JPH0822942A - Stage device - Google Patents

Abstract

PURPOSE:To make it possible to make a moving table return automatically within the allowable moving range of the table when the moving table exceeds its allowable moving range and a drive power to a driving device for driving the table is cut off. CONSTITUTION:A movable element 46 is placed along a linear guide 55 in a frame 44 and the element 46 is energized to the side of a sidewall 44a by a tensile coil spring 47. When a scanning stage 9 is moved to the side of the element 46, the element 46 is moved in a direction -Y and when an operating plate 49 fixed by the element 46 comes into contact with a microswitch 50, a drive current to a linear motor for driving the stage 9 is cut off. After that, the stage 9 is pushed in a direction +Y by the element 46 to return in its allowable moving range 51 and the microswitch 50 is returned in a state that it is turned on.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a stage device provided with a switch means for limiting a moving range of a moving table on which a positioning object is placed, and more particularly to a step device for manufacturing a semiconductor element or the like. It is suitable for application to a reticle stage or a wafer stage of an exposure apparatus of the and scan type.

[0002]

2. Description of the Related Art Conventionally, when a semiconductor element, a liquid crystal display element or the like is manufactured by using a photolithography technique,
A projection exposure apparatus is used which exposes a pattern formed on a reticle (or a photomask or the like) onto a wafer (or a glass plate or the like) coated with a photoresist via a projection optical system.

In recent years, since a single chip pattern such as a semiconductor element tends to be large, a projection exposure apparatus that exposes a pattern having a larger area on a reticle onto a wafer is required. If a so-called step-and-repeat type projection exposure apparatus that collectively exposes the pattern of the entire surface of the reticle is required to meet such a demand for an increased exposure area, the projection optical system needs to be increased in size, but it is wide. A projection optical system having high imaging performance over the entire exposure field has a disadvantage of high manufacturing cost.

Therefore, after each shot area of the wafer is moved to the scanning start position, the wafer is projected in synchronization with the scanning of the reticle in the direction traversing the optical axis of the projection optical system while the reticle is illuminated. A scanning exposure apparatus such as a so-called step-and-scan method that exposes a reticle pattern to each shot area of a wafer by scanning in a direction traversing the optical axis of an optical system has attracted attention.

FIG. 10 shows a schematic structure of a conventional scanning type exposure apparatus. In FIG. 10, illumination light I from an optical integrator (not shown) in the illumination optical system is shown.
L illuminates the field stop 2 via the first relay lens 1. The illumination light that has passed through the slit-shaped opening of the field stop 2 has a second relay lens 3, a mirror 4 for bending the optical path,
Also, the slit-shaped illumination area 7 on the reticle 6 is illuminated with a uniform illuminance via the illumination condenser lens 5. The arrangement surface of the field stop 2 and the pattern formation surface of the reticle 6 are conjugated, and the width d in the short side direction formed on the field stop 2 is d.
The projected image of the rectangular aperture of _S is the slit-shaped illumination area 7.

The pattern image in the illumination area 7 of the reticle 6 is image-projected in the slit-shaped exposure area 18 on the wafer 17 via the projection optical system 14 of both-side telecentric (or one-side telecentric). Here, the Z axis is taken parallel to the optical axis of the projection optical system 14, the X axis is taken perpendicular to the paper surface of FIG. 10 in the plane perpendicular to the Z axis, and the Y axis is taken parallel to the paper surface of FIG. The direction parallel to the Y axis is the scanning direction.

At this time, the reticle 6 is moved by the fine movement stage 8
Held above, the fine movement stage 8
The scanning stage 9 is mounted movably and rotatably in the Y plane, and is mounted on the reticle base 10 so as to be driven in the Y direction (or −Y direction) which is the scanning direction by a linear motor (not shown). Has been done. Coordinates in the scanning direction and the non-scanning direction of the fine movement stage 8 measured by a movable mirror 11 fixed to an end of the fine movement stage 8 and a laser interferometer 12 installed outside are supplied to a main control system 13. .
The main control system 13 controls the position of the fine movement stage 8 and the scanning speed of the scanning stage 9 based on the supplied coordinates.

