JPH0820431A - Pneumatic floatation type sheet conveyor system - Google Patents

Pneumatic floatation type sheet conveyor system

Info

Publication number
JPH0820431A
JPH0820431A JP15461894A JP15461894A JPH0820431A JP H0820431 A JPH0820431 A JP H0820431A JP 15461894 A JP15461894 A JP 15461894A JP 15461894 A JP15461894 A JP 15461894A JP H0820431 A JPH0820431 A JP H0820431A
Authority
JP
Japan
Prior art keywords
thin plate
air
facing surface
wafer
conveying direction
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP15461894A
Other languages
Japanese (ja)
Inventor
Takashi Kato
隆司 加藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shinmaywa Industries Ltd
Original Assignee
Shin Meiva Industry Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shin Meiva Industry Ltd filed Critical Shin Meiva Industry Ltd
Priority to JP15461894A priority Critical patent/JPH0820431A/en
Publication of JPH0820431A publication Critical patent/JPH0820431A/en
Withdrawn legal-status Critical Current

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  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)

Abstract

PURPOSE:To promote the compactification of a conveyor system as preventing the sticking any scratch and dust to a wafer in time of conveyance by forming each suction layer successively in space between an opposed surface continuing this surface in the conveying direction of a thin plate and the wafer, and making the wafer alone conveyable. CONSTITUTION:An opposed surface 11 is set up so as to be opposed to a top surface 3a of a wafer 3, and this opposed surface 11 is continuously installed in the conveying direction of the wafer 3. Six supply openings 12a, 12b, 12c, 12d, 12e and 12f are installed in the opposed surface 11 so as to make each suction layer be formed in space between this opposed surface 11 and the wafer 3 successively in the conveying direction of the wafer 3. Subsequently, these supply openings 12a, 12b, 12c, 12d, 12e and 12f are installed in a row at a shorter space than length in the conveying direction of the wafer 3.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、空気浮上式薄板搬送装
置に関し、詳しくは、薄板を非接触状態で浮上させて搬
送するものに係る。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an air levitation type thin plate conveying device, and more particularly to a device for floating and conveying thin plates in a non-contact state.

【0002】[0002]

【従来の技術】一般に、ウエハや液晶基板などの薄板を
搬送する搬送装置は、薄板に対して可及的に接触面の少
ない細帯状のベルトコンベア上に上記薄板を載置して搬
送するようにしている。
2. Description of the Related Art Generally, a transfer device for transferring a thin plate such as a wafer or a liquid crystal substrate is arranged so that the thin plate is placed on a thin belt conveyor having a contact surface with the thin plate as small as possible. I have to.

【0003】[0003]

【発明が解決しようとする課題】ところが、上記の如き
搬送装置では、薄板自体が非常にデリケートで表面積が
大きなものであるため、ベルトコンベア上に載置した薄
板の接触面に傷が付いたり、ダストが付着したりするこ
とがあった。
However, since the thin plate itself is very delicate and has a large surface area in the above-described conveying device, the contact surface of the thin plate placed on the belt conveyor may be scratched, Dust may have adhered.

【0004】そこで、上記薄板の上面に対向するよう搬
送装置のハンド部の対向面を配置すると共に、該対向面
に空気を吹出す吹出口を設け、上記薄板の上面と対向面
との間に、上記吹出口から薄板の上面に向けて吹出す空
気を層流させて負圧層を形成し、この負圧層により薄板
を対向面に対して非接触状態で浮上させるようにした,
いわゆるベルヌーイチャックなどを用いることによっ
て、薄板を対向面に非接触状態に浮上させたままでハン
ド部ごと所定位置まで搬送することが考えられる。しか
し、このものでは、ハンド部(対向面)を移動させるに
当たってアームや該アームを駆動させるアクチュエータ
などの機器が必要となり、搬送装置が大型化するという
欠点を有している。
Therefore, the facing surface of the hand portion of the conveying device is arranged so as to face the upper surface of the thin plate, and an air outlet for blowing air is provided in the facing surface, and the air outlet is provided between the upper surface and the facing surface of the thin plate. The air blown from the outlet toward the upper surface of the thin plate is laminarly formed to form a negative pressure layer, and the negative pressure layer causes the thin plate to float in a non-contact state with respect to the facing surface.
By using a so-called Bernoulli chuck or the like, it is possible to convey the thin plate together with the hand unit to a predetermined position while floating in a non-contact state on the facing surface. However, this device requires a device such as an arm and an actuator for driving the arm in order to move the hand part (opposing surface), and has a drawback that the transport device becomes large.

【0005】本発明はかかる諸点に鑑みてなされたもの
で、その目的とするところは、上記対向面を薄板の搬送
方向に連続して設けると共にその連続する対向面と薄板
との間に順次負圧層が形成されるようにして、薄板のみ
の搬送を可能とし、搬送時の薄板への傷やダストの付着
を防止しつつ、搬送装置のコンパクト化を図ることにあ
る。
The present invention has been made in view of the above points, and an object of the present invention is to provide the above-mentioned facing surface continuously in the conveying direction of the thin plate and to sequentially provide a negative electrode between the continuous facing surface and the thin plate. The pressure layer is formed so that only the thin plate can be conveyed, and scratches and adhesion of dust to the thin plate at the time of conveyance can be prevented, and the conveying device can be made compact.

【0006】[0006]

【課題を解決するための手段】上記目的を達成するた
め、請求項1記載の発明が講じた解決手段は、空気浮上
式薄板搬送装置として、薄板の上面に対向するよう対向
面が配置され、該対向面には空気を吹出す複数の吹出口
が設けられ、上記薄板の上面と対向面との間に、上記吹
出口から薄板の上面に向けて吹出す空気を層流させて負
圧層が形成され、この負圧層により上記薄板を対向面に
対して非接触状態で浮上させて所定位置まで搬送するよ
うにする。そして、上記対向面を、上記薄板の搬送方向
に連続して設け、上記吹出口を、上記薄板の搬送方向に
連続する対向面と薄板との間に薄板の搬送方向に順次負
圧層が形成されるよう,上記対向面に薄板の搬送方向の
長さよりも短い間隔でその搬送方向に並べて設ける構成
としたものである。
Means for Solving the Problems In order to achieve the above-mentioned object, a means for solving the problems according to the invention of claim 1 is an air levitation type thin plate conveying device, in which a facing surface is arranged so as to face the upper surface of the thin plate, A plurality of air outlets for blowing air are provided on the facing surface, and the air blown from the air outlet toward the upper surface of the thin plate is laminarly flowed between the upper surface of the thin plate and the facing surface to form a negative pressure layer. The negative pressure layer causes the thin plate to float on the facing surface in a non-contact state and be conveyed to a predetermined position. Further, the facing surface is continuously provided in the transport direction of the thin plate, and the air outlet is sequentially formed in the transport direction of the thin plate between the facing surface and the thin plate continuous in the transport direction of the thin plate. As described above, the thin plates are arranged side by side in the conveying direction at intervals shorter than the length of the thin plates in the conveying direction.

