JPH07294722A - Manufacture of color filter - Google Patents

Abstract

PURPOSE:To eliminate the protruding part where a filter colored pattern layer and a black matrix pattern layer of a color filter are overlapped with each other. CONSTITUTION:The pattern of the grid-shaped black matrix pattern layer 2 having light-shading properties is formed on one surface of the transparent filter substrate 1 beforehand and then, the filter colored pattern layer 4 consisting of the color picture element patterns of each of R, G and B is formed by printing through using a photosetting pigment dispersion photoresist ink so as to overlap with the pattern layer 2. Thereafter, the pattern layer 4 is subjected to exposure to ultraviolet rays from the other surface side of the substrate 1 by using the pattern layer 2 as the photomask and then, the unexposed part of the pattern layer 4 is dissolved and removed by appropriately using a solvent.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for manufacturing a color filter used for a color display panel or the like of a color liquid crystal display device.

[0002]

2. Description of the Related Art Generally, a color liquid crystal display device (abbreviated as L) is used.
The color filter (abbreviation CF) for CD) is, for example, as shown in FIG.
As shown in the partial side sectional view of the color filter of (a) and the partial plan view of FIG. 3 (b), a width of 100 μm to 200 μ is provided on a transparent filter substrate 1 made of glass or plastic.
m pixel stripe (parallel line) red pixel pattern R, green pixel pattern G, blue pixel pattern B
And a filter coloring pattern layer 22 having a matrix pixel pattern of
25 μm in width under each boundary of the red pixel pattern R, the green pixel pattern G, and the blue pixel pattern B of
A black matrix pattern layer 24 (abbreviated as BMX) having a stripe shape of about 50 μm is provided.

Further, for example, as shown in a partial side sectional view of the color filter of FIG. 4A and a partial plan view of FIG. 4B, a width is formed on a transparent filter substrate 1 made of glass or plastic. A square dot-shaped red pixel pattern R, a green pixel pattern G of about 100 μm to 200 μm,
A filter coloring pattern layer 22 serving as a matrix pixel pattern composed of the blue pixel pattern B is provided, and the filter coloring pattern layer 22 is below each boundary portion of the red pixel pattern R, the green pixel pattern G, and the blue pixel pattern B. , A grid-like black matrix pattern layer 24 formed by orthogonal parallel lines having a width of about 25 μm to 50 μm
(Abbreviation BMX).

The BMX 24 is formed into a thin film pattern by using a vapor-deposited film of light-shielding chromium metal or the like,
Alternatively, a relatively thick film pattern is formed using a black pigment dispersion photoresist having a light opaque absorption property, a black pigment colorant such as a printing ink, and the red pixel pattern R, the green pixel pattern G, and the blue pixel pattern. The filter coloring pattern layer 22 as each color display pixel pattern of the pixel pattern B is formed such that its end portion 22a overlaps the BMX 24.

[0005]

The end portion 22a of the filter coloring pattern layer 22 is overlapped on a relatively thick film BMX 24 using a black pigment dispersion photoresist, a black pigment colorant such as a printing ink, or the like. When it is formed as shown in FIG. 5, as shown in a partial side sectional view of the color filter of FIG. Is likely to occur, and the cell gap for filling and encapsulating the liquid crystal between the separated opposing plates is likely to be non-uniform when, for example, assembling the panel by separating and facing the other counter electrode plate in parallel.

In order to eliminate the occurrence of such a raised portion of the end portion 22a, for example, when the thickness of the filter coloring pattern layer 22 or the thickness of the BMX 24 is set thinner, each red pixel pattern R and green When the coloring density of the filter coloring pattern layer 22 of the pixel pattern G and the blue pixel pattern B is lowered or the coloring density of the BMX 24 is lowered so that the required proper color density cannot be maintained and the color filter is not preferable. There is.

