JPH08132574A - Polyimide film - Google Patents
Polyimide filmInfo
- Publication number
- JPH08132574A JPH08132574A JP27267394A JP27267394A JPH08132574A JP H08132574 A JPH08132574 A JP H08132574A JP 27267394 A JP27267394 A JP 27267394A JP 27267394 A JP27267394 A JP 27267394A JP H08132574 A JPH08132574 A JP H08132574A
- Authority
- JP
- Japan
- Prior art keywords
- film
- polyimide film
- polymer
- adhesive
- polymer film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 229920001721 polyimide Polymers 0.000 title claims abstract description 45
- 229920001187 thermosetting polymer Polymers 0.000 claims abstract description 21
- 229920006254 polymer film Polymers 0.000 claims abstract description 18
- 239000004634 thermosetting polymer Substances 0.000 claims abstract description 18
- 238000000034 method Methods 0.000 claims description 11
- 238000004140 cleaning Methods 0.000 claims description 10
- 229920000642 polymer Polymers 0.000 claims description 7
- 230000001070 adhesive effect Effects 0.000 abstract description 27
- 239000000853 adhesive Substances 0.000 abstract description 26
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract description 17
- 238000007639 printing Methods 0.000 abstract description 8
- 239000000126 substance Substances 0.000 abstract description 8
- 239000003513 alkali Substances 0.000 abstract description 7
- 239000003599 detergent Substances 0.000 abstract 1
- 239000010408 film Substances 0.000 description 50
- 239000003822 epoxy resin Substances 0.000 description 16
- 229920000647 polyepoxide Polymers 0.000 description 16
- 229910052751 metal Inorganic materials 0.000 description 13
- 239000002184 metal Substances 0.000 description 13
- 238000000576 coating method Methods 0.000 description 11
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 9
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 9
- 239000012459 cleaning agent Substances 0.000 description 9
- 239000011248 coating agent Substances 0.000 description 9
- 229920001169 thermoplastic Polymers 0.000 description 9
- 239000010410 layer Substances 0.000 description 7
- 238000007747 plating Methods 0.000 description 7
- 239000000203 mixture Substances 0.000 description 6
- 229920005989 resin Polymers 0.000 description 6
- 239000011347 resin Substances 0.000 description 6
- 239000003795 chemical substances by application Substances 0.000 description 5
- 230000000052 comparative effect Effects 0.000 description 5
- 239000000463 material Substances 0.000 description 5
- 229920003223 poly(pyromellitimide-1,4-diphenyl ether) Polymers 0.000 description 5
- 239000004215 Carbon black (E152) Substances 0.000 description 4
- 239000002585 base Substances 0.000 description 4
- 229930195733 hydrocarbon Natural products 0.000 description 4
- 150000002430 hydrocarbons Chemical class 0.000 description 4
- 230000001771 impaired effect Effects 0.000 description 4
- 238000012986 modification Methods 0.000 description 4
- 230000004048 modification Effects 0.000 description 4
- 239000002904 solvent Substances 0.000 description 4
- 238000005406 washing Methods 0.000 description 4
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- 239000007864 aqueous solution Substances 0.000 description 3
- 239000010949 copper Substances 0.000 description 3
- 238000001035 drying Methods 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 238000000465 moulding Methods 0.000 description 3
- 229920006122 polyamide resin Polymers 0.000 description 3
- 229920000178 Acrylic resin Polymers 0.000 description 2
- 239000004925 Acrylic resin Substances 0.000 description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- 229920000459 Nitrile rubber Polymers 0.000 description 2
- 239000004952 Polyamide Substances 0.000 description 2
- 239000005062 Polybutadiene Substances 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 239000012790 adhesive layer Substances 0.000 description 2
- 125000001931 aliphatic group Chemical group 0.000 description 2
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 2
- PXKLMJQFEQBVLD-UHFFFAOYSA-N bisphenol F Chemical compound C1=CC(O)=CC=C1CC1=CC=C(O)C=C1 PXKLMJQFEQBVLD-UHFFFAOYSA-N 0.000 description 2
- 239000012528 membrane Substances 0.000 description 2
- 229920002647 polyamide Polymers 0.000 description 2
- 229920002857 polybutadiene Polymers 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- 239000000243 solution Substances 0.000 description 2
- 229920003048 styrene butadiene rubber Polymers 0.000 description 2
- 229920005992 thermoplastic resin Polymers 0.000 description 2
- AJDIZQLSFPQPEY-UHFFFAOYSA-N 1,1,2-Trichlorotrifluoroethane Chemical compound FC(F)(Cl)C(F)(Cl)Cl AJDIZQLSFPQPEY-UHFFFAOYSA-N 0.000 description 1
- WZCQRUWWHSTZEM-UHFFFAOYSA-N 1,3-phenylenediamine Chemical compound NC1=CC=CC(N)=C1 WZCQRUWWHSTZEM-UHFFFAOYSA-N 0.000 description 1
- ITWBWJFEJCHKSN-UHFFFAOYSA-N 1,4,7-triazonane Chemical compound C1CNCCNCCN1 ITWBWJFEJCHKSN-UHFFFAOYSA-N 0.000 description 1
- LELKUNFWANHDPG-UHFFFAOYSA-N 2-(oxiran-2-ylmethoxymethyl)oxirane;prop-2-enoic acid Chemical compound OC(=O)C=C.C1OC1COCC1CO1 LELKUNFWANHDPG-UHFFFAOYSA-N 0.000 description 1
- FUIQBJHUESBZNU-UHFFFAOYSA-N 2-[(dimethylazaniumyl)methyl]phenolate Chemical compound CN(C)CC1=CC=CC=C1O FUIQBJHUESBZNU-UHFFFAOYSA-N 0.000 description 1
