JPH08222789A - Fine beam forming equipment and forming method of fine beam - Google Patents

Abstract

PURPOSE: To provide a continuous and stable fine beam by a method wherein a beam position information necessary for moving a pin hole to the most suitable position is made detectable, when large fluctuation, large deviation, etc., are generated in the relative positions of an incident beam and the pin hole, and the pin hole is moved to the most suitable position by using information at a pin hole position. CONSTITUTION: An aluminum electrode 1 is formed on a silicon substrate 1. Terminals 2 are arranged outside the electrode 1, and a pin hole 4 is formed at the center. A slightly moving mechanism of position is shown by 5, an ammeter is shown by 6, and a computer is shown by 7. By using them, current value is measured from each of the terminals, and the distribution of position intensity of a beam by the center position of the pin hole can be obtained.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a microbeam producing apparatus and a production method having a function of detecting an incident beam position in a pinhole for obtaining a microbeam.

[0002]

2. Description of the Related Art As one of methods for producing a minute beam as a probe necessary for analyzing a minute region, there is a method for forming a minute beam by using only an incident beam which has passed through a pinhole. However, in the conventional technology, the pinhole has only the function of making the beam smaller, and a beam detection device is required behind the pinhole to confirm that the beam passes through the pinhole. It was Further, in order to detect the relative position of the pinhole with respect to the incident beam, the pinhole is scanned in the area where the beam is present, and the shape of the beam is detected by detecting the signal with the detection device, and then the inspection is performed. However, there is no real-time detection method that is necessary when the position of the incident beam changes due to fluctuations.

[0003]

DISCLOSURE OF THE INVENTION The present invention has been proposed in order to improve the above-mentioned drawbacks, and its purpose is to provide a pin when a large swing or a large deviation occurs in the relative position between the incident beam and the pinhole. Solved the problem that the beam position information necessary to move the hole to the optimum position could not be detected, and further improved the point that a detection device behind the beam was required, and used the information at the pinhole position to identify the pinhole. It is to provide a continuous and stable minute beam by moving it to the optimum position.

[0004]

In order to achieve the above-mentioned object, the present invention provides a microbeam producing apparatus having a pinhole and a plurality of electrodes formed surrounding the pinhole and electrically insulated from each other. It is a feature of the invention.
Further, the present invention is characterized by a microbeam producing apparatus having a pinhole and a plurality of regions formed of a conductive material containing different materials and surrounding the pinhole. Further, according to the present invention, a beam is incident on a pinhole, currents from a plurality of electrodes which are formed to surround the pinhole and are insulated from each other are detected, and the pinhole and the incident light are detected based on the detected current value. A feature of the invention is a method for producing a minute beam in which a relative position with respect to a beam is changed. Further, according to the present invention, a beam is incident on a pinhole, and electrons generated from an electrode having a plurality of regions formed of a conductive substance containing different materials are formed so as to surround the pinhole, and based on the detection result, The present invention is characterized by a method for producing a minute beam in which the relative position between the pinhole and the incident beam is changed. SUMMARY OF THE INVENTION It is an object of the present invention to provide the pinhole itself with an incident beam intensity distribution and a position detection function in order to improve the above-mentioned conventional drawbacks. In order to achieve such an object, a metal electrode is formed on the pinhole itself.

[0005]

[Operation] The position and distribution of the incident beam are measured by detecting, with an ammeter or an electron analyzer, the photocurrent induced in the electrode unit by the irradiation of the incident beam with the electrode unit or the electrons emitted from the electrode unit, respectively. You can As a result, it is not necessary to provide a detector after the pinhole, and the device configuration becomes simpler than the conventional one. Further, even when the fluctuation is large and the beam does not reach the rear, the optimum position of the pinhole can be obtained.

[0006]

EXAMPLES Next, examples of the present invention will be described. In order to specifically describe the device of the present invention, a case where a synchrotron radiation beam is used as an incident beam will be described.

(Example 1) As a microbeam producing apparatus,
A case will be described in which a pinhole formed with a plurality of electrodes is used to measure a current or emitted electrons from the electrodes. FIG. 1 shows a pinhole in which electrodes with four terminals are formed. In the figure, 1 is an electrode, 2 is a terminal, and 3 is a pinhole. When a minute beam is produced by a pinhole, light that does not pass hits the electrode, emits photoelectrons, and at the same time, a photocurrent flows to the terminal.

