JPH08273441A - Anisotropic electric conduction film and its preparation - Google Patents

Anisotropic electric conduction film and its preparation

Info

Publication number
JPH08273441A
JPH08273441A JP8887695A JP8887695A JPH08273441A JP H08273441 A JPH08273441 A JP H08273441A JP 8887695 A JP8887695 A JP 8887695A JP 8887695 A JP8887695 A JP 8887695A JP H08273441 A JPH08273441 A JP H08273441A
Authority
JP
Japan
Prior art keywords
film
thermoplastic
holes
anisotropic conductive
conductive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP8887695A
Other languages
Japanese (ja)
Inventor
Akira Tateishi
彰 立石
Shunsuke Tazaki
俊介 田崎
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Whitaker LLC
Original Assignee
Whitaker LLC
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Whitaker LLC filed Critical Whitaker LLC
Priority to JP8887695A priority Critical patent/JPH08273441A/en
Publication of JPH08273441A publication Critical patent/JPH08273441A/en
Pending legal-status Critical Current

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  • Manufacturing Of Electrical Connectors (AREA)
  • Printing Elements For Providing Electric Connections Between Printed Circuits (AREA)
  • Non-Insulated Conductors (AREA)

Abstract

PURPOSE: To provide an anisotropic conductive film that has sufficient anisotropy and higher conductivity for its reliable contact, and its manufacturing method. CONSTITUTION: An anisotropic conductive film is manufactured by coating a thermoplastic film 1 with separable protective films 2 and 3 on both sides, forming holes 4 through the coated film 1, and filling the holes 4 with a conductive substance 5. Upon its usage, after the separation of the protective films 2 and 3, the conductive film is fixed by thermo-compression bonding to objects to be connected together, which are then interconnected in the film thickness direction.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、狭い導電体間隔を持つ
精密電子部品と基板との接続、例えばFPCと基板の接
続や、LCD基板とドライバの接続などに用いられる。
膜厚方向のみに導電性を持つ異方性導電膜及びその製造
方法に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention is used for connecting a precision electronic component having a narrow space between conductors and a substrate, such as connecting an FPC to a substrate or connecting an LCD substrate to a driver.
The present invention relates to an anisotropic conductive film having conductivity only in the film thickness direction and a manufacturing method thereof.

【0002】[0002]

【従来技術及び解決すべき課題】現在用いられている異
方性導電膜は、接着性のバインダー樹脂に導電性の粒子
や繊維などを分散させたものである。このような異方性
導電膜は、安価に製造でき、かつ微細な間隔で整列する
対向した電極等の導体を容易に接続できる半面、異方性
を発現させるために、含有することの出来る導電性粒子
の量を制限する必要があり、高い導電性を得ることが本
質的に不可能であった。また、圧着の際には導電性粒子
の周囲に存在するバインダーを除去するため、高い圧力
をかける必要がある。そのため、被着物には強い機械的
特性が要求され、応用範囲を狭くしていた。
2. Description of the Related Art The anisotropic conductive film currently used is one in which conductive particles or fibers are dispersed in an adhesive binder resin. Such an anisotropic conductive film can be manufactured at low cost and can easily connect conductors such as opposed electrodes arranged at fine intervals, but on the other hand, it can be contained in order to exhibit anisotropy. It was necessary to limit the amount of conductive particles, and it was essentially impossible to obtain high conductivity. In addition, a high pressure must be applied during the pressure bonding in order to remove the binder existing around the conductive particles. Therefore, the adherend is required to have strong mechanical properties, which narrows the range of application.

