JPH0817999A - Semiconductor device - Google Patents

Semiconductor device

Info

Publication number
JPH0817999A
JPH0817999A JP6166391A JP16639194A JPH0817999A JP H0817999 A JPH0817999 A JP H0817999A JP 6166391 A JP6166391 A JP 6166391A JP 16639194 A JP16639194 A JP 16639194A JP H0817999 A JPH0817999 A JP H0817999A
Authority
JP
Japan
Prior art keywords
metal member
input
semiconductor chip
semiconductor device
semiconductor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP6166391A
Other languages
Japanese (ja)
Other versions
JP2551385B2 (en
Inventor
Kazuyoshi Kamimura
和義 上村
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp filed Critical NEC Corp
Priority to JP6166391A priority Critical patent/JP2551385B2/en
Publication of JPH0817999A publication Critical patent/JPH0817999A/en
Application granted granted Critical
Publication of JP2551385B2 publication Critical patent/JP2551385B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/44Structure, shape, material or disposition of the wire connectors prior to the connecting process
    • H01L2224/45Structure, shape, material or disposition of the wire connectors prior to the connecting process of an individual wire connector
    • H01L2224/45001Core members of the connector
    • H01L2224/45099Material
    • H01L2224/451Material with a principal constituent of the material being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof
    • H01L2224/45138Material with a principal constituent of the material being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof the principal constituent melting at a temperature of greater than or equal to 950°C and less than 1550°C
    • H01L2224/45144Gold (Au) as principal constituent
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/4805Shape
    • H01L2224/4809Loop shape
    • H01L2224/48091Arched
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/481Disposition
    • H01L2224/48151Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/48221Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/48245Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic
    • H01L2224/48247Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic connecting the wire to a bond pad of the item
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/49Structure, shape, material or disposition of the wire connectors after the connecting process of a plurality of wire connectors
    • H01L2224/491Disposition
    • H01L2224/4912Layout
    • H01L2224/49175Parallel arrangements
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/15Details of package parts other than the semiconductor or other solid state devices to be connected
    • H01L2924/181Encapsulation

Abstract

PURPOSE:To reduce deterioration of the operating efficiency of parallel operation elements, which is caused by an electrical phase difference between input or output signals in the parallel operation of an arbitrary number of the semiconductor elements. CONSTITUTION:A semiconductor device has a first metal member 2 mounted with a semiconductor chip 1 and a second metal member 3 or 4, which is connected with input or output electrodes of the chip 1 by bonding using metal wires or the like, recessed and projected parts 19, 19' and 20 and 20' are provided in and on arbitrary places on the second metal members, an electrical phase difference between electrical signals, which are inputted in a plurality of the input electrodes, or an electrical phase difference between electrical signals, which are outputted from a plurality of the output electrodes, is reduced and the operating efficiency of parallel operation elements is improved.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、半導体装置に関し、特
に複数の半導体素子を並列に配置した配列運転型半導体
装置に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a semiconductor device, and more particularly to an array operation type semiconductor device in which a plurality of semiconductor elements are arranged in parallel.

【0002】[0002]

【従来の技術】複数個の半導体素子を並列に配置し、並
列運転させる半導体装置ではその装置の動作効率を高め
るために、並列配置された半導体素子の入力及び出力信
号の電気的位相をそろえることが従来より課題であっ
た。例えば、2つのトランジスタを並列運転させ、1つ
のトランジスタが出しうる電力の2倍の電力を得る増幅
器等を作る場合、2つのトランジスタに入力される信号
に位相差:ψがあると、信号をsin波と仮定して2つ
の信号の合成波Aは、A=sinθ+sin(θ−ψ)
となる。一方、位相差がない理想的な場合の合成波B
は、B=2sinθであるから動作効率として上記合成
波A、Bの電力比を考えると、[数1]である。
2. Description of the Related Art In a semiconductor device in which a plurality of semiconductor elements are arranged in parallel and operated in parallel, the electrical phases of input and output signals of the semiconductor elements arranged in parallel are aligned in order to enhance the operation efficiency of the device. Has been a problem than before. For example, when operating two transistors in parallel and making an amplifier that obtains twice the electric power that one transistor can output, if the signals input to the two transistors have a phase difference of ψ, the signal will be sin Assuming a wave, the composite wave A of the two signals is A = sin θ + sin (θ−ψ)
Becomes On the other hand, the composite wave B in the ideal case with no phase difference
Since B = 2 sin θ, when the power ratio of the composite waves A and B is considered as the operation efficiency, it is [Equation 1].

【数1】 [Equation 1]

【0003】ここで、[数1]の式を簡単化するため
に、積分範囲を0→πにとって、かっこ内を計算すると
[数2]となる。
Here, in order to simplify the equation of [Equation 1], the inside of the parentheses is calculated as [Equation 2] with the integration range of 0 → π.

【数2】 例えばψ=30°の位相差があると、本来出しうる出力
の87%でしか動作しない。
[Equation 2] For example, if there is a phase difference of ψ = 30 °, only 87% of the output that can be originally output operates.

