JPH0831584B2 - Solid-state imaging device and method of manufacturing the same - Google Patents

Solid-state imaging device and method of manufacturing the same

Info

Publication number
JPH0831584B2
JPH0831584B2 JP5084785A JP8478593A JPH0831584B2 JP H0831584 B2 JPH0831584 B2 JP H0831584B2 JP 5084785 A JP5084785 A JP 5084785A JP 8478593 A JP8478593 A JP 8478593A JP H0831584 B2 JPH0831584 B2 JP H0831584B2
Authority
JP
Japan
Prior art keywords
solid
image pickup
substrate
state image
state imaging
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP5084785A
Other languages
Japanese (ja)
Other versions
JPH0621415A (en
Inventor
一己 庄司
昌俊 板坂
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sony Corp
Original Assignee
Sony Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sony Corp filed Critical Sony Corp
Priority to JP5084785A priority Critical patent/JPH0831584B2/en
Publication of JPH0621415A publication Critical patent/JPH0621415A/en
Publication of JPH0831584B2 publication Critical patent/JPH0831584B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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  • Solid State Image Pick-Up Elements (AREA)
  • Color Television Image Signal Generators (AREA)

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明はカラービデオカメラ用の
固体撮像装置およびその製造方法に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a solid-state image pickup device for a color video camera and a manufacturing method thereof .

【0002】[0002]

【従来の技術】従来、カラービデオカメラに使用される
固体撮像装置として図5に示す如きものが提案されてい
る。
2. Description of the Related Art Conventionally, as shown in FIG. 5, a solid-state image pickup device used for a color video camera has been proposed.

【0003】この固体撮像装置は、上部開口部にガラス
板1を装着したセラミック製のケース2の底部の略中央
部に固体撮像素子3をその撮像部3aをケース2の開口
部に向けて固定し、この固体撮像素子3の電極4とリー
ド部5とをAu線6で接続し所謂ワイヤーボンディング
すると共に周辺駆動回路素子7を装着した基板8の端子
9とをリード線10で接続する如くして構成されてい
る。
In this solid-state image pickup device, a solid-state image pickup device 3 is fixed to a substantially central portion of a bottom of a ceramic case 2 having a glass plate 1 mounted in an upper opening, with its image pickup portion 3a directed toward the opening of the case 2. Then, the electrode 4 of the solid-state image pickup device 3 and the lead portion 5 are connected by the Au wire 6 and so-called wire bonding is performed, and the terminal 9 of the substrate 8 on which the peripheral drive circuit element 7 is mounted is connected by the lead wire 10. Is configured.

【0004】そして、この様に構成された固体撮像装置
が装着されたカラービデオカメラにおいては、被写体像
をレンズ系を介して固体撮像素子3の撮像部3aに結像
させることによって被写体像を再生するに必要な情報信
号を得、これを例えばビデオテープ等の磁気記録媒体に
記録する如くなされている。
In the color video camera equipped with the solid-state image pickup device having the above-mentioned structure, the image of the subject is formed on the image pickup section 3a of the solid-state image pickup device 3 through the lens system to reproduce the image. The information signal necessary for the recording is obtained and recorded on a magnetic recording medium such as a video tape.

【0005】[0005]

【発明が解決しようとする課題】しかしながら、斯る従
来の固体撮像装置においては、固体撮像素子3とケース
2でパッケージする様にしているので、固体撮像装置自
体が大型になり、カラービデオカメラも大型になるとい
う不都合があった。
However, in such a conventional solid-state image pickup device, since the solid-state image pickup device 3 and the case 2 are packaged, the solid-state image pickup device itself becomes large, and the color video camera is also used. There was an inconvenience that it became large.

【0006】また固体撮像素子3をケース2でパッケー
ジし、このケース2をカラービデオカメラに装着し、ま
た周辺駆動回路素子7を基板8に配し、この基板8をカ
ラービデオカメラに装着し、ケース2のリード部5と基
板8の端子9とをリード線10で接続する様にしている
ため製造工程が多くなるという不都合があった。
The solid-state image pickup device 3 is packaged in a case 2, the case 2 is mounted on a color video camera, the peripheral drive circuit device 7 is arranged on a substrate 8, and the substrate 8 is mounted on a color video camera. Since the lead portion 5 of the case 2 and the terminal 9 of the substrate 8 are connected by the lead wire 10, there is a disadvantage that the number of manufacturing processes increases.