According to the present invention, the film thickness of the filter coloring pattern layer or the black matrix pattern layer of the color filter can be set to a sufficient film thickness so as to maintain the required proper color density, and the filter coloring It is to eliminate the rising portion of the overlapping portion of the pattern layer and the black matrix pattern layer.

[0008]

According to the present invention, a light-shielding grid-like black matrix pattern layer 2 is preliminarily formed on one surface of a transparent filter substrate 1 by a printing method.
A filter coloring pattern layer 4 composed of a red pixel pattern R, a green pixel pattern G, and a blue pixel pattern B was formed by using a photocurable pigment-dispersed photoresist ink so as to overlap the black matrix pattern layer 2. Then, from the other surface side of the filter substrate 1, ultraviolet rays are exposed using the lattice-shaped black matrix pattern layer 2 as a photomask to cure the filter coloring pattern layer 4 in the exposed portion, and the filter coloring pattern layer 4 in the unexposed portion. Is dissolved and removed with a solvent as appropriate, and is a method for manufacturing a color filter.

[0009]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS A method for manufacturing a color filter according to the present invention will be described in FIG.
Details will be described below according to the examples of the manufacturing process shown in (a) to (e).

First, as shown in FIG. 1 (a), a photo-curable pigment dispersion photoresist with a black pigment is applied to the entire surface of a transparent filter substrate 1 such as a glass plate or a plastic plate by a spin coater. Then, the photoresist layer 12 is formed.

The coating thickness of the photocurable pigment dispersion photoresist is about 1 μm to 2 μm, for example, 1.5 μm.
m is suitable. As spin coater application conditions, the rotation speed is about 800 rpm to 1500 rpm, and the rotation duration is about 8 seconds to 15 seconds. For example, rotation speed of 1000 rpm is suitable for 10 seconds. Further, after applying the photocurable pigment-dispersed photoresist, if necessary, prebaking treatment is performed, and the prebaking condition is a temperature of 70 ° C. to 85 ° C. for about 10 minutes to 20 minutes. About 70 minutes at 70 ° C is suitable.

Next, as shown in FIG. 1A, ultraviolet rays L are irradiated using a photomask m in which light transmitting portions ma in _a lattice-like black matrix pattern are formed on the photoresist layer 12. Then, pattern exposure is performed.

The exposure conditions for the above-mentioned pigment-dispersed photoresist are ultraviolet rays, for example, 60 mJ / cm ^{2 to} 120.
Exposure is performed with a dose of mJ / cm ² . By the pattern exposure, the photo-cured portion is formed in the portion of the photoresist layer 12 that is pattern-exposed by the ultraviolet rays L.

Then, as shown in FIG. 1 (b), the photo-cured portion of the photoresist layer 12 which has been pattern-exposed by the ultraviolet rays L is left, and the uncured portion which is not exposed is dissolved in a solvent as needed and developed. By removing the pattern, the black matrix pattern layer 2 in a grid pattern is formed. In addition, in this invention, the said solvent contains an alkaline solution.

The width of the black matrix pattern layer 2 is the pixel size of a square or rectangular quadrangular dot, for example, 100 μm × 100 μm to 600 μm.
It can be set corresponding to × 600 μm or the like.

The developing conditions for the above pigment-dispersed photoresist are that an alkaline solution (sodium hydroxide aqueous solution, sodium carbonate aqueous solution, potassium hydroxide aqueous solution, etc.) is used as a developing solution, the developing temperature is room temperature, and the developing time is 35 seconds to 5 seconds.
It is about 0 seconds, and for example, about 40 seconds is suitable.

Further, after the development treatment of the above-mentioned pigment dispersion type photoresist, a post-baking treatment is appropriately carried out if necessary, and the post-baking condition is a temperature of 200 ° C to 250 ° C.
It is about 30 to 100 minutes, and 60 minutes is suitable at a temperature of 230 ° C.

