JPH08150301A - Distillation apparatus and operation thereof - Google Patents

Distillation apparatus and operation thereof

Info

Publication number
JPH08150301A
JPH08150301A JP29507494A JP29507494A JPH08150301A JP H08150301 A JPH08150301 A JP H08150301A JP 29507494 A JP29507494 A JP 29507494A JP 29507494 A JP29507494 A JP 29507494A JP H08150301 A JPH08150301 A JP H08150301A
Authority
JP
Japan
Prior art keywords
inert gas
chemical vapor
liquid
distillation apparatus
liquid chemicals
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP29507494A
Other languages
Japanese (ja)
Inventor
Seiji Sudo
誠司 須藤
Yuji Tanaka
裕二 田中
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Chemical Corp
Mitsubishi Kasei Engineering Co
Original Assignee
Mitsubishi Chemical Corp
Mitsubishi Kasei Engineering Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Chemical Corp, Mitsubishi Kasei Engineering Co filed Critical Mitsubishi Chemical Corp
Priority to JP29507494A priority Critical patent/JPH08150301A/en
Publication of JPH08150301A publication Critical patent/JPH08150301A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE: To restrain the occurrence of mist and to remove metal ions and high boiling point organic materials in a distillation apparatus in which a heat source and a liquid chemical vapor condenser are installed in the lower part and in the upper part respectively by installing a means for blowing inert gas into liquid chemicals. CONSTITUTION: A distillation apparatus 10 for removing metal impurities and high boiling point organic materials in liquid chemicals consists of a heater 3 for vaporizing liquid chemicals 2 stored in the lower part of a body 1 and a liquid chemical vapor condenser 6 for condensing liquid chemical vapor in the upper part thereof. In the lower part of the vapor condenser 6, a pan 11 for recovering the condensed liquid chemicals is installed. Between a part for storing the liquid chemicals 2 and the liquid chemical vapor condenser 6, a demister 4 is installed. In this case, inert gas feeding piping 8 in which blow-in ports 9 for blowing inert gas such as nitrogen and helium into the liquid chemicals to be distilled are formed in the liquid chemicals 2 is installed. In this way, the bumping and the occurrence of mist are restrained to reduce the occurrence of heavy metal contamination, water mark or the like of the device.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、薬液中の金属不純物や
高沸点有機物等を効率的に除去するための蒸留装置、及
びその運転方法に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a distillation apparatus for efficiently removing metal impurities, high-boiling point organic substances and the like in a chemical solution, and a method of operating the distillation apparatus.

【0002】[0002]

【従来の技術】一般に半導体ウエハーや液晶パネルなど
を洗浄・乾燥するために2−プロパノールなどの薬液を
利用する方法が広く知られている。2−プロパノールの
精製においては薬液を大気圧下で蒸発させ、発生蒸気を
凝縮させることにより金属不純物および高沸点有機物を
除去していた。
2. Description of the Related Art Generally, a method of using a chemical solution such as 2-propanol for cleaning and drying semiconductor wafers and liquid crystal panels is widely known. In the purification of 2-propanol, the chemical liquid was evaporated under atmospheric pressure and the generated vapor was condensed to remove metal impurities and high-boiling organic substances.

【0003】[0003]

【発明が解決しようとする課題】上記の薬液を使用した
洗浄・乾燥操作等において、半導体ウエハー等に使用し
た場合には、重金属汚染によるディバイス性能の劣化や
ウォーターマークと呼ばれる欠陥が生じることや、液晶
・レンズ等に使用した場合には、ヘイズが生じることが
あり、大きな問題となっていた。
When used for semiconductor wafers in the cleaning / drying operations using the above chemicals, deterioration of device performance due to heavy metal contamination and defects called watermarks occur, and When used for liquid crystals, lenses, etc., haze may occur, which is a big problem.