- DRQFBCMQBWNTNV-UHFFFAOYSA-N 2-[bis(2-hydroxyethyl)amino]ethanol;trifluoroborane Chemical compound FB(F)F.OCCN(CCO)CCO DRQFBCMQBWNTNV-UHFFFAOYSA-N 0.000 description 1
- LXBGSDVWAMZHDD-UHFFFAOYSA-N 2-methyl-1h-imidazole Chemical compound CC1=NC=CN1 LXBGSDVWAMZHDD-UHFFFAOYSA-N 0.000 description 1
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 1
- UITKHKNFVCYWNG-UHFFFAOYSA-N 4-(3,4-dicarboxybenzoyl)phthalic acid Chemical compound C1=C(C(O)=O)C(C(=O)O)=CC=C1C(=O)C1=CC=C(C(O)=O)C(C(O)=O)=C1 UITKHKNFVCYWNG-UHFFFAOYSA-N 0.000 description 1
- 229920003319 Araldite® Polymers 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- MQJKPEGWNLWLTK-UHFFFAOYSA-N Dapsone Chemical compound C1=CC(N)=CC=C1S(=O)(=O)C1=CC=C(N)C=C1 MQJKPEGWNLWLTK-UHFFFAOYSA-N 0.000 description 1
- RPNUMPOLZDHAAY-UHFFFAOYSA-N Diethylenetriamine Chemical compound NCCNCCN RPNUMPOLZDHAAY-UHFFFAOYSA-N 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- JIGUQPWFLRLWPJ-UHFFFAOYSA-N Ethyl acrylate Chemical compound CCOC(=O)C=C JIGUQPWFLRLWPJ-UHFFFAOYSA-N 0.000 description 1
- 239000002841 Lewis acid Substances 0.000 description 1
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 description 1
- WOBQSJVYSADMHV-UHFFFAOYSA-N NC.FB(F)F Chemical compound NC.FB(F)F WOBQSJVYSADMHV-UHFFFAOYSA-N 0.000 description 1
- 239000004677 Nylon Substances 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 1
- 239000004696 Poly ether ether ketone Substances 0.000 description 1
- 239000004695 Polyether sulfone Substances 0.000 description 1
- 239000004697 Polyetherimide Substances 0.000 description 1
- 239000004734 Polyphenylene sulfide Substances 0.000 description 1
- 239000002174 Styrene-butadiene Substances 0.000 description 1
- 150000008065 acid anhydrides Chemical class 0.000 description 1
- 239000002313 adhesive film Substances 0.000 description 1
- 125000003368 amide group Chemical group 0.000 description 1
- IMUDHTPIFIBORV-UHFFFAOYSA-N aminoethylpiperazine Chemical compound NCCN1CCNCC1 IMUDHTPIFIBORV-UHFFFAOYSA-N 0.000 description 1
- 239000004760 aramid Substances 0.000 description 1
- -1 aromatic amine imidazole compounds Chemical class 0.000 description 1
- 229920003235 aromatic polyamide Polymers 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 1
- 238000005266 casting Methods 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 229920001577 copolymer Polymers 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- QGBSISYHAICWAH-UHFFFAOYSA-N dicyandiamide Chemical compound NC(N)=NC#N QGBSISYHAICWAH-UHFFFAOYSA-N 0.000 description 1
- ZBCBWPMODOFKDW-UHFFFAOYSA-N diethanolamine Chemical class OCCNCCO ZBCBWPMODOFKDW-UHFFFAOYSA-N 0.000 description 1
- 238000010790 dilution Methods 0.000 description 1
- 239000012895 dilution Substances 0.000 description 1
- 238000003113 dilution method Methods 0.000 description 1
- ZZTCPWRAHWXWCH-UHFFFAOYSA-N diphenylmethanediamine Chemical compound C=1C=CC=CC=1C(N)(N)C1=CC=CC=C1 ZZTCPWRAHWXWCH-UHFFFAOYSA-N 0.000 description 1
- 229920001971 elastomer Polymers 0.000 description 1
- 238000007772 electroless plating Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 125000003700 epoxy group Chemical group 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 238000009501 film coating Methods 0.000 description 1
- 239000003063 flame retardant Substances 0.000 description 1
- 230000004907 flux Effects 0.000 description 1
- 239000011888 foil Substances 0.000 description 1
- ANSXAPJVJOKRDJ-UHFFFAOYSA-N furo[3,4-f][2]benzofuran-1,3,5,7-tetrone Chemical compound C1=C2C(=O)OC(=O)C2=CC2=C1C(=O)OC2=O ANSXAPJVJOKRDJ-UHFFFAOYSA-N 0.000 description 1
- 238000007756 gravure coating Methods 0.000 description 1
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 1
- MUTGBJKUEZFXGO-UHFFFAOYSA-N hexahydrophthalic anhydride Chemical compound C1CCCC2C(=O)OC(=O)C21 MUTGBJKUEZFXGO-UHFFFAOYSA-N 0.000 description 1
- AVGTYNJIWPQPIH-UHFFFAOYSA-N hexan-1-amine;trifluoroborane Chemical compound FB(F)F.CCCCCCN AVGTYNJIWPQPIH-UHFFFAOYSA-N 0.000 description 1
- 239000012761 high-performance material Substances 0.000 description 1
- 239000012943 hotmelt Substances 0.000 description 1
- 239000011256 inorganic filler Substances 0.000 description 1
- 229910003475 inorganic filler Inorganic materials 0.000 description 1
- 238000007759 kiss coating Methods 0.000 description 1
- 238000009940 knitting Methods 0.000 description 1
- 150000007517 lewis acids Chemical class 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 239000003607 modifier Substances 0.000 description 1
- QOHMWDJIBGVPIF-UHFFFAOYSA-N n',n'-diethylpropane-1,3-diamine Chemical compound CCN(CC)CCCN QOHMWDJIBGVPIF-UHFFFAOYSA-N 0.000 description 1
- 229920003986 novolac Polymers 0.000 description 1
- 229920001778 nylon Polymers 0.000 description 1
- PNJWIWWMYCMZRO-UHFFFAOYSA-N pent‐4‐en‐2‐one Natural products CC(=O)CC=C PNJWIWWMYCMZRO-UHFFFAOYSA-N 0.000 description 1
- 239000005011 phenolic resin Substances 0.000 description 1
- 239000013034 phenoxy resin Substances 0.000 description 1
- 229920006287 phenoxy resin Polymers 0.000 description 1
- 229920002492 poly(sulfone) Polymers 0.000 description 1
- 229920000768 polyamine Polymers 0.000 description 1