【0003】一方、弾性体に導電性粒子を大量に分散さ
せてなるタイプの導電膜は、比較的低い圧力で接続が可
能であるが、それ自体の導電性は等方的であるか、又は
隣接端子間が絶縁されていると見做されるほどの異方性
を備えていないのが現状である。また、この種の導電膜
は圧縮の圧力に応じて接続が大きく変化する特性を持っ
ているため、対向する導体間の接続のために導電性の弾
性体をハウジングの上下方向に貫通した孔部内に充填
し、異方性を持たせる手法が知られている(米国特許第
4,770,641 号)が、開示される方法では上下の被接続物
に固定する手段を必要とするばかりか、異方性導電膜に
比べて接続可能なピッチが大きいのが実情である。従っ
て、本発明の目的は十分な異方性を具えつつ高導電性を
有し、信頼性の高い接続を容易な接続により得ることが
でき、更に狭ピッチに対応する異方性導電膜及びその製
造方法を提供することである。
On the other hand, a conductive film of a type in which a large amount of conductive particles are dispersed in an elastic body can be connected at a relatively low pressure, but its own conductivity is isotropic, or At present, the anisotropy is not so large that it is considered that the adjacent terminals are insulated from each other. In addition, since this type of conductive film has the characteristic that the connection changes greatly depending on the compression pressure, the conductive elastic body is inserted in the vertical direction of the housing to connect between the opposing conductors. There is known a method of filling the core with anisotropy (US Patent No.
No. 4,770,641), the disclosed method not only requires a means for fixing to the upper and lower objects to be connected, but also has a larger connectable pitch as compared with the anisotropic conductive film. Therefore, an object of the present invention is to provide an anisotropic conductive film having high conductivity while having sufficient anisotropy, capable of obtaining a highly reliable connection by easy connection, and an anisotropic conductive film corresponding to a narrow pitch. It is to provide a manufacturing method.

【0004】[0004]

【課題解決の手段及びその作用】本発明は、熱可塑性膜
と、該熱可塑性膜の両面に剥離可能に配置される保護膜
と、前記熱可塑性膜及び前記保護膜を膜厚方向に貫通す
る孔部内に充填させる導電性物質とを有し、使用時に保
護膜を剥離して被接続物に熱圧着されて膜厚方向の電気
的接続を行うことを特徴とする異方性導電膜を提供する
ものである。
According to the present invention, a thermoplastic film, a protective film releasably arranged on both sides of the thermoplastic film, and the thermoplastic film and the protective film are penetrated in the thickness direction. Provided is an anisotropic conductive film having a conductive substance filled in a hole portion, which is peeled off a protective film at the time of use and thermocompression-bonded to an object to be connected to electrically connect in a film thickness direction. To do.

【0005】更に本発明は、熱可塑性膜の両面に保護膜
を剥離可能にして配置させる工程と、前記熱可塑性膜及
び前記保護部を貫通する孔部を形成する工程と、該孔部
に弾性を有する導電性物質を充填する工程とを含む異方
性導電膜の製造方法を提供するものである。
Furthermore, the present invention further comprises a step of arranging a protective film on both surfaces of the thermoplastic film so that the protective film can be peeled off, a step of forming a hole portion penetrating the thermoplastic film and the protective portion, and an elastic member in the hole portion. A method of manufacturing an anisotropic conductive film, which comprises the step of filling a conductive material having

【0006】発明者らは、これらの課題を解決するため
の構造について検討を重ねた結果、熱可塑性の物質から
なる膜1を、剥離可能な保護膜2、3でサンドイッチし
(工程1、図面1(a)) 、その膜を貫通する複数の孔部4
を形成し(工程2、図面1(b))、その孔部4に弾性を有
する導電性物質5を充填する(工程3、図面1(c))こと
により、優れた異方性と高導電性を兼ね備え、取付接続
が容易な異方性導電膜を作製することを見いだした。こ
の異方性導電膜は、使用に先立ち保護膜2、3を剥離し
(工程4、図2(a))、被接続物に熱圧着する(工程5、
図2(a) 乃至(c))ことにより実際に使用されるものであ
る。
As a result of repeated studies on the structure for solving these problems, the inventors sandwiched a film 1 made of a thermoplastic material with peelable protective films 2 and 3 (Step 1, drawing 1 (a)), multiple holes 4 through the membrane
Is formed (step 2, drawing 1 (b)), and the hole 4 is filled with a conductive material 5 having elasticity (step 3, drawing 1 (c)) to obtain excellent anisotropy and high conductivity. It has been found that an anisotropic conductive film having good properties and easy to attach and connect is manufactured. The anisotropic conductive film is peeled off the protective films 2 and 3 prior to use (step 4, FIG. 2 (a)), and thermocompression bonded to the object to be connected (step 5,
It is actually used by referring to FIGS. 2 (a) to 2 (c).

