JPH08141480A - Method and device for removing excess coating liquid at end of substrate surface - Google Patents

Method and device for removing excess coating liquid at end of substrate surface

Info

Publication number
JPH08141480A
JPH08141480A JP28981694A JP28981694A JPH08141480A JP H08141480 A JPH08141480 A JP H08141480A JP 28981694 A JP28981694 A JP 28981694A JP 28981694 A JP28981694 A JP 28981694A JP H08141480 A JPH08141480 A JP H08141480A
Authority
JP
Japan
Prior art keywords
coating liquid
substrate
excess coating
edge
substrate surface
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP28981694A
Other languages
Japanese (ja)
Inventor
Shinichiro Murakami
上 慎一郎 村
Hiroshi Yoshiba
羽 洋 吉
Takayasu Komatsu
松 隆 泰 小
Shunji Miyagawa
川 俊 二 宮
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dai Nippon Printing Co Ltd
Original Assignee
Dai Nippon Printing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dai Nippon Printing Co Ltd filed Critical Dai Nippon Printing Co Ltd
Priority to JP28981694A priority Critical patent/JPH08141480A/en
Publication of JPH08141480A publication Critical patent/JPH08141480A/en
Pending legal-status Critical Current

Links

Landscapes

  • Coating Apparatus (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)

Abstract

PURPOSE: To easily, rapidly and surely remove excess coating liquid remaining at the end of coating the coating liquid, such as photosensitive resin, on the surface of a large-sized glass substrate of a color filter for LCDs, etc. CONSTITUTION: After a coating liquid film Ra is applied on the substrate S, an absorbent material sheet is advanced toward the end edges S2 of the substrate and in succession, groove parts of channel-shaped pressing members 21 are pressed to the parts of the absorbent sheet 20 pressed thereto from behind the sheet to hold the absorbent sheet 20 between the pressing members 21 and the end edges S2 of the substrate. As a result, the absorbent sheet 20 absorbs the coating liquid by being brought into force contact with the excess coating liquid, by which the coating liquid is removed and simultaneously the coating liquid infiltrating the end edges S2 of the substrate is removed.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、LCD用カラーフィル
ターに代表される大型ガラス基板等の枚葉基板への塗布
液の塗布終了後における、基板面端部の過剰塗布液除去
方法およびその方法に用いられる装置に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for removing an excessive coating liquid at the edge of a substrate surface after the coating liquid is applied to a single substrate such as a large glass substrate typified by a color filter for LCD, and the method thereof. Relates to a device used in.

【0002】[0002]

【従来の技術】従来、LCD用カラーフィルターに代表
される大型ガラス基板等の枚葉基板への塗布液のコーテ
ィング方式としては、スピンコーティング方法が知られ
ている。この方式は、塗布効率が10%程度と低く、し
かも基板のコーナー部分で塗布膜厚が厚くなり過ぎると
いう欠点がある。この欠点を解決でき、かつ枚葉基板に
塗布液を効率よく塗布する方法としては、ナイフコート
方式、ロールコート方式、ダイコート方式があるが、こ
れらの方式を用いて均一な膜厚を得るために、基板表面
の平滑度が塗布精度以下でなければならないという問題
がある。この問題をも解決できる液塗布方式として、塗
布液ビードを基板面と塗布ヘッドの間に形成し、基板と
塗布ヘッドを相対移動させて、基板面に塗布液を塗布す
る方式を、出願人はさきに国際出願PCT/JP 94
/00845号(国際出願日:平成6年5月27日)に
おいて提案した。
2. Description of the Related Art Heretofore, a spin coating method has been known as a method of coating a coating liquid on a single substrate such as a large glass substrate represented by a color filter for LCD. This method has a drawback that the coating efficiency is as low as about 10% and that the coating film becomes too thick at the corners of the substrate. There are knife coating method, roll coating method, and die coating method as a method for solving this drawback and for efficiently applying the coating liquid to the single-wafer substrate. In order to obtain a uniform film thickness using these methods, However, there is a problem that the smoothness of the substrate surface must be less than the coating accuracy. As a liquid coating method that can also solve this problem, the applicant has proposed a method in which a coating liquid bead is formed between the substrate surface and the coating head, and the substrate and the coating head are relatively moved to apply the coating liquid to the substrate surface. Previous international application PCT / JP 94
/ 00845 (International filing date: May 27, 1994).

【0003】[0003]

【発明が解決しようとする課題】上述のナイフコート方
式、ロールコート方式、ダイコート方式を用いて塗布を
行う場合においても、また上述の国際出願に記載の方式
においても、塗布終了時に基板の塗布終了端部に過剰の
塗布液が残留し、この残留液のために、塗布膜厚の均一
領域が縮小したり、部分的な乾燥不良が生じたりして、
塗布膜の品質が阻害される要因となっている。
When the coating is carried out using the knife coating method, the roll coating method, the die coating method described above, or in the method described in the above-mentioned international application, the coating of the substrate is completed at the end of the coating. Excessive coating liquid remains on the edges, and due to this residual liquid, the uniform area of the coating film thickness is reduced, and partial poor drying occurs.
This is a factor that hinders the quality of the coating film.

【0004】そこで上記国際出願に開示した方法では、
過剰塗布液を除去するために、過剰塗布液の真空吸引に
よる除去や、吸収性ロールによる除去が行われる。しか
しながら、真空吸引による塗布液除去は、塗布幅全体に
わたって行うのに時間を要し、かつ吸い取った余剰塗布
液の処理が必要になり、配管、真空源の設置によりスペ
ースを要するという欠点がある。また、吸収性ロールに
よる除去は、特に有機溶剤系塗布液を用いる場合に、ロ
ールの耐久性、洗浄性の点で問題があり、ロールの材質
に制限を受けるという問題があり、しかも吸収性ロール
は使用後に洗浄しなければならないため洗浄溶剤を多く
使用する必要があるという問題や、機構的に複雑で設置
スペースを多く要するという問題がある。
Therefore, in the method disclosed in the above international application,
In order to remove the excess coating liquid, the excess coating liquid is removed by vacuum suction or an absorbent roll. However, the removal of the coating solution by vacuum suction takes time to be performed over the entire coating width, and it is necessary to treat the absorbed excess coating solution, which requires space for installing a pipe and a vacuum source. Further, the removal by the absorptive roll, especially when using an organic solvent-based coating liquid, there is a problem in terms of roll durability and washability, there is a problem that the material of the roll is limited, Has a problem that a large amount of cleaning solvent needs to be used since it must be cleaned after use, and a problem that it is mechanically complicated and requires a large installation space.

