JP2797532B2 - Method of manufacturing color liquid crystal panel - Google Patents

Description

DETAILED DESCRIPTION OF THE INVENTION [Summary] The present invention relates to a method for manufacturing a color liquid crystal panel, and more particularly to a method for controlling a cell thickness of a color liquid crystal panel. A color filter having at least a coloring layer corresponding to a pixel pattern of red, green, and blue is periodically arranged in a matrix form, and a non-translucent black matrix is formed on a boundary between the coloring layers. In manufacturing a color liquid crystal panel, a top coat layer is formed on the color filter, and then, by a back exposure method using the black matrix as a mask, the top coat layer is removed from the black matrix, and each colored layer is removed. The method includes a step of making the top coat layer and the black matrix remaining on the surface substantially flush.

[Industrial applications]

The present invention relates to a method for manufacturing a color liquid crystal panel, and more particularly, to controlling the cell thickness of a color liquid crystal panel.

In recent years, there has been a demand for a liquid crystal display device of a color display corresponding to a CRT, and accordingly, a color filter has been used.

[Conventional technology]

FIG. 3 shows a configuration example of a conventional color liquid crystal display panel.

On a glass substrate 7, coloring layers 3, 4, and 5 corresponding to the pixel patterns of the three primary colors R, G, and B are periodically arranged to form a color filter 8, and a top coat layer 6 is provided thereon.

In the liquid crystal display panel, spherical spacers 21 are scattered on the color filters 8 so that the glass substrates 7,
The 7 'interval is defined by the diameter of the spacer 21, and the thickness of the liquid crystal 20 is controlled.

[Problems to be solved by the invention]

However, in a structure in which the end portions of adjacent coloring layers are overlapped and the overlapping portion does not transmit light to form the black matrix 9, the portion of the black matrix 9 becomes convex, and The distance between the glass substrates 7, 7 'is determined by the located spacer 21, so that the cell thickness cannot be controlled to a predetermined thickness.

This problem arises because the surface of the pixel portion 10 and the surface of the black matrix 9 have irregularities.

An object of the present invention is to flatten the surfaces of a pixel portion and a black matrix.

[Means for solving the problem]

 FIG. 1 shows the configuration of the present invention.

In the figure, 1 is light for exposure, 2 is a photocurable top coat layer, 3, 4, and 5 are R (red), G (green), and B (blue) colored layers, 6
Is a top coat layer that finally remains, 7 is a transparent insulating substrate, 8 is a color filter, and 9 is a non-light-transmitting portion where the coloring layers 3, 4, and 5 are overlapped, and is a black matrix.

First, as shown in (a), a photocurable resin film is formed as a top coat layer 2 on a color filter 8 composed of coloring layers 3, 4, and 5 formed by overlapping the ends. This is irradiated with light 1 from the back surface of the transparent insulating substrate 7.

With this exposure, the photocurable resin film as the top coat layer 2 is not exposed on the black matrix 9 of the coloring layer,
Therefore, it does not cure, but the other parts are exposed and cured. Then, the non-photosensitive portion is removed by performing an etching process.

As a result, the top coat layer 6 is left in the pixel section 10 as shown in FIG.

(Operation)

When the black matrix 9 is formed by overlapping the end portions of the coloring layers 3, 4, and 5, the black matrix 9 has a convex shape and the pixel portion 10 has a concave portion. Since the convex portion does not transmit light, if a photosensitive film is formed on the color filter 8 and back exposure is performed, the photosensitive film on the convex portion is not exposed.

The present invention utilizes this fact. In the case where the color filter 8 has a structure in which the end portions of the three coloring layers 3, 4, and 5 are overlapped with each other, the photosensitive film self-aligned to the convex portion by back exposure. A film is formed and the top coat layer is planarized using the film.

In order to form a self-aligned photosensitive film on the convex portion, the top coat layer 2 itself may be used as a photosensitive film as described above. As described later, a negative resist film is formed on the top coat layer 2. The resist film is left only in the pixel portion 10 by exposing the pixel portion 10 of the resist film by the backside exposure, and the top coat layer 2 is etched using the resist film as a mask to form a convex shape. The top coat layer 2 may be removed from the part.

In any case, a photosensitive film self-aligned with a convex black matrix is formed, and the top coat layer is left only in a concave portion by using the photosensitive film, whereby the surfaces of the pixel portion 10 and the black matrix 9 can be flattened. .

〔Example〕

First, an embodiment of the present invention will be described with reference to FIGS. 1 (a) and 1 (b).

A polyimide resin in which a pigment corresponding to G is dispersed is formed on a glass substrate 7 and patterned to form a coloring layer 4.
Is formed, and then the B and R coloring layers 5 and 3 are successively formed to form the color filter 8.

