JPH08161013A - Device and method for device manufacture - Google Patents

Abstract

PURPOSE: To decrease the frequency of variation of parameters by a user and to prevent a parameter from being missed. CONSTITUTION: The operators of the device manufacturing device are divided into several groups 31, which are registered and recorded; and the limit values and default values 33-35 of the parameters 21 are registered by the groups. When the manufacturing device is operated, the groups of operators are referred to and the limit values and default values which are registered are reflected on the operation and parameter setting of the manufacturing device.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an apparatus and method for manufacturing a device such as a semiconductor device or a liquid crystal device,
In particular, the present invention relates to an apparatus and method for setting parameter limit values and default values for each user (operator group). The present invention is particularly preferably applied to a semiconductor exposure apparatus and an exposure method for printing a circuit pattern on a wafer.

[0002]

2. Description of the Related Art Conventionally, in a reduction projection type exposure apparatus used in a semiconductor manufacturing (exposure) process, each operator is a serviceman who maintains the apparatus or an operator who operates the apparatus.
It was using the default value.

[0003]

However, on the side using the semiconductor exposure apparatus, there is a possibility that the limit value defined by the apparatus maker may affect the product depending on the type of resist. Also, depending on the product and conditions, the parameter values used by the user and the default values of the device manufacturer do not always match, so the user has to reset the parameter values each time, and there is the problem that the operation becomes troublesome. It was

The present invention takes the above circumstances into consideration. By registering a limit value and a default value that a user often uses, the limit value and the default value can be registered for each user, and the number of parameter changes can be reduced. In addition, the purpose is to prevent parameter setting mistakes due to conditions.

[0005]

In order to solve the above problems, according to the present invention, a person (operator) who operates the manufacturing apparatus is divided into several groups (field operator, engineer, service person, maker person in charge, etc.). These groups are registered and recorded, parameter limit values and default values are registered for each group, and at the time of operation of the device, the operator's group at that time is referred to, and the operation of the device and parameters set by the group. In addition, the registered limit value and default value are reflected.

[0006]

According to the present invention, since the parameters can be changed only within the limit range permitted by the person who operates the apparatus, mistakes in the change are reduced. Further, by registering the value determined by the user as the default value of the parameter, the number of parameter changes can be reduced.

[0007]

The present invention will be described in more detail with reference to the following examples. FIG. 1 is a perspective view showing the outer appearance of a semiconductor exposure apparatus according to an embodiment of the present invention. As shown in the figure, this semiconductor exposure apparatus includes a temperature control chamber 101 that controls the environmental temperature of the apparatus main body, an EWS main body 106 that is disposed inside the chamber and has a CPU that controls the apparatus main body, and
An EWS display device 102 that displays predetermined information in the device, a monitor TV 105 that displays image information obtained through an image pickup unit in the device body, an operation panel 103 for performing predetermined input to the device, and an EWS keyboard 104. It is equipped with a console section including the above. In the figure, 107 is an ON-OFF switch, 108 is an emergency stop switch, 109 is various switches, a mouse, etc., 110 is a LAN communication cable, 111 is an exhaust duct for heat generated from the console function, and 112 is a chamber exhaust device. . The main body of the semiconductor exposure apparatus is installed inside the chamber 101.

The EWS display 102 is a thin flat type such as EL, plasma, liquid crystal, etc., is housed in the front of the chamber 101, and is connected to the EWS main body 106 by a LAN cable 110. Operation panel 10
3, a keyboard 104, a monitor TV 105 and the like are also installed on the front surface of the chamber 101 so that the console operation similar to the conventional one can be performed from the front surface of the chamber 101.

FIG. 2 is a diagram showing the internal structure of the apparatus shown in FIG. In the figure, a stepper as a semiconductor exposure apparatus is shown. In the figure, 202 is a reticle, and 203 is a wafer. When the light flux emitted from the light source device 204 passes through the illumination optical system 205 and illuminates the reticle 202, the pattern on the reticle 202 is exposed on the wafer 203 by the projection lens 206. It can be transferred to a layer. The reticle 202 is supported by a reticle stage 207 for holding and moving the reticle 202. Wafer 203
Is exposed by the wafer chuck 291 while being vacuum-adsorbed. The wafer chuck 291 is the wafer stage 20.
It is possible to move in each axial direction by 9. A reticle optical system 281 for detecting a positional deviation amount of the reticle is arranged above the reticle 202. An off-axis microscope 282 is arranged above the wafer stage 209 and adjacent to the projection lens 206. Off-axis microscope 282
The main role is to detect the relative position between the internal reference mark and the alignment mark on the wafer 203.
Further, adjacent to the stepper body, peripheral devices such as a reticle library 220 and a wafer carrier elevator 2 are provided.
30 is arranged, and necessary reticles and wafers are transferred to the stepper main body by the reticle transfer device 221 and the wafer transfer device 231.

The chamber 101 is mainly composed of an air conditioner room 210 for controlling the temperature of air, a filter box 213 for filtering fine foreign matters to form a uniform flow of clean air, and a booth 214 for shutting off the environment of the apparatus from the outside. Has been done. In the chamber 101, air whose temperature is adjusted by the cooler 215 and the reheat heater 216 in the air conditioner room 210 is supplied by the blower 217 into the booth 214 via the air filter g. The air supplied to the booth 214 is again returned from the return port ra to the air conditioner room 210.
And is circulated in the chamber 101. Usually, this chamber 101 is not a complete circulation system in a strict sense, and about 10% of the amount of circulating air outside the booth 214 is introduced into the air conditioning chamber 210 in order to maintain the positive pressure inside the booth 214 at all times. It is introduced through the blower from the mouth oa. In this way, the chamber 101 makes it possible to keep the ambient temperature in which the apparatus is placed constant and keep the air clean. Further, the light source device 204 is provided with an intake port sa and an exhaust port e in preparation for cooling of the ultra-high pressure mercury lamp and preparation of toxic gas in the event of a laser abnormality.
a is provided, and a part of the air in the booth 214 is forcedly exhausted to the factory equipment via the light source device 204 and the exclusive exhaust fan provided in the air conditioner room 210. Further, a chemical adsorption filter cf for removing chemical substances in the air is provided by being connected to the outside air introduction port oa and the return port ra of the air conditioner chamber 210, respectively.

FIG. 3 is a block diagram showing an electric circuit configuration of the apparatus shown in FIG. In the figure, reference numeral 321 denotes a main body C incorporated in the EWS main body 106, which controls the entire apparatus.
The PU is a central processing unit such as a microcomputer or a minicomputer. 322 is a wafer stage drive device, 323 is the off-axis microscope 28
2 and the like alignment detection system, 324 a reticle stage drive device, 325 an illumination system such as the light source device 204, 3
26 is a shutter drive device, 327 is a focus detection system,
Reference numeral 328 denotes a Z drive device, which is a main body CPU 32.
Controlled by 1. Reference numeral 329 denotes the reticle transport device 2
21, a wafer transfer device 231, and the like. 330
Is a console unit having the display 102, the keyboard 104, etc., and is for giving various commands and parameters relating to the operation of the exposure apparatus to the main body CPU 321. That is, it is for exchanging information with the operator. 331 is a console CPU, and 332 is an external memory that stores parameters and the like. The external memory 331 is, for example, a hard disk, has a database built therein, and records various parameters and their management data, a group of operators, and the like.

FIG. 4 is a diagram for explaining the window for registering the default value and the limit value for the user in the apparatus of FIG. 1 in more detail. The window in the figure shows when the user sets default values and limit values for the user.
Displayed by popup. This window is composed of a window title display area 10, a standard default value / limit value display area 20 set by the manufacturer, and a user default value / limit value input area 30. In FIG. 4, 21 is a parameter name input section, 22
Is a "Search" button, 31 is an operator group display section, 32 is an operator group change password input section, 33 is a user default value input section, 34 is a user up limit value input section, 35 is a user down limit value input section, 36 Is an "Apply" button.

5 to 7 show the screen of FIG.
Shows how to set default and limit values for a user. Hereinafter, with reference to FIGS. 4 to 7, the operation for registering the user default value and the limit value and FIG.
The operation of the CPU 331 will be described. (1) First, the user default value / limit value registration is selected by the input means (touch panel 103, keyboard 104, mouse, etc.) of the console unit 330,
To bring up the screen. (2) Next, the group name of which group the user default value and the limit value are to be registered or changed is input to the input unit 31 of FIG. The screen looks like Figure 5. (3) A parameter for which a default value and / or a limit value is to be registered is selected by the input means and input to the input unit 21. (4) Press the "Search" button 22 to search the database for standard default values and limit values set by the manufacturer. Standard default and limit values are displayed (see Figure 6). (5) Based on the search result, the user default value and / or the limit value is input to the input units 33 to 35 (see FIG. 7). If a value exceeding the standard limit value is input as the user default value and the limit value, an alarm will be output as an error and it will not be displayed on the screen. The same applies when the user limit value is set and a value exceeding the range of the user limit value is input as the user default value. Furthermore, when the user default value is set, the same applies when the user limit value is input such that the user default value is out of the range. (6) Press the “Apply” button 36 to register the user default value and limit value in the database.
When the “Apply” button 36 is pressed in the state where the user default value or the limit value is not displayed, the value not displayed is replaced with the standard value and registered.

When starting up the apparatus shown in FIG. 1, an operator who wants to start up the apparatus first inputs his own ID from the keyboard of the console. As a result, the CPU 331
Can recognize whether the operator is registered and, if registered, the group to which the operator belongs. And the group to which it belongs is "Engineer
If it is 1 ", the above user default value and limit value are reflected in the operation of the device and the parameter setting operation thereafter. The group to which each operator belongs is shown in FIG.
In this case, the operator's group cannot register or change without entering a password in the input unit 32.

[0015]

Scope of application of the invention In the above description, an example in which the present invention is mainly applied to semiconductor exposure for producing a semiconductor has been shown. However, the present invention produces semiconductors other than semiconductor exposure or LCD panels. It is also applicable to device manufacturing other than semiconductor exposure, such as exposure for exposure.

[0016]

As described above, according to the present invention, the limit value and the default value of the manufacturing apparatus can be registered for each user. Therefore, it is possible to register the limit value and the default value that are often used by the user, reduce the number of parameter changes, and prevent parameter setting errors due to conditions.

[Brief description of drawings]

FIG. 1 is a perspective view showing the outer appearance of a semiconductor exposure apparatus according to an embodiment of the present invention.

FIG. 2 is a diagram showing an internal structure of the apparatus of FIG.

FIG. 3 is a block diagram showing an electric circuit configuration of the apparatus of FIG.

FIG. 4 is a diagram illustrating in more detail a window for registering a default value and a limit value for a user in the device of FIG.

5 shows an example of a window displayed on the console screen when searching for standard default values and limit values set by the manufacturer in the apparatus of FIG.

FIG. 6 is a diagram showing an example of a window showing a result of searching for standard default values and limit values set by the manufacturer in the apparatus of FIG.

7 is a diagram showing an example of a window for inputting a default value and a limit value for a user and reflecting the data in a database in the apparatus of FIG. 1. FIG.

[Explanation of symbols]

10: window title display area, 20: standard default value / limit value display area, 21: parameter name input area, 22: "Search" button, 30: user default value / limit value input area, 31: operator group display area, 32: operator group change password input section, 33: user default value input section, 34:
User up limit value input section, 35: User down limit value input section, 36: "Aply" button, 10
1: Temperature control chamber, 102: EWS display device, 103: Operation panel, 104: EWS keyboard, 105: Monitor TV, 106: EWS body, 10
7: ON-OFF switch, 108: Emergency stop switch, 109: Various switches, mouse, etc., 110: LAN
Communication cable, 111: exhaust duct, 112: exhaust device, 202: reticle, 203: wafer, 204: light source device, 205: illumination optical system, 206: projection lens, 20
7: Reticle stage, 209: Wafer stage, 28
1: reticle microscope, 282: off-axis microscope, 2
10: air conditioner room, 213: filter box, 214:
Booth 217: Blower, g: Air filter, cf: Chemical adsorption filter, oa: Outside air introduction port, ra: Return port, 321: Main body CPU, 330: Console, 33
1: Console CPU, 332: External memory.

─────────────────────────────────────────────────── ─── Continuation of the front page (51) Int.Cl. ⁶ Identification code Internal reference number FI Technical indication H01L 21/30 516 Z

Claims (4)

[Claims] 1. A means for dividing an operator who operates the apparatus into several groups, registering and storing the grouping, and a means for registering a different value for each group as a limit value or a default value of a parameter. , Having means for recognizing a group of operators currently operating at the time of starting up the apparatus and means for reflecting the limit value or default value of the operator group in the operation of the apparatus after starting the apparatus and the parameter setting. Device manufacturing equipment. 2. The apparatus according to claim 1, wherein the operator further comprises means for changing a group to which the operator belongs by inputting a special keyword. 3. A dedicated window for setting the limit values / default values is displayed by a pop-up, and the window includes a limit value / default value display area for parameters defined by the device manufacturer and a current operator group display area. The apparatus according to claim 1 or 2, wherein the apparatus is constituted by an input area for the limit value / default value of the current operator group. 4. An operator of a device manufacturing apparatus is divided into several groups, these groups are registered and recorded, parameter limit values and default values are registered for each group, and when operating the manufacturing apparatus, an operation is performed. A method of manufacturing a device, characterized in that a limit value or a default value registered in the operation of the apparatus or parameter setting is reflected by referring to a group of operating operators.