JPH08129715A - Production of combined thin-film magnetic head - Google Patents

Production of combined thin-film magnetic head

Info

Publication number
JPH08129715A
JPH08129715A JP26974594A JP26974594A JPH08129715A JP H08129715 A JPH08129715 A JP H08129715A JP 26974594 A JP26974594 A JP 26974594A JP 26974594 A JP26974594 A JP 26974594A JP H08129715 A JPH08129715 A JP H08129715A
Authority
JP
Japan
Prior art keywords
layer
thin film
core layer
head
track width
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP26974594A
Other languages
Japanese (ja)
Inventor
Naoto Matono
直人 的野
Shinji Kobayashi
伸二 小林
Masahiro Nakada
正宏 中田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sanyo Electric Co Ltd
Original Assignee
Sanyo Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sanyo Electric Co Ltd filed Critical Sanyo Electric Co Ltd
Priority to JP26974594A priority Critical patent/JPH08129715A/en
Publication of JPH08129715A publication Critical patent/JPH08129715A/en
Pending legal-status Critical Current

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Abstract

PURPOSE: To substantially prevent the spreading of the magnetic fluxes leaking from opposite parts alongside the track width direction and to eliminate blurring in recording by forming parts facing each other in the same plane shape as the plane shape of the track width regulating part of an upper core layer in a part of a lower core layer. CONSTITUTION: A lower shielding layer 2, a gap spacer layer 3, a magneto- resistance effect element layer 4, a conductive layer 5 and a gap spacer layer 6 are successively formed on a substrate 1 and thereafter, a first thin film 71 to be made into an upper shielding layer and a second thin film 72 to be made into the lower core layer of an induction type head are formed. These films 71, 72 are etched as the upper shielding layer to a plane shape. Next, a lower insulating layer, coil layer 8, upper insulating layer, gap spacer layer and upper core layer 9 of the induction type head are formed on the film 72. Next, a resist layer is formed on the layer 9 and the upper insulating layer exclusive of the parts on the track regulating part of the layer 9. The film 72 is etched and shaped with the track width regulating part of the layer 9 and the resist layer as a mask. Finally, the resist layer is removed and the combined thin-film magnetic head is obtd.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、HDD(ハード・ディ
スク・ドライブ)等の磁気記録装置に使用される磁気ヘ
ッドに関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a magnetic head used in a magnetic recording device such as an HDD (hard disk drive).

【0002】[0002]

【従来の技術】HDD等の磁気記録装置に使用される磁
気ヘッドとして、磁気抵抗効果素子層及びシールド層を
備える再生用の磁気抵抗効果型ヘッドと磁気コア層及び
コイル層を備える記録用の誘導型ヘッドとを基板上に積
み重ねて形成した複合型の薄膜磁気ヘッドが、特公昭5
8−36406号に開示されている。
2. Description of the Related Art As a magnetic head used in a magnetic recording device such as an HDD, a reproducing magnetoresistive head having a magnetoresistive element layer and a shield layer and a recording induction having a magnetic core layer and a coil layer. A composite type thin film magnetic head formed by stacking a mold head on a substrate is disclosed in
No. 8-36406.

【0003】かかる複合型薄膜薄膜ヘッドにおいて、磁
気抵抗効果型ヘッドの上部シールド層と誘導型ヘッドの
下部磁気コア層は、絶縁層を介して互いに分離されてい
てもよいが、製造プロセスの簡略化を図るためには、図
8に示すように両者を磁性薄膜の一体物7にて構成して
もよい。
In such a composite thin film thin film head, the upper shield layer of the magnetoresistive head and the lower magnetic core layer of the inductive head may be separated from each other by an insulating layer, but the manufacturing process is simplified. In order to achieve this, as shown in FIG. 8, both may be constituted by an integrated body 7 of magnetic thin films.

