JPH0820201B2 - Measuring tool - Google Patents
Measuring toolInfo
- Publication number
- JPH0820201B2 JPH0820201B2 JP28525786A JP28525786A JPH0820201B2 JP H0820201 B2 JPH0820201 B2 JP H0820201B2 JP 28525786 A JP28525786 A JP 28525786A JP 28525786 A JP28525786 A JP 28525786A JP H0820201 B2 JPH0820201 B2 JP H0820201B2
- Authority
- JP
- Japan
- Prior art keywords
- thin film
- hard thin
- surface plate
- block gauge
- measured
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
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- Length-Measuring Instruments Using Mechanical Means (AREA)
- Length Measuring Devices With Unspecified Measuring Means (AREA)
- Details Of Measuring And Other Instruments (AREA)
Description
【発明の詳細な説明】 （産業上の利用分野） 本発明は定盤やブロックゲージなどの測定具に関する
ものである。TECHNICAL FIELD The present invention relates to a measuring tool such as a surface plate and a block gauge.
（従来の技術） 精密測定などに用いる測定具として、定盤やブロック
ゲージがあるが、第６図（ａ）（ｂ）に示すように定盤
Ｊは被測定物体を載置する基準面J1を有する板状体であ
り、基準面J1は平坦でなめらかな面としていた。またブ
ロックゲージＢは２つの平行な基準面B1，B1を有する六
面体で、基準面B1，B1間の距離ｔが定められた長さとな
っており、さまざまな距離ｔを有するブロックゲージＢ
を用意しておいて、必要な長さのものを取り出して使用
するようになっていた。また、これら定盤Ｊ、ブロック
ゲージＢの材質は、合金工具鋼、炭素クロム鋼などの金
属や、アルミナセラミックなどの用いていた。(Prior Art) As a measuring tool used for precision measurement, there are a surface plate and a block gauge. As shown in FIGS. 6 (a) and 6 (b), the surface plate J is a reference surface J on which an object to be measured is placed. It was a plate having 1 and the reference plane J 1 was a flat and smooth surface. Further, the block gauge B is a hexahedron having two parallel reference planes B 1 and B 1 , the distance t between the reference planes B 1 and B 1 is a fixed length, and the block gauges having various distances t B
It was supposed to be prepared, and the one with the required length was taken out and used. The surface plate J and the block gauge B are made of metal such as alloy tool steel or carbon chrome steel, or alumina ceramic.
（従来技術の問題点） このような従来の定盤Ｊ、ブロックゲージＢを使用す
るときは、たとえばブロックゲージＢを定盤Ｊ上に載置
した場合、第６図（ｂ）に示すように、定盤Ｊの基準面
J1とブロックゲージＢの基準面B1の間に、微細なゴミＧ
が存在して測定値に誤差が生じるため、ブロックゲージ
Ｂを定盤Ｊに押しつけながら、矢印方向に何度か動かし
て、ゴミＧを外へ出すようにしていた。(Problems of Prior Art) When such a conventional surface plate J and block gauge B are used, for example, when the block gauge B is placed on the surface plate J, as shown in FIG. , Reference surface of surface plate J
Between the J 1 and the reference surface B 1 of the block gauge B, fine dust G
Since there is an error in the measured value due to the existence of the above, the block gauge B was pressed against the surface plate J and moved a few times in the direction of the arrow to let out the dust G.
しかし、定盤Ｊの基準面J1とブロックゲージＢの基準
面B1はいずれも平坦でなめらかな面であるから、ゴミＧ
の逃げ場がなく、ゴミＧを完全に外へ出しきることが困
難であり、残ったゴミＧの大きさ分だけ誤差が生じてい
た。たとえクリーンルーム内でも数μｍ程度のゴミＧが
存在しているため、数μｍ程度の誤差を防ぐことは難か
しかった。However, since the reference surface B 1 of the reference plane J 1 and the block gauge B of the surface plate J is smooth surfaces both flat, dust G
It was difficult to completely remove the dust G, and an error was generated by the size of the remaining dust G. Even in the clean room, dust G of about several μm exists, so it was difficult to prevent an error of about several μm.