【0007】請求項2記載の発明が講じた解決手段は、
請求項1記載の発明の構成要件に加えて、薄板の搬送方
向と直交する左右両側部にそれぞれ対応する対向面の対
応位置に、薄板の搬送を案内する案内部を薄板の搬送方
向に延ばして設ける構成としたものである。
[0007] The solving means taken by the invention of claim 2 is,
In addition to the constituent features of the invention according to claim 1, a guide portion for guiding the conveyance of the thin plate is extended in the conveyance direction of the thin plate at a corresponding position of the facing surface corresponding to both left and right sides orthogonal to the conveyance direction of the thin plate. It is configured to be provided.

【0008】請求項3記載の発明が講じた解決手段は、
請求項1記載の発明の対向面を特定し、少なくとも搬送
開始位置では、搬送方向に行くに従い下方に位置する傾
斜面に形成する構成としたものである。
[0008] The solution means taken by the invention of claim 3 is,
According to the first aspect of the present invention, the facing surface is specified, and at least at the transport start position, it is formed as an inclined surface located downward in the transport direction.

【0009】請求項4記載の発明が講じた解決手段は、
請求項1記載の発明の構成要件に加えて、複数の吹出口
にそれぞれ吹出通路の下流端を開口させるとともに、該
吹出通路を、各吹出口から薄板の搬送方向向きに空気を
吹出すよう,薄板の搬送方向に対して上流側が後方に傾
斜した状態で設ける構成としたものである。
[0009] The solution means taken by the invention of claim 4 is,
In addition to the constituent features of the invention according to claim 1, a plurality of outlets are provided to open the downstream ends of the outlet passages, and air is blown out from the outlets in the sheet conveying direction, The configuration is provided such that the upstream side is inclined rearward with respect to the transport direction of the thin plate.

【0010】請求項5記載の発明が講じた解決手段は、
請求項1記載の発明の構成要件に加えて、薄板の搬送方
向で相隣る吹出口の間に、その下方に薄板があることを
検知する検知手段を設ける。そして、上記検知手段によ
り検知した薄板近傍の吹出口からのみ空気の吹出しを行
う制御手段を備える構成としたものである。
The means for solving the problems according to the invention of claim 5 is as follows.
In addition to the constituent features of the first aspect of the present invention, a detection means for detecting the presence of a thin plate below the outlets is provided between adjacent outlets in the sheet conveying direction. Further, the control means is provided to blow out the air only from the air outlet near the thin plate detected by the detecting means.

【0011】[0011]

【作用】上記の構成により、請求項1記載の発明では、
薄板の上面に向けて空気を吹出して薄板の上面と対向面
との間に負圧層を形成する複数の吹出口が、対向面が連
続する薄板の搬送方向に並べて設けられているので、薄
板を搬送方向へ力を加えて移動させると、上記吹出口に
対して薄板の搬送方向に相隣る吹出口から吹出す空気
が、搬送方向に移動した薄板の上面と対向面との間で層
流されて負圧層が形成され、さらに搬送方向に移動した
薄板の上面と対向面との間で次に相隣る吹出口から吹出
す空気が層流されて負圧層が薄板の搬送方向に順次形成
され、薄板自身を対向面に対して非接触状態で浮上させ
たままで搬送される。これによって、薄板のみが対向面
に対して非接触状態で搬送され、薄板に傷が付いたり、
ダストが付着したりすることはない。しかも、薄板をハ
ンド部の対向面に非接触状態でハンド部ごと搬送する場
合に必要なアームや該アームを駆動させるアクチュエー
タなどの機器が不要となり、搬送装置がコンパクトなも
のとなる。
According to the above-mentioned structure, according to the first aspect of the present invention,
Since a plurality of air outlets that blow air toward the upper surface of the thin plate to form a negative pressure layer between the upper surface of the thin plate and the facing surface are provided side by side in the conveying direction of the thin plate with the facing surface continuous, When a force is applied to move the sheet in the conveying direction, the air blown out from the air outlet adjacent to the outlet in the sheet conveying direction causes the layer to move between the upper surface and the facing surface of the sheet moved in the conveying direction. The negative pressure layer is formed by flowing the negative pressure layer, and the air blown from the next adjacent outlet between the upper surface and the facing surface of the thin plate that has moved in the transport direction is laminarly flown so that the negative pressure layer is in the transport direction of the thin plate. Are sequentially formed, and the thin plate itself is conveyed while being floated on the facing surface in a non-contact state. As a result, only the thin plate is conveyed in a non-contact state against the facing surface, and the thin plate may be damaged,
No dust is attached. In addition, a device such as an arm and an actuator for driving the arm, which is necessary when the thin plate is conveyed together with the facing surface of the hand part in a non-contact state, is unnecessary, and the transfer device becomes compact.

【0012】また、上記複数の吹出口は、薄板の搬送方
向の長さよりも短い間隔で対向面の搬送方向に並べて設
けられているので、薄板の搬送方向で互いに隣合う搬送
方向側の吹出口から吹出す空気により薄板の上面と対向
面との間に負圧層が形成されるまでの間、反搬送方向側
の吹出口から吹出す空気による負圧層によって薄板が確
実に浮上支持され、薄板の搬送方向に連続する対向面に
対する薄板の搬送が円滑に行われる。
Further, since the plurality of outlets are arranged side by side in the conveying direction of the facing surface at intervals shorter than the length of the thin plate in the conveying direction, the outlets on the conveying direction side adjacent to each other in the conveying direction of the thin plates. Until the negative pressure layer is formed between the upper surface and the facing surface of the thin plate by the air blown out from the thin plate, the thin plate is reliably levitationally supported by the negative pressure layer formed by the air blown from the air outlet on the side opposite to the conveyance direction. The thin plate is smoothly conveyed to the facing surface that is continuous in the conveying direction of the thin plate.