【0005】本発明は上述の問題を解決するためになさ
れたもので、その目的は、過剰塗布液の吸収のための原
理が簡単であるため安価で、吸収に時間をとらず、しか
も吸収を確実に行うことができ、吸収液の後処理や洗浄
を必要としない、基板面端部の過剰塗布液除去方法およ
び装置を得ることにある。
The present invention has been made to solve the above-mentioned problems, and its purpose is to be inexpensive because the principle for absorbing excess coating solution is simple, and to absorb absorption in a short time. An object of the present invention is to obtain a method and an apparatus for removing the excess coating liquid at the end of the substrate surface, which can be surely performed and does not require post-treatment or cleaning of the absorbing liquid.

【0006】[0006]

【課題を解決するための手段】請求項1の発明は、基板
面への塗布液の塗布終了時に基板面端部寄りに残留する
過剰塗布液を除去する、基板面端部の過剰塗布液除去方
法であって、基板面への塗布液の塗布終了時に、基板の
過剰塗布液が残留する側の端縁に、塗布幅の全体にわた
って吸収材を押し当てるとともに、この吸収材を過剰塗
布液が残留している基板面部分に接触させ、過剰塗布液
を吸収材に吸収することを特徴とする。
According to a first aspect of the present invention, excess coating liquid remaining near the edge of the substrate surface is removed at the end of coating of the coating liquid on the substrate surface. In this method, when the coating liquid is applied to the surface of the substrate, the absorbent material is pressed against the edge of the substrate where the excess coating liquid remains, over the entire coating width, and It is characterized in that the remaining coating material is brought into contact with the remaining substrate surface portion and the excess coating liquid is absorbed by the absorbing material.

【0007】請求項2の発明では、請求項1の方法にお
いて、前記吸収材として吸収性シートを用い、この吸収
性シートを、その異なる部分が順次過剰塗布液を吸収す
るように、基板に関して送るようにする。
According to a second aspect of the present invention, in the method of the first aspect, an absorbent sheet is used as the absorbent material, and the absorbent sheet is fed with respect to the substrate so that different portions thereof sequentially absorb the excess coating liquid. To do so.

【0008】請求項3の発明では、請求項1または2の
方法において、基板の端縁に吸収材を押し当てかつ吸収
材を過剰塗布液が残留している基板面部分に接触させる
ときに、少くとも、過剰塗布液が残留している基板面部
分に、吸収材を背後から押圧部材により押圧する。
According to a third aspect of the present invention, in the method of the first or second aspect, when the absorber is pressed against the edge of the substrate and the absorber is brought into contact with the substrate surface portion where the excess coating liquid remains, At least, the absorber is pressed from behind by the pressing member to the substrate surface portion where the excess coating liquid remains.

【0009】請求項4による基板面端部の過剰塗布液除
去装置は、基板面への液塗布装置に支持される基板の過
剰塗布液が残留する側の端縁に向かって進退自在に設け
られた往復動部材と、この往復動部材の先端部に支持さ
れた吸収材と、基板面への液塗布終了時に前記吸収材を
基板端縁に押し当てるように前記往復動部材を前進させ
る駆動手段と、往復動部材の先端部に支持されていて、
往復動部材が前進した時に前記吸収材を、少くとも過剰
塗布液が残留している基板面部分に、背後から押圧する
押圧部材とを備えることを特徴とする。
According to a fourth aspect of the present invention, there is provided an apparatus for removing excessive coating liquid on the edge of a substrate surface so as to be movable back and forth toward the edge of the substrate supported by the liquid coating apparatus for the substrate surface on the side where the excessive coating liquid remains. A reciprocating member, an absorber supported by the tip of the reciprocating member, and a driving means for advancing the reciprocating member so that the absorber is pressed against the edge of the substrate at the end of liquid application on the substrate surface. And supported by the tip of the reciprocating member,
When the reciprocating member advances, the absorbent material is provided with a pressing member that presses the absorbent material from at least the substrate surface portion where the excess coating liquid remains.

【0010】請求項5および6の発明では、請求項4の
過剰塗布液除去装置において、前記押圧部材が、それぞ
れ、基板端縁へ向かう方向に開放されたチャンネル材お
よび回動自在な部材により構成される。
According to the fifth and sixth aspects of the present invention, in the excess coating liquid removing apparatus according to the fourth aspect, the pressing member is composed of a channel member and a rotatable member which are opened in the direction toward the edge of the substrate. To be done.

【0011】[0011]

【作用】請求項1による過剰塗布液除去方法では、基板
面への液塗の終了時に、基板の端縁にまず吸収材が押し
当てられ、次いで吸収材が端縁近くの過剰塗布液のある
基板面部分に接触させられて、過剰塗布液は吸収材に吸
収される。
In the method for removing excess coating liquid according to the first aspect of the present invention, when the coating of the liquid on the surface of the substrate is completed, the absorbent is first pressed against the edge of the substrate, and then the absorbent has the excess coating liquid near the edge. The excess coating liquid is brought into contact with the substrate surface portion and absorbed by the absorbing material.

【0012】請求項2による過剰塗布液除去方法では、
吸収性シートが基板に押し当てられる度ごとに、その異
なる部分に順次過剰塗布液が吸収される。
In the method for removing excess coating liquid according to claim 2,
Every time the absorbent sheet is pressed against the substrate, the excess coating liquid is sequentially absorbed by the different portions.

【0013】請求項3による過剰塗布液除去方法では、
吸収材が押圧部材により背後から押されて、基板の所定
位置に押し当てられ、接触する。
In the method for removing excess coating liquid according to claim 3,
The absorber is pressed from the back by the pressing member and pressed against a predetermined position of the substrate to come into contact therewith.

【0014】請求項4による過剰塗布液除去装置では、
基板面への液塗布終了時に、往復動部材が駆動手段によ
り基板端縁へ向かって前進させられて、吸収材が基板に
押し当てられ、次いで押圧部材が吸収材を前後から押し
て吸収材を過剰塗布液が残留している基板面に接触させ
る。これによって、過剰塗布液は吸収材によく吸収され
る。
In the apparatus for removing excess coating liquid according to claim 4,
At the end of the application of the liquid to the substrate surface, the reciprocating member is advanced toward the substrate edge by the driving means, the absorbent material is pressed against the substrate, and then the pressing member pushes the absorbent material from the front and back to excess the absorbent material. The surface of the substrate on which the coating liquid remains is brought into contact. As a result, the excess coating liquid is well absorbed by the absorbent material.