The lattice-shaped black matrix pattern layer 2 is not limited to the pigment dispersion photoresist system,
Intaglio offset printing using a black opaque printing ink (light-blocking printing ink, which can be either normal printing ink, photo-curable printing ink, or thermosetting printing ink) A pattern may be formed on the filter substrate 1 by a printing method such as a printing method or an intaglio printing method.

The grid-like black matrix pattern layer 2 is formed of a light-shielding metal chromium film formed on the filter substrate 1 by metal deposition, or a metal having a two-layer structure of light-shielding metal chromium and chromium oxide. The film may be patterned on the filter substrate 1 by pattern etching.

Next, as shown in FIG. 1C, the pattern layer 2 is formed in the color display pixel pattern forming region other than the lattice-shaped black matrix pattern layer 2 on the filter substrate 1.
From above, printing method (intaglio printing method, intaglio offset printing method, lithographic printing plate) using photocurable pigment-dispersed photoresist type ink (using photocurable pigment-dispersed photoresist as printing ink) By the offset printing method or the like), each red pixel pattern R, green pixel pattern G, and blue pixel of any shape pattern regularly arranged in the column direction and the row direction, such as a stripe shape, a square dot shape, or a polygonal dot shape. The filter coloring pattern layer 4 which becomes the color display pixel pattern of the pattern B is formed by patterning.

The filter coloring pattern layer 4 is a portion that becomes a color display pixel pattern in a matrix of color filters, and is an end of the filter coloring pattern layer 4 of each color of red (red), green (green) and blue (blue). Part 4a
Are patterned so as to overlap on the black matrix pattern layer 2.

The pattern printing of the filter coloring pattern layer 4 consisting of each red pixel pattern R, green pixel pattern G and blue pixel pattern B will be described below.

First, red (red), green (green),
A color to be printed in any one of the colors of blue (blue), for example, a photocurable pigment dispersion photoresist type red printing ink colored with a red pigment,
The red pixel pattern R is printed by a printing method on the transparent filter substrate 1 so as to overlap the lattice-shaped black matrix pattern layer 2.

Subsequently, the printed red pixel pattern R is not subjected to ultraviolet curing and drying, and a second printing color, for example, a photocurable pigment dispersion photoresist type green printing ink colored with a green pigment is used. Then, the green pixel pattern G is printed by the printing method so as to overlap the lattice-shaped black matrix pattern layer 2 on the transparent filter substrate 1 on which the red pixel pattern R is pattern-printed.

Subsequently, the printed pattern G is not subjected to ultraviolet curing and drying, and a third printing color, for example, a photo-curing pigment dispersion photoresist type blue printing ink colored with a blue pigment is used. The blue pixel pattern B is printed by a printing method so that the red pixel pattern R and the green pixel pattern G are printed on the transparent filter substrate 1 so as to overlap the lattice-shaped black matrix pattern layer 2. To do.

A pattern is printed on the filter substrate 1,
The ends 4a of the filter coloring pattern layer 4 of each red pixel pattern R, green pixel pattern G, and blue pixel pattern B are overlapped on the grid-like black matrix pattern layer 2 as shown in FIG. The overlapped portion is printed so that a raised portion is formed.

Thereafter, as shown in FIG. 1C, ultraviolet rays are emitted from the back surface (non-printed surface) of the filter substrate 1 on which each red pixel pattern R, green pixel pattern G and blue pixel pattern B is printed. By irradiating L, the light-shielding black matrix pattern layer 2 serves as a photomask, and the portion of the filter coloring pattern layer 4 where the black matrix pattern layer 2 is not present is irradiated with ultraviolet rays and cured. On the other hand, the black matrix pattern layer 2
The filter coloring pattern layer 4 printed right above is not cured by being irradiated with ultraviolet rays.

