JPH08263807A - Formation of magnetic pole of thin-film magnetic head - Google Patents

Formation of magnetic pole of thin-film magnetic head

Info

Publication number
JPH08263807A
JPH08263807A JP9133395A JP9133395A JPH08263807A JP H08263807 A JPH08263807 A JP H08263807A JP 9133395 A JP9133395 A JP 9133395A JP 9133395 A JP9133395 A JP 9133395A JP H08263807 A JPH08263807 A JP H08263807A
Authority
JP
Japan
Prior art keywords
magnetic pole
magnetic
film
thin
plating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP9133395A
Other languages
Japanese (ja)
Inventor
Takeshi Sawake
剛 佐分
Kazuhiko Tachikawa
一彦 立川
Shigenori Suzuki
茂徳 鈴木
Toshiya Suzuki
利弥 鈴木
Shunsuke Haga
俊介 芳賀
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
FDK Corp
Original Assignee
FDK Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by FDK Corp filed Critical FDK Corp
Priority to JP9133395A priority Critical patent/JPH08263807A/en
Publication of JPH08263807A publication Critical patent/JPH08263807A/en
Pending legal-status Critical Current

Links

Landscapes

  • Magnetic Heads (AREA)

Abstract

PURPOSE: To make it possible to obtain a thin-film magnetic head which does not adversely affect the distribution of magnetic fields, substantially prevents the occurrence of dimensional defects, facilitate operation by decreasing the number of plating stages and has good characteristics. CONSTITUTION: The magnetic pole 32 of the thin-film magnetic head having a narrow and thin front end 10 of a magnetic pole and a broad and thick yoke part 12 having such a drawn structure which is continuous from this front end of the magnetic pole is formed by a plating method. A magnetic film is formed in the yoke part over the entire part of the front end of the magnetic pole and the yoke part by one time of the plating stage and a resist 34 is patterned thereon exclusive of the front end of the magnetic pole and thereafter, the front end of the magnetic pole is removed to the necessary pole length by an ion milling and is thinly trimmed.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、メッキ法による薄膜磁
気ヘッドの磁極形成方法に関し、更に詳しく述べると、
1回のメッキ工程でヨーク部分に必要な厚さまで磁性膜
を形成し、薄い磁極先端部はイオンミリングで磁性膜を
一部除去することで形成する薄膜磁気ヘッドの磁極形成
方法に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method of forming a magnetic pole of a thin film magnetic head by a plating method.
The present invention relates to a method of forming a magnetic pole of a thin film magnetic head in which a magnetic film is formed in a yoke portion to a required thickness in one plating step, and a thin magnetic pole tip is formed by partially removing the magnetic film by ion milling.

【0002】[0002]

【従来の技術】ハードディスク用薄膜磁気ヘッドの形態
には各種あるが、その代表的な例は、セラミックス基板
上に設ける上下2層の磁極をギャップ膜で分離し、その
間に磁界発生用及び誘導電流ピックアップ用のコイル膜
を形成する誘導型である。その他、再生にMR効果(磁
気抵抗効果)を利用したMR複合型などもある。これら
において、上部及び下部の磁極は、通常、パーマロイ
(NiFe合金)等の磁性材のメッキ膜からなり、レジ
ストにより画定された部分に必要な厚みで形成される。
2. Description of the Related Art There are various forms of thin-film magnetic heads for hard disks, and a typical example thereof is to separate magnetic poles of upper and lower two layers provided on a ceramic substrate with a gap film, and to generate a magnetic field and an induced current between them. It is an induction type that forms a coil film for a pickup. In addition, there is an MR composite type that utilizes the MR effect (magnetoresistance effect) for reproduction. In these, the upper and lower magnetic poles are usually made of a plating film of a magnetic material such as permalloy (NiFe alloy), and are formed in a portion defined by a resist with a required thickness.

