JPH08181414A - Manufacture of injection molding circuit substrate - Google Patents

Manufacture of injection molding circuit substrate

Info

Publication number
JPH08181414A
JPH08181414A JP32469594A JP32469594A JPH08181414A JP H08181414 A JPH08181414 A JP H08181414A JP 32469594 A JP32469594 A JP 32469594A JP 32469594 A JP32469594 A JP 32469594A JP H08181414 A JPH08181414 A JP H08181414A
Authority
JP
Japan
Prior art keywords
pattern
injection molded
plating
injection
resin
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP32469594A
Other languages
Japanese (ja)
Inventor
Yoshinori Ookawa
喜教 大川
Masami Maeda
正美 前田
Rikio Komagine
力夫 駒木根
Toshiaki Ichige
敏明 市毛
Shinichi Takaba
進一 高場
Toshiyuki Oaku
俊幸 大阿久
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Cable Ltd
Original Assignee
Hitachi Cable Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Cable Ltd filed Critical Hitachi Cable Ltd
Priority to JP32469594A priority Critical patent/JPH08181414A/en
Publication of JPH08181414A publication Critical patent/JPH08181414A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE: To improve bonding property and to make a pattern fine by roughening a surface by forming a secondary injection molded item to expose only a primary injection molded item and a pattern side of a substrate, and by applying electroless plating on a pattern side. CONSTITUTION: Resin mixed with electroless plating catalyst is used and a primary injection molded item is formed by projecting a pattern side 4. A substrate 5 is inserted and a secondary injection molded item 2 is formed of unmixed resin to expose only pattern sides 14, 54 of a primary injection molded item 1 and the substrate 5. Then, a surface is subjected to wet treatment and immersed in electroless copper plating solution, and foundation platings 16, 56 are formed as an electric conductor film in a surface of mixed resin shaped to correspond to the pattern parts 14, 54. Therefore, if upper platings 17, 57 consisting of Ni plating and Au plating are formed by an electroless plating method on the foundation platings 16, 56, good bonding success ratio of almost 100% can be realized and a fine pattern of a pitch of 0.15mm can be formed.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、表面にパターン状金属
層を有する射出成形回路基板の製造方法に関するもので
ある。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for manufacturing an injection molded circuit board having a patterned metal layer on its surface.

【0002】[0002]

【従来の技術】表面に電気回路パターン等として利用さ
れるパターン状金属層を有する射出成形回路基板、例え
ば、MCB(molded circuit board)、MWB(molded
wiring board)、MID(molded interconnection boa
rd)が、三次元化、配線工数低減、軽量化、スペース節
減及びコスト低下等の諸要求に沿うものとして注目され
ている。
2. Description of the Related Art An injection-molded circuit board having a patterned metal layer used as an electric circuit pattern or the like on its surface, for example, MCB (molded circuit board), MWB (molded).
wiring board), MID (molded interconnection boa)
rd) has attracted attention because it meets various requirements such as three-dimensionalization, reduction in wiring man-hours, weight reduction, space saving, and cost reduction.

【0003】上記射出成形回路基板は、例えば、特開昭
63−50482号公報に示されているように、金属め
っきが付着し難い樹脂(以下、単に「難めっき性樹脂」
という)と、金属めっきが付着し易い樹脂(以下、単に
「易めっき性樹脂」という)を利用したいわゆる2ショ
ット成形品であり、易めっき性樹脂を所定のパターンで
二次成形しその表面に金属めっきを施すことにより所定
の回路パターンを形成する。
The above-mentioned injection-molded circuit board has a resin (hereinafter, simply referred to as "difficult-to-plate resin") to which metal plating is hard to adhere, as disclosed in, for example, Japanese Patent Application Laid-Open No. 63-50482.
It is a so-called two-shot molded product that uses a resin that easily adheres to the metal plating (hereinafter simply referred to as “easy-plating resin”). A predetermined circuit pattern is formed by applying metal plating.