【0013】請求項2記載の発明では、薄板は、その搬
送方向と直交する左右両側部に対応する対向面の対応位
置に設けた案内部により、搬送方向から外れることなく
円滑に所定位置まで案内される。
According to the second aspect of the present invention, the thin plate is smoothly guided to a predetermined position without being displaced from the conveying direction by the guide portions provided at the corresponding positions of the facing surfaces corresponding to the left and right sides orthogonal to the conveying direction. To be done.

【0014】請求項3記載の発明では、少なくとも搬送
開始位置の対向面が搬送方向に行くに従い下方に位置す
る傾斜面に形成されているので、薄板の重力方向に作用
する重力モーメントにより薄板に搬送方向への力が作用
することになり、薄板に搬送方向への力を加えることな
く該薄板が搬送され、薄板に搬送方向への搬送力を付与
するアクチュエータなどの装置を別途に設ける必要はな
い。
According to the third aspect of the present invention, at least the facing surface of the carrying start position is formed as an inclined surface located downward as it goes in the carrying direction. Therefore, the sheet is carried to the thin plate by the gravity moment acting in the gravity direction of the thin plate. Since a force acts in the direction, the thin plate is conveyed without applying a force in the conveying direction to the thin plate, and it is not necessary to separately provide a device such as an actuator that applies a conveying force to the thin plate in the conveying direction. .

【0015】請求項4記載の発明では、複数の吹出口に
それぞれ下流端が開口する吹出通路は、薄板の搬送方向
に対して上流側が後方に傾斜した状態で設けられている
ので、薄板の上面と対向面との間で層流される空気が搬
送方向向きに積極的に流れて搬送方向向きの流れが付与
されることになり、この空気により形成された負圧層に
よって薄板に搬送方向への力を加えることなく該薄板が
搬送され、薄板に搬送力を付与するアクチュエータなど
の装置が同様に不要となる。
According to the fourth aspect of the present invention, the blowout passages each having a downstream end open to the plurality of blowout openings are provided in a state where the upstream side is inclined rearward with respect to the conveying direction of the thin plate. The air laminarly flowing between the air bearing surface and the facing surface positively flows in the transport direction to give a flow in the transport direction, and the negative pressure layer formed by this air causes the thin plate to move in the transport direction. The thin plate is conveyed without applying force, and a device such as an actuator that applies a conveying force to the thin plate is also unnecessary.

【0016】さらに、請求項5記載の発明では、搬送方
向に互いに相隣る吹出口の間に設けた検知手段により薄
板が下方にあることを検知して、薄板近傍の吹出口のみ
から空気が吹出されるので、薄板の搬送に無関係な吹出
口からの不要な空気の吹出しが防止されて、空気の無駄
使いが防止されるとともに、薄板と対向面との間つまり
搬送系路上での層流の乱れが防止される。
Further, in the invention according to claim 5, the detection means provided between the air outlets adjacent to each other in the conveying direction detects that the thin plate is below, and the air is emitted only from the air outlets near the thin plate. Since it is blown out, unnecessary air is prevented from being blown out from the air outlet that is unrelated to the transport of the thin plate, waste of air is prevented, and laminar flow between the thin plate and the facing surface, that is, on the transport system path. Disorder is prevented.

【0017】[0017]

【実施例】以下、本発明の実施例を図面に基づいて説明
する。
Embodiments of the present invention will be described below with reference to the drawings.

【0018】図1および図2は本発明の第1実施例に係
る空気浮上式薄板搬送装置を示し、この空気浮上式薄板
搬送装置1は、クリーンルーム2内に設置されている。
上記空気浮上式薄板搬送装置1は、集積回路の基板とな
るシリコン製のウエハ3(薄板)をクリーンルーム2内
で搬送するよう搬送開始位置から終端位置まで延びて設
けられている。
1 and 2 show an air-floating thin plate carrier according to a first embodiment of the present invention. This air-floating thin plate carrier 1 is installed in a clean room 2.
The air floating type thin plate transfer device 1 is provided so as to extend from a transfer start position to an end position so as to transfer a silicon wafer 3 (thin plate) which is a substrate of an integrated circuit in the clean room 2.

【0019】上記空気浮上式薄板搬送装置1は、ウエハ
3の上面3aに対向する対向面11を下面側に備え、該
対向面11に、幅方向略中央部に凹設された,空気を吹
出すための略円形状の吹出口12を開口させている。該
吹出口12は、ウエハ搬送開始位置の第1吹出口12a
から第2吹出口12b,第3吹出口12c,第4吹出口
12d,第5吹出口12e,第6吹出口12f,…の順
に終端位置まで一列に並べて設けられている。また、上
記空気浮上式薄板搬送装置1の内部には、ウエハ3の搬
送方向へ延びるクリーンエア通路(図示せず)が設けら
れている。上記各吹出口12a,…には、上記クリーン
エア通路より各吹出口12a,…に向けて鉛直方向に個
別に延びる第1吹出通路13a,第2吹出通路13b,
第3吹出通路13c,第4吹出通路13d,第5吹出通
路13e,第6吹出通路13f,…の下流端が連結され
ており、クリーンエア通路からのクリーンエア(図に示
す矢印)が各吹出通路13a,…を介して吹出口12
a,…にそれぞれ個別に送給されるようになっている。
この場合、各吹出口12a,…からのクリーンエアの単
位時間当たりの送給量は、いずれの吹出口12a,…に
おいても均一となるように設定されている。
The air levitation type thin plate carrier 1 is provided with a facing surface 11 facing the upper surface 3a of the wafer 3 on the lower surface side, and the facing surface 11 is provided with a recessed portion in a substantially central portion in the width direction to blow air. A substantially circular outlet 12 for opening is opened. The outlet 12 is the first outlet 12a at the wafer transfer start position.
To the second outlet 12b, the third outlet 12c, the fourth outlet 12d, the fifth outlet 12e, the sixth outlet 12f, ... A clean air passage (not shown) extending in the transfer direction of the wafer 3 is provided inside the air floating thin plate transfer device 1. The first outlet passages 13a, the second outlet passages 13b, which individually extend in the vertical direction from the clean air passages to the respective outlets 12a, ...
The downstream ends of the third outlet passage 13c, the fourth outlet passage 13d, the fifth outlet passage 13e, the sixth outlet passage 13f, ... Are connected, and the clean air (the arrow shown in the figure) from the clean air passage is blown out from each outlet. The air outlet 12 through the passages 13a, ...
are individually sent to a, ....
In this case, the amount of clean air delivered from each of the outlets 12a, ... Is set to be uniform at any of the outlets 12a ,.

