JPH08311202A - Purified polysulfone resin and method for purifying polysulfone resin - Google Patents

Purified polysulfone resin and method for purifying polysulfone resin

Info

Publication number
JPH08311202A
JPH08311202A JP7121435A JP12143595A JPH08311202A JP H08311202 A JPH08311202 A JP H08311202A JP 7121435 A JP7121435 A JP 7121435A JP 12143595 A JP12143595 A JP 12143595A JP H08311202 A JPH08311202 A JP H08311202A
Authority
JP
Japan
Prior art keywords
polysulfone resin
polysulfone
liquid
cyclic dimer
resin
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP7121435A
Other languages
Japanese (ja)
Other versions
JP3640701B2 (en
Inventor
Masako Odagiri
昌子 小田切
Shoichi Doi
正一 土井
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Asahi Chemical Industry Co Ltd
Original Assignee
Asahi Chemical Industry Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asahi Chemical Industry Co Ltd filed Critical Asahi Chemical Industry Co Ltd
Priority to JP12143595A priority Critical patent/JP3640701B2/en
Publication of JPH08311202A publication Critical patent/JPH08311202A/en
Application granted granted Critical
Publication of JP3640701B2 publication Critical patent/JP3640701B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Treatments Of Macromolecular Shaped Articles (AREA)
  • Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)

Abstract

PURPOSE: To obtain a purified polysulfone resin improved in stability and productivity in film formation without causing filter clogging due to the turbidness of the polymer solution by immersing a polysulfone resin in a liquid in which the resin can be swollen. CONSTITUTION: A polysulfone resin having a content of a cyclic dimer represented by formula II and obtained by copolymerizing a bisphenol A of formula I with dichlorodiphenyl sulfone of 50% or below is immersed in a liquid in which the resin can be swollen, and optionally irradiated with ultrasonic waves at 20kHz to 1MHz, and the liquid is evaporated to leave a purified polysulfone resin freed from the cyclic dimer.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明はポリスルホン製膜原液の
安定性および製膜における生産性にすぐれた精製ポリス
ルホン樹脂及びポリスルホン樹脂精製方法に関する。
FIELD OF THE INVENTION The present invention relates to a purified polysulfone resin and a method for purifying a polysulfone resin which are excellent in stability of a polysulfone film-forming stock solution and in productivity in film formation.

【0002】[0002]

【従来の技術】ポリスルホンを素材とする流体分離膜は
耐熱性に優れ、多くの用途で活躍している。製膜に当た
っては、ポリスルホンをジメチルアセトアミド(以下、
DMACという)やジメチルホルムアミド(DMF)等
特定の有機溶剤に溶解したポリマー溶液を水等の凝固媒
体に押し出して凝固させる。ところで、このポリスルホ
ンの製膜原液が時間と共に白濁する現象を示す事は古く
から観察されていた。しかし、その正体は明らかにはさ
れていなかった。原液が白濁すると製膜工程内の異物除
去用のフィルターがつまり生産性が低下することが問題
となっていた。
2. Description of the Related Art Fluid separation membranes made of polysulfone have excellent heat resistance and are used in many applications. In forming the film, polysulfone was added to dimethylacetamide (hereinafter,
A polymer solution dissolved in a specific organic solvent such as DMAC) or dimethylformamide (DMF) is extruded into a coagulation medium such as water to coagulate. By the way, it has been observed for a long time that this polysulfone film-forming stock solution shows a phenomenon that it becomes cloudy over time. However, its identity was not revealed. When the undiluted solution becomes cloudy, the filter for removing foreign matter in the film forming process is clogged, which lowers productivity.