【0015】請求項5および6による過剰塗布液除去装
置では、それぞれ、チャンネル材および回動部材からな
る押圧部材がその特殊な構成により、吸収材の一部を、
過剰塗布液が残留する基板面部分へ確実に接触させる。
In the excess coating liquid removing device according to the fifth and sixth aspects, the pressing member composed of the channel member and the rotating member has a special structure, so that part of the absorbing material is
Make sure that the excess coating liquid contacts the surface of the substrate where it remains.

【0016】[0016]

【実施例】以下、図面を参照して本発明の実施例を説明
するが、その前に基板への塗布液の塗布方法の一例を図
1から図4を参照して説明する。
Embodiments of the present invention will be described below with reference to the drawings. Before that, an example of a method for applying a coating liquid to a substrate will be described with reference to FIGS. 1 to 4.

【0017】本発明で塗布処理される枚葉基体Sは、典
型的にはLCDカラーフィルター用大型ガラス基板であ
り、また、基板に塗布される液は、ガラス基板上に微細
パターンを形成するための感光性樹脂である。ガラス基
板は非可撓性であるが、本発明で処理される基板はこの
ようなガラス基板に限らずプラスチック、金属、紙等で
もよく、また基板自体が可撓性をもっていてもよい。ま
た、塗布される液は、水系、溶剤系等各種の液を用いる
ことができ、顔料、染料、フィラー、増感剤、樹脂、添
加剤等を単独または組合せて混合することができる、図
1において、Sは基板である。図1は基板Sへの液塗布
の開示時の状態を示している。図1のように、ホルダ8
の下面吸着面に、水平に対し角度θをなして基板Sが吸
着保持されている。そして、基板Sの最も高い端縁S1
の近傍下面の直下に、塗布ヘッドHの直線状スリット1
3が一定のクリアランスをおいて位置するように、ホル
ダ8の位置を定めておく。
The single-wafer substrate S applied by the present invention is typically a large glass substrate for LCD color filters, and the liquid applied to the substrate forms a fine pattern on the glass substrate. It is a photosensitive resin. Although the glass substrate is inflexible, the substrate treated in the present invention is not limited to such a glass substrate, and may be plastic, metal, paper, or the like, and the substrate itself may be flexible. As the liquid to be applied, various liquids such as water-based and solvent-based liquids can be used, and pigments, dyes, fillers, sensitizers, resins, additives and the like can be mixed alone or in combination. In, S is a substrate. FIG. 1 shows a state at the time of disclosure of the liquid application on the substrate S. As shown in FIG. 1, the holder 8
The substrate S is adsorbed and held on the lower adsorbing surface thereof at an angle θ with respect to the horizontal. And the highest edge S1 of the substrate S
Immediately below the lower surface in the vicinity of the
The position of the holder 8 is determined so that the 3 is positioned with a certain clearance.

【0018】感光性樹脂のような塗布液Rは、塗布液タ
ンク15内に貯えられていて、ポンプ16などの送液手
段によって塗布ヘッドH内へ送られて、スリット13か
ら上方へ送り出され、塗布液ビードBが形成される。塗
布液ビードBは、基板Sの下面(主面)と塗布ヘッドH
とのクリアランスに塗布液Rの液溜まりとして形成さ
れ、この液ビードBは基板Sの下面に付着する。基板下
面と塗布ヘッドHの間の最小クリアランスは、塗布液R
の粘度、表面張力等の物性により、塗布液Rがクリアラ
ンスからこぼれ出さずに塗布液ビードBが形成されるよ
うに設定される。塗布液ビードBが図1のように形成さ
れた時に、基板Sの低い側に面するメニスカスL1と、
基板の高い側に面するメニスカスL2が形成されるが、
前記傾斜角度θのために、メニスカスL1,L2の高さ
寸法h1,h2は、h1>h2となる。
A coating liquid R such as a photosensitive resin is stored in a coating liquid tank 15 and is sent into the coating head H by a liquid feeding means such as a pump 16 and is sent upward from the slit 13. The coating liquid bead B is formed. The coating liquid bead B is formed on the lower surface (main surface) of the substrate S and the coating head H.
The liquid bead B is formed as a liquid pool of the coating liquid R in the clearance between the liquid bead B and the lower surface of the substrate S. The minimum clearance between the lower surface of the substrate and the coating head H is the coating liquid R
The coating liquid R is set so that the coating liquid bead B is formed without spilling from the clearance due to physical properties such as viscosity and surface tension. A meniscus L1 facing the lower side of the substrate S when the coating liquid bead B is formed as shown in FIG.
A meniscus L2 facing the high side of the substrate is formed,
Due to the inclination angle θ, the height dimensions h1 and h2 of the meniscuses L1 and L2 are h1> h2.

【0019】次に、図2の塗布開始状態から基板Sの下
面である主面に塗布を行うには次のようにする。
Next, in order to apply the coating to the main surface which is the lower surface of the substrate S from the coating start state shown in FIG.

【0020】前記クリアランスを一定に維持したまま、
図示しないガイドレールに沿って図2の位置からホルダ
8を右斜め上方へ移動させると、図3の状態から、図4
に示すように基板Sが一定の傾斜角度θで塗布ヘッドH
に対し斜め右上方へ移動する。これと併行して、塗布液
ポンプ16で塗布液Rを塗布ヘッドHに送り続けてビー
ドBを形成し続けると、塗布液Rは基板Sの下面の主面
に順次付着して塗布層Raが形成される。この塗布工程
中、塗布液Rは、順次塗布された量だけ補うように、ポ
ンプ16によって塗布液ビードBに供給され、ビードの
形状を一定に保つようにする。そして、図4に示すよう
に、塗布ヘッドHが基板Sの最も低い端縁S2に近い塗
布範囲最終端に到達した時点で、基板Sの移動を停止
し、次いで、クリアランス内に残留している塗布液ビー
ドBを除去したのち、必要により塗布ヘッドHを基板S
に支障のない場所まで離脱させる。
While maintaining the clearance constant,
When the holder 8 is moved diagonally upward to the right from the position of FIG. 2 along a guide rail (not shown), the holder of FIG.
As shown in FIG.
To the right diagonally upward. In parallel with this, when the coating liquid R is continuously sent to the coating head H by the coating liquid pump 16 and the beads B are continuously formed, the coating liquid R sequentially adheres to the lower main surface of the substrate S to form the coating layer Ra. It is formed. During this coating step, the coating liquid R is supplied to the coating liquid bead B by the pump 16 so as to supplement only the sequentially coated amount so that the bead shape is kept constant. Then, as shown in FIG. 4, when the coating head H reaches the final end of the coating range close to the lowest edge S2 of the substrate S, the movement of the substrate S is stopped and then remains in the clearance. After removing the coating solution bead B, the coating head H is moved to the substrate S if necessary.
Remove it to a place where it does not interfere with the operation.