【0004】この射出成形回路基板を製造する場合に
は、図2の(a)のように、形成される電気回路のパタ
ーンに応じたパターン面4を突出させた一次射出成形体
1を易めっき性樹脂で成形した後、二次成形において図
2の(b)のように、パターン面4を除く一次射出成形
体1の周りを難めっき性樹脂で包囲して二次射出成形体
2を形成し、これによって射出成形品3を成形する。そ
の後、薬品により粗化処理を行ない、該処理後のパター
ン面4に無電解めっき処理を行う。この際、図2の
(d)のように難めっき性樹脂2の部分には金属が付着
せず、易めっき性樹脂であるパターン面4にのみ下地め
っき6が形成される。さらに、パターン面の表面保護や
ワイヤのボンディング性向上を図るため、このようにし
て形成された下地めっき6の上に、例えばニッケル、金
などを上めっき7として施し、当該金属めっき部分を利
用して種々の回路を形成していた。この方法は2回成形
法と呼ばれ、パターン形成の自由度が高く、3次元的に
形成できるのが特徴である。
When manufacturing this injection-molded circuit board, as shown in FIG. 2A, the primary injection-molded body 1 having a pattern surface 4 corresponding to the pattern of the electric circuit to be formed is easily plated. 2B, the secondary injection molded body 2 is formed by surrounding the primary injection molded body 1 excluding the pattern surface 4 with the non-plating resin in the secondary molding after molding with the flexible resin. Then, the injection-molded product 3 is molded by this. After that, roughening treatment is performed with a chemical, and electroless plating treatment is performed on the patterned surface 4 after the treatment. At this time, as shown in FIG. 2D, the metal does not adhere to the portion of the difficult-to-plate resin 2, and the base plating 6 is formed only on the pattern surface 4 which is the easily-platable resin. Further, in order to protect the surface of the pattern surface and improve the wire bondability, nickel plating, gold plating, or the like is applied as the upper plating 7 on the base plating 6 thus formed, and the metal plating portion is used. To form various circuits. This method is called a two-time molding method and is characterized in that it has a high degree of freedom in pattern formation and can be formed three-dimensionally.

【0005】[0005]

【発明が解決しようとする課題】しかしながら、前記し
た下地めっきは、一般に、無電解めっき法により銅めっ
きを行っていたため、その表面は非常に荒れたものとな
り、表面粗さパラメータを示すRmax(JIS:断面
曲線の最高山頂と最深谷底の間隔)で30〜50mであ
った。さらに、該下地めっき上に、無電解めっき法に比
べて平滑性に富む電解めっき法により、銅、ニッケル等
の上めっきを厚く行った場合でも、該上めっきの表面は
荒れたものとなり、その値はRmaxで10〜20μm
であった。
However, since the above-mentioned base plating is generally copper-plated by the electroless plating method, the surface thereof becomes very rough, and Rmax (JIS The distance between the highest peak and the deepest valley bottom of the sectional curve was 30 to 50 m. Furthermore, even when the upper plating of copper, nickel or the like is thickly formed on the undercoating by an electrolytic plating method which is smoother than the electroless plating method, the surface of the upper plating becomes rough. The value is 10 to 20 μm in Rmax
Met.

【0006】めっきの表面がこのように荒れていると、
上めっき上にワイヤ特に直径20μm程度の細いワイヤ
をボールボンダーによりボンディングすることは非常に
困難であり、従来、その成功率は50〜70%程度でし
かなく、実用性に難があった。
If the surface of the plating is rough like this,
It is very difficult to bond a wire, especially a thin wire having a diameter of about 20 μm, onto the upper plating by a ball bonder, and conventionally, the success rate was only about 50 to 70%, which was not practical.

【0007】このため、ボンディングの成功率を向上さ
せるべく、下地めっきの表面粗さの改善が望まれてい
た。
Therefore, in order to improve the success rate of bonding, it has been desired to improve the surface roughness of the undercoat.

【0008】また、回路パターンの幅及びピッチは、成
形上の限界、金型作製能力、樹脂流動の問題(例えば、
厚さ0.2mm以下でかつ3cm角以上の面積が大きい形状
の場合は樹脂が流れない)等により制限され、従来の2
回成形法ではせいぜい0.5mm程度が限界であり、最近
の実装部品の小型化及び高密度実装の要求に応えるべく
回路パターンのより一層のファイン化が望まれていた。
Further, the width and pitch of the circuit pattern are limited in terms of molding, mold production ability, resin flow problem (for example,
If the thickness is 0.2 mm or less and the area of 3 cm square or more is large, the resin will not flow.)
In the molding method, the limit is at most about 0.5 mm, and further finer circuit patterns have been demanded in order to meet recent demands for miniaturization and high-density mounting of mounted components.