【0003】最近の研究において白濁の正体は原材料た
るポリスルホンペレット中に存在するサイクリックダイ
マーが析出するためである事がわかった。ところが、こ
のサイクリックダイマーはポリマーの重合工程である確
率で発生するものであり、その生成を防止する事はもち
ろん比率を変化させる事も不可能であるといわれてい
る。またサイクリックダイマーをペレット中から除去す
る方法についても確立された技術はなく、ために白濁を
放置せざるを得なかった。
In recent studies, it has been found that the white turbidity is due to the precipitation of cyclic dimers existing in the raw material polysulfone pellets. However, it is said that this cyclic dimer is generated at a probability that it is a polymerization step of a polymer, and it is impossible to prevent its formation and of course it is impossible to change the ratio. Further, there is no established technique for removing the cyclic dimer from the pellets, and therefore the white turbidity had to be left.

【0004】[0004]

【発明が解決しようとする課題】本発明は、原液の安定
性および製膜の生産性にすぐれた精製ポリスルホン樹脂
及びポリスルホン樹脂精製方法を提供することを目的と
する。
SUMMARY OF THE INVENTION It is an object of the present invention to provide a purified polysulfone resin and a method for purifying a polysulfone resin, which are excellent in the stability of a stock solution and the productivity of film formation.

【0005】[0005]

【課題を解決するための手段】本発明者らは、前記ポリ
マー溶液を白濁させる原因物質のサイクリックダイマー
を除去し、長期間白濁せずフィルターつまりを起こさず
に安定な製膜が可能な原液を供給するために鋭意研究を
行った結果、特定の条件でサイクリックダイマーを選択
的に抽出する方法を見いだし本発明に到達した。
[Means for Solving the Problems] The present inventors have removed a cyclic dimer, which is a causative substance that causes the polymer solution to become cloudy, and provide a stable solution capable of forming a stable film without clouding for a long period of time without causing filter clogging. As a result of earnest research for supplying the above, a method for selectively extracting cyclic dimers under specific conditions was found and the present invention was reached.

【0006】即ち、本発明の第1は、サイクリックダイ
マーを除去した事を特徴とする精製ポリスルホン樹脂で
ある。ポリスルホン樹脂には数種のものが知られてお
り、スーパーエンジニアリングプラスチックで耐熱性を
有する膜素材として認知されているが、本発明では式
(1)で表されるビスフェノールAとジクロロジフェニ
ルスルホンの共重合体で、一般にポリスルホンと呼ばれ
るものが対象となる。
That is, the first aspect of the present invention is a purified polysulfone resin which is characterized by removing cyclic dimers. Although several kinds of polysulfone resins are known and recognized as a heat-resistant membrane material for super engineering plastics, in the present invention, the bisphenol A represented by the formula (1) and dichlorodiphenyl sulfone are Polymers, which are generally called polysulfones, are targeted.

【0007】[0007]

【化1】 Embedded image

【0008】ポリスルホンの重合の過程では、いくつか
の低分子量重合体が生成される。ポリスルホンをテトラ
ヒドロフラン(以下、THFという)のような有機溶媒
に溶解させそのゲルパーミエーションクロマトグラフ
(以下、GPCという)を測定すると、複数のピークを
得る。2量体、環状2量体(即ち、サイクリックダイマ
ー)、3量体、環状3量体、4量体、環状4量体等オリ
ゴマーと呼ばれる低分子量成分である。このうちサイク
リックダイマー等の環状多量体は構造上ポリマーを溶解
する溶媒にも溶解しにくく、結晶を形成しやすいが、結
晶のほとんどはサイクリックダイマーであり、白濁をな
くすにはサイクリックダイマーを除去すればよいことが
判明した。
Several low molecular weight polymers are formed during the polymerization of polysulfones. When polysulfone is dissolved in an organic solvent such as tetrahydrofuran (hereinafter referred to as THF) and its gel permeation chromatograph (hereinafter referred to as GPC) is measured, a plurality of peaks are obtained. It is a low molecular weight component called oligomer such as dimer, cyclic dimer (that is, cyclic dimer), trimer, cyclic trimer, tetramer and cyclic tetramer. Of these, cyclic multimers such as cyclic dimers are structurally difficult to dissolve in a solvent that dissolves the polymer and easily form crystals, but most of the crystals are cyclic dimers, and to eliminate cloudiness, use cyclic dimers. It turned out that it should be removed.