【0007】ここで熱可塑性の物質1としては、一般に
ホットメルト接着剤として用いられるエチレン酢酸ビニ
ル共重合体(EVA)、スチレンブタジエンラバー(S
BR)、ポリアミド(PA)などの他、熱可塑性ポリイ
ミド(TPI)、熱可塑性ウレタン(TPU)、ポリエ
ーテルイミド(PEI)等、あらゆる熱可塑性樹脂を用
いることができる。
Here, as the thermoplastic substance 1, ethylene vinyl acetate copolymer (EVA) and styrene-butadiene rubber (S) which are generally used as hot melt adhesives are used.
In addition to BR), polyamide (PA), and the like, any thermoplastic resin such as thermoplastic polyimide (TPI), thermoplastic urethane (TPU), and polyetherimide (PEI) can be used.

【0008】剥離可能な保護膜2、3としては、どのよ
うなものでも使用できるが、熱可塑性樹脂との密着性に
より適当なものを選定すべきであることは言うまでもな
い。
As the peelable protective films 2 and 3, any one can be used, but it goes without saying that an appropriate one should be selected depending on the adhesiveness with the thermoplastic resin.

【0009】工程2の孔部4の形成は、通常の加工手段
を利用することが可能である。即ち、パンチングによる
方法、ドリルによる方法、レーザーによる方法、化学
的、物理的エッチングによる方法などが挙げられるが、
短い間隔で孔部を形成するためにはレーザーやエッチン
グによる方法が有利であるし、コストの面ではパンチン
グやドリリングが有利であるので、必要とする孔部の径
および間隔に応じて最適な方法を選択すべきである。孔
部の径および間隔は、被接続物の有する導体(以下被着
導体と言う)の幅および間隔により決定されるが、孔部
の径が被着導体間の最も狭い間隔により小さいことが必
要であり、2分の1以下であることが望ましい。また、
孔部の間隔は被着導体間の最も狭い間隔より狭いことが
必要であり、やはり2分の1以下であることが望まし
い。
The formation of the hole 4 in the step 2 can be performed by using a usual processing means. That is, a method using punching, a method using a drill, a method using a laser, a method using chemical and physical etching, and the like,
The method using laser or etching is advantageous for forming holes at short intervals, and punching or drilling is advantageous in terms of cost. Therefore, the most suitable method according to the required diameter and interval of holes. Should be selected. The diameter and spacing of the holes are determined by the width and spacing of the conductor of the object to be connected (hereinafter referred to as the deposited conductor), but the diameter of the holes must be smaller than the narrowest spacing between the deposited conductors. And it is desirable that it is half or less. Also,
It is necessary that the distance between the holes is smaller than the narrowest distance between the adhered conductors, and it is also preferable that the distance is 1/2 or less.

【0010】工程3の物質5の充填は、通常知られてい
る方法が全て適用できるが、充填剤の種類により最適な
方法を選択すべきである。物質がシリコーンゴム等の熱
硬化型樹脂と導電性粒子もしくは繊維の混合物からなる
場合には、未硬化の混合物をスクイーズ等によって孔内
に埋めるスクイーズ法等の方法により孔内に充填した
後、加熱により硬化する方法が有効である。この場合の
導電性粒子としては金属粒子又は金属膜により実質的に
被覆された非導電性粒子等が挙げられる。
As for the filling of the substance 5 in the step 3, all the commonly known methods can be applied, but the optimum method should be selected depending on the kind of the filler. When the substance consists of a mixture of thermosetting resin such as silicone rubber and conductive particles or fibers, fill the hole by a method such as squeeze method of filling the uncured mixture into the hole with squeeze, and then heat. The method of curing is effective. In this case, examples of the conductive particles include metal particles and non-conductive particles substantially covered with a metal film.