【0003】これら上部及び下部の磁極は、図1に示す
ように、狭幅で薄い磁極先端部10と、その磁極先端部
10から連続するような絞り構造をもつ広幅で厚いヨー
ク部分12とを有する。図1において、Aは磁極の平面
形状を示し、Bはその断面形状を示している。ここで、
ヨーク部分12を厚くするのは磁気飽和を防ぐためであ
って、この厚肉部分は「ふとらし」ともよばれている。
代表的な寸法例は、a=200μm,b=150μm,
c=100μm,d=4μm,e=5μmといった値で
ある。なお寸法eはポール長PLに対応しており、符号
GDはギャップデプス、TWはトラック幅である。最終
的には、所定のギャップデプスGDが得られるように、
仮想線で示す符号FSの位置まで研磨することになる。
このFSの位置がスライダ浮上面に一致する。
As shown in FIG. 1, these upper and lower magnetic poles have a narrow and thin magnetic pole tip portion 10 and a wide and thick yoke portion 12 having a diaphragm structure continuous from the magnetic pole tip portion 10. Have. In FIG. 1, A shows the planar shape of the magnetic pole, and B shows its cross-sectional shape. here,
The reason why the yoke portion 12 is made thick is to prevent magnetic saturation, and this thick portion is also called “futonashi”.
Typical dimensions are a = 200 μm, b = 150 μm,
The values are c = 100 μm, d = 4 μm, e = 5 μm. Note that the dimension e corresponds to the pole length PL, the symbol GD is the gap depth, and TW is the track width. Finally, in order to obtain a predetermined gap depth GD,
The polishing will be performed up to the position of the symbol FS indicated by the virtual line.
The position of this FS coincides with the air bearing surface of the slider.

【0004】さて、このような構造の磁極は、従来、2
回のメッキ工程を繰り返すことで形成してきた。まず図
3のAに示すように、磁極を形成する部分の周囲に初回
のレジスト20をパターニングし、1回目のメッキを行
い磁性膜22を形成する。メッキ厚eは、磁極先端部に
必要な膜厚(ポール長PL)となるように選定する。次
に図3のBに示すように、ヨーク部分を取り囲むように
再度レジスト24をパターニングし、2回目のメッキを
行い厚みdの磁性膜26を形成する。この2回目の磁性
膜26が所謂「ふとらし」であり、1回目と2回目の磁
性膜22,26の合計(d+e)が厚いヨーク部分とな
る。その後、図3のCに示すように、レジスト24を除
去することで必要な磁性膜が得られる。
By the way, the magnetic pole having such a structure has been conventionally used in two cases.
It was formed by repeating the plating process once. First, as shown in FIG. 3A, the resist 20 is patterned for the first time around the portion where the magnetic pole is formed, and the first plating is performed to form the magnetic film 22. The plating thickness e is selected so as to have a film thickness (pole length PL) necessary for the tip of the magnetic pole. Next, as shown in FIG. 3B, the resist 24 is patterned again so as to surround the yoke portion, and second plating is performed to form a magnetic film 26 having a thickness d. The second magnetic film 26 is a so-called “flatter”, and the total (d + e) of the first and second magnetic films 22 and 26 is a thick yoke portion. Thereafter, as shown in FIG. 3C, the resist 24 is removed to obtain a necessary magnetic film.

【0005】[0005]

【発明が解決しようとする課題】上記のように、従来方
法では、メッキによる磁性膜の形成工程を2回実施しな
ければならない。ところがメッキを2工程で行うと、そ
の組成の不均一、あるいは形状の不連続(即ち、図3に
示すような段差28の発生)などの不具合が生じる虞れ
がある。第1層と第2層とで組成の不均一があると、磁
場の分布が境界面で違ってくるために所定の出力が得ら
れないことが起こる。また形状が不連続であると、寸法
不良となったり磁場の分布に悪影響を及ぼす等の問題が
生じる。
As described above, in the conventional method, the step of forming the magnetic film by plating must be performed twice. However, if the plating is performed in two steps, problems such as non-uniform composition or discontinuity in shape (that is, generation of step 28 as shown in FIG. 3) may occur. If the composition is not uniform between the first layer and the second layer, the predetermined output may not be obtained because the distribution of the magnetic field differs on the boundary surface. Further, if the shape is discontinuous, problems such as dimensional failure and adversely affecting the distribution of the magnetic field occur.