【0021】その後、基板Sを水平に、上向あるいは下
向にして乾燥ユニット内でホットプレートあるいは熱
風、遠赤外線ヒーター等の乾燥手段を用いて塗布膜Ra
を乾燥させて均一な塗布膜を形成する。
After that, the substrate S is set horizontally, upward or downward, and in the drying unit, the coating film Ra is formed by using a drying means such as a hot plate, hot air, or a far infrared heater.
Is dried to form a uniform coating film.

【0022】以上のようにして行う基板への液塗布の方
法は、基本的に、出願人の国際出願PCT/JP 91
/00845号に記載されている。
The method of coating a liquid on a substrate performed as described above is basically the same as the applicant's international application PCT / JP 91.
/ 00845.

【0023】前述のようにして基板Sの面に塗布液の膜
Raを形成した場合、図4に示すように、基板Sの低い
側の端縁S2の近傍に過剰塗布液Rbが残留する。この
ような過剰塗布液Rbの溜りは、図1から図4に示す方
向以外の方法を用いて塗布液膜Raを形成した場合にも
発生する。本発明は、このような残留過剰塗布液を除去
しようとするものである。
When the film Ra of the coating liquid is formed on the surface of the substrate S as described above, the excess coating liquid Rb remains near the lower edge S2 of the substrate S as shown in FIG. Such accumulation of the excess coating liquid Rb also occurs when the coating liquid film Ra is formed by a method other than the direction shown in FIGS. 1 to 4. The present invention is intended to remove such a residual excess coating liquid.

【0024】図5は残留過剰塗布液を除去する装置の一
実施例を示す。同図において、1は、図1から図4に示
したと同じ作動原理をもつ塗布液塗布装置であり、図1
に示した傾斜過度θは零または零に近い場合を示してい
る。ホルダ8は軸2により枢支されていて傾斜角θを調
節可能に、かつ上下反転可能に設けられている。ホルダ
8の下面には基板Sが保持されており、基板Sの下面に
は既に塗布液の膜Raが形成されている。
FIG. 5 shows an embodiment of an apparatus for removing the residual excess coating liquid. In FIG. 1, reference numeral 1 is a coating liquid coating device having the same operation principle as shown in FIGS.
The excessive inclination θ shown in (3) is zero or close to zero. The holder 8 is pivotally supported by the shaft 2 so that the inclination angle θ can be adjusted and the holder 8 can be turned upside down. The substrate S is held on the lower surface of the holder 8, and the coating liquid film Ra is already formed on the lower surface of the substrate S.

【0025】ホルダ8の下方には塗布ヘッドHが設けら
れている。塗布ヘッドHは図1に示した場合とまったく
同じ原理で塗布液を上方へ送り出す、直線状スリット1
3(図1)と同様なスリットをもっている。図1の場合
には、塗布ヘッドHに対して基板Sが移動するように構
成されているが、図5の例では、ホルダ8に支持された
基板Sは移動せず、塗布ヘッドHが実線および仮想線矢
印で示す方向に往復動するようになっている。塗布ヘッ
ドHは上下駆動機構を内蔵する走行台3上に固定されて
おり、走行台3は、基台4上に支持されている送りねじ
5に螺合して送りねじ5の回転により図において左右方
向に送られる。送りねじ5はサーボモータMにより回転
駆動されるようになっている。なお、基台4は、ホルダ
8の傾斜角に合せて傾斜させうるように構成することが
できる。
A coating head H is provided below the holder 8. The coating head H sends the coating liquid upward by the same principle as in the case shown in FIG.
It has the same slit as 3 (Fig. 1). In the case of FIG. 1, the substrate S is configured to move with respect to the coating head H, but in the example of FIG. 5, the substrate S supported by the holder 8 does not move, and the coating head H is shown by a solid line. And, it is adapted to reciprocate in a direction indicated by a virtual line arrow. The coating head H is fixed on a traveling table 3 having a built-in up-down drive mechanism, and the traveling table 3 is screwed onto a feed screw 5 supported on a base 4 to rotate the feed screw 5 so as to be shown in the drawing. It is sent to the left and right. The feed screw 5 is rotationally driven by the servo motor M. The base 4 can be configured to be tiltable according to the tilt angle of the holder 8.

【0026】塗布液膜Raを形成するには、塗布へツド
Hを図5において右方から左方へ基板Sの下面に沿って
鋭線矢印方向に移動させる。この結果、前述のように、
図において基板Sの下面の左端縁近傍に過剰塗布液が残
留する。過剰塗布液は図6にRbで示されている。
In order to form the coating liquid film Ra, the coating head H is moved from the right side to the left side in FIG. As a result, as mentioned above,
In the figure, the excess coating liquid remains near the left edge of the lower surface of the substrate S. The excess coating solution is indicated by Rb in FIG.

【0027】本発明の方法の一実施例によれば、過剰塗
布Rbは、図6から図9に示す工程により除去される。
図6に示すように、過剰塗布液Rbのある基板Sの端縁
S2に対向して吸収材20が設けられる。吸収材20は
塗布液Rを吸収することのできる繊維材シート、例えば
不織布、その他多孔質製のシートにより構成することが
できる。吸収材の一例は、ベンコットワイパー(旭化成
工業株式会社の商品名)である。吸収材20は上下方向
に張るように図示しない部材により支持されている。ま
た、吸収材20の背後には押圧部材21が設けられてい
る。押圧部材21は端縁S2に向かって開いたチャンネ
ル材により構成されている。
According to one embodiment of the method of the present invention, the overcoat Rb is removed by the steps shown in FIGS.
As shown in FIG. 6, the absorber 20 is provided so as to face the edge S2 of the substrate S having the excess coating liquid Rb. The absorbent material 20 can be composed of a fibrous material sheet capable of absorbing the coating liquid R, for example, a non-woven fabric or other porous sheet. An example of the absorbent material is Bencot wiper (trade name of Asahi Kasei Corporation). The absorber 20 is supported by a member (not shown) so as to stretch in the vertical direction. A pressing member 21 is provided behind the absorbent material 20. The pressing member 21 is composed of a channel material opened toward the edge S2.