また、前記したように使用するときにブロックゲージ
Ｂを定盤Ｊに押しつけながら前後に動かすため、金属や
アルミナセラミックよりなる定盤ＪやブロックゲージＢ
は基準面J1，B1が摩耗しやすく、長期使用中には基準面
J1，B1の平坦度が悪くなって測定値に誤差が生じてしま
うという不都合があった。In addition, since the block gauge B is moved forward and backward while being pressed against the surface plate J when used as described above, the surface plate J and the block gauge B made of metal or alumina ceramic are used.
The reference surfaces J 1 and B 1 are easily worn,
There was the inconvenience that the flatness of J 1 and B 1 deteriorated and errors occurred in the measured values.
（問題点を解決するための手段） 上記に鑑みて本発明は、被測定物体と接触する平坦な
基準面に、凹凸パターンを形成するように硬質薄膜を被
着したり、また前記基準面にあらかじめ凹凸パターンを
形成し、その上に硬質薄膜を被着して測定具を構成する
ようにしたものである。(Means for Solving Problems) In view of the above, the present invention, on a flat reference surface that comes into contact with the object to be measured, is coated with a hard thin film so as to form an uneven pattern, or on the reference surface. A concave-convex pattern is formed in advance, and a hard thin film is adhered thereon to form a measuring tool.
（実施例） 以下、本発明の実施例を図によって説明する。(Example) Hereinafter, an example of the present invention will be described with reference to the drawings.
第１図（ａ）（ｂ）に示すように、定盤Ｊは基体１の
載置面に縞状に硬質薄膜２を被着して、溝３よりなる凹
凸パターンを形成したものであり、硬質薄膜２の表面2a
は表面粗さ0.25Ra以下のなめらかな面としてある。As shown in FIGS. 1 (a) and 1 (b), a surface plate J is one in which a hard thin film 2 is applied in a striped pattern on a mounting surface of a substrate 1 to form an uneven pattern composed of grooves 3. Surface 2a of hard thin film 2
Is a smooth surface with a surface roughness of 0.25 Ra or less.
また、第２図（ａ）（ｂ）に示すようにブロックゲー
ジＢは、基体11の２つの平行な基準面に縞状に硬質薄膜
12を被着して溝13よりなる凹凸パターンを形成したもの
であり、硬質薄膜12の表面12cは表面粗さ0.1Ra以下のな
めらかな面としてある。Further, as shown in FIGS. 2 (a) and 2 (b), the block gauge B has a striped hard thin film on two parallel reference surfaces of the base 11.
The surface 12c of the hard thin film 12 is a smooth surface having a surface roughness of 0.1 Ra or less.
このような第１図（ａ）（ｂ）に示した本発明実施例
に係る定盤Ｊを用いれば、第３図に示すように、定盤Ｊ
上で、被測定物体Ｈを矢印方向に何度が動かすと、微細
なゴミＧが溝３の中に入りこむため、被測定物体Ｈが硬
質薄膜２の表面2aに完全に密着して正確な測定を行うこ
とができる。また、被測定物体Ｈが接触する部分は硬質
薄膜２の表面2aであるから摩耗が少なく、さらに硬質薄
膜２の表面2aの粒子構造は丸味を帯びたなめらかなもの
となっているため、被測定物体Ｈに傷をつけにくい。If the surface plate J according to the embodiment of the present invention shown in FIGS. 1A and 1B is used, as shown in FIG.
When the object to be measured H is moved in the direction of the arrow many times, fine dust G enters the groove 3, so that the object to be measured H is completely adhered to the surface 2a of the hard thin film 2 and an accurate measurement is performed. It can be performed. Further, since the portion in contact with the object H to be measured is the surface 2a of the hard thin film 2, the wear is small, and the particle structure of the surface 2a of the hard thin film 2 is roundish and smooth, so Hard to scratch the object H.
