JPH08171209A - 放射線硬化性組成物 - Google Patents

放射線硬化性組成物

Info

Publication number
JPH08171209A
JPH08171209A JP33288994A JP33288994A JPH08171209A JP H08171209 A JPH08171209 A JP H08171209A JP 33288994 A JP33288994 A JP 33288994A JP 33288994 A JP33288994 A JP 33288994A JP H08171209 A JPH08171209 A JP H08171209A
Authority
JP
Japan
Prior art keywords
acid
weight
curable composition
parts
radiation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP33288994A
Other languages
English (en)
Japanese (ja)
Inventor
Hiroaki Nemoto
宏明 根本
Koichi Sakurai
幸一 櫻井
Sukefuku Tajima
右副 田島
Nobuo Bessho
信夫 別所
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
JSR Corp
Original Assignee
Japan Synthetic Rubber Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Japan Synthetic Rubber Co Ltd filed Critical Japan Synthetic Rubber Co Ltd
Priority to JP33288994A priority Critical patent/JPH08171209A/ja
Priority to KR1019950049198A priority patent/KR960024636A/ko
Priority to EP95309146A priority patent/EP0718694B1/en
Publication of JPH08171209A publication Critical patent/JPH08171209A/ja
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/22—Absorbing filters
    • G02B5/223—Absorbing filters containing organic substances, e.g. dyes, inks or pigments
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Optical Filters (AREA)
  • Polymerisation Methods In General (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
JP33288994A 1994-12-15 1994-12-15 放射線硬化性組成物 Pending JPH08171209A (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP33288994A JPH08171209A (ja) 1994-12-15 1994-12-15 放射線硬化性組成物
KR1019950049198A KR960024636A (ko) 1994-12-15 1995-12-13 방사선 경화성 조성물
EP95309146A EP0718694B1 (en) 1994-12-15 1995-12-15 Radiation-curable composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP33288994A JPH08171209A (ja) 1994-12-15 1994-12-15 放射線硬化性組成物

Publications (1)

Publication Number Publication Date
JPH08171209A true JPH08171209A (ja) 1996-07-02

Family

ID=18259939

Family Applications (1)

Application Number Title Priority Date Filing Date
JP33288994A Pending JPH08171209A (ja) 1994-12-15 1994-12-15 放射線硬化性組成物

Country Status (3)

Country Link
EP (1) EP0718694B1 (OSRAM)
JP (1) JPH08171209A (OSRAM)
KR (1) KR960024636A (OSRAM)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11231524A (ja) * 1998-02-17 1999-08-27 Jsr Corp プラズマディスプレイパネルの製造方法

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB9605712D0 (en) * 1996-03-19 1996-05-22 Minnesota Mining & Mfg Novel uv-curable compositions
NL1013854C2 (nl) 1999-03-03 2001-05-30 Sumitomo Chemical Co Kleurfilter, werkwijze voor het vervaardigen van een kleurfilter en fotogevoelig kleurenmengsel.

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3443221A1 (de) * 1984-11-27 1986-06-05 ESPE Fabrik pharmazeutischer Präparate GmbH, 8031 Seefeld Bisacylphosphinoxide, ihre herstellung und verwendung
DE3633436A1 (de) * 1986-10-01 1988-04-14 Basf Ag Photopolymerisierbare aufzeichnungsmasse, insbesondere zur herstellung von druckplatten und reliefformen
EP0413657B1 (de) * 1989-08-04 1996-12-27 Ciba SC Holding AG Mono- und Diacylphosphinoxide
RU2091385C1 (ru) * 1991-09-23 1997-09-27 Циба-Гейги АГ Бисацилфосфиноксиды, состав и способ нанесения покрытий
US5399604A (en) * 1992-07-24 1995-03-21 Japan Synthetic Rubber Co., Ltd. Epoxy group-containing resin compositions
JP3452145B2 (ja) * 1993-08-23 2003-09-29 大日本インキ化学工業株式会社 粘弾性製品用光重合性組成物及び該組成物を用いた粘弾性製品の製造方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11231524A (ja) * 1998-02-17 1999-08-27 Jsr Corp プラズマディスプレイパネルの製造方法

Also Published As

Publication number Publication date
EP0718694B1 (en) 2002-05-15
EP0718694A2 (en) 1996-06-26
KR960024636A (ko) 1996-07-20
EP0718694A3 (OSRAM) 1996-07-17

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Legal Events

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Effective date: 20020521