【0004】[0004]

【課題を解決するための手段】本発明者らは、上記課題
について鋭意検討した結果、重金属汚染、ウォーターマ
ークやヘイズの発生要因の一つは、その洗浄・乾燥時に
使用する薬液の蒸留過程で微小液滴の同伴によって薬液
中に重金属等が混入しているためであることを見出し、
蒸留過程での薬液中に不活性ガスを吹き込むことにより
ミスト発生を抑制すればディバイスの重金属汚染および
ウォーターマークやヘイズの発生が減少することを見出
し、本発明に到達した。
Means for Solving the Problems As a result of intensive studies on the above problems, the present inventors have found that one of the causes of heavy metal contamination, watermarks and haze is the distillation process of a chemical solution used during cleaning and drying. It was found that heavy metals, etc. were mixed in the chemical liquid due to the entrainment of minute droplets,
The present invention was found to suppress heavy metal contamination of the device and the generation of watermarks and haze by suppressing the generation of mist by blowing an inert gas into the chemical liquid in the distillation process.

【0005】すなわち、本発明の要旨は、下部に貯留さ
れた薬液を気化させるための熱源と、上部に薬液蒸気を
凝縮させるための薬液蒸気凝縮器とを少なくとも有する
蒸留装置において、薬液中に不活性ガスを吹き込む手段
を設けたことを特徴とする蒸留装置、および、前記蒸留
装置の運転方法において、薬液中に伝熱面1m2あたり
0.05〜0.3Nm3/hrの不活性ガスを吹き込む
ことを特徴とする蒸留装置の運転方法、に存する。
That is, the gist of the present invention is that in a distillation apparatus having at least a heat source for vaporizing the chemical liquid stored in the lower portion and a chemical vapor condenser for condensing the chemical vapor in the upper portion, the distillation apparatus is not In a distillation apparatus, characterized in that a means for blowing an active gas is provided, and in the method for operating the distillation apparatus, an inert gas of 0.05 to 0.3 Nm 3 / hr per 1 m 2 of heat transfer surface is contained in a chemical solution. It exists in the operating method of the distillation apparatus characterized by blowing.

【0006】以下、本発明について図面を参照しながら
詳細に説明する。図1は本発明の一態様の説明するため
の模式的断面図である。蒸留装置10は、略円筒状の本
体1と、本体1の下部に貯留される薬液を気化させるた
めの熱源としてのヒーター3と、本体1の上部に薬液蒸
気を凝縮させるための薬液蒸気凝縮器6とからなる。薬
液蒸気凝縮器6の下部には、凝縮した薬液を回収するた
めの受皿11が設けられ、そこから凝縮液が凝縮液抜き
出し管12を通じて抜き出される。また、薬液を貯留す
るための部分と薬液蒸気凝縮器6との間には繊維状のデ
ミスター4が設けられている。デミスターは必ずしも必
要ではないが、デミスターを設けることによって、微小
液滴の同伴を抑制することがさらに容易となる。
The present invention will be described below in detail with reference to the drawings. FIG. 1 is a schematic cross-sectional view for explaining one embodiment of the present invention. The distillation apparatus 10 includes a substantially cylindrical main body 1, a heater 3 as a heat source for vaporizing the chemical liquid stored in the lower portion of the main body 1, and a chemical liquid vapor condenser for condensing the chemical liquid vapor in the upper portion of the main body 1. It consists of 6 and 6. At the bottom of the chemical vapor condensing device 6, a receiving tray 11 for collecting the condensed chemical liquid is provided, from which the condensate is extracted through a condensate extracting pipe 12. A fibrous demister 4 is provided between the portion for storing the chemical liquid and the chemical vapor condenser 6. Although the demister is not always necessary, the provision of the demister makes it easier to suppress the entrainment of microdroplets.

【0007】蒸留装置本体1の下部には薬液2が貯留さ
れる。薬液としては特に制限はないが、2ープロパノー
ル(イソプロピルアルコール)、エタノール、トリクロ
ロエタンなどが例示できる。薬液2はヒーター3により
加熱され、気化する。薬液蒸気5は上昇し、凝縮器6の
表面で凝縮する。薬液蒸気凝縮器6としては、冷却コイ
ル中に冷媒を流したものが例示できる。
A chemical solution 2 is stored in the lower portion of the distillation apparatus body 1. The chemical liquid is not particularly limited, but 2-propanol (isopropyl alcohol), ethanol, trichloroethane and the like can be exemplified. The chemical liquid 2 is heated by the heater 3 and vaporized. The chemical vapor 5 rises and condenses on the surface of the condenser 6. An example of the chemical vapor condenser 6 is one in which a cooling medium is made to flow a refrigerant.