【0009】ポリスルホンのこのサイクリックダイマー
は式(2)で表される。
This cyclic dimer of polysulfone is represented by the formula (2).

【0010】[0010]

【化2】 Embedded image

【0011】重合過程で親水基などの官能基を導入した
もの、ポリマー形成後に官能基等を付加させたものに対
しても同様のサイクリックダイマーが存在すれば本発明
は適用できる。本発明において「除去した」状態とは、
初期原料中のサイクリックダイマー含有率に対する抽出
後の原料中のサイクリックダイマー含有率で定義する残
存率が50%以下である事をいう。すなわちペレット中
に含まれていた量の50%以下に低減した状態を指す。
さらに好ましくは30%以下である。水分が多かった
り、温度が高かったりすると白濁しやすいが、30%ま
で低減させると原液中の水分約1000ppm、温度5
0℃の原液は1週間放置しても白濁してこない。
The present invention can be applied to those in which a functional group such as a hydrophilic group is introduced in the polymerization process or those to which a functional group is added after the formation of the polymer, as long as the same cyclic dimer exists. In the present invention, the “removed” state means
It means that the residual ratio defined by the cyclic dimer content in the raw material after extraction with respect to the cyclic dimer content in the initial raw material is 50% or less. That is, it means a state in which the amount contained in the pellet is reduced to 50% or less.
It is more preferably 30% or less. If the water content is high or the temperature is high, it becomes cloudy.
The stock solution at 0 ° C does not become cloudy even if left for 1 week.

【0012】サイクリックダイマーの含有率は以下のよ
うにして測定する。被検ペレット1粒を約20ccのT
HFに溶解し、カラムをTSKgel G2000Hx
lとした東洋曹達製HLP−8020でGPCクロマト
グラムを得る。得られたポリマーピーク高さに対するサ
イクリックダイマーピーク高さを含有率とする。
The cyclic dimer content is measured as follows. Approximately 20cc of T
Dissolve in HF and load column on TSKgel G2000Hx
A GPC chromatogram is obtained using HLP-8020 manufactured by Toyo Soda Co., Ltd. The content ratio is the cyclic dimer peak height with respect to the obtained polymer peak height.

【0013】本発明の第2は、上記サイクリックダイマ
ーを除去することによるポリスルホン樹脂の精製方法で
ある。サイクリックダイマーの除去方法は何通りか考え
られる。原液にしてから長期間放置して白濁させ沈降さ
せてから濾別する方法が公知であるが、白濁沈降が生じ
るまでの時間がかかりすぎて工業生産には不適当であ
る。またサイクリックダイマーはポリマーを溶解する溶
媒に対しては一般に溶解しやすいので、沈殿して平衡に
なっていた原液を1回濾別して放置すると、再び白濁し
てしまう。これをくりかえしてゆかないとサイクリック
ダイマーの含有率は下がってゆかないので、工業生産の
生産性を考えると不適当である。
The second aspect of the present invention is a method for purifying a polysulfone resin by removing the cyclic dimer. There are several possible methods for removing cyclic dimers. A method is known in which a stock solution is allowed to stand for a long period of time to become cloudy, and then settled, followed by filtration. However, it takes too much time until cloudy sedimentation occurs, which is unsuitable for industrial production. Further, since cyclic dimers are generally easily dissolved in a solvent that dissolves a polymer, if the undiluted stock solution that has precipitated and is in equilibrium is filtered once and left to stand, it becomes cloudy again. Unless this is repeated, the cyclic dimer content cannot decrease, so it is inappropriate in view of the productivity of industrial production.

