JP2004356415A - Aligner and method for exposure - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide an aligner and a method for exposure having a simple and practical proximity blind. <P>SOLUTION: The aligner includes a movable blind unit 100 having a pair of L-shaped blind plates 160, 161. The blind plates 160, 161 are slidably provided at guide shaft and countermeasures 111, 113. The blind plates 160, 161 are driven by an inchworm type contact non-resonance ultrasonic actuator to be movable in directions X, Y and Z. A rectangular opening for limiting the exposure area of a reticle is formed of these pair of blind plates 160, 161. The opening size and position can be set by independently driving the blind plates 160, 161. <P>COPYRIGHT: (C)2005,JPO&NCIPI

Description

[0001]
TECHNICAL FIELD OF THE INVENTION
The present invention relates to an exposure apparatus and an exposure method for transferring a pattern formed on an original (a mask, a reticle, etc.) to a sensitive substrate (a wafer, etc.). In particular, the present invention relates to an exposure apparatus and an exposure method having a simple and practical proximity line.
[0002]
BACKGROUND ART AND PROBLEMS TO BE SOLVED BY THE INVENTION
In a so-called lithography technique for forming a fine pattern of a semiconductor device or the like, a light exposure apparatus is currently mainstream. Among the optical exposure apparatuses, a scanning type apparatus scans a pattern while synchronizing scanning between a reticle stage on which a pattern original (reticle) is mounted and a wafer stage on which a sensitive substrate (wafer) to which the pattern is transferred is mounted. Projection transfer (so-called scan exposure) is performed thereon. In this scan exposure apparatus, a step operation of moving the wafer stage to position an exposure area to be transferred on the optical axis of the projection optical system and a scan operation of performing scanning exposure while synchronously moving the reticle stage and the wafer stage are repeated.
[0003]
In light exposure, a transmission type reticle through which exposure light is transmitted is widely used. In the illumination optical system, the exposure light is irradiated on a reticle after being shaped by passing through an opening inside a blind (formed aperture plate). Then, the exposure light passes through the reticle with little intensity loss, and is guided to the wafer via the projection optical system. In light exposure, since the exposure light hardly loses intensity, a considerable number of lenses can be arranged in the illumination optical system. Then, a surface conjugate with the reticle surface is provided in the illumination optical system, and a blind for shaping the exposure light beam can be provided on the surface, so that the blind can be disposed farther away than the reticle stage.
[0004]
In addition to the blind for shaping the exposure light beam used for the scanning exposure, a blind (field stop) for limiting the exposure area on the reticle is required, but such a blind is also required near the conjugate plane. Can be arranged.
[0005]
By the way, with the recent miniaturization of device patterns, it is desired to further improve the resolving power of a projection optical system limited by the diffraction limit of light. Therefore, X-rays having a wavelength of several nm to several tens nm called soft X-rays or EUV light (Extreme Ultra Violet light: extreme ultraviolet light) have been attracting attention, and specifically, EUV light having a wavelength of about 13 nm is used. Lithography technology has been developed. This technology is expected as a technology that can achieve a resolving power of 70 nm or less, which cannot be realized by photolithography using ultraviolet light having a wavelength of about 190 nm, which is an extension of light exposure. In the EUV light exposure apparatus, it is assumed that a scanning exposure method in which a reticle and a wafer are relatively scanned with respect to a projection optical system is adopted.
[0006]
In the EUV light region, there is no influential substance that transmits light, and a transmission / refraction type optical system cannot be configured. Therefore, a reflective optical system is used, and a reflective reticle is also used as the reticle. The exposure light beam emitted from the illumination optical system is obliquely incident on the reflection type reticle, is reflected on the reflection surface, and is guided to the wafer via the projection optical system. However, the reflection mirror used in EUV light exposure currently has a low reflectivity of about 70%, so that when the number of mirrors increases, the intensity of the exposure light decreases exponentially. Therefore, it is desirable to reduce the number of reflection mirrors in the illumination optical system as much as possible. Therefore, there is no room for placing a plane conjugate with the reticle surface in the illumination optical system, and a blind for shaping the exposure light beam must be arranged near the reticle stage.