【0020】上記ウエハ3の上面3aには、搬送開始位
置に位置する3つの第1〜第3吹出口12a〜12cが
それぞれ対応しており、該各吹出口12a〜12cから
は、搬送開始位置において対向面11に対向するように
持上げ手段(図示せず)により持上げられたウエハ3の
上面3aに向けてクリーンエアがそれぞれ吹出され、こ
のクリーンエアをウエハ3の上面3aと対向面11との
間に秒速約1m弱の風速で層流させて、該ウエハ3の上
面3aと対向面11との間に負圧層を形成し、この負圧
層により上記ウエハ3を対向面11に対して、約0.1
mm〜0.2mm程度の間隙を存した非接触状態で浮上
させて搬送開始位置から終端位置まで搬送するようにし
ている。
The first to third outlets 12a to 12c located at the transfer start position correspond to the upper surface 3a of the wafer 3, and the transfer start position is reached from each of the outlets 12a to 12c. In the above, clean air is blown toward the upper surface 3a of the wafer 3 lifted by a lifting means (not shown) so as to face the facing surface 11, and the clean air is transferred between the upper surface 3a of the wafer 3 and the facing surface 11. A negative pressure layer is formed between the upper surface 3a of the wafer 3 and the facing surface 11 by causing a laminar flow at a wind speed of about 1 m / s or less, and the negative pressure layer causes the wafer 3 to face the facing surface 11. , About 0.1
It is floated in a non-contact state with a gap of about mm to 0.2 mm and conveyed from the conveyance start position to the end position.

【0021】そして、上記対向面11は、ウエハ3の搬
送開始位置から終端位置まで連続的に延びる水平面に形
成されている。また、上記各吹出口12a,12b,1
2c,…は、上記ウエハ3の搬送開始位置から終端位置
まで連続する対向面11にウエハ3の搬送方向の長さ
(例えば200mm)よりも短い間隔(例えば70m
m)でその搬送方向に一列に並べて設けられていて、ウ
エハ3の搬送方向に連続する対向面11とウエハ3との
間にウエハ3が搬送方向に移動する度に順次負圧層が形
成されるようにしている。
The facing surface 11 is formed in a horizontal plane which continuously extends from the transfer start position to the end position of the wafer 3. In addition, the outlets 12a, 12b, 1
2c, ... Are spaced from each other by a distance (for example, 70 m) shorter than the length (for example, 200 mm) in the transfer direction of the wafer 3 on the facing surface 11 that is continuous from the transfer start position to the end position of the wafer 3.
m), the negative pressure layers are sequentially formed between the opposing surface 11 of the wafer 3 and the wafer 3 which are arranged in a line in the carrying direction and are continuous in the carrying direction, each time the wafer 3 moves in the carrying direction. I am trying to do it.

【0022】また、上記ウエハ3の搬送方向と直交する
左右両側部に対応する対向面11の対応位置たる左右両
側端部には、ウエハ3の搬送を案内する案内部21,2
1が下方に突出して一体的に設けられている。該各案内
部21は、それぞれウエハ3の搬送方向に向かって連続
的に延びて設けられている。さらに、上記対向面11の
搬送開始位置には、ウエハ3に搬送方向への搬送力を付
与する搬送力付与手段22が設けられている。該搬送力
付与手段22は、空気浮上式薄板搬送装置1の搬送方向
始端部に設けられ、ウエハ3の搬送方向に出没自在なロ
ッド23を有するアクチュエータ24と、そのロッド2
3の先端に基端(上端)が固着され、搬送開始位置にあ
るウエハ3よりも反搬送方向側に開口する孔部25を介
して対向面11よりも下方に先端(下端)が突出するア
ーム26とを備えてなる。
Guide portions 21, 2 for guiding the transfer of the wafer 3 are provided at both left and right ends of the facing surface 11 corresponding to the left and right sides of the wafer 3 which are orthogonal to the transfer direction.
1 projects downward and is integrally provided. Each of the guide portions 21 is provided so as to continuously extend in the transfer direction of the wafer 3. Further, at the transfer start position on the facing surface 11, a transfer force applying means 22 for applying a transfer force to the wafer 3 in the transfer direction is provided. The transfer force applying means 22 is provided at the starting end of the air levitation type thin plate transfer device 1 in the transfer direction, and has an actuator 24 having a rod 23 that can be retracted and retracted in the transfer direction of the wafer 3, and the rod 2 thereof.
An arm whose base end (upper end) is fixed to the front end of 3 and whose front end (lower end) projects below the facing surface 11 through a hole portion 25 that is open on the side opposite to the transfer direction of the wafer 3 at the transfer start position. And 26.