【0004】この並列運転型半導体装置の電気的位相差
を軽減する従来技術として特開昭63−141328及
び特開昭63−224247などの半導体装置が提案さ
れている。図7は、特開昭63−141328の半導体
装置の構成で、外周器(37)上に形成されたマウント
エリア(31)上に半導体チップ(30a)〜(30
e)(ここではバイポーラトランジスタ)をアーチ状に
配列マウントし、入力リード(33)から半導体チップ
の入力電極(ベース)(42a)〜(42e)までMO
Sコンデンサ(32)を介して、ボンディングされた金
属ワイヤ(38a)〜(38e)、及び(39a)〜
(39e)のワイヤ長がそれぞれの半導体チップ(30
a)〜(30e)に対し等しくなる様構成し、入力信号
の位相差を軽減している。なお、(34)は出力端子、
(35)は絶縁層、(36)は接地電極(金属層)、
(40a)〜(40e)、(41a)〜(41d)は金
属ワイヤである。
As a conventional technique for reducing the electrical phase difference of this parallel operation type semiconductor device, semiconductor devices such as JP-A-63-141328 and JP-A-63-224247 have been proposed. FIG. 7 shows the structure of the semiconductor device disclosed in Japanese Patent Laid-Open No. 63-141328.
e) (here, bipolar transistors) are arrayed and mounted in an arch shape, and MO is applied from the input lead (33) to the input electrodes (base) (42a) to (42e) of the semiconductor chip.
Metal wires (38a) to (38e) and (39a) to which are bonded via the S capacitor (32).
The wire length of (39e) is the same for each semiconductor chip (30
A) to (30e) are made equal to reduce the phase difference of the input signals. In addition, (34) is an output terminal,
(35) is an insulating layer, (36) is a ground electrode (metal layer),
(40a) to (40e) and (41a) to (41d) are metal wires.

【0005】図8(a)(b)は、図7の半導体装置を
モールド型半導体装置に適用したもので、第1の金属部
材(2)上に半導体チップ(30a)〜(30e)をア
ーチ状にマウントし、入力電極(42a)〜(42e)
と、第2の金属部材(3)を金属ワイヤ(45a)〜
(45e)でボンディング接続しており、半導体チップ
(30a)〜(30e)の接地電極(エミッタ)(43
a)〜(43e)はもう一つの第2の金属部材(47)
に金属ワイヤ(46a)〜(46e)でボンディングさ
れている。モールドエリア(8)に充填されたモールド
樹脂(9)により半導体チップ、金属ワイヤ、第1及び
第2の金属部材が固定されている。なお(13)は入力
端子、(14)は出力端子である。また図8(b)は、
チップ(30a)〜(30e)の電極説明図である。
FIGS. 8 (a) and 8 (b) are obtained by applying the semiconductor device of FIG. 7 to a mold type semiconductor device, in which semiconductor chips (30a) to (30e) are arched on a first metal member (2). Mounted in a rectangular shape, and input electrodes (42a) to (42e)
And the second metal member (3) to the metal wire (45a) to
(45e) is connected by bonding, and the ground electrodes (emitters) (43) of the semiconductor chips (30a) to (30e) are connected.
a) to (43e) is another second metal member (47)
Are bonded with metal wires (46a) to (46e). The semiconductor resin, the metal wire, and the first and second metal members are fixed by the mold resin (9) filled in the mold area (8). Note that (13) is an input terminal and (14) is an output terminal. In addition, FIG.
It is an electrode explanatory view of chips (30a)-(30e).

【0006】図9は、特開昭63−224247の半導
体装置の構成で、外周器(37)上に形成されたマウン
トエリア(31)上に半導体チップ(30a)〜(30
d)がマウントされ入力電極(42a)〜(42d)
と、入力リード(33)との間に、MOSコンデンサ
(32′)(32" )をマウントし、そのMOSコンデ
ンサを介し、ボンディングワイヤ(44)(38a)〜
(38b)(39a)〜(39d)がトーナメント状に
ボンディングして、入力リード(33)から半導体チッ
プの入力電極(42a)〜(42d)までのボンディン
グワイヤ長を等しくなる様構成し、入力信号の位相差を
軽減している。なお図9の(34)は出力端子、(3
5)は絶縁層、(36)は接地電極、(37)外周器で
ある。
FIG. 9 shows the structure of the semiconductor device disclosed in JP-A-63-224247, in which semiconductor chips (30a) to (30) are mounted on a mount area (31) formed on a peripheral device (37).
d) is mounted and the input electrodes (42a) to (42d) are mounted.
And the input lead (33), the MOS capacitors (32 ') (32 ") are mounted, and the bonding wires (44) (38a) to
(38b) (39a) to (39d) are bonded in a tournament shape so that the bonding wire lengths from the input lead (33) to the input electrodes (42a) to (42d) of the semiconductor chip are equal, and the input signal is The phase difference of is reduced. Note that (34) in FIG. 9 is an output terminal and (3
5) is an insulating layer, (36) is a ground electrode, and (37) is a peripheral device.

【0007】図10は、図9の半導体装置をモールド型
半導体装置に応用したもので、トーナメント配線の一部
を第2の金属部材(3)で置き換えたものである。第1
の金属部材(2)上に、半導体チップ(30a)〜(3
0d)がマウントされ、そのチップ上入力電極(42
a)〜(42d)と、第2の金属部材(3)が金属ワイ
ヤ(45a)〜(45d)により接続されている。入力
リード(13)から入力端子(42a)〜(42d)ま
では、第2の金属部材(3)を金属ワイヤ(45a)〜
(45d)により、トーナメント状に配線されており、
接地電極(43a)〜(43d)はもう一つの第2の金
属部材(47)に金属ワイヤ(46a)〜(46d)で
ボンディングされている。モールドエリア(8)に充填
されたモールド樹脂(9)により半導体チップ、金属ワ
イヤ、第1及び第2の金属部材が固定されている。
FIG. 10 is an application of the semiconductor device of FIG. 9 to a mold type semiconductor device in which a part of the tournament wiring is replaced with a second metal member (3). First
On the metal member (2) of the semiconductor chips (30a) to (3)
0d) is mounted and the input electrode (42
a) to (42d) and the second metal member (3) are connected by metal wires (45a) to (45d). From the input lead (13) to the input terminals (42a) to (42d), the second metal member (3) is connected to the metal wires (45a) to (42a).
By (45d), it is wired like a tournament,
The ground electrodes (43a) to (43d) are bonded to the other second metal member (47) with metal wires (46a) to (46d). The semiconductor resin, the metal wire, and the first and second metal members are fixed by the mold resin (9) filled in the mold area (8).