【0004】図8は、該複合型薄膜磁気ヘッドの斜視図
であり、1は基板、2は磁気抵抗効果型ヘッドの下部シ
ールド層、3は下部シールド層と磁気抵抗効果素子層と
の間のギャップスペーサ層、4は磁気抵抗効果素子層、
5は磁気抵抗効果素子層に通電するための導体層、6は
磁気抵抗効果素子層と上部シールド層との間のギャップ
スペーサ層、7は上部シールド層兼誘導型ヘッドの下部
コア層、8はコイル層、9は上部コア層を示している。
なお、上部シールド層兼下部コア層7と上部コア層9と
の間にはギャップスペーサ層が介在しており、上部シー
ルド層兼下部コア層7とコイル層8との間及びコイル層
8と上部コア層9との間には絶縁層が介在しているが、
図示を省略している。
FIG. 8 is a perspective view of the composite type thin film magnetic head, in which 1 is a substrate, 2 is a lower shield layer of the magnetoresistive head, and 3 is between the lower shield layer and the magnetoresistive element layer. Gap spacer layers, 4 are magnetoresistive element layers,
Reference numeral 5 is a conductor layer for conducting electricity to the magnetoresistive effect element layer, 6 is a gap spacer layer between the magnetoresistive effect element layer and the upper shield layer, 7 is an upper shield layer / lower core layer of the inductive head, and 8 is A coil layer, 9 indicates an upper core layer.
A gap spacer layer is interposed between the upper shield layer / lower core layer 7 and the upper core layer 9, and is provided between the upper shield layer / lower core layer 7 and the coil layer 8 and between the coil layer 8 and the upper layer. An insulating layer is interposed between the core layer 9 and
Illustration is omitted.

【0005】図8に示したような複合型薄膜磁気ヘッド
によって磁気ディスク等の記録媒体上に形成される記録
トラックの幅は、誘導型ヘッドの上部コア層9のトラッ
ク幅によって規制されるが、該複合型薄膜磁気ヘッドに
おいては上部シールド層兼下部コア層7が前記上部コア
層9のトラック幅の側方にも拡がっているため、記録電
流が大きくなるとギャップ部からの漏れ磁束がトラック
幅方向側方にまで拡がり、実効的な記録トラック幅が上
部コア層のトラック幅よりも拡くなることがある。
The width of a recording track formed on a recording medium such as a magnetic disk by the composite type thin film magnetic head as shown in FIG. 8 is restricted by the track width of the upper core layer 9 of the induction type head. In the composite type thin film magnetic head, since the upper shield layer / lower core layer 7 extends to the side of the track width of the upper core layer 9 as well, when the recording current becomes large, the leakage magnetic flux from the gap portion is generated in the track width direction. It may spread laterally, and the effective recording track width may become wider than the track width of the upper core layer.

【0006】このような実効記録トラック幅の拡大現象
は「記録にじみ」と称され、HDD装置等において50
00TPIにも達するような高トラック密度を実現する
ためには、すなわち5μm程度以下のトラック幅で記録
を行うためには、隣接トラックとのクロストーク等の原
因となる「記録にじみ」の問題が大きな障害となる。
Such an expansion phenomenon of the effective recording track width is called "recording bleeding", and is 50 in HDD devices or the like.
In order to realize a high track density that reaches even 00TPI, that is, to perform recording with a track width of about 5 μm or less, there is a large problem of “recording bleeding” that causes crosstalk with adjacent tracks. It becomes an obstacle.

【0007】[0007]

【発明が解決しようとする課題】本発明は、磁気抵抗効
果素子層及びシールド層を備える磁気抵抗効果型ヘッド
と磁気コア層及びコイル層を備える誘導型ヘッドとを基
板上に積み重ねて形成し、前記磁気抵抗効果型ヘッドの
上部シールド層と前記誘導型ヘッドの下部コア層とを磁
性薄膜の一体物あるいは比較的薄い非磁性薄膜を介して
積層された磁性薄膜にて構成した複合型薄膜磁気ヘッド
の製造方法において、前記「記録にじみ」の問題が改善
されるような製造方法を明らかにするものである。
SUMMARY OF THE INVENTION According to the present invention, a magnetoresistive head having a magnetoresistive element layer and a shield layer and an inductive head having a magnetic core layer and a coil layer are stacked and formed on a substrate. A composite thin film magnetic head in which the upper shield layer of the magnetoresistive head and the lower core layer of the inductive head are composed of a magnetic thin film or a magnetic thin film laminated via a relatively thin non-magnetic thin film. In the manufacturing method (1), the manufacturing method which can solve the above-mentioned problem of "recording bleeding" is clarified.