【0007】本発明は、斯る点に鑑み、固体撮像装置を
使用するビデオカメラを小型化し得ると共にその製造工
程を短縮し得る様にした固体撮像装置およびその製造方
を提供することを目的とする。
In view of the above problems, the present invention is directed to a solid-state image pickup device and a method of manufacturing the same which can downsize a video camera using the solid-state image pickup device and shorten the manufacturing process thereof.
The purpose is to provide the law .

【0008】[0008]

【課題を解決するための手段】本発明に依るビデオカメ
ラ用の固体撮像装置は、表面に金属箔による配線パター
ンが形成された絶縁支持基板上に、一方の主面に撮像部
を有するディスクリート型の二次元固体撮像素子とこの
固体撮像素子の周辺駆動回路素子とを配置し、この主面
上であってこの撮像部を除く領域に形成された電極とこ
の基板上に形成された配線パターンとを導電性部材によ
り接続し、この固体撮像素子の撮像部とこの基板との間
が中空とされ、かつ、この固体撮像素子の撮像部に対向
するこの固体撮像素子が配置されたこの基板の光入射面
を平滑面としたものである。
A solid-state image pickup device for a video camera according to the present invention has a wiring pattern formed by a metal foil on the surface.
A discrete type two-dimensional solid-state image pickup device having an image pickup section on one main surface and a peripheral drive circuit element of the solid-state image pickup device are arranged on the insulating support substrate on which the main surface is formed. An electrode formed in a region excluding the image pickup section and a wiring pattern formed on the substrate are connected by a conductive member, and the image pickup section of the solid-state image pickup element and the substrate are hollow, and The light incident surface of the substrate, on which the solid-state image sensor is arranged, facing the image pickup section of the solid-state image sensor, is a smooth surface.

【0009】[0009]

【0010】[0010]

【作用】斯る本発明に依れば、固体撮像素子3の撮像部
3aに対向する基板8又は保護膜11の光入射面8a又
は11aが平滑面とされているので、之等光入射面8a
又は11aで光の散乱は生ぜず、被写体像を固体撮像素
子3の撮像部3aに結像させることができる。
According to the present invention, since the light incident surface 8a or 11a of the substrate 8 or the protective film 11 facing the image pickup section 3a of the solid-state image pickup device 3 is a smooth surface, the light incident surface is not uniform. 8a
Alternatively, light scattering does not occur at 11a, and a subject image can be formed on the image pickup unit 3a of the solid-state image pickup device 3.

【0011】また固体撮像素子3とこの固体撮像素子3
の周辺駆動回路素子7とは同一基板8上に配置する如く
されているので、固体撮像装置を小型化し、電子光学機
器を小型化することができると共にケース2と基板8と
を別々に電子光学機器内に装着し、之等の間をリード線
10で接続する等の工程を不要にし、製造工程を短縮す
ることができる。
The solid-state image sensor 3 and the solid-state image sensor 3
Since the peripheral drive circuit element 7 is disposed on the same substrate 8, the solid-state imaging device can be downsized, the electronic optical device can be downsized, and the case 2 and the substrate 8 can be separately provided in the electronic optical device. The manufacturing process can be shortened by eliminating the process of mounting the device inside the device and connecting the two with the lead wire 10.

【0012】[0012]

【実施例】以下、図1を参照して本発明の固体撮像装置
の一実施例につき説明しよう。この図1において図5に
対応する部分には同一符号を付し、その詳細説明は省略
する。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS An embodiment of the solid-state image pickup device of the present invention will be described below with reference to FIG. In FIG. 1, parts corresponding to those in FIG. 5 are designated by the same reference numerals, and detailed description thereof will be omitted.

【0013】本例においては、固体撮像素子3の電極4
にAuによるビームリード12をウエハ・プロセスで形
成する如くする。またガラス基板8上にビームリード1
2と対応してこのビームリード12が接続される配線パ
ターン等必要な配線パターン13をCu箔により形成す
ると共に少なくともビームリード12との接続部の配線
パターン13aに金メッキを施す如くする。
In this example, the electrode 4 of the solid-state image pickup device 3 is used.
Then, the beam lead 12 made of Au is formed by a wafer process. Also, the beam lead 1 on the glass substrate 8
Corresponding to No. 2, a necessary wiring pattern 13 such as a wiring pattern to which the beam lead 12 is connected is formed of Cu foil, and at least the wiring pattern 13a at the connection portion with the beam lead 12 is plated with gold.