【0011】物質が共役二重結合を有する導電性高分子
である場合は、孔内で電気的もしくは化学的に重合させ
ることができる。この際に用いることができる高分子の
例としては、ポリアセチレン、ポリピロール、ポリチエ
ニレン、ポリフェニレン、ポリ(フェニレンビニレン)
など及びこれらの誘導体が挙げられる。また、これらの
高分子は電子受容性物質(アクセプター)あるいは電子
供与性物質(ドナー)によってドープされていてもよ
い。この際用いることのできる電子受容性物質の例とし
ては、ハロゲン、5フッ化リン、5フッ化ヒ素、3フッ
化ホウ素、3塩化ホウ素、3臭化ホウ素、硫酸、ハロゲ
ン化水素などがあげられる。また、この際用いることの
できる電子供与性物質の例としては、アルカリ金属、第
4級アミンなどがあげられる。
When the substance is a conductive polymer having a conjugated double bond, it can be polymerized electrically or chemically in the pores. Examples of polymers that can be used at this time include polyacetylene, polypyrrole, polythienylene, polyphenylene, and poly (phenylene vinylene).
Etc. and derivatives thereof. Further, these polymers may be doped with an electron accepting substance (acceptor) or an electron donating substance (donor). Examples of the electron-accepting substance that can be used in this case include halogen, phosphorus pentafluoride, arsenic pentafluoride, boron trifluoride, boron trichloride, boron tribromide, sulfuric acid, hydrogen halide and the like. . Further, examples of the electron donating substance that can be used in this case include alkali metals and quaternary amines.

【0012】物質が共役二重結合を有する高分子と熱硬
化型樹脂の混合物である場合には、上で述べた方法によ
り熱硬化性樹脂を孔内に充填した後、上で述べた導電性
を有する高分子を重合することで、樹脂内に浸透したモ
ノマーの重合により混合物を得る方法や、あらかじめ既
知の方法により得られた導電性高分子粉末を未硬化の熱
硬化性樹脂原料中に混合し、孔内に充填後、加熱硬化す
る方法などにより得ることができる。
When the substance is a mixture of a polymer having a conjugated double bond and a thermosetting resin, the thermosetting resin is filled in the pores by the method described above, and then the conductive material described above is used. A method of obtaining a mixture by polymerizing a monomer having penetrated into a resin by polymerizing a polymer having a, or a conductive polymer powder obtained by a known method in advance is mixed with an uncured thermosetting resin raw material. However, it can be obtained by, for example, a method of heating and curing after filling the holes.

【0013】物質が金属である場合には、孔内において
化学的もしくは電気的反応により金属を析出させ、充填
する方法が利用できる。例えば、膜の片側の面に銅膜を
張り付け、これを電極として電解鍍金を施した後、エッ
チングにより銅膜を除去することにより、孔内に金属を
充填することが可能である。
When the substance is a metal, a method of precipitating and filling the metal in the pores by a chemical or electrical reaction can be used. For example, it is possible to fill the inside of the hole with metal by sticking a copper film on one surface of the film, performing electrolytic plating using this as an electrode, and then removing the copper film by etching.

【0014】注目すべきことは、孔部への導電性物質の
充填は、完全に行われる必要はないという点である。被
着導体の長さおよび間隔に比べ、工程2で形成した孔部
の間隔を狭くしておくことにより、複数の導電性物質が
該被着導体間の電気的接続に貢献することになる。この
ため、該被着導体当り1つ以上の孔部に導電性物質が充
填されておれば、工程3の目的は達成されるのである。
It should be noted that the holes need not be completely filled with the conductive material. By making the intervals of the holes formed in step 2 narrower than the lengths and intervals of the adhered conductors, a plurality of conductive substances contribute to electrical connection between the adhered conductors. Therefore, the object of step 3 can be achieved if one or more holes are filled with the conductive material per the deposited conductor.