【0008】[0008]

【発明が解決しようとする課題】以上説明した様に、従
来の並列運転型の半導体装置は、半導体チップのマウン
ト位置やワイヤボンディングの構成を工夫して入力信号
の位相差を軽減していた。しかし、特開昭63−141
328の半導体装置は、半導体チップをアーチ状にマウ
ントするためにマウントエリアの幅(図7のM及び図8
のM′部)は半導体チップを直線状にマウントする場合
に比べて広くする必要があり、装置の小型化に不都合で
あった。このことは並列配置する半導体チップの数が増
えるほど顕著になる。
As described above, in the conventional parallel operation type semiconductor device, the phase difference between the input signals is reduced by devising the mounting position of the semiconductor chip and the wire bonding structure. However, JP-A-63-141
In the semiconductor device 328, the width of the mounting area (M in FIG. 7 and FIG. 8) for mounting the semiconductor chip in an arch shape.
It is necessary to make the M'section) wider than in the case where the semiconductor chip is linearly mounted, which is inconvenient for downsizing of the device. This becomes remarkable as the number of semiconductor chips arranged in parallel increases.

【0009】さらに、特開昭63−141328の半導
体チップをアーチ状にマウントすることにより直線状に
マウントした時に生ずるボンディングワイヤ長の差(中
心部より外側へ行くほどボンディングワイヤが長くな
る)を補正しているが、FETのように入力側の他に出
力側も入力同様のボンディングワイヤによって配線する
必要がある場合、入力側で位相を合わせたアーチ構成で
は出力側においては中心部よりも外側のボンディングワ
イヤがさらに長くなるため、位相補正ができない。従っ
て、FETの様な、入出力同時の位相補正が必要な場合
に特開昭63−141328は適用できない。
Further, the semiconductor chip of Japanese Patent Laid-Open No. 63-141328 is mounted in an arch shape so as to correct the difference in the bonding wire length (the bonding wire becomes longer from the center to the outside) when linearly mounted. However, when it is necessary to wire not only the input side but also the output side by a bonding wire similar to the input like the FET, in the arch configuration in which the phases are matched on the input side, the output side is outside the center part. Since the bonding wire becomes longer, the phase cannot be corrected. Therefore, Japanese Patent Laid-Open No. 63-141328 cannot be applied to the case where a phase correction for simultaneous input and output is required, such as an FET.

【0010】また、特開昭63−224247は、入力
リードから半導体チップまでの配線をトーナメント状に
構成するために、トーナメントエリアの幅(図9のN及
び図10のN′部)が必要であり、並列配置の半導体チ
ップの数が増えると、トーナメントエリアを広くとる必
要が生じ、装置の小型化に不都合を生じる。また、この
特開昭63−224247の構成では、モスコンデンサ
を仲介としてボンディングワイヤをトーナメントにボン
ディングすることにより外部入力端から半導体チップま
での信号位相をそろえているため、適用できる半導体チ
ップの素子数は2ケ並列、4ケ並列、87ケ並列...
ケ並列の素子であり、奇数個素子の並列運転には適
用できない。例えば3ケ並列素子の場合、中間に配置す
る素子への外部入力端子から半導体チップ入力端子まで
の総合位相長が、他の2つの素子(両側に配置される素
子)に比べて短くなって、位相がそろわない。
Further, in Japanese Patent Laid-Open No. 63-224247, the width of the tournament area (N in FIG. 9 and N'in FIG. 10) is required in order to configure the wiring from the input lead to the semiconductor chip in a tournament shape. However, if the number of semiconductor chips arranged in parallel increases, it becomes necessary to secure a large tournament area, which causes inconvenience in downsizing of the device. Further, in the configuration of this Japanese Patent Laid-Open No. 63-224247, the signal phase from the external input terminal to the semiconductor chip is aligned by bonding the bonding wire to the tournament by using the moss capacitor as an intermediary. 2 parallels, 4 parallels, 87 parallels. . .
These are 2 n parallel elements and cannot be applied to parallel operation of an odd number of elements. For example, in the case of three parallel elements, the total phase length from the external input terminal to the element arranged in the middle to the semiconductor chip input terminal becomes shorter than the other two elements (elements arranged on both sides), The phases are not aligned.