Subsequently, as shown in FIG. 1D, the uncured filter coloring pattern layer 4 directly above the black matrix pattern layer 2 is dissolved and removed by a solvent to remove each red pixel pattern R, The raised portions in the overlapping portions with the lattice-shaped black matrix pattern layer 2 formed on the end portions 4a of the filter coloring pattern layer 4 of the green pixel pattern G and the blue pixel pattern B are removed, and then the formed pattern Is post-baked at an appropriate heating temperature and time.

Through the above manufacturing process, as shown in FIG. 1D, the end 4a of the filter coloring pattern layer 4 overlapping the black matrix pattern layer 2 is
A color filter with no swell and smoothness is produced.

As described above, according to the manufacturing method of the present invention,
As shown in FIG. 1E (partial plan view of the color filter), a black matrix pattern layer 2 having a grid pattern of orthogonal parallel lines and surrounded by the grid pattern layer 2 on a filter substrate 1. A color filter having a filter coloring pattern layer 4 composed of each red pixel pattern R, green pixel pattern G, and blue pixel pattern B is manufactured in a large number of rectangular color display pixel regions.

As one embodiment of the method of manufacturing the color filter of the present invention, the filter substrate shown in FIG. 1 (e), which is surrounded by the grid-like black matrix pattern layer 2 and is formed in the row and column directions. A filter coloring pattern layer 4 including each red pixel pattern R, green pixel pattern G, and blue pixel pattern B is arranged in a column direction (vertical direction in FIG. 1E) in a large number of quadrangular color display pixel regions on one. By forming a pattern in a stripe shape (parallel line shape) by a printing method, as shown in FIG. 1E, a red pixel pattern R and a green pixel pattern G of the same color in the column direction (vertical direction) are formed. Then, a color filter in which the pixel pattern of the blue pixel pattern B is arranged is manufactured.

It should be noted that, in the present invention, the side sectional views of the manufacturing process shown in FIGS. 1 (a) to 1 (d) used for explaining the embodiment of the manufacturing process of the color filter manufacturing method are shown in FIG. The sectional view on the XX side in the partial plan view of the color filter in (e) is used.

2 (a) to 2 (d) are shown in FIG. 1 (e).
FIG. 1A is a sectional view taken along line YY in the partial plan view of the color filter of FIG.
Corresponds to FIG. 2 (a), FIG. 1 (b) corresponds to FIG. 2 (b), FIG. 1 (c) corresponds to FIG. 2 (c), and FIG. Corresponds to FIG. 2 (d).

As another embodiment of the method for manufacturing a color filter of the present invention, the color filter is surrounded by a lattice-shaped black matrix pattern layer 2 and formed in the row and column directions.
In a large number of rectangular color display pixel regions on the filter substrate 1 shown in FIG. 1E, a filter coloring pattern layer 4 including each red pixel pattern R, green pixel pattern G, and blue pixel pattern B is arranged in the row direction ( Square dot shapes of a red pixel pattern R, a green pixel pattern G, and a blue pixel pattern B of different colors sequentially in the column direction (vertical direction in FIG. 1E) and in the column direction (vertical direction in FIG. 1E). By forming the pixel pattern of FIG. 4 by a printing method, each red pixel pattern R of a color sequentially different in the row direction and the column direction as shown in the partial plan view of the conventional color filter of FIG. Alternatively, a color filter in which the pixel patterns of the green pixel pattern G and the blue pixel pattern B are arranged may be manufactured.

Further, the shape of the color display pixel area surrounded by the lattice-shaped black matrix pattern layer 2 formed by orthogonal light-shielding parallel line groups shown in FIG. 1E may be a simple quadrangle shape. Alternatively, the shape portion of the color display pixel area may be polygonal such as hexagonal or circular. Then, when the pattern is formed by the printing method such that the color display pixel region overlaps the grid-like black matrix pattern layer 2, the print pattern shape of each color pixel pattern R, G, B (for printing) The shape of each pixel pattern R, G, B formed on the printing plate to be used may be a stripe shape, a square dot shape, or any other shape. The shape of each pixel pattern R, G, B after pattern printing is finally
It is defined by the pattern shape of the lattice-shaped light-shielding black matrix pattern layer 2.