【0015】[0015]

【実施例】以下、本発明の異方性導電膜及びその製造方
法の好適実施例を示すが、本発明は以下の記述によって
限定されるものではなく、当業者により様々に変形変更
され得る。
EXAMPLES The preferred examples of the anisotropic conductive film and the method for producing the same according to the present invention will be shown below, but the present invention is not limited to the following description and can be variously modified and modified by those skilled in the art.

【0016】[0016]

【実施例1】あらかじめ剥離剤を塗布したポリエステル
フィルム3(膜厚50μm )に、ポリアミド系ホットメル
ト接着剤1を加熱塗布した後、更にホットプレスにより
ポリエステルフィルム2(膜厚50μm )をラミネート
し、ポリエステル(保護膜)−ポリアミド(熱可塑性
膜)−ポリエステル(保護膜)からなる3層フィルムを
作成した。
Example 1 Polyamide film 3 (thickness 50 μm) coated with a release agent in advance was coated with polyamide hot melt adhesive 1 by heating, and then polyester film 2 (thickness 50 μm) was laminated by hot pressing. A three-layer film composed of polyester (protective film) -polyamide (thermoplastic film) -polyester (protective film) was prepared.

【0017】この3層フィルムに、パンチング法により
直径0.6mm の穴(孔部)4を縦横ピッチ1.2mm で多数形
成した後、導電性物質5として銀粉末(平均粒径10μm
)を80重量%含有した付加硬化型シリコーンゴム(東
レ・ダウコーニング社製SE−1740)をスクイーズ法に
より充填した。得られたフィルムを85℃で30分加熱し、
樹脂を硬化させた。得られたフィルムを電子顕微鏡によ
り観測したところ、銀粉末含有シリコーンゴム5がフィ
ルムの穴4に充填された構造のものが得られたことがわ
かった。
A large number of holes (holes) 4 having a diameter of 0.6 mm were formed in this three-layer film at a pitch of 1.2 mm in length and width by a punching method, and then silver powder (average particle size 10 μm) was used as the conductive material 5.
Of 80% by weight) was added by a squeeze method to an addition-curable silicone rubber (SE-1740 manufactured by Dow Corning Toray Co., Ltd.). The obtained film is heated at 85 ° C for 30 minutes,
The resin was cured. When the obtained film was observed by an electron microscope, it was found that a film having a structure in which the silver powder-containing silicone rubber 5 was filled in the holes 4 of the film was obtained.

【0018】この3層フィルムを5mm×30mmに切断した
後、3層フィルム両面側の層のポリエステルフィルム
2、3を剥離し、1.2mm ピッチで櫛状の電極(被着導
体)22を形成した基板21と、同ピッチの電極(被着導
体)24を有するFPC23の間に挟み、200 ℃で10秒間加
圧した後、除荷放冷することにより熱圧着を行った。
After cutting the three-layer film into 5 mm × 30 mm, the polyester films 2 and 3 on both sides of the three-layer film were peeled off to form comb-shaped electrodes (adhered conductors) 22 at a pitch of 1.2 mm. It was sandwiched between a substrate 21 and an FPC 23 having electrodes (deposited conductors) 24 of the same pitch, pressurized at 200 ° C. for 10 seconds, then unloading and cooling to perform thermocompression bonding.

【0019】対向する電極間の接続抵抗を測定したとこ
ろ、10m Ωであった。また、隣接する電極間は略絶縁さ
れていた。
When the connection resistance between the opposing electrodes was measured, it was 10 mΩ. Moreover, the adjacent electrodes were substantially insulated from each other.