以上第１図（ａ）（ｂ）に示した定盤Ｊについて説明
したが、第２図（ａ）（ｂ）に示したブロックゲージＢ
についても同様である。Although the surface plate J shown in FIGS. 1A and 1B has been described above, the block gauge B shown in FIGS. 2A and 2B.
The same applies to.
次に第１図（ａ）（ｂ）に示した定盤Ｊおよび第２図
（ａ）（ｂ）に示すブロックゲージＢの製法を定盤Ｂを
例として説明する。まずアルミナ，ジルコニアなどのセ
ラミックまたはコバールよりなる基体１を用意し、載置
面をなめらかで平坦な面とする。次にこの載置上面の溝
３とすべき分に樹脂やフォトレジストなどでマスクを形
成しおいて、その上からTiC,TiN,TiB2，ダイヤモンド,W
B,SiC,Si3N4などのビッカース硬度1800Kg/mm2以上の硬
質薄膜２をCVD法などで被着させる。その後、前記マス
クを取り除けばマスク部分は硬質薄膜２が被着されてい
ないため溝３となり、第１図（ｂ）に示すような凹凸パ
ターンを形成することができる。さらに、必要に応じて
硬質薄膜２の表面を研磨して、表面粗さ0.25Ra以下のな
めらかな面とすればよい。Next, a method of manufacturing the surface plate J shown in FIGS. 1 (a) and (b) and the block gauge B shown in FIGS. 2 (a) and 2 (b) will be described by using the surface plate B as an example. First, a substrate 1 made of ceramic such as alumina or zirconia or Kovar is prepared, and the mounting surface is made smooth and flat. Next, a mask is formed with resin, photoresist, etc. for the groove 3 on the mounting upper surface, and TiC, TiN, TiB 2 , diamond, W
A hard thin film 2 having a Vickers hardness of 1800 kg / mm 2 or more such as B, SiC, Si 3 N 4 is deposited by a CVD method or the like. After that, if the mask is removed, the hard thin film 2 is not deposited on the mask portion to form the groove 3, so that the concavo-convex pattern as shown in FIG. 1B can be formed. Further, if necessary, the surface of the hard thin film 2 may be polished to form a smooth surface having a surface roughness of 0.25 Ra or less.
このとき溝３の深さＤは硬質薄膜２の薄厚でありCVD
法の時間を変化させることにより、また溝３の幅Ｗ、ピ
ッチＰはマスクの形状を変化させることによりそれぞれ
容易に変化させることができ、しかも非常に微小なもの
とすることができる。At this time, the depth D of the groove 3 is the thin thickness of the hard thin film 2,
The width W and the pitch P of the groove 3 can be easily changed by changing the time of the method and by changing the shape of the mask, and can be made extremely minute.
したがって、定盤Ｊの大きさや被測定物体Ｈの種類、
使用環境などに応じて最適の形状、深さを持った溝３を
形成すればよい。Therefore, the size of the surface plate J, the type of the measured object H,
It suffices to form the groove 3 having an optimum shape and depth according to the use environment and the like.
さらに本発明の他の実施例を説明する。 Further, another embodiment of the present invention will be described.
第３図に示す定盤Ｊは基体１の載置面全体に硬質薄膜
２を被着しておき、表面に溝３よりなる凹凸パターンを
形成したものであり、凸部表面2aは0.25Ra以下のなめら
かな面となっている。このような凹凸パターンは、硬質
薄膜２を被着後、溝３以外の部分にマスクを形成してお
いて、エッチング処理を施したあとマスクを取り除くこ
とによって形成される。The surface plate J shown in FIG. 3 is one in which a hard thin film 2 is deposited on the entire mounting surface of a substrate 1 and an uneven pattern consisting of grooves 3 is formed on the surface, and the convex surface 2a is 0.25 Ra or less. It has a smooth surface. Such a concavo-convex pattern is formed by depositing the hard thin film 2, forming a mask on a portion other than the groove 3, performing etching treatment, and then removing the mask.