Next, a method of measuring the position of the emitted light beam by the photocurrent according to the present invention will be described. The configuration is shown in FIG. In the figure, 1 is an electrode, 2 is a terminal, 3 is a pinhole, 4 is a synchrotron radiation beam, 5 is a position fine movement mechanism, 6 is an ammeter, and 7 is a calculator. Here, the substrate material is silicon,
The electrode 1 is aluminum and the electrode 2 is solder. Further, this component is formed by forming a hole having a diameter of 25 μm on a silicon substrate and vapor-depositing aluminum on the hole to form an electrode. By using these, the current value from each terminal can be measured and the position and distribution of the beam can be obtained. Then, based on this data, it will be controlled by an electronic computer and the pinhole position will be aligned with the beam position. With this method, the pinhole can be moved to the optimum position. Here, in order to confirm the possibility of current detection by pinholes, photocurrent was measured using synchrotron radiation.

FIG. 3 is a graph showing the pinhole position dependence of the photocurrent generated by a radiation beam having a diameter of about 1 mm measured using a pinhole of a = b = 8 mm square. The polygonal line 9 is a photocurrent from the electrode above the polygonal line 8 and the polygonal line 9 is from the electrode below. It can be seen that the intensity changes as the beam moves away from the pinhole. This is because the shape of the electrodes is triangular. The reason why the curve has a negative slope and a positive curvature at both ends of the profile is that the emitted light beam has an intensity distribution that is larger at the center and smaller at the edges. It was shown that the intensity distribution and position of the incident beam can be obtained by this. Although the silicon substrate provided with the oxide film and the aluminum electrode are used in this embodiment, the beam position detecting pinhole substrate may be made of any material as long as it is smooth and has insulating properties. The electrodes are not limited to aluminum, but all conductive materials have the same effect. Further, the electrodes do not have to be made of the same material, and different electrodes can use different conductive materials.

(Embodiment 2) FIG. 4 is a view for explaining a second embodiment of the present invention. In the drawing, 1 is an electrode, 3 is a pinhole, 4 is a radiant light beam, and 5 is a position fine movement mechanism. , 7 is a calculator, 10 is a spectrum analyzer, and 11 is an electronic analyzer. In Example 1, all the electrode material elements may be the same, but in this Example 2, different elements must be used for each electrode in order to identify the electrodes. In this example, gold and platinum were used as electrode materials. The position of the beam position detection pinhole is moved, and the Auger electron or photoelectron spectrum of the electrode element is measured by an electronic analyzer. In this case, the peak of the element contained in the electrode is measured. The photoelectron spectrum was measured, and the peak intensity peculiar to the element contained in the electrode was plotted against the position, and the result is shown in FIG.

When this method is used, the change in the intensity of the photoelectron peak of a different element is measured for each electrode. In the second embodiment, the electron emitted from the electrode into the space is analyzed by the electronic analyzer 1.
Measure at 1. The upper and lower electrodes are distinguished by the electron kinetic energy spectrum. Therefore, it is not necessary to take out the current and measure it, so that insulation from the substrate and terminals are not required. That is, this has the effect of eliminating the need for terminals for measuring the photocurrent. Further, in this case, since it is not necessary to insulate the substrate and the electrodes, it is possible to form a larger number of electrodes around the pinhole, and finer position control is possible. Further, in this case, the electrode and the substrate may be made of any material as long as they can emit electrons.

Although circular pinhole slits are used in the first and second embodiments, similar effects can be obtained with short slits. Although synchrotron radiation was used as the excitation light source, particles (photons, X-rays, ultraviolet rays, etc.) having a higher energy than the work function of the substance, charged particles (ions, electrons, etc.), neutral particles (neutral molecules, The same effect can be obtained by using a beam of neutral atoms, neutrons, etc. Further, in the above-described Embodiment 1, an example using four electrodes has been described, but if the control is performed in only one direction, two electrodes are sufficient. Further, in the second embodiment, the case where each of the four electrodes is made of a single material is shown. However, if the material is different depending on the place, the electrodes do not need to be divided for each material, and one electrode is used. But it is enough. In the second embodiment, it is sufficient that the electrode material has conductivity, and it is needless to say that a doped semiconductor or the like can be used in addition to the metal.