- 229920001230 polyarylate Polymers 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920006393 polyether sulfone Polymers 0.000 description 1
- 229920002530 polyetherether ketone Polymers 0.000 description 1
- 229920001601 polyetherimide Polymers 0.000 description 1
- 229920006290 polyethylene naphthalate film Polymers 0.000 description 1
- 239000009719 polyimide resin Substances 0.000 description 1
- 229920001228 polyisocyanate Polymers 0.000 description 1
- 239000005056 polyisocyanate Substances 0.000 description 1
- 239000002861 polymer material Substances 0.000 description 1
- 229920005862 polyol Polymers 0.000 description 1
- 150000003077 polyols Chemical class 0.000 description 1
- 229920000069 polyphenylene sulfide Polymers 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 239000011342 resin composition Substances 0.000 description 1
- 238000007763 reverse roll coating Methods 0.000 description 1
- 239000005060 rubber Substances 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- JIYNFFGKZCOPKN-UHFFFAOYSA-N sbb061129 Chemical compound O=C1OC(=O)C2C1C1C=C(C)C2C1 JIYNFFGKZCOPKN-UHFFFAOYSA-N 0.000 description 1
- 150000003384 small molecules Chemical class 0.000 description 1
- 238000005476 soldering Methods 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- 150000003512 tertiary amines Chemical class 0.000 description 1
- 229920002803 thermoplastic polyurethane Polymers 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 229920006305 unsaturated polyester Polymers 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
Landscapes
- Laminated Bodies (AREA)
Abstract
Description
【0001】[0001]
【産業上の利用分野】本発明は、電子機器に用いられる
フレキシブルプリント基板用フィルムの表面処理に利用
する。本発明は、フィルムの機械的特性および化学的特
性を損なわずにアルカリに対する耐性を向上させること
ができる技術に関する。本発明は、水系あるいは炭化水
素系洗浄剤を用いて洗浄を行っても、印刷用インク、金
属メッキ層、接着剤、カバーレイなどとの密着性および
接着性を損なわないようにすることができる技術に関す
る。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention is used for surface treatment of films for flexible printed circuit boards used in electronic equipment. The present invention relates to a technique capable of improving resistance to alkali without impairing the mechanical properties and chemical properties of a film. INDUSTRIAL APPLICABILITY According to the present invention, even if cleaning is performed using a water-based or hydrocarbon-based cleaning agent, the adhesion and the adhesiveness with the printing ink, the metal plating layer, the adhesive, the coverlay, etc. can be prevented from being impaired. Regarding technology.
【0002】[0002]
【従来の技術】エレクトロニクス分野における産業用、
民生用の電子機器の小型化、軽量化が進み、その進展に
対応すべく種々の高機能材料が開発されている。特に、
フレキシブルプリント基板の分野においては、ポリイミ
ドフィルム、ポリエーテルエーテルケトンフィルム、ポ
リフェニレンサルファイドフィルム、ポリエチレンナフ
タレートフィルム、全芳香族ポリアミドフィルム、ポリ
パラバン酸フィルム、ポリサルフオンフィルム、ポリエ
ーテルサルフオンフィルム、ポリエーテルイミドフィル
ム、ポリアリレートフィルムなどの開発があげられる。2. Description of the Related Art Industrial use in the field of electronics,
Consumer electronic devices have become smaller and lighter, and various high-performance materials have been developed in response to the progress. In particular,
In the field of flexible printed circuit boards, polyimide film, polyether ether ketone film, polyphenylene sulfide film, polyethylene naphthalate film, wholly aromatic polyamide film, polyparabanic acid film, polysulfone film, polyether sulfone film, polyetherimide Examples include the development of films and polyarylate films.
【0003】中でも、ポリイミドフィルムは、すぐれた
機械的特性、化学的特性、電気的特性に加えて、耐熱性
にも優れているために、広い温度範囲に耐えられること
から注目され、フレキシブルプリント基板分野において
銅張積層板用およびカバーレイ用のベースフィルムとし
て広く利用されている。これらの銅張積層板およびカバ
ーレイは、エッチング、金属メッキ、プレス加工、はん
だ付けなどの加工を経て、フラックスの洗浄が行われ電
子機器に組み込まれている。Among them, the polyimide film has attracted attention because it can withstand a wide temperature range because it is excellent in heat resistance in addition to excellent mechanical properties, chemical properties, and electrical properties. It is widely used in the field as a base film for copper-clad laminates and coverlays. These copper-clad laminates and coverlays are subjected to processing such as etching, metal plating, press working, soldering, etc., and then washed with flux to be incorporated in electronic equipment.
【0004】[0004]
【発明が解決しようとする課題】従来、前述した銅張積
板およびカバーレイはフロン系洗浄剤により洗浄されて
いたが、フロンによるオゾン層破壊の環境問題が発生
し、その対策のためにフロン系溶剤の使用が禁止され、
現在、水系または炭化水素系の洗浄剤にかわりつつあ
る。Conventionally, the above-mentioned copper clad laminate and cover lay have been cleaned with a CFC-based cleaning agent, but an environmental problem of ozone layer depletion due to CFCs occurs. The use of system solvents is prohibited,
At present, they are replacing water-based or hydrocarbon-based cleaning agents.
【0005】ポリイミドフィルムは耐アルカリ性には弱
い材料であるが、フレキシブルプリント基板加工時のレ
ジストを剥離させるためのアルカリ処理程度では大きな
影響を受けることはない。つまり、このようなアルカリ
処理後にポリイミドフィルム面に印刷、金属メッキが施
されたり、接着剤によりカバーレイなどが積層された後
に、フロン系または炭化水素系溶剤により洗浄した場合
には、密着性および接着性が低下するようなことはなか
った。Although the polyimide film is a material that is weak in alkali resistance, it is not significantly affected by the degree of alkali treatment for stripping the resist when processing the flexible printed circuit board. That is, when the polyimide film surface is printed or metal-plated after such an alkali treatment, or a cover lay or the like is laminated with an adhesive and then washed with a CFC-based or hydrocarbon-based solvent, the adhesion and The adhesiveness did not deteriorate.