さらに、第４図に示す定盤Ｊは基体１の載置面1aにあ
らかじめ、マスクを形成しておいてエッチングまたはサ
ンドブラストを施すことにより凹凸バターンを形成して
おき、この載置面1aに硬質薄膜２を被着させ、溝３を形
成したものである。Further, in the surface plate J shown in FIG. 4, an uneven pattern is formed by previously forming a mask on the mounting surface 1a of the substrate 1 and performing etching or sandblasting, and the mounting surface 1a is hard. The thin film 2 is deposited and the groove 3 is formed.
これらの第３図、第４図に示した定盤Ｊを用いても溝
３に微細なゴミＧを取り込むことができるため、載置し
た被測定物体を硬質薄膜２の表面2aに完全に密着させる
ことができる。また溝３の深さＤはエッチングまたはサ
ンドブラストの時間を変化させることにより、幅W,ピッ
チＰはマスクの形状を変化させることによりそれぞれ容
易に変化させることがでいる。したっがって、定盤Ｊの
大きさや被測定物体の種類、使用環境などに応じて最適
の形状、深さを持った溝３を形成すればよい。また第３
図、第４図では測定具として定盤のみを示したが、ブロ
ックゲージなどの他の測定具にも応用でき同様の効果を
奏することは言うまでもない。Even if the surface plate J shown in FIGS. 3 and 4 is used, fine dust G can be taken into the groove 3, so that the placed object to be measured is completely adhered to the surface 2a of the hard thin film 2. Can be made. The depth D of the groove 3 can be easily changed by changing the etching or sandblasting time, and the width W and the pitch P can be easily changed by changing the shape of the mask. Therefore, the groove 3 having the optimum shape and depth may be formed according to the size of the surface plate J, the type of the object to be measured, the usage environment, and the like. Also the third
Although only the surface plate is shown as the measuring tool in FIGS. 4 and 5, it is needless to say that it can be applied to other measuring tools such as a block gauge and the same effect can be obtained.
実際に第１図（ａ）（ｂ）、第３図、第４図に示した
定盤Ｊを測定具に使用する場合は種々実験の結果、溝３
の深さＤは５〜10μｍ、幅Ｗが５〜10μｍ、ピッチＰは
１〜５μｍのものがゴミを確実に取り除き摩耗も少なく
優れていた。また、第２図（ａ）（ｂ）に示したブロッ
クゲージＢの場合は溝13の深さＤは５〜10μｍ、幅Ｗは
10〜30μｍ、ピッチＰは0.5〜１μｍのものが優れてい
た。さらに、これらの定盤ＪやブロックゲージＢにおい
て溝3,13の形状は格子状などさまざまなものとしてよ
く、また基準面の端部まで溝3,13を形成しておけば中に
たまったゴミＧを容易に排除することができる。When the surface plate J shown in FIGS. 1 (a) and (b), FIG. 3 and FIG.
The depth D of 5 to 10 μm, the width W of 5 to 10 μm, and the pitch P of 1 to 5 μm were excellent in that dust was reliably removed and wear was small. In the case of the block gauge B shown in FIGS. 2A and 2B, the depth D of the groove 13 is 5 to 10 μm and the width W is
Those having a pitch of 10 to 30 μm and a pitch P of 0.5 to 1 μm were excellent. Further, in the surface plate J and the block gauge B, the grooves 3 and 13 may have various shapes such as a lattice shape, and if the grooves 3 and 13 are formed up to the end of the reference surface, dust accumulated inside the grooves. G can be easily eliminated.