【0008】[0008]

【課題を解決するための手段】本発明による複合型薄膜
磁気ヘッドの製造方法は、 磁気抵抗効果素子層及びシ
ールド層を備える磁気抵抗効果型ヘッドと磁気コア層及
びコイル層を備える誘導型ヘッドとを基板上に積み重ね
て形成した複合型薄膜磁気ヘッドの製造方法において、
磁気抵抗効果型ヘッドの上部シールド層となる第1の薄
膜を成膜した後、該第1の薄膜をエッチング整形する前
に誘導型ヘッドの下部コア層となる第2の薄膜を成膜す
る工程と、前記第1及び第2の薄膜を前記上部シールド
層としての平面形状にエッチング整形する工程と、前記
第2の薄膜上の所定の部位に所定の平面形状を有する誘
導型ヘッドの下部絶縁層、コイル層、上部絶縁層、ギャ
ップスペーサ層及び上部コア層を順次形成する工程と、
前記上部コア層のトラック幅規制部上を除いて、該上部
コア層上及び前記上部絶縁層上にレジスト層を形成する
工程と、前記上部コア層のトラック幅規制部及び前記レ
ジスト層ををマスクとして前記第2の薄膜をエッチング
整形する工程と、前記レジスト層を除去する工程とを備
えることを特徴とするものである。
A method of manufacturing a composite thin film magnetic head according to the present invention comprises a magnetoresistive head having a magnetoresistive element layer and a shield layer, and an inductive head having a magnetic core layer and a coil layer. In a method of manufacturing a composite type thin film magnetic head formed by stacking on a substrate,
A step of forming a second thin film which will be a lower core layer of the inductive head after forming a first thin film which will be an upper shield layer of the magnetoresistive head and before etching and shaping the first thin film. And a step of etching and shaping the first and second thin films into a planar shape as the upper shield layer, and a lower insulating layer of an inductive head having a predetermined planar shape at a predetermined portion on the second thin film. A step of sequentially forming a coil layer, an upper insulating layer, a gap spacer layer and an upper core layer,
Forming a resist layer on the upper core layer and on the upper insulating layer except on the track width regulating portion of the upper core layer, and masking the track width regulating portion of the upper core layer and the resist layer And a step of etching and shaping the second thin film, and a step of removing the resist layer.

【0009】[0009]

【作用】上記本発明の製造方法によれば、下部コア層の
一部に上部コア層のトラック幅規制部と同一の平面形状
で対向する部分が形成され、該対向部、すなわち誘導型
ヘッドとしてのギャップ部からの漏れ磁束がトラック幅
方向の側方に拡がりにくくなり、前記「記録にじみ」の
問題が解消される。
According to the above-described manufacturing method of the present invention, a portion of the lower core layer that is opposed to the upper core layer in the same plane shape as the track width regulating portion is formed, and the facing portion, that is, the induction type head is formed. It becomes difficult for the magnetic flux leaking from the gap portion to spread laterally in the track width direction, and the problem of "recording bleeding" is solved.

【0010】また、上記本発明の製造方法によれば、上
部コア層のトラック幅規制部がレジスト層で覆われた部
分に比べて薄くなるため、上部コア層内を通る磁束がト
ラック幅規制部において厚さ方向に絞り込まれて、記録
効率が向上する。
Further, according to the above-described manufacturing method of the present invention, the track width regulating portion of the upper core layer is thinner than the portion covered with the resist layer, so that the magnetic flux passing through the upper core layer is absorbed by the track width regulating portion. The recording efficiency is improved by narrowing down in the thickness direction.

【0011】[0011]

【実施例】以下、本発明の実施例について図面を参照し
ながら説明する。
Embodiments of the present invention will be described below with reference to the drawings.

