

【図2】本実施例のワイヤボンダにおけるワイヤボンデ
ィングの各処理手順における状態を示す説明図である。
FIG. 2 is an explanatory diagram showing a state in each processing procedure of wire bonding in the wire bonder of the present embodiment.

【図3】本実施例において、ボンディングツールの動作
軌跡とワイヤのループ状態の一例を示す説明図である。
FIG. 3 is an explanatory diagram showing an example of an operation locus of a bonding tool and a loop state of a wire in the present embodiment.

【図4】本実施例と比較した従来技術におけるボンディ
ングツールの動作軌跡の一例を示す説明図である。
FIG. 4 is an explanatory diagram showing an example of an operation trajectory of a bonding tool in a conventional technique compared with this embodiment.

【図5】図4におけるボンディングツールとワイヤとの
要部関係を示す断面図である。
5 is a sectional view showing a main part relationship between a bonding tool and a wire in FIG.

【図6】本実施例と比較した従来技術におけるボンディ
ングツールの動作軌跡の他の一例を示す説明図である。
FIG. 6 is an explanatory diagram showing another example of the operation locus of the bonding tool in the related art compared with the present embodiment.

【符号の説明】[Explanation of symbols]

1 ローダ部 2 フィーダ部 3 アンローダ部 4 ボンディングヘッド部 5 キャピラリ(ボンディングツール) 6 ツールホルダ 7 XYテーブル 8 カメラ 9 制御部(ヘッド制御手段) 10 チップ 11 基板 12 ワイヤスプール 13 金線(ボンディングワイヤ) 14 ボール形成用トーチ 15 インナーリード 16 クランパ 1 Loader Section 2 Feeder Section 3 Unloader Section 4 Bonding Head Section 5 Capillary (Bonding Tool) 6 Tool Holder 7 XY Table 8 Camera 9 Control Section (Head Control Means) 10 Chip 11 Board 12 Wire Spool 13 Gold Wire (Bonding Wire) 14 Ball forming torch 15 Inner lead 16 Clamper

フロントページの続き (72)発明者 石井 康 東京都青梅市藤橋3丁目3番地2 日立東 京エレクトロニクス株式会社内Continued Front Page (72) Inventor Yasushi Ishii 3-3 Fujibashi, Ome City, Tokyo 2 Inside Hitachi Tokyo Electronics Co., Ltd.

Claims (5)

【特許請求の範囲】[Claims] 【請求項1】 ボンディングヘッドおよびこのボンディ
ングヘッドが搭載されるテーブルの動作制御により、半
導体チップ上の接続電極とパッケージの外部引き出し用
端子との間をボンディングツールから引き出されるボン
ディングワイヤで接続するワイヤボンディング方法であ
って、前記ボンディングワイヤの一方を前記半導体チッ
プ上の接続電極に接続した後、前記ボンディングツール
の動作を、第1の上昇、第1の下降かつ平行移動、第2
の上昇、第2の下降かつ平行移動の順に制御して、前記
ボンディングワイヤの他方を前記パッケージの外部引き
出し用端子に接続することを特徴とするワイヤボンディ
ング方法。
1. A wire bonding for connecting a connection electrode on a semiconductor chip and an external lead-out terminal of a package with a bonding wire pulled out from a bonding tool by controlling operation of a bonding head and a table on which the bonding head is mounted. A method of connecting one of the bonding wires to a connection electrode on the semiconductor chip, and then performing operations of the bonding tool including a first raising, a first lowering and a parallel movement;
And the second lowering and parallel movement are controlled in this order to connect the other of the bonding wires to the external lead-out terminal of the package.
【請求項2】 請求項1記載のワイヤボンディング方法
であって、前記ボンディングツールの動作手段として、
前記第1の上昇で必要とするワイヤループのアーチ高さ
の数倍の高さまで動作させた後に前記第1の下降かつ平
行移動で前記ワイヤループのアーチ高さ付近まで動作さ
せ、さらに前記第2の上昇で前記ワイヤループの長さ分
だけ動作させた後に前記第2の下降かつ平行移動で前記
パッケージの外部引き出し用端子の位置まで動作させる
ことを特徴とするワイヤボンディング方法。
2. The wire bonding method according to claim 1, wherein the operating means of the bonding tool is:
After operating to a height several times as high as the arch height of the wire loop required for the first ascent, the first descending and parallel movement is made to operate near the arch height of the wire loop, and further to the second The wire bonding method is characterized in that the wire loop is operated for the length of the wire loop by the ascent of the wire and then moved to the position of the external lead-out terminal of the package by the second descending and parallel movement.
【請求項3】 請求項1または2記載のワイヤボンディ
ング方法であって、前記ワイヤボンディング方法で前記
ボンディングツールの動作(軌跡)を制御することによ
り、前記ワイヤループのアーチ高さをおよそ100μm
とすることを特徴とするワイヤボンディング方法。
3. The wire bonding method according to claim 1, wherein the arch height of the wire loop is about 100 μm by controlling the operation (trajectory) of the bonding tool by the wire bonding method.
And a wire bonding method.
【請求項4】 請求項1、2または3記載のワイヤボン
ディング方法であって、前記第1の下降かつ平行移動お
よび前記第2の下降かつ平行移動における動作軌跡を弧
状とすることを特徴とするワイヤボンディング方法。
4. The wire bonding method according to claim 1, 2 or 3, wherein the operation loci in the first descending and parallel movement and in the second descending and parallel movement are arcuate. Wire bonding method.
【請求項5】 ボンディングヘッドおよびこのボンディ
ングヘッドが搭載されるテーブルの動作制御により、半
導体チップ上の接続電極とパッケージの外部引き出し用
端子との間をボンディングツールから引き出されるボン
ディングワイヤで接続する半導体製造装置であって、少
なくとも、前記ボンディングツールを、前記半導体チッ
プ上の接続電極の位置に位置決めして前記ボンディング
ワイヤの一方を前記半導体チップ上の接続電極に接続
し、その後必要とするワイヤループのアーチ高さの数倍
の高さまで上昇させた後に前記ワイヤループのアーチ高
さ付近まで下降かつ平行移動させ、さらに前記ワイヤル
ープの長さ分だけ上昇させた後に下降かつ平行移動させ
て前記パッケージの外部引き出し用端子の位置に位置決
めして前記ボンディングワイヤの他方を前記パッケージ
の外部引き出し用端子に接続する手段を有することを特
徴とする半導体製造装置。
5. A semiconductor manufacturing method in which a bonding head and a table on which the bonding head is mounted are controlled in operation to connect a connection electrode on a semiconductor chip and an external lead terminal of a package with a bonding wire drawn from a bonding tool. An apparatus, at least, positioning the bonding tool at a position of a connection electrode on the semiconductor chip to connect one of the bonding wires to a connection electrode on the semiconductor chip, and then an arch of a wire loop required. The height of the wire loop is raised several times, and then the wire loop is lowered and translated to the vicinity of the arch height, and the wire loop is raised by the length of the wire loop and then lowered and translated to the outside of the package. Position it at the position of the lead-out terminal and A semiconductor manufacturing apparatus comprising means for connecting the other of the wire to the external lead-out terminal of the package.
JP11943195A 1995-05-18 1995-05-18 Wire bonding method and semiconductor manufacturing apparatus Pending JPH08316260A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11943195A JPH08316260A (en) 1995-05-18 1995-05-18 Wire bonding method and semiconductor manufacturing apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11943195A JPH08316260A (en) 1995-05-18 1995-05-18 Wire bonding method and semiconductor manufacturing apparatus