【0006】ところが、洗浄剤が水系の洗浄剤または水
を用いて洗浄した場合には、ポリイミドフィルム面と印
刷用インク、金属メッキ層、接着剤、カバーレイなどと
の密着性が悪くなり、接着面が剥がれ易くなる問題が発
生した。However, when the cleaning agent is a water-based cleaning agent or water, the adhesion between the polyimide film surface and the printing ink, the metal plating layer, the adhesive, the cover lay, etc. deteriorates, and the adhesion There was a problem that the surface was easily peeled off.
【0007】本発明はこのような背景のもとに行われた
ものであって、水系の洗浄剤または水により洗浄を行っ
ても、フィルム面と印刷用インク、金属メッキ層、接着
剤、カバーレイなどとの密着性および接着性を損なうこ
とのないポリイミドフィルムの表面改質の方法を提供す
ることを目的とする。The present invention has been made under such a background, and the film surface and the printing ink, the metal plating layer, the adhesive, and the cover are cleaned even if the cleaning is performed with an aqueous cleaning agent or water. An object of the present invention is to provide a method for surface-modifying a polyimide film that does not impair the adhesiveness and the adhesiveness with a ray or the like.
【0008】[0008]
【課題を解決するための手段】本発明は、水系洗浄剤あ
るいは水を用いて洗浄を行っても、印刷用インク、金属
メッキ層、接着剤、カバーレイなどとの密着性および接
着性を損なわないようにするもので、第一の観点は、フ
レキシブルプリント基板の基材となるポリイミドフィル
ムであって、少くとも一方の表面に熱硬化性高分子およ
びまたは熱軟化性高分子の膜が形成されたことを特徴と
する。前記膜の厚さは0.01μmないし10μmであ
ることが望ましい。According to the present invention, even if cleaning is performed using an aqueous cleaning agent or water, the adhesion and the adhesiveness with a printing ink, a metal plating layer, an adhesive, a coverlay, etc. are impaired. The first viewpoint is a polyimide film which is a base material of a flexible printed circuit board, and a film of thermosetting polymer and / or thermosoftening polymer is formed on at least one surface of the polyimide film. It is characterized by that. The thickness of the film is preferably 0.01 μm to 10 μm.
【0009】本発明の第二の観点は、ポリイミドフィル
ムの表面性質を改良する方法であって、少くとも一方の
表面に厚さが0.01μmないし10μmの高分子膜を
形成することを特徴とする。A second aspect of the present invention is a method for improving the surface properties of a polyimide film, which comprises forming a polymer film having a thickness of 0.01 μm to 10 μm on at least one surface. To do.
【0010】本発明の第三の観点は、ポリイミドフィル
ムの表面洗浄方法であって、ポリイミドフィルムの表面
に厚さが0.01μmないし10μmの高分子膜を形成
してから洗浄を行うことを特徴とする。表面洗浄液は水
系洗浄剤または水であるときに効果的である。A third aspect of the present invention is a method for cleaning the surface of a polyimide film, which comprises cleaning after forming a polymer film having a thickness of 0.01 μm to 10 μm on the surface of the polyimide film. And The surface cleaning liquid is effective when it is an aqueous cleaning agent or water.
【0011】[0011]
【作用】ポリイミドフィルムの少くとも一方の表面に熱
硬化性高分子、または熱軟化性高分子、あるいは熱硬化
性高分子と熱軟化性高分子との混合の膜を形成する。こ
のように少くとも一方の表面に膜厚0.01μmないし
10μmの高分子膜を形成することにより、ポリイミド
フィルムの表面性質を改良することができる。The thermosetting polymer, the thermosoftening polymer, or the mixture film of the thermosetting polymer and the thermosoftening polymer is formed on at least one surface of the polyimide film. By thus forming a polymer film having a film thickness of 0.01 μm to 10 μm on at least one surface, the surface properties of the polyimide film can be improved.
【0012】すなわち、ポリイミドフィルムの表面に高
分子膜を形成してから水系または炭化水素系洗浄剤を用
いて洗浄を行った場合に、ポリイミドフィルム面と印刷
用インク、金属メッキ層、接着剤、カバーレイなどとの
密着性および接着性が損なわれないようにすることが可
能とする。That is, when a polymer film is formed on the surface of a polyimide film and then washed with a water-based or hydrocarbon-based cleaning agent, the polyimide film surface and printing ink, a metal plating layer, an adhesive, It is possible to prevent the adhesion and the adhesion with the coverlay and the like from being impaired.
【0013】さらには、ポリイミドフィルムの少くとも
一方に高分子膜を形成するか、あるいは、ポリイミドフ
ィルムの樹脂組成は全芳香族、芳香族−脂肪族、または
脂肪族の各種ポリイミド樹脂であり、そのフィルムの厚
さはこれを例示すると、12.5μm〜125μmの範
囲で必要に応じて選択することができる。Further, a polymer film is formed on at least one of the polyimide films, or the resin composition of the polyimide film is a wholly aromatic, aromatic-aliphatic or aliphatic various polyimide resin. For example, the thickness of the film can be selected in the range of 12.5 μm to 125 μm as required.
【0014】熱硬化性高分子膜には、フェノール樹脂、
キシレン樹脂、エポキシ樹脂、ポリオール/ポリイソシ
アナート系のウレタン樹脂、熱架橋型アクリル樹脂、光
架橋型アクリル樹脂、熱硬化性ポリブタジェン、不飽和
ポリエステル、ポリアミドポリアミンなどの熱硬化性樹
脂が用いられ、塗膜の要求特性に応じて単独または2種
類以上の混合によって使用される。For the thermosetting polymer film, phenol resin,
A thermosetting resin such as xylene resin, epoxy resin, polyol / polyisocyanate-based urethane resin, thermocrosslinking acrylic resin, photocrosslinking acrylic resin, thermosetting polybutadiene, unsaturated polyester, or polyamide polyamine is used. They are used alone or as a mixture of two or more types depending on the required properties of the membrane.