【0006】本発明の目的は、2回のメッキ工程により
生じる不具合を解消し、寸法不良が生じ難く、メッキ工
程数を減少して作業をし易くすると共に、特性の良好な
薄膜磁気ヘッドが得られるようにした磁極の形成方法を
提供することである。
An object of the present invention is to solve the problems caused by two plating steps, to prevent dimensional defects from occurring, to reduce the number of plating steps to facilitate the work, and to obtain a thin film magnetic head having good characteristics. To provide a method of forming a magnetic pole.

【0007】[0007]

【課題を解決するための手段】本発明は、狭幅で薄い磁
極先端部と、該磁極先端部から連続するような絞り構造
をもつ広幅で厚いヨーク部分とを有する薄膜磁気ヘッド
の磁極を、メッキ法により形成する方法である。本発明
では、磁極先端部とヨーク部分の全体にわたってヨーク
部分に必要な厚さまで1回のメッキ工程で磁性膜を形成
し、その上に磁極先端部を除いてレジストをパターニン
グした後、イオンミリングによって磁極先端部を必要な
ポール長まで除去し薄くトリミングする。
SUMMARY OF THE INVENTION The present invention provides a magnetic pole of a thin film magnetic head having a narrow and thin magnetic pole tip portion and a wide and thick yoke portion having a diaphragm structure continuous from the magnetic pole tip portion. It is a method of forming by a plating method. In the present invention, a magnetic film is formed over the entire magnetic pole tip portion and the yoke portion to a required thickness in the yoke portion by a single plating process, a resist is patterned on the magnetic film excluding the magnetic pole tip portion, and then ion milling is performed. The tip of the magnetic pole is removed to the required pole length and thinly trimmed.

【0008】[0008]

【作用】本発明方法では、薄膜磁気ヘッドの磁極の形成
ではメッキ工程は唯1回で完了することになる。このた
め、メッキ組成の均一化及び形状の不連続が生じること
はなく、所望形状の磁極を形成できる。磁極の厚さの調
整は、薄くする磁極先端部をイオンミリングでトリミン
グし一部分を除去することによって、正確に行われる。
In the method of the present invention, the plating process is completed only once for forming the magnetic poles of the thin film magnetic head. Therefore, it is possible to form a magnetic pole having a desired shape without causing a uniform plating composition and discontinuity in shape. The thickness of the magnetic pole is adjusted accurately by trimming the tip of the magnetic pole to be thinned by ion milling and removing a part.

【0009】[0009]

【実施例】本発明による薄膜磁気ヘッドの磁極の形成方
法の工程を図2に示す。まずレジスト30のパターニン
グにより磁極形成部分を画定し、例えばパーマロイ(N
iFe合金)などの磁性材をメッキすることにより、1
回のメッキ工程でヨーク部分に必要な厚みの磁性膜32
を形成する。つまり、この磁性膜32は、1回のメッキ
工程で、従来の「ふとらし」まで含めた厚み(即ち、前
記の寸法例でいうとd+e=9μm)にする。従って、
磁性膜32は、磁極先端部とヨーク部分を含めた全体が
同じ9μmの厚みとなる(図2のA参照)。
FIG. 2 shows steps of a method of forming a magnetic pole of a thin film magnetic head according to the present invention. First, the magnetic pole forming portion is defined by patterning the resist 30, and, for example, permalloy (N
1 by plating a magnetic material such as an iFe alloy)
The magnetic film 32 having a thickness required for the yoke portion in one plating process
To form. In other words, the magnetic film 32 has a thickness (that is, d + e = 9 μm in the above dimensional example) that includes the conventional “flatter” in one plating step. Therefore,
The entire magnetic film 32 including the magnetic pole tip and the yoke has the same thickness of 9 μm (see A in FIG. 2).