These coloring layers 3, 4, and 5 have their ends overlapped with each other, and the overlapping portions form the black matrix 9. The overlapping portions of the coloring layers 3, 4, and 5 have a convex shape as illustrated. Except for the overlapping portion, the pixel portion 10 corresponds to each color.

Next, a photocurable resin is applied on the color filter 8 to form the top coat layer 2. As the photocurable resin, for example, polyvinyl alcohol (PVA) can be used.

The top coat layer 2 is irradiated with light from the back of the substrate 7. Since the black matrix 9 does not transmit light,
Due to the light irradiation, the top coat layer 2 is not cured because the portion on the black matrix 9 is not exposed, and the top coat layer 2 is not cured.
Is exposed and cured.

Thereafter, washing with water is performed to remove the uncured photo-cured resin on the black matrix 9.

 Thus, the top coat layer 6 remains in the pixel section 10.

As described above, in this embodiment, the top coat layer 2 applied on the color filter 8 is
Then, it is removed and is left only in the concave pixel portion 10, and the pixel portion 10
And the surface of the black matrix 9 could be flattened.

Next, another embodiment will be described with reference to FIGS. 2 (a) to 2 (d).

The present embodiment is an example in which the top coat layer 2 is patterned using a resist film.

First, as shown in FIG. 2A, a negative resist film 22 is formed on the entire surface of the top coat layer 2, and the light 1 is irradiated from the back side of the glass substrate 7 to use the black matrix 9 as a mask. Perform exposure.

As a result, the resist film 22 is exposed to light in the pixel portion 10 but is not exposed to light on the black matrix 9.

Next, if a development process is performed, the resist film 22 remains only on the pixel portion 10 as shown in FIG.

Therefore, using the resist film 22 as a mask, the top coat layer is etched to remove the exposed portion of the top coat layer, and the top coat layer 6 is left only in the pixel portion 10 as shown in FIG.

Thereafter, the resist film 22 is removed as shown in FIG.

As described above, also in the present embodiment, the surfaces of the pixel portion 10 and the black matrix 9 can be flattened.

In each of the above-described embodiment and other embodiments, the pixel portion 10
And the surface of the black matrix 9 can be flattened, so that the desired distance between the two glass substrates can be controlled.

〔The invention's effect〕

As described above, according to the present invention, the step between the pixel portion and the black matrix is 0.4 μm in the related art,
It could be 0.1 μm or less.

Accordingly, the accuracy of the cell thickness has been improved, and the variation in the cell thickness has been reduced from about ± 0.5 μm in the past to about ± 0.1 μm.

[Brief description of the drawings]

FIG. 1 is an explanatory view of one embodiment of the present invention, FIG. 2 is an explanatory view of another embodiment of the present invention, and FIG. 3 is an explanatory view of a conventional problem. In the figure, 1 is light, 2 and 6 are top coat layers, 3, 4 and 5 are coloring layers for R, G and B, respectively, 7, 7 'are transparent insulating substrates (glass substrates), 8 is a color filter, Reference numeral 9 denotes a black matrix, 10 denotes a pixel portion, 20 denotes a liquid crystal, 21 denotes a spacer, and 22 denotes a resist film.

──────────────────────────────────────────────────続 き Continued on the front page (72) Inventor Makoto Ohashi 1015 Uedanaka, Nakahara-ku, Kawasaki City, Kanagawa Prefecture Inside Fujitsu Limited (72) Inventor Takuya Yoshimi 1015 Kamiodanaka, Nakahara-ku, Kawasaki City, Kanagawa Prefecture Fujitsu Limited ( 56) References JP-A-63-159806 (JP, A) JP-A-1-145626 (JP, A) (58) Fields investigated (Int. Cl. ⁶ , DB name) G02F 1/1335 G02B 5/20

Claims (3)

(57) [Claims] A color filter (8) in which at least colored layers (3, 4, 5) corresponding to pixel patterns of red, green and blue are periodically arranged in a matrix on a transparent insulating substrate (7). In producing a color liquid crystal panel comprising a non-light-transmitting black matrix (9) on the boundary of each coloring layer, a top coat layer (2) is formed on the color filter, Removing the top coat layer from the black matrix by a backside exposure method using the black matrix as a mask, and making the top coat layer (6) remaining on each coloring layer and the black matrix substantially flush. A method for manufacturing a color liquid crystal panel, comprising: 2. The photosensitive resin film is used as the top coat layer (2), the photosensitive resin film is left unexposed on the black matrix (9) by the back exposure method, and the non-exposed portions are removed by post-processing. 2. The method according to claim 1, wherein the color liquid crystal panel is removed. 3. A resist pattern is formed by applying the backside exposure method to a resist film formed by applying a resist on the topcoat layer (2), and using the resist pattern as a mask, topping the black matrix. 2. The method for producing a color liquid crystal panel according to claim 1, wherein the color liquid crystal panel is removed from the coat layer.