JPH08235527A - Thin-film magnetic head slider and its production - Google Patents

Thin-film magnetic head slider and its production

Info

Publication number
JPH08235527A
JPH08235527A JP7041574A JP4157495A JPH08235527A JP H08235527 A JPH08235527 A JP H08235527A JP 7041574 A JP7041574 A JP 7041574A JP 4157495 A JP4157495 A JP 4157495A JP H08235527 A JPH08235527 A JP H08235527A
Authority
JP
Japan
Prior art keywords
magnetic head
slider
thin film
film magnetic
sacrificial layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP7041574A
Other languages
Japanese (ja)
Other versions
JP3257917B2 (en
Inventor
Yoshio Koshikawa
誉生 越川
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP04157495A priority Critical patent/JP3257917B2/en
Priority to US08/603,257 priority patent/US5920978A/en
Priority to DE19655040A priority patent/DE19655040C2/en
Priority to DE19607379A priority patent/DE19607379C2/en
Priority to CNB200410003953XA priority patent/CN1284141C/en
Priority to CNB961055200A priority patent/CN1191567C/en
Priority to KR1019960005474A priority patent/KR100235090B1/en
Publication of JPH08235527A publication Critical patent/JPH08235527A/en
Priority to US09/189,301 priority patent/US6181531B1/en
Priority to US09/670,748 priority patent/US6594119B1/en
Application granted granted Critical
Publication of JP3257917B2 publication Critical patent/JP3257917B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Magnetic Heads (AREA)
  • Adjustment Of The Magnetic Head Position Track Following On Tapes (AREA)

Abstract

PURPOSE: To provide an inexpensive thin-film magnetic head slider having high performance by simultaneously forming plating a terminal leading part and slider body part. CONSTITUTION: This slider 20 is obtd. by forming the slider body part 22 consisting of a conductor, such as Ni, on the rear surface of a floating surface part 21 consisting of SiO2 , Al2 O3 , etc. The slider body part 22 consists of the terminal leading out pad parts 23 in its central part and outer peripheral parts 24. These pad parts 23 are arranged in a plurality in a direction parallel with the progressing direction B of a disk and a direction orthogonal with it. Gaps 25 of prescribed intervals are formed between the respective pad parts 23 and between the pad parts 23 and the outer peripheral parts 24. The terminals or terminal drawing out pad parts 23 exist in two sets and four pieces. The one set is for read head elements (MR elements) and one set for write head elements (inductive head elements). The terminals suffice with one set and two pieces if the read/write head elements are commonly used. Resins 26, such as polyimide, are arranged in these gaps 25 so as to cover the rear surface of the floating surface part 21.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、磁気ディスク装置に用
いられる薄膜磁気ヘッドスライダ及びその製造方法に関
する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a thin film magnetic head slider used in a magnetic disk device and a manufacturing method thereof.

【0002】[0002]

【従来の技術】近年、磁気ディスク装置の小型化、高性
能化、低価格化に伴い、高性能かつ低価格の薄膜磁気ヘ
ッドの開発が望まれている。この要求を満たす方式とし
て、薄膜パターン成膜面を、浮上面と平行としたホリゾ
ンタルヘッド(プレーナヘッド)が提案されている。そ
の理由は、ホリゾンタルヘッドは、特定の形状を有する
浮上レールの形成が容易であるために安定して低浮上の
ヘッドを実現しやすい、機械加工部を減らしやすいため
に低価格を実現しやすい等による。
2. Description of the Related Art In recent years, with the miniaturization, high performance, and low price of magnetic disk devices, there has been a demand for the development of a high-performance and low-cost thin film magnetic head. As a method for satisfying this requirement, a horizontal head (planar head) has been proposed in which the thin film pattern forming surface is parallel to the air bearing surface. The reason is that the horizontal head is easy to form a floating rail having a specific shape, so it is easy to realize a stable low floating head, and it is easy to reduce the number of machined parts, so it is easy to realize a low price. by.

【0003】従来のホリゾンタルヘッドスライダの例を
以下に示す。図1はIEEE TRANSACTIONS ON MAGNETICS,
vol.25, p.3190, 1989, 「新薄膜ヘッド形成(A New Th
in Film Head Geueration)」、J. P. Lazzari 及びP. D
eroux-Dauphin,に開示されている例を示す。図1におい
て、1はシリコン基板、2はスルーホール、3は導電
層、4は絶縁層、5は磁性層、6はギャップ層、7はコ
イル、8はエアベアリング面、9はトラック幅を示す。
An example of a conventional horizontal head slider is shown below. Figure 1 shows IEEE TRANSACTIONS ON MAGNETICS,
vol.25, p.3190, 1989, "New thin film head formation (A New Th
in Film Head Geueration), JP Lazzari and P. D.
Here is an example disclosed in eroux-Dauphin. In FIG. 1, 1 is a silicon substrate, 2 is a through hole, 3 is a conductive layer, 4 is an insulating layer, 5 is a magnetic layer, 6 is a gap layer, 7 is a coil, 8 is an air bearing surface, and 9 is a track width. .

【0004】図1の例は、シリコン基板、表面にエッチ
ングにより窪みを形成し、その窪みに薄膜磁気ヘッド素
子を形成している。シリコン基板表面が記録媒体に対向
する浮上面となるため、ヘッドの端子をスライダ背面に
取り出すために、シリコン基板を貫通するスルーホール
2を形成して端子を引き出している。また、スライダ外
形は機械加工により形成している。
In the example of FIG. 1, a silicon substrate is used to form a recess on the surface by etching, and a thin film magnetic head element is formed in the recess. Since the surface of the silicon substrate is the air bearing surface facing the recording medium, in order to take out the terminals of the head to the back surface of the slider, the through holes 2 penetrating the silicon substrate are formed and the terminals are led out. The slider outer shape is formed by machining.

【0005】図2はIEEE TRANSACTIONS ON MAGNETICS,
vol.25, p.3686, 1989, 「薄膜ヘッドスライダ装置の製
造に関する新研究(A New Approach to Making Thin Fi
lm Head-Slider Deuices) 」, Daniel W.Chapman, に開
示されている例を示す。図2の例は、基板上11に浮上
面側から先に薄膜磁気ヘッド素子12を形成し、絶縁膜
を平坦化後、スルーホールを貫通させたガラス基板13
をボンディングさせてスライダ本体部を形成する。その
後基板11をエッチング除去した後、スライダ外形を機
械加工で切断する。
FIG. 2 shows IEEE TRANSACTIONS ON MAGNETICS,
vol.25, p.3686, 1989, "A New Approach to Making Thin Fi
lm Head-Slider Deuices) ", Daniel W. Chapman ,. In the example of FIG. 2, the thin film magnetic head element 12 is formed on the substrate 11 from the air bearing surface side first, the insulating film is flattened, and then the glass substrate 13 in which the through holes are penetrated is formed.
Are bonded to form a slider body. After that, the substrate 11 is removed by etching, and then the slider outer shape is cut by machining.