On the other hand, the wafer 17 has a wafer holder 19
Mounted on the X stage 20 via the
Is mounted on the Y stage 21 by a drive motor 27 so as to be freely movable in the X direction.
The motor 2 and the feed screw 26 are mounted on the motor 2 so as to be freely driven in the Y direction. On the X stage 20, a Z stage for adjusting the position of the wafer 17 in the Z direction, a leveling stage for adjusting the inclination angle of the wafer 17 and the like (not shown) are mounted. Further, the two-dimensional coordinates of the X stage 20 measured by the movable mirror 23 fixed on the X stage 20 and the laser interferometer 24 installed outside are supplied to the main control system 13, and the main control system 12 supplies them. The operations of the drive motors 25 and 27 and the like are controlled based on the coordinates thus obtained.

At the time of scan exposure, the projection optical system 14 is projected.
If the shadow magnification is β, under the control of the main control system 12,
The speed V of the scanning stage 9 on the side of the tickle is, for example, in the B1 direction._R
In synchronism with scanning with
Speed V in the C1 direction_W(= Β ・ V _R) By scanning,
The pattern image of the reticle 6 is successively projected and exposed on the wafer 17.
Is done.

FIG. 11 is a perspective view showing the state of the synchronous scanning. In FIG. 11, the pattern area 15 of the reticle 6 is scanned in the B1 direction with respect to the obliquely illuminated slit-shaped illumination area 7. Synchronously, the shot area 1 of the wafer 17 is moved in the C1 direction with respect to the shaded exposure area 18.
6 are scanned. As a result, the pattern images in the pattern area 15 of the reticle 6 are sequentially exposed on the shot area 16.

FIG. 12 is a plan view of the reticle stage in FIG. 10, and FIG. 13 is a side view of the reticle stage. As shown in FIG. 12, the scanning stage 9 is parallel to the Y axis on the reticle base 10. Linear guides 34A and 3
It is mounted so as to be movable in the Y direction along 4B. Further, the stator 33A and the mover 32A constitute a first linear motor 31A, and the stator 33B and the mover 32B.
The second linear motor 31B is thus configured. The stators 33A and 33B are fixed on the reticle base 10 in parallel with the linear guides 34A and 34B, and the mover 32 is attached to the scanning stage 9 along the stators 33A and 33B.
A and 32B are fixed. The scanning stage 9 is driven with respect to the reticle base 10 in the + Y direction or the −Y direction by these two linear motors 31A and 31B.

Further, a pair of microswitches 36A and 36B as limit switches are fixed along the linear guide 34A so as to sandwich the scanning stage 9 on the reticle base 10. Corresponding to this, a pair of microswitches 36A and 36B are mounted on the scanning stage 9.
A pair of actuation plates 35A and 35B are attached. In this case, drive power is supplied to the linear motors 31A and 31B with the two micro switches 36A and 36B open. Then, as shown in FIG. 13, when the scanning stage 9 moves in the -Y direction, the operating plate 35A contacts the micro switch 36A and the micro switch 36A is closed, the drive power to the linear motors 31A and 31B is cut off. , Scanning stage 9
Stops with the microswitch 36A closed. After that, in order to supply the driving power to the linear motors 31A and 31B again, the scanning stage 9 is manually pushed back to the movable range in the + Y direction (the range where the driving power is supplied to the linear motors 31A and 31B), and the micro switch is operated. 36A
Had to be open.

Similarly, when the scanning stage 9 moves in the + Y direction and the operating plate 35B comes into contact with the microswitch 36B and the microswitch 36B is closed, the drive power to the linear motors 31A and 31B is cut off, and the linear motors are again turned on. In order to supply drive power to 31A and 31B, it was necessary to manually push the scanning stage 9 back to the movable range in the -Y direction.

