JPH08111366A - Method for forming title display - Google Patents

Abstract

PURPOSE: To obtain a method for forming an arbitrary pattern on a substrate by exposing an arbitrary pattern on the surface of a film simultaneously with the exposing operation for forming a main pattern through a photo mask, and then performing the developing operation thereby forming an indication pattern of product number, for example, using the material for forming the main pattern. CONSTITUTION: The entire surface of a glass substrate 2 is spin coated with a UV-curing resist 3 for forming a red main pattern colored by dispersing a pigment into a resin. Subsequently, in an arbitrary process preceding the developing operation, the resist 3 is exposed to UV-rays through a photo mask 5 and a dot matrix liquid crystal mask 1 for forming a main pattern by means of an exposed pattern producing unit utilizing a dot matrix liquid crystal. Thereafter, the resist 3 is subjected to shower development using a developer to be used exclusively therefor. Post-bake is then carried out under predetermined conditions thus forming a main pattern and an arbitrary pattern of number, for example, simultaneously using the resist 3. This method enhances the cleanliness.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for forming an indication such as a product number and a title in a manufacturing process of a product such as a color filter using a photo process.

[0002]

2. Description of the Related Art At present, in order to clarify quality control and production control in a color filter manufacturing line, it is required to give a product number, a title, etc. to each substrate of a product so that they can be easily distinguished. Has been. However,
In order to write the product number, title, etc. on each substrate of a product, it has been necessary to add a dedicated title exposure device to cope with the problem. It was a big deal, for example, by combining a device that prints a character shape selected from the original plate with a character pattern such as a phototypesetting device. In addition, the exposure pattern is limited because characters that are not on the original plate of the disk cannot be printed, and since each character is exposed one by one, the processing time becomes longer in proportion to the number of characters to be displayed, which affects throughput.

[0003]

SUMMARY OF THE INVENTION The object of the present invention is not to use the above-mentioned expensive apparatus for exposing titles, and to easily handle complicated characters.
It is to provide a method capable of forming an arbitrary pattern on a substrate.

[0004]

That is, according to the present invention, an exposure pattern using a segment liquid crystal or a dot matrix liquid crystal is applied in an arbitrary step after applying a photosensitive resin on a whole surface of a substrate and before starting a developing operation. Using the creating device, at the same time as performing the exposure operation through the photomask for forming the main pattern or in a separate process, the display of the title or the like is pattern-formed by exposing an arbitrary pattern on the coating film surface, and thereafter. This is a method for forming a title display on a substrate, which is characterized by forming a display of a product number, a title, etc. with a member for forming a main pattern by performing a developing operation.

When the main pattern forming member forming the display pattern is a photosensitive resin in which a color pigment is dispersed in a resin, specifically, first, the resist 3 for forming the main pattern is first formed on the glass substrate 2. Is applied to the entire surface. Here, the main pattern means a main pattern portion such as a display pixel surface of a black matrix or a color filter. Then, the main pattern is exposed and developed, but at an arbitrary step before the developing operation, an exposure pattern forming apparatus using segment liquid crystal or dot matrix liquid crystal as shown in FIG. An arbitrary pattern such as is formed by performing collective exposure.

When the main pattern forming member forming the display pattern has a metallic chromium or a laminated structure of metallic chromium and chromium oxide, specifically, metallic chromium, or metallic chromium and chromium oxide is provided on the glass substrate. The resist 3 is applied on the entire surface after the entire surface is sputter-deposited. Then, the main pattern is exposed and developed, but at an arbitrary step before the developing operation, an exposure pattern forming apparatus using segment liquid crystal or dot matrix liquid crystal as shown in FIG. An arbitrary pattern such as is formed by performing collective exposure.

In these exposure pattern forming steps, for example, as shown in FIG. 3, a photomask 5 having a transmissive portion provided at a position where the dot matrix liquid crystal mask 1 is placed may be used to perform exposure simultaneously with the main pattern, or a conventional method. Similar to the titling device, one process may be provided as a dedicated device.

[0008]

By using the above-mentioned exposure pattern forming apparatus using the segment liquid crystal or the dot matrix liquid crystal, a pattern such as an arbitrary number or the like can be easily displayed without using an expensive title exposure exclusive device. Can be formed on the substrate.

[0009]

Embodiments of the present invention will be described with reference to the drawings. <Example 1> A UV-curable resist 3 for forming a first color (red) main pattern formed by dispersing a pigment in a resin and coloring it on a glass substrate 2 (for example, product name "CR-2000 manufactured by Fuji Hunt Co., Ltd." )) Is applied to the entire surface by spin coating to a thickness of 1.0 to 2.0 μm, prebaking is performed at 70 ° C. for 20 minutes, and then the main pattern is exposed and developed. In the step, the exposure pattern forming apparatus using the dot matrix liquid crystal as shown in FIG. 1 is used.