【0006】[0006]

【発明が解決しようとする課題】図1,図2の従来例で
は、スライダ外形の形成は機械加工に頼っていること、
端子をスライダ背面に取り出すために、シリコン基板や
ガラス基板に貫通穴(スルーホール)を形成して導体を
埋め込むこと、ガラス基板をボンディングすること等の
工程が必要となり、工程が複雑である。
In the conventional example shown in FIGS. 1 and 2, the slider outer shape is formed by machining.
In order to take out the terminals to the back surface of the slider, it is necessary to form a through hole (through hole) in a silicon substrate or a glass substrate to embed a conductor, and to bond the glass substrate. Therefore, the process is complicated.

【0007】そこで、本発明の目的は、高性能で低価格
の薄膜磁気ヘッドスライダを得ること、並びにスルーホ
ールを形成することやガラス基板を使用することを必要
せず容易に薄膜磁気ヘッドスライダを製造できる方法を
提供することである。
Therefore, an object of the present invention is to easily obtain a thin film magnetic head slider without obtaining a high performance and low cost thin film magnetic head slider, forming a through hole and using a glass substrate. It is to provide a method that can be manufactured.

【0008】[0008]

【課題を解決するための手段】請求項1によれば、記録
媒体に対して浮上又は接触する浮上面を有し、該浮上面
と平行に薄膜磁気ヘッド素子の薄膜成膜面が形成されて
いる薄膜磁気ヘッドスライダにおいて、浮上面を形成す
る浮上面層及び薄膜磁気ヘッド素子上に、導体から成り
且つ剛性をもったスライダ本体部及び導体から成る少な
くとも1つ以上の端子引き出しパッド部が、浮上面と平
行な方向に所定の間隔を有して配置されていることを特
徴とする薄膜磁気ヘッドスライダが提供される。
According to a first aspect of the present invention, there is provided an air bearing surface that floats or contacts a recording medium, and a thin film deposition surface of a thin film magnetic head element is formed parallel to the air bearing surface. In the thin-film magnetic head slider, the air-bearing surface layer forming the air-bearing surface and the thin-film magnetic head element are provided with at least one terminal lead-out pad portion made of a conductor and having rigidity, and a slider body portion made of a conductor. There is provided a thin film magnetic head slider characterized by being arranged with a predetermined interval in a direction parallel to the surface.

【0009】請求項2によれば、スライダ本体部はスラ
イダの外周部に形成され、該スライダ本体部に囲まれた
内部に、1つ以上の端子引き出しパッド部が、パッド部
相互間及びパッド部とスライダ本体部との間に浮上面と
平行な方向に所定の間隔を有して形成されていることを
特徴とする請求項1に記載の薄膜磁気ヘッドスライダが
提供される。
According to a second aspect of the present invention, the slider main body is formed on the outer peripheral portion of the slider, and one or more terminal lead-out pad portions are provided between the pad portions and between the pad portions within the interior surrounded by the slider main body portion. The thin film magnetic head slider according to claim 1, wherein the thin film magnetic head slider is formed with a predetermined space in a direction parallel to the air bearing surface between the slider and the slider body.

【0010】請求項3によれば、パッド部相互間又はパ
ッド部とスライダ本体部との間の空隙にポリイミド又は
フォトレジスト等の樹脂あるいはダイヤモンドライクカ
ーボン等の無機材等からなる絶縁体が配置されているこ
とを特徴とする請求項1又は2に記載の薄膜磁気ヘッド
スライダが提供される。請求項4によれば、スライダ本
体部も端子引き出しパッドを兼ねることを特徴とする請
求項1〜3のいずれか1項に記載の薄膜磁気ヘッドスラ
イダが提供される。
According to the third aspect, an insulator made of a resin such as polyimide or photoresist or an inorganic material such as diamond-like carbon is arranged in the space between the pad portions or between the pad portion and the slider body. A thin film magnetic head slider according to claim 1 or 2 is provided. According to a fourth aspect of the present invention, there is provided the thin film magnetic head slider according to any one of the first to third aspects, wherein the slider main body also serves as the terminal lead-out pad.

【0011】請求項5によれば、端子引き出しパッドが
板状の支持ばねの端子部に接続されるように、スライダ
本体部及び端子引き出しパッドが支持ばねにボンディン
グ接着されていることを特徴とする請求項1に記載の薄
膜磁気ヘッドスライダが提供される。請求項6によれ
ば、スライダ本体部が板状の支持ばねに接着され、端子
引き出しパッドがワイヤを介して支持ばねの端子部にボ
ンディング接着されていることを特徴とする請求項1に
記載の薄膜磁気ヘッドスライダが提供される。
According to a fifth aspect of the present invention, the slider body and the terminal lead-out pad are bonded to the support spring by bonding so that the terminal lead-out pad is connected to the terminal portion of the plate-shaped support spring. A thin film magnetic head slider according to claim 1 is provided. According to a sixth aspect of the present invention, the slider body is bonded to the plate-shaped support spring, and the terminal lead-out pad is bonded and bonded to the terminal portion of the support spring via a wire. A thin film magnetic head slider is provided.

【0012】請求項7によれば、前記浮上面層は、Si
2 ,Al2 3 ,又はカーボン、又はこれらの組成物
から成り、導体の前記スライダ本体部及び端子引き出し
パッド部は、Ni,NiFe,Au又はCu又はこれら
の合金から成ることを特徴とする請求項1に記載の薄膜
磁気ヘッドスライダが提供される。請求項8によれば、
記録媒体に対して浮上又は接触する浮上レールを設けた
浮上面を有し、該浮上面と平行に薄膜磁気ヘッド素子の
薄膜成膜面が形成されている請求項1に記載の薄膜磁気
ヘッドスライダを製造する方法において、基板上に犠牲
層で前記浮上面の形状を形成するあるいは浮上面形状を
形成した層上に犠牲層を形成する工程と、該犠牲層上に
無機材料からなる浮上レールを形成する工程と、該犠牲
層上にスライダ本体部及び端子引き出しパッド部をめっ
きにより形成する工程と、該スライダ部を犠牲層のエッ
チングにより基板から分離する工程とを含むことを特徴
とする薄膜磁気ヘッドスライダの製造方法が提供され
る。
According to claim 7, the air bearing surface layer is made of Si.
It is made of O 2 , Al 2 O 3 , or carbon, or a composition thereof, and the slider body portion and the terminal lead-out pad portion of the conductor are made of Ni, NiFe, Au, Cu, or an alloy thereof. A thin film magnetic head slider according to claim 1 is provided. According to claim 8,
2. The thin film magnetic head slider according to claim 1, further comprising an air bearing surface provided with a flying rail that floats or contacts the recording medium, and a thin film deposition surface of the thin film magnetic head element is formed in parallel with the air bearing surface. In the method for manufacturing the above, a step of forming the shape of the air bearing surface with a sacrificial layer on the substrate or forming a sacrificial layer on the layer having the air bearing surface shape, and a flying rail made of an inorganic material on the sacrificial layer. A thin film magnetic layer including a step of forming, a step of forming a slider body portion and a terminal lead pad portion on the sacrificial layer by plating, and a step of separating the slider portion from the substrate by etching the sacrificial layer. A method of manufacturing a head slider is provided.