【0028】基板端縁S2近傍の過剰塗布液Rbを除去
するには、吸収材20を、図7に示すように端縁S2に
向かって移動させて端縁S2に接触させ、押し当てる。
次に、図8に示すように押圧部材21を、端縁S2に押
し当てられた吸収材20の背後から押しつけて、端縁S
2およびそれに隣接する基板上下面部分に吸収材20を
添わせるようにする。これにより、吸収材20の一部
は、端縁S2と押圧部材21との間に挟まれるようにな
る。このような状態が生じるようにするためには、当然
のことながら、チャンネル材である押圧部材21の内溝
の幅は基板Sの厚さに吸収材20の厚さの2倍を加えた
値に等しいか、それより僅かに小さい値としておくのが
よい。
In order to remove the excess coating liquid Rb in the vicinity of the edge S2 of the substrate, the absorbent 20 is moved toward the edge S2 as shown in FIG.
Next, as shown in FIG. 8, the pressing member 21 is pressed from behind the absorbent material 20 pressed against the edge S2 to move the edge S.
The absorber 20 is added to the upper and lower surface portions of the substrate 2 and the adjacent portions of the substrate 2. As a result, a part of the absorbent material 20 is sandwiched between the edge S2 and the pressing member 21. In order to cause such a state, the width of the inner groove of the pressing member 21, which is the channel material, is of course the value obtained by adding the thickness of the substrate S to twice the thickness of the absorber 20. It is better to set the value to or slightly smaller than.

【0029】図8のように、端縁S2を吸収材20が囲
むことによって、過剰塗布液Rbは、基板下面側の吸収
材20の部分に吸収され、しかも基板端縁に回り込もう
とする塗布液もきれいに吸収されてしまう。よって、図
9に示すように、押圧部材21を図において左方へ後退
させ、かつ吸収材20をも後退させると、基板端縁S2
の近傍の過剰塗膜液Rbは完全に消失してその部分は多
少薄くなり、他の部分には均一な厚さの塗布液膜Raが
残されることになる。吸収された塗布液は、図9でRb
により示す。
As shown in FIG. 8, since the absorbent material 20 surrounds the edge S2, the excess coating liquid Rb is absorbed by the absorbent material 20 on the lower surface side of the substrate, and further tries to wrap around to the edge of the substrate. The coating liquid is also absorbed neatly. Therefore, as shown in FIG. 9, when the pressing member 21 is retracted to the left in the drawing and the absorber 20 is also retracted, the substrate edge S2
The excess coating liquid Rb in the vicinity of is completely disappeared, the portion becomes slightly thin, and the coating liquid film Ra having a uniform thickness is left in the other portions. The absorbed coating liquid is Rb in FIG.
Indicated by.

【0030】以上に述べたように、本発明の方法では、
基板端縁に単に吸収材20を押し付けるだけでなく、そ
の一部を、基板の過剰塗布液のある側の面の一部に添わ
せるようにするので、過剰塗布液を迅速かつ確実に吸収
して除去することができる。
As mentioned above, in the method of the present invention,
Not only the absorbent material 20 is pressed against the edge of the substrate, but also a part of the absorbent material 20 is brought along with a part of the surface of the substrate on the side where the excess coating liquid is present, so that the excess coating liquid is absorbed quickly and reliably. Can be removed.

【0031】図5には、図6から図9に示す工程を実施
するための過剰塗布液除去装置を示す。前記基台4に隣
接してスタンド23が固設され、このスタンド23上に
駆動手段の一例としてのエアシリンダ24が設置されて
いる。エアシリンダ24は往復動部材としてのピストン
ロッド2を有し、このピストンロッド25は図5におい
て左右に往復道自在となっている。ピストンロッド25
の先端(右端)には前記チャンネル材の押圧部材21が
水平方向固定されている。
FIG. 5 shows an excessive coating liquid removing device for carrying out the steps shown in FIGS. 6 to 9. A stand 23 is fixedly installed adjacent to the base 4, and an air cylinder 24 as an example of a driving unit is installed on the stand 23. The air cylinder 24 has a piston rod 2 as a reciprocating member, and the piston rod 25 can freely reciprocate left and right in FIG. Piston rod 25
The pressing member 21 of the channel member is horizontally fixed to the tip (right end) of the.

【0032】図10に示すように、ピストンロッド25
の先端は押圧部材21の中程に固定されており、押圧部
材21の両端には上下方向の腕27,27の中間部が図
11に示すように固定されている。そして、腕27,2
7の上下端の内側には軸28,28が突設され、これら
の軸によって、前記吸収材シート20のロール20a、
20aが回転自在に支持されている。そして、2本のロ
ール20a,20aの上方のものは駆動側となってお
り、その軸はステッピングモータMoのような回転駆動
源に連結されている。ロール20a,20aの間には、
押圧部材21の溝側に隣接するように吸収材シート20
が上下方向に張り渡されており、したがって、駆動側の
上方のロール20aを回転駆動することにより、他方の
ロール20aから駆動側ロール20aへ吸収材シート2
0を漸次巻き取ることができる。なお、下方のロール2
0aの軸はパウダーブレーキのような制動装置29に連
結されている。
As shown in FIG. 10, the piston rod 25
Is fixed in the middle of the pressing member 21, and the intermediate portions of the vertical arms 27, 27 are fixed to both ends of the pressing member 21 as shown in FIG. And the arms 27, 2
Shafts 28, 28 are provided on the inner side of the upper and lower ends of 7, and the rolls 20a of the absorbent sheet 20 are
20a is rotatably supported. The upper part of the two rolls 20a, 20a is the drive side, and its shaft is connected to a rotary drive source such as a stepping motor Mo. Between the rolls 20a, 20a,
The absorbent sheet 20 is provided so as to be adjacent to the groove side of the pressing member 21.
Are stretched in the vertical direction. Therefore, by rotating the upper roll 20a on the drive side, the absorbent sheet 2 is transferred from the other roll 20a to the drive side roll 20a.
0 can be gradually wound up. The lower roll 2
The shaft 0a is connected to a braking device 29 such as a powder brake.