[0014]

As described above, in the conventional reticle stage, the microswitches 36A, 36 are used.
After the movable range of the scanning stage 9 is set by B and the microswitches 36A and 36B are closed, in order to return the scanning stage 9 to the movable range again, the scanning stage 9
Had to be manually pushed back into the range of motion. Therefore, for example, when the scanning stage 9 is out of the movable range during the exposure process, it is necessary to open the chamber in which the exposure apparatus is housed, interrupt the exposure process, and manually move the scanning stage 9. It was In this case, the opening / closing of the chamber causes the temperature inside the exposure apparatus to change, and the exposure step needs to be interrupted until the temperature stabilizes, so the throughput (productivity) of the exposure step decreases. It was

Similarly, also in a scanning exposure apparatus such as a wafer stage or a normal batch exposure type exposure apparatus (stepper or the like), the movable range of the stage is limited by a micro switch, and the stage is out of the movable range. When the microswitch is used to cut off the driving power to the driving device, it is necessary to manually push the stage back into the movable range, which lowers the throughput of the exposure process. There is inconvenience.

In view of the above point, the present invention moves a moving table along a predetermined base by a driving device and shuts off driving power to the driving device when the moving table exceeds a predetermined allowable moving range. In such a stage device, when the moving table exceeds the allowable moving range and the drive power to the driving device is cut off, the moving table can automatically return to the allowable moving range. With the goal.

[0017]

In the stage device according to the present invention, a movable table (9) on which an object to be positioned (6, 8) is placed, and the movable table are placed so as to be movable in a predetermined direction. In a stage device having a base (10) and a drive means (31A) for driving the moving table (9) in a predetermined direction with respect to the base, the moving table (9) with respect to the base (10). Drive means (31A) when the vehicle exceeds the allowable movement range in the predetermined direction
And a push-back means (46-48) for generating an urging force for pushing back the moving table (9) to its allowable movement range side earlier than the operation of this switch means. Be prepared.

In this case, the pushing back means (46-4
The urging force of 8) is the moving table (9) and the base (10).
It is desirable that the force is within a range that is larger than the frictional force between and and smaller than the driving force during the normal operation of the driving means (31A). Further, an example of the pushing back means has elastic members (47, 48).

Further, an example of the driving means (31A) is
It is a linear motor.

[0020]

According to the present invention, the moving table (9) is out of the allowable moving range due to, for example, a runaway, and the switch means (5) is moved.
When approaching 0), first, the push-back means (46 to 48) starts to urge the moving table (9) toward the allowable moving range. Further, when the moving table (9) moves, the switch means (50) operates and the operation of the drive means (31A) stops. That is, the driving force applied to the moving table (9) by the driving means (31A) disappears and the moving table (9) stops.

Even in this state, the pushing back means (46-4
8) is in operation and the pushing back means (46-48)
Since the moving table (8) has an urging force exceeding the frictional force between the moving table (9) and the base (10), the moving table (8) is pushed back toward the allowable moving range. Then, switch means (5
0) is in a non-operating state, and the moving table (9) can be driven by the driving means (31A). However, when the switch means (50) is activated, for example, the drive means (3
The control system of 1A) shifts to the error sequence, and the drive means (31A) is driven after the end of the error processing, so that the moving stage (9) again runs away to the switch means (50) side. Is prevented.

Next, the pushing back means is a coil spring,
Alternatively, when an elastic member such as rubber is included, the elastic member can generate a biasing force with a simple structure without adding a power source or the like. When the drive means is a linear motor, the switch means (5
When 0) operates and the supply of the driving power to the linear motor is cut off, the linear motor is in a state of having no driving force. Therefore, only the frictional force and the urging force from the pushing-back means (46 to 48) act on the moving table (9), and the moving table (9) is easily returned to the allowable moving range side.

[0023]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS An embodiment of the stage device according to the present invention will be described below with reference to FIGS. In this embodiment, the present invention is applied to a reticle cage of a step-and-scan type projection exposure apparatus. In FIGS. 1 and 2, parts corresponding to those in FIGS. The detailed description thereof will be omitted.

FIG. 1 is a plan view of the reticle stage of the present embodiment. In FIG. 1, the scanning stage 9 is mounted on the base 10 along the linear guides 34A and 34B so as to be slidable in the Y direction. The scanning stage 9 is driven in the + Y direction or the −Y direction with respect to the base 10 by the linear motors 31A and 31B. At the bottom of the scanning stage 9, a sliding portion 9a is provided so as to face one linear guide 34A.
(See FIG. 2) is formed, a sliding portion 9b (see FIG. 5) is formed so as to face the other linear guide 34B, and between the linear guides 34A and 34B and the sliding portions 9a and 9b, The bearing 60 (see FIG. 5) is interposed.