【0020】[0020]

【実施例2】実施例1で用いた3層フィルムに、レーザ
ー加工法により直径0.06mmの穴(孔部)4を縦横ピッチ
0.12mmで多数形成した後、導電性物質5として銀粉末
(平均粒径2μm)を80重量%含有した付加硬化型シリコ
ーンゴム(東レ・ダウコーニング社製SE−1740)をス
クイーズ法により充填した。得られたフィルムを85℃で
30分加熱し、樹脂を硬化させた。得られたフィルムを電
子顕微鏡により観測したところ、銀粉末含有シリコーン
ゴム5がフィルムの穴4に充填された構造のものが得ら
れたことがわかった。
[Example 2] Holes (holes) 4 having a diameter of 0.06 mm were formed in the three-layer film used in Example 1 by a laser processing method in a vertical and horizontal pitch.
After forming a large number of 0.12 mm, an addition-curable silicone rubber (SE-1740 manufactured by Dow Corning Toray Co., Ltd.) containing 80% by weight of silver powder (average particle size: 2 μm) was filled as a conductive substance 5 by a squeeze method. The resulting film at 85 ° C
Heated for 30 minutes to cure the resin. When the obtained film was observed by an electron microscope, it was found that a film having a structure in which the silver powder-containing silicone rubber 5 was filled in the holes 4 of the film was obtained.

【0021】この3層フィルムを5mm×30mmに切断した
後、フィルム両面側の層のポリエステルフィルムを剥離
し、0.2mm ピッチで櫛状の電極(被着導体)22を形成し
た基板21と、同ピッチの電極(被着導体)24を有するF
PC22の間に挟み、200 ℃で10秒間加圧した後、除荷放
冷することにより熱圧着を行った。
After cutting this three-layer film into 5 mm × 30 mm, the polyester film on the layers on both sides of the film was peeled off and the same as the substrate 21 on which comb-shaped electrodes (adhered conductors) 22 were formed at a pitch of 0.2 mm. F having pitch electrodes (deposited conductors) 24
It was sandwiched between PC22, pressurized at 200 ° C. for 10 seconds, and then unloaded and cooled to perform thermocompression bonding.

【0022】対向する電極間の接続抵抗を測定したとこ
ろ、60m Ωであった。また、隣接する電極間は略絶縁さ
れていた。
The connection resistance between the opposing electrodes was measured and found to be 60 mΩ. Moreover, the adjacent electrodes were substantially insulated from each other.

【0023】なお、実施例1、実施例2に対する比較の
ため、市販の異方性導電膜(スリーボンド社製3370C )
を、あらかじめ250 ℃に加熱した2枚のプリント基板に
挟み、5kg/cm2 の圧力下、20秒間圧着を行った。基板
を冷却した後、上下間の電気抵抗値を測定したが、略絶
縁状態であった。
For comparison with Examples 1 and 2, a commercially available anisotropic conductive film (3370C manufactured by ThreeBond) was used.
Was sandwiched between two printed circuit boards that had been heated to 250 ° C. in advance, and pressure bonding was performed for 20 seconds under a pressure of 5 kg / cm 2 . After cooling the substrate, the electrical resistance value between the upper and lower sides was measured and it was in a substantially insulated state.

【0024】[0024]

【発明の効果】本発明によれば、剥離可能な2枚の保護
膜の間に挟まれた熱可塑性膜に、膜を貫通する孔部を形
成し、孔部に導電性を有する物質を充填してなる膜であ
って、使用時に保護膜を剥離し、熱圧着することにより
膜厚方向の電気的接続を行う異方性導電膜が提供される
ので以下の如き効果を奏する。
According to the present invention, in a thermoplastic film sandwiched between two peelable protective films, a hole penetrating the film is formed, and the hole is filled with a conductive substance. An anisotropic conductive film, which is a film formed by removing the protective film and thermocompression-bonding the film when used, provides the following effects because the anisotropic conductive film is provided.