また本発明の実施例の測定具を構成する基体１の材質
はアルミナ，ジルコニア等のセラミックやコバールなど
の熱膨張率の低いものを用いる。らに硬質薄膜2,12とし
て用いる物質は第１表に示すように従来の測定具を形成
する物質である合金工具鋼，炭素クロム鋼，アルミナに
比べ硬度が大きく、したがって本発明実施例に係る測定
具は基準面の耐摩耗性が大きいことがわかる。Further, as the material of the substrate 1 which constitutes the measuring tool of the embodiment of the present invention, a material having a low coefficient of thermal expansion such as ceramics such as alumina and zirconia and Kovar is used. Further, as shown in Table 1, the materials used as the hard thin films 2 and 12 have a higher hardness than the alloy tool steel, carbon chrome steel, and alumina, which are the materials that form the conventional measuring tools, and therefore the materials according to the embodiment of the present invention. It can be seen that the measuring tool has a large wear resistance on the reference surface.
次に本発明実施例に係る定盤Ｊを、第２表に示すさま
ざまな材質の基体１と硬質薄膜２の組合せ試作した。基
体１の大きさは縦100mm,横100mm,厚さ20mmで硬質薄膜２
の膜厚は10μm,溝３の幅は10μm,ピッチは1mmとした。
また比較例として同じ大きさで硬質薄膜２を被着しない
ものと、硬質薄膜２を被着して溝３を形成しないもの試
作して、これらの定盤Ｊを用いて特性試験を行った。ま
ず、各々の定盤Ｊに従来のブロックゲージを載置して何
度か前後に動かしてゴミＧを除くようにした後、その大
きさを測定し、測定誤差の大きさを調べ、次に20mm角の
セラミックブロックを各定盤上に一定時間内こすりつけ
て、定盤の摩耗量を測定した。結果は第２表の通りであ
る。 Next, the surface plate J according to the embodiment of the present invention was manufactured as a combination of the base material 1 and the hard thin film 2 made of various materials shown in Table 2. The size of the base 1 is 100 mm in length, 100 mm in width, and 20 mm in thickness, and the hard thin film 2
The film thickness was 10 μm, the width of the grooves 3 was 10 μm, and the pitch was 1 mm.
Further, as comparative examples, prototypes having the same size without the hard thin film 2 deposited thereon and those having the hard thin film 2 deposited thereon without forming the groove 3 were manufactured, and a characteristic test was performed using these surface plates J. First, a conventional block gauge is placed on each surface plate J and moved back and forth several times to remove dust G, and then the size thereof is measured, and the size of the measurement error is investigated, and then A 20 mm square ceramic block was rubbed on each platen for a certain period of time, and the amount of wear of the platen was measured. The results are shown in Table 2.
第２表より比較例であるNo.1,2の定盤は硬質薄膜２を
被着してないため摩耗量が大きく、またゴミＧが完全に
取り除けないため測定誤差も大きかった。No.3の定盤は
硬質薄膜２を被着しているが溝３を形成していないため
ゴミＧを取り除けず、測定誤差が大きかった。これに対
して、本発明実施例に係るNo.4〜７の定盤はいずれも摩
耗量が少なく、溝中にゴミを取り込むことができるため
測定誤差も小さかった。 As shown in Table 2, the surface plates of Nos. 1 and 2 which are comparative examples had a large amount of wear because the hard thin film 2 was not adhered thereto, and the measurement error was large because the dust G could not be completely removed. The surface plate of No. 3 was coated with the hard thin film 2 but did not have the groove 3 formed therein, so that the dust G could not be removed and the measurement error was large. On the other hand, the surface plates of Nos. 4 to 7 according to the examples of the present invention all had a small amount of wear, and the measurement error was small because dust could be taken into the groove.