The fine movement stage 8 is mounted on the scanning stage 9 so as to be finely movable in the X direction, the Y direction, and the rotation direction (θ direction), and the reticle 6 on which the original pattern is formed is vacuum-sucked on the fine movement stage 8. And so on. Illumination light for exposure is applied to the slit-shaped illumination area 7 in the pattern formation area on the lower surface of the reticle 6 from an illumination optical system (not shown), which is + Y in the lateral direction of the illumination area 7 during scanning exposure.
Direction (or -Y direction), the reticle 6 is scanned at a predetermined speed via the scanning stage 9, and the position is adjusted by the fine movement stage 8 as necessary.

Further, Y is attached to the end of the fine movement stage 8 in the Y direction.
The axis moving mirror 11Y is fixed, and two laser interferometers 12YB and 12YA external to the moving mirror 11Y are used.
The laser beam is emitted parallel to the axis. The Y coordinate of the fine movement stage 8 is obtained from the average value of the measurement values of the laser interferometers 12YB and 12YA, and the rotation angle of the fine movement stage 8 is obtained from the difference of the measurement values of the laser interferometers 12YB and 12YA. In addition, X is attached to the end of the fine movement stage 8 in the X direction.
The axis movable mirror 11X is fixed, and a laser beam is emitted to the movable mirror 11X from an external laser interferometer 12X parallel to the X axis. The X coordinate of the fine movement stage 8 is obtained from the measurement value of the laser interferometer 12X, and the position in the Y direction of the scanning stage 9 and the scanning speed are determined based on the X coordinate, the Y coordinate, and the rotation angle thus measured. The position and rotation angle of the fine movement stage 8 are controlled in parallel.

Next, the reference plate 42 is fixed to the side surface of the scanning stage 9 in the X direction, and the origin sensor 43 is fixed to the position on the base 10 where the reference plate 9 passes. 5 shows the positional relationship between the reference plate 42 and the origin sensor 43. In FIG. 5, the origin sensor 43 is
The light emitting unit and the light receiving unit are provided, and when the reference plate 42 passes in the Y direction between the light emitting unit and the light receiving unit, an origin signal is generated from the light receiving unit. In this embodiment, when the reticle stage is used, for example, its origin signal is used to reset the measurement values of the laser interferometers 12YA and 12YB.

Returning to FIG. 1, a pair of limit switch units 41A and 41B are fixed on the base 10 so as to sandwich the scanning stage 9 in the Y direction. FIG. 2 shows FIG.
As shown in FIG. 2, when the scanning stage 9 moves in the −Y direction or the + Y direction, the bottom portion of the scanning stage 9 comes into contact with the limit switch unit 41A or 41B, as described later. Linear motor 31
The drive power to A and 31B is cut off.
That is, the limit switch unit 41A or 41B defines the allowable movement range of the scanning stage 9 in the Y direction.

FIG. 3 is an enlarged plan view of one of the limit switch units 41A of FIG. 1, and FIG. 4A is an enlarged front view thereof. In the limit switch unit 41A shown in FIGS. 3 and 4A, FIG. , A linear guide 45 is formed parallel to the Y direction in a frame 44 having a U-shaped cross section in the YZ plane. The mover 46 is slidably mounted along the linear guide 45, and the convex portions 46a and 46b on both side surfaces of the mover 46 and + Y of the frame 44 are provided.
The tension coil springs 47 and 48 are mounted between the side wall 44a and the side wall 44a, respectively, and the movable coil 46 is pressed against the side wall 44a by the tension coil springs 47 and 48. The total urging force of the tension coil springs 47 and 48 when the mover 46 is in contact with the side wall 44a is larger than the frictional force between the scanning stage 9 and the base 10 and the linear motors 31A and 31B. It is set to be smaller than the average driving force.