【0011】[0011]

【課題を解決するための手段】本発明は、複数の高周波
信号入力あるいは出力端子をもつ半導体チップと、この
半導体チップがマウントされる第1の金属部材と、前記
半導体チップに金属ワイヤ等のボンディングで接続さ
れ、前記半導体チップを外周回路と電気的に接続する第
2の金属部材とが、モールド樹脂により固定されている
半導体装置において、前記半導体チップの複数の高周波
信号入力端子に、外周回路から入力される高周波信号の
電気的位相がそろうように、あるいは前記半導体チップ
の複数の高周波信号出力端子から外部回路へ出力される
高周波信号の電気的位相がそろうように、第2の金属部
材の任意の箇所に凹凸部を設けたことを特徴とする半導
体装置である。
SUMMARY OF THE INVENTION The present invention is directed to a semiconductor chip having a plurality of high frequency signal input or output terminals, a first metal member on which the semiconductor chip is mounted, and bonding of a metal wire or the like to the semiconductor chip. And a second metal member electrically connecting the semiconductor chip to the outer peripheral circuit is fixed by a molding resin, the plurality of high frequency signal input terminals of the semiconductor chip are connected to the outer peripheral circuit from the outer peripheral circuit. Any of the second metal members may be used so that the electric phases of the high-frequency signals that are input are aligned with each other, or that the high-frequency signals that are output from the plurality of high-frequency signal output terminals of the semiconductor chip to the external circuit are aligned with each other. The semiconductor device is characterized in that a concave-convex portion is provided at the location.

【0012】また、上記半導体装置における複数の高周
波信号入力あるいは出力端子をもつ半導体チップの代わ
りに、1つの高周波信号入力あるいは出力端子をもつ半
導体チップを複数個マウントしている半導体装置であ
る。また、本発明の半導体装置は、第2の金属部材が、
単一の入力端子が分岐されて複数の入力端子群となるも
ので複数個の半導体チップと、各々ボンディングで接続
されており、前記分岐された複数の入力端子群の内、前
記単一の入力端子に近い入力端子群に凹凸部を設けたこ
とを特徴とするものである。また、本発明の半導体装置
は、第2の金属部材が、複数の出力端子群が統合されて
単一の出力端子となるもので、複数個の半導体チップと
複数の出力端子が各々ボンディングで接続されており、
前記複数の出力端子群の内、前記単一の出力端子に近い
入力端子群に凹凸部を設けたことを特徴とするものであ
る。また、本発明の半導体装置は、第2の金属部材に設
けられた凹凸部が、その高さを変えることで複数の端子
群間の位相差を調整することを特徴とするものである。
In addition, instead of the semiconductor chip having a plurality of high frequency signal input or output terminals in the above semiconductor device, a plurality of semiconductor chips having one high frequency signal input or output terminal are mounted. Further, in the semiconductor device of the present invention, the second metal member is
A single input terminal is branched to form a plurality of input terminal groups, each of which is connected to a plurality of semiconductor chips by bonding, and the single input is selected from the plurality of branched input terminal groups. It is characterized in that an uneven portion is provided on the input terminal group close to the terminals. Further, in the semiconductor device of the present invention, the second metal member is formed by integrating a plurality of output terminal groups into a single output terminal, and the plurality of semiconductor chips and the plurality of output terminals are connected by bonding. Has been done,
Among the plurality of output terminal groups, an uneven portion is provided on an input terminal group close to the single output terminal. Further, the semiconductor device of the present invention is characterized in that the uneven portion provided on the second metal member adjusts the phase difference between the plurality of terminal groups by changing the height thereof.

【0013】[0013]

【作用】本発明においては、従来の並列運転型半導体装
置に対して本発明の半導体装置は、半導体チップをマウ
ントする第1の金属部材と、半導体チップの入力あるい
は出力電極と、金属ワイヤ等で電気的に接続された第2
の金属部材を有し、第2の金属部材の任意の箇所に凹凸
を設けているので、第2の金属部材と半導体チップの複
数の入力あるいは出力電極の位置関係による電気的位相
の差を部分的に任意の位置に設けた第2の金属部材の凹
凸部により補正し、半導体チップに入力される、あるい
は半導体チップから出力される電気信号の位相差を軽減
することができるものである。
According to the present invention, in contrast to the conventional parallel operation type semiconductor device, the semiconductor device of the present invention includes the first metal member for mounting the semiconductor chip, the input or output electrode of the semiconductor chip, and the metal wire. Second electrically connected
Since the second metal member is provided with the unevenness at any position, the difference in electrical phase due to the positional relationship between the second metal member and the plurality of input or output electrodes of the semiconductor chip is partly affected. It is possible to reduce the phase difference of the electric signal input to the semiconductor chip or output from the semiconductor chip by correcting the unevenness of the second metal member provided at an arbitrary position.

【0014】[0014]

【実施例】次に本発明の実施例について図面を参照して
説明する。 [実施例1]図1は、本発明の第1の実施例の半導体装
置でその平面図であり、図2(a)は、図1のA−A′
断面図、図2(b)は図1の半導体チップの電極を示す
図である。半導体チップ(1)(ここではFET)が第
1の金属部材(2)上にAuSnロー材等を用いてマウ
ントされており、半導体チップ(1)は図2(b)に詳
細を示すように4つの入力電極(10a)〜(10d)
(ゲート電極)と4つの出力電極(11a)〜(11
d)(ドレイン電極)と、8つの接地電極(12a)〜
(12h)(ソース電極)が形成されている。入力電極
(10a)〜(10d)は、第2の金属部材(3)と金
ワイヤ等の金属ワイヤ(5a)〜(5d)でボンディン
グ接続されている。又、出力電極(11a)〜(11
d)は、もう一つの第2の金属部材(4)に金属ワイヤ
(6a)〜(6d)によりボンディング接続されてい
る。又、接地電極(12a)〜(12h)は金属ワイヤ
(7a)〜(7h)で、第1の金属部材(2)にボンデ
ィング接続されている。
Next, an embodiment of the present invention will be described with reference to the drawings. [Embodiment 1] FIG. 1 is a plan view of a semiconductor device according to a first embodiment of the present invention, and FIG. 2 (a) is a sectional view taken along the line AA 'in FIG.
FIG. 2B is a sectional view showing electrodes of the semiconductor chip shown in FIG. The semiconductor chip (1) (here, FET) is mounted on the first metal member (2) by using AuSn brazing material or the like, and the semiconductor chip (1) is as shown in detail in FIG. 2 (b). Four input electrodes (10a) to (10d)
(Gate electrode) and four output electrodes (11a) to (11
d) (drain electrode) and eight ground electrodes (12a) to
(12h) (source electrode) is formed. The input electrodes (10a) to (10d) are bonded to the second metal member (3) by metal wires (5a) to (5d) such as gold wires. Also, the output electrodes (11a) to (11
d) is bonded to another second metal member (4) by metal wires (6a) to (6d). The ground electrodes (12a) to (12h) are connected to the first metal member (2) by bonding with metal wires (7a) to (7h).