【0023】したがって、上記第1実施例では、ウエハ
3の上面3aに向けてクリーンエアを吹出してウエハ3
の上面3aと対向面11との間に負圧層を形成する吹出
口12a,…が、対向面11が連続するウエハ3の搬送
方向に一列に並べて設けられているので、第1〜第3吹
出口12a〜12cにより浮上支持されていたウエハ3
が、アクチュエータ23(搬送力付与手段22)により
ロッド24を介してアーム26を搬送方向へ突出させて
搬送方向へ押し出されると、第1吹出口12aから外れ
て第3吹出口12cの搬送方向に相隣る第4吹出口12
dから吹出すクリーンエアによって搬送方向に移動した
ウエハ3(図1に一点鎖線で示す位置)の上面3aと対
向面11との間に負圧層を形成し、さらに搬送方向に移
動したウエハ3(図1に二点鎖線で示す位置)の上面3
aと対向面11との間で次に相隣る第5吹出口12eか
ら吹出すクリーンエアにより負圧層を順次形成し、ウエ
ハ3自身を対向面11に対して非接触状態で浮上させた
ままで搬送する。これによって、ウエハ3のみが対向面
11に対して非接触状態で搬送されることになり、ウエ
ハ3に傷が付いたり、ダストが付着したりすることが防
止できる。また、ウエハ(薄板)をハンド部の対向面に
非接触状態でハンド部ごと搬送する場合に必要なアーム
や該アームを駆動させるアクチュエータなどの機器が不
要となり、空気浮上式薄板搬送装置1をコンパクトなも
のにすることができる。
Therefore, in the first embodiment described above, the clean air is blown toward the upper surface 3a of the wafer 3 and the wafer 3
, Which form a negative pressure layer between the upper surface 3a of the wafer 3 and the facing surface 11 are arranged in a line in the transfer direction of the wafer 3 where the facing surface 11 is continuous, the first to the third. Wafer 3 that was levitated and supported by air outlets 12a to 12c
However, when the actuator 23 (conveyance force applying means 22) causes the arm 26 to protrude in the conveyance direction via the rod 24 and is pushed out in the conveyance direction, the arm 26 is disengaged from the first outlet 12a and is conveyed in the conveyance direction of the third outlet 12c. Adjacent 4th outlet 12
A negative pressure layer is formed between the upper surface 3a of the wafer 3 (the position indicated by the alternate long and short dash line in FIG. 1) moved in the transport direction by the clean air blown from d and the facing surface 11, and the wafer 3 further moved in the transport direction. Upper surface 3 (at the position indicated by the chain double-dashed line in FIG. 1)
A negative pressure layer is sequentially formed between a and the facing surface 11 by clean air blown from the next adjacent fifth outlet 12e, and the wafer 3 itself is floated on the facing surface 11 in a non-contact state. Transport to. As a result, only the wafer 3 is conveyed in a non-contact state with the facing surface 11, and it is possible to prevent the wafer 3 from being scratched or dust from being attached. Further, equipment such as an arm and an actuator for driving the arm, which is necessary when the wafer (thin plate) is transferred to the facing surface of the hand part without contacting the hand part, is unnecessary, and the air levitation type thin plate transfer device 1 is compact. It can be anything.

【0024】しかも、上記吹出口12a,…は、ウエハ
3の搬送方向に連続する対向面11にウエハ3の搬送方
向の長さよりも短い間隔でその搬送方向に一列に並べて
設けられているので、吹出口12cの搬送方向に相隣る
搬送方向側の吹出口12d(12e)から吹出すクリー
ンエアによりウエハ3の上面3aと対向面11との間に
負圧層が形成されるまでの間、反搬送方向側の吹出口1
2b,12c(12c,12d)から吹出すクリーンエ
アによる負圧層によってウエハ3が確実に浮上支持さ
れ、ウエハ3の搬送方向に連続する対向面11に対する
ウエハ3の搬送を円滑に行うことができる。
Moreover, since the air outlets 12a, ... Are provided on the facing surface 11 continuous in the carrying direction of the wafer 3 at intervals shorter than the length of the wafer 3 in the carrying direction, they are arranged in a line in the carrying direction. Until a negative pressure layer is formed between the upper surface 3a of the wafer 3 and the facing surface 11 by the clean air blown from the air outlet 12d (12e) on the transport direction side adjacent to the air outlet 12c in the transport direction, Blow-out port 1 on the opposite side
The wafer 3 is reliably floated and supported by the negative pressure layer formed by the clean air blown from 2b and 12c (12c and 12d), and the wafer 3 can be smoothly transferred to the facing surface 11 continuous in the transfer direction of the wafer 3. .

【0025】また、ウエハ3を、その搬送方向と直交す
る左右両側部に対応する対向面11の左右両側端部に設
けた案内部21,21により、搬送方向から外れること
なく円滑に終端位置まで案内しつつ搬送することができ
る。
Further, the guide portions 21 and 21 provided on the left and right end portions of the facing surface 11 corresponding to the left and right side portions orthogonal to the transfer direction of the wafer 3 allow the wafer 3 to smoothly reach the end position without deviating from the transfer direction. It can be conveyed while being guided.

【0026】さらに、クリーンエアを下方に吹出す吹出
口12a,…によりウエハ3の搬送を可能にしたので、
上方へのエアの吹出を嫌うクリーンルーム2に適した空
気浮上式薄板搬送装置1が構成され、実施する上で非常
に有利なものとなる。
Furthermore, since the wafer 3 can be transferred by the blowout ports 12a, ...
The air levitation type thin plate transporting device 1 suitable for the clean room 2 which is reluctant to blow air upward is constructed, which is very advantageous for implementation.

【0027】次に、本発明の第2実施例を図3に基づい
て説明する。
Next, a second embodiment of the present invention will be described with reference to FIG.

【0028】この第2実施例では、搬送力付与手段の構
成を変更している。
In the second embodiment, the structure of the conveying force applying means is changed.

【0029】すなわち、本実施例では、図3に示すよう
に、対向面11を、搬送開始位置では、搬送方向に行く
に従い下方に位置する傾斜面31に形成している。この
傾斜面31は、水平面Aに対して傾斜角θだけ傾斜して
いる。また、上記傾斜面31に対応する各吹出通路13
a,…も、傾斜面31に対して直交する向きにそれぞれ
傾斜している。尚、搬送力付与手段のその他の構成は、
第1実施例の場合と同じであり、同一の部分については
同一の符号を付してその説明は省略する。
That is, in this embodiment, as shown in FIG. 3, the facing surface 11 is formed on the inclined surface 31 located downward at the carrying start position in the carrying direction. The inclined surface 31 is inclined with respect to the horizontal plane A by an inclination angle θ. In addition, each outlet passage 13 corresponding to the inclined surface 31.
.. are also inclined in directions orthogonal to the inclined surface 31. In addition, the other configuration of the conveying force applying means,
This is the same as the case of the first embodiment, and the same parts are denoted by the same reference numerals and the description thereof is omitted.

【0030】したがって、上記第2実施例では、搬送開
始位置の対向面11が搬送方向に行くに従い下方に位置
する傾斜面31に形成されているので、ウエハ3の重力
方向に作用する重力モーメントによりウエハ3に搬送方
向への力が作用することになり、ウエハ3に搬送方向へ
の力を加えることなく該ウエハ3が実線位置から一点鎖
線位置を経て二点鎖線位置の順に搬送され、ウエハ3に
搬送方向への搬送力を付与する別途のアクチュエータな
どの搬送力付与手段を不要にすることができる。
Therefore, in the second embodiment, since the facing surface 11 at the carrying start position is formed on the inclined surface 31 located downward as it goes in the carrying direction, the gravitational moment acting in the gravitational direction of the wafer 3 causes Since a force in the carrying direction acts on the wafer 3, the wafer 3 is carried in order from the solid line position to the one-dot chain line position to the two-dot chain line position without applying a force to the wafer 3 in the carrying direction. It is possible to eliminate the need for a separate conveying force applying unit such as an actuator that applies a conveying force in the conveying direction.