次に本発明実施例に係るブロックゲージＢを第２表に
示すさまざま材質の基体11と硬質薄膜12の組合せで試作
した。ブロックゲージＢの大きさは縦10mm,横10mm,基準
面間の距離ｔが5mmとし、硬質薄膜12の膜厚は５μm,溝1
3の幅は10μｍ、ピッチは1mmとした。また比較例とし
て、同じ大きさで、硬質薄膜12を被着しないものと、硬
質薄膜12を被着して溝13を形成しないものも試作して、
これらのブロックゲージＢを用いて特性試験を行った。
まず各々のブロックゲージＢをアルミナセラミックより
なる従来の定盤上に載置し、前後に何度か動かしてゴミ
を取り除くようにした後、基準面間の距離ｔを測定して
誤差の大きさを調べ、次に各々のブロックゲージＢを定
盤上に一定時間こすりつけて、基準面の摩耗量を測定し
た。結果は第３表の通りである。Next, a block gauge B according to an embodiment of the present invention was made by trial using a combination of a base material 11 of various materials and a hard thin film 12 shown in Table 2. The size of the block gauge B is 10 mm in length, 10 mm in width, the distance t between the reference planes is 5 mm, the thickness of the hard thin film 12 is 5 μm, and the groove 1
The width of 3 was 10 μm, and the pitch was 1 mm. Further, as a comparative example, the same size, one without the hard thin film 12 and one without the groove 13 formed by depositing the hard thin film 12 as a prototype,
A characteristic test was performed using these block gauges B.
First, each block gauge B is placed on a conventional surface plate made of alumina ceramic and moved back and forth several times to remove dust, and then the distance t between the reference surfaces is measured to measure the magnitude of the error. Then, each block gauge B was rubbed on the surface plate for a certain period of time, and the amount of wear of the reference surface was measured. The results are shown in Table 3.
第３表より、比較例であるNo.1のものは硬質薄膜12を
被着していないため測定誤差、摩耗量とも大きく、また
No.2のものは溝13を形成していないためゴミを逃がしき
れず、測定誤差が大きかった。これに対して、本発明実
施例に係るNo.3〜７のものは測定誤差、摩耗量ともに小
さく優れた結果であった。 From Table 3, No. 1 which is a comparative example does not have the hard thin film 12 deposited thereon, so that the measurement error and the wear amount are large.
The sample No. 2 did not have the grooves 13 formed therein, so that it was not possible to release the dust and the measurement error was large. On the other hand, in Nos. 3 to 7 according to the example of the present invention, both the measurement error and the wear amount were small and the results were excellent.
以上の実施例において、硬質薄膜2,12の被着方法はCV
D法以外にもイオンプレーティング法、スパッタリング
法、イオンデームポジション法などのPVD法を用いても
よい。また、硬質薄膜2,12としてTiC,TiNなどの導電性
の高い物質を用いると、表面の静電気を除去することが
でき好都合であった。In the above examples, the method of depositing the hard thin films 2 and 12 is CV.
Besides the D method, a PVD method such as an ion plating method, a sputtering method, or an ion dam position method may be used. Further, it was convenient to use a highly conductive substance such as TiC and TiN as the hard thin films 2 and 12 because static electricity on the surface can be removed.
（発明の効果） 叙上のように本発明によれば、被測定物体と接触する
平坦な基準面に凹凸パターンを形成するように硬質薄膜
を被着したり、または前記基準面に凹凸パターンを形成
しておいて、その上に硬質薄膜を被着させて測定具を形
成したことによって、該凹凸パターン溝中にゴミが入り
込むため、被測定物体や他の測定具を完全に密着させ、
正確な測定ができるだけでなく、基準面の耐摩耗性が大
きく長期にわたって優れた平坦度を保つことができ、ま
た基準面の粒子構造が丸味を帯びたものとなるため被測
定物体や他の測定具に傷をつけることもないなど、多く
の特長を有した測定具を提供することができる。(Effect of the invention) As described above, according to the present invention, a hard thin film is applied so as to form an uneven pattern on a flat reference surface that comes into contact with an object to be measured, or an uneven pattern is formed on the reference surface. After forming, by forming a measurement tool by depositing a hard thin film on it, because dust enters into the concave-convex pattern groove, the measurement object and other measurement tools are completely adhered,
Not only accurate measurement is possible, the wear resistance of the reference surface is large and excellent flatness can be maintained for a long time.Because the particle structure of the reference surface is rounded, the object to be measured and other measurements can be performed. It is possible to provide a measuring tool having many features such as not damaging the tool.