【0015】第2の金属部材(3)には、凹凸部(1
9)(19′)が形成されている。又もう一つの第2の
金属部材(4)には凹凸部(20)(20′)が形成さ
れている。その凹凸部が図1のA−A′断面図である図
2(a)に示されている。即ち、第2の金属部材(3)
は入力端子(13)に、もう一つの第2の金属部材
(4)は出力端子(14)に、そして第1の金属部材
(2)は接地端子(15)(15′)に接続されてい
る。そして、第2の金属部材(3)が、単一の入力端子
(13)が分岐されて複数の入力端子群となり、複数個
の半導体チップ(1)と、各々ボンディングで接続され
ており、分岐された複数の入力端子群の内、単一の入力
端子(13)に近い入力端子群に凹凸部(19)(1
9′)が設けられている。また、第2の金属部材(4)
は、複数の出力端子群が統合されて単一の出力端子(1
4)となり、複数個の半導体チップ(1)と複数の出力
端子が各々ボンディングで接続され、複数の出力端子群
の内、単一の出力端子(14)に近い入力端子群に凹凸
部(20)(20′)が設けられているものである。
The second metal member (3) has an uneven portion (1
9) (19 ') is formed. Further, the second metal member (4) is provided with uneven portions (20) and (20 '). The uneven portion is shown in FIG. 2A which is a sectional view taken along the line AA ′ of FIG. That is, the second metal member (3)
Is connected to the input terminal (13), the second metal member (4) is connected to the output terminal (14), and the first metal member (2) is connected to the ground terminals (15) and (15 '). There is. Then, the second metal member (3) is branched from the single input terminal (13) to form a plurality of input terminal groups, which are respectively connected to the plurality of semiconductor chips (1) by bonding. The concave-convex portion (19) (1) is formed in the input terminal group close to the single input terminal (13) among the plurality of input terminal groups
9 ') are provided. Also, the second metal member (4)
Is a single output terminal (1
4), a plurality of semiconductor chips (1) and a plurality of output terminals are connected by bonding, respectively, and an uneven portion (20) is formed in the input terminal group near the single output terminal (14) among the plurality of output terminal groups. ) (20 ') is provided.

【0016】半導体チップ(1)と、第1の金属部材
(2)と、第2の金属部材(3)及び(4)と、金属ワ
イヤ(5a)〜(5d)、(6a)〜(6d)、(7
a)〜(7h)は、モールドエリア(8)に充填された
モールド樹脂(9)により固定されている。なお、半導
体チップ(1)が複数の高周波信号入力あるいは出力端
子をもつものについて説明したが、それに代えて1つの
高周波信号入力あるいは、出力端子をもつ半導体チップ
を複数個マウントしたものにおいても同様に構成するも
のである。
The semiconductor chip (1), the first metal member (2), the second metal members (3) and (4), and the metal wires (5a) to (5d) and (6a) to (6d). ), (7
a) to (7h) are fixed by the mold resin (9) filled in the mold area (8). The semiconductor chip (1) has been described as having a plurality of high frequency signal input or output terminals, but the same applies to a case where a plurality of semiconductor chips having one high frequency signal input or output terminal are mounted instead. It is what constitutes.

【0017】この半導体装置の製造について、図3、図
4で説明する。この半導体装置の製造に際しては、第1
の金属部材と第2の金属部材をリードフレーム構成とし
たものをまず製造する。図3、図4はそのリードフレー
ムの実施例であり、リードフレームはまず銅等の板材を
第1プレス加工により、図3の様なパターンに加工し、
その後第2プレス加工により図4の様に任意の箇所に凹
凸部を形成して銀メッキ等の表面処理を行なって完成す
る。即ち、図3に示すように送り穴(63)を有する銅
等の板材を第1プレス加工によってリードフレーム(6
0)を形成する。リードフレーム(60)は、リードフ
レーム外枠(61)、リードフレーム内枠(62)を有
しており、リードフレーム外枠(61)には、第1の金
属部材(2)が、リードフレーム内枠(62)には第2
の金属部材(3)、及び(4)がつながっているパター
ンにプレス加工される。
The manufacture of this semiconductor device will be described with reference to FIGS. When manufacturing this semiconductor device,
First, a lead frame configuration of the metal member and the second metal member is manufactured. 3 and 4 show an example of the lead frame. The lead frame is formed by first pressing a plate material such as copper into a pattern as shown in FIG.
After that, the second press working is used to form a concavo-convex portion at an arbitrary position as shown in FIG. 4, and surface treatment such as silver plating is performed to complete the process. That is, as shown in FIG. 3, a plate material such as copper having a perforation hole (63) is subjected to a first press working to produce a lead frame (6
0) is formed. The lead frame (60) has a lead frame outer frame (61) and a lead frame inner frame (62), and the lead frame outer frame (61) includes the first metal member (2) and the lead frame. The second in the inner frame (62)
The metal members (3) and (4) are pressed into a pattern.