【0009】[0009]

【課題を解決するための手段】本発明は上記の課題に鑑
み、2回成形法による回路パターン、特に立体形状の回
路パターン形成の自由度を有しながら、めっき表面の平
滑化によるボンディング性の向上およびパターンのファ
イン化の要求にも応えうる射出成形回路基板の製造方法
の提供を目的としてなされたものである。
SUMMARY OF THE INVENTION In view of the above problems, the present invention has a degree of freedom in forming a circuit pattern by a two-time molding method, particularly a three-dimensional circuit pattern, and at the same time, improves the bonding property by smoothing a plating surface. The purpose of the present invention is to provide a method for manufacturing an injection molded circuit board that can meet the demands for improvement and finer pattern.

【0010】上記目的を達成するために、本発明にかか
る射出成形回路基板の製造方法は、無電解めっき用触媒
を配合した配合樹脂を電気回路のパターンに応じたパタ
ーン面を突出させて射出成形して一次射出成形体を形成
した後、前記パターン面を除く一次射出成形体の周りに
無電解めっき用触媒を配合していない非配合樹脂を射出
成形して二次射出成形体を形成し、さらに該一次射出成
形体の表面にめっきを施すことによりパターンを形成し
てなる射出成形回路基板の製造方法において、一次射出
成形体を形成した後、めっき表面の平滑性またはファイ
ンなパターンが必要な部分に予めパターンが形成された
基板をインサートするとともに該一次射出成形体及び該
基板のパターン面のみが露出するように二次射出成形体
を形成して射出成形品を作製した後、該射出成形品表面
の粗化処理を行ない、該処理後のパターン面上に無電解
めっき法によりめっきを施す構成としたものである。
In order to achieve the above object, a method of manufacturing an injection-molded circuit board according to the present invention comprises injection-molding a compounded resin containing a catalyst for electroless plating with a pattern surface corresponding to the pattern of an electric circuit protruding. After forming a primary injection molded body, to form a secondary injection molded body by injection molding a non-blended resin not mixed with a catalyst for electroless plating around the primary injection molded body except the pattern surface, Further, in the method for producing an injection molded circuit board in which a pattern is formed by plating the surface of the primary injection molded body, after forming the primary injection molded body, smoothness of the plated surface or a fine pattern is required. A substrate on which a pattern is preliminarily formed is inserted, and a secondary injection molded body is formed so that only the pattern surface of the primary injection molded body and the substrate is exposed. After producing the goods, performs a roughening process of injection-molded article surface, is obtained by a configuration in which plating by electroless plating on the pattern surface after the treatment.

【0011】上記構成のうち、一次射出成形体1を形成
するための無電解めっき用触媒を配合した配合樹脂とし
ては、ポリエステル系合成樹脂が採用され、熱可塑性樹
脂として芳香族系ポリエステル樹脂である液晶ポリマ
(LCP)、ポリエチレンテレフタレート(PET)、
ポリブチレンテレフタレート(PBT)、またポリエー
テルサルフォン、(PES)、ポリエーテルイミド(P
EI)、あるいは芳香族ポリアミド等があげられるが、
特にこれらに限定されるものではない。また、無電解め
っき用触媒としてはパラジウム、ルテニウムが用いられ
る。
Among the above-mentioned constitutions, a polyester-based synthetic resin is adopted as a compounding resin containing a catalyst for electroless plating for forming the primary injection molded body 1, and an aromatic polyester resin is used as a thermoplastic resin. Liquid crystal polymer (LCP), polyethylene terephthalate (PET),
Polybutylene terephthalate (PBT), polyether sulfone, (PES), polyether imide (PBT)
EI), aromatic polyamide, etc.
It is not particularly limited to these. Further, palladium and ruthenium are used as the electroless plating catalyst.

【0012】一方、二次射出成形体2を形成するための
非配合樹脂としては、ポリフェニレンスルフィド(PP
S)が適しているが、特にこれに限定されるものではな
く、配合樹脂の粗化に用いる薬品に対する耐性を有する
ものであれば良い。例えば、配合樹脂として芳香族系ポ
リエステル樹脂を用いた場合には、PPSのほか、アル
カリに強いPES、PEI等が使用できる。なお、一次
射出成形及び二次射出成形は、金型等を用いて行う。
On the other hand, polyphenylene sulfide (PP) is used as a non-blended resin for forming the secondary injection molded body 2.
Although S) is suitable, it is not particularly limited thereto, and any material having resistance to a chemical used for roughening the compounded resin may be used. For example, when an aromatic polyester resin is used as the compounding resin, PES, PEI, PEI, etc. which are resistant to alkali can be used in addition to PPS. The primary injection molding and the secondary injection molding are performed using a mold or the like.