【0010】次に、薄くする磁極先端部を除いてレジス
ト34をパターニングし、イオンミリング法により磁極
先端部の磁性膜を所望の厚さ(上記の寸法の例ではe=
5μm)まで除去し薄くする(図2のB参照)。除去部
分を破線で表すと共に符号Rを付す。このようなイオン
ミリングによるトリミングによって、磁極先端部のポー
ル長PL及びヨーク部分前部(磁極の絞り構造)の厚み
を決定することができる。そして、最後にレジストを除
去すると、段差のついた磁性膜のみが残る(図2のC参
照)。これによって薄い磁極先端部10と厚いヨーク部
分12をもつ薄膜磁気ヘッドの磁極が得られる。
Next, the resist 34 is patterned except for the magnetic pole tip portion to be thinned, and the magnetic film at the magnetic pole tip portion is made to have a desired thickness (e = e in the example of the above dimension) by an ion milling method.
5 μm) to make thin (see B in FIG. 2). The removed portion is represented by a broken line and the symbol R is attached. By such trimming by ion milling, the pole length PL at the tip of the magnetic pole and the thickness of the front portion of the yoke portion (magnetic pole diaphragm structure) can be determined. Then, when the resist is finally removed, only the magnetic film having steps is left (see C in FIG. 2). As a result, a magnetic pole of a thin film magnetic head having a thin magnetic pole tip portion 10 and a thick yoke portion 12 is obtained.

【0011】なお従来技術でもメッキ工程の後にイオン
ミリング工程が設けられている場合があるが、これはメ
ッキの残滓を取り除くものであって、本発明のように磁
性膜を薄くトリミングする工程とは全く異なる。
In the prior art, an ion milling process may be provided after the plating process, but this is to remove the plating residue, and is different from the process of thinly trimming the magnetic film as in the present invention. Totally different.

【0012】本発明方法によって、所望の厚み分布をも
つ磁極が形成できる。なお本発明方法は、薄膜磁気ヘッ
ドの下部磁極の形成にも下部磁極の形成にも適用でき
る。
According to the method of the present invention, a magnetic pole having a desired thickness distribution can be formed. The method of the present invention can be applied to the formation of the lower magnetic pole and the lower magnetic pole of the thin film magnetic head.

【0013】[0013]

【発明の効果】本発明は上記のように、2回のメッキ工
程を経る必要が無く、1回のメッキ工程のみでヨーク部
分の「ふとらし」まで形成できるために、メッキ組成の
不均一及び形状の不連続などに起因する不具合(即ち特
性の低下や寸法不良など)は生じない。またメッキ工程
数が減少するので、その分製作も容易となる。
As described above, according to the present invention, since it is not necessary to perform the plating process twice, and even the "flatter" of the yoke portion can be formed by only one plating process, uneven plating composition and Problems (that is, deterioration of characteristics, dimensional defects, etc.) due to discontinuity of shape do not occur. Further, since the number of plating steps is reduced, the manufacturing becomes easier accordingly.

【図面の簡単な説明】[Brief description of drawings]

【図1】薄膜磁気ヘッドの磁極の形状の一例を示す説明
図。
FIG. 1 is an explanatory diagram showing an example of the shape of a magnetic pole of a thin film magnetic head.

【図2】本発明に係る磁極形成方法の工程説明図。FIG. 2 is a process explanatory diagram of a magnetic pole forming method according to the present invention.

【図3】従来の磁極形成方法の工程説明図。FIG. 3 is a process explanatory diagram of a conventional magnetic pole forming method.

【符号の説明】[Explanation of symbols]

10 磁極先端部 12 ヨーク部分 30 レジスト 32 磁性膜 34 レジスト 10 magnetic pole tip 12 yoke part 30 resist 32 magnetic film 34 resist

───────────────────────────────────────────────────── フロントページの続き (72)発明者 鈴木 利弥 東京都港区新橋5丁目36番11号 富士電気 化学株式会社内 (72)発明者 芳賀 俊介 東京都港区新橋5丁目36番11号 富士電気 化学株式会社内 ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Inventor Toshiya Suzuki 5-36-11 Shinbashi, Minato-ku, Tokyo Fuji Electric Chemical Co., Ltd. (72) Shunsuke Haga 5-36-11 Shinbashi, Minato-ku, Tokyo Fuji Electric Chemical Co., Ltd.