【0012】本発明実施例においては、まず、図2に示
すように、基板1上に磁気抵抗効果型ヘッドの下部シー
ルド層2、下部シールド層と磁気抵抗効果素子層との間
のギャップスペーサ層3、磁気抵抗効果素子層4、磁気
抵抗効果素子に通電するための導体層5、磁気抵抗効果
素子層と上部シールド層との間のギャップスペーサ層6
を順次形成した後、上部シールド層となる第1の薄膜7
1及び誘導型ヘッドの下部コア層となる第2の薄膜72
を成膜し、該第1及び第2の薄膜71、72を上部シー
ルド層としての平面形状にエッチング整形する。
In the embodiment of the present invention, first, as shown in FIG. 2, the lower shield layer 2 of the magnetoresistive head and the gap spacer layer between the lower shield layer and the magnetoresistive element layer are formed on the substrate 1. 3, magnetoresistive effect element layer 4, conductor layer 5 for energizing the magnetoresistive effect element, gap spacer layer 6 between the magnetoresistive effect element layer and the upper shield layer
And then sequentially forming the first thin film 7 serving as an upper shield layer.
1 and a second thin film 72 to be the lower core layer of the inductive head
Is formed, and the first and second thin films 71 and 72 are etched and shaped into a planar shape as an upper shield layer.

【0013】前記第1の薄膜71の材料としてはNiF
e合金等が用いられ、厚さは0.5〜3μmである。前
記第2の薄膜72の材料としてはCoZrSn系の非晶
質合金等が用いられ、厚さは0.5〜5μmである。
The material of the first thin film 71 is NiF.
An e-alloy or the like is used, and the thickness is 0.5 to 3 μm. As the material of the second thin film 72, a CoZrSn-based amorphous alloy or the like is used, and the thickness thereof is 0.5 to 5 μm.

【0014】次に、図3に示すように、前記第2の薄膜
72上の所定の部位に所定の平面形状を有する誘導型ヘ
ッドの下部絶縁層(図示省略)、コイル層8、上部絶縁
層(図示省略)、ギャップスペーサ層(図示省略)及び
上部コア層9を順次形成する。
Next, as shown in FIG. 3, a lower insulating layer (not shown), a coil layer 8 and an upper insulating layer of the induction type head having a predetermined plane shape at a predetermined portion on the second thin film 72. (Not shown), a gap spacer layer (not shown), and an upper core layer 9 are sequentially formed.

【0015】前記上部コア層9の材料としてはCoZr
Sn系の非晶質合金等が用いられ、厚さは1〜5μmで
ある。
The material of the upper core layer 9 is CoZr.
A Sn-based amorphous alloy or the like is used, and the thickness is 1 to 5 μm.

【0016】次に、図4に示すように、前記上部コア層
9のトラック幅規制部91上を除いて、該上部コア層上
及び前記上部絶縁層上にレジスト層92を形成する。
Next, as shown in FIG. 4, a resist layer 92 is formed on the upper core layer and the upper insulating layer except on the track width restricting portion 91 of the upper core layer 9.

【0017】次に、図5に示すように、前記上部コア層
のトラック幅規制部91及び前記レジスト層92ををマ
スクとして前記第2の薄膜をエッチング整形する。この
時、エッチングの深さは第2の薄膜の厚さと必ずしも一
致させる必要はなく、第2の薄膜の底層部が残っていて
もよいし、第1の薄膜の上層部にまで達してもよい。
Next, as shown in FIG. 5, the second thin film is etched and shaped by using the track width regulating portion 91 of the upper core layer and the resist layer 92 as a mask. At this time, the etching depth does not necessarily have to match the thickness of the second thin film, and the bottom layer portion of the second thin film may remain or may reach the upper layer portion of the first thin film. .

【0018】最後に、前記レジスト層を除去することに
より、図1に示すような複合型薄膜磁気ヘッドが得られ
る。
Finally, by removing the resist layer, a composite type thin film magnetic head as shown in FIG. 1 is obtained.

【0019】ここで、前記第1の薄膜71と第2の薄膜
72は、上記実施例のように異種の材料で構成されてい
てもよいし、同種の材料で構成されていてもよい。
Here, the first thin film 71 and the second thin film 72 may be made of different materials as in the above embodiment, or may be made of the same material.