【0013】インサートする基板は、一般的に知られて
いるプリント基板の製造方法によって形成すれば良い。
該基板を形成する材料としてはフェノール含浸紙、エポ
キシ含浸紙、エポキシ含浸ガラス布、ポリイミド含浸ガ
ラス、熱可塑性樹脂(LCP、PET、PBT、PES
等)、熱硬化性樹脂(フェノール、エポキシ等)、ポリ
イミドフィルム等が挙げられる。これらの材料を用いて
平板状に成形してその表面に銅(電解銅、圧延銅)など
の電気導体被膜を形成し、この電気導体被膜上の電気導
体回路として残る部分にレジスト膜を形成した後、化学
的にレジスト膜のない部分の電気導体被膜を除去するサ
ブトラクト法によって回路パターンを形成する。
The board to be inserted may be formed by a generally known method for manufacturing a printed board.
As a material for forming the substrate, phenol-impregnated paper, epoxy-impregnated paper, epoxy-impregnated glass cloth, polyimide-impregnated glass, thermoplastic resin (LCP, PET, PBT, PES)
Etc.), thermosetting resins (phenol, epoxy, etc.), polyimide films and the like. A flat plate was formed using these materials, an electric conductor coating film of copper (electrolytic copper, rolled copper) or the like was formed on the surface, and a resist film was formed on the portion of the electric conductor coating film that remained as an electric conductor circuit. After that, a circuit pattern is formed by a subtraction method of chemically removing the electric conductor coating film in the portion without the resist film.

【0014】なお、該基板の形状は平板状に限定される
ものではなく、立体的な形状、例えば2.5次元的な形
状でも構わない。また、回路形成にあたっては上記方法
に限らず露光法やアディティブ法により行なうこともで
きる。
The shape of the substrate is not limited to a flat plate, but may be a three-dimensional shape, for example, a 2.5-dimensional shape. Further, the circuit formation can be performed not only by the above method but also by an exposure method or an additive method.

【0015】さらに導体表面の平滑性を求める場合に
は、パターンの形状に打ち抜いた銅バーを用いても良
い。
Further, when the smoothness of the conductor surface is required, a copper bar punched out in the shape of the pattern may be used.

【0016】[0016]

【作用】本発明は上記の構成としたことにより、2回成
形法による回路パターン、特に立体形状の回路パターン
形成の自由度を有しながらも、めっき表面の平滑性に優
れ、ボンディング性が向上し、かつ0.1mmピッチ程度
のファインなパターンを有する射出成形回路基板を形成
することが可能となる。
According to the present invention having the above-described structure, the plating surface is excellent in smoothness and the bonding property is improved while having a degree of freedom in forming a circuit pattern by the double molding method, particularly a three-dimensional circuit pattern. In addition, it becomes possible to form an injection molded circuit board having a fine pattern of about 0.1 mm pitch.

【0017】[0017]

【実施例】以下、本発明に係る射出成形回路基板の製造
方法の好適実施例を、図1(a)〜(f)を用いて説明
する。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS A preferred embodiment of a method for manufacturing an injection molded circuit board according to the present invention will be described below with reference to FIGS.

【0018】まず、無電解めっき用触媒を配合した配合
樹脂として、LCP(液晶ポリマー)であるLCX−2
49(ヘキストセラニーズ株式会社製、商品名)を用い
て、金型により電気回路のパターンに応じたパターン面
4を突出させて射出成形し、一次射出成形体1を形成し
た(図1(a))。
First, as a compounding resin compounded with a catalyst for electroless plating, LCP-2 which is LCP (liquid crystal polymer)
49 (manufactured by Hoechst Celanese Co., Ltd., product name) was used to project the pattern surface 4 corresponding to the pattern of the electric circuit with a mold and injection molding was performed to form a primary injection molded body 1 (FIG. )).