An operating plate 49 is fixed to the side surface of the mover 46, and a micro switch 50 is fixed to a position on the frame 44 where the operating plate 49 passes. Two circuits are arranged in parallel in the microswitch 50.
Each of the two circuits is a linear motor 31A and 31B of FIG.
Is connected between one of the cables for supplying the drive current. When the micro switch 50 comes into contact with the actuation plate 49 and closes, the micro switch 50 is put into an actuated state, the circuit inside is made non-conductive (OFF), and the supply of the drive current to the linear motors 31A and 31B is cut off. Also, the micro switch 50
Is in a non-operating state when the operating plate 49 is open apart, the circuit inside is made conductive (ON), and the linear motor 3
1A and 31B are driven. Also,
The other limit switch unit 41B shown in FIG.
The limit switch unit 41A has a symmetrical structure.

Next, the operation of this embodiment will be described. First, in FIG. 4A, an area in the Y direction sandwiched between the mover 46 and the mover of the other limit switch unit 41B (see FIG. 1) is defined as an allowable movement range 51. At this time, the scanning stage 9 moves in the direction of the arrow 52 (-Y direction) due to the runaway of the linear motors 31A and 31B in FIG.
When the scanning stage 9 moves out of the allowable movement range 51, the scanning stage 9 starts to push the mover 46. After that, as shown in FIG. 4B, the mover 46 is pushed by the scanning stage 9 and moves in the −Y direction along the linear guide 45, and the actuating plate 49 fixed to the mover 46 eventually becomes micro. Switch 5
Close 0. In this state, the linear motor 31A of FIG.
The supply of the drive current to 31B is cut off, and the driving force of the scanning stage 9 is lost. In this case, the tension coil springs 47 and 48 are + Y sufficient to push back the scanning stage 9.
Since it has the urging force F in the direction, the mover 46 pushes the scanning stage 9 back in the + Y direction, and the micro switch 50 is opened to supply the drive current to the linear motors 31A and 31B.

However, in this embodiment, the micro switch 5 is used.
0 is closed and the drive current is cut off, the linear motor 31
In the drive system (not shown) of A and 31B, the linear motor 31
The drive current to the A and 31B is set to 0, for example, and a host computer (not shown) is notified of the error occurrence. afterwards,
When the error recovery is performed, the linear motors 31A, 3A
Since the supply of the drive current to 1B is started, the scanning stage 9 is returned to the allowable movement range 51 by the mover 46.

Further, since the measured values of the laser interferometers 12YA and 12YB in FIG. 1 may be incorrect due to, for example, runaway, the linear motor 3 after the error recovery in FIG.
1A. 31B is driven to move the scanning stage 9 in the -Y direction so that the reference plate 42 crosses the origin sensor 43. Then, at that time, the laser interferometers 12YA, 12Y are used by using the origin signal obtained from the origin sensor 43.
Reset the measured value of B. As a result, the Y coordinate is always accurately measured on the scanning stage 9.

As described above, according to this embodiment, after the microswitch 50 is closed and the drive current to the linear motors 31A and 31B is cut off, the mover 4 as the push-back means is provided.
Since 6 pushes the scanning stage 9 back within the allowable movement range 51, the operator does not have to push the scanning stage 9 back manually. Therefore, the exposure process of the scanning type exposure apparatus using the reticle stage of FIG. 1 is not interrupted for a long time, and the throughput of the exposure process is improved.

Next, a first modification of the left limit switch unit 41A in FIG. 1 will be described with reference to FIGS. 6 and 7. 6 and 7, parts corresponding to those in FIGS. 1 to 5 are designated by the same reference numerals, and detailed description thereof will be omitted.
FIG. 6 is an enlarged plan view of a limit switch unit of this modification, and FIG. 7 is an enlarged front view of which a part is cut away.
In this limit switch unit, the frame 44
Through-holes 44 in the Y-direction side walls 44a and 44b, respectively.
c and 44d are formed, and these through holes 44c and 44d are formed.
A cylindrical mover 53 is inserted in the d parallel to the Y axis, and the stopper 5 is attached to the surface of the mover 53 in the side walls 44a and 44b.
4 is fixed, and a compression coil spring 55 is interposed between the stopper 54 and the side wall 44b so as to surround the mover 53. Therefore, when the scanning stage 9 is separated from the mover 53, the stopper 54 is pressed toward the side wall 44a in the + Y direction by the urging force of the compression coil spring 55, and the end of the mover 53 in the + Y direction is removed from the side wall 44a. It projects in the + Y direction. The urging force of the compression coil spring 55 in the state where the stopper 54 is in contact with the side wall 44a is larger than the frictional force between the scanning stage 9 and the base 10 in FIG. 1 and the average of the linear motors 31A and 31B. The driving force is set to be smaller than that.