【0031】次に、本発明の第3実施例を図4に基づい
て説明する。
Next, a third embodiment of the present invention will be described with reference to FIG.

【0032】この第3実施例では、搬送力付与手段の構
成を変更している。
In the third embodiment, the structure of the conveying force applying means is changed.

【0033】すなわち、本実施例では、図4に示すよう
に、複数の吹出口12a,…にそれぞれ下流端が開口す
る吹出通路13a,…を、それらの吹出口12a,…か
らウエハ3の搬送方向向きにクリーンエアを吹出すよ
う,ウエハ3の搬送方向に対して上流側が後方に傾斜し
た状態で設けている。これらの吹出通路13a,…は、
鉛直線xに対して傾斜角αだけ傾斜している。尚、搬送
力付与手段のその他の構成は、第1実施例の場合と同じ
であり、同一の部分については同一の符号を付してその
説明は省略する。
That is, in this embodiment, as shown in FIG. 4, the blow-out passages 13a, ... The upstream side is inclined rearward with respect to the transfer direction of the wafer 3 so as to blow clean air in the direction. These outlet passages 13a, ...
It is inclined by an inclination angle α with respect to the vertical line x. The rest of the configuration of the conveying force applying means is the same as that of the first embodiment, and the same parts are designated by the same reference numerals and the description thereof is omitted.

【0034】したがって、上記第3実施例では、各吹出
通路13a,…は、ウエハ3の搬送方向に対して後方に
傾斜角αだけ傾斜した状態で設けられているので、ウエ
ハ3の上面3aと対向面11との間で層流されるクリー
ンエアが搬送方向向きに積極的に流れて搬送方向向きの
流れが付与されることになり、このクリーンエアにより
形成された負圧層によってウエハ3に搬送方向への力を
加えることなく該ウエハ3が実線位置から一点鎖線位置
を経て二点鎖線位置の順に搬送され、ウエハ3に搬送方
向への搬送力を付与するアクチュエータなどの搬送力付
与手段を同様に不要にすることができる。
Therefore, in the third embodiment described above, the blow-out passages 13a, ... Are provided so as to be inclined rearward with respect to the transfer direction of the wafer 3 by the inclination angle α. The clean air laminarly flowing with the facing surface 11 positively flows in the transfer direction, and a flow in the transfer direction is imparted, and the negative pressure layer formed by the clean air transfers the clean air to the wafer 3. The wafer 3 is carried in the order of the solid line position, the one-dot chain line position, and the two-dot chain line position without applying a force in the direction, and a transfer force applying unit such as an actuator for applying a transfer force to the wafer 3 in the transfer direction is also used. Can be unnecessary.

【0035】次に、本発明の第4実施例を図5に基づい
て説明する。
Next, a fourth embodiment of the present invention will be described with reference to FIG.

【0036】この第4実施例では、搬送力付与手段の構
成を変更している。
In the fourth embodiment, the structure of the conveying force applying means is changed.

【0037】すなわち、本実施例では、図5に示すよう
に、ウエハ3の搬送方向に互いに相隣る吹出口12a,
12b(又は12b,12c、又は12c,12d、又
は12d,12e)の間には、その下方にウエハ3があ
ることを検知する検知手段41,…が設けられており、
該検知手段41,…により検知したウエハ3近傍の吹出
口12a〜12eからのみクリーンエアの吹出しが行わ
れている。この場合、吹出通路13a,…には、それぞ
れシャッタ弁(図示せず)が設けられ、このシャッタ弁
が、図示しない制御手段により開閉されるようになって
いる。そして、上記検知手段41,…によりウエハ3が
検出されると、そのウエハを検出した検出手段41から
の信号を受けた制御手段によりシャッタ弁が開閉操作さ
れて、ウエハ3近傍の吹出口12a〜12eのみからの
クリーンエアの吹出しを行うようにしている。尚、搬送
力付与手段のその他の構成は、第1実施例の場合と同じ
であり、同一の部分については同一の符号を付してその
説明は省略する。
That is, in the present embodiment, as shown in FIG. 5, the air outlets 12a, which are adjacent to each other in the wafer 3 transfer direction,
Between the 12b (or 12b, 12c, or 12c, 12d, or 12d, 12e), there is provided detection means 41 for detecting the presence of the wafer 3 therebelow.
The clean air is blown out only from the air outlets 12a to 12e near the wafer 3 detected by the detection means 41. In this case, a shutter valve (not shown) is provided in each of the outlet passages 13a, ... And the shutter valve is opened and closed by a control means (not shown). When the detecting means 41, ... Detects the wafer 3, the shutter valve is opened / closed by the control means which receives a signal from the detecting means 41 that has detected the wafer, and the outlets 12a to 12a near the wafer 3 are opened. The clean air is blown from only 12e. The rest of the configuration of the conveying force applying means is the same as that of the first embodiment, and the same parts are designated by the same reference numerals and the description thereof is omitted.

【0038】したがって、上記実施例では、搬送方向に
互いに相隣る吹出口12a,12bの間に設けた検知手
段41によりウエハ3が下方にあることを検知して、ウ
エハ3近傍の吹出口12a〜12eのみからクリーンエ
アが吹出されるので、ウエハ3の搬送に無関係な吹出
口、つまりウエハ3の移動によりその後方で該ウエハ3
に対向しない吹出口(ウエハ3の一点鎖線位置では第1
吹出口12a、ウエハ3の二点鎖線位置では第1吹出口
12a及び第2吹出口12b)及び図外の吹出口からの
不要なクリーンエアの吹出しが防止されて、クリーンエ
アの無駄使いを防止できるとともに、ウエハ3と対向面
11との間つまり搬送系路上での層流の乱れを防止する
ことができる。しかも、不要なクリーンエアの吹出しを
防止して、クリーンルーム2内でのダストの巻き上げを
可及的に防止することもできる。
Therefore, in the above embodiment, the detection means 41 provided between the air outlets 12a and 12b adjacent to each other in the carrying direction detects that the wafer 3 is below, and the air outlet 12a near the wafer 3 is detected. Since clean air is blown out only from ~ 12e, the air outlets unrelated to the transfer of the wafer 3, that is, the movement of the wafer 3 causes the clean air to be blown behind the wafer 3.
(Not shown at the position of the alternate long and short dash line of the wafer 3
At the position indicated by the chain double-dashed line of the blower outlet 12a and the wafer 3, unnecessary clean air is prevented from being blown out from the first blower outlet 12a and the second blower outlet 12b) and a blower outlet not shown in the figure, thus preventing waste of clean air. In addition, it is possible to prevent turbulence of the laminar flow between the wafer 3 and the facing surface 11, that is, on the transfer system path. Moreover, it is possible to prevent unnecessary blowing of clean air and prevent dust from being wound up in the clean room 2.