【0014】本発明者らは鋭意研究の結果、サイクリッ
クダイマーがポリスルホン樹脂を膨潤させる液体に浸す
事で除去することができることを見いだし本発明に至っ
た。これは、すなわちポリスルホンのポリマーを膨潤す
る液体の中ではポリスルホンのポリマー鎖の隙間が空
き、ポリマー鎖間に閉じこめられているサイクリックダ
イマーの移動性が上がった結果抽出速度が高まったもの
と解釈できる。さらに、ポリスルホン樹脂を膨潤させる
液体中で超音波を照射すると、移動がますます促進され
るため除去速度が向上する。膨潤したポリスルホンを圧
延すれば接触面積が広がるためさらに除去速度が促進さ
れる。また、前記、ポリスルホン樹脂を膨潤させる液体
中で圧延する工程と超音波照射する工程を併用すること
も有用である。こうして、サイクリックダイマーを抽出
分離した後、膨潤させた液体を揮発させればサイクリッ
クダイマーが除去された精製ポリスルホン樹脂が得られ
る。
As a result of intensive studies, the present inventors have found that the cyclic dimer can be removed by immersing it in a liquid that swells the polysulfone resin, and completed the present invention. This can be interpreted as an increase in the extraction speed as a result of the gap between the polymer chains of the polysulfone being open in the liquid that swells the polymer of the polysulfone and the mobility of the cyclic dimer trapped between the polymer chains increasing. . Further, when ultrasonic waves are irradiated in a liquid that swells the polysulfone resin, the movement is further promoted and the removal rate is improved. When the swollen polysulfone is rolled, the contact area is expanded and the removal rate is further accelerated. It is also useful to use the step of rolling in a liquid for swelling the polysulfone resin and the step of irradiating ultrasonic waves together. In this way, after extracting and separating the cyclic dimer, the swollen liquid is volatilized to obtain a purified polysulfone resin from which the cyclic dimer is removed.

【0015】なお、この際、サイクリックダイマー以外
のオリゴマーも除去される場合もあるが、それは何ら本
発明の目的を妨げるものではない。本発明において用い
られるポリスルホン樹脂を膨潤させる液体は、ジメチル
スルホキシド(以下、DMSOという)、ケトン類等が
あげられるが膨潤能力に加え、オリゴマーを抽出後ペレ
ットを再度乾燥させることを考えると、揮発性のあるア
セトンに代表されるケトン類がもっとも好ましい。
At this time, oligomers other than cyclic dimers may be removed, but this does not hinder the purpose of the present invention. Examples of the liquid for swelling the polysulfone resin used in the present invention include dimethyl sulfoxide (hereinafter referred to as DMSO) and ketones. In addition to the swelling ability, considering that the pellet is dried again after extracting the oligomer, it is volatile. Most preferred are ketones represented by acetone.

【0016】照射する超音波の波数、出力は設備の規
模、要求能力によって異なるが、20kHz〜1MHz
程度、好ましくは40〜100kHz程度が使用され
る。出力は装置の大きさによって決定されるが、実験室
的には数百Wあれば十分である。またポリマーと抽出膨
潤剤の浴比は低いほど良好な抽出を可能にするが、生産
性と到達レベルを考慮して適宜決定できる。
The wave number and output of the ultrasonic waves to be irradiated vary depending on the scale of equipment and required capacity, but are from 20 kHz to 1 MHz.
About 40 to 100 kHz is preferably used. The output is determined by the size of the device, but in the laboratory, several hundred W is sufficient. Further, the lower the bath ratio of the polymer and the extraction swelling agent, the better the extraction becomes possible, but it can be appropriately determined in consideration of the productivity and the achievement level.