【0033】以上に述べたように過剰塗布液除去装置の
作用を説明する。図5に示すように、基板Sの下面に塗
布ヘッドHにより塗布液膜Raが形成された後、エアシ
リンダ24を作動させてピストンロッド25を図におい
て右方へ前進させる。これによって、ピストンロッド2
5は図5の位置へ達し、その先端の押圧部材21の前側
にある吸収材シート20が図7に示すように押し当てら
れ、次いで押圧部材21が図8に示すような状態を生起
させる。したがって、さきに説明したよに、過剰塗布液
Rbが吸収材20に確実に吸収されて除去される。押圧
部材21は、図8の状態で吸収材20を基板面への接触
状態に保ち、過剰塗布液の吸収を確実にする。上述のよ
うな塗布液の吸収が行われている間に、塗布ヘッドHは
次の塗布工程のために実線位置および仮想線位置を経て
塗布開始位置へ戻される。そして、過剰塗布液の除去完
了後にエアシリンダ24を作動させて、ピストンロッド
25、押圧部材21および吸収材20を図5において左
方へ後退させる。また、それと併行して駆動側ロール2
0aを少量回動させて、吸収材20を上下方向に送り、
新しい吸収材部分20が基板端縁S2に対向するように
して次の過剰塗布液吸収工程に備える。
The operation of the excessive coating liquid removing device as described above will be described. As shown in FIG. 5, after the coating liquid film Ra is formed on the lower surface of the substrate S by the coating head H, the air cylinder 24 is operated to move the piston rod 25 forward to the right in the figure. As a result, the piston rod 2
5 reaches the position of FIG. 5, the absorbent sheet 20 on the front side of the pressing member 21 at its tip is pressed as shown in FIG. 7, and then the pressing member 21 causes the state as shown in FIG. Therefore, as described above, the excess coating liquid Rb is reliably absorbed by the absorbent 20 and removed. The pressing member 21 keeps the absorbent 20 in contact with the substrate surface in the state of FIG. 8 to ensure the absorption of the excess coating liquid. While the coating liquid is being absorbed as described above, the coating head H is returned to the coating start position through the solid line position and the virtual line position for the next coating step. Then, after the removal of the excess coating liquid is completed, the air cylinder 24 is operated to retract the piston rod 25, the pressing member 21, and the absorbent 20 to the left in FIG. In addition, in parallel with that, the drive side roll 2
Rotate 0a a small amount to feed the absorber 20 in the vertical direction,
The new absorbing material portion 20 is made to face the substrate edge S2 to prepare for the next excess coating liquid absorbing step.

【0034】図12から図15は本発明による過剰塗布
液除去装置の他の実施例を示す。この実施例が、図5の
実施例と異なる点は、押圧部材がチャンネル材の代り
に、基板Sの塗布幅の全体にわたる幅の板材からなる回
動部材30により構成されている点にある。回動部材3
0は軸31により枢支されており、図12で示す位置と
図14で示す位置との間で往復回動自在となっており、
図12に示す駆動装置32によって回動させられる。こ
の駆動装置32と回動部材30は、例えば図5に示すピ
ストンロッド25のような往復動部材の先端に支持され
ている。また、この実施例でも吸収材シート20は図5
に示したと同様にして支持されている。
12 to 15 show another embodiment of the excess coating liquid removing device according to the present invention. This embodiment is different from the embodiment of FIG. 5 in that the pressing member is constituted by a rotating member 30 made of a plate material having a width over the entire coating width of the substrate S instead of the channel material. Rotating member 3
0 is pivotally supported by a shaft 31 and is reciprocally rotatable between the position shown in FIG. 12 and the position shown in FIG.
It is rotated by the drive device 32 shown in FIG. The drive device 32 and the rotating member 30 are supported by the tip of a reciprocating member such as the piston rod 25 shown in FIG. Also in this embodiment, the absorbent sheet 20 has the same structure as in FIG.
It is supported in the same way as shown in.

【0035】この実施例では、ピストンロッド25を前
進させて吸収材シート20を図13に示すように基板S
の端縁S2に押し当てた後、駆動装置32により図14
に示す矢印方向に回動させると、回動部材30は、基板
端縁S2の下側に隣接する吸収材シート20の部分を、
図4に示すように端縁S2に隣接する基板下面に対して
押しつける。これによって、過剰塗布液Rbは積極的に
吸収材シート20に吸収されて消失する。次に、ピスト
ンロッド25を後退させると図15の状態が得られる。
この実施例でも、吸収材シート20の一部過剰塗布液を
確実に除去することができる。
In this embodiment, the piston rod 25 is moved forward to move the absorbent sheet 20 to the substrate S as shown in FIG.
14 after being pressed against the edge S2 of the
When rotated in the arrow direction indicated by, the rotating member 30 moves the portion of the absorbent sheet 20 adjacent to the lower side of the substrate edge S2,
As shown in FIG. 4, it is pressed against the lower surface of the substrate adjacent to the edge S2. As a result, the excess coating liquid Rb is positively absorbed by the absorbent sheet 20 and disappears. Next, when the piston rod 25 is retracted, the state shown in FIG. 15 is obtained.
Also in this embodiment, the partial excess coating liquid of the absorbent sheet 20 can be reliably removed.

【0036】なお、以上に述べた実施例では、基板の下
面に液を塗布するようになっているが、基板の上向き面
に液を塗布する場合にも本発明の前述の原理を利用でき
るものである。また、基板と塗布ヘッドの塗布液膜方向
の移動は、相対移動であればよく、どちらが動いてもよ
い。
Although the liquid is applied to the lower surface of the substrate in the above-mentioned embodiments, the above-described principle of the present invention can be used when the liquid is applied to the upper surface of the substrate. Is. Further, the movement of the substrate and the coating head in the coating liquid film direction may be relative movement, and either one may move.

【0037】[0037]

【発明の効果】請求項1の発明によれば、基板の残留過
剰塗布液のある側の端縁に吸収材を押し当てるのに加
え、吸収材の一部を残留過剰塗布液のある基板面にも接
触させるので、過剰塗布液を確実に除去することができ
る。また、この発明によれば、従来のロール洗浄や真空
吸引に比し、短時間でしかも簡単な手段で過剰塗布液を
除去できる利点がある。また、基端端縁についても吸収
材によりきれいに端部処理ができるので、残留塗布液に
よる基板汚れを防止できる。
According to the invention of claim 1, in addition to pressing the absorbent material against the edge of the side of the substrate on which the residual excess coating solution is present, a part of the absorbent material is applied to the substrate surface on which the residual excess coating solution is present. Since it is also brought into contact with, it is possible to reliably remove the excess coating liquid. Further, according to the present invention, there is an advantage that the excess coating liquid can be removed in a short time by a simple means as compared with the conventional roll cleaning and vacuum suction. Further, since the edge portion of the base end edge can be cleanly treated by the absorbent material, it is possible to prevent the substrate from being contaminated by the residual coating liquid.