【0013】請求項9によれば、基板上に犠牲層で浮上
面の形状を形成する際、浮上レールの流入端テーパ部に
相当する部分は、犠牲層あるいは犠牲層の下に設けた層
の膜厚が徐々に変化するようにテーパ状に形成すること
を特徴とする請求項8に記載の薄膜磁気ヘッドスライダ
の製造方法が提供される。請求項10によれば、前記犠
牲層のテーパ状の部分は、該犠牲層の上に形成したフォ
トレジストへの露光量を調整することによりレジスト膜
の厚さを変化させてテーパ状とし、該フォトレジストを
マスクとして該犠牲層をドライエッチングすることによ
り形成することを特徴とする請求項9に記載の薄膜磁気
ヘッドスライダの製造方法が提供される。
According to the ninth aspect, when forming the shape of the air bearing surface with the sacrificial layer on the substrate, the portion corresponding to the taper portion of the inflow end of the flying rail is the sacrificial layer or the layer provided below the sacrificial layer. 9. A method of manufacturing a thin film magnetic head slider according to claim 8, wherein the thin film magnetic head slider is formed in a tapered shape so that the film thickness gradually changes. According to a tenth aspect, the tapered portion of the sacrificial layer is tapered by changing the exposure amount of the photoresist formed on the sacrificial layer to change the thickness of the resist film. 10. The method for manufacturing a thin film magnetic head slider according to claim 9, wherein the sacrificial layer is formed by dry etching using a photoresist as a mask.

【0014】請求項11によれば、前記犠牲層のテーパ
状の部分は、基板上にフォトレジストあるいはポリイミ
ドを形成し、該フォトレジストあるいはポリイミドへの
露光量を調整することによりレジスト膜ポリイミド膜の
厚さを変化させてテーパ状とし、該フォトレジストある
いはポリイミドを熱硬化又は紫外線硬化させて犠牲層と
するもしくはレジスト上に犠牲層を設けることを特徴と
する請求項9に記載の磁気ヘッドスライダの製造方法が
提供される。
According to the eleventh aspect, in the tapered portion of the sacrifice layer, photoresist or polyimide is formed on the substrate, and the exposure amount to the photoresist or polyimide is adjusted to form the resist film of the polyimide film. 10. The magnetic head slider according to claim 9, wherein the thickness is changed to form a taper shape, and the photoresist or polyimide is thermally or ultraviolet-cured to form a sacrificial layer or a sacrificial layer is provided on the resist. A manufacturing method is provided.

【0015】請求項12によれば、前記スライダ本体部
及び端子引き出しパッド部は絶縁材のめっきマスクを用
いて同時に前記浮上面層上に成膜されることを特徴とす
る請求項8に記載の磁気ヘッドスライダの製造方法が提
供される。請求項13によれば、基板上に多数の薄膜磁
気ヘッドスライダを形成する工程と、基板を少なくとも
複数の薄膜磁気ヘッドスライダを含むブロックに切断す
る工程と、該ブロック上の複数のスライダを複数の支持
ばねに同時にボンディング接続する工程と、該ブロック
の犠牲層をエッチングにより除去することにより各スラ
イダを分離することを特徴とする請求項8に記載の薄膜
磁気ヘッドスライダの製造方法が提供される。
According to a twelfth aspect, the slider body portion and the terminal lead-out pad portion are simultaneously formed on the air bearing surface layer by using a plating mask of an insulating material. A method of manufacturing a magnetic head slider is provided. According to a thirteenth aspect, a step of forming a large number of thin film magnetic head sliders on a substrate, a step of cutting the substrate into blocks including at least a plurality of thin film magnetic head sliders, and a plurality of sliders on the block are divided into a plurality of blocks. 9. A method of manufacturing a thin film magnetic head slider according to claim 8, wherein the sliders are separated by simultaneously performing bonding connection to the support springs and removing the sacrificial layer of the block by etching.

【0016】[0016]

【作用】請求項1によれば、浮上面を形成する無機材料
部及び薄膜磁気ヘッド素子上に、めっき工程により、ス
ライダ本体部と複数の端子引き出しパッド部を形成でき
るので、製造が容易となる。請求項2によれば、スライ
ダ本体部がスライダの外周部に形成されるので、十分な
剛性をもち、スライダを安定的に維持することができ
る。
According to the present invention, the slider body and the plurality of terminal lead-out pad portions can be formed on the inorganic material portion forming the air bearing surface and the thin film magnetic head element by a plating process, which facilitates manufacturing. . According to the second aspect, since the slider body is formed on the outer peripheral portion of the slider, it has sufficient rigidity and the slider can be stably maintained.

【0017】請求項3によれば、パッド部相互間又はパ
ッド部とスライダ本体部との間の空隙にポリイミド又は
フォトレジスト等の絶縁体が配置されているので、パッ
ド部の短絡等が有効に防止するとともに、浮上面部材の
機械的強度を向上させる。請求項4によれば、スライダ
本体部も端子引き出しパッドを兼ねるようにしたので、
パッドの数を実質的に減ずることが出来る。
According to the third aspect of the present invention, since the insulator such as polyimide or photoresist is arranged in the space between the pad portions or between the pad portion and the slider body, the pad portion can be effectively short-circuited. In addition to preventing, the mechanical strength of the air bearing surface member is improved. According to claim 4, since the slider body also serves as the terminal lead-out pad,
The number of pads can be substantially reduced.

【0018】請求項5によれば、スライダ本体部及び端
子引き出しパッドが支持ばねにボンディング接着され、
支持ばねに保持された状態のスライダが得られる。請求
項6によれば、スライダはその本体部により支持ばねに
保持され、端子引き出しパッドはワイヤを介して支持ば
ねの端子部にボンディングしているので、支持ばねの端
子部を任意の位置に設けることが出来る。
According to the present invention, the slider body and the terminal lead-out pad are bonded to the support spring by bonding.
The slider held by the supporting spring is obtained. According to the sixth aspect, the slider is held by the support spring by the main body thereof, and the terminal lead-out pad is bonded to the terminal portion of the support spring via the wire. Therefore, the terminal portion of the support spring is provided at an arbitrary position. You can

【0019】請求項7によれば、無機材料部の材質を特
定することにより、適切なスライダ本体が得られ、また
導体のスライダ本体部及び端子引き出しパッド部の金属
材質を特定することにより、めっきの容易な導体部が得
られる。請求項8によれば、犠牲層を設けることによ
り、めっきによる成膜が容易になる。
According to claim 7, a suitable slider body can be obtained by specifying the material of the inorganic material portion, and the plating can be performed by specifying the metal material of the slider body portion of the conductor and the terminal lead-out pad portion. It is possible to obtain a conductor part that is easy. According to the eighth aspect, by providing the sacrificial layer, film formation by plating becomes easy.