【0019】二次射出成形体2を形成する際にインサー
トする基板5として、厚さ25μmのポリイミド樹脂上
に厚さ25μmの電解銅箔を接合させた2層式メタルク
ラッドフィルムであるMCF−5000I(日立化成工
業株式会社製、商品名)を用い、上記サブトラクト法に
よりピッチ0.15mmのパターンを形成した(図1
(b))。
A MCF-5000I, which is a two-layer metal clad film in which a 25 μm-thick electrolytic copper foil is bonded onto a 25 μm-thick polyimide resin as a substrate 5 to be inserted when the secondary injection-molded article 2 is formed. (Hitachi Chemical Co., Ltd., trade name) was used to form a pattern with a pitch of 0.15 mm by the subtract method (FIG. 1).
(B)).

【0020】次に、基板5をインサートするとともに、
無電解めっき用触媒を配合していない非配合樹脂である
PPS(ポリフェニレンスルフィド)としてC−100
HG(出光石油化学株式会社製、商品名)を、該一次射
出成形体1及び該基板5のパターン面14,54のみが
露出するように射出成形して二次射出成形体2を形成
し、射出成形品3を作製した(図1(c))。
Next, while inserting the substrate 5,
C-100 as PPS (polyphenylene sulfide), which is a non-blended resin that does not contain a catalyst for electroless plating
HG (trade name, manufactured by Idemitsu Petrochemical Co., Ltd.) is injection-molded so that only the pattern surfaces 14 and 54 of the primary injection molded body 1 and the substrate 5 are exposed to form a secondary injection molded body 2. An injection molded product 3 was produced (Fig. 1 (c)).

【0021】さらに、上記射出成形品3の表面を湿式処
理、具体的には、11 mol/l、温度70℃の水酸化カ
リウム溶液中で30分間粗化した後、塩化水素で中和処
理を実施し(図1(d))、この湿式処理後の射出成形
品3を無電解銅めっき液である■562(KOLLMO
RGEN CO.製、商品名)中に浸漬させ、パターン
部14,54に対応する形状の配合樹脂の表面に、無電
解めっき法により電気導体被膜として下地めっき(銅め
っき)16,36を30μm形成した(図1(e))。
Further, the surface of the injection-molded article 3 is wet-processed, specifically, after roughening for 30 minutes in a potassium hydroxide solution at 11 mol / l and a temperature of 70 ° C., it is neutralized with hydrogen chloride. (FIG. 1 (d)), the injection-molded article 3 after the wet treatment was treated with an electroless copper plating solution (562) (KOLLMO).
RGEN CO. Manufactured, product name), and base plating (copper plating) 16 and 30 μm was formed as an electric conductor coating on the surface of the compound resin having a shape corresponding to the pattern portions 14 and 54 by an electroless plating method (Fig. 1 (e)).

【0022】この時点で下地めっきの表面粗さを測定し
てみると、プラスチック成形品上に直接めっきを施した
下地めっき16は、Rmax(JIS:最大高さ)が3
0〜50μm、Rz(JIS:十点平均粗さ)が20μ
m、Ra(JIS:中心線平均粗さ)が3μmであった
のに対し、電解銅箔上に施した下地めっき56は、Rm
axが7μm、Rzが5μm、Raが0.5μmであ
り、前者よりもめっき表面が格段に平滑化した。
At this point, the surface roughness of the undercoating was measured. As a result, the undercoating 16 which was directly plated on the plastic molded product had an Rmax (JIS: maximum height) of 3
0-50 μm, Rz (JIS: 10-point average roughness) 20 μ
m, Ra (JIS: center line average roughness) was 3 μm, whereas the base plating 56 applied on the electrolytic copper foil was Rm.
The ax was 7 μm, the Rz was 5 μm, and the Ra was 0.5 μm, and the plated surface was much smoother than the former.