Publications (1)

Publication Number Publication Date
JPH08316260A true JPH08316260A (en) 1996-11-29

Family

ID=14761271

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11943195A Pending JPH08316260A (en) 1995-05-18 1995-05-18 Wire bonding method and semiconductor manufacturing apparatus

Country Status (1)

Country Link
JP (1) JPH08316260A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7851347B2 (en) 2008-10-21 2010-12-14 Kabushiki Kaisha Shinkawa Wire bonding method and semiconductor device

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7851347B2 (en) 2008-10-21 2010-12-14 Kabushiki Kaisha Shinkawa Wire bonding method and semiconductor device
US8232656B2 (en) 2008-10-21 2012-07-31 Kabushiki Kaisha Shinkawa Semiconductor device

Similar Documents

Publication Publication Date Title
KR100646833B1 (en) Wire loop, semiconductor device having same, wire bonding method and wire bonding apparatus
JP4860128B2 (en) Wire bonding method
US7314818B2 (en) Semiconductor device and method of manufacturing the same, circuit board, and electronic equipment
KR101672053B1 (en) Method of manufacturing semiconductor device and semiconductor device
US3747198A (en) Tailless wedge bonding of gold wire to palladium-silver cermets
JP2002280414A (en) Semiconductor device and its manufacturing method
JP5714195B2 (en) Manufacturing method of semiconductor device
JP2004221257A (en) Wire bonding method and device thereof
JP2004282015A (en) Method and device for forming bump for semiconductor interconnection using wire bonding machine
JP2004289153A (en) Wire-bonding for semiconductor package
US20060216863A1 (en) Method of manufacturing semiconductor device
WO2005105357A1 (en) System and method for low loop wire bonding
JP2007512714A (en) Low loop height ball bonding method and apparatus
TW201421592A (en) Wire bonding device and production method of semiconductor device
WO2006112393A1 (en) Semiconductor device and semiconductor device manufacturing method
JPH06291160A (en) Semiconductor device and manufacture of semiconductor device
JPH08316260A (en) Wire bonding method and semiconductor manufacturing apparatus
JPH04334034A (en) Wire bonding method
JPH04255237A (en) Manufacture of semiconductor device
JPH1116934A (en) Wire-bonding method
JP2500655B2 (en) Wire-bonding method and device
JPH09162219A (en) Method and device for wire bonding
TWI816255B (en) Wire bonding structure, bonding structure forming method, and electronic device
JPH04206841A (en) Wire bonding equipment for semiconductor device
JP2000106381A (en) Manufacture of semiconductor device