【0020】請求項9〜11によれば、浮上レールの流
入端テーパ部の形成を容易に行うことが出来る。請求項
12によれば、前記スライダ本体部及び端子引き出しパ
ッド部は、マスクを用いて同時に成膜することが出来
る。請求項13によれば、多数のスライダ支持ばねに装
着させた状態で同時に得ることが出来る。
According to the ninth to eleventh aspects, the inflow end taper portion of the floating rail can be easily formed. According to the twelfth aspect, the slider main body portion and the terminal lead-out pad portion can be simultaneously formed by using a mask. According to the thirteenth aspect, it can be obtained at the same time in a state of being attached to a large number of slider supporting springs.

【0021】[0021]

【実施例】図3(a)〜(c)に本発明の薄膜磁気ヘッ
ドスライダの実施例を示す。図3(a)は支持ばね30
に装着する前のスライダ20を背面(浮上面とは反対側
の面)から見た斜視図であり、図3(b)は支持ばね3
0に装着したスライダ20を浮上面の側から見た斜視図
であり、図3(c) は図3(a)の線A−A′における
断面を示す図である。
EXAMPLE FIGS. 3A to 3C show an example of the thin film magnetic head slider of the present invention. FIG. 3A shows a support spring 30.
FIG. 3B is a perspective view of the slider 20 before being mounted on the support spring 3 as viewed from the rear surface (the surface opposite to the air bearing surface).
FIG. 3C is a perspective view of the slider 20 attached to No. 0 as viewed from the air bearing surface side, and FIG. 3C is a view showing a cross section taken along line AA ′ in FIG.

【0022】スライダ20は、SiO2 ,Al2 3
から成る浮上面部21の背面にNi等の導体から成るス
ライダ本体部22を形成したものである。スライダ本体
部22は、その中央部に端子引き出しパッド部23と外
周部24とから成り、パッド部23はディスクの進行方
向Bと平行な方向及びそれと直交する方向に複数配列さ
れ、各パッド部23間及びパッド部23と外周部24と
の間は所定間隔の空隙25を有する。端子ないし端子引
き出しパッド部23は2組、4個あり、1組はリードヘ
ッド素子(MR素子)用、1組はライトヘッド素子(イ
ンダクティブヘッド素子)用である。尚、リード/ライ
トヘッド素子を兼用した場合は、端子は1組、2個で良
い。これらの空隙25内には、浮上面部21の背面を覆
うようにポリイミド等の樹脂26が配置されている。な
お、スライダ本体部22の外周部24が端子引き出しパ
ッド部の1つを兼ねていてもよい。
The slider 20 has a slider body 22 made of a conductor such as Ni formed on the back surface of an air bearing surface 21 made of SiO 2 , Al 2 O 3 or the like. The slider main body 22 is composed of a terminal lead-out pad portion 23 and an outer peripheral portion 24 in the central portion thereof, and the pad portions 23 are arranged in a plurality of directions parallel to the disc traveling direction B and in a direction orthogonal thereto. There is a gap 25 at a predetermined interval between the pad portion 23 and the outer peripheral portion 24. There are two sets or four sets of terminals or terminal lead-out pad portions 23, one set for a read head element (MR element) and one set for a write head element (inductive head element). When the read / write head element is also used, the number of terminals may be one set or two. In these voids 25, a resin 26 such as polyimide is arranged so as to cover the back surface of the air bearing surface portion 21. The outer peripheral portion 24 of the slider body 22 may also serve as one of the terminal lead-out pad portions.

【0023】スライダ20はその背面の側が、図3
(a)に示すように、支持ばね30に装着される。スラ
イダ20の浮上面部21の側には、図3(b)に示すよ
うに、ディスクの進行方向Bに略平行な2本の両側レー
ル27、流入端中央部に中心レール28、薄膜ヘッド2
9が形成されている。また、両側レール27および中心
レール28の流入端にはテーパ部27a,28aが形成
されている。
The rear side of the slider 20 is shown in FIG.
As shown in (a), it is attached to the support spring 30. As shown in FIG. 3B, on the air bearing surface 21 side of the slider 20, two side rails 27 substantially parallel to the traveling direction B of the disk, a center rail 28 at the center of the inflow end, a thin film head 2 are provided.
9 is formed. Further, tapered portions 27a and 28a are formed at the inflow ends of the both side rails 27 and the center rail 28.

【0024】図4に薄膜磁気ヘッドスライダの変形例を
示す。図3の実施例では、スライダ本体部22の外周部
24の導体がパッド部23を囲んでいたのに対し、本変
形例ではスライダ20の本体部22の骨組を導体で形成
し、端子引き出しパッド部23はその外側に配置した例
である。このように、端子引き出しパッド部23はスラ
イダ20内の任意の位置に配置可能である。また、浮上
レール27,28(図3(b))の形状に応じて、剛性
を確保するためにスライダ本体部22の形状を任意に変
化させることが可能である。
FIG. 4 shows a modification of the thin film magnetic head slider. In the embodiment of FIG. 3, the conductor of the outer peripheral portion 24 of the slider body 22 surrounds the pad portion 23, whereas in the present modification, the frame of the body portion 22 of the slider 20 is formed of a conductor, and the terminal lead-out pad is formed. The part 23 is an example arranged on the outside thereof. In this way, the terminal lead-out pad portion 23 can be arranged at any position in the slider 20. In addition, the shape of the slider main body 22 can be arbitrarily changed in order to ensure rigidity according to the shape of the levitation rails 27 and 28 (FIG. 3B).