【0015】また、熱可塑性高分子膜には、ポリブタジ
ェン、SBR(スチレンブタジエンゴム)、NBR(ニ
トリルブタジエンゴム)、ナイロン、ポリエステル、ア
リルゴム、熱軟化性エポキシ樹脂などの熱可塑性樹脂が
用いられ、塗膜の要求特性に応じて単独または2種類以
上の混合によって使用される。For the thermoplastic polymer film, a thermoplastic resin such as polybutadiene, SBR (styrene butadiene rubber), NBR (nitrile butadiene rubber), nylon, polyester, allyl rubber, or a thermosoftening epoxy resin is used. They are used alone or as a mixture of two or more types depending on the required properties of the membrane.
【0016】熱硬化性高分子と熱軟化性高分子との混合
膜には、前述した熱硬化性樹脂および熱可塑性樹脂を使
用することができ、必要に応じて適宜2種類以上の樹脂
材を混合することもできる。The above-mentioned thermosetting resin and thermoplastic resin can be used in the mixed film of the thermosetting polymer and the thermosoftening polymer, and if necessary, two or more kinds of resin materials can be appropriately used. It can also be mixed.
【0017】これらの熱硬化性高分子膜および熱可塑性
高分子膜、あるいは熱硬化性高分子と熱可塑性高分子と
の混合膜の中には各種無機フイラー、難燃剤などを加え
ることも可能であり、さらに、目的に応じて高分子また
は低分子の硬化剤、触媒および各種改質材を添加するこ
ともできる。It is also possible to add various inorganic fillers, flame retardants, etc. to the thermosetting polymer film and the thermoplastic polymer film, or the mixed film of the thermosetting polymer and the thermoplastic polymer. In addition, a high-molecular or low-molecular curing agent, a catalyst, and various modifiers can be added depending on the purpose.
【0018】このようにポリイミドフィルムの表面改質
に用いられる塗膜には種々の高分子および低分子化合物
の使用が可能であるが、ポリイミドフィルムの大きな特
長である耐熱性を損なわないためには耐熱性の高い樹脂
を選ぶことが好ましく、例えば、エポキシ樹脂とエポキ
シ樹脂硬化剤、並びにポリアミド樹脂などの混合系が挙
げられる。As described above, various polymers and low molecular weight compounds can be used in the coating film used for the surface modification of the polyimide film, but in order not to impair the heat resistance which is a major feature of the polyimide film. It is preferable to select a resin having high heat resistance, and examples thereof include a mixed system of an epoxy resin, an epoxy resin curing agent, and a polyamide resin.
【0019】エポキシ樹脂としては、1分子中に2個以
上のエポキシ基を有するエポキシ樹脂が好ましく、この
エポキシ樹脂としてはビスフェノールA型エポキシ樹
脂、ビスフェノールF型エポキシ樹脂、ノボラック型エ
ポキシ樹脂、カルボン酸のポリグリシジルエーテル、ウ
レタン変性エポキシ樹脂、および臭素化エポキシ樹脂な
どがあり、これらの1種または2種以上の混合系で使用
することができる。市販されているエポキシ樹脂とし
て、エピコートシリーズ(シェル化学社製)、アラルダ
イトシリーズ(チバガイギー社製)、DERシリーズ
(ダウケミカル社製)、およびエピクロンシリーズ(大
日本インキ化学工業社製)などが使用できる。The epoxy resin is preferably an epoxy resin having two or more epoxy groups in one molecule. Examples of the epoxy resin include bisphenol A type epoxy resin, bisphenol F type epoxy resin, novolac type epoxy resin and carboxylic acid. There are polyglycidyl ether, urethane-modified epoxy resin, brominated epoxy resin and the like, and these can be used alone or in a mixture of two or more kinds. As commercially available epoxy resins, Epicoat series (made by Shell Chemical Co., Ltd.), Araldite series (made by Ciba Geigy Co., Ltd.), DER series (made by Dow Chemical Co., Ltd.), Epicron series (made by Dainippon Ink and Chemicals Co., Ltd.), etc. are used. it can.
【0020】ポリアミド樹脂は、エポキシ樹脂との混合
を考えた場合、溶剤可溶型のアミド基を有する脂肪族の
アミドアミン化合物が望ましく、これはエポキシ樹脂の
硬化剤として作用する。市販されている溶剤可溶型のポ
リアミド樹脂として、アミランCM4000およびCM
8000(東レ社製)、ポリマイトシリーズ(三洋化成
工業社製)、バーサミドシリーズ(第一ゼネラル社
製)、およびゼナミドシリーズ(ヘンケル白水社製)な
どが使用できる。Considering the mixing with the epoxy resin, the polyamide resin is preferably an aliphatic amidoamine compound having a solvent-soluble amide group, which acts as a curing agent for the epoxy resin. As commercially available solvent-soluble polyamide resins, Amilan CM4000 and CM
8000 (manufactured by Toray Industries, Inc.), polymite series (manufactured by Sanyo Chemical Industry Co., Ltd.), Versamide series (manufactured by Daiichi General Co., Ltd.), Zenamide series (manufactured by Henkel Hakusui Co., Ltd.) and the like can be used.
【0021】エポキシ樹脂の別の硬化剤としては、ジエ
チレントリアミン、トリエチレントリアミン、ジエチル
アミノプロピルアミン、N−アミノエチルピペラジン、
ジシアンジアミド、メタフェニレンジアミン、ジアミノ
ジフェニルメタン、ジアミノジフェニルスルフォン、お
よび2−ジメチルアミノメチルフェノールなどがあり、
硬化促進剤としては、トリエタノールアミン−トリフル
オロホウ素錯体、ヘキシルアミン−トリフルオロホウ素
錯体およびモノメチルアミン−トリフルオロホウ素錯体
等のルイス酸との塩、並びに第三級アミンを有する脂肪
族アミン化合物や芳香族アミンイミダゾール化合物など
があり、これらの1種または2種以上を添加することが
できる。Other curing agents for epoxy resin include diethylenetriamine, triethylenetriamine, diethylaminopropylamine, N-aminoethylpiperazine,
Dicyandiamide, metaphenylenediamine, diaminodiphenylmethane, diaminodiphenylsulfone, and 2-dimethylaminomethylphenol, etc.,
As the curing accelerator, triethanolamine-trifluoroboron complex, salts with Lewis acids such as hexylamine-trifluoroboron complex and monomethylamine-trifluoroboron complex, and aliphatic amine compounds having a tertiary amine and There are aromatic amine imidazole compounds and the like, and one or more of these can be added.