【0008】本発明の特徴は、蒸留の対象となる薬液中
に不活性ガスを吹き込む手段が設けられていることにあ
る。不活性ガスとしては窒素やヘリウム、ネオン、アル
ゴンなどが例示でき、また、薬液が空気に対して安定で
あれば空気でもよい。不活性ガスはパーティクルの蒸留
装置内への持ち込み源とならないようにフィルターを通
すことが好ましい。フィルターとしては、孔径1μm以
下、特に孔径0.1μm以下のものが好ましい。
A feature of the present invention is that a means for blowing an inert gas into the chemical liquid to be distilled is provided. Examples of the inert gas include nitrogen, helium, neon and argon, and may be air as long as the chemical liquid is stable to air. It is preferable to pass the inert gas through a filter so that the inert gas does not become a source for bringing particles into the distillation apparatus. As the filter, a filter having a pore diameter of 1 μm or less, particularly 0.1 μm or less is preferable.

【0009】図1では不活性ガス吹き込み手段として、
薬液中に吹き込み口9を設けた不活性ガス供給配管8が
例示されている。吹き込み口9は、口径が0.1〜0.
5mmで、伝熱面1m2あたり20〜70個の面密度で
設けられている。吹き込み口は、伝熱面から20mm以
内の近傍に設けるのが好ましい。図1では、ヒーター3
は、本体1の底面全体に渡って設けられているので、伝
熱面とは底面全てを表し、吹き込み口9は、底面から5
mmのところに設けられている。ヒーターによる加熱
は、底面からではなく側面から行うこともでき、この場
合、吹き込み口は、側面近傍にリング状に設けることが
できる。ただし、伝熱面が側面の場合、即ち側面からの
加熱の場合、側面の周辺部分と中央部分とで薬液の気化
速度が異なる、特に本体が円筒状の形状を有する場合に
は加工の難しい曲面を有するヒーターを使用することに
なる、等の難点が生じることがあるので、伝熱面は底面
とするのが通常である。
In FIG. 1, as an inert gas blowing means,
An inert gas supply pipe 8 provided with a blowing port 9 in the chemical liquid is illustrated. The blowing port 9 has a diameter of 0.1 to 0.
The surface density is 5 mm and the surface density is 20 to 70 per 1 m 2 of heat transfer surface. The blowing port is preferably provided in the vicinity within 20 mm from the heat transfer surface. In FIG. 1, the heater 3
Is provided over the entire bottom surface of the main body 1, so the heat transfer surface means the entire bottom surface, and the blowing port 9 is located at 5
It is provided at mm. The heating by the heater can be performed from the side surface instead of from the bottom surface, and in this case, the blowing port can be provided in a ring shape near the side surface. However, when the heat transfer surface is a side surface, that is, when heating from the side surface, the peripheral portion and the central portion of the side surface have different vaporization rates of the chemical liquid, and especially when the main body has a cylindrical shape, a curved surface that is difficult to process Since there are cases where a heater having a heater is used, the heat transfer surface is usually the bottom surface.

【0010】不活性ガスの吹き込み量は伝熱面1m2
たり0.05〜0.3Nm3/hrが好ましい。不活性
ガスの吹き込み量が少なすぎると本発明の効果が十分に
得られず、多すぎるとかえってミスト発生の原因となる
ので好ましくない。
The amount of the inert gas blown in is preferably 0.05 to 0.3 Nm 3 / hr per 1 m 2 of heat transfer surface. If the amount of the inert gas blown in is too small, the effect of the present invention will not be sufficiently obtained, and if it is too large, it will cause the generation of mist, which is not preferable.