【0025】図5には、本スライダ20と支持ばね30
の接続図を示す。本実施例では、スライダ20上の端子
引き出しパッド部23と本体外周部24の背面にボンデ
ィング用金属31を形成しておき、端子導体部32を形
成した支持ばね30と熱圧着、超音波圧着等のボンディ
ング(C)あるいは導電性接着剤によるボンディングを
行う。この際、端子引き出しパッド部23と支持ばね3
0の接続部は電気的接続と機械的接続を兼ね、スライダ
本体部の外周部24は機械的接続の役目を果たす。スラ
イダ本体部の外周部24も端子引き出しパッドのひとつ
を兼ねている場合には、全ての接続部が電気的接続と機
械的接続を兼ねることとなる。
FIG. 5 shows the slider 20 and the support spring 30.
The connection diagram of is shown. In this embodiment, a bonding metal 31 is formed on the rear surface of the terminal lead-out pad portion 23 on the slider 20 and the main body outer peripheral portion 24, and the support spring 30 having the terminal conductor portion 32 is formed thereon by thermocompression bonding, ultrasonic pressure bonding, or the like. Bonding (C) or bonding with a conductive adhesive is performed. At this time, the terminal lead-out pad portion 23 and the support spring 3
The connection portion of 0 serves both as an electrical connection and a mechanical connection, and the outer peripheral portion 24 of the slider main body portion serves as a mechanical connection. When the outer peripheral portion 24 of the slider body also serves as one of the terminal lead-out pads, all the connecting portions serve both electrical connection and mechanical connection.

【0026】図6には、本スライダ20と支持ばね30
の接続方法の他の実施例を示す。スライダ20と支持ば
ね30を接着あるいは圧着し、端子引き出しパッド23
は支持ばね30の背面に設置した導体部33とワイヤ3
4を介してボンディングや半田付け等で接続する。ある
いは、支持ばね30に沿って配置されたリード線(図示
せず)を直線端子引き出しパッド23に接続しても構わ
ない。
FIG. 6 shows the slider 20 and the support spring 30.
Another embodiment of the connection method will be described. The slider 20 and the support spring 30 are bonded or pressure-bonded to each other, and the terminal lead-out pad 23
Is a conductor 33 and a wire 3 installed on the back surface of the support spring 30.
Connection is made via 4 by bonding or soldering. Alternatively, a lead wire (not shown) arranged along the support spring 30 may be connected to the linear terminal lead-out pad 23.

【0027】図7(a)〜(e)には、本スライダ20
の製造工程を示す。なお、これらの図は図3におけるA
−A′断面に対応する。まず、Si基板46上に、A
l,Ti,Ta等の犠牲層をなす材料で浮上レール(両
側レール及び中心レール)の形状を形成する(図7
(a))。図8(a)は対応する斜視図である。図示の
ように、浮上レールとなる部分以外の部位がAl等の犠
牲層で覆われる。なお、浮上レールのテーパ部の形成方
法については後述する。次に、上面の全面に犠牲層(A
l)を成膜する(図7(b))。次に、記録再生ヘッド
素子を形成し、SiO2 、ダイヤモンドライクカーボン
(カーボン)、Al2 3 等で浮上面部を成膜する(図
7(c))。なお、記録再生ヘッド素子を形成した後、
浮上面部を成膜する前に図8(b)に示すように、ヘッ
ド素子41と端子引き出しパッド形成部42とを配線4
3にて接続しておく。次に、めっき用導電膜(図示せ
ず)を成膜し、かつフォトレジストでめっき用マスク
(図示せず)を形成後、Ni,NiFe,Au,Cu等
の金属をめっき成膜することによって端子引き出しパッ
ド部23とスライダ本体部22を形成する。めっき後、
フォトレジストおよびめっき膜の付着していない部分の
導電膜を除去する(図7(d))。端子部23およびス
ライダ本体部22の背面側(表面)にAu等のボンディ
ングメタル45を成膜し、端子23とスライダ本体22
間にはポリイミド等の樹脂26を埋める(図7
(e))。なお、ダイヤモンドライクカーボン、SiO
2 等の無機材料で埋めてもかまわない。その後、支持ば
ね30とボンディング接続後に、犠牲層あるいは犠牲層
と基板をエッチングすることによって該スライダ20を
Siの基板46から分離する。なお、スライダ20を基
板46から分離した後、支持ばね30と接続しても構わ
ないことはいうまでもない。
In FIGS. 7A to 7E, the main slider 20 is shown.
The manufacturing process of is shown. In addition, these figures are shown in FIG.
Corresponds to the -A 'cross section. First, on the Si substrate 46, A
The material of the sacrificial layer such as l, Ti, and Ta forms the shape of the levitation rail (both sides rail and center rail) (FIG.
(A)). FIG. 8A is a corresponding perspective view. As shown in the figure, the portion other than the portion that becomes the floating rail is covered with a sacrificial layer such as Al. The method of forming the tapered portion of the levitation rail will be described later. Next, the sacrificial layer (A
l) is deposited (FIG. 7B). Next, a recording / reproducing head element is formed, and an air bearing surface is formed of SiO 2 , diamond-like carbon (carbon), Al 2 O 3 or the like (FIG. 7C). After forming the recording / reproducing head element,
Before forming the air bearing surface portion, as shown in FIG. 8B, the head element 41 and the terminal lead-out pad forming portion 42 are connected to the wiring 4
Connect at 3. Next, a conductive film for plating (not shown) is formed, a mask for plating (not shown) is formed with a photoresist, and then a metal such as Ni, NiFe, Au, or Cu is formed by plating. The terminal lead-out pad portion 23 and the slider body portion 22 are formed. After plating,
The conductive film in the portion where the photoresist and the plating film are not attached is removed (FIG. 7D). A bonding metal 45 such as Au is formed on the back surface (front surface) of the terminal portion 23 and the slider body 22 to form the terminal 23 and the slider body 22.
A resin 26 such as polyimide is filled in the space (see FIG. 7).
(E)). In addition, diamond-like carbon, SiO
It may be filled with an inorganic material such as 2 . After that, the slider 20 is separated from the Si substrate 46 by etching the sacrifice layer or the sacrifice layer and the substrate after bonding and connecting the support spring 30. Needless to say, the slider 20 may be separated from the substrate 46 and then connected to the support spring 30.

【0028】図9(a)〜(c)には、本発明のスライ
ダ20と支持ばね30の組立方法について示す。基板4
6上にスライダ20を形成後、この基板46を複数のス
ライダ20を含むブロック47に切断し、複数の支持ば
ね30を短冊状に連結した連結体48を該スライダブロ
ック47に一括ボンディングする(図9(a))。その
後、該スライダブロック47の基板46をエッチングに
より分離し(図9(b))、各支持ばね30を連結体4
8から切断して完成させる(図9(c))。
FIGS. 9A to 9C show a method of assembling the slider 20 and the support spring 30 of the present invention. Board 4
After forming the slider 20 on the substrate 6, the substrate 46 is cut into blocks 47 including a plurality of sliders 20, and a connecting body 48 in which a plurality of supporting springs 30 are connected in a strip shape is collectively bonded to the slider block 47 (FIG. 9 (a)). After that, the substrate 46 of the slider block 47 is separated by etching (FIG. 9B), and each support spring 30 is connected to the connecting body 4.
Complete by cutting from 8 (FIG. 9C).