[0007]
The present invention has been made in view of such a problem, and an object of the present invention is to provide an exposure apparatus and an exposure method having a simple and practical proximity line.
[0008]
[Means for Solving the Problems]
In order to solve the above problems, an exposure apparatus of the present invention is an exposure apparatus that transfers a pattern formed on an original to a sensitive substrate, and restricts an exposure area of the original, and is arranged near the original. A movable blind, wherein the movable blinds cooperate with each other to form a rectangular opening, and a pair of L-shaped blind plates; and in order to change a size and / or a position of the opening, each of the blind plates is independent. And a blind plate driving means for driving the plate.
[0009]
According to the present invention, the rectangular opening for limiting the exposure area of the original is formed by a pair of L-shaped blind plates. Then, by independently driving each of the pair of blind plates by the blind plate driving means, the opening size and position can be set.
[0010]
In the exposure apparatus of the present invention, the exposure apparatus scans and exposes the original in a certain direction (Y direction), and the pair of blind plates is arranged in a direction orthogonal to the Y direction (X direction). Both blind plates move relatively to change the width of the opening to set an edge of the exposure region, and in the Y direction, both blind plates move synchronously to set an edge of the exposure region. can do.
When the size of the exposure area of the original plate changes, the width adjustment in the X direction moves the both blind plates relatively in the X direction to change the width of the opening between the two blind plates. The setting of the edge of the exposure area in the Y direction (adjustment of the length of the exposure area in the Y direction) will be described later in detail with reference to FIGS. 9B and 10B. , The edge in the Y direction of the exposure area is set while using both the synchronous movement and the asynchronous movement of the blind plate.
It is preferable that each blind plate be driven independently in the Y direction during alignment of the exposure apparatus.
[0011]
In the exposure apparatus of the present invention, at the time of exchanging the original plate of the exposure apparatus, the pair of blind plates can also move in a vertical direction (Z direction) with respect to a plane formed in the XY directions.
In this case, by enabling the blind plate to move in the Z direction, the original transfer or the like can be smoothly performed.
[0012]
In the exposure apparatus of the present invention, the original stage may be arranged on the body of the exposure apparatus via a vibration isolating means.
In this case, the vibration isolating means can prevent the vibration generated due to the movement of the original stage from being transmitted to the housing of the exposure apparatus.
[0013]
The exposure apparatus of the present invention may include a counter mass mechanism for processing a driving reaction force of the blind plate in the Y direction.
In this case, the counter mass mechanism can cancel the reaction force generated by driving the blind plate. Therefore, even if the blind is driven in the scanning direction during the scanning exposure, it is possible to prevent the stage from vibrating, and to suppress a decrease in pattern transfer accuracy.
[0014]
In the exposure apparatus of the present invention, the blind plate driving means includes: a guide bar extending in a longitudinal direction; a slider moved and positioned along the guide bar;
An inch-worm-type actuator for driving the slider.
For example, Japanese Patent Application No. 2002-036147 can be used as such an actuator. A driving force transmitting unit that is applied to the guide bar from the slider and presses the slider in a longitudinal direction of the guide bar; and a driving force transmitting unit that presses and separates the driving force transmitting unit against the guide bar surface. One piezoelectric element (vertical drive piezoelectric element) and a second piezoelectric element (horizontal drive piezoelectric element) that pushes the driving force transmission unit in the longitudinal direction of the guide bar can be provided.
[0015]
The exposure method of the present invention is an exposure method for transferring a pattern formed on an original to a sensitive substrate, wherein a pair of L-shaped blind plates that cooperate to form a rectangular opening are placed near the original. Each of them is driven independently, and the exposure area of the original is limited by the blind plate.
Note that the type of exposure light is not limited to EUV light, and may be ultraviolet light, an electron beam, an ion beam, or the like. Also, the method of exposure is not particularly limited, and may be reduction projection exposure or 1: 1 close proximity transfer.