【0039】尚、本発明は上記各実施例に限定されるも
のではなく、その他種々の変形例を包含するものであ
る。例えば、上記各実施例では、各吹出口12a,…を
対向面11の幅方向略中央部に設けたが、対向面の幅方
向複数箇所、又は搬送方向に位置ずれさせて複数列並べ
た吹出口であっても良い。また、上記各実施例では、ウ
エハ3を3つの吹出口に対応させたが、2つまたは4つ
以上の吹出口に対応させるようにしても良い。
The present invention is not limited to the above-mentioned embodiments, but includes various modifications. For example, in each of the above-described embodiments, the outlets 12a, ... Are provided in the widthwise central portion of the facing surface 11, but a plurality of rows are arranged in the widthwise direction of the facing surface or in a plurality of rows while being displaced in the transport direction. It may be the exit. In addition, in each of the above-described embodiments, the wafer 3 is associated with three outlets, but it may be associated with two or four or more outlets.

【0040】さらに、上記各実施例では、空気浮上式薄
板搬送装置1をクリーンルーム2内に設置した場合につ
いて述べたが、その他あらゆる場所に設置しても良いの
は勿論である。上記実施例では、薄板としてウエハを用
いたが、液晶基板など薄く表面積の大きな軽量物であれ
ばなんでも良い。
Further, in each of the above-mentioned embodiments, the case where the air floating thin plate carrier 1 is installed in the clean room 2 has been described, but it goes without saying that it may be installed in any other place. In the above embodiment, the wafer is used as the thin plate, but any thin material having a large surface area such as a liquid crystal substrate may be used.

【0041】また、上記各実施例では、各案内部21を
それぞれウエハ3の搬送方向に連続して設けたが、ウエ
ハが案内可能となるように各案内部が断続的に設けられ
ていても良く、この場合には、クリーンエアの逃げ道が
確保されて層流が円滑に行え、負圧層が効果的に形成さ
れる。
Further, in each of the above-mentioned embodiments, the guide portions 21 are continuously provided in the wafer transfer direction, but the guide portions may be provided intermittently so that the wafer can be guided. Well, in this case, an escape route for clean air is secured, a laminar flow can be performed smoothly, and a negative pressure layer is effectively formed.

【0042】[0042]

【発明の効果】以上の如く、請求項1記載の発明におけ
る空気浮上式薄板搬送装置によれば、薄板の搬送方向に
連続する対向面に薄板の搬送方向の長さよりも短い間隔
でその搬送方向に複数の吹出口を並べて設けたので、搬
送方向に移動する薄板の上面と対向面との間に負圧層を
順次形成して薄板自身の非接触状態での円滑な搬送を可
能とし、薄板への傷やダストの付着を防止できるととも
に、薄板をハンド部ごと搬送するものに必要なアームや
アーム駆動用のアクチュエータなどの機器を不要にして
搬送装置のコンパクト化を図ることができる。
As described above, according to the air levitation type thin plate conveying device of the invention of claim 1, the conveying direction of the thin plate on the facing surface which is continuous in the conveying direction is shorter than the length of the thin plate in the conveying direction. Since a plurality of outlets are arranged side by side in the sheet, a negative pressure layer is sequentially formed between the upper surface and the facing surface of the thin plate that moves in the transport direction to enable smooth transport of the thin plate itself in a non-contact state. It is possible to prevent scratches and dust from adhering to the device, and it is possible to reduce the size of the transfer device by eliminating the need for devices such as an arm and an actuator for driving the arm that are required to transfer the thin plate together with the hand part.

【0043】請求項2記載の発明における空気浮上式薄
板搬送装置によれば、薄板を案内部により案内して、搬
送方向から外れることなく薄板を円滑に所定位置まで案
内することができる。
According to the air levitation type thin plate conveying device of the second aspect of the invention, the thin plate can be guided by the guide portion so that the thin plate can be smoothly guided to a predetermined position without being displaced from the conveying direction.

【0044】請求項3記載の発明における空気浮上式薄
板搬送装置によれば、少なくとも搬送方向基端位置の対
向面を傾斜面に形成したので、薄板にその重力モーメン
トによる搬送方向への力を付与し、別途の搬送力付与装
置を不要にすることができる。
According to the air levitation type thin plate conveying device of the third aspect of the present invention, at least the facing surface at the base end position in the conveying direction is formed as an inclined surface, so that the thin plate is given a force in the conveying direction due to its gravitational moment. However, it is possible to eliminate the need for a separate conveying force applying device.

【0045】請求項4記載の発明における空気浮上式薄
板搬送装置によれば、吹出通路を薄板の搬送方向に対し
て上流側を後方に傾斜した状態で設けたので、薄板の上
面と対向面との間に搬送方向向きの流れを付与する負圧
層を形成し、薄板に搬送方向への力を加えることなく該
薄板を搬送できて、薄板に搬送方向への力を加える装置
を同様に不要にすることができる。
According to the air levitation type thin plate carrier of the invention as defined in claim 4, since the blowing passage is provided in a state where the upstream side is inclined rearward with respect to the carrying direction of the thin plate, the upper surface and the facing surface of the thin plate are opposed to each other. A negative pressure layer that gives a flow in the transport direction is formed between the thin plates, and the thin plates can be transported without applying a force in the transport direction to the thin plates, and a device for applying a force in the transport direction to the thin plates is also unnecessary. Can be

【0046】さらに、請求項5記載の発明における空気
浮上式薄板搬送装置によれば、検知手段により検知した
薄板近傍の吹出口のみから空気を吹出すので、空気の無
駄使いを防止できるとともに、搬送系路上での空気流の
乱れを防止できる。
Further, according to the air levitation type thin plate conveying device of the fifth aspect of the invention, since the air is blown out only from the air outlet in the vicinity of the thin plate detected by the detecting means, it is possible to prevent waste of air and to convey the air. It is possible to prevent turbulence of the air flow on the system road.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の第1実施例に係る空気浮上式薄板搬送
装置の搬送開始位置付近での縦断側面図である。
FIG. 1 is a vertical cross-sectional side view in the vicinity of a transfer start position of an air floating type thin plate transfer device according to a first embodiment of the present invention.