【0029】図10(a)〜(d)には、浮上レールの
テーパ部形成方法を示す。Siの基板46上に犠牲層5
1(Al)を成膜後、フォトレジスト52を塗布し、露
光する。その際、テーパ部の露光量を他の部分の露光量
より徐々に減らして露光を行う(図10(a))。この
手法はフォトレジストパターンを立体形状を形成する方
法として一般的に適用されるもので、例えば特開昭61
−107514や下記文献等に記載されている。
10 (a) to 10 (d) show a method of forming the taper portion of the levitation rail. Sacrificial layer 5 on Si substrate 46
After depositing 1 (Al), a photoresist 52 is applied and exposed. At that time, exposure is performed by gradually reducing the exposure amount of the taper portion from the exposure amounts of the other portions (FIG. 10A). This method is generally applied as a method of forming a three-dimensional shape of a photoresist pattern.
-1071414 and the following documents.

【0030】W. Henke, W. Hoppe, H. J. Quenzer, P.
Staudt-Fischbach and B. Wagner“Simulation and Exp
erimental Study of Gray-Tone Lithography for the F
abrication of arbitrarily Shaped Surfaces ”IEEE,
Micro Electro Mechanical Systems, p. 205, 1994 フォトレジストを現像してテーパ部53を形成後(図1
0(b))、イオンミリングやスパッタエッチング等に
より犠牲層をエッチングし(図10(c))、レジスト
52を除去してテーパ部54をもった犠牲層51のパタ
ーンを完成する(図10(d))。その後、全面に犠牲
層を成膜後犠牲層51上にSiO2 等からなる浮上レー
ル部(図示せず)を成膜する。
W. Henke, W. Hoppe, HJ Quenzer, P.
Staudt-Fischbach and B. Wagner “Simulation and Exp
erimental Study of Gray-Tone Lithography for the F
abrication of arbitrarily Shaped Surfaces ”IEEE,
Micro Electro Mechanical Systems, p. 205, 1994 After developing the photoresist to form the tapered portion 53 (see FIG. 1).
0 (b)), the sacrificial layer is etched by ion milling, sputter etching or the like (FIG. 10 (c)), the resist 52 is removed, and the pattern of the sacrificial layer 51 having the tapered portion 54 is completed (FIG. 10 ()). d)). Then, after forming a sacrificial layer on the entire surface, a flying rail portion (not shown) made of SiO 2 or the like is formed on the sacrificial layer 51.

【0031】図11(a)及び(b)には、浮上レール
のテーパ形成方法の他の実施例を示す。この実施例で
は、図10のようにAlの犠牲層51を成膜することな
く、基板46上フォトレジスト52を塗布し、露光量を
調整してフォトレジスト52の露光を行い(図11
(a))、その後、該フォトレジスト52を熱あるいは
紫外線により硬化させて犠牲層とする。もしくは、その
上に全面に犠牲層を成膜する。なお、硬化させたフォト
レジストはエッチング分離時に溶解されない材料でもか
まわない。また、テーパ部だけでなく、浮上レール形状
全体をフォトレジストで形成してもよい。
11 (a) and 11 (b) show another embodiment of the method for forming the taper of the flying rail. In this embodiment, the photoresist 52 is applied on the substrate 46 and the exposure amount is adjusted to expose the photoresist 52 without forming the Al sacrificial layer 51 as shown in FIG.
(A)) After that, the photoresist 52 is cured by heat or ultraviolet rays to form a sacrificial layer. Alternatively, a sacrificial layer is formed on the entire surface. The cured photoresist may be a material that is not dissolved during etching separation. Further, not only the taper portion but also the entire flying rail shape may be formed by photoresist.

【0032】[0032]

【発明の効果】本発明によれば、端子引き出し部とスラ
イダ本体部を導体で同時にめっき形成することにより、
シリコン基板にスルーホールを形成したり、ガラス基板
を接着することなくスライダを構成でき、高性能で低価
格の薄膜磁気ヘッドスライダの提供が可能となる。
According to the present invention, the terminal lead-out portion and the slider body portion are simultaneously formed by plating with a conductor,
The slider can be configured without forming a through hole in the silicon substrate or adhering the glass substrate, and it is possible to provide a high performance and low cost thin film magnetic head slider.

【図面の簡単な説明】[Brief description of drawings]

【図1】従来知られている薄膜磁気ヘッドスライダの一
例を断面図で示す。
FIG. 1 is a sectional view showing an example of a conventionally known thin film magnetic head slider.

【図2】従来知られている薄膜磁気ヘッドスライダの他
の例を断面図で示す。
FIG. 2 is a sectional view showing another example of a conventionally known thin film magnetic head slider.

【図3】本発明の薄膜磁気ヘッドスライダの実施例を示
し、(a)は支持ばねに接着する前のスライダを背面よ
り見た図、(b)は支持ばねに接着後のスライダを浮上
面より見た面、(c)は(a)のA−A′断面図であ
る。
3A and 3B show an embodiment of a thin film magnetic head slider of the present invention, FIG. 3A is a view of the slider before adhesion to a support spring as seen from the back surface, and FIG. 3B is an air bearing surface of the slider after adhesion to a support spring. A more viewed surface, (c) is a cross-sectional view taken along the line AA ′ of (a).

【図4】本発明の薄膜磁気ヘッドスライダの変形例を示
す。
FIG. 4 shows a modification of the thin film magnetic head slider of the present invention.

【図5】支持ばねとスライダとの接続方法を示す概略図
である。
FIG. 5 is a schematic view showing a method of connecting a support spring and a slider.

【図6】支持ばねとスライダとの接続方法の他の例を示
す概略図である。
FIG. 6 is a schematic view showing another example of a method of connecting the support spring and the slider.

【図7】本発明の薄膜磁気ヘッドスライダの構造工程を
示す図である。
FIG. 7 is a diagram showing a structural process of a thin film magnetic head slider of the present invention.

【図8】本発明の薄膜磁気ヘッドスライダの製造工程の
途中の状態を示す。
FIG. 8 shows a state in the middle of a manufacturing process of the thin film magnetic head slider of the present invention.

【図9】複数の支持ばねと複数のスライダとを同時に接
続する方法を示す。
FIG. 9 shows a method of simultaneously connecting a plurality of support springs and a plurality of sliders.

【図10】浮上レールのテーパ部の形成方法の一実施例
を示す。
FIG. 10 shows an embodiment of a method for forming a taper portion of a floating rail.

【図11】浮上レールのテーパ部の形成方法の他の実施
例を示す。
FIG. 11 shows another embodiment of the method for forming the tapered portion of the floating rail.