【0014】本例においては、この様に構成したガラス
基板8上の所定の位置に上述のビームリード12を形成
した固体撮像素子3を載置し、ビームリード12とこれ
に対応して金メッキを施した配線パターン13aとを熱
圧着により接合し、撮像部3aが基板8に対向する如く
すると共に撮像部3aが対向する基板8の光入射面8a
を鏡面研磨し入射光が光入射面8aで散乱しない様にす
る。また固体撮像素子3をエポキシ樹脂等で封止し保護
膜11を形成する。
In this example, the solid-state image pickup device 3 having the above-described beam leads 12 is placed at a predetermined position on the glass substrate 8 thus constructed, and the beam leads 12 and corresponding gold plating are performed. The printed wiring pattern 13a is joined by thermocompression bonding so that the imaging unit 3a faces the substrate 8 and the light incident surface 8a of the substrate 8 facing the imaging unit 3a.
Is mirror-polished to prevent the incident light from being scattered on the light incident surface 8a. Further, the solid-state image sensor 3 is sealed with epoxy resin or the like to form the protective film 11.

【0015】この様に構成された本実施例に依れば、固
体撮像素子3の撮像部3aに対向する基板8の光入射面
8aが鏡面研磨されているので、入射光は光入射面8a
で散乱せず、被写体像を固体撮像素子3の撮像部3aに
結像させることができる。
According to this embodiment having such a configuration, since the light incident surface 8a of the substrate 8 facing the image pickup portion 3a of the solid-state image pickup device 3 is mirror-polished, the incident light is incident on the light incident surface 8a.
Therefore, the subject image can be formed on the image pickup unit 3a of the solid-state image pickup device 3 without being scattered.

【0016】この場合、本例においては固体撮像素子3
とこの固体撮像素子3の周辺駆動回路素子7とは同一基
板8上に配置する如くされているので、固体撮像装置を
小型化し、この固体撮像装置を例えばカラービデオカメ
ラに装着する場合にはこのカラービデオカメラを小型化
できるという利益があると共に固体撮像素子3を装着固
定したケース2と周辺駆動回路素子7を装着した基板8
とを別々にカラービデオカメラ内に装着し、ケース2の
リード部5と基板8の端子9とをリード線10で接続す
る工程を不要とし、製造工程を短縮できるという利益が
ある。
In this case, in this example, the solid-state image pickup device 3
Since the peripheral driving circuit element 7 of the solid-state image pickup device 3 is arranged on the same substrate 8, the solid-state image pickup device is downsized, and when the solid-state image pickup device is mounted on, for example, a color video camera, There is an advantage that the color video camera can be miniaturized, and a case 2 in which the solid-state image pickup device 3 is mounted and fixed and a substrate 8 in which the peripheral drive circuit device 7 is mounted
There is an advantage that the manufacturing process can be shortened by eliminating the step of separately mounting and in the color video camera and connecting the lead portion 5 of the case 2 and the terminal 9 of the substrate 8 with the lead wire 10.

【0017】また図2,図3及び図4は夫々本発明の他
の実施例を示し、この図2例においては、固体撮像素子
3の電極4に半田によるバンプ14を形成し、これを基
板8の配線パターン13aと溶着させる如くし、その他
は図1例と同様に構成する。この図2例においても図1
例と同様の作用効果を得ることができる。
2, 3 and 4 respectively show another embodiment of the present invention. In this example of FIG. 2, bumps 14 are formed on the electrodes 4 of the solid-state image pickup device 3 by soldering, and the bumps 14 are formed on the substrate. No. 8 wiring pattern 13a is welded, and the other parts are configured similarly to the example of FIG. Also in this FIG. 2 example, FIG.
The same effect as the example can be obtained.

【0018】また図3例においては、固体撮像素子3の
撮像部3aの周辺と基板8との間に無反射コート15を
施し、その他は図1例と同様に構成する。この図3例に
おいては図1例と同様の作用効果が得られるほか、無反
射コート15を施した後に固体撮像素子3を樹脂封止す
ることにより、封止樹脂が撮像部3aと基板8との間に
流れ込まないようにできるという利益があると共に入射
光が配線パターン13aに反射し撮像部3aに入光しな
いようにできるという利益がある。
Further, in the example of FIG. 3, a non-reflective coating 15 is applied between the periphery of the image pickup section 3a of the solid-state image pickup device 3 and the substrate 8, and the other configurations are similar to those of the example of FIG. In the example of FIG. 3, the same effect as that of the example of FIG. 1 can be obtained, and the solid-state imaging device 3 is resin-sealed after the antireflection coating 15 is applied, so that the sealing resin allows the imaging unit 3a and the substrate 8 to be sealed. There is an advantage in that it can be prevented from flowing in between, and an advantage that incident light can be prevented from being reflected by the wiring pattern 13a and entering the imaging unit 3a.