【0025】(1)使用時に保護膜を剥離するので剥離
前まで熱可塑性膜が保護され、更に熱圧着することによ
り、被着導体の接続を行うので信頼性の高い接続が容易
に達成される。
(1) Since the protective film is peeled off at the time of use, the thermoplastic film is protected before peeling, and the adhered conductors are connected by thermocompression bonding, so that highly reliable connection can be easily achieved. .

【0026】(2)保護膜を剥離したとき、弾性を有す
る導電性物質の突起が熱可塑性膜の面から突出し、この
突起が接続に寄与するのでより信頼性の高い接続が実現
される。更に、接続の際に必要な力は、導電性物質の圧
縮に必要な力と熱可塑性樹脂の接着に必要な力の和とな
り、この値は樹脂を大量に排除する必要のある従来の異
方性導電膜の場合に必要な力に比べ大幅に小さい。従っ
て機械的強度が低く、圧縮変形し易い被着物の電気的接
続も可能となる。
(2) When the protective film is peeled off, the projection of the conductive material having elasticity projects from the surface of the thermoplastic film, and this projection contributes to the connection, so that a more reliable connection is realized. Furthermore, the force required for connection is the sum of the force required to compress the conductive material and the force required to bond the thermoplastic resin, and this value is the same as the conventional anisotropic method that requires large amounts of resin to be removed. Significantly smaller than the force required for a conductive film. Therefore, it is possible to electrically connect the adherend that has low mechanical strength and is easily deformed by compression.

【0027】(3)圧縮応力がかかった状態で接続が達
成され、この状態はそのまま接着剤により保持されるの
で、安定した高い導電性を継続して有することが可能と
なる。
(3) The connection is achieved under compressive stress, and this state is retained as it is by the adhesive, so that it is possible to continue to have stable and high conductivity.

【0028】(4)導電性物質が充填される孔部を適当
な間隔にとって形成することにより被着導体の間隔にば
らつきがある場合にも対応できる。
(4) By forming the holes filled with the conductive material at an appropriate interval, it is possible to cope with the case where the interval between the adhered conductors varies.

【0029】(5)孔部に充填される導電性物質は、比
較的に広い選択幅の中から弾性及び導電性を自由に調節
したものを使用可能である。
(5) As the conductive material with which the hole is filled, a material in which elasticity and conductivity are freely adjusted can be used from a relatively wide selection range.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の異方性導電膜の製造工程を示す断面図
であり、(a)は熱可塑性膜に保護膜を被着させた膜を
示す図。(b)は(a)の膜に孔部を形成した状態を示
す図、(c)は(b)で形成した孔部に導電性物質を充
填した状態を示す図。
FIG. 1 is a cross-sectional view showing a process for producing an anisotropic conductive film of the present invention, in which (a) is a view showing a film in which a protective film is attached to a thermoplastic film. (B) is a diagram showing a state in which holes are formed in the film of (a), and (c) is a diagram showing a state in which the holes formed in (b) are filled with a conductive substance.

【図2】本発明の異方性導電膜の被接続物との接続方法
を示す断面図であり、(a)は保護膜を剥離した状態を
示す図、(b)は(a)の異方性導電膜を被接続物と対
向配置させた状態を示す図。(c)は異方性導電膜の接
続状態を示す図。
2A and 2B are cross-sectional views showing a method of connecting an anisotropic conductive film of the present invention to an object to be connected, wherein FIG. 2A is a view showing a state in which a protective film is peeled off, and FIG. The figure which shows the state which has arrange | positioned the electrically conductive film opposite to an to-be-connected object. (C) is a figure which shows the connection state of an anisotropic conductive film.

【符号の説明】[Explanation of symbols]

1 熱可塑性膜 2、3 保護膜 4 孔部 5 導電性物質 21、23 被接続物(FPC、基板等) 1 Thermoplastic film 2, 3 Protective film 4 Hole 5 Conductive substance 21, 23 Connected object (FPC, substrate, etc.)