In the method for producing a color filter of the present invention, the type of the photocurable pigment-dispersed photoresist colored in black, the coating thickness, and the spin coater used for patterning the black matrix pattern layer 2 are used. The coating conditions, pre-baking conditions, exposure conditions, developing conditions, post-baking conditions, etc. are not particularly limited in the method of the present invention. Also, red, green,
In the method of the present invention, the kind of ink of the photocurable pigment-dispersed photoresist type ink colored in blue, printing conditions, exposure conditions, dissolution removal conditions, post-baking conditions, etc. are not particularly limited.

As the photocurable pigment-dispersed photoresist used for forming the pattern of the black matrix pattern layer 2, for example, a black photoresist (CK2000) manufactured by Fuji Hunt Co. can be used.

The spin coater for forming the photoresist layer 12 has a rotation speed of 8
00 rpm-1500 rpm, rotation duration is 8
Second to 15 seconds, for example, rotation speed 1000 rpm
10 seconds is appropriate. The pre-baking condition is a temperature of 70 ° C. to 85 ° C. for about 10 minutes to 20 minutes, and for example, a temperature of 70 ° C. for about 15 minutes is suitable.

The photocurable pigment dispersion photoresist type ink used for forming the pattern of the filter coloring pattern layer 4 of each red pixel pattern R, green pixel pattern G, and blue pixel pattern B is, for example, manufactured by Fuji Hunt. , Red (red); CR2000, green (green); CG2000, blue (blue); CB2000 can be used, and the coating film thickness is about 1 μm to 2 μm, for example, 1.5 μm is suitable.

The coating conditions of the spin coater are as follows:
The rotation speed is about 800 rpm to 1500 rpm, and the rotation duration is about 8 seconds to 15 seconds.
000 rpm for 10 seconds is suitable. In addition, if necessary, pre-baking (heat treatment before dissolution removal) may be performed, and pre-baking conditions include a temperature of about 70 ° C. to 85 ° C.
It is about 0 to 20 minutes, and for example, about 70 minutes at a temperature of 70 ° C. is suitable.

The ultraviolet exposure conditions for the above pigment-dispersed photoresist type ink of each color are 60 mJ / cm 2.
Was exposed at dose of ^{2 ~120mJ} / cm ^2, for ^{example, B; 120mJ / cm 2,} G; 80mJ / cm 2,
R; 60 mJ / cm ² is suitable.

The developing conditions for the above-mentioned color pigment-dispersed photoresist type inks are that an alkaline solution (sodium hydroxide aqueous solution, sodium carbonate aqueous solution, potassium hydroxide aqueous solution, etc.) is used as the developing solution, and the developing temperature is room temperature and the development is performed. The time is about 35 seconds to 50 seconds, for example 4
About 0 seconds is suitable.

The post-baking conditions after dissolution and removal of the above-described color pigment-dispersed photoresist type inks are a temperature of 200 ° C. to 250 ° C. for about 30 minutes to 100 minutes, and a temperature of 230 ° C. for 60 minutes is suitable. Is.

In the color filter manufacturing method, the black matrix pattern layer 2 formed on the filter substrate 1 and the filter coloring pattern layer 4 are directly or insulatively transparent overcoat layer (transparent). A transparent conductive film layer (not shown) having a film thickness of about 1000Å is indirectly formed through a resin layer).