【0018】次いで、図4に示すように、リードフレー
ムに第2プレス加工を行い、第2の金属部材(3)の4
本のうちの中央部の2本に凹凸部(19)(19′)
を、及び第2の金属部材(4)の4本のうちの中央部の
2本に凹凸部(20)(20′)を形成する。そしてこ
れに銀メッキ等の表面処理を行うものである。このよう
にして形成されたリードフレームに、図1,図2で説明
したように、半導体チップをマウントし金属ワイヤでボ
ンディング配線した後、モールド型に入れ、モールド樹
脂をモールド型に注入してキュア処理をし、モールド樹
脂を固める。その後、半田メッキ等の処理を行なった
後、リードを切断し、かつリードを成形して完成するも
のである。
Next, as shown in FIG. 4, the lead frame is subjected to the second press working, and the second metal member (3)
Concavo-convex parts (19) (19 ') on the two central parts of the book
And the concave and convex portions (20) and (20 ') are formed on two of the four central portions of the second metal member (4). Then, this is subjected to surface treatment such as silver plating. As described with reference to FIGS. 1 and 2, a semiconductor chip is mounted on the lead frame thus formed and bonding wiring is performed with metal wires, and then the mold is put into a mold and a mold resin is injected into the mold to cure. Process and harden the molding resin. After that, after processing such as solder plating, the leads are cut, and the leads are molded to complete the process.

【0019】[実施例2]図5,図6は本発明の第2の
実施例である。上記第1の実施例と構成は同様である。
即ち、半導体チップ(1)が第1の金属部材(2)上に
マウントされており、半導体チップ(1)には5つの入
力電極(ゲート電極)と、5つの出力電極(ドレイン電
極)と、10の接地電極(ソース電極)が形成されてい
て、入力電極は第2の金属部材(3)と、金属ワイヤ
(5a)〜(5e)でボンディング接続されている。
又、出力電極はもう一つの第2の金属部材(4)に、金
属ワイヤ(6a)〜(6e)によりボンディング接続さ
れている。又、接地電極は金属ワイヤ(7a)〜(7
j)で、第1の金属部材(2)にボンディング接続され
ている。
[Embodiment 2] FIGS. 5 and 6 show a second embodiment of the present invention. The configuration is the same as that of the first embodiment.
That is, the semiconductor chip (1) is mounted on the first metal member (2), and the semiconductor chip (1) has five input electrodes (gate electrodes), five output electrodes (drain electrodes), Ten ground electrodes (source electrodes) are formed, and the input electrodes are bonded to the second metal member (3) by metal wires (5a) to (5e).
Further, the output electrode is bonded to another second metal member (4) by metal wires (6a) to (6e). In addition, the ground electrodes are metal wires (7a) to (7
At j), it is bonded to the first metal member (2).

【0020】このように本実施例では、5セルの半導体
チップを使用しており、最も外側の2素子(両端の素
子)を基準に位相を合わせるためには、中心部へ行く程
大きな位相補正が必要となるため、第2の金属部材の凹
凸形成においては中央リード(19" )の凸部高さがそ
の両側のリード(19)及び(19′)よりも高く形成
してある。又、出力側も同様に(20" )の凸部が(2
0)及び(20′)よりも高く形成してある。
As described above, in the present embodiment, the semiconductor chip of 5 cells is used, and in order to match the phases with the two outermost elements (elements at both ends) as a reference, a larger phase correction is performed toward the center. Therefore, in forming the unevenness of the second metal member, the height of the convex portion of the central lead (19 ") is formed higher than that of the leads (19) and (19 ') on both sides thereof. Similarly, on the output side, the convex part of (20 ") is (2
0) and (20 ').

【0021】これについて、図6(a)に図5のA−
A′断面が示され、凹凸部(19′)及び(20′)
が、また図6(b)に図5のB−B′断面が示され、凹
凸部(19" )及び(20" )が示されている。この図
6(a),(b)から明らかなように、中央リード(1
9" )及び(20" )の凸部高さがその両側のリードよ
り高く形成されているものである。また、本実施例で
は、第2の金属部材を凸形状に加工して位相補正を行っ
ているが、第2の金属部材を凹形状に加工しても同様な
効果が得られることは言うまでもない。即ち、第2の金
属部材(3)(4)に設けられた凹凸部が、その高さを
変えることで複数の端子群間の位相差を調整することが
できるものである。このように形成されたものは、半導
体チップ(1)と、第1の金属部材(2)と、第2の金
属部材(3)及び(4)と金属ワイヤ(5a)〜(5
e)、(6a)〜(6e)、(7a)〜(7j)は、モ
ールドエリア(8)に充填されたモールド樹脂(9)に
より固定されている。
Regarding this, FIG. 6A shows a line A- in FIG.
A'section is shown, showing the irregularities (19 ') and (20')
However, FIG. 6 (b) shows a cross section taken along the line BB 'of FIG. 5, showing the uneven portions (19 ") and (20"). As is apparent from FIGS. 6A and 6B, the central lead (1
9 ") and (20") are formed higher than the leads on both sides thereof. Further, in the present embodiment, the second metal member is processed into a convex shape to perform the phase correction, but it goes without saying that the same effect can be obtained even if the second metal member is processed into a concave shape. . That is, the uneven portions provided on the second metal members (3) and (4) can adjust the phase difference between the plurality of terminal groups by changing the height thereof. Those formed in this way are the semiconductor chip (1), the first metal member (2), the second metal members (3) and (4), and the metal wires (5a) to (5).
e), (6a) to (6e), and (7a) to (7j) are fixed by the mold resin (9) filled in the mold area (8).