【0023】これら両者の表面粗さの差は、下地めっ
き前のプラスチック表面は、ピール強度を得るために既
にRmaxが数10μmである(図3)のに対し、銅箔
表面のそれは5μm程度である(図4)。めっきの析
出開始に関し、プラスチック表面への析出の場合は、プ
ラスチック上に散在する触媒から部分的に成長が起こり
(図5(a))、隣接する成長部分と融合することで面
状の成長となっていく(同(b)ないし(c))ため、
めっき表面に凹凸が残るのに対し、銅箔表面への析出の
場合は、すべての点でめっきの析出が開始するためめっ
き表面が平坦となる(図6(a)ないし(c))ことに
起因する。
The difference in surface roughness between these two is that the Rmax is already several tens of μm for obtaining the peel strength on the plastic surface before undercoating (FIG. 3), whereas that of the copper foil surface is about 5 μm. Yes (Fig. 4). Regarding the start of plating deposition, in the case of deposition on the plastic surface, partial growth occurs from the catalyst scattered on the plastic (Fig. 5 (a)), and planar growth is achieved by fusing with adjacent growth parts. Because ((b) to (c))
While the unevenness remains on the plating surface, in the case of deposition on the copper foil surface, the deposition starts at all points and the plating surface becomes flat (Fig. 6 (a) to (c)). to cause.

【0024】さらに、該下地めっき16,56上に無電
解めっき法によりNiめっき3μm、Auめっき0.3
μmからなる上めっき17,57を形成して射出成形回
路基板を得た。
Further, Ni plating 3 μm, Au plating 0.3 on the undercoat plating 16, 56 by electroless plating.
The upper plating 17, 57 of μm was formed to obtain an injection molded circuit board.

【0025】このようにして形成した該射出成形回路基
板のパターン上に直径20μmの金ワイヤをボンディン
グしたところ、一次射出成形体1上に施した上めっき1
7へのボンディング成功率は20%であったのに対し、
インサートした基板5上に施した上めっき57へのボン
ディング成功率はほぼ100%と良好であった。
When a gold wire having a diameter of 20 μm was bonded onto the pattern of the injection molded circuit board thus formed, the upper plating 1 applied on the primary injection molded body 1
While the success rate of bonding to 7 was 20%,
The success rate of bonding to the upper plating 57 applied on the inserted substrate 5 was good at almost 100%.

【0026】また、該基板5上のパターンはインサート
した時点で形成された形状がそのまま最終的なパターン
となるため、ピッチ0.15mmのファインなパターンが
形成できた。
Since the pattern formed on the substrate 5 is the final pattern as it is when it is inserted, a fine pattern with a pitch of 0.15 mm can be formed.

【0027】[0027]

【発明の効果】本発明は上記の構成としたことにより、
2回成形法による回路パターン、特に立体形状の回路パ
ターン形成の自由度を有しながらも、めっき表面の平滑
性に優れ、ボンディング性が向上し、かつ0.1mmピッ
チ程度のファインなパターンを有する射出成形回路基板
を形成することが可能となる。
According to the present invention having the above-mentioned constitution,
Despite having the freedom to form a circuit pattern, especially a three-dimensional circuit pattern by the double molding method, the plating surface is excellent in smoothness, bonding property is improved, and a fine pattern of about 0.1 mm pitch is provided. It becomes possible to form an injection molded circuit board.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の実施例に係る射出成形回路基板の製造
工程を示す横断面説明図である。
FIG. 1 is a cross-sectional explanatory view showing a manufacturing process of an injection molded circuit board according to an embodiment of the present invention.

【図2】従来の射出成形回路基板の製造工程を示す横断
面説明図である。
FIG. 2 is a cross-sectional explanatory view showing a manufacturing process of a conventional injection molded circuit board.

【図3】プラスチック表面の拡大横断面説明図である。FIG. 3 is an enlarged cross-sectional explanatory view of a plastic surface.

【図4】銅箔表面の拡大横断面説明図である。FIG. 4 is an enlarged cross-sectional explanatory view of a copper foil surface.

【図5】プラスチック表面におけるめっきの成長を示す
模式説明図である。
FIG. 5 is a schematic explanatory view showing the growth of plating on the plastic surface.

【図6】銅箔表面におけるめっきの成長を示す模式説明
図である。
FIG. 6 is a schematic explanatory view showing the growth of plating on the surface of a copper foil.