[0016]
BEST MODE FOR CARRYING OUT THE INVENTION
Hereinafter, description will be made with reference to the drawings.
In the present embodiment described below, an EUVL exposure apparatus will be described as an example, but the present invention can be applied to other exposure apparatuses that use energy rays other than EUV light.
FIG. 11 is a diagram showing a schematic configuration of an example of an EUVL exposure apparatus (four-projection system).
The EUVL exposure apparatus shown in FIG. 11 includes an illumination system IL including a light source. EUV light (generally, a wavelength of 5 to 20 nm is used, and specifically, a wavelength of 13 nm or 11 nm is used) emitted from the illumination system IL is reflected by the turning mirror 1 and irradiated on the reticle 2.
[0017]
The reticle 2 is held on a reticle stage 3. The reticle stage 3 has a stroke of 100 mm or more in the scanning direction (Y axis), has a minute stroke in the direction (X axis) orthogonal to the scanning direction in the reticle plane, and has a minute stroke in the optical axis direction (Z axis). Have a stroke. The position in the XY directions is monitored with high precision by a laser interferometer (not shown), and the position in the Z direction is monitored by a reticle focus sensor including a reticle focus light transmitting system 4 and a reticle focus light receiving system 5.
[0018]
The EUV light reflected by the reticle 2 enters the lower optical barrel 14 in the figure. The EUV light includes information on a circuit pattern drawn on the reticle 2. The reticle 2 is formed with a multilayer film (for example, Mo / Si or Mo / Be) that reflects EUV light, and is patterned with or without an absorption layer (for example, Ni or Al) on the multilayer film.
[0019]
The EUV light that has entered the optical barrel 14 is reflected by the first mirror 6, then sequentially reflected by the second mirror 7, the third mirror 8, and the fourth mirror 9, and finally is perpendicular to the wafer 10. Incident on. The reduction magnification of the projection system is, for example, 1/4 or 1/5. In this figure, there are four mirrors. A. It is effective to increase the number of mirrors to six or eight in order to further increase. An off-axis microscope 15 for alignment is arranged near the lens barrel 14.
[0020]
The wafer 10 is placed on a wafer stage 11. The wafer stage 11 can freely move in a plane (XY plane) orthogonal to the optical axis, and has a stroke of, for example, 300 to 400 mm. The wafer stage 11 can move up and down a minute stroke in the optical axis direction (Z axis), and the position in the Z direction is monitored by a wafer focus sensor including a wafer autofocus light transmitting system 12 and a wafer autofocus light receiving system 13. ing. The position of the wafer stage 11 in the XY directions is monitored with high precision by a laser interferometer (not shown). In the exposure operation, the reticle stage 3 and the wafer stage 11 perform synchronous scanning at the same speed ratio as the reduction ratio of the projection system, that is, at 4: 1 or 5: 1.
[0021]
Next, the movable blind device according to the present invention will be described. The movable blind device is disposed below the reticle stage 3 in FIG. 11 described above, and drives the L-shaped blind plates 160 and 161 (see FIG. 1 and the like) to limit the exposure area of the reticle 2. is there. A fixed blind for shaping the outer shape of the illumination light beam is also provided near the movable blind, but is not shown.
FIG. 1 is a perspective view showing the configuration of the movable blind device according to the present embodiment.
FIG. 2 is an XY plan view schematically showing a configuration of a blind plate driving unit of the movable blind device.
FIG. 3 is a side view schematically showing the configuration of a blind plate driving unit of the movable blind device, as viewed from the YZ plane.
[0022]
FIG. 4 is an enlarged view (an enlarged view of a portion A in FIG. 1) showing a configuration near the X drive actuator of the blind plate drive unit.
FIG. 5 is a diagram schematically illustrating a configuration near an arm of the blind plate driving unit.
(A) is a side view seen from the YZ plane, (B) is a perspective view.