Further, the operating plate 49 is provided on the side surface of the stopper 54.
Is fixed, and the micro switch 50 is fixed at a position on the frame 44 where the operating plate 49 passes. When the micro switch 50 comes into contact with the operating plate 49 and closes, the supply of drive current to the linear motors 31A and 31B is cut off,
When the operating plate 49 is open apart, the linear motor 3
1A and 31B are driven.

In this modification, when the scanning stage 9 moves in the direction of the arrow 51 (-Y direction) and starts pushing the mover 53, the mover 53 and the stopper 54 move in the -Y direction. After that, when the operating plate 49 fixed to the stopper 54 closes the micro switch 50, the driving force from the linear motors 31A and 31B to the scanning stage 9 disappears. At this time, the compression coil spring 55 moves the scanning stage 9
Since it has a sufficient force to push back the scanning stage 9 in the + Y direction via the stopper 54 and the mover 53, the micro switch 50 opens to move the linear motors 31A and 31B. The drive current can be supplied. The subsequent operation is shown in FIGS.
Is the same as in the example.

Next, a second modification of the left limit switch unit 41A in FIG. 1 will be described with reference to FIGS. 8 and 9. 8 and 9, parts corresponding to those in FIGS. 1 to 5 are designated by the same reference numerals, and detailed description thereof will be omitted.
FIG. 8 is an enlarged plan view of a limit switch unit of this modification, and FIG. 9 is an enlarged front view thereof. In this limit switch unit, two convex portions 56 on a base 56 are provided.
A rotary pin 57 is inserted through the through holes in a and 56b perpendicularly to the Y axis, and a movable element 58 is rotatably supported about the rotary pin 57 as an axis. A tension coil spring 59 is stretched between the side surface of the mover 58 on the −Y direction side and the protrusion 56d at the upper end of the base 56 in the −Y direction. The rotational force is applied to. However, the left side surface of the mover 58 is the base 56.
The mover 58 is supported so as not to rotate further clockwise by contacting the upper step portion 56c. The urging force of the tension coil spring 59 when the mover 58 is in contact with the step portion 56c is larger than the frictional force between the scanning stage 9 and the base 10 of FIG. 1 and the linear motors 31A and 31B. It is set to be smaller than the average driving force.

Further, the micro switch 50 is fixed on the base 56 in the rotational direction of the lower right slope 58b of the mover 58. When the micro switch 50 comes into contact with the slope 58b and closes, the linear motors 31A and 31B of FIG.
The linear motors 31A and 31B are driven when the supply of the drive current to the motor is cut off and the slope 58b is opened apart.

In this modification, when the scanning stage 9 moves in the direction of arrow 51 (-Y direction) and starts pushing the right side surface 58a of the mover 58, the mover 58 rotates counterclockwise about the rotary pin 57 as an axis. Rotate in the (θ direction). After that, when the slope 58b of the mover 58 closes the micro switch 50, the driving force from the linear motors 31A and 31B to the scanning stage 9 disappears. At this time, the tension coil spring 59 has sufficient force to push back the scanning stage 9, so the tension coil spring 59 pushes back the scanning stage 9 in the + Y direction via the mover 58, and the micro switch 50 opens. It becomes possible to supply the drive current to the linear motors 31A and 31B. The subsequent operation is the same as in the example of FIGS. 3 and 4.