【0019】また図4例においては、固体撮像素子3の
撮像部3aを基板8と反対側に向けて基板8に固定し、
固体撮像素子3の電極4と配線パターン13aとをAu
線6で接続すると共にこの固体撮像素子3を透明性に優
れたアクリル酸樹脂で封止し保護膜11を形成し、この
保護膜11の撮像部3aと対向する光入射面11aとな
る部分を鏡面研磨する如くし、その他は図1例と同様に
構成する。この図4例においても図1例と同様の作用効
果を得ることができる。
Further, in the example of FIG. 4, the image pickup section 3a of the solid-state image pickup device 3 is fixed to the substrate 8 so as to face the side opposite to the substrate 8.
The electrode 4 of the solid-state image sensor 3 and the wiring pattern 13a are connected to Au.
The protective film 11 is formed by sealing the solid-state image sensor 3 with acrylic resin having excellent transparency while connecting with the line 6, and a portion of the protective film 11 that becomes the light incident surface 11a facing the image capturing section 3a is formed. The mirror polishing is performed, and the other parts are configured in the same manner as in the example of FIG. Also in the example of FIG. 4, the same operational effect as that of the example of FIG. 1 can be obtained.

【0020】尚、本発明は上述実施例に限らず、本発明
の要旨を逸脱することなくその他種々の構成が取り得る
ことは勿論である。
The present invention is not limited to the above-described embodiments, and it goes without saying that various other structures can be adopted without departing from the gist of the present invention.

【0021】[0021]

【発明の効果】本発明に依れば、固体撮像素子とこの固
体撮像素子の周辺駆動回路素子とは同一基板上に配置す
る如くなされているので、固体撮像装置を小型化し、固
体撮像装置を使用する電子光学機器を小型化することが
できるという利益があると共に固体撮像素子を装着した
ケースと周辺駆動回路素子を装着した基板とを別々に電
子光学機器に装着し、之等の間をリード線で接続する等
の工程を不要にし、製造工程を短縮することができると
いう利益がある。
According to the present invention, since the solid-state image pickup device and the peripheral drive circuit element of the solid-state image pickup device are arranged on the same substrate, the solid-state image pickup device can be downsized and the solid-state image pickup device can be realized. There is an advantage that the electro-optical equipment to be used can be downsized, and the case with the solid-state image sensor and the board with the peripheral drive circuit element are separately mounted on the electro-optical equipment, and lead between them. There is an advantage that a manufacturing process can be shortened by eliminating a process such as connecting with a wire.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明固体撮像装置の一実施例を示す構成図で
ある。
FIG. 1 is a configuration diagram showing an embodiment of a solid-state imaging device of the present invention.

【図2】本発明の他の実施例の要部を示す断面図であ
る。
FIG. 2 is a cross-sectional view showing the main parts of another embodiment of the present invention.

【図3】本発明の他の実施例の要部を示す断面図であ
る。
FIG. 3 is a sectional view showing a main part of another embodiment of the present invention.

【図4】本発明の他の実施例を示す構成図である。FIG. 4 is a configuration diagram showing another embodiment of the present invention.

【図5】従来の固体撮像装置の例を示す構成図である。FIG. 5 is a configuration diagram showing an example of a conventional solid-state imaging device.

【符号の説明】[Explanation of symbols]

3 固体撮像素子 3a 撮像部 7 周辺駆動回路素子 8 基板 8a 基板の光入射面 11 保護膜 11a 保護膜の光入射面 3 solid-state image sensor 3a image pickup section 7 peripheral drive circuit element 8 substrate 8a light incident surface of substrate 11 protective film 11a light incident surface of protective film

Claims (4)