【0022】[0022]

【発明の効果】以上説明したように、本発明の半導体装
置によれば、半導体チップと外周回路を接続するフレー
ム部(第2の金属部材)に凹凸を設け、装置の入力又は
出力端子から各半導体素子の入力又は出力電極までの距
離を一定にすることにより、半導体チップに入力され
る。あるいは半導体チップから出力される電気信号の位
相差を軽減し、並列運転型素子において、動作効率の改
善がなされるという効果を奏するものである。さらに、
従来技術の欠点であったチップ数(又はセル数)の増加
に伴う半導体装置の容器面積の増加を最小限に押えるこ
とができる。そして、入・出力同時の位相差の軽減も実
現できる。また奇数個(又は奇数セル)の半導体チップ
の実装も可能である。という効果を奏するものである。
As described above, according to the semiconductor device of the present invention, the frame portion (second metal member) connecting the semiconductor chip and the outer peripheral circuit is provided with irregularities so that the input or output terminals of the device are connected to each other. It is input to the semiconductor chip by keeping the distance to the input or output electrode of the semiconductor element constant. Alternatively, the effect of reducing the phase difference of the electric signal output from the semiconductor chip and improving the operation efficiency in the parallel operation type element is achieved. further,
It is possible to minimize the increase in the container area of the semiconductor device due to the increase in the number of chips (or cells), which is a drawback of the conventional technology. Moreover, it is possible to reduce the phase difference at the time of input and output simultaneously. It is also possible to mount an odd number (or odd number of cells) of semiconductor chips. That is the effect.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の第1の実施例の平面図。FIG. 1 is a plan view of a first embodiment of the present invention.

【図2】(a)は図1のA−A′断面図、(b)はチッ
プ電極説明図。
2A is a sectional view taken along the line AA ′ of FIG. 1, and FIG. 2B is an explanatory view of a chip electrode.

【図3】本発明の第1の実施例のリードフレームの図
(第1プレス加工後)。
FIG. 3 is a view of the lead frame according to the first embodiment of the present invention (after the first press working).

【図4】本発明の第1の実施例のリードフレームの図
(第2プレス加工後)。
FIG. 4 is a view of the lead frame according to the first embodiment of the present invention (after the second press working).

【図5】本発明の第2の実施例の平面図。FIG. 5 is a plan view of the second embodiment of the present invention.

【図6】(a)は図5のA−A′断面図、(b)は図5
のB−B′断面図。
6A is a sectional view taken along the line AA ′ in FIG. 5, and FIG.
BB 'sectional drawing.

【図7】従来技術を説明する図。FIG. 7 is a diagram illustrating a conventional technique.

【図8】従来技術を説明する図(図7のモールド型応用
例)。
FIG. 8 is a diagram illustrating a conventional technique (application example of a mold of FIG. 7).

【図9】従来技術を説明する図。FIG. 9 is a diagram illustrating a conventional technique.

【図10】従来技術を説明する図(図9のモールド型応
用例)。
FIG. 10 is a diagram illustrating a conventional technique (application example of a mold of FIG. 9).

【符号の説明】[Explanation of symbols]

1 半導体チップ(FET) 2 第1の金属部材 3,4 第2の金属部材 5a〜5e,6a〜6e,7a〜7i 金属ワイヤ 8 モールドエリア 9 モールド樹脂 10a〜10d 入力電極(ゲート) 11a〜11d 出力電極(ドレイン) 12a〜12h 接地電極(ソース) 13 入力端子 14 出力端子 15,15′ 接地端子 19,19′,19" ,20,20′,20" 凹凸部 30a〜30e 半導体チップ(バイポーラトランジス
タ) 31 マウントエリア(金属層) 32,32′,32" モスコンデンサ 33 入力端子 34 出力端子 35 絶縁層 36 接地電極(金属層) 37 外周器 38a〜38e,39a〜39e,40a〜40e,4
1a〜41d 金属ワイヤ 42a〜42e 入力電極(ベース) 43a〜43e 接地電極(エミッタ) 44,45a〜45e,46a〜46e 金属ワイヤ 47 第2の金属部材 60 リードフレーム 61 リードフレーム外枠 62 リードフレーム内枠 63 送り穴
DESCRIPTION OF SYMBOLS 1 Semiconductor chip (FET) 2 1st metal member 3,4 2nd metal member 5a-5e, 6a-6e, 7a-7i Metal wire 8 Mold area 9 Mold resin 10a-10d Input electrode (gate) 11a-11d. Output electrode (drain) 12a to 12h Ground electrode (source) 13 Input terminal 14 Output terminal 15, 15 'Ground terminal 19, 19', 19 ", 20, 20 ', 20" Uneven portion 30a to 30e Semiconductor chip (bipolar transistor) ) 31 mount area (metal layer) 32, 32 ', 32 "moss capacitor 33 input terminal 34 output terminal 35 insulating layer 36 ground electrode (metal layer) 37 peripheral device 38a-38e, 39a-39e, 40a-40e, 4
1a to 41d Metal wire 42a to 42e Input electrode (base) 43a to 43e Ground electrode (emitter) 44, 45a to 45e, 46a to 46e Metal wire 47 Second metal member 60 Lead frame 61 Lead frame outer frame 62 In lead frame Frame 63 Feed hole