FIG. 2 is an explanatory view showing the state of the exposure pattern forming apparatus during exposure, in which the ultraviolet rays radiated correspond to the light shielding portion 4a and the transmission portion 4b formed in the liquid crystal layer in the dot matrix liquid crystal mask 1. The three resist layers are patterned. Note that, depending on the purpose, a mask in which the light shielding portion 4a and the transmission portion 4b are reversed may be used. Also, the pattern you want to form with the exposure pattern creation device is mainly centered on numbers,
The device is cheaper if a 7-element segmented liquid crystal is used when alphabets and the like are not needed.

Here, as shown in FIG. 3, a photomask 5 having a transparent portion provided at a position where an arbitrary pattern such as a number is formed is used, and the dot matrix liquid crystal mask 1 is provided at the transparent portion.
The exposure pattern forming device is installed so that the portion is positioned, and the ultraviolet rays are exposed under the condition of 120 mJ / cm ² through the photomask 5 and the dot matrix liquid crystal mask 1, and the shower development is performed using the above-mentioned resist exclusive developer. To do. And
Post bake is performed at 230 ° C for 60 minutes. As a result,
The main pattern and an arbitrary pattern such as a number were simultaneously formed by the resist 3 at once. Subsequently, main patterns of the second color (green) and the third color (blue) are formed.

In this embodiment, an arbitrary pattern such as a number is formed by the resist of the first color.
It may be formed with a resist of a third color or a third color. Further, the exposure process for forming the main pattern may be performed in the conventional manner, and a dedicated process for forming an arbitrary pattern such as a number may be provided. In this case, it is not necessary to provide the photomask 5 with a transparent portion.

<Embodiment 2> On the glass substrate 2, only metallic chromium or metallic chromium and chromium oxide are laminated by a sputtering apparatus to form a film. In the case of a layer containing only metallic chromium, the film thickness is about 1500Å. After forming the film in this manner, a positive type photosensitive resist 3a, for example, product name "TFR-210K" manufactured by Hoechst Japan Co., Ltd. is spin-coated to a thickness of about 8500Å and prebaked on a hot plate. After that, the main pattern is exposed and developed, and the exposure pattern creating apparatus using the dot matrix liquid crystal as shown in FIG. 1 is used in any step before starting the developing operation. By the ultraviolet rays that are irradiated, the light-shielding portion 4a and the transmission portion 4b formed in the liquid crystal layer in the dot matrix liquid crystal mask 1
The resist 3a layer is patterned accordingly. In addition,
Depending on the purpose, a mask in which the light shielding portion 4a and the transmission portion 4b are reversed may be used.

Here, the exposure pattern forming apparatus is installed so that the dot matrix liquid crystal mask 1 portion is positioned on the transmissive portion where no other pattern is formed on the photomask 5, and the photomask 5 and the dot matrix liquid crystal mask are arranged. 1 is exposed to ultraviolet light under the condition of 95 mJ / cm ² and developed using the resist developing solution, that is, a weak alkaline aqueous solution of NaOH and Na ₂ CO ₃ . Then nitric acid second
The chromium film in the removed portion of the resist 3a is etched with an acidic solution prepared by mixing cerium ammonium and perchloric acid. After that, the resist 3a is peeled off with a NaOH solution. As a result, the main pattern and an arbitrary pattern such as a number were simultaneously formed by the metallic chrome.

[0015]

As described above, if the exposure pattern forming apparatus using the segment liquid crystal or the dot matrix liquid crystal is used, an arbitrary number or complicated pattern can be formed on the substrate without using an expensive apparatus for title exposure. Can be formed. Further, since a plurality of character strings can be formed at the same time, a drive system for moving a substrate or a disk original plate, which is indispensable for a conventional device, is not required, so that the cost of the device can be reduced, and Cleanliness is improved because dust is not emitted from the drive unit.

[0016]

[Brief description of drawings]

FIG. 1 is an explanatory diagram showing an exposure pattern forming apparatus used in the present invention.

FIG. 2 is an explanatory diagram showing a state at the time of exposure of the exposure pattern forming apparatus of the present invention.

FIG. 3 is an explanatory diagram showing an example of a title display forming method of the present invention.

[Explanation of symbols]

 1 dot matrix liquid crystal mask 2 glass substrate 3 resist 4a light-shielding portion 4b transmission portion 5 photomask

─────────────────────────────────────────────────── ─── Continuation of the front page (51) Int.Cl. ⁶ Identification code Internal reference number FI Technical indication H01L 21/68 F

Claims (3)

[Claims] 1. A main pattern is formed by applying a photosensitive resin on the entire surface of a substrate and then using an exposure pattern forming apparatus using segment liquid crystal or dot matrix liquid crystal in an arbitrary step before starting a developing operation. Simultaneously with performing the exposure operation through the photomask for or for another step, expose an arbitrary pattern on the coating film surface, and then perform the development operation to hold the main pattern forming member such as the product number or title. A method for forming a title display on a substrate, which comprises forming a display pattern. 2. The title display forming method according to claim 1, wherein the main pattern forming member forming the display pattern is a photosensitive resin in which a color pigment is dispersed in a resin. 3. The title display forming method according to claim 1, wherein the main pattern forming member forming the display pattern has a metal chrome or a laminated structure of metal chrome and chromium oxide.