【0022】また、無水メチルナジック酸、無水ヘキサ
ヒドロフタル酸、無水ピロメリット酸、および無水ベン
ゾフェノンテトラカルボン酸などの酸無水物を硬化剤と
して使用することも可能である。It is also possible to use acid anhydrides such as methyl nadic acid anhydride, hexahydrophthalic acid anhydride, pyromellitic acid anhydride, and benzophenone tetracarboxylic acid anhydride as a curing agent.
【0023】熱硬化性高分子および熱可塑性高分子ある
いは熱硬化性高分子と熱可塑性高分子との混合物のポリ
イミドフィルム面への塗布方法は、ワイヤーバーコーテ
ィング、リバースロールコート、キスコート、グラビア
コートなどの薄膜塗布方式が望ましく、塗布物の性状お
よび塗付厚さにより選ぶことができ、かつ溶剤による希
釈などの希釈方法も塗布物の性状、塗布方法により適宜
選択することができる。The coating method of the thermosetting polymer and the thermoplastic polymer or the mixture of the thermosetting polymer and the thermoplastic polymer on the polyimide film surface may be wire bar coating, reverse roll coating, kiss coating, gravure coating, etc. The thin film coating method is preferable, and it can be selected depending on the property and coating thickness of the coated product, and the dilution method such as dilution with a solvent can be appropriately selected according to the property and coating method of the coated product.
【0024】熱硬化性高分子および熱可塑性高分子ある
いは熱硬化性高分子と熱可塑性高分子との混合物のポリ
イミドフィルム面への塗布後の反応または乾燥方法は、
遠赤外線加熱、熱風加熱、高周波加熱または紫外線硬化
などの塗布物の性状に合った方法を選ぶことができ、か
つその条件も適宜決定することができる。The reaction or drying method after the application of the thermosetting polymer and the thermoplastic polymer or the mixture of the thermosetting polymer and the thermoplastic polymer onto the polyimide film surface is as follows:
A method suitable for the properties of the coating material, such as far-infrared heating, hot air heating, high frequency heating, or ultraviolet curing, can be selected, and the conditions therefor can be appropriately determined.
【0025】熱硬化性高分子膜および熱可塑性高分子膜
あるいは熱硬化性高分子と熱可塑性高分子との混合膜の
塗膜厚さは、前述したように0.01μm〜10μmの
範囲で可能であるが、ポリイミドフィルムの機械的特性
をそのまま維持する場合には0.1μm〜5μm程度が
望ましい。0.01μm未満の塗布厚さでは、ポリイミ
ドフィルムの表面改質硬化は半減する可能性がある。The coating film thickness of the thermosetting polymer film and the thermoplastic polymer film or the mixed film of the thermosetting polymer and the thermoplastic polymer can be in the range of 0.01 μm to 10 μm as described above. However, in the case of maintaining the mechanical properties of the polyimide film as it is, the thickness is preferably about 0.1 μm to 5 μm. When the coating thickness is less than 0.01 μm, the surface modification and curing of the polyimide film may be halved.
【0026】このように表面処理されたポリイミドフィ
ルムは、フィルムのアルカリ処理および水洗後に次の各
種フィルムに利用される。The polyimide film thus surface-treated is used in the following various films after the film is subjected to alkali treatment and washing with water.
【0027】1.印刷インク塗布用フィルム 2.無電解メッキ用フィルム 3.金属蒸着およびスパッタリング用フィルム 4.カバーレイ用ベースフィルム 5.ボンディングシート、カバーレイ等の接着剤との接
着用フィルム 6.金属箔等との貼合用ベースフィルム1. Film for applying printing ink 2. Film for electroless plating 3. Films for metal vapor deposition and sputtering 4. Base film for coverlay 5. Adhesive film with adhesive such as bonding sheet and cover lay 6. Base film for bonding with metal foil, etc.
【0028】[0028]
【実施例】次に、本発明実施例を図面を参照して説明す
る。図1は本発明によるポリイミドフィルムの構成の一
例を示す断面図である。この例は、厚さ25μmのポリ
イミドフィルム1の一方の表面に熱硬化性高分子材料ま
たは熱軟化性高分子材料を用いた厚さ5μmの高分子膜
2が形成されたものである。また、図2は本発明による
金属膜が形成された構成の一例を示す断面図である。こ
の例は、18μmの金属膜(Cu)4の一方の表面に接
着層5により25μmのポリイミドフィルム1が形成さ
れ、このポリイミドフィルム1の一方の面に5μmの高
分子膜が形成される。Embodiments of the present invention will now be described with reference to the drawings. FIG. 1 is a sectional view showing an example of the constitution of a polyimide film according to the present invention. In this example, a 5 μm-thick polymer film 2 made of a thermosetting polymer material or a thermosoftening polymer material is formed on one surface of a 25 μm-thick polyimide film 1. FIG. 2 is a sectional view showing an example of a structure in which the metal film according to the present invention is formed. In this example, a 25 μm polyimide film 1 is formed by an adhesive layer 5 on one surface of a 18 μm metal film (Cu) 4, and a 5 μm polymer film is formed on one surface of the polyimide film 1.
【0029】ここで、具体的ないくつかの実施例および
比較例について説明する。これらはあくまでも例を示す
ものであって、これにより本発明の技術的範囲を限定す
るものではない。Here, some specific examples and comparative examples will be described. These are merely examples and do not limit the technical scope of the present invention.