【0017】圧延する方法は、スクリュー、ローラー等
従来公知の技術が適用可能である。さらに抽出を効率よ
く行うために撹拌、昇温する事も可能である。膨潤剤は
バッチ式で接触させては更新することが好ましい。更新
を繰り返すと残存率を下げる効果が高い。最後に抽出さ
れた膨潤剤を揮発等の方法で除去して、サイクリックダ
イマーが除去されたポリスルホン樹脂を得ることが出来
る。
As a rolling method, conventionally known techniques such as a screw and a roller can be applied. It is also possible to stir and raise the temperature in order to carry out extraction efficiently. The swelling agent is preferably contacted and updated in a batch manner. Repeating the update has a high effect of reducing the remaining rate. The swelling agent extracted at the end can be removed by a method such as volatilization to obtain a polysulfone resin from which cyclic dimers have been removed.

【0018】一方、抽出溶媒を揮発させずに残存させた
ままポリマー溶液を調製することも可能である。たとえ
ば、DMSOはポリスルホンの良溶剤であるDMACと
よく混和し性能制御に有効な膨潤剤であることからその
まま残しておいても問題ない場合もある。
On the other hand, it is also possible to prepare the polymer solution while leaving the extraction solvent without volatilizing. For example, DMSO is a swelling agent that is well miscible with DMAC, which is a good solvent for polysulfone, and is effective for performance control, so there may be no problem even if it is left as it is.

【0019】[0019]

【実施例】以下、本発明を実施例によってさらに詳細に
説明する。
EXAMPLES The present invention will now be described in more detail by way of examples.

【0020】[0020]

【実施例1】ポリスルホンペレット(テイジンアモコ株
式会社製UDEL・P−3500)約0.1g、和光純
薬株式会社製試薬特級アセトン100mlをいれたコレ
クションバイアルを、ヤマト科学株式会社製の超音波洗
浄器BLANSONIC221(45kHz,60W)
中で8時間超音波処理した。8時間後のサイクリックダ
イマー残存率は55%であった。
Example 1 A collection vial containing about 0.1 g of polysulfone pellets (UDEL P-3500 manufactured by Teijin Amoco Co., Ltd.) and 100 ml of reagent grade acetone made by Wako Pure Chemical Industries, Ltd. was ultrasonically cleaned by Yamato Scientific Co., Ltd. BLANSONIC 221 (45kHz, 60W)
And sonicated for 8 hours. The cyclic dimer residual rate after 8 hours was 55%.

【0021】さらに3回アセトンを更新して計32時間
実施したところ残存率は17%であった。このようにし
て精製した残存率17%のポリスルホン固形物20gを
DMAC(和光純薬株式会社製試薬特級)80gに溶解
し、ポリマー溶液を得た。この溶液は20℃で10日以
上放置しても全く白濁してこなかった。この原液を日本
ポール株式会社製の公称孔径0.5ミクロンのキャンド
ルフィルターで定容濾過したが、濾過圧力の上昇は見ら
れなかった。
When the acetone was renewed three times and the operation was carried out for a total of 32 hours, the residual rate was 17%. 20 g of the polysulfone solid matter having a residual rate of 17% thus purified was dissolved in 80 g of DMAC (special grade reagent manufactured by Wako Pure Chemical Industries, Ltd.) to obtain a polymer solution. This solution did not become cloudy at all even when left at 20 ° C. for 10 days or longer. This stock solution was subjected to constant volume filtration with a candle filter having a nominal pore size of 0.5 micron manufactured by Nippon Pole Co., Ltd. No increase in filtration pressure was observed.

【0022】[0022]

【実施例2】実施例1と同様にして3時間超音波処理し
た。途中1時間後、2時間後にペレットを取り出しガラ
ス棒で圧延した。3時間後のサイクリックダイマー残存
率は42%であった。このようにして精製した残存率4
2%のポリスルホン固形物20gをDMAC80gに溶
解し、ポリマー溶液を得た。この溶液は20℃で10日
以上放置しても全く白濁してこなかった。この原液を日
本ポール株式会社製の公称孔径0.5ミクロンのキャン
ドルフィルターで定容濾過したが、濾過圧力の上昇は見
られなかった。
Example 2 As in Example 1, ultrasonic treatment was carried out for 3 hours. One hour and two hours later, the pellets were taken out and rolled with a glass rod. The cyclic dimer residual rate after 3 hours was 42%. Residual rate 4 thus purified
20 g of a 2% polysulfone solid was dissolved in 80 g of DMAC to obtain a polymer solution. This solution did not become cloudy at all even when left at 20 ° C. for 10 days or longer. This stock solution was subjected to constant volume filtration with a candle filter having a nominal pore size of 0.5 micron manufactured by Nippon Pole Co., Ltd. No increase in filtration pressure was observed.