【0020】また、前記第1の薄膜71と第2の薄膜7
2の間の全面に非磁性薄膜を介在させてもよいし、図6
や図7に示すように、前記第1の薄膜71と第2の薄膜
72との間に局部的に非磁性薄膜73を介在させてもよ
い。前記非磁性薄膜73は前記第2の薄膜によって構成
される誘導型ヘッドの下部コア層72と前記第1の薄膜
によって構成される磁気抵抗効果型ヘッドの上部シール
ド層71との間の静磁的な結合状態を変化させて、前記
下部コア層72内の磁区構造を制御するために設けられ
るものである。
Further, the first thin film 71 and the second thin film 7
A non-magnetic thin film may be provided on the entire surface between the two, and FIG.
Alternatively, as shown in FIG. 7, a non-magnetic thin film 73 may be locally interposed between the first thin film 71 and the second thin film 72. The non-magnetic thin film 73 is magnetostatic between the lower core layer 72 of the inductive head composed of the second thin film and the upper shield layer 71 of the magnetoresistive head composed of the first thin film. It is provided to control the magnetic domain structure in the lower core layer 72 by changing the different coupling state.

【0021】[0021]

【発明の効果】本発明によって製造される複合型薄膜磁
気ヘッドを用いれば、実効的な記録トラック幅の拡がり
が抑制されるとともに記録効率も向上し、高トラック密
度の磁気記録システムを実現することが可能になる。
By using the composite type thin film magnetic head manufactured according to the present invention, it is possible to suppress the effective expansion of the recording track width and improve the recording efficiency, and to realize a high track density magnetic recording system. Will be possible.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明実施例による複合型薄膜磁気ヘッドの斜
視図である。
FIG. 1 is a perspective view of a composite type thin film magnetic head according to an embodiment of the present invention.

【図2】本発明実施例による複合型薄膜磁気ヘッドの製
造工程を示す斜視図(その1)である。
FIG. 2 is a perspective view (No. 1) showing a manufacturing process of a composite type thin film magnetic head according to an embodiment of the present invention.

【図3】本発明実施例による複合型薄膜磁気ヘッドの製
造工程を示す斜視図である。
FIG. 3 is a perspective view showing a manufacturing process of a composite type thin film magnetic head according to an embodiment of the present invention.

【図4】本発明実施例による複合型薄膜磁気ヘッドの製
造工程を示す斜視図である。
FIG. 4 is a perspective view showing a manufacturing process of a composite type thin film magnetic head according to an embodiment of the present invention.

【図5】本発明実施例による複合型薄膜磁気ヘッドの製
造工程を示す斜視図である。
FIG. 5 is a perspective view showing a manufacturing process of a composite type thin film magnetic head according to an embodiment of the present invention.

【図6】本発明実施例による複合型薄膜磁気ヘッドの斜
視図である。
FIG. 6 is a perspective view of a composite type thin film magnetic head according to an embodiment of the present invention.

【図7】本発明実施例による複合型薄膜磁気ヘッドの斜
視図である。
FIG. 7 is a perspective view of a composite type thin film magnetic head according to an embodiment of the present invention.

【図8】従来例による複合型薄膜磁気ヘッドの斜視図で
ある。
FIG. 8 is a perspective view of a composite type thin film magnetic head according to a conventional example.

【符号の説明】[Explanation of symbols]

1 基板 2 下部シールド層 3 下部シールド層と磁気抵抗効果素子層との間のギ
ャップスペーサ層 4 磁気抵抗効果素子層 5 磁気抵抗効果素子層に通電するための導体層 6 磁気抵抗効果素子層と上部シールド層との間のギ
ャップスペーサ層 71 上部シールド層(第1の薄膜) 72 下部コア層(第2の薄膜) 8 コイル層 9 上部コア層
1 Substrate 2 Lower Shield Layer 3 Gap Spacer Layer Between Lower Shield Layer and Magnetoresistive Element Layer 4 Magnetoresistive Element Layer 5 Conductor Layer for Energizing Magnetoresistive Element Layer 6 Magnetoresistive Element Layer and Top Gap between shield layer 71 Upper shield layer (first thin film) 72 Lower core layer (second thin film) 8 Coil layer 9 Upper core layer