【0038】請求項2の発明によれば、吸収材をシート
とし、それを基板に関して送りながら使用するので、常
に吸収材の新しい部分が基板ごとに塗布液の吸収のため
に使用され、そのため吸収がよく行われ、しかも吸収材
を後で溶剤で洗浄するなどの手間が不要となる。
According to the second aspect of the present invention, the absorbent material is formed into a sheet and is used while being fed with respect to the substrate. Therefore, a new portion of the absorbent material is always used for absorbing the coating liquid for each substrate, and therefore the absorbent material is used. Is often performed, and the labor of washing the absorbent material with a solvent later is unnecessary.

【0039】請求項3の発明によれば、残留過剰塗布液
のある基板面部への吸収材の接触を、その背後から押圧
部材を押圧することにより行うので、吸収材の基板面部
への接触が確実に行われる。
According to the third aspect of the invention, the contact of the absorbent with the surface of the substrate having the residual excess coating liquid is performed by pressing the pressing member from the rear side of the absorbent, so that the contact of the absorbent with the surface of the substrate is prevented. Definitely done.

【0040】請求項4の発明によれば、過剰塗布液が残
留している基板面部分に、押圧部材の背後からの押圧に
より吸収材を確実に接触させることができ、過剰塗布液
を短時間で簡単に除去することが可能になる。また、基
板端縁についても吸収材によりきれいに端部処理ができ
るので、残留塗布液による基板汚れを防止できる。
According to the fourth aspect of the present invention, the absorber can be surely brought into contact with the substrate surface portion where the excess coating liquid remains by pressing from the back of the pressing member, and the excess coating liquid can be kept in a short time. Can be removed easily. Further, since the edge portion of the substrate edge can be cleanly treated by the absorbing material, it is possible to prevent the substrate from being contaminated by the residual coating liquid.

【0041】また、請求項6の発明では、往復動部材の
前進時に回動部材を回動させて、吸収材を基板面へ積極
的に接触させることができる。
According to the sixth aspect of the invention, when the reciprocating member moves forward, the rotating member can be rotated to positively bring the absorber into contact with the substrate surface.

【図面の簡単な説明】[Brief description of drawings]

【図1】基板への液塗布装置の一例を示す原理図。FIG. 1 is a principle diagram showing an example of a liquid coating apparatus for a substrate.

【図2】液塗布の開始時の状態を示す図。FIG. 2 is a diagram showing a state at the start of liquid application.

【図3】液塗布の途中の状態を示す図。FIG. 3 is a diagram showing a state in the middle of liquid application.

【図4】液塗布の終了時の状態を示す図。FIG. 4 is a diagram showing a state at the end of liquid application.

【図5】本発明による基板面端部の過剰塗布液除去装置
を示す正面図。
FIG. 5 is a front view showing an excessive coating liquid removing device at the end portion of the substrate surface according to the present invention.

【図6】本発明による基板面端部の過剰塗布液除去方法
の一実施例の工程開始時の状態を示す図。
FIG. 6 is a diagram showing a state at the start of steps of an embodiment of the method for removing the excess coating liquid on the end portion of the substrate surface according to the present invention.

【図7】同じく、次の工程を示す図。FIG. 7 is a diagram similarly showing the next step.

【図8】同じく、さらに次の工程を示す図。FIG. 8 is a diagram showing the next step in the same manner.

【図9】同じく、工程完了時の状態を示す図。FIG. 9 is a diagram similarly showing a state at the time of completing the process.

【図10】図5の一部の斜視図。FIG. 10 is a perspective view of a part of FIG.

【図11】図10の左側からみた一部断面側面図。11 is a partial cross-sectional side view seen from the left side of FIG.

【図12】本発明の他の実施例における工程開始時の状
態を示す図。
FIG. 12 is a diagram showing a state at the time of starting a process in another embodiment of the present invention.

【図13】同じく、次の工程を示す図。FIG. 13 is a diagram similarly showing the next step.

【図14】同じく、さらに次の工程を示す図。FIG. 14 is a diagram similarly showing the next step.

【図15】同じく、工程完了時の状態を示す図。FIG. 15 is a diagram showing a state when the process is completed.

【符号の説明】 S 基板 S2 基板端縁 8 基板ホルダ R 塗布液 B ビード Ra 塗布液膜 Rb 過剰塗布液 N 塗布ヘッド 20 吸収材(シート) 20a 吸収材ロール 21 押圧部材(チャンネル材) 24 駆動手段(エアシリンダ) 25 往復動部材(ピストンロッド) 27 腕 30 押圧部材(回動部材)[Explanation of reference symbols] S substrate S2 substrate edge 8 substrate holder R coating liquid B bead Ra coating liquid film Rb excess coating liquid N coating head 20 absorber (sheet) 20a absorber roll 21 pressing member (channel member) 24 driving means (Air cylinder) 25 Reciprocating member (piston rod) 27 Arm 30 Pressing member (rotating member)

───────────────────────────────────────────────────── フロントページの続き (72)発明者 宮 川 俊 二 東京都新宿区市谷加賀町一丁目1番1号 大日本印刷株式会社内 ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Inventor Shunji Miyagawa 1-1-1, Ichigaya-Kagacho, Shinjuku-ku, Tokyo Dai Nippon Printing Co., Ltd.

Claims (6)