【0023】[0023]

【比較例1】アセトンの代わりにエタノールを用いたこ
と以外は実施例1と同様にして処理した。3時間後の残
存率は98%であった。エタノールはポリスルホンの多
孔膜は膨潤させるが、ペレットはほとんど膨潤させな
い。このような液体ではペレットからの除去は困難であ
る。このようにして処理した残存率98%のポリスルホ
ンペレット20gをDMAC80gに溶解し、ポリマー
溶液を得た。この溶液は20℃で数日放置するとすぐ白
濁してしまった。この原液を実施例1で用いたのと同じ
公称孔径0.5ミクロンのキャンドルフィルターで定容
濾過したところ濾過圧力の上昇が見られた。
Comparative Example 1 The same treatment as in Example 1 was carried out except that ethanol was used instead of acetone. The residual rate after 3 hours was 98%. Ethanol causes the polysulfone porous membrane to swell, but the pellet does not. Such liquids are difficult to remove from pellets. 20 g of the polysulfone pellet having a residual rate of 98% treated in this manner was dissolved in 80 g of DMAC to obtain a polymer solution. This solution became cloudy immediately after standing at 20 ° C. for several days. When this stock solution was filtered with a constant volume of the same candle filter having a nominal pore diameter of 0.5 μm as that used in Example 1, an increase in filtration pressure was observed.

【0024】[0024]

【発明の効果】本発明により白濁の原因物質であるサイ
クリックダイマーが除去されたポリスルホンが得られる
ので、白濁を起こさない安定な製膜原液を調製すること
が出来、製膜の生産性が向上する。
Industrial Applicability According to the present invention, polysulfone from which the cyclic dimer, which is the causative agent of white turbidity, is removed can be obtained, so that it is possible to prepare a stable stock solution for forming a film that does not cause white turbidity and improve the productivity of film formation. To do.

Claims (6)

【特許請求の範囲】[Claims] 【請求項1】 サイクリックダイマーを除去した事を特
徴とする精製ポリスルホン樹脂。
1. A purified polysulfone resin having a cyclic dimer removed.
【請求項2】 ポリスルホン樹脂を膨潤させる液体に浸
す事を特徴とするポリスルホン樹脂からサイクリックダ
イマーを除去するポリスルホン樹脂精製方法
2. A method for purifying a polysulfone resin for removing a cyclic dimer from the polysulfone resin, which comprises immersing the polysulfone resin in a liquid for swelling the polysulfone resin.
【請求項3】 ポリスルホン樹脂を膨潤させる液体中で
超音波を照射する工程を含む事を特徴とするポリスルホ
ン樹脂からサイクリックダイマーを除去するポリスルホ
ン樹脂精製方法
3. A method for purifying a polysulfone resin for removing cyclic dimers from the polysulfone resin, which comprises the step of irradiating ultrasonic waves in a liquid for swelling the polysulfone resin.
【請求項4】 ポリスルホン樹脂を膨潤させる液体中で
圧延する工程、超音波を照射する工程、膨潤させた液体
を揮発させる工程を含む事を特徴とするポリスルホン樹
脂からサイクリックダイマーを除去するポリスルホン樹
脂精製方法
4. A polysulfone resin for removing cyclic dimers from a polysulfone resin, which comprises a step of rolling in a liquid for swelling the polysulfone resin, a step of irradiating ultrasonic waves, and a step of volatilizing the swollen liquid. Purification method
【請求項5】 ポリスルホン樹脂を膨潤させる液体がケ
トン類である事を特徴とする請求項2から請求項4のい
ずれかに記載のポリスルホン樹脂からサイクリックダイ
マーを除去するポリスルホン樹脂精製方法
5. The method for purifying a polysulfone resin for removing cyclic dimer from the polysulfone resin according to claim 2, wherein the liquid for swelling the polysulfone resin is a ketone.
【請求項6】 ポリスルホン樹脂を膨潤させる液体がア
セトンである事を特徴とする請求項2から請求項5のい
ずれかに記載のポリスルホン樹脂からサイクリックダイ
マーを除去するポリスルホン樹脂精製方法
6. The method for purifying a polysulfone resin for removing a cyclic dimer from the polysulfone resin according to claim 2, wherein the liquid for swelling the polysulfone resin is acetone.
JP12143595A 1995-05-19 1995-05-19 Purified polysulfone resin and polysulfone resin purification method Expired - Fee Related JP3640701B2 (en)