【符号の説明】[Explanation of symbols]

20…スライダ 21…浮上面層 22…スライダ本体部 23…端子引き出しパッド部 24…外周部 26…絶縁材 27,28…浮上レール 27a,28a…テーパ部 30…支持ばね 32,33…端子部 34…ワイヤボンディング 46…基板 47…ブロック 20 ... Slider 21 ... Air bearing surface layer 22 ... Slider body 23 ... Terminal drawing pad portion 24 ... Outer peripheral portion 26 ... Insulating material 27,28 ... Floating rails 27a, 28a ... Tapered portion 30 ... Support springs 32,33 ... Terminal portion 34 … Wire bonding 46… Substrate 47… Block

Claims (13)

【特許請求の範囲】[Claims] 【請求項1】 記録媒体に対して浮上又は接触する浮上
面を有し、該浮上面と平行に薄膜磁気ヘッド素子の薄膜
成膜面が形成されている薄膜磁気ヘッドスライダにおい
て、浮上面を形成する浮上面層(21)及び薄膜磁気ヘ
ッド素子(29)上に、導体から成り且つ剛性をもった
スライダ本体部(22)及び導体から成る少なくとも1
つ以上の端子引き出しパッド部(23)が、浮上面と平
行な方向に所定の間隔を有して配置されていることを特
徴とする薄膜磁気ヘッドスライダ。
1. A thin film magnetic head slider having an air bearing surface that floats or contacts a recording medium, and a thin film deposition surface of a thin film magnetic head element is formed parallel to the air bearing surface. On the air bearing surface layer (21) and the thin film magnetic head element (29), at least one of a slider body portion (22) made of a conductor and having rigidity and a conductor is formed.
A thin-film magnetic head slider, wherein one or more terminal lead-out pad portions (23) are arranged at a predetermined interval in a direction parallel to the air bearing surface.
【請求項2】 スライダ本体部(22)はスライダ(2
0)の外周部(24)に形成され、該スライダ本体部に
囲まれた内部に、1つ以上の端子引き出しパッド部(2
3)が、パッド部(23)相互間及びパッド部(23)
とスライダ本体部(22)との間に浮上面と平行な方向
に所定の間隔を有して形成されていることを特徴とする
請求項1に記載の薄膜磁気ヘッドスライダ。
2. The slider body (22) is a slider (2).
0) formed on the outer peripheral portion (24) and surrounded by the slider body portion, and at least one terminal lead pad portion (2).
3) is between the pad portions (23) and between the pad portions (23)
2. The thin film magnetic head slider according to claim 1, wherein the thin film magnetic head slider is formed between the slider and the slider body portion (22) with a predetermined space in a direction parallel to the air bearing surface.
【請求項3】 パッド部(23)相互間又はパッド部
(23)とスライダ本体部(22)との間の空隙にポリ
イミド又はフォトレジスト等の樹脂あるいはダイヤモン
ドライクカーボン等の無機材等からなる絶縁材(26)
が配置されていることを特徴とする請求項1又は2に記
載の薄膜磁気ヘッドスライダ。
3. An insulation made of a resin such as polyimide or photoresist or an inorganic material such as diamond-like carbon in a space between the pad portions (23) or between the pad portion (23) and the slider body (22). Material (26)
3. The thin film magnetic head slider according to claim 1 or 2, wherein:
【請求項4】 スライダ本体部(22)も端子引き出し
パッドを兼ねることを特徴とする請求項1〜3のいずれ
か1項に記載の薄膜磁気ヘッドスライダ。
4. The thin-film magnetic head slider according to claim 1, wherein the slider body (22) also serves as a terminal lead-out pad.
【請求項5】 端子引き出しパッド(23)が板状の支
持ばね(30)の端子部(32)に接続されるように、
スライダ本体部(22)及び端子引き出しパッド(2
3)が支持ばね(30)にボンディング接着されている
ことを特徴とする請求項1に記載の薄膜磁気ヘッドスラ
イダ。
5. The terminal lead-out pad (23) is connected to the terminal portion (32) of the plate-shaped support spring (30),
The slider body (22) and the terminal lead-out pad (2
3. The thin film magnetic head slider according to claim 1, wherein 3) is bonded to a support spring (30) by bonding.
【請求項6】 スライダ本体部(22)が板状の支持ば
ね(30)に接着され、端子引き出しパッド(23)が
ワイヤ(34)を介して支持ばね(30)の端子部(3
3)にボンディング接着されていることを特徴とする請
求項1に記載の薄膜磁気ヘッドスライダ。
6. The slider body (22) is adhered to a plate-shaped support spring (30), and the terminal lead-out pad (23) is connected via a wire (34) to the terminal (3) of the support spring (30).
The thin film magnetic head slider according to claim 1, wherein the thin film magnetic head slider is bonded to 3) by bonding.
【請求項7】 前記浮上面層(21)は、SiO2 ,A
2 3 ,又はカーボン、又はこれらの組成物から成
り、導体の前記スライダ本体部(22)及び端子引き出
しパッド部(23)は、Ni,NiFe,Au又はCu
又はこれらを含む合金から成ることを特徴とする請求項
1に記載の薄膜磁気ヘッドスライダ。
7. The air bearing surface layer (21) is made of SiO 2 , A.
l 2 O 3, or carbon, or made from these compositions, the slider body of the conductor (22) and the terminal lead pad portion (23), Ni, NiFe, Au, or Cu
2. The thin film magnetic head slider according to claim 1, wherein the thin film magnetic head slider is made of an alloy containing them.
【請求項8】 記録媒体に対して浮上又は接触する浮上
レール(27,28)を設けた浮上面を有し、該浮上面
と平行に薄膜磁気ヘッド素子の薄膜成膜面が形成されて
いる請求項1に記載の薄膜磁気ヘッドスライダを製造す
る方法において、 基板(46)上に犠牲層で前記浮上面の形状を形成す
る、あるいは浮上面形状を形成した層上に犠牲層を形成
する工程と、 該犠牲層上に無機材料からなる浮上レール(27,2
8)を形成する工程と、 該犠牲層上にスライダ本体部(22)及び端子引き出し
パッド部(23)をめっきにより形成する工程と、 該スライダ部(20)を犠牲層のエッチングにより基板
(46)から分離する工程とを含むことを特徴とする薄
膜磁気ヘッドスライダの製造方法。
8. An air bearing surface provided with a levitation rail (27, 28) which floats or contacts a recording medium, and a thin film deposition surface of a thin film magnetic head element is formed parallel to the air bearing surface. The method of manufacturing a thin-film magnetic head slider according to claim 1, wherein the air bearing surface is formed of a sacrificial layer on a substrate (46), or a sacrificial layer is formed on a layer on which the air bearing surface is formed. And a levitation rail (27, 2) made of an inorganic material on the sacrificial layer.
8), a step of forming a slider body portion (22) and a terminal lead pad portion (23) on the sacrificial layer by plating, and a step of forming the slider portion (20) on the substrate (46) by etching the sacrificial layer. And a step of separating the thin film magnetic head slider from the above.
【請求項9】 基板(46)上に犠牲層で浮上面の形状
を形成する際、浮上レール(27,28)の流入端テー
パ部に相当する部分は、犠牲層あるいは犠牲層の下に設
けた層の膜厚が徐々に変化するようにテーパ状に形成す
ることを特徴とする請求項8に記載の薄膜磁気ヘッドス
ライダの製造方法。
9. When forming a shape of an air bearing surface with a sacrificial layer on a substrate (46), a portion corresponding to a taper portion of an inflow end of a flying rail (27, 28) is provided under the sacrificial layer or the sacrificial layer. 9. The method for manufacturing a thin film magnetic head slider according to claim 8, wherein the film thickness is formed in a tapered shape so that the film thickness of the layer changes gradually.
【請求項10】 前記犠牲層のテーパ状の部分は、該犠
牲層の上に形成したフォトレジストへの露光量を調整す
ることによりレジスト膜の厚さを変化させてテーパ状と
し、該フォトレジストをマスクとして該犠牲層をドライ
エッチングすることにより形成することを特徴とする請
求項9に記載の薄膜磁気ヘッドスライダの製造方法。
10. The tapered portion of the sacrificial layer is tapered by changing the thickness of the resist film by adjusting the exposure amount to the photoresist formed on the sacrificial layer. 10. The method of manufacturing a thin film magnetic head slider according to claim 9, wherein the sacrificial layer is formed by dry etching with the mask as a mask.
【請求項11】 前記犠牲層のテーパ状の部分は、基板
(46)上にフォトレジストあるいは感光性ポリイミド
を形成し、該フォトレジストへの露光量を調整すること
によりレジスト膜あるいはポリイミド膜の厚さを変化さ
せてテーパ状とし、該フォトレジストあるいはポリイミ
ドを熱硬化又は紫外線硬化させて犠牲層とする、あるい
は該フォトレジスト、ポリイミド上に犠牲層を形成する
ことを特徴とする請求項9に記載の磁気ヘッドスライダ
の製造方法。
11. The tapered portion of the sacrificial layer is formed by forming a photoresist or a photosensitive polyimide on the substrate (46) and adjusting the exposure amount to the photoresist to adjust the thickness of the resist film or the polyimide film. 10. The sacrificial layer is formed by changing the thickness to form a taper shape and thermally or ultraviolet curing the photoresist or polyimide, or forming a sacrificial layer on the photoresist or polyimide. Manufacturing method of magnetic head slider of.
【請求項12】 前記スライダ本体部(22)及び端子
引き出しパッド部(23)は絶縁材のめっきマスクを用
いて同時に前記浮上面層上に成膜されることを特徴とす
る請求項8に記載の磁気ヘッドスライダの製造方法。
12. The slider body portion (22) and the terminal lead-out pad portion (23) are simultaneously formed on the air bearing surface layer by using a plating mask of an insulating material. Manufacturing method of magnetic head slider of.
【請求項13】 基板(46)上に多数の薄膜磁気ヘッ
ドスライダ(20)を形成する工程と、基板(46)を
少なくとも複数の薄膜磁気ヘッドスライダ(20)を含
むブロック(47)に切断する工程と、該ブロック(4
7)上の複数のスライダ(20)を複数の支持ばね(3
0)に同時にボンディング接続する工程と、該ブロック
(47)の犠牲層をエッチングにより除去することによ
り各スライダ(20)を分離することを特徴とする請求
項8に記載の薄膜磁気ヘッドスライダの製造方法。
13. A step of forming a large number of thin film magnetic head sliders (20) on a substrate (46), and cutting the substrate (46) into blocks (47) including at least a plurality of thin film magnetic head sliders (20). Process and the block (4
7) a plurality of sliders (20) on a plurality of support springs (3
9. The thin film magnetic head slider manufacturing method according to claim 8, wherein the sliders (20) are separated by simultaneously performing bonding connection with the sliders (0) and etching the sacrificial layer of the blocks (47). Method.
JP04157495A 1995-03-01 1995-03-01 Thin film magnetic head slider and manufacturing method thereof Expired - Fee Related JP3257917B2 (en)