FIG. 6 is a schematic side view showing a positional relationship among a support structure, a reticle stage, and a movable blind device in the exposure apparatus according to the present invention.
In the following description, the directions XX ', YY' and ZZ 'indicate the directions of the arrows shown in FIG. The arrow directions shown in the other figures basically conform to the arrow directions in FIG.
[0023]
First, the positional relationship of the movable blind device 100 in the exposure apparatus will be described with reference to FIG.
As shown schematically in FIG. 6, the movable blind apparatus 100 is provided on a base 101 supported by a body BD (support structure) of the exposure apparatus shown in FIG. Above the movable blind device 100, the above-mentioned reticle stage 3 is arranged. The reticle stage 3 is mounted on the body BD via an air mount (vibration insulating means) 90. Due to the air mount 90, vibrations caused by the movement of the reticle stage 3 are not transmitted to the body BD, so that the movable blind device 100 is stably supported.
[0024]
Next, the movable blind device 100 will be described in detail.
As shown in FIG. 1, the movable blind device 100 includes a disc-shaped base 101. The base 101 has four overhangs (large overhangs 101a and 101b and small overhangs 101c and 101d) on the outer periphery. At the center of the base 101, there is formed a circular opening 102 through which the exposure light beam passes. Although not shown, sensors for detecting the positions and postures of the L-shaped blind plates 160 and 161 are mounted on the base 101.
[0025]
As shown in FIGS. 1 and 2, two guide shafts 111 and 113 extending parallel to each other along the Y direction are attached to the upper surface of the base 101. These guide shafts 111 and 113 are arranged symmetrically with respect to the base center point with a base center line C passing through the center of the base 101 interposed therebetween. Guide frames 121A and 121B and 123A and 123B having a rectangular frame shape are fitted to both ends of each of the guide shafts 111 and 113, respectively. A linear guide (not shown) is interposed between each of the guide shafts 111 and 113 and each of the guide frames 121A and 121B and 123A and 123B. The guide shafts 111 and 113 are independently slidable in the Y and Y 'directions while being supported inside the guide frames 121A and 121B and 123A and 123B. These guide shafts 111 and 113 also serve as counter masses for canceling the driving reaction force of the L-shaped blind plates 160 and 161 (described in detail later).
[0026]
Projections 125a (see FIG. 4), 125b, 126a, and 126b are formed on the side portions of the guide frames 121A and 121B and 123A and 123B, respectively. The protrusion 125a of the guide frame 121A and the protrusion 126a of the guide frame 123A protrude in the X direction, and the protrusion 125b of the guide frame 121B and the protrusion 126b of the guide frame 123B protrude in the X 'direction. These projections 125a, 125b, 126a, 126b are connected to X drive actuators 131A, 131B, 133A, 133B, respectively. The aforementioned guide shaft / counter masses 111 and 113 are supported on the base 101 by X drive actuators 131A, 131B, 133A and 133B via guide frames 121A and 121B and 123A and 123B at both ends.
[0027]
Since the configuration of the X drive actuators 131A, 131B, 133A, 133B corresponding to the respective guide frames 121A, 121B, 123A, 123B of FIG. 1 is the same, here, mainly the guide frame 121A and the X drive actuator 131A are used. A set (an enlarged view of the vicinity thereof is shown in FIG. 4) will be described.
2, 3 and 4, the X drive actuator 131A includes a frame-shaped casing 131a. The projection 125a of the guide frame 121A is inserted inside the casing 131a. At the end of the projection 125, a retaining flange 125f (see FIG. 2) is provided.
[0028]
On the inner surface of the casing 131a of the X-drive actuator 131A, linear guides 135 are provided on the upper and lower sides in the Z-axis direction, and inch-worm type contact non-resonant ultrasonic actuators 136 are provided on both sides in the Y-axis direction. ing. As the inch worm type ultrasonic actuator 136, for example, the same one as disclosed in Japanese Patent Application No. 2002-036147 or the like can be used. As shown in FIG. 2, when the ultrasonic actuator 136 operates, the protrusions 125a (125b) of the guide frame 121A (121B) are driven in the X and X 'directions while being guided by the linear guide 135 (see FIG. 3). Accordingly, the guide shaft / counter mass 111 supported by the guide frame 121A (121B) can move in the X and X 'directions. Note that the guide shaft / counter masses 111 and 113 can be independently moved.