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Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2007015357A1 (en) * 2005-08-01 2007-02-08 Yukari Nose Method and apparatus for swelling polyvinyl alcohol film, and process and apparatus for producing polarizing film
CN103278878A (en) * 2013-06-27 2013-09-04 佛山纬达光电材料有限公司 Processing technology of polarizer
CN110272545A (en) * 2019-06-12 2019-09-24 扬州清研高分子新材料有限公司 A kind of processing method shortening the polysulfones production cycle
CN111253574A (en) * 2020-05-06 2020-06-09 富海(东营)新材料科技有限公司 Preparation method of polysulfone resin material with low cyclic dimer content
CN113648678A (en) * 2021-07-30 2021-11-16 珠海健科医用材料有限公司 Polysulfone polymer and purification method thereof
CN114163642A (en) * 2021-12-21 2022-03-11 富海(东营)新材料科技有限公司 Energy-saving and environment-friendly purification process and purification equipment for polysulfone resin
WO2022135184A1 (en) * 2020-12-21 2022-06-30 富海(东营)新材料科技有限公司 Industrial purification process and device for polysulfone resin material
CN116217932A (en) * 2023-05-05 2023-06-06 富海(东营)新材料科技有限公司 Process for preparing polysulfone by induced crystallization

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2007015357A1 (en) * 2005-08-01 2007-02-08 Yukari Nose Method and apparatus for swelling polyvinyl alcohol film, and process and apparatus for producing polarizing film
CN103278878A (en) * 2013-06-27 2013-09-04 佛山纬达光电材料有限公司 Processing technology of polarizer
CN110272545A (en) * 2019-06-12 2019-09-24 扬州清研高分子新材料有限公司 A kind of processing method shortening the polysulfones production cycle
CN110272545B (en) * 2019-06-12 2020-08-04 扬州清研高分子新材料有限公司 Processing method for shortening polysulfone production period
CN111253574A (en) * 2020-05-06 2020-06-09 富海(东营)新材料科技有限公司 Preparation method of polysulfone resin material with low cyclic dimer content
WO2022135184A1 (en) * 2020-12-21 2022-06-30 富海(东营)新材料科技有限公司 Industrial purification process and device for polysulfone resin material
CN113648678A (en) * 2021-07-30 2021-11-16 珠海健科医用材料有限公司 Polysulfone polymer and purification method thereof
CN114163642A (en) * 2021-12-21 2022-03-11 富海(东营)新材料科技有限公司 Energy-saving and environment-friendly purification process and purification equipment for polysulfone resin
CN114163642B (en) * 2021-12-21 2023-08-15 富海(东营)新材料科技有限公司 Purification process and purification equipment of energy-saving environment-friendly polysulfone resin
CN116217932A (en) * 2023-05-05 2023-06-06 富海(东营)新材料科技有限公司 Process for preparing polysulfone by induced crystallization

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