【0030】(実施例1)図3に示すように、高分子膜
として厚さ25μmのカプトンフィルム(東レ・デュポ
ン社製ポリイミドフィルム)の片面上にマクロメルト6
238(ヘンケル白水社製ホットメルトポリアミド)を
ダイコーターにより5μmの厚さにて塗布し、冷却後に
40℃の3wt%水酸化ナトリウム水溶液に2分浸漬
し、水洗後80℃にて30分乾燥した。次にカプトンフ
ィルムのマクロメルト塗布面にニカフレックスCISV
−2535(DB)(ニッカン工業社製カバーレイ)の
接着剤面を成型温度160℃、成型圧力40kg/cm
2 、成型時間90分にてプレス接着した。次にプレス品
のカプトンフィルムとニカフレックスCISV−253
5(DB)の薬品処理無での接着力(常態)および薬品
中での接着力の測定を行った。使用した薬品は、フレオ
ンTF(三井・デュポンフロロケミカル社製フロン系溶
剤)および水である。測定した接着力は表1に示す。(Example 1) As shown in FIG. 3, Macromelt 6 was formed on one side of a 25 μm thick Kapton film (polyimide film manufactured by DuPont Toray) as a polymer film.
238 (Hot melt polyamide manufactured by Henkel Hakusui Co., Ltd.) was applied with a die coater to a thickness of 5 μm, and after cooling, it was immersed in a 3 wt% sodium hydroxide aqueous solution at 40 ° C. for 2 minutes, washed with water, and dried at 80 ° C. for 30 minutes. . Next, apply Nikaflex CISV to the surface of the Kapton film coated with macromelt.
-2535 (DB) (Nickan Kogyo Co., Ltd. cover lay) adhesive surface, molding temperature 160 ℃, molding pressure 40 kg / cm
2. Press bonding was performed at a molding time of 90 minutes. Next, press Kapton film and Nicaflex CISV-253
The adhesive strength (normal state) of 5 (DB) without chemical treatment and the adhesive strength in chemicals were measured. The chemicals used were Freon TF (a CFC-based solvent manufactured by Mitsui DuPont Fluorochemicals) and water. The measured adhesive strength is shown in Table 1.
【0031】(実施例2)高分子膜として厚さ25μm
のカプトンフィルム(東レ・デュポン社製ポリイミドフ
ィルム)の片面上にエピコート828(シェル化学社
製)50部、ポリマイドL−45−(3)(三洋化成工
業社製)20部、メチルエチルケトン500部を混合し
たものをキャスト法にて塗布し、130℃にて1時間乾
燥・反応させ、2μmの塗布厚さを得た。実施例1と同
様に水酸化ナトリウム水溶液にて処理し水洗・乾燥後に
カプトンフィルムの塗布面にニカフレックスCISV−
2535(DB)の接着剤面を実施例1のプレス条件と
同一条件にてプレス接着した。プレス接着品の接着力に
ついて実施例1と同一条件にて測定した。測定した接着
力は表1に示す。(Example 2) Polymer film having a thickness of 25 μm
50 parts of Epicoat 828 (manufactured by Shell Chemical Co., Ltd.), 20 parts of Polymide L-45- (3) (manufactured by Sanyo Chemical Industry Co., Ltd.), and 500 parts of methyl ethyl ketone are mixed on one side of the Kapton film (polyimide film manufactured by DuPont Toray). The obtained product was applied by a casting method, dried and reacted at 130 ° C. for 1 hour to obtain a coating thickness of 2 μm. After treating with a sodium hydroxide aqueous solution, washing with water and drying in the same manner as in Example 1, Nikaflex CISV-is applied to the coated surface of the Kapton film.
The adhesive surface of 2535 (DB) was press-bonded under the same press conditions as in Example 1. The adhesive strength of the press-bonded article was measured under the same conditions as in Example 1. The measured adhesive strength is shown in Table 1.
【0032】(実施例3)高分子膜として厚さ50μm
のアピカルフィルム(鐘淵化学工業社製ポリイミドフィ
ルム)の片面上にスリーボンド1570(スリーボンド
社製エポキシ編成樹脂)100部、JA−7405(住
友スリーエム社製フェノキシ樹脂)5部、メチルエチル
ケトン500部を混合したものをキスコーターにより塗
布し、160℃にて30分乾燥・硬化し、1μmの塗膜
厚さを得た。実施例1と同様に水酸化ナトリウム水溶液
にて処理し、水洗・乾燥後に、アピカルフィルムの塗布
面にニカフレックスCISV−2535(DB)の接着
剤面を実施例1のプレス条件と同一条件にてプレス接着
した。プレス接着品の接着力について実施例1と同一条
件にて測定した。測定した接着力は表1に示す。(Example 3) Polymer film having a thickness of 50 μm
100 parts of ThreeBond 1570 (epoxy knitting resin manufactured by ThreeBond Co., Ltd.), 5 parts of JA-7405 (phenoxy resin manufactured by Sumitomo 3M Co., Ltd.), and 500 parts of methyl ethyl ketone were mixed on one surface of an apical film (polyimide film manufactured by Kanegafuchi Chemical Co., Ltd.). The product was applied with a kiss coater, dried and cured at 160 ° C. for 30 minutes to obtain a coating film thickness of 1 μm. After treating with an aqueous sodium hydroxide solution in the same manner as in Example 1, washing with water and drying, the adhesive surface of Nicaflex CISV-2535 (DB) was applied to the application surface of the apical film under the same pressing conditions as in Example 1. Press bonded. The adhesive strength of the press-bonded article was measured under the same conditions as in Example 1. The measured adhesive strength is shown in Table 1.