[0029]
As shown in FIGS. 1 and 3, a groove 111 a is formed in the guide shaft / counter mass 111 along the Y-axis direction. A blind plate driving slider 141 is slidably mounted in the groove 111a in the Y-axis direction. On the upper and lower surfaces of the groove 111a of the guide shaft / counter mass 111, an inch worm type contact type non-resonant ultrasonic actuator (Y driving actuator) 145 is provided. As the inch worm type ultrasonic actuator 145, the same one as disclosed in, for example, Japanese Patent Application No. 2002-036147 can be used in the same manner as described above. By driving the ultrasonic actuator 145, the blind plate drive slider 141 slides in the Y and Y ′ directions along the groove 111 a of the guide shaft and counter mass 111.
[0030]
As will be described later, since the blind plates 160 and 161 are lightweight, the driving thrust may be small, and the positioning accuracy may be relatively loose (for example, about ± 1 μm). Therefore, an ultrasonic actuator 145 of this type which generates a small amount of heat and can be integrated with the guide shaft and counter mass 111 is optimal. However, since the ultrasonic actuator basically uses the resonance mode, there is a possibility that vibration disturbance will occur. Therefore, a non-resonant type (that does not use resonance) is used as in the present embodiment. Further, it is more preferable to use a vacuum-compatible type such as low degassing which has recently been studied.
[0031]
Although not shown, the other guide shaft / counter mass 113 is also provided with a groove, a blind plate driving slider, and an ultrasonic actuator. These are provided symmetrically with respect to the guide axis and counter mass 111 with respect to the base center point with a base center line C (see FIG. 1) passing through the center of the base 101 interposed therebetween.
[0032]
As shown in FIGS. 2, 4 and 5, the blind plate driving slider 141 is integrally formed with a frame-shaped arm receiving portion 151. The base 153 a of the arm 153 that supports the L-shaped blind plate 160 is housed in the arm housing 151. At the lower end of the base 153a of the arm 153, a retaining flange 153f (see FIG. 4) is provided.
[0033]
A linear guide 155 is provided on each of both sides in the X-axis direction on the inner surface of the arm accommodating portion 151 of the blind plate drive slider 141, and an inch worm-type contact-type non-resonant ultrasonic actuator (Z A driving actuator 156 is provided. The ultrasonic actuator 156 is of an inchworm type similar to the ultrasonic actuator 145 described above. When the ultrasonic actuator 156 operates, the base 153a of the arm 153 is driven in the Z-axis direction while being guided by the linear guide 155 (see FIGS. 3 and 5). Thus, the L-shaped blind plate 160 can move in the Z and Z 'directions while being supported by the linear guide 155.
[0034]
Although not shown, an arm, a linear slider, and an ultrasonic actuator are similarly provided on the blind plate drive slider of the other guide shaft / counter mass 113.
[0035]
The L-shaped blind plate 160 (161) is attached to the upper end of the arm 153 so as to spread on the XY plane. As shown in FIG. 1, the L-shaped blind plate 160 on the guide shaft 111 side and the L-shaped blind plate 161 on the guide shaft 113 side are opposed to each other so that a rectangular area can be formed inside both. Have been. Then, an exposure area is formed inside the pair of L-shaped blind plates 160 and 161.
[0036]
Next, the operation of the above-described movable blind device will be described.
FIG. 7A is a diagram showing a reticle carrying state of the exposure apparatus according to the present embodiment, and FIG. 7B is a schematic diagram showing a reticle carrying robot arm and a reticle thereon.
FIG. 8 is a diagram in which the reticle stage and the robot arm are removed from the state of FIG.