【0011】[0011]

【作用】従来の蒸留装置では、薬液の突沸に伴いミスト
が発生し、該ミストが凝縮薬液中に混入し、ディバイス
の重金属汚染およびウォーターマーク等の生成原因とな
っていた。本発明では少量の不活性ガスを吹き込むこと
により突沸を抑制し、ミストの発生を抑制することによ
りディバイスの重金属汚染およびウォーターマーク等の
発生を減らすことができる。
In the conventional distillation apparatus, mist is generated due to bumping of the chemical liquid, and the mist is mixed into the condensed chemical liquid, which is a cause of heavy metal contamination of the device and generation of watermarks and the like. In the present invention, by blowing a small amount of an inert gas, bumping can be suppressed, and by suppressing the generation of mist, it is possible to reduce the heavy metal contamination of the device and the generation of watermarks.

【0012】また、ミストに同伴されるパーティクルの
量も減少させることができるので、半導体等の欠陥発生
を抑制できる。
Further, since the amount of particles entrained in the mist can be reduced, the occurrence of defects such as semiconductors can be suppressed.

【0013】[0013]

【実施例】以下、本発明を実施例によりさらに詳細に説
明する。 実施例1および比較例1 図1において、本体1の伝熱面での内径を50cmと
し、薬液2として2−プロパノールを用いた。
EXAMPLES The present invention will now be described in more detail with reference to examples. Example 1 and Comparative Example 1 In FIG. 1, the inner diameter of the heat transfer surface of the main body 1 was 50 cm, and 2-propanol was used as the chemical liquid 2.

【0014】不活性ガスとしては窒素ガスを用い、0.
09μm以上の粒径のパーティクルをほぼ完全に除去で
きる精密濾過フィルターを通して使用した。吹き込み口
9は孔径が0.3mmであり、薬液中に合計7個(伝熱
面1m2あたり35個)設けられている。また、微小液
滴同伴を抑えるデミスターとしてはステンレス製の繊維
を編んだ、直径100mm、高さ150mmのものを使
用した。
Nitrogen gas is used as the inert gas, and
It was used through a microfiltration filter capable of almost completely removing particles having a particle size of 09 μm or more. The blowing port 9 has a hole diameter of 0.3 mm, and a total of seven blowing ports 9 (35 per 1 m 2 of heat transfer surface) are provided in the chemical solution. As the demister for suppressing the entrainment of fine droplets, a woven stainless fiber having a diameter of 100 mm and a height of 150 mm was used.

【0015】初めに比較例1として窒素を吹き込まない
で蒸留装置を運転させたところ、蒸留して得られる2ー
プロパノール中にナトリウムイオンが2ppb、鉄イオ
ンが5ppb、塩素イオンが7ppb含まれていた。次
に、実施例1して窒素を0.5Nl/min(0.03
Nm3/hr、伝熱面1m2あたり0.153Nm3/h
r)の流量で吹き込みながら運転させたところ、薬液蒸
気凝縮器6で凝縮される2ープロパノール中のナトリウ
ムイオン、鉄イオン、塩素イオンの量がいずれも0.1
ppb未満と減少した。
First, as Comparative Example 1, when the distillation apparatus was operated without blowing nitrogen, 2-propanol obtained by distillation contained 2 ppb of sodium ions, 5 ppb of iron ions, and 7 ppb of chlorine ions. Next, in Example 1, nitrogen was added at 0.5 Nl / min (0.03
Nm 3 / hr, the heat transfer surface 1m 2 per 0.153Nm 3 / h
When operated while blowing at a flow rate of r), the amounts of sodium ion, iron ion and chlorine ion in 2-propanol condensed in the chemical vapor condenser 6 were all 0.1.
It decreased to less than ppb.