The color filters are used, for example, in such a manner that they are spaced apart and face each other in parallel with the liquid crystal sandwiched therebetween and are orthogonal to each other.
When used in a color liquid crystal display device of a simple matrix display system having a pair of striped electrodes (a striped scanning electrode and a striped display electrode), regularly arranged red pixel patterns R, blue pixel patterns B, On the filter coloring pattern layer 4 of the green pixel pattern G, a film thickness of about 500 to 1000Å, such as an ITO film for a simple matrix scanning electrode common to each column or row,
A transparent conductive film layer of about 1000 to 3000 Å is indirectly formed through a transparent insulating protective layer (transparent resin layer) having an insulating property in a stripe pattern in a column direction or a row direction by using a sputtering method, an etching method, or the like. Form a pattern. The transparent protective layer is obtained by coating a transparent resin such as a synthetic resin or a photocurable resin.

Further, the use of the color filter is, for example,
An active matrix display method using a pixel electrode and a common electrode that face each other in parallel with a liquid crystal in between (for example,
Thin Film Transistor method; TF
(T type, etc.), the thickness of the ITO film or the like for the common electrode of the TFT type is about 500 to 1000Å on the filter coloring pattern layer 4 and the black matrix pattern layer 2.
Transparent conductive film layer 7 (ITO of about 1000 to 3000Å)
The film) is formed directly or indirectly through an insulating transparent protective layer (transparent resin layer) in an appropriately solid shape by using a sputtering method, an etching method, or the like.

Specific examples of the method of the present invention are shown below.

Example 1 A transparent glass filter substrate was coated with a photosensitive resin in which a carbon pigment was dispersed (manufactured by Fuji Hunt Co .; CK2000) at a layer thickness of 0.7 to 2.0 μm. It was applied in a layer thickness to form a photoresist layer. The optical density of the photoresist layer is 3.0-3.
It was about 4.

Subsequently, the photoresist layer is pattern-exposed to a grid-like black matrix pattern by ultraviolet rays using a photomask, and is developed with a predetermined developing solution (for example, an alkaline solution) to form a grid-like black matrix. After patterning the pattern layer (light-shielding layer),
Post-baking was performed at 230 ° C. for 60 minutes.

Next, red, green and blue pigments are dispersed and mixed in a photoresist from the grid-like black matrix pattern layer on the filter substrate so as to overlap the pattern layer. Colored pigment dispersion of each color of green and blue Using a photoresist type ink, each square dot-shaped red pixel pattern, green pixel pattern, and blue pixel pattern are printed by the intaglio printing method, and the filter coloring pattern layer is patterned. Formed.

Next, ultraviolet rays (100 mJ / c) are applied from the back surface of the filter substrate (the side opposite to the pattern printing side).
m ² ) to photo-cur the filter coloring pattern layer other than the grid-like black matrix pattern layer (light-shielding layer), and to filter the unirradiated part on the grid-like black matrix pattern layer (light-shielding layer). Pattern layer,
It was removed by dissolution with a 2.5% aqueous sodium carbonate solution.

Then, a post-baking treatment is performed at 230 ° C. for 1 hour to subject the photo-cured filter coloring pattern layer to a film hardening treatment to enhance chemical resistance and adhesiveness to the filter substrate, and to obtain a color filter. Got If necessary, an overcoat layer was formed on the filter substrate surface from above the filter coloring pattern layer.

[0053]

According to the method of manufacturing a color filter of the present invention, the filter coloring pattern layer 4 including the blue pixel pattern B, the green pixel pattern G and the red pixel pattern R is formed in the black matrix by using the photocurable pigment dispersion photoresist ink. After pattern printing so as to overlap the pattern layer 2, ultraviolet rays are exposed from the other surface side of the filter substrate 1 using the lattice-shaped black matrix pattern layer 2 as a photomask to cure the filter coloring pattern layer 4 in the exposed portion. However, since the unexposed portion of the filter coloring pattern layer 4 is appropriately dissolved and removed with a solvent, only the raised portion of the portion of the filter coloring pattern layer 4 overlapping the lattice-shaped black matrix pattern layer 2 has a light-shielding lattice shape. Through the black matrix pattern layer 2, the unexposed part (uncured Min) can be formed, only the raised portions of the filter color pattern layer 4 as the uncured portion, can be eliminated portion raised facilitated by dissolving and removing the solvent.