FIG. 9A is a diagram showing a state in which the blind plate of the movable blind device has moved in the Y ′ direction during the exposure of the exposure device, and FIG. 9B is a state in which the edge in the Y direction is set by the blind plate. FIG. 4 is a schematic diagram showing a relationship between an exposure area and an illumination beam in FIG.
FIG. 10A is a view showing a state in which the blind plate of the movable blind device has moved in the Y direction during exposure by the exposure device, and FIG. FIG. 3 is a schematic diagram showing a relationship between an exposure area and an illumination beam in a state.
[0037]
First, as a previous step, an exposure field width is determined according to the size of an exposure area of a reticle used for exposure. At this time, the movable blind device 100 drives the X drive actuators 131A, 131B, 133A, and 133B to move the guide shaft / counter masses 111 and 113 independently, and moves the L-shaped blind plates 160 and 161 to the X direction. Position it in the axial direction. Therefore, it is possible to cope with a case where the reticle is slightly displaced from the reticle stage, or a case where the exposure area of the reticle is off center from the center of the reticle.
[0038]
FIG. 7A illustrates the reticle stage 3 above the L-shaped blind plates 160 and 161 of the movable blind device 100 (see also FIG. 6 described above). At the center of the reticle stage 3, an electrostatic chuck 3A for holding the reticle is provided. As shown in FIG. 7B, the reticle 2 is placed on the forked end of the robot arm 95, and is placed between the reticle stage 3 and the L-shaped blind plates 160 and 161 (the gap t in FIG. 6). ), And is attracted and held on the lower surface side of the electrostatic chuck 3A. After the completion of the suction holding of the reticle 2, the robot arm 95 is retracted.
[0039]
During the reticle conveyance, the movable blind device 100 drives the ultrasonic actuator (Z-drive actuator) 156 of the blind plate drive slider 141 to lower the arm 153 supporting the L-shaped blind plates 160 and 161. Side (Z ′ direction) (see FIGS. 7A and 8). Then, a gap t is secured between the lower surface of the electrostatic chuck 3A of the reticle stage 3 and the upper surfaces of the L-shaped blind plates 160 and 161 (see FIG. 6). As described above, the gap t is a space for carrying the reticle 2 and the robot arm 95. After the reticle 2 is attracted to the lower surface of the electrostatic chuck 3A, the arm 153 is raised upward (Z direction) until the gap t becomes about 1 mm (see FIG. 8A to FIG. 9A).
[0040]
Next, alignment of the reticle 2 is performed. At the time of this alignment, the X drive is performed so that an alignment mark on the base 101 (not shown: provided on the side of the exposure area F shown in FIG. 9B in the XX ′ direction) can be detected. The actuators 131A, 131B, 133A, and 133B are driven to move the L-shaped blind plates 160 and 161 independently in the X and X 'directions.
[0041]
Here, as shown in FIG. 9 (B) or FIG. 10 (B), an X-arm part 160X of the L-shaped blind 160 along the X-axis direction and an X-arm part of the L-shaped blind 161 along the X-axis direction 161X are parallel to each other, and the Y-arm 160Y of the L-shaped blind 160 along the Y-axis direction and the Y-arm 161Y of the L-shaped blind 161 along the Y-axis are parallel to each other. Then, a rectangular region is formed by both arms 160X and 160Y of the L-shaped blind plate 160 and both arms 161X and 161Y of the L-shaped blind plate 161, and an exposure region is formed in the rectangular region. F is set.
[0042]
After the alignment is completed, the L-shaped blind plates 160 and 161 are moved in the X and X 'directions by the X drive actuators 131A, 131B, 133A and 133B, and as shown in FIG. Is set in the X direction. At the same time, the ultrasonic actuator (actuator for Y driving) 145 of the guide shaft / counter masses 111 and 113 is driven so that the edge of the exposure region F in the Y direction (symbol FY) is moved to the X arm of the L-shaped blind plate 161. The inner edge 161α of the portion 161X is made to coincide.