[0013]

As described above, according to the present invention,
By detecting the position of the beam in the pinhole for forming a minute beam, (1) there is no need to install a dimmer after the pinhole, and (2) a large deviation that the incident beam does not pass through the pinhole. It is also possible to detect the position of the incident beam at. This simplifies the beam position control and can cope with a large deviation of the incident beam.

[Brief description of drawings]

FIG. 1 shows a pinhole with electrodes.

FIG. 2 shows a measurement system diagram using the first embodiment.

FIG. 3 shows a change in intensity of a photocurrent generated by emitted light with respect to a pinhole position.

FIG. 4 shows a measurement system diagram using the second embodiment.

FIG. 5 shows a change in photoelectron peak intensity generated by synchrotron radiation with respect to a pinhole position.

[Explanation of symbols]

 1 Electrode 2 Terminal 3 Pinhole 4 Synchrotron Radiation Beam 5 Positioning Mechanism 6 Ammeter 7 Calculator 8 Current from Upper Electrode 9 Current from Lower Electrode 10 Spectrum Analyzer 11 Electronic Analyzer 12 Au4f Inner Level Photoelectron from Upper Electrode Intensity 13 Pt4f core level light from the lower electrode

[Procedure amendment]

[Submission date] June 23, 1995

[Procedure Amendment 1]

[Document name to be amended] Statement

[Name of item to be corrected] Brief description of the drawing

[Correction method] Change

[Correction content]

[Brief description of drawings]

FIG. 1 shows a pinhole with electrodes.

FIG. 2 shows a measurement system diagram using the first embodiment.

FIG. 3 shows a change in intensity of a photocurrent generated by emitted light with respect to a pinhole position.

FIG. 4 shows a measurement system diagram using the second embodiment.

FIG. 5 shows a change in photoelectron peak intensity generated by synchrotron radiation with respect to a pinhole position.

[Explanation of symbols] 1 electrode 2 terminal 3 pinhole 4 synchrotron radiation beam 5 position fine adjustment mechanism 6 ammeter 7 calculator 8 current from upper electrode 9 current from lower electrode 10 spectrum analyzer 11 electronic analyzer 12 Au4f from upper electrode Core level photoelectron intensity 13 Pt4f core level light from lower electrode

[Procedure Amendment 2]

[Document name to be corrected] Drawing

[Name of item to be corrected] Figure 5

[Correction method] Added

[Correction content]

[Figure 5]

 ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Inventor Shoji Ojima 1-1-6 Uchisaiwai-cho, Chiyoda-ku, Tokyo Nihon Telegraph and Telephone Corporation (72) Tadashi Serikawa 1-1-6 Uchisai-cho, Chiyoda-ku, Tokyo Nippon Telegraph and Telephone Corporation

Claims (6)

[Claims] 1. A microbeam producing apparatus comprising: a pinhole; and a plurality of electrodes that surround the pinhole and are electrically insulated from each other. 2. The microbeam producing apparatus according to claim 1, further comprising means for detecting a current generated by irradiating the electrode with an incident beam. 3. A microbeam producing apparatus comprising: a pinhole and a plurality of regions formed of a conductive substance that surrounds the pinhole and contains different materials. 4. An electron detecting means for detecting electrons generated by irradiating the electrode with an incident beam, and a means for changing a relative position between the pinhole and the incident beam based on a detection result of the electron detecting means. The microbeam producing apparatus according to claim 3, further comprising: 5. A beam is incident on a pinhole, currents are detected from a plurality of electrodes which are formed surrounding the pinhole and are insulated from each other, and the pinhole and the incident are detected based on the detected current value. A method for producing a minute beam, characterized in that the relative position to the beam is changed. 6. A beam is incident on a pinhole, and electrons generated from an electrode having a plurality of regions formed of a conductive substance containing different materials and surrounding the pinhole are detected, and based on the detection result. A method for producing a minute beam, characterized in that a relative position between the pinhole and the incident beam is changed.