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】 磁気抵抗効果素子層及びシールド層を備
える磁気抵抗効果型ヘッドと磁気コア層及びコイル層を
備える誘導型ヘッドとを基板上に積み重ねて形成した複
合型薄膜磁気ヘッドの製造方法において、 磁気抵抗効果型ヘッドの上部シールド層となる第1の薄
膜を成膜した後、該第1の薄膜をエッチング整形する前
に誘導型ヘッドの下部コア層となる第2の薄膜を成膜す
る工程と、 前記第1及び第2の薄膜を前記上部シールド層としての
平面形状にエッチング整形する工程と、 前記第2の薄膜上の所定の部位に、所定の平面形状を有
する誘導型ヘッドの下部絶縁層、コイル層、上部絶縁
層、ギャップスペーサ層及び上部コア層を順次形成する
工程と、 前記上部コア層のトラック幅規制部上を除いて、該上部
コア層上及び前記上部絶縁層上にレジスト層を形成する
工程と、 前記上部コア層のトラック幅規制部及び前記レジスト層
ををマスクとして前記第2の薄膜をエッチング整形する
工程と、 前記レジスト層を除去する工程とを備えることを特徴と
する複合型薄膜磁気ヘッドの製造方法。
1. A method of manufacturing a composite thin-film magnetic head, wherein a magnetoresistive head having a magnetoresistive element layer and a shield layer and an inductive head having a magnetic core layer and a coil layer are stacked and formed on a substrate. After forming a first thin film which will be an upper shield layer of the magnetoresistive head, and forming a second thin film which will be a lower core layer of the inductive head before etching and shaping the first thin film. A step of etching and shaping the first and second thin films into a planar shape as the upper shield layer, and a lower part of the induction type head having a predetermined planar shape at a predetermined portion on the second thin film. A step of sequentially forming an insulating layer, a coil layer, an upper insulating layer, a gap spacer layer, and an upper core layer; and, except for a track width restricting portion of the upper core layer, on the upper core layer and the upper insulating layer. A step of forming a resist layer thereon; a step of etching and shaping the second thin film using the track width restricting portion of the upper core layer and the resist layer as a mask; and a step of removing the resist layer. And a method of manufacturing a composite thin film magnetic head.
【請求項2】 前記第1の薄膜上に、中間層を介さずに
前記第2の薄膜を成膜する工程を備えることを特徴とす
る請求項1記載の複合型薄膜磁気ヘッドの製造方法。
2. The method of manufacturing a composite thin-film magnetic head according to claim 1, further comprising the step of forming the second thin film on the first thin film without an intermediate layer.
【請求項3】 前記第1の薄膜上の所定の部位に、所定
の平面形状を有する非磁性層を形成した後、前記第2の
薄膜を成膜する工程を備えることを特徴とする請求項1
記載の複合型薄膜磁気ヘッドの製造方法。
3. The method according to claim 1, further comprising a step of forming a nonmagnetic layer having a predetermined planar shape on a predetermined portion of the first thin film, and then forming the second thin film. 1
A method of manufacturing the composite thin-film magnetic head described.
JP26974594A 1994-11-02 1994-11-02 Production of combined thin-film magnetic head Pending JPH08129715A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP26974594A JPH08129715A (en) 1994-11-02 1994-11-02 Production of combined thin-film magnetic head

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP26974594A JPH08129715A (en) 1994-11-02 1994-11-02 Production of combined thin-film magnetic head

Publications (1)

Publication Number Publication Date
JPH08129715A true JPH08129715A (en) 1996-05-21

Family

ID=17476570

Family Applications (1)

Application Number Title Priority Date Filing Date
JP26974594A Pending JPH08129715A (en) 1994-11-02 1994-11-02 Production of combined thin-film magnetic head

Country Status (1)

Country Link
JP (1) JPH08129715A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6282776B1 (en) 1998-06-30 2001-09-04 Fujitsu Limited Magnetic head and method of manufacturing the same
US6510024B2 (en) 1998-06-30 2003-01-21 Fujitsu Limited Magnetic head and method of manufacturing the same

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6282776B1 (en) 1998-06-30 2001-09-04 Fujitsu Limited Magnetic head and method of manufacturing the same
US6510024B2 (en) 1998-06-30 2003-01-21 Fujitsu Limited Magnetic head and method of manufacturing the same

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