[0043]
Then, after the Y-direction edge FY of the exposure region F and the inner edge 161α of the X arm portion 161X of the L-shaped blind plate 161 have been matched, exposure is started. That is, as shown in FIG. 9 (B), a pair of L-shaped blind plates 160 and 161 of the movable blind device 100 are used for an illumination beam B1 (see a dotted line) formed into an arc shape by a fixed blind (not shown). The reticle 2 on the reticle stage 3 is scanned from the Y direction to the Y ′ direction. At this time, in the movable blind device 100, the ultrasonic actuator (Y driving actuator) 145 of the guide shaft / counter masses 111 and 113 is driven to slide the blind plate driving slider 141 in the Y and Y 'directions, and thereby the L The character-shaped blind plates 160 and 161 are moved (see FIG. 9A). The position of the illumination beam B1 does not change with respect to the optical system.
[0044]
At this time, as shown in FIG. 9B, the exposure area by the illumination beam B1 which is first irradiated is in the X-axis direction by the inner edges of the X arms 160X and 161X of both the L-shaped blind plates 160 and 161. Both ends are limited, and the Y-direction edge is limited by the inner edge 161α of the X arm portion 161X of the L-shaped blind plate 161. Then, when the illumination beam reaches from B1 to B2, both ends in the X-axis direction are limited in the exposure region F by the inner edges of the X arms 160X and 161X of both the L-shaped blind plates 160 and 161. Therefore, it is possible to prevent the illumination beams B1 and B2 from hitting outside the exposure region F, and to prevent the exposure light irrelevant to the pattern transfer from being reflected in the wafer direction.
[0045]
Next, as shown in FIG. 10B, both the L-shaped blind plates 160 and 161 are moved in the Y direction, and the edge of the exposure region F in the Y ′ direction (reference numeral FY ′) is moved to the L-shaped blind plate 160. Of the X arm 160X. During this time, in the exposure region F, both ends in the X-axis direction are limited by the inner edges of the X-arm portions 160X and 161X of both the L-shaped blind plates 160 and 161. When the scanning further proceeds and the illumination beam reaches B2 → B3, the edge FY ′ in the Y ′ direction of the exposure region F and the inner edge 160α of the X arm portion 160X of the L-shaped blind plate 160 have already been formed. Since they coincide with each other, the exposure area by the illumination beam B3 is restricted at both ends in the X-axis direction by the inner edges of the X arm portions 160X and 161X of both the L-shaped blind plates 160 and 161. The edge in the Y ′ direction is limited by the inner edge 161α of the X arm 161X. Also at this time, it is possible to prevent the illumination beams B2 and B3 from hitting outside the exposure area F, and to prevent the exposure light irrelevant to the pattern transfer from being reflected in the wafer direction.
[0046]
During such scan exposure, the blind plate drive slider 141 to which the arm 153 supporting the L-shaped blind plates 160 and 161 is attached slides along the counter mass and guide shaft 111 (113) (FIG. 9A ) And FIG. 10 (A)). At this time, as clearly shown in FIG. 3, the counter mass and guide shaft 111 (113) is supported by the guide frames 121A and 121B (123A and 123B), and slides in the sliding direction (Y direction or Y direction) of the blind plate driving slider 141. ′ Direction) in the opposite direction (Y ′ direction or Y direction).
[0047]
By the movement of the counter mass and guide shaft 111 (113), the reaction force generated by the movement of the blind plate drive slider 141 can be canceled. Therefore, even if the L-shaped blind plates 160 and 161 are driven in the scanning direction during the scanning exposure, it is possible to prevent the reticle stage 3 from being vibrated, and to suppress a decrease in pattern transfer accuracy.
[0048]
【The invention's effect】
As is apparent from the above description, according to the present invention, it is possible to provide an exposure apparatus and an exposure method capable of realizing highly accurate exposure light beam shaping.
[Brief description of the drawings]
FIG. 1 is a perspective view showing a configuration of a movable blind device according to the present embodiment.
FIG. 2 is an XY plan view schematically showing a configuration of a blind plate driving unit of the movable blind device.