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 熱可塑性膜と、 該熱可塑性膜の両面に剥離可能に配置される保護膜と、 前記熱可塑性膜及び前記保護膜を膜厚方向に貫通する孔
部内に充填される導電性物質とを有し、使用時に保護膜
を剥離して被接続物に熱圧着されて膜厚方向の電気的接
続を行うことを特徴とする異方性導電膜。
1. A thermoplastic film, a protective film releasably disposed on both sides of the thermoplastic film, and a conductive material filled in a hole penetrating the thermoplastic film and the protective film in a film thickness direction. An anisotropic conductive film comprising a substance, which is peeled off from the protective film at the time of use and thermocompression-bonded to an object to be connected to perform electrical connection in the film thickness direction.
【請求項2】 熱可塑性膜の両面に保護膜を剥離可能に
して配置させる工程と、 前記熱可塑性膜及び前記保護膜を貫通する孔部を形成す
る工程と、 該孔部に弾性を有する導電性物質を充填する工程とを含
む異方性導電膜の製造方法。
2. A step of arranging a protective film on both sides of a thermoplastic film in a releasable manner, a step of forming a hole portion penetrating the thermoplastic film and the protective film, and an electrically conductive material having elasticity in the hole portion. Of an anisotropic conductive film, which comprises a step of filling a conductive material.
JP8887695A 1995-03-22 1995-03-22 Anisotropic electric conduction film and its preparation Pending JPH08273441A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8887695A JPH08273441A (en) 1995-03-22 1995-03-22 Anisotropic electric conduction film and its preparation

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8887695A JPH08273441A (en) 1995-03-22 1995-03-22 Anisotropic electric conduction film and its preparation

Publications (1)

Publication Number Publication Date
JPH08273441A true JPH08273441A (en) 1996-10-18

Family

ID=13955214

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8887695A Pending JPH08273441A (en) 1995-03-22 1995-03-22 Anisotropic electric conduction film and its preparation

Country Status (1)

Country Link
JP (1) JPH08273441A (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2003007430A1 (en) * 2001-07-09 2003-01-23 Tokyo Electron Limited Feed-through manufacturing method and feed-through
JP2003031030A (en) * 2001-07-12 2003-01-31 Sekisui Chem Co Ltd Microparticle alignment conductive connection film, manufacturing method of the microparticle alignment conductive connection film and conductive connection structural body
US7267559B2 (en) 2001-05-10 2007-09-11 Fujitsu Limited Anisotropic conductive sheet, production process, contact structure, electronic device and inspection apparatus for operation test
US7514045B2 (en) 2002-01-18 2009-04-07 Avery Dennison Corporation Covered microchamber structures
JP2010062103A (en) * 2008-09-06 2010-03-18 Sumitomo Electric Ind Ltd Connection member and method of forming the same, and connection structure and method of forming the same
CN112521873A (en) * 2020-12-01 2021-03-19 湖南省凯纳方科技有限公司 Method for manufacturing anisotropic conductive film

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7267559B2 (en) 2001-05-10 2007-09-11 Fujitsu Limited Anisotropic conductive sheet, production process, contact structure, electronic device and inspection apparatus for operation test
WO2003007430A1 (en) * 2001-07-09 2003-01-23 Tokyo Electron Limited Feed-through manufacturing method and feed-through
JP2003031030A (en) * 2001-07-12 2003-01-31 Sekisui Chem Co Ltd Microparticle alignment conductive connection film, manufacturing method of the microparticle alignment conductive connection film and conductive connection structural body
JP4669635B2 (en) * 2001-07-12 2011-04-13 積水化学工業株式会社 Method for producing fine particle arrangement conductive connection film
US7514045B2 (en) 2002-01-18 2009-04-07 Avery Dennison Corporation Covered microchamber structures
JP2010062103A (en) * 2008-09-06 2010-03-18 Sumitomo Electric Ind Ltd Connection member and method of forming the same, and connection structure and method of forming the same
CN112521873A (en) * 2020-12-01 2021-03-19 湖南省凯纳方科技有限公司 Method for manufacturing anisotropic conductive film

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