Priority Applications (9)

Application Number Priority Date Filing Date Title
JP04157495A JP3257917B2 (en) 1995-03-01 1995-03-01 Thin film magnetic head slider and manufacturing method thereof
US08/603,257 US5920978A (en) 1995-03-01 1996-02-20 Method of making a thin film magnetic slider
DE19607379A DE19607379C2 (en) 1995-03-01 1996-02-28 Method of making a thin film magnetic head slider
DE19655040A DE19655040C2 (en) 1995-03-01 1996-02-28 Thin film magnetic head slider and electrostatic actuator for driving a head element of the same
CNB200410003953XA CN1284141C (en) 1995-03-01 1996-03-01 Film magnetic head sliding plate and electrostatic actuator for driving its magnetic head element
CNB961055200A CN1191567C (en) 1995-03-01 1996-03-01 Thin film magnetic head slider and electrostatic actuator for driving head element thereof
KR1019960005474A KR100235090B1 (en) 1995-03-01 1996-03-02 Thin film magnetic head slider and electrostatic actuator for driving head element thereof
US09/189,301 US6181531B1 (en) 1995-03-01 1998-11-10 Thin film magnetic head slider and electrostatic actuator for driving a head element thereof
US09/670,748 US6594119B1 (en) 1995-03-01 2000-09-27 Thin film magnetic head slider and electrostatic actuator for driving a head element thereof

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP04157495A JP3257917B2 (en) 1995-03-01 1995-03-01 Thin film magnetic head slider and manufacturing method thereof

Publications (2)

Publication Number Publication Date
JPH08235527A true JPH08235527A (en) 1996-09-13
JP3257917B2 JP3257917B2 (en) 2002-02-18

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ID=12612221

Family Applications (1)

Application Number Title Priority Date Filing Date
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Country Link
JP (1) JP3257917B2 (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5999368A (en) * 1997-09-18 1999-12-07 Fujitsu Limited Magnetic head slider provided with a hard material layer for improved impact resistance and for avoiding cracking of an air bearing surface during production of the magnetic head slider
US6088908A (en) * 1997-09-19 2000-07-18 Fujitsu Limited Method of making a head slider
US8125734B2 (en) 2006-09-05 2012-02-28 Hitachi Global Storage Technologies, Netherlands B.V. Magnetic slider, head gimbal assembly and method for manufacturing the same

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5999368A (en) * 1997-09-18 1999-12-07 Fujitsu Limited Magnetic head slider provided with a hard material layer for improved impact resistance and for avoiding cracking of an air bearing surface during production of the magnetic head slider
US6088908A (en) * 1997-09-19 2000-07-18 Fujitsu Limited Method of making a head slider
US8125734B2 (en) 2006-09-05 2012-02-28 Hitachi Global Storage Technologies, Netherlands B.V. Magnetic slider, head gimbal assembly and method for manufacturing the same

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