【特許請求の範囲】[Claims] 【請求項1】基板面への塗布液の塗布終了時に基板面端
部寄りに残留する過剰塗布液を除去する、基板面端部の
過剰塗布液除去方法であって、基板面への塗布液の塗布
終了時に、基板の過剰塗布液が残留する側の端縁に、塗
布幅の全体にわたって吸収材を押し当てるとともに、こ
の吸収材を過剰塗布液が残留している基板面部分に接触
させ、過剰塗布液を吸収材に吸収することを特徴とする
方法。
1. A method of removing excess coating liquid on the edge of a substrate surface, which comprises removing excess coating liquid remaining near the edge of the substrate surface at the end of coating of the coating liquid on the substrate surface. At the end of coating, the absorbent material is pressed against the edge of the substrate where the excess coating liquid remains, and the absorbent material is brought into contact with the substrate surface portion where the excess coating liquid remains, A method comprising absorbing an excess coating liquid in an absorbent material.
【請求項2】前記吸収材として吸収性シートを用い、こ
の吸収性シートを、その異なる部分が順次過剰塗布液を
吸収するように、基板に関して送ることを特徴とする請
求項1記載の基板面端部の過剰塗布液除去方法。
2. A substrate surface according to claim 1, wherein an absorbent sheet is used as the absorbent material, and the absorbent sheet is fed with respect to the substrate so that different portions thereof sequentially absorb the excess coating liquid. Method for removing excess coating liquid on the edge.
【請求項3】基板の端縁に吸収材を押し当てかつ吸収材
を過剰塗布液が残留している基板面部分に接触させると
きに、少くとも、過剰塗布液が残留している基板面部分
に、吸収材を背後から押圧部材により押圧することを特
徴とする請求項1または2記載の基板面端部の過剰塗布
液除去方法。
3. A substrate surface portion on which at least excess coating liquid remains when the absorbent material is pressed against the edge of the substrate and brought into contact with the substrate surface portion on which excess coating liquid remains. 3. The method for removing excess coating liquid from the edge portion of the substrate surface according to claim 1, wherein the absorbent material is pressed from behind by a pressing member.
【請求項4】基板面への液塗布装置に支持される基板の
過剰塗布液が残留する側の端縁に向かって進退自在に設
けられた往復動部材と、この往復動部材の先端部に支持
された吸収材と、基板面への液塗布終了時に前記吸収材
を基板端縁に押し当てるように前記往復動部材を前進さ
せる駆動手段と、往復動部材の先端部に支持されてい
て、往復動部材が前進した時に前記吸収材を、少くとも
過剰塗布液が残留している基板面部分に、背後から押圧
する押圧部材とを備えることを特徴とする、基板面端部
の過剰塗布液除去装置。
4. A reciprocating member provided to be movable back and forth toward an edge of a substrate supported by a substrate surface liquid coating device on a side where an excess coating liquid remains, and a tip end portion of the reciprocating member. A supported absorber, a drive means for advancing the reciprocating member so as to press the absorber against the substrate edge at the end of liquid application to the substrate surface, and supported by the tip of the reciprocating member, When the reciprocating member advances, the absorbent is provided with a pressing member that presses the absorbent material from at least the substrate surface portion where the excessive coating liquid remains, and the excessive coating liquid at the end portion of the substrate surface. Removal device.
【請求項5】前記押圧部材が、基板端縁へ向かう方向に
開放されたチャンネル材であることを特徴とする請求項
4記載の基板面端部の過剰塗布液除去装置。
5. The excess coating liquid removing device according to claim 4, wherein the pressing member is a channel material opened in a direction toward an edge of the substrate.
【請求項6】前記押圧部材が、往復道部材に基端を回動
自在に軸支された回動部材であることを特徴とする請求
項4記載の基板面端部の過剰塗布液除去装置。
6. The excess coating liquid removing device according to claim 4, wherein the pressing member is a rotating member having a base end rotatably supported by a reciprocating member. .
JP28981694A 1994-11-24 1994-11-24 Method and device for removing excess coating liquid at end of substrate surface Pending JPH08141480A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP28981694A JPH08141480A (en) 1994-11-24 1994-11-24 Method and device for removing excess coating liquid at end of substrate surface

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP28981694A JPH08141480A (en) 1994-11-24 1994-11-24 Method and device for removing excess coating liquid at end of substrate surface

Publications (1)

Publication Number Publication Date
JPH08141480A true JPH08141480A (en) 1996-06-04

Family

ID=17748147

Family Applications (1)

Application Number Title Priority Date Filing Date
JP28981694A Pending JPH08141480A (en) 1994-11-24 1994-11-24 Method and device for removing excess coating liquid at end of substrate surface

Country Status (1)

Country Link
JP (1) JPH08141480A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7338854B2 (en) 2003-12-05 2008-03-04 Samsung Electro-Mechanics Co., Ltd. Method for manufacturing multilayer ceramic capacitor
CN109945812A (en) * 2019-03-22 2019-06-28 北京航空航天大学 A kind of shaft replaces the sealing area contact width monitoring method of mechanism and rubber and plastic axle envelope
CN115487996A (en) * 2022-10-10 2022-12-20 浙江新中纺实业有限公司 Gloiopeltis coating machine

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7338854B2 (en) 2003-12-05 2008-03-04 Samsung Electro-Mechanics Co., Ltd. Method for manufacturing multilayer ceramic capacitor
CN109945812A (en) * 2019-03-22 2019-06-28 北京航空航天大学 A kind of shaft replaces the sealing area contact width monitoring method of mechanism and rubber and plastic axle envelope
CN109945812B (en) * 2019-03-22 2020-12-08 北京航空航天大学 Rotating shaft replacing mechanism and method for monitoring contact width of sealing area of rubber-plastic shaft seal
CN115487996A (en) * 2022-10-10 2022-12-20 浙江新中纺实业有限公司 Gloiopeltis coating machine
CN115487996B (en) * 2022-10-10 2023-12-19 浙江新中纺实业有限公司 Flower and plant coating machine

Similar Documents

Publication Publication Date Title
JP2002090547A (en) Device for manufacturing polarizer
JPH08141480A (en) Method and device for removing excess coating liquid at end of substrate surface
JPH0284337A (en) Rotary type pad printer for printing edge of window glass for automobile
JPH07256862A (en) Equipment for wiping surface of printing paper
KR100965372B1 (en) Silkscreen printing system having a stencil cleaning device
JP2535172B2 (en) Screen printing machine with cleaning mechanism
US5515778A (en) Method and a device for printing disc-shaped registration carriers
JP3690859B2 (en) License plate painting equipment
US11932039B2 (en) Pretreatment device, method of pretreatment for pretreatment device, and printing apparatus
JPS6227862B2 (en)
JPH06305108A (en) Offset printing apparatus
JPH0229504B2 (en)
JPH11254655A (en) Method and device for cleaning screen printing plate
JP2578006Y2 (en) Coating machine blade changing device
JPH0825832A (en) Coating device of adhesive agent
JPH0349293A (en) Printing device for printed circuit board
JPH03121849A (en) Cleaning device for screen printing machine
JPH08141484A (en) Method and device for removing excessive coating liquid at end substrate surface
JP3571439B2 (en) Coating device
JPS5937188B2 (en) Strip side edge processing device with meandering copying mechanism
JP4006263B2 (en) Paste removing device and screen printing machine
JPH1110052A (en) Screen coating method and device
JPH08155Y2 (en) Cutter device
JP3089374B2 (en) Ink supply device for marking
JPH06191010A (en) Attached-ink removing apparatus for squeegee and doctor in screen printing machine

Legal Events

Date Code Title Description
A02 Decision of refusal

Free format text: JAPANESE INTERMEDIATE CODE: A02

Effective date: 20040511