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】 狭幅で薄い磁極先端部と、該磁極先端部
から連続するような絞り構造をもつ広幅で厚いヨーク部
分とを有する薄膜磁気ヘッドの磁極を、メッキ法により
形成する方法において、磁極先端部とヨーク部分の全体
にわたってヨーク部分に必要な厚さまで1回のメッキ工
程で磁性膜を形成し、その上に磁極先端部を除いてレジ
ストをパターニングした後、イオンミリングによって磁
極先端部を必要なポール長まで除去し薄くトリミングす
ることを特徴とする薄膜磁気ヘッドの磁極形成方法。
1. A method for forming a magnetic pole of a thin-film magnetic head having a narrow and thin magnetic pole tip portion and a wide and thick yoke portion having a diaphragm structure continuous from the magnetic pole tip portion by a plating method. A magnetic film is formed over the entire magnetic pole tip portion and the yoke portion by a single plating process to a required thickness in the yoke portion, and after patterning the resist except the magnetic pole tip portion, the magnetic pole tip portion is removed by ion milling. A method of forming a magnetic pole of a thin film magnetic head, which comprises removing a required pole length and thinly trimming.
JP9133395A 1995-03-24 1995-03-24 Formation of magnetic pole of thin-film magnetic head Pending JPH08263807A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9133395A JPH08263807A (en) 1995-03-24 1995-03-24 Formation of magnetic pole of thin-film magnetic head

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9133395A JPH08263807A (en) 1995-03-24 1995-03-24 Formation of magnetic pole of thin-film magnetic head

Publications (1)

Publication Number Publication Date
JPH08263807A true JPH08263807A (en) 1996-10-11

Family

ID=14023524

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9133395A Pending JPH08263807A (en) 1995-03-24 1995-03-24 Formation of magnetic pole of thin-film magnetic head

Country Status (1)

Country Link
JP (1) JPH08263807A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6282776B1 (en) 1998-06-30 2001-09-04 Fujitsu Limited Magnetic head and method of manufacturing the same
US6510024B2 (en) 1998-06-30 2003-01-21 Fujitsu Limited Magnetic head and method of manufacturing the same

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6282776B1 (en) 1998-06-30 2001-09-04 Fujitsu Limited Magnetic head and method of manufacturing the same
US6510024B2 (en) 1998-06-30 2003-01-21 Fujitsu Limited Magnetic head and method of manufacturing the same

Similar Documents

Publication Publication Date Title
JP2000163713A (en) Forming method of upper magnetic pole layer of thin film magnetic head, forming method of fine block pattern of high aspect ratio on bottom of step on surface having steps, and thin film magnetic head
JPH08203036A (en) Magnetoresistance effect type head and its production
JPH10283611A (en) Thin film magnetic head
US7372667B2 (en) Thin-film magnetic head, head gimbal assembly with thin-film magnetic head, head arm assembly with head gimbal assembly, magnetic disk drive apparatus with head gimbal assembly and manufacturing method of thin-film magnetic head
US6477765B1 (en) Method of fabricating a magnetic write transducer
JPH05143939A (en) Composite type thin-film magnetic head and production thereof
JPH08263807A (en) Formation of magnetic pole of thin-film magnetic head
US20010013992A1 (en) Thin film magnetic head with tip sub-magnetic pole and method of manufacturing the same
JP3364962B2 (en) Thin film magnetic head
JP2002287376A5 (en)
JP2833583B2 (en) Patterning method for magnetoresistive element
JP3919926B2 (en) Manufacturing method of thin film magnetic head
JP3842475B2 (en) Method for manufacturing MR head
JP2861080B2 (en) Method for forming pattern of amorphous alloy magnetic film
JP3164050B2 (en) Manufacturing method of magnetoresistive composite head
JPH11273026A (en) Composite type thin film magnetic head and its manufacture
JP3474533B2 (en) Thin film magnetic head and method of manufacturing the same
JP2000011318A (en) Thin-film magnetic head and its production
JP2001176026A (en) Yoke-type spin valve magnetic head and its manufacturing method
JP2000215411A (en) Thin film magnetic head and its manufacture
JPH10247308A (en) Formation of gap layer of thin-film magnetic head
JPH1186220A (en) Manufacture for thin film magnetic head
JP2000231705A (en) Thin film magnetic head and its production
JPH11273024A (en) Thin film magnetic head and its manufacture
JPH06333215A (en) Production of magnetoresistance effect head