Claims (5)

【特許請求の範囲】[Claims] 【請求項1】 複数の高周波信号入力あるいは出力端子
をもつ半導体チップと、前記半導体チップがマウントさ
れる第1の金属部材と、前記半導体チップに金属ワイヤ
等のボンディングで接続され、前記半導体チップを外周
回路と電気的に接続する第2の金属部材とが、モールド
樹脂により固定されている半導体装置において、前記半
導体チップの複数の高周波信号入力端子に外周回路から
入力される高周波信号の電気的位相がそろうように、あ
るいは前記半導体チップの複数の高周波信号出力端子か
ら外部回路へ出力される高周波信号の電気的位相がそろ
うように第2の金属部材の任意の箇所に凹凸部を設けた
ことを特徴とする半導体装置。
1. A semiconductor chip having a plurality of high-frequency signal input or output terminals, a first metal member on which the semiconductor chip is mounted, and a semiconductor chip connected to the semiconductor chip by bonding such as a metal wire. In a semiconductor device in which a second metal member electrically connected to an outer peripheral circuit is fixed by a molding resin, an electrical phase of a high frequency signal input from the outer peripheral circuit to a plurality of high frequency signal input terminals of the semiconductor chip. So that the high-frequency signals output from the plurality of high-frequency signal output terminals of the semiconductor chip to the external circuit have the same electrical phase so that the second metal member is provided with an uneven portion at an arbitrary position. Characteristic semiconductor device.
【請求項2】 請求項1に記載の半導体装置における複
数の高周波信号入力あるいは出力端子をもつ半導体チッ
プの代わりに、1つの高周波信号入力あるいは出力端子
をもつ半導体チップを複数個マウントしてなることを特
徴とする半導体装置。
2. The semiconductor device according to claim 1, wherein instead of the semiconductor chip having a plurality of high frequency signal input or output terminals, a plurality of semiconductor chips having one high frequency signal input or output terminal are mounted. A semiconductor device characterized by:
【請求項3】 第2の金属部材が、単一の入力端子が分
岐されて複数の入力端子群となるもので複数個の半導体
チップと、各々ボンディングで接続されており、前記分
岐された複数の入力端子群の内、前記単一の入力端子に
近い入力端子群に凹凸部を設けたことを特徴とする請求
項1または2に記載の半導体装置。
3. A second metal member, wherein a single input terminal is branched to form a plurality of input terminal groups, each of which is connected to a plurality of semiconductor chips by bonding, and the plurality of branched terminals are connected. 3. The semiconductor device according to claim 1, wherein an uneven portion is provided in an input terminal group close to the single input terminal in the input terminal group.
【請求項4】 第2の金属部材が、複数の出力端子群が
統合されて単一の出力端子となるもので、複数個の半導
体チップと複数の出力端子が各々ボンディングで接続さ
れており、前記複数の出力端子群の内、前記単一の出力
端子に近い入力端子群に凹凸部を設けたことを特徴とす
る請求項1〜3のいずれかに記載の半導体装置。
4. A second metal member, wherein a plurality of output terminal groups are integrated to form a single output terminal, and a plurality of semiconductor chips and a plurality of output terminals are connected by bonding, respectively. The semiconductor device according to claim 1, wherein an uneven portion is provided in an input terminal group near the single output terminal among the plurality of output terminal groups.
【請求項5】 第2の金属部材に設けられた凹凸部が、
その高さを変えることで複数の端子群間の位相差を調整
することを特徴とする請求項1〜4のいずれかに記載の
半導体装置。
5. The uneven portion provided on the second metal member,
The semiconductor device according to claim 1, wherein the phase difference between the plurality of terminal groups is adjusted by changing the height.
JP6166391A 1994-06-24 1994-06-24 Semiconductor device Expired - Fee Related JP2551385B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6166391A JP2551385B2 (en) 1994-06-24 1994-06-24 Semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6166391A JP2551385B2 (en) 1994-06-24 1994-06-24 Semiconductor device

Publications (2)

Publication Number Publication Date
JPH0817999A true JPH0817999A (en) 1996-01-19
JP2551385B2 JP2551385B2 (en) 1996-11-06

Family

ID=15830555

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6166391A Expired - Fee Related JP2551385B2 (en) 1994-06-24 1994-06-24 Semiconductor device

Country Status (1)

Country Link
JP (1) JP2551385B2 (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009238937A (en) * 2008-03-26 2009-10-15 New Japan Radio Co Ltd Semiconductor device and manufacturing method therefor
JP2018078487A (en) * 2016-11-10 2018-05-17 三菱電機株式会社 High frequency circuit
JPWO2018211643A1 (en) * 2017-05-17 2020-03-12 三菱電機株式会社 amplifier

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009238937A (en) * 2008-03-26 2009-10-15 New Japan Radio Co Ltd Semiconductor device and manufacturing method therefor
JP2018078487A (en) * 2016-11-10 2018-05-17 三菱電機株式会社 High frequency circuit
JPWO2018211643A1 (en) * 2017-05-17 2020-03-12 三菱電機株式会社 amplifier
US11164828B2 (en) 2017-05-17 2021-11-02 Mitsubishi Electric Corporation Amplifier

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