【図2】同空気浮上式薄板搬送装置の搬送開始位置付近
での縦断背面図である。
FIG. 2 is a vertical cross-sectional rear view in the vicinity of a transport start position of the air levitation type thin plate transport device.

【図3】第2実施例に係る図1相当図である。FIG. 3 is a view corresponding to FIG. 1 according to a second embodiment.

【図4】第3実施例に係る図1相当図である。FIG. 4 is a view corresponding to FIG. 1 according to a third embodiment.

【図5】第4実施例に係る図1相当図である。FIG. 5 is a view corresponding to FIG. 1 according to a fourth embodiment.

【符号の説明】[Explanation of symbols]

1 空気浮上式薄板搬送装置 3 ウエハ(薄板) 3a 上面 11 対向面 12a〜12f 吹出口 13a〜13f 吹出通路 21 案内部 31 傾斜面 41 検知手段 DESCRIPTION OF SYMBOLS 1 Air floating type thin plate conveying apparatus 3 Wafer (thin plate) 3a Upper surface 11 Opposing surface 12a to 12f Air outlet 13a to 13f Air outlet passage 21 Guide portion 31 Sloping surface 41 Detection means

Claims (5)

【特許請求の範囲】[Claims] 【請求項1】 薄板の上面に対向するよう対向面が配置
され、該対向面には空気を吹出す複数の吹出口が設けら
れ、 上記薄板の上面と対向面との間に、上記吹出口から薄板
の上面に向けて吹出す空気を層流させて負圧層が形成さ
れ、この負圧層により上記薄板を対向面に対して非接触
状態で浮上させて所定位置まで搬送するようになされて
おり、 上記対向面は、上記薄板の搬送方向に連続して設けら
れ、 上記吹出口は、上記薄板の搬送方向に連続する対向面と
薄板との間に薄板の搬送方向に順次負圧層が形成される
よう,上記対向面に薄板の搬送方向の長さよりも短い間
隔でその搬送方向に並べて設けられていることを特徴と
する空気浮上式薄板搬送装置。
1. A facing surface is disposed so as to face the upper surface of the thin plate, and a plurality of air outlets for blowing air are provided in the facing surface, and the air outlet is provided between the upper surface of the thin plate and the facing surface. A negative pressure layer is formed by laminarly flowing the air blown toward the upper surface of the thin plate, and the negative pressure layer causes the thin plate to float in a non-contact state with respect to the facing surface and to be conveyed to a predetermined position. The facing surface is continuously provided in the transport direction of the thin plate, and the air outlet is between the facing surface and the thin plate continuous in the transport direction of the thin plate, and the negative pressure layer is sequentially formed in the transport direction of the thin plate. The air-floating thin plate transporting device is characterized in that it is provided on the facing surface side by side in the transporting direction at intervals shorter than the length of the thin plates in the transporting direction.
【請求項2】 上記薄板の搬送方向と直交する左右両側
部にそれぞれ対応する対向面の対応位置には、薄板の搬
送を案内する案内部が薄板の搬送方向に延びて設けられ
ている請求項1記載の空気浮上式薄板搬送装置。
2. A guide part for guiding the conveyance of the thin plate is provided at a corresponding position of the facing surface corresponding to both left and right sides orthogonal to the conveying direction of the thin plate, extending in the conveying direction of the thin plate. 1. The air levitation type thin plate carrier according to 1.
【請求項3】 上記対向面は、少なくとも搬送開始位置
では、搬送方向に行くに従い下方に位置する傾斜面に形
成されている請求項1記載の空気浮上式薄板搬送装置。
3. The air-floating thin plate carrier according to claim 1, wherein the facing surface is formed as an inclined surface located downward in the carrying direction at least at the carrying start position.
【請求項4】 上記複数の吹出口にそれぞれ吹出通路の
下流端が開口しており、該吹出通路は、各吹出口から薄
板の搬送方向向きに空気を吹出すよう,薄板の搬送方向
に対して上流側が後方に傾斜した状態で設けられている
請求項1記載の空気浮上式薄板搬送装置。
4. A downstream end of an outlet passage is opened at each of the plurality of outlets, and the outlet passage is arranged so as to blow out air from the outlets in the sheet conveying direction. The air levitation type thin plate carrier according to claim 1, wherein the upstream side is provided so as to be inclined rearward.
【請求項5】 上記薄板の搬送方向で相隣る吹出口の間
には、その下方に薄板があることを検知する検知手段が
設けられており、該検知手段により検知した薄板近傍の
吹出口からのみ空気の吹出しを行う制御手段を備えてい
る請求項1記載の空気浮上式薄板搬送装置。
5. A detection means for detecting the presence of the thin plate is provided between the air outlets adjacent to each other in the conveying direction of the thin plate, and the air outlet near the thin plate detected by the detection means. The air levitation type thin plate transport device according to claim 1, further comprising a control means for blowing air from only the above.
JP15461894A 1994-07-06 1994-07-06 Pneumatic floatation type sheet conveyor system Withdrawn JPH0820431A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15461894A JPH0820431A (en) 1994-07-06 1994-07-06 Pneumatic floatation type sheet conveyor system

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15461894A JPH0820431A (en) 1994-07-06 1994-07-06 Pneumatic floatation type sheet conveyor system

Publications (1)

Publication Number Publication Date
JPH0820431A true JPH0820431A (en) 1996-01-23

Family

ID=15588121

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15461894A Withdrawn JPH0820431A (en) 1994-07-06 1994-07-06 Pneumatic floatation type sheet conveyor system

Country Status (1)

Country Link
JP (1) JPH0820431A (en)

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