【0033】(実施例4)高分子膜として厚さ25μm
のアピカルフィルムの片面上にアクリル酸エチル40%
と、メタクリル酸メチル40%、アクリル酸グリシジル
エーテル20%の共重合体のメチルエチルケトン溶液
(固形分20wt%)200部に対し、1−ベンジル−
2−メチルイミダゾール3部を加えたものをキャスト法
にて塗布し、130℃にて1時間乾燥・反応させ、3μ
mの塗布厚さを得た。次に、40℃の3wt%水酸化カ
リウム水溶液に2分浸漬し、水洗後105℃にて30分
乾燥した。次に、実施例3と同様、アピカルフィルムの
塗布面にニカフレックスCISV−2535(DB)の
接着剤面をプレス接着し、接着力の測定を行った。測定
した接着力は表1に示す。(Example 4) Polymer film having a thickness of 25 μm
40% ethyl acrylate on one side of the apical film
And 200 parts of a methyl ethyl ketone solution (solid content 20 wt%) of a copolymer of methyl methacrylate 40% and glycidyl ether acrylate 20%, 1-benzyl-
What added 3 parts of 2-methyl imidazole was apply | coated by the cast method, it was made to dry and react at 130 degreeC for 1 hour, and 3 micro | micron | mu.
A coating thickness of m was obtained. Next, it was immersed in a 3 wt% potassium hydroxide aqueous solution at 40 ° C. for 2 minutes, washed with water, and dried at 105 ° C. for 30 minutes. Next, as in Example 3, the adhesive surface of Nicaflex CISV-2535 (DB) was press-bonded to the coated surface of the apical film, and the adhesive strength was measured. The measured adhesive strength is shown in Table 1.
【0034】(比較例1)実施例1において、マクロメ
ルト6238による表面改質処理を行わない以外は実施
例1と同様にして測定した。その接着力を表1に示す。(Comparative Example 1) The measurement was performed in the same manner as in Example 1 except that the surface modification treatment with Macromelt 6238 was not performed. The adhesive strength is shown in Table 1.
【0035】(比較例2)実施例4において、アピカル
フィルム片面の表面改質処理を行わない以外は実施例4
と同様にして測定した。その接着力を表1に示す。Comparative Example 2 Example 4 is the same as Example 4 except that the surface modification treatment on one side of the apical film is not performed.
It measured similarly to. The adhesive strength is shown in Table 1.
【0036】[0036]
【表1】 表1に示すように、実施例1〜実施例4の場合は、水洗
後においても接着力に変化がなく、比較例1および比較
例2の場合には、著しい接着力の低下がみられた。[Table 1] As shown in Table 1, in the case of Examples 1 to 4, there was no change in the adhesive force even after washing with water, and in the cases of Comparative Example 1 and Comparative Example 2, a remarkable decrease in the adhesive force was observed. .
【0037】[0037]
【発明の効果】以上説明したように本発明によれば、ポ
リイミドフィルムの表面性質を改良することができ、水
系または水を用いて洗浄を行っても、ポリイミドフィル
ム面と印刷用インク、金属メッキ層、接着剤、カバーレ
イなどとの密着性および接着性を損なわないようにする
ことができる効果があり、フレキシブルプリント基板の
信頼性を向上させることができる。As described above, according to the present invention, the surface properties of a polyimide film can be improved, and even if cleaning is performed using an aqueous system or water, the polyimide film surface and printing ink, metal plating The adhesiveness with the layer, the adhesive, the coverlay, and the like can be prevented from being impaired, and the reliability of the flexible printed circuit board can be improved.
【図面の簡単な説明】[Brief description of drawings]
【図1】本発明によるポリイミドフィルムの構成の一例
を示す断面図。FIG. 1 is a sectional view showing an example of the configuration of a polyimide film according to the present invention.
【図2】本発明による金属膜が形成された構成の一例を
示す断面図。FIG. 2 is a sectional view showing an example of a structure in which a metal film according to the present invention is formed.
【図3】本発明による実施例1のポリイミドフィルムの
構成を示す断面図。FIG. 3 is a cross-sectional view showing the structure of the polyimide film of Example 1 according to the present invention.
1 ポリイミドフィルム 2 高分子膜 4 金属膜(Cu) 5 接着層 1 Polyimide film 2 Polymer film 4 Metal film (Cu) 5 Adhesive layer
Claims (5)
およびまたは熱軟化性高分子の膜が形成されたポリイミ
ドフィルム。1. A polyimide film having a film of a thermosetting polymer and / or a thermosoftening polymer formed on at least one surface thereof.
μmである請求項1記載のポリイミドフィルム。2. The thickness of the film is 0.01 μm to 10 μm.
The polyimide film according to claim 1, which has a thickness of μm.
μmないし10μmの高分子膜を形成してポリイミドフ
ィルムの表面性質を改良する方法。3. A thickness of 0.01 on at least one surface.
A method for improving the surface properties of a polyimide film by forming a polymer film having a thickness of 10 μm to 10 μm.
01μmないし10μmの高分子膜を形成してから洗浄
を行うポリイミドフィルムの表面洗浄方法。4. A polyimide film having a thickness of 0.
A method for cleaning the surface of a polyimide film, which comprises cleaning a polymer film having a thickness of 01 μm to 10 μm and then cleaning the film.
びまたは熱軟化性高分子を含む請求項3または4のいず
れかに記載の方法。5. The method according to claim 3, wherein the polymer film contains a thermosetting polymer and / or a thermosoftening polymer.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP27267394A JPH08132574A (en) | 1994-11-07 | 1994-11-07 | Polyimide film |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP27267394A JPH08132574A (en) | 1994-11-07 | 1994-11-07 | Polyimide film |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH08132574A true JPH08132574A (en) | 1996-05-28 |
Family
ID=17517202
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP27267394A Pending JPH08132574A (en) | 1994-11-07 | 1994-11-07 | Polyimide film |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH08132574A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2004060660A1 (en) * | 2002-12-27 | 2004-07-22 | Nec Corporation | Sheet material and wiring board |
KR100800130B1 (en) * | 2004-02-04 | 2008-01-31 | 미쓰비시 신도 가부시키가이샤 | Metallized polyimide film |
-
1994
- 1994-11-07 JP JP27267394A patent/JPH08132574A/en active Pending
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2004060660A1 (en) * | 2002-12-27 | 2004-07-22 | Nec Corporation | Sheet material and wiring board |
US7294393B2 (en) | 2002-12-27 | 2007-11-13 | Nec Corporation | Sheet material and wiring board |
KR100800130B1 (en) * | 2004-02-04 | 2008-01-31 | 미쓰비시 신도 가부시키가이샤 | Metallized polyimide film |
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