【符号の説明】[Explanation of symbols]

1 一次射出成形体 2 二次射出成形体 3 射出成形品 4,14,54 パターン面 5 基板 6,16,56 下地めっき 7,17,57 上めっき 8 プラスチック 9 銅箔 1 Primary injection molded product 2 Secondary injection molded product 3 Injection molded product 4,14,54 Pattern surface 5 Substrate 6,16,56 Undercoat 7,17,57 Top plating 8 Plastic 9 Copper foil

───────────────────────────────────────────────────── フロントページの続き (72)発明者 市毛 敏明 茨城県日立市日高町5丁目1番1号 日立 電線株式会社日高工場内 (72)発明者 高場 進一 茨城県日立市日高町5丁目1番1号 日立 電線株式会社日高工場内 (72)発明者 大阿久 俊幸 茨城県日立市日高町5丁目1番1号 日立 電線株式会社日高工場内 ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Inventor Toshiaki Ichige 5-1-1 Hidakacho, Hitachi City, Ibaraki Prefecture Hitachi Cable Co., Ltd. Hidaka Plant (72) Inventor Shinichi Takaba Hidaka, Hitachi City, Ibaraki Prefecture 5-1-1, Machi, Hitachi Cable, Hidaka Factory (72) Inventor Toshiyuki Oaku 5-1-1, Hidaka-cho, Hitachi City, Ibaraki Hitachi Cable, Hidaka Factory

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】無電解めっき用触媒を配合した配合樹脂を
電気回路のパターンに応じたパターン面を突出させて射
出成形して一次射出成形体を形成した後、前記パターン
面を除く一次射出成形体の周りに無電解めっき用触媒を
配合していない非配合樹脂を射出成形して二次射出成形
体を形成し、さらに該一次射出成形体の表面にめっきを
施すことによりパターンを形成してなる射出成形回路基
板の製造方法において、一次射出成形体を形成した後、
めっき表面の平滑性またはファインなパターンが必要な
部分に予めパターンが形成された基板をインサートする
とともに該一次射出成形体及び該基板のパターン面のみ
が露出するように二次射出成形体を形成して射出成形品
を作製した後、該射出成形品表面の粗化処理を行ない、
該処理後のパターン面上に無電解めっき法によりめっき
を施してなることを特徴とする射出成形回路基板の製造
方法。
1. A primary injection molded article is formed by injection molding a compounded resin containing a catalyst for electroless plating with a pattern surface corresponding to the pattern of an electric circuit protruding to form a primary injection molded body, and then primary injection molding excluding the pattern surface. A non-blended resin that does not contain a catalyst for electroless plating is injection molded around the body to form a secondary injection molded body, and a pattern is formed by plating the surface of the primary injection molded body. In the method of manufacturing an injection-molded circuit board, which comprises:
Insert a substrate on which a pattern is formed in advance on the surface of the plating where smoothness or a fine pattern is required, and form a secondary injection molded body so that only the primary injection molded body and the pattern surface of the substrate are exposed. After producing an injection-molded product by performing the roughening treatment of the injection-molded product surface,
A method for manufacturing an injection molded circuit board, characterized in that the pattern surface after the treatment is plated by an electroless plating method.
JP32469594A 1994-12-27 1994-12-27 Manufacture of injection molding circuit substrate Pending JPH08181414A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP32469594A JPH08181414A (en) 1994-12-27 1994-12-27 Manufacture of injection molding circuit substrate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP32469594A JPH08181414A (en) 1994-12-27 1994-12-27 Manufacture of injection molding circuit substrate

Publications (1)

Publication Number Publication Date
JPH08181414A true JPH08181414A (en) 1996-07-12

Family

ID=18168696

Family Applications (1)

Application Number Title Priority Date Filing Date
JP32469594A Pending JPH08181414A (en) 1994-12-27 1994-12-27 Manufacture of injection molding circuit substrate

Country Status (1)

Country Link
JP (1) JPH08181414A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100925761B1 (en) * 2008-03-11 2009-11-11 삼성전기주식회사 Fabrication method of printed circuit board
US8020289B2 (en) 2009-03-25 2011-09-20 Denso Corporation Method of producing electronic device
US11362248B2 (en) 2019-07-25 2022-06-14 Nichia Corporation Method of manufacturing light-emitting device, light-emitting device, element mounting wiring board

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100925761B1 (en) * 2008-03-11 2009-11-11 삼성전기주식회사 Fabrication method of printed circuit board
US8020289B2 (en) 2009-03-25 2011-09-20 Denso Corporation Method of producing electronic device
US11362248B2 (en) 2019-07-25 2022-06-14 Nichia Corporation Method of manufacturing light-emitting device, light-emitting device, element mounting wiring board
US11791448B2 (en) 2019-07-25 2023-10-17 Nichia Corporation Light-emitting device and element mounting wiring board

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