【特許請求の範囲】[Claims] 【請求項1】 表面に金属箔による配線パターンが形成
された絶縁支持基板上に、一方の主面に撮像部を有する
ディスクリート型の二次元固体撮像素子と、該固体撮像
素子の周辺駆動回路素子とを配置し、 上記主面上であって上記撮像部を除く領域に形成された
電極と上記配線パターンとを導電性部材により接続し、 上記固体撮像素子の撮像部と上記基板との間が中空とさ
れ、 かつ、 上記固体撮像素子の撮像部に対向する上記固体撮像素子
が配置された上記基板の光入射面を平滑面としたことを
特徴とするビデオカメラ用固体撮像装置。
1. A wiring pattern made of metal foil is formed on the surface.
A discrete type two-dimensional solid-state imaging device having an imaging unit on one main surface and a peripheral drive circuit element of the solid-state imaging device are arranged on the insulated supporting substrate, and the imaging is performed on the main surface. The electrode formed in the region excluding the area and the wiring pattern are connected by a conductive member, and the space between the image pickup section of the solid-state image pickup device and the substrate is hollow, and the image pickup section of the solid-state image pickup device is formed. A solid-state image pickup device for a video camera, wherein a light-incident surface of the substrate on which the opposed solid-state image pickup element is arranged is a smooth surface.
【請求項2】 上記導電性部材はバンプであることを特
徴とする請求項1記載の固体撮像装置。
2. The solid-state imaging device according to claim 1, wherein the conductive member is a bump.
【請求項3】 表面に金属箔による配線パターンが形成
された絶縁支持基板上に、一方の主面に撮像部を有する
二次元固体撮像素子と、該固体撮像素子の周辺駆動回路
素子とを配置し、 上記主面上であって上記撮像部を除く領域に形成された
電極と上記配線パターンとを導電性部材により電気的に
接続し、 上記固体撮像素子の撮像部に対向する保護膜の光入射面
を平滑面としたことを特徴とするビデオカメラ用の固体
撮像装置。
3. A wiring pattern made of metal foil is formed on the surface.
A two-dimensional solid-state image pickup device having an image pickup section on one principal surface and a peripheral drive circuit element of the solid-state image pickup element are arranged on the insulated supporting substrate, and the image pickup section is excluded on the main surface. A video camera characterized in that an electrode formed in a region and the wiring pattern are electrically connected by a conductive member, and a light incident surface of a protective film facing the image pickup section of the solid-state image pickup device is a smooth surface. Solid-state image pickup device.
【請求項4】 ディスクリート型の固体撮像素子と該固
体撮像素子の周辺駆動回路素子とを同一基板上に配置す
る固体撮像装置の製造方法において、金属箔による 配線パターンが形成された絶縁基板を製造
する工程と、 上記絶縁基板を製造する工程とは独立に同一面に撮像部
及び電極が形成された固体撮像素子を製造する工程と、 上記固体撮像素子の上記電極と上記基板上に形成された
上記配線パターンとバンプを介して溶着させる工程
と、 上記周辺駆動回路素子と上記基板上に形成された上記配
線パターンとを電気的に接続する工程と を有することを特徴とする固体撮像装置の製造方法。
4. A method of manufacturing a solid-state imaging device, wherein a discrete type solid-state imaging device and a peripheral drive circuit element of the solid-state imaging device are arranged on the same substrate, and an insulating substrate having a wiring pattern formed of a metal foil is manufactured. And a step of manufacturing a solid-state imaging device in which an imaging section and an electrode are formed on the same surface independently of the step of manufacturing the insulating substrate, and the electrodes of the solid-state imaging element and the substrate formed on the substrate. a step of welding through the bumps and the wiring pattern, a solid-state imaging apparatus characterized by a step of electrically connecting the wiring pattern formed on the peripheral drive circuit element and the substrate Production method.
JP5084785A 1993-04-12 1993-04-12 Solid-state imaging device and method of manufacturing the same Expired - Lifetime JPH0831584B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5084785A JPH0831584B2 (en) 1993-04-12 1993-04-12 Solid-state imaging device and method of manufacturing the same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5084785A JPH0831584B2 (en) 1993-04-12 1993-04-12 Solid-state imaging device and method of manufacturing the same

Publications (2)

Publication Number Publication Date
JPH0621415A JPH0621415A (en) 1994-01-28
JPH0831584B2 true JPH0831584B2 (en) 1996-03-27

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US6943423B2 (en) * 2003-10-01 2005-09-13 Optopac, Inc. Electronic package of photo-image sensors in cellular phone camera modules, and the fabrication and assembly thereof
JP2009049146A (en) * 2007-08-17 2009-03-05 Univ Kinki Wiring structure, integrated circuitry having the same, and solid-state image pickup device having the same, and further, imaging device having the solid-state image pickup device
JP5706357B2 (en) * 2012-02-24 2015-04-22 富士フイルム株式会社 Substrate module and manufacturing method thereof

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US4092859A (en) * 1977-05-31 1978-06-06 The Foxboro Company Oscillating wing flowmeter
JPS55159678A (en) * 1979-05-31 1980-12-11 Toshiba Corp Solidstate image sensor
JPS5770460A (en) * 1981-01-08 1982-04-30 S G:Kk Tachometer
JPS6063957A (en) * 1983-09-17 1985-04-12 Toshiba Corp Image sensor
JPS60134463A (en) * 1983-12-23 1985-07-17 Toshiba Corp Adhesion type image sensor and manufacture thereof

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