FIG. 3 is a side view schematically showing a configuration of a blind plate driving unit of the movable blind device, viewed from a YZ plane.
FIG. 4 is an enlarged view (an enlarged view of a portion A in FIG. 1) showing a configuration near an X drive actuator of the blind plate drive unit.
FIG. 5 is a diagram schematically showing a configuration near an arm of the blind plate driving unit. (A) is a side view seen from the YZ plane, (B) is a perspective view.
FIG. 6 is a schematic side view showing a positional relationship among a support structure, a reticle stage, and a movable blind device in the exposure apparatus according to the present invention.
FIG. 7A is a diagram showing a reticle carrying state of the exposure apparatus according to the present embodiment, and FIG. 7B is a schematic diagram showing a reticle carrying robot arm and a reticle thereon; is there.
FIG. 8 is a diagram in which a reticle stage and a robot arm are removed from the state of FIG. 7A.
FIG. 9A is a diagram showing a state in which the blind plate of the movable blind device has moved in the Y ′ direction during the exposure of the exposure device, and FIG. FIG. 4 is a schematic diagram illustrating a relationship between an exposure area and an illumination beam in an edge setting state.
FIG. 10A is a diagram showing a state in which the blind plate of the movable blind device has moved in the Y direction during exposure by the exposure device, and FIG. 10B is a diagram showing Y 'by the blind plate; It is a schematic diagram which shows the relationship between an exposure area and an illumination beam in the direction edge setting state.
FIG. 11 is a view showing a schematic configuration of an example of an EUVL exposure apparatus (four-projection system).
[Explanation of symbols]
BD Body IL Lighting system
2 reticle 3 reticle stage
10 Wafer 11 Wafer stage
90 air mount
100 Movable blind device 101 Base
111, 113 Guide shaft and counter mass
121A, 121B, 123A, 123B Guide frame
125a, 125b, 126a, 126b protrusion
131A, 131B, 133A, 133B X drive actuator
135 Linear guide 136 Ultrasonic actuator
141 Blind plate drive slider
145 Ultrasonic actuator (Y drive actuator)
153 Arm 155 Linear guide
156 Ultrasonic actuator (Z drive actuator)
160, 161 L-shaped blind board
B1 to B3 Illumination beam F Exposure area

Claims (7)

An exposure apparatus for transferring a pattern formed on an original to a sensitive substrate,
Limiting the exposure area of the original, comprising a movable blind disposed near the original,
The movable blind is
A pair of L-shaped blind plates cooperating to form a rectangular opening;
Blind plate driving means for driving each of the blind plates independently to change the size and / or position of the opening;
An exposure apparatus comprising: The exposure apparatus scans and exposes the original in a certain direction (Y direction).
The pair of blind plates,
In the direction orthogonal to the Y direction (X direction), both blind plates move relatively to change the width of the opening to set the edge of the exposure area,
2. The exposure apparatus according to claim 1, wherein in the Y direction, both blind plates move synchronously to set an edge of the exposure area. 3. 3. The exposure apparatus according to claim 2, wherein the pair of blind plates also move in a vertical direction (Z direction) with respect to a plane formed in the XY directions when the original is replaced by the exposure apparatus. 4. The exposure apparatus according to claim 1, wherein the original stage is disposed on a body of the exposure apparatus via a vibration isolation unit. The exposure apparatus according to claim 1, further comprising a counter mass mechanism configured to process a driving reaction force of the blind plate in a Y direction. The blind plate driving means,
A guide bar extending in the longitudinal direction;
A slider that is moved and positioned along the guide bar;
An inch-worm-type actuator for driving the slider;
The exposure apparatus according to any one of claims 1 to 5, further comprising: An exposure method for transferring a pattern formed on an original to a sensitive substrate,
An exposure method, wherein a pair of L-shaped blind plates forming a rectangular opening in cooperation with each other are independently driven in the vicinity of the master, and the blind plate limits an exposure area of the master. .

Images