Further, in the method of the present invention, the pixel patterns R for each color are arranged so as to overlap the light-shielding black matrix pattern layer 2 which is previously patterned in a grid pattern.
Since the G and B filter coloring pattern layers 4 are formed by a printing method, finally, the substantial shape of each color pixel pattern observed from the non-printing surface side through the filter substrate 1 is light-shielding. It becomes a shape surrounded by the conductive black matrix pattern layer 2. Therefore, when the filter coloring pattern layer 4 is pattern-printed, the substantial print pattern shape of each color pixel pattern is set to an appropriate print pattern shape among stripe shape, square dot shape, and polygonal dot shape, and pattern printing is performed. You can
After pattern printing, only the filter coloring pattern layer 4 overlapping the black matrix pattern layer 2 can be dissolved and removed as described above.

[0055]

The method of manufacturing a color filter according to the present invention comprises:
The raised portion of the filter coloring pattern layer 4 patterned on the filter substrate can be easily removed, and in particular, a relatively thick film pattern is formed using a black pigment-dispersed photoresist, printing ink, or the like. A swell that occurs when a pattern is formed by overlapping a filter coloring pattern layer on a black matrix pattern layer is eliminated, and a color filter having a relatively smooth filter coloring pattern layer can be manufactured.

Further, the color filter manufactured by the method of the present invention and the counter electrode plate are arranged in parallel and spaced apart from each other,
When the display panel of the color liquid crystal display device is panelized (assembled), the uniformity of the cell gap for filling and enclosing the liquid crystal between the separated and opposed surfaces can be obtained.

In addition, in the method for manufacturing a color filter of the present invention, in order to eliminate the raised portion of the filter coloring pattern layer 4 formed on the filter substrate, a black matrix pattern layer or a filter coloring pattern layer on the filter substrate is eliminated. There is an effect that it is not necessary to set the thickness of the film to less than necessary, and the film thickness can be set with sufficient allowance for maintaining an appropriate color density.

[Brief description of drawings]

1 (a) to 1 (d) are side cross-sectional views taken along line XX showing a method for manufacturing a color filter of the present invention, and FIG. 1 (e) is a color filter manufactured by the method of manufacturing a color filter of the present invention. FIG.

2 (a) to 2 (d) are sectional views taken along line YY showing the method for manufacturing a color filter of the present invention.

FIG. 3A is a partial side sectional view illustrating a conventional color filter, and FIG. 3B is a partial plan view illustrating a conventional color filter.

FIG. 4 is a partial side sectional view illustrating a conventional color filter.

FIG. 5A is a partial side sectional view illustrating a conventional color filter, and FIG. 5B is a partial plan view illustrating a conventional color filter.

[Explanation of symbols]

R ... Red pixel pattern G ... Green pixel pattern
B ... Blue pixel pattern 1 ... Filter substrate 2 ... Black matrix pattern layer 4 ... Filter coloring pattern layer 4a ... Edge 12 ... Photoresist layer 22 ... Filter coloring pattern layer 22a ... Edge 24 ... Black matrix pattern layer m ... Photomask

Claims (1)

[Claims] 1. A red pixel pattern R is formed on a surface of a transparent filter substrate 1 in advance by patterning a light-shielding grid-like black matrix pattern layer 2 and using a photocurable pigment dispersion photoresist ink by a printing method. After patterning the filter coloring pattern layer 4 including the green pixel pattern G and the blue pixel pattern B so as to overlap the black matrix pattern layer 2, from the other surface side of the filter substrate 1, the grid black matrix is formed. An ultraviolet ray is exposed using the pattern layer 2 as a photomask to cure the filter coloring pattern layer 4 in the exposed portion, and the filter coloring pattern layer 4 in the unexposed portion is appropriately dissolved and removed with a solvent. Production method.