第１図（ａ）は本発明に係る測定具の一実施例である定
盤を示す斜視図、第１図（ｂ）は同図（ａ）中のＸ−Ｘ
線断面図である。第２図（ａ）は本発明の他の実施例で
あるブロックゲージを示す斜視図、第２図（ｂ）は同図
（ａ）中のＹ−Ｙ線断面図である。第３図、第４図はそ
れぞれ本発明の他の実施例を示す断面図である。第５図
は第１図に示した定盤上に被測定物体を載置した状態を
示す断面図である。 第６図（ａ）は従来の定盤とブロックゲージを示す斜視
図、第６図（ｂ）は同図（ａ）のＺ−Ｚ線断面図であ
る。 Ｊ……定盤 Ｂ……ブロックゲージ 1,11……基体 2,12……硬質薄膜FIG. 1 (a) is a perspective view showing a surface plate which is one embodiment of the measuring tool according to the present invention, and FIG. 1 (b) is XX in FIG. 1 (a).
It is a line sectional view. FIG. 2 (a) is a perspective view showing a block gauge which is another embodiment of the present invention, and FIG. 2 (b) is a sectional view taken along line YY in FIG. 2 (a). 3 and 4 are sectional views showing other embodiments of the present invention. FIG. 5 is a sectional view showing a state in which the object to be measured is placed on the surface plate shown in FIG. FIG. 6 (a) is a perspective view showing a conventional surface plate and a block gauge, and FIG. 6 (b) is a sectional view taken along line ZZ of FIG. 6 (a). J: surface plate B: block gauge 1,11 ... substrate 2,12 ... hard thin film
Claims (2)
凸パターンを形成するように硬質薄膜を被着したことを
特徴とする測定具。1. A measuring tool characterized in that a hard thin film is deposited on a flat reference surface that comes into contact with an object to be measured so as to form an uneven pattern.
ンを形成し、該基準面に硬質薄膜を被着したことを特徴
とする測定具。2. A measuring tool characterized in that a concavo-convex pattern is formed on a reference surface that comes into contact with an object to be measured, and a hard thin film is applied to the reference surface.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP28525786A JPH0820201B2 (en) | 1986-11-29 | 1986-11-29 | Measuring tool |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP28525786A JPH0820201B2 (en) | 1986-11-29 | 1986-11-29 | Measuring tool |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS63138201A JPS63138201A (en) | 1988-06-10 |
| JPH0820201B2 true JPH0820201B2 (en) | 1996-03-04 |
Family
ID=17689156
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP28525786A Expired - Lifetime JPH0820201B2 (en) | 1986-11-29 | 1986-11-29 | Measuring tool |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0820201B2 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6427355B1 (en) | 1999-01-14 | 2002-08-06 | Mitutoyo Corporation | Gauge block |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0339612A (en) * | 1989-07-06 | 1991-02-20 | Origin Electric Co Ltd | Roller for thickness detector of paper |
| JP4511316B2 (en) * | 2003-11-06 | 2010-07-28 | 昭和電工株式会社 | Work cradle and work flatness measuring apparatus equipped with the work cradle |
| JP2005288619A (en) * | 2004-03-31 | 2005-10-20 | Nippon Oil Corp | Cfrp surface table |
-
1986
- 1986-11-29 JP JP28525786A patent/JPH0820201B2/en not_active Expired - Lifetime
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6427355B1 (en) | 1999-01-14 | 2002-08-06 | Mitutoyo Corporation | Gauge block |
| US6516532B2 (en) | 1999-01-14 | 2003-02-11 | Mitutoyo Corporation | Gauge block |
| DE10001171B4 (en) * | 1999-01-14 | 2008-08-28 | Mitutoyo Corp., Kawasaki | final dimension |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS63138201A (en) | 1988-06-10 |
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