In the above embodiment, the limit switch unit 41A is the base 10 as shown in FIG.
It is fixed on top, but the limit switch unit 41
A may be attached to the scanning stage 9 side, and a member that comes into contact with the mover 46 may be attached to a position on the base 10 that faces the A. Further, for example, elastic members such as rubber may be used instead of the tension coil springs 47 and 48 in FIG. Further, for example, in FIG. 7, the movable element 53 may be formed of an elastic member such as rubber without forming a through hole in the side wall 44b, and the scanning stage 9 may be pushed back by this elastic member.

Further, although the linear motors 31A and 31B are used as the driving device for the scanning stage 9 in the above embodiment, the voice coil motor (V
The present invention can be applied to the case of using another electromagnetic type driving device such as CM). However, in particular, a linear motor or V
Like the CM, when the driving power is cut off, the scanning stage 9
A drive device is advantageous which allows it to move freely.

Further, although the present invention is applied to the reticle stage of the scanning type exposure apparatus in the above embodiment, the present invention may be applied to the wafer stage side. Further, even in a batch exposure type exposure apparatus (stepper etc.), when the allowable movement range of the stage is defined by a limit switch, the present invention is applied to automatically move the stage. Can be returned to range.

As described above, the present invention is not limited to the above-described embodiments, and various configurations can be adopted without departing from the gist of the present invention.

[0045]

According to the present invention, for example, when the moving table runs out of control and the switch means is operated, the moving table is automatically returned to the allowable moving range by the push-back means, and the switch means is not operated. Return to the state. Therefore,
There is an advantage that it is not necessary to push back the moving table manually. Therefore, when the stage device of the present invention is applied to, for example, a reticle stage or a wafer stage of a scanning type exposure apparatus, it is not necessary for an operator to interrupt the exposure process even when these stages run out, so that the exposure process Throughput (productivity) is improved.

Further, when the pushing-back means has an elastic member, it is not necessary to separately provide a power source such as a drive motor, and the structure is simple. Further, when the driving means is a linear motor, the moving table can be freely moved by cutting off the driving power, so that there is an advantage that the moving table can be easily moved by the push-back means of the present invention.

[Brief description of drawings]

FIG. 1 is a plan view showing a reticle stage as an embodiment of a stage device according to the present invention.

FIG. 2 is a front view of FIG.

FIG. 3 is an enlarged plan view showing a limit switch unit 41A in FIG.

4A is a front view of FIG. 3, and FIG. 4B is a front view showing a state in which a micro switch 50 is closed.

FIG. 5 is a reference plate 42 and an origin sensor 43 in FIG.
It is an enlarged view of the principal part showing the relationship.

FIG. 6 is an enlarged plan view showing a first modification of the limit switch unit 41A of the embodiment.

FIG. 7 is a front view in which a part of FIG. 6 is cut away.

FIG. 8 is an enlarged plan view showing a second modification of the limit switch unit 41A of the embodiment.

9 is a front view of FIG. 8. FIG.

FIG. 10 is a configuration diagram showing a conventional scanning type exposure apparatus.

FIG. 11 is a perspective view showing an exposure operation of the scanning exposure apparatus.

FIG. 12 is a plan view showing a conventional reticle stage.

FIG. 13 is a front view of FIG.

[Explanation of symbols]

 6 reticle 7 slit-shaped illumination area 8 fine movement stage 9 scanning stage 10 base 12YA, 12YB laser interferometer 31A, 31B linear motor 34A, 34B linear guide 41A, 41B limit switch unit 44 frame 46 mover 47, 48, 59 tension coil Spring 49 Operating plate 50 Micro switch 53 Mover 55 Compressed coil spring 58 Mover

Claims (3)

[Claims] 1. A moving table on which an object to be positioned is placed, a base on which the moving table is movably placed in a predetermined direction, and the moving table is driven in the predetermined direction with respect to the base. And a switch unit for stopping the operation of the drive unit when the moving table moves beyond the allowable movement range in the predetermined direction with respect to the base. A push-back means for generating an urging force for pushing the movable table toward the allowable movement range side with respect to the base earlier than the means operates. 2. The stage device according to claim 1, wherein the push-back means has an elastic member. 3. The stage device according to claim 1, wherein the driving means is a linear motor.