【0016】[0016]

【発明の効果】本発明の蒸留装置では、ミストの発生を
抑制することにより、金属イオン及び高沸点有機物を除
去し、ウォーターマークやヘイズなどの欠陥発生を抑制
し、同伴されるパーティクルの量も減少させることがで
き、より高密度化される電子工業機器の洗浄、乾燥に特
に有用である。
INDUSTRIAL APPLICABILITY In the distillation apparatus of the present invention, by suppressing the generation of mist, metal ions and high boiling point organic substances are removed, the generation of defects such as watermarks and haze is suppressed, and the amount of particles entrained is also reduced. It is particularly useful for cleaning and drying electronic industrial equipment, which can be reduced in density and can be highly densified.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の一態様を示す模式的断面図である。FIG. 1 is a schematic cross-sectional view showing one embodiment of the present invention.

【符号の説明】[Explanation of symbols]

1 蒸留装置本体 2 薬液 3 ヒーター 4 デミスター 5 薬液蒸気 6 薬液蒸気凝縮器 7 薬液蒸気上昇限界面 8 不活性ガス供給配管 9 不活性ガス吹き込み口 12 凝縮液抜き出し管 1 Distilling device main body 2 Chemical liquid 3 Heater 4 Demister 5 Chemical liquid vapor 6 Chemical liquid vapor condenser 7 Chemical liquid vapor rising limit surface 8 Inert gas supply pipe 9 Inert gas blowing port 12 Condensate extraction pipe

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】 下部に貯留された薬液を気化させるため
の熱源と、上部に薬液蒸気を凝縮させるための薬液蒸気
凝縮器とを少なくとも有する蒸留装置において、薬液中
に不活性ガスを吹き込む手段を設けたことを特徴とする
蒸留装置。
1. A distillation apparatus having at least a heat source for vaporizing a chemical solution stored in a lower portion and a chemical vapor condenser for condensing the chemical vapor in an upper portion, a means for blowing an inert gas into the chemical solution. A distillation device characterized by being provided.
【請求項2】 口径0.1〜0.5mmの不活性ガス吹
き込み口が、薬液中の伝熱面の近傍に、伝熱面1m2
たり20〜70個設けられている請求項1に記載の蒸留
装置。
2. An inert gas blowing port having a diameter of 0.1 to 0.5 mm is provided in the vicinity of the heat transfer surface in the chemical liquid in an amount of 20 to 70 per 1 m 2 of the heat transfer surface. Distillation equipment.
【請求項3】 下部に貯留された薬液を気化させるため
の熱源と、上部に薬液蒸気を凝縮させるための薬液蒸気
凝縮器とを少なくとも有する蒸留装置の運転方法におい
て、薬液中に伝熱面1m2あたり0.05〜0.3Nm3
/hrの不活性ガスを吹き込むことを特徴とする蒸留装
置の運転方法。
3. A method of operating a distillation apparatus having at least a heat source for vaporizing a chemical solution stored in a lower portion and a chemical vapor condenser for condensing a chemical vapor in an upper portion, wherein a heat transfer surface of 1 m is contained in the chemical solution. 0.05 to 0.3 Nm 3 per 2
A method for operating a distillation apparatus, which comprises blowing in an inert gas of / hr.
JP29507494A 1994-11-29 1994-11-29 Distillation apparatus and operation thereof Pending JPH08150301A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP29507494A JPH08150301A (en) 1994-11-29 1994-11-29 Distillation apparatus and operation thereof

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP29507494A JPH08150301A (en) 1994-11-29 1994-11-29 Distillation apparatus and operation thereof

Publications (1)

Publication Number Publication Date
JPH08150301A true JPH08150301A (en) 1996-06-11

Family

ID=17815986

Family Applications (1)

Application Number Title Priority Date Filing Date
JP29507494A Pending JPH08150301A (en) 1994-11-29 1994-11-29 Distillation apparatus and operation thereof

Country Status (1)

Country Link
JP (1) JPH08150301A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103566606A (en) * 2013-11-04 2014-02-12 中国地质大学(武汉) Multifunctional purification device and method for purifying ammonium bifluoride by using same

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103566606A (en) * 2013-11-04 2014-02-12 中国地质大学(武汉) Multifunctional purification device and